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CN104804660B - Cover protection film for printed circuit boards with high temperature resistance and high reflectivity - Google Patents

Cover protection film for printed circuit boards with high temperature resistance and high reflectivity Download PDF

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Publication number
CN104804660B
CN104804660B CN201410031886.6A CN201410031886A CN104804660B CN 104804660 B CN104804660 B CN 104804660B CN 201410031886 A CN201410031886 A CN 201410031886A CN 104804660 B CN104804660 B CN 104804660B
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printed circuit
circuit board
film
reflectivity
high reflectance
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CN104804660A (en
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洪子景
施玉真
田丰荣
卢振国
李育宪
吴淑萍
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Taiflex Scientific Co Ltd
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Taiflex Scientific Co Ltd
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Abstract

The invention provides a covering protection film for a printed circuit board with high temperature resistance and high reflectivity, which comprises a high temperature resistant polymer film, wherein the melting point is more than 260 ℃; a high-reflection polymer composite material layer containing a first reflective pigment, which is arranged on one side surface of the high-temperature-resistant polymer film; the adhesive layer is arranged on one side surface of the high-temperature-resistant polymer film, which is far away from the high-reflectivity polymer layer; the whole reflectivity of the covering protection film for the printed circuit board with high temperature resistance and high reflectivity is more than 89%, and the absorptivity of the high-temperature-resistant polymer film is less than 35%. Therefore, after the surface adhesive is combined with a printed circuit board and subjected to a surface adhesion process of a light source element at 160-320 ℃, the reflectivity of the light source element in the wave band is more than 89%, and yellowing and delamination phenomena are not generated.

Description

具耐高温性及高反射率的印刷电路板用覆盖保护胶片Cover protection film for printed circuit boards with high temperature resistance and high reflectivity

技术领域technical field

本发明是关于一种印刷电路板用覆盖保护胶片,尤指一种具耐高温性及高反射率的印刷电路板用覆盖保护胶片。The invention relates to a covering protective film for printed circuit boards, especially a covering protective film for printed circuit boards with high temperature resistance and high reflectivity.

背景技术Background technique

现有技术的电子产品的光源模组,为了达到特定的光传递及光分布的效果,需通过二次光学元件的使用。但当光源模组的光源元件所产生的光线经过二次光学元件时,会有如光吸收及光散射等光损失发生,除了造成光线被浪费掉而无法有效利用外,亦会影响该电子产品整体的出光效率及光演色性;再加上,光源模组的光源元件所产生的光线经过二次光学元件后,其发光强度随传递距离的增长而衰减,需要提高光源模组的光源的发光强度以确保电子产品的出光效率。举例来说,显示器的背光模组中,可透过导光板来达到面光源及匀光的效果,但导光板的光吸收及光散射会造成光损失。In order to achieve specific light transmission and light distribution effects in the light source modules of electronic products in the prior art, secondary optical elements are required. However, when the light generated by the light source element of the light source module passes through the secondary optical element, there will be light loss such as light absorption and light scattering, which will not only cause the light to be wasted and cannot be used effectively, but also affect the overall electronic product In addition, after the light generated by the light source element of the light source module passes through the secondary optical element, its luminous intensity attenuates with the increase of the transmission distance, so it is necessary to increase the luminous intensity of the light source of the light source module To ensure the light output efficiency of electronic products. For example, in the backlight module of a display, the light guide plate can be used to achieve the effect of surface light source and uniform light, but the light absorption and light scattering of the light guide plate will cause light loss.

如图10所示,为降低二次光学元件所造成的光损失,现有技术提供一种具有反射油墨层的印刷电路板供电子产品的光源模组的光源元件使用,该反射油墨层81以油墨印刷成形于印刷电路板82的一表面上,光源模组的光源元件83则经由表面粘着(SMT,SurfaceMount Technology)工艺设置于该表面上;光源模组的光源元件83朝印刷电路板82的表面方向的散射光线可被该反射油墨层81反射,并朝向远离印刷电路板82的方向前进,以此提升电子产品的出光效率及光演色性。As shown in Figure 10, in order to reduce the light loss caused by the secondary optical element, the prior art provides a printed circuit board with a reflective ink layer for the light source element of the light source module of the electronic product, the reflective ink layer 81 is The ink is printed and formed on a surface of the printed circuit board 82, and the light source element 83 of the light source module is arranged on the surface through a surface mount (SMT, Surface Mount Technology) process; Scattered light in the surface direction can be reflected by the reflective ink layer 81 and travel away from the printed circuit board 82 , thereby improving the light extraction efficiency and light color rendering of electronic products.

但是现有技术的反射油墨层81具有以下缺点:However, the reflective ink layer 81 of the prior art has the following disadvantages:

1、经光源元件83表面粘着工艺后,由于表面粘着工艺的操作温度介于160至320℃之间,使得以油墨印刷成形的反射油墨层81会发生黄变(Yellowing),因而降低反射油墨层81的反射率(Reflection)。1. After the surface adhesion process of the light source element 83, since the operating temperature of the surface adhesion process is between 160 and 320°C, the reflective ink layer 81 formed by ink printing will undergo yellowing (Yellowing), thus reducing the reflective ink layer. 81 reflectivity (Reflection).

2、通过增加印刷成形的反射层的厚度以提高其反射率,当印刷的反射层厚度增厚后,在反射层无使用基材支撑的状况下,油墨在成型裁切工艺及印刷电路板82挠折应用(R角小于0.5mm)时,反射层容易发生脆裂。2. Increase the reflectivity by increasing the thickness of the printed reflective layer. When the thickness of the printed reflective layer is thickened, the ink will not be used in the forming and cutting process and the printed circuit board 82 when the reflective layer is not supported by the substrate. When flexing (R angle less than 0.5mm), the reflective layer is prone to embrittlement.

发明内容Contents of the invention

鉴于上述现有技术的缺点,本发明的目的在于提供一种具耐高温性及高反射率的印刷电路板用覆盖保护胶片,其在表面粘着工艺后不产生黄变,并仍具有高反射率,且具有较佳结构强度因而不易脆裂。In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a cover protective film for printed circuit boards with high temperature resistance and high reflectivity, which does not produce yellowing after the surface adhesion process, and still has high reflectivity , and has better structural strength so it is not easy to be brittle.

为了达到上述发明目的,本发明所采取的技术手段是令该具耐高温性及高反射率的印刷电路板用覆盖保护胶片,包含:In order to achieve the above-mentioned purpose of the invention, the technical means adopted by the present invention is to make the printed circuit board cover protection film with high temperature resistance and high reflectivity, including:

一耐高温高分子膜,其厚度为2至125微米(μm),熔点大于260℃,且具有两个侧面;A high-temperature-resistant polymer film with a thickness of 2 to 125 micrometers (μm), a melting point greater than 260°C, and two sides;

一高反射高分子复合材料层,设置于该耐高温高分子膜的一侧面上,其厚度为2至30微米,其中包含有一第一反光色料,该第一反光色料的折射率大于1;A high-reflective polymer composite material layer is arranged on one side of the high-temperature-resistant polymer film, and its thickness is 2 to 30 microns, which contains a first reflective coloring material, and the refractive index of the first reflective coloring material is greater than 1 ;

一粘着层,其设置于该耐高温高分子膜远离该高反射高分子复合材料层的另一侧面上,其厚度为10至75微米;An adhesive layer, which is arranged on the other side of the high-temperature-resistant polymer film away from the high-reflection polymer composite material layer, and has a thickness of 10 to 75 microns;

其中,在具耐高温性及高反射率的印刷电路板用覆盖保护胶片整体的反射率大于89%的波段,该耐高温高分子薄膜的吸收率小于35%。Wherein, in the band where the overall reflectivity of the protective film covering the printed circuit board with high temperature resistance and high reflectivity is greater than 89%, the absorption rate of the high temperature resistant polymer film is less than 35%.

依据本发明,所述耐高温性是指能经过工艺温度介于160至320℃之间且工艺时间为10至180秒的表面粘着工艺而不产生黄变及脱层现象。According to the present invention, the high temperature resistance refers to the ability to pass through a surface adhesion process with a process temperature of 160 to 320° C. and a process time of 10 to 180 seconds without yellowing and delamination.

依据本发明,所述高反射率,是在波长介于415至700纳米的波段,反射率介于89%至100%之间。优选地,在415至700纳米的波段,耐高温高分子薄膜吸收率小于35%,该具耐高温性及高反射率的印刷电路板用覆盖保护胶片整体的反射率为89%至100%。According to the present invention, the high reflectivity is in the wavelength band between 415 and 700 nanometers, and the reflectivity is between 89% and 100%. Preferably, in the wave band of 415 to 700 nanometers, the absorption rate of the high temperature resistant polymer film is less than 35%, and the overall reflectance of the cover protective film for printed circuit boards with high temperature resistance and high reflectivity is 89% to 100%.

基于上述,透过含有第一反光色料的高反射高分子复合材料层的使用,提高光源元件的光线被高反射高分子复合材料层反射的比例,降低光源元件的光线穿透高反射高分子复合材料层的比例;通过在具耐高温性及高反射率的印刷电路板用覆盖保护胶片整体的反射率大于89%的波段,具有35%以下的吸收率的耐高温高分子薄膜的使用,使得该波段的穿透光被吸收的情形降低并能进行多重反射,则能达到增加电子产品的整体出光强度、减少电子产品的光源元件的功率并提升电子产品的光演色性。其中,且耐高温高分子膜的熔点大于260℃,从而本发明的具耐高温性及高反射率的印刷电路板用覆盖保护胶片,在进行表面粘着工艺后,能具有不产生黄变及脱层现象的优点。Based on the above, through the use of the high-reflection polymer composite material layer containing the first reflective coloring material, the ratio of the light from the light source element being reflected by the high-reflection polymer composite material layer is increased, and the light from the light source element penetrates through the high-reflection polymer material. The proportion of the composite material layer; through the use of high temperature resistant polymer films with an absorption rate of 35% or less in the band where the overall reflectivity of the protective film covering the printed circuit board with high temperature resistance and high reflectivity is greater than 89%, By reducing the absorption of the penetrating light in this wavelength band and enabling multiple reflections, it is possible to increase the overall light output intensity of electronic products, reduce the power of light source components of electronic products, and improve the light color rendering of electronic products. Wherein, and the melting point of the high-temperature-resistant polymer film is greater than 260°C, so that the covering protection film for printed circuit boards with high-temperature resistance and high reflectivity of the present invention can have no yellowing and no peeling after the surface adhesion process is carried out. Advantages of the layer phenomenon.

另外,通过该耐高温高分子薄膜的设置,能支撑高反射高分子复合材料层,使得所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片在挠折或裁切工艺中,具耐高温性及高反射率的印刷电路板用覆盖保护胶片不易发生脆裂。In addition, through the setting of the high temperature resistant polymer film, the high reflective polymer composite material layer can be supported, so that the covering protective film for printed circuit boards with high temperature resistance and high reflectivity can Covering protective film for printed circuit boards with high temperature resistance and high reflectivity is not easy to be brittle and cracked.

此外,通过令该粘着层的厚度为10至75微米,能够达到覆盖印刷电路板上的线路间隙的功效。In addition, by making the adhesive layer have a thickness of 10 to 75 microns, the effect of covering the circuit gap on the printed circuit board can be achieved.

较佳的,该高反射高分子复合材料层的厚度的公差为±2微米,具有良好的厚度均匀性,相对于现有技术的反射油墨而言,更可进一步提升其对于光线的反射均匀性。Preferably, the thickness tolerance of the high-reflection polymer composite material layer is ±2 microns, which has good thickness uniformity. Compared with the reflective inks in the prior art, it can further improve the reflection uniformity of light .

优选地,该粘着层包含有一第二反光色料,该耐高温高分子膜包含有一第三反光色料。Preferably, the adhesive layer contains a second light-reflecting colorant, and the high-temperature-resistant polymer film contains a third light-reflecting colorant.

优选地,该第二反光色料的折射率大于1,该第三反光色料的折射率大于1。Preferably, the refractive index of the second light-reflecting colorant is greater than 1, and the refractive index of the third light-reflecting colorant is greater than 1.

优选地,该第一反光色料占该高反射高分子复合材料层整体的20至70体积百分比,该第二反光色料占该粘着层整体的10至50体积百分比,该第三反光色料占该耐高温高分子膜整体的1至20体积百分比。Preferably, the first reflective colorant accounts for 20 to 70 volume percent of the entire high-reflective polymer composite material layer, the second reflective colorant accounts for 10 to 50 volume percent of the adhesive layer as a whole, and the third reflective colorant Accounting for 1 to 20 volume percent of the whole high temperature resistant polymer film.

较佳的,该第一反光色料包含二氧化钛(titanium dioxide)、硫酸钡(bariumsulfate)、硫酸锶(strontium sulfate)、氧化铝(aluminium oxide)、氧化锆(zirconiumdioxide)、氧化锌(zinc oxide)、氧化镁(magnesium oxide)、氧化钙(calcium oxide)、氮化硼(boron nitride)、氮化铝(aluminium nitride)、碳酸钙(calcium carbonate)、氢氧化铝(aluminium hydroxide)和氢氧化镁(magnesium hydroxide)中的一种或几种的组合。Preferably, the first reflective coloring material includes titanium dioxide, barium sulfate, strontium sulfate, aluminum oxide, zirconium dioxide, zinc oxide, Magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate, aluminum hydroxide and magnesium hydroxide Hydroxide) in one or a combination of several.

较佳的,该第二反光色料包含二氧化钛、硫酸钡、硫酸锶、氧化铝、氧化锆、氧化锌、氧化镁、氧化钙、氮化硼、氮化铝、碳酸钙、氢氧化铝和氢氧化镁中的一种或几种的组合。Preferably, the second reflective coloring material comprises titanium dioxide, barium sulfate, strontium sulfate, aluminum oxide, zirconium oxide, zinc oxide, magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate, aluminum hydroxide and hydrogen One or a combination of magnesium oxide.

较佳的,该第三反光色料包含二氧化钛、硫酸钡、硫酸锶、氧化铝、氧化锆、氧化锌、氧化镁、氧化钙、氮化硼、氮化铝、碳酸钙、氢氧化铝和氢氧化镁中的一种或几种的组合。Preferably, the third reflective coloring material comprises titanium dioxide, barium sulfate, strontium sulfate, aluminum oxide, zirconium oxide, zinc oxide, magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate, aluminum hydroxide and hydrogen One or a combination of magnesium oxide.

依据本发明,所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片除了具有在表面粘着工艺后不产生黄变并具有高反射率,及具有较佳结构强度的特点外,也具有低厚度的特点,能符合产业上轻薄的趋势。优选地,该耐高温高分子膜的厚度为6至25微米,该高反射高分子复合材料层的厚度为6至20微米,该粘着层的厚度为10至35微米。更优选地,该耐高温高分子膜的厚度为6至12微米。According to the present invention, the covering protection film for printed circuit boards with high temperature resistance and high reflectivity has the characteristics of no yellowing after the surface adhesion process, high reflectivity, and better structural strength. It has the characteristics of low thickness, which can meet the trend of light and thin in the industry. Preferably, the high temperature resistant polymer film has a thickness of 6 to 25 microns, the high reflective polymer composite material layer has a thickness of 6 to 20 microns, and the adhesive layer has a thickness of 10 to 35 microns. More preferably, the high temperature resistant polymer film has a thickness of 6 to 12 microns.

依据本发明,该高反射高分子复合材料层包含一第一具反应性官能基树脂及一第一交联剂。该第一具反应性官能基树脂的反应性官能基包含羧基(carboxy group)、胺基(amine group)、环氧基(epoxy group)、羟基(hydroxy group)和双键(double bond)中的一种或几种的组合。该第一交联剂为含有两个以上交联反应性官能基的芳香族化合物或脂肪族化合物,该第一交联剂的交联反应性官能基包含羧基(carboxy group)、酸酐(anhydride group)、胺基(amine group)、羟基、环氧基(epoxy group)、异氰酸基(isocyanate)和双键(double bond)中的一种或几种的组合。According to the present invention, the high reflective polymer composite material layer includes a first reactive functional group resin and a first crosslinking agent. The reactive functional groups of the first resin with reactive functional groups include carboxy groups, amine groups, epoxy groups, hydroxyl groups and double bonds. one or a combination of several. The first crosslinking agent is an aromatic compound or aliphatic compound containing two or more crosslinking reactive functional groups, and the crosslinking reactive functional groups of the first crosslinking agent include carboxy group, anhydride group ), amine group (amine group), hydroxyl group, epoxy group (epoxy group), isocyanate group (isocyanate) and double bond (double bond) in one or a combination of several.

依据本发明,该粘着层包含一第二具反应性官能基树脂及一第二交联剂,该第二具反应性官能基树脂的反应性官能基包含羧基、胺基、环氧基和羟基中的一种或几种的组合。该第二交联剂为含有两个以上交联反应性官能基的芳香族化合物或脂肪族化合物,该第二交联剂的交联反应性官能基包含羧基、酸酐、胺基、羟基、环氧基和异氰酸基中的一种或几种的组合。According to the present invention, the adhesive layer includes a second resin with reactive functional groups and a second crosslinking agent, and the reactive functional groups of the second resin with reactive functional groups include carboxyl groups, amine groups, epoxy groups and hydroxyl groups one or a combination of several. The second crosslinking agent is an aromatic compound or aliphatic compound containing two or more crosslinking reactive functional groups, and the crosslinking reactive functional groups of the second crosslinking agent include carboxyl, acid anhydride, amine, hydroxyl, ring One or more combinations of oxygen and isocyanate groups.

优选地,该耐高温高分子膜包含聚苯硫醚(polyphenylene sulfide)、聚萘二甲酸乙二醇酯(polyethylene naphthalate)和聚醚醚酮(poly(ether ether ketone))中的一种或几种的组合。Preferably, the high temperature resistant polymer film contains one or more of polyphenylene sulfide (polyphenylene sulfide), polyethylene naphthalate (polyethylene naphthalate) and polyether ether ketone (poly(ether ether ketone)). combination of species.

依据本发明,该具耐高温性及高反射率的印刷电路板用覆盖保护胶片可包含有一离型层,该离型层设于该粘着层远离该耐高温高分子膜的一侧面上,该离型层包含塑胶离型膜或离型纸等离型材,但不以此为限。According to the present invention, the covering protective film for printed circuit boards with high temperature resistance and high reflectivity may include a release layer, the release layer is arranged on the side of the adhesive layer away from the high temperature resistant polymer film, the The release layer includes release materials such as plastic release film or release paper, but is not limited thereto.

依据本发明,该具耐高温性及高反射率的印刷电路板用覆盖保护胶片可同时应用于硬式电路板及软式电路板。According to the present invention, the covering protective film for printed circuit boards with high temperature resistance and high reflectivity can be applied to rigid circuit boards and flexible circuit boards at the same time.

附图说明Description of drawings

图1为本发明的实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的剖面侧视示意图。FIG. 1 is a cross-sectional schematic side view of a cover protection film for a printed circuit board with high temperature resistance and high reflectivity according to Embodiment 1 of the present invention.

图2为本发明的实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片贴合于印刷电路板上的剖面侧视示意图。FIG. 2 is a cross-sectional side view of the high-temperature-resistant and high-reflectivity printed circuit board cover protection film attached to the printed circuit board according to Embodiment 1 of the present invention.

图3为本发明的实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片进行表面粘着工艺的部分剖面侧视示意图。FIG. 3 is a partial cross-sectional side view of the surface-adhesive process of the cover protection film for the printed circuit board with high temperature resistance and high reflectivity according to Embodiment 1 of the present invention.

图4为本发明的实施例4至7的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射光谱图。图中分别以符号“■”标示实施例4、符号“●”标示实施例5、 符号“▲”标示实施例6、符号“▼”标示实施例7。FIG. 4 is a reflectance spectrum diagram of the cover protection film for printed circuit boards with high temperature resistance and high reflectivity according to Examples 4 to 7 of the present invention. In the figure, the symbol "■" indicates the embodiment 4, the symbol "●" indicates the embodiment 5, the symbol "▲" indicates the embodiment 6, and the symbol "▼" indicates the embodiment 7.

图5为本发明的实施例4至6及实施例8至11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的耐高温高分子膜的吸收光谱图。图中分别以符号“●”标示使用50微米PET的实施例8、符号“■”标示使用125微米PET的实施例9、符号“◆”标示使用50微米PPS的实施例10、符号“▲”标示使用12.5微米polyimide的实施例4至6、符号“▼”标示使用12.5微米PEEK的实施例11。5 is an absorption spectrum diagram of a high temperature resistant polymer film covered with a protective film for a printed circuit board with high temperature resistance and high reflectivity according to embodiments 4 to 6 and embodiments 8 to 11 of the present invention. In the figure, the symbol "●" indicates Example 8 using 50 micron PET, the symbol "■" indicates Example 9 using 125 micron PET, the symbol "◆" indicates Example 10 using 50 micron PPS, and the symbol "▲" Examples 4 to 6 that use 12.5 micron polyimide are marked, and the symbol "▼" marks Example 11 that uses 12.5 micron PEEK.

图6为本发明的实施例6及实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的耐高温高分子膜的反射光谱图。图中以符号“■”标示实施例11并以符号“▲”标示实施例6。6 is a reflectance spectrum diagram of a high temperature resistant polymer film covering a protective film for a printed circuit board with high temperature resistance and high reflectivity according to Embodiment 6 and Embodiment 11 of the present invention. In the figure, the embodiment 11 is marked with the symbol "■" and the embodiment 6 is marked with the symbol "▲".

图7为本发明的实施例8至10的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的耐高温高分子膜的反射光谱图。图中分别以符号“■”标示实施例10、符号“▲”标示实施例8、符号“●”标示实施例9。7 is a reflectance spectrum diagram of a high temperature resistant polymer film covered with a protective film for a printed circuit board with high temperature resistance and high reflectivity according to Examples 8 to 10 of the present invention. In the figure, the symbol "■" indicates the embodiment 10, the symbol "▲" indicates the embodiment 8, and the symbol "●" indicates the embodiment 9.

图8为本发明的对比例1的具有反射油墨层的印刷电路板的部分剖面侧视示意图。FIG. 8 is a partial cross-sectional side view of a printed circuit board with a reflective ink layer according to Comparative Example 1 of the present invention.

图9为本发明的对比例1及2的具有反射油墨层的印刷电路板的反射光谱图。图中分别以符号“▲”标示进行耐热性检测前对比例1、符号“▼”标示进行耐热性检测后的对比例1、符号“■”标示进行耐热性检测前的对比例2、符号“●”标示进行耐热性检测后的对比例2。9 is a reflectance spectrum diagram of printed circuit boards with reflective ink layers in Comparative Examples 1 and 2 of the present invention. In the figure, the symbol "▲" indicates comparative example 1 before heat resistance test, the symbol "▼" indicates comparative example 1 after heat resistance test, and the symbol "■" indicates comparative example 2 before heat resistance test , The symbol "●" indicates the comparative example 2 after the heat resistance test was carried out.

图10为现有技术的具有反射油墨层的印刷电路板的部分剖面侧视示意图。FIG. 10 is a schematic partial cross-sectional side view of a printed circuit board with a reflective ink layer in the prior art.

主要附图符号说明Explanation of main reference symbols

10 印刷电路板用覆盖保护胶片10 Cover protection film for printed circuit boards

11 耐高温高分子膜11 High temperature resistant polymer film

12 高反射高分子复合材料层12 layers of highly reflective polymer composite material

13 粘着层13 Adhesive layer

10A 印刷电路板用覆盖保护胶片10A Overlay protection film for printed circuit boards

11A 耐高温高分子膜11A High temperature resistant polymer film

12A 高反射高分子复合材料层12A highly reflective polymer composite layer

13A 粘着层13A Adhesive layer

20 印刷电路板20 printed circuit board

30 第一样品30 first sample

30A 第一样品30A first sample

20A 印刷电路板20A PCB

40A 光源元件40A light source element

50 印刷电路板50 printed circuit boards

60 反射油墨层60 layers of reflective ink

70 光源元件70 light source element

81 反射油墨层81 reflective ink layer

82 印刷电路板82 printed circuit board

83 光源元件83 light source components

具体实施方式detailed description

为了对本发明的技术特征、目的和有益效果有更加清楚的理解,现对本发明的技术方案进行以下详细说明,但不能理解为对本发明的可实施范围的限定。In order to have a clearer understanding of the technical features, purpose and beneficial effects of the present invention, the technical solution of the present invention is described in detail below, but it should not be construed as limiting the scope of the present invention.

实施例1Example 1

请参阅图1所示,在本实施例中,本发明的具耐高温性及高反射率的印刷电路板用覆盖保护胶片10,包含有一耐高温高分子膜11、一高反射高分子复合材料层12、一粘着层13及一离型层。该耐高温高分子膜11具有相对应的两个侧面,该高反射高分子复合材料层12及该粘着层13分别设于该耐高温高分子膜11的两个侧面上,该离型层设于该粘着层13远离该耐高温高分子膜11的一侧面上。Please refer to shown in Fig. 1, in the present embodiment, the printed circuit board cover protective film 10 of the present invention with high temperature resistance and high reflectivity includes a high temperature resistant polymer film 11, a high reflective polymer composite material Layer 12, an adhesive layer 13 and a release layer. The high temperature resistant polymer film 11 has two corresponding sides, the high reflective polymer composite material layer 12 and the adhesive layer 13 are respectively arranged on the two sides of the high temperature resistant polymer film 11, and the release layer is provided On the side of the adhesive layer 13 away from the high temperature resistant polymer film 11 .

在本实施例中,所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片10的制备方法,具体步骤包含:In this embodiment, the preparation method of the covering protective film 10 for printed circuit boards with high temperature resistance and high reflectivity, the specific steps include:

提供该耐高温高分子膜11;Provide the high temperature resistant polymer film 11;

设置该高反射高分子复合材料层12于该耐高温高分子膜11的一侧面上,具体步骤包含:先将第一具反应性官能基树脂、第一交联剂及催化剂混合形成第一混合溶液;将第一反光色料通过物理分散技术分散于该第一混合溶液中而形成预高反射高分子复合材料溶液;通过表面涂膜技术将该预高反射高分子复合材料溶液覆盖于该耐高温高分子薄膜11的一侧面上形成预高反射高分子复合材料层12;对该预高反射高分子复合材料层加热,使得该第一具反应性官能基树脂及该第一交联剂进行交联反应而固化,形成所述高反射高分子复合材料层12;The high-reflection polymer composite material layer 12 is disposed on one side of the high-temperature-resistant polymer film 11. The specific steps include: first mixing the first resin with reactive functional groups, the first cross-linking agent and the catalyst to form a first mixed solution; the first reflective colorant is dispersed in the first mixed solution by physical dispersion technology to form a pre-high reflective polymer composite solution; the pre-high reflective polymer composite solution is covered on the resistant by surface coating technology A pre-high reflective polymer composite material layer 12 is formed on one side of the high temperature polymer film 11; the pre-high reflective polymer composite material layer is heated, so that the first reactive functional group resin and the first crosslinking agent are Curing by crosslinking reaction to form the high reflective polymer composite material layer 12;

设置该粘着层13于该耐高温高分子膜11远离该高反射高分子复合材料层12的一侧面上,具体步骤包含:先将第二具反应性官能基树脂及第二交联剂混合形成第二混合溶液;将第二反光色料通过物理分散技术分散于该第二混合溶液中而形成粘着液;通过表面涂膜技术将该粘着液覆盖于该耐高温高分子薄膜的一侧面上以形成该粘着层13;以及The adhesive layer 13 is disposed on the side of the high-temperature-resistant polymer film 11 away from the high-reflection polymer composite material layer 12. The specific steps include: first mixing the second resin with reactive functional groups and the second cross-linking agent to form The second mixed solution; the second reflective coloring material is dispersed in the second mixed solution by physical dispersion technology to form a viscous liquid; the viscous liquid is covered on one side of the high temperature resistant polymer film by surface coating technology to forming the adhesive layer 13; and

贴附该离型层于该粘着层13远离该耐高温高分子膜11的一侧面上;Attaching the release layer on the side of the adhesive layer 13 away from the high temperature resistant polymer film 11;

其中,该耐高温高分子膜11为聚酰亚胺(polyimide)膜,其厚度为12.5微米,且其熔点大于260℃。该第一具反应性官能基树脂为具羟基的聚酯-聚醇树脂共聚物(polyester-polyol copolymer)。该第一交联剂为聚异氰酸酯(HDI polyisocyanate),该第一反光色料(reflected pigment)为折射率(reflection index)大于1的二氧化钛(TiO2)粉体,该高反射高分子复合材料层12的厚度为20微米,该高反射高分子复合材料层12中所含有的该二氧化钛粉体为20体积百分比(vol%)。该第二具反应性官能基树脂为具环氧基(epoxy group)的环氧树脂,该第二交联剂为具有两个胺基(amine group)的双胺(diamine),该第二反光色料为折射率大于1的碳酸钙(calcium carbonate)粉体,该粘着层13可采用约25微米的厚度,在相关工艺中可接受正负2微米的差距在23微米至27微米的厚度。本实施例中所采用该粘着层13的厚度为25微米,该粘着层13中所含有的该碳酸钙粉体为10体积百分比,该离形层可为塑胶离型膜或离型纸等离型材。在本实施例中采用离型纸作为该离形层。Wherein, the high temperature-resistant polymer film 11 is a polyimide film with a thickness of 12.5 microns and a melting point greater than 260°C. The first resin with reactive functional groups is a polyester-polyol copolymer with hydroxyl groups. The first crosslinking agent is polyisocyanate (HDI polyisocyanate), the first reflective pigment (reflected pigment) is titanium dioxide (TiO 2 ) powder with a refractive index greater than 1, and the high reflective polymer composite material layer The thickness of 12 is 20 microns, and the titanium dioxide powder contained in the high reflective polymer composite material layer 12 is 20 volume percent (vol%). The second resin with reactive functional group is epoxy resin with epoxy group, the second crosslinking agent is diamine with two amine groups, and the second reflective The colorant is calcium carbonate powder with a refractive index greater than 1. The thickness of the adhesive layer 13 can be about 25 microns, and a thickness of 23 microns to 27 microns with a difference of plus or minus 2 microns is acceptable in related processes. The thickness of the adhesive layer 13 used in the present embodiment is 25 microns, the calcium carbonate powder contained in the adhesive layer 13 is 10 volume percent, and the release layer can be a plastic release film or a release paper etc. profiles. In this embodiment, release paper is used as the release layer.

请参阅图1及图2所示,在本实施例中,将所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片10的离型层剥离,得到一剥离离型层后的具耐高温性及高反射率的印刷电路板用覆盖保护胶片10,再将该剥离离型层后的具耐高温性及高反射率的印刷电路板用覆盖保护胶片10经压合工艺后,透过该粘着层13贴附于一印刷电路板20的一侧面上,再进行热固化工艺以令该粘着层13进行交联反应而固化,得到第一样品30,以该第一样品30进行反射率检测。Please refer to Fig. 1 and shown in Fig. 2, in the present embodiment, the release layer of the printed circuit board with high temperature resistance and high reflectivity covering protective film 10 is peeled off to obtain a peeled off release layer. The covering protective film 10 for printed circuit boards with high temperature resistance and high reflectivity, and then the covering protective film 10 for printed circuit boards with high temperature resistance and high reflectivity after peeling off the release layer, after the lamination process, Attach the adhesive layer 13 to one side of a printed circuit board 20, and then perform a thermal curing process to allow the adhesive layer 13 to undergo a cross-linking reaction and cure to obtain a first sample 30. With the first sample 30 to perform reflectance detection.

在本实施例中,所述的反射率检测,其所使用的设备为日立U-4100光谱仪(Hitachi U-4100spectrometer),所使用的标准试片为日立原厂硫酸钡标准片(反射率为100%),反射率检测值为在波长为550纳米下,量测所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片10整体的反射率相对于标准片的相对比较值。测试结果如表1中所示。In the present embodiment, described reflectance detects, and its used equipment is Hitachi U-4100 spectrometer (Hitachi U-4100spectrometer), and the standard test piece used is Hitachi original barium sulfate standard sheet (reflectivity 100 %), the reflectance detection value is at a wavelength of 550 nanometers, measuring the relative comparison value of the overall reflectivity of the printed circuit board cover protection film 10 with high temperature resistance and high reflectivity relative to the standard sheet. The test results are shown in Table 1.

实施例2Example 2

本实施例概同于实施例1,其区别在于:该高反射高分子复合材料层12中所含有作为第一反光色料的二氧化钛粉体为30体积百分比。本实施例的测试结果如表1所示。This embodiment is similar to the embodiment 1, the difference is that: the titanium dioxide powder contained in the high reflective polymer composite material layer 12 as the first reflective coloring material is 30% by volume. The test results of this embodiment are shown in Table 1.

实施例3Example 3

本实施例概同于实施例1,其区别在于:该高反射高分子复合材料层12中所含有作为第一反光色料的二氧化钛粉体为60体积百分比。本实施例的测试结果如表1所示。This embodiment is similar to the embodiment 1, the difference is that: the titanium dioxide powder contained in the high reflective polymer composite material layer 12 as the first reflective coloring material is 60% by volume. The test results of this embodiment are shown in Table 1.

表1实施例1至实施例3的测试结果The test result of table 1 embodiment 1 to embodiment 3

实施例4Example 4

请参阅图3所示,本实施例概同于实施例1,其区别在于:所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片10A的高反射高分子复合材料层12A的厚度为13微米。在本实施例中,所述的反射率检测,是在波长介于400至700纳米下,量测所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片整体的反射率。Please refer to shown in Fig. 3, present embodiment is generally the same as embodiment 1, and its difference is: the high reflective polymer composite material layer 12A of the printed circuit board of described tool high temperature resistance and high reflectivity covering protective film 10A The thickness is 13 microns. In this embodiment, the reflectance detection is to measure the overall reflectance of the cover protection film for printed circuit boards with high temperature resistance and high reflectivity at a wavelength of 400 to 700 nanometers.

此外,请参阅图3所示,在本实施例中,另进行耐高温检测,其令第一样品30A进行表面粘着工艺,以使光源元件40A与该粘着层13A位于该印刷电路板20A的同一侧面上。所述的表面粘着工艺,其工艺温度为300℃,其工艺时间为30秒。In addition, as shown in FIG. 3 , in this embodiment, a high temperature resistance test is additionally carried out, which makes the first sample 30A undergo a surface adhesion process, so that the light source element 40A and the adhesive layer 13A are located on the printed circuit board 20A. on the same side. In the surface adhesion process, the process temperature is 300° C., and the process time is 30 seconds.

另外,在本实施例中,另对该耐高温高分子膜11A以日立U-4100光谱仪(HitachiU-4100spectrometer)进行吸收率量测,本实施例的耐高温高分子膜11A为聚酰亚胺膜。In addition, in this embodiment, the high temperature resistant polymer film 11A is also measured with a Hitachi U-4100 spectrometer (Hitachi U-4100spectrometer), and the high temperature resistant polymer film 11A of this embodiment is a polyimide film .

另外,在本实施例中,依据日本工业标准(Japanese Industry Standard,JIS)的JIS-K7105规范,测试具耐高温性及高反射率的印刷电路板用覆盖保护胶片10A整体 经300℃耐高温检测后是否黄变,且依据CIE 1976(Lab)的NBS色差单位与感觉色差关系,ΔE值小于1.5为极微至轻微感觉色差。In addition, in this embodiment, according to the JIS-K7105 specification of the Japanese Industry Standard (JIS), the cover protection film 10A for printed circuit boards with high temperature resistance and high reflectivity is tested as a whole through a high temperature resistance test at 300°C. Whether it turns yellow afterward, and according to the relationship between the NBS color difference unit and the sensory color difference of CIE 1976 (Lab), the ΔE value is less than 1.5, which means very slight to slight sensory color difference.

本实施例的测试结果如表2、图4及图5所示。The test results of this embodiment are shown in Table 2, Figure 4 and Figure 5 .

实施例5Example 5

本实施例概同于实施例4,其区别在于:该高反射高分子复合材料层的厚度为20微米。本实施例的测试结果如表2、图4及图5所示。This embodiment is similar to Embodiment 4, the difference is that the thickness of the high reflective polymer composite material layer is 20 microns. The test results of this embodiment are shown in Table 2, Figure 4 and Figure 5 .

实施例6Example 6

本实施例概同于实施例4,其区别在于:该高反射高分子复合材料层的厚度为29微米。本实施例的测试结果如表2及图4至6所示。This embodiment is similar to Embodiment 4, the difference is that the thickness of the high reflective polymer composite material layer is 29 microns. The test results of this embodiment are shown in Table 2 and FIGS. 4 to 6 .

实施例7Example 7

本实施例概同于实施例4,其区别在于:该高反射高分子复合材料层的厚度为32微米。本实施例的测试结果如表2、图4及图5所示。This embodiment is similar to Embodiment 4, the difference is that the thickness of the high reflective polymer composite material layer is 32 microns. The test results of this embodiment are shown in Table 2, Figure 4 and Figure 5 .

表2实施例4至实施例7的测试结果The test result of table 2 embodiment 4 to embodiment 7

实施例8Example 8

本实施例概同于实施例4,其区别在于:该耐高温高分子膜为聚对苯二甲酸乙二醇酯(polyethylene terephthalate,PET)膜,该聚对苯二甲酸乙二醇酯膜的厚度为50微米,且该高反射高分子复合材料层的厚度为29微米。本实施例的测试结果如表3、图5及图7所示。This embodiment is generally the same as Embodiment 4, and the difference is that the high-temperature-resistant polymer film is a polyethylene terephthalate (PET) film, and the polyethylene terephthalate film The thickness is 50 microns, and the thickness of the high reflective polymer composite material layer is 29 microns. The test results of this embodiment are shown in Table 3, Fig. 5 and Fig. 7 .

实施例9Example 9

本实施例概同于实施例8,其区别在于:该作为耐高温高分子膜的聚对苯二甲酸乙二醇酯膜的厚度为125微米。本实施例的测试结果如表3、图5及图7所示。This embodiment is generally the same as Embodiment 8, the difference being that the thickness of the polyethylene terephthalate film as a high temperature resistant polymer film is 125 microns. The test results of this embodiment are shown in Table 3, Fig. 5 and Fig. 7 .

表3实施例8及实施例9的测试结果The test result of table 3 embodiment 8 and embodiment 9

实施例10Example 10

本实施例概同于实施例1,其区别在于:该耐高温高分子膜为聚苯硫醚(poly(p-phenylene sulfide),PPS),该聚苯硫醚膜的厚度为50微米,且其熔点大于260℃。该高反射高分子复合材料层的厚度为29微米。该粘着层以该第二混合溶液直接作为该粘着液,并通过湿式涂布方式将该粘着液覆盖于该耐高温高分子薄膜的一侧面上而成形,该粘着层中所含有的第二反光色料为0体积百分比,亦即该粘着层不含第二反 光色料。This embodiment is generally the same as Embodiment 1, the difference is that the high temperature resistant polymer film is poly(p-phenylene sulfide), PPS, and the thickness of the polyphenylene sulfide film is 50 microns, and Its melting point is greater than 260°C. The thickness of the high reflective polymer composite material layer is 29 microns. The adhesive layer uses the second mixed solution directly as the adhesive liquid, and is formed by covering the adhesive liquid on one side of the high-temperature-resistant polymer film by wet coating. The second light-reflecting layer contained in the adhesive layer The coloring material is 0 volume percent, that is, the adhesive layer does not contain the second reflective coloring material.

在本实施例中,所述的反射率检测,在400至700纳米的波段下,量测所述具耐高温性及高反射率的印刷电路板用覆盖保护胶片整体的反射率。且本实施例也对该聚苯硫醚膜进行所述的反射率检测。此外,在本实施例中,进行如实施例4所述的耐高温检测,还对该聚苯硫醚膜进行如实施例4所述的吸收率检测。本实施例的测试结果如表4、图5及图7所示。In this embodiment, the reflectance detection is to measure the overall reflectance of the covering protection film for printed circuit boards with high temperature resistance and high reflectivity in the wave band of 400 to 700 nanometers. In addition, in this embodiment, the reflectance detection described above is also performed on the polyphenylene sulfide film. In addition, in this embodiment, the high temperature resistance test as described in Example 4 is carried out, and the absorptivity test as described in Example 4 is also carried out on the polyphenylene sulfide film. The test results of this embodiment are shown in Table 4, Fig. 5 and Fig. 7 .

表4实施例10及实施例11的测试结果The test result of table 4 embodiment 10 and embodiment 11

实施例11Example 11

本实施例概同于实施例10,其区别在于:该耐高温高分子膜为聚醚醚酮(poly(ether ether ketone),PEEK)膜,该聚醚醚酮膜的熔点大于300℃。本实施例的测试结果如表4、图5及图6所示。This embodiment is similar to that of Embodiment 10, except that the high-temperature-resistant polymer film is a poly(ether ether ketone) (PEEK) film, and the melting point of the polyether ether ketone film is greater than 300°C. The test results of this embodiment are shown in Table 4, Fig. 5 and Fig. 6 .

对比例1Comparative example 1

请参阅图8所示,在本对比例提供一具有反射油墨层60的印刷电路板50,在一印刷电路板50的一侧面上以油墨(冠品材料科技股份有限公司制造,型号T-75)印刷成形一反射油墨层60。Please refer to shown in Figure 8, in this comparative example, a printed circuit board 50 with a reflective ink layer 60 is provided, and ink (manufactured by Guanpin Material Technology Co., Ltd., model T-75) is used on one side of a printed circuit board 50 ) printing and forming a reflective ink layer 60 .

在本对比例中,令该具有反射油墨层60的印刷电路板50直接进行反射率检测。再令该具有反射油墨层60的印刷电路板50进行耐高温检测:透过表面粘着工艺,使 光源元件70与该反射油墨层60位于该印刷电路板50的同一侧面上(如图8所示)。而在该具有反射油墨层60的印刷电路板50进行耐高温检测之后,再次进行反射率检测,并以JIS-K7105检测是否黄变。In this comparative example, the printed circuit board 50 with the reflective ink layer 60 is directly tested for reflectance. Then make the printed circuit board 50 with the reflective ink layer 60 carry out high temperature resistance detection: through the surface adhesion process, the light source element 70 and the reflective ink layer 60 are positioned on the same side of the printed circuit board 50 (as shown in Figure 8 ). After the printed circuit board 50 with the reflective ink layer 60 is tested for high temperature resistance, the reflectance is tested again, and the yellowing is detected according to JIS-K7105.

在本对比例中,所述的反射率检测,其入射光为可见光,其波长介于415至700纳米。所述的表面粘着工艺,其工艺温度为288℃,其工艺时间为10秒。本对比例的测试结果如图9及表5所示。In this comparative example, for the reflectance detection, the incident light is visible light with a wavelength between 415 and 700 nanometers. In the surface adhesion process, the process temperature is 288° C., and the process time is 10 seconds. The test results of this comparative example are shown in Figure 9 and Table 5.

表5对比例1及对比例2的测试结果The test result of table 5 comparative example 1 and comparative example 2

对比例2Comparative example 2

本对比例与对比例1的区别在于:所使用的油墨为中国台湾太阳油墨股份有限公司制造,型号为PSR-4000。本对比例的测试结果如图9及表5所示。The difference between this comparative example and comparative example 1 is that the ink used is manufactured by China Taiwan Sun Ink Co., Ltd., and the model is PSR-4000. The test results of this comparative example are shown in Figure 9 and Table 5.

如图9所示,在进行耐高温检测前,在415至700纳米的波段下,对比例1及对比例2的最高反射率皆为80%以下。而在耐高温检测后,在415至700纳米的波段下,对比例1及对比例2的最高反射率皆降至77%以下。如表5所示,在经耐高温检测后,对比例1及对比例2的ΔE值分别为3.8及2.6,皆大于1.5,则对比例1及对比例2产生黄变;推知,经耐高温检测后,由于对比例1及对比例2产生黄变而使其反射率降低。As shown in FIG. 9 , before the high temperature test, the highest reflectances of Comparative Example 1 and Comparative Example 2 are both below 80% in the wave band from 415 to 700 nanometers. However, after the high temperature test, the highest reflectances of Comparative Example 1 and Comparative Example 2 both dropped below 77% in the wave band from 415 to 700 nanometers. As shown in Table 5, after the high temperature test, the ΔE values of Comparative Example 1 and Comparative Example 2 were 3.8 and 2.6 respectively, both of which were greater than 1.5, and then Comparative Example 1 and Comparative Example 2 produced yellowing; After the test, the reflectance of Comparative Example 1 and Comparative Example 2 decreased due to yellowing.

由表1至表5、图4至图7及图9可知,当波长为550纳米时,实施例1至实施例3及实施例5至实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率皆达到89%以上,而对比例1及对比例2的具有反射油墨层的印刷电路板反射率低于80%,则实施例1至实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有较对比例1及对比例2的具有反射油墨层的印刷电路板为佳的反射率。经耐高温检测后,实施例4至实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的ΔE值均小于1.5,则均未产生黄变。且对比例1及对比例2的反射油墨层的厚度的公差为±15微米,而实施例1至实施例11的高反射高分子复合材料层的厚度的公差为±2微米,显示对比例1及对比例2的反射油墨层的厚度均匀性较实施例1至实施例11为差,则实施例1至实施例11具有较对比例1及对比例2为 佳的厚度均匀性。From Table 1 to Table 5, Figure 4 to Figure 7 and Figure 9, it can be seen that when the wavelength is 550 nanometers, the printing materials with high temperature resistance and high reflectivity of Embodiment 1 to Embodiment 3 and Embodiment 5 to Embodiment 11 The reflectivity of the covering protection film for the circuit board all reaches more than 89%, and the reflectivity of the printed circuit board with the reflective ink layer of comparative example 1 and comparative example 2 is lower than 80%, then the tool resistance of embodiment 1 to embodiment 11 The cover protection film for printed circuit boards with high temperature resistance and high reflectivity has better reflectivity than the printed circuit boards with reflective ink layer in Comparative Example 1 and Comparative Example 2. After the high-temperature test, the ΔE values of the high-temperature-resistant and high-reflectivity cover protection films for printed circuit boards in Examples 4 to 11 were all less than 1.5, and no yellowing occurred. And the tolerance of the thickness of the reflective ink layer of Comparative Example 1 and Comparative Example 2 is ± 15 microns, while the tolerance of the thickness of the high reflective polymer composite material layer of Examples 1 to 11 is ± 2 microns, showing Comparative Example 1 And the thickness uniformity of the reflective ink layer of Comparative Example 2 is worse than that of Examples 1 to 11, and then Examples 1 to 11 have better thickness uniformity than Comparative Examples 1 and 2.

如表1所示,实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片,其高反射高分子复合材料层所含有的二氧化钛粉体的含量为20体积百分比,且入射光的波长为550纳米时,实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片10对于此波段的反射率为89%以上,而实施例2及实施例3的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的高反射高分子复合材料层所含有的二氧化钛粉体的含量均高于实施例1,分别为30及60体积百分比,但当入射光的波长为550纳米时,实施例2及实施例3的具耐高温性及高反射率的印刷电路板用覆盖保护胶片10的反射率与实施例1的具耐高温性及高反射率的印刷电路板用覆盖保护胶片相当接近,分别为90.2%及90.5%以上;由此可知,高反射高分子复合材料层所含有的二氧化钛粉体的含量为20体积百分比时,反射率即能达到89%以上。As shown in Table 1, the covering protective film for printed circuit boards with high temperature resistance and high reflectivity of embodiment 1, the content of titanium dioxide powder contained in its high reflective polymer composite material layer is 20 volume percent, and incident When the wavelength of light is 550 nanometers, the reflectivity of the printed circuit board cover protection film 10 with high temperature resistance and high reflectivity of embodiment 1 for this waveband is more than 89%, while the reflectivity of embodiment 2 and embodiment 3 has The content of titanium dioxide powder contained in the high-reflection polymer composite material layer covered with protective film for printed circuit boards with high temperature resistance and high reflectivity is all higher than that of Example 1, which are 30 and 60 volume percent respectively, but when the incident light When the wavelength is 550 nanometers, the reflectivity of the cover protective film 10 of the printed circuit board with high temperature resistance and high reflectivity of embodiment 2 and embodiment 3 is the same as that of the printed circuit board with high temperature resistance and high reflectivity of embodiment 1. The protective films used for circuit boards are quite close, being 90.2% and above 90.5% respectively; it can be seen that when the content of titanium dioxide powder contained in the high-reflection polymer composite material layer is 20% by volume, the reflectivity can reach 89%. above.

如表2及图4所示,在波长介于420至495纳米的波段下,实施例4的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有89%以上的反射率;在420至600纳米的波段下,实施例5的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有89%以上的反射率;在420至700纳米的波段,实施例6的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有89%以上的反射率;在415至700纳米的波段,实施例7的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有89%以上的反射率,而实施例4至7的高反射高分子复合材料层的厚度分别为13微米、20微米、29微米及32微米,且实施例4至7的耐高温高分子膜皆为厚度为12.5微米的聚酰亚胺膜。As shown in Table 2 and Figure 4, under the wavelength band between 420 and 495 nanometers, the cover protection film with high temperature resistance and high reflectivity of embodiment 4 has a reflectivity of more than 89%; Under the wave band of 420 to 600 nanometers, the covering protective film for printed circuit boards with high temperature resistance and high reflectivity of embodiment 5 has a reflectivity of more than 89%; The high-temperature and high-reflectivity covering protective film for printed circuit boards has a reflectivity of more than 89%; in the wave band from 415 to 700 nanometers, the high-temperature-resistant and high-reflective covering protective film for printed circuit boards of embodiment 7 It has a reflectivity of more than 89%, and the thicknesses of the high reflective polymer composite material layers of Examples 4 to 7 are respectively 13 microns, 20 microns, 29 microns and 32 microns, and the high temperature resistant polymer films of Examples 4 to 7 Both are polyimide films with a thickness of 12.5 microns.

如图5所示,当入射光的波长介于415至520纳米的波段时,12.5微米厚的聚酰亚胺膜的吸收率为35%以上。As shown in FIG. 5 , when the wavelength of the incident light is between 415 and 520 nanometers, the absorptivity of the polyimide film with a thickness of 12.5 microns is above 35%.

由此可知,在420至495纳米的波段下,一含有12.5微米厚的聚酰亚胺膜的具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有89%以上的反射率的条件为:高反射高分子复合材料层的厚度需为30微米以上。进一步可推知,当一具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有的高反射高分子复合材料层的厚度为30微米以下时,在415至700的波段下,该具耐高温性及高反射率的印刷电路板用覆盖保护胶片具有具有89%以上的反射率的条件为:耐高温高分子膜的吸收率需为35%以下。It can be seen that, under the wavelength band of 420 to 495 nanometers, a polyimide film with a thickness of 12.5 microns and high temperature resistance and a high reflectivity cover protection film for printed circuit boards has a reflectivity of more than 89%. For: the thickness of the high reflective polymer composite material layer must be more than 30 microns. It can be further deduced that when the thickness of the high-reflection polymer composite material layer of a high-temperature-resistant and high-reflectivity cover protective film for printed circuit boards is less than 30 microns, under the wave band from 415 to 700, the resistant The high-temperature and high-reflectivity cover protection film for printed circuit boards has a reflectivity of 89% or more on the condition that the absorptivity of the high-temperature-resistant polymer film must be 35% or less.

如表3、图5及图7所示,实施例8的耐高温高分子膜的厚度为50微米,实施 例9的耐高温高分子膜的厚度为125微米。而在330至700的波段下,实施例8的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的耐高温高分子膜的吸收率为35%以下,实施例9的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的耐高温高分子膜的吸收率也为35%以下。且在330至700的波段下,实施例8及实施例9的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率均为89%以上;显示耐高温高分子膜的厚度差异不会影响实施例8及实施例9的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率。As shown in Table 3, Figure 5 and Figure 7, the thickness of the high temperature resistant polymer film in Example 8 is 50 microns, and the thickness of the high temperature resistant polymer film in Example 9 is 125 microns. And under the wave band of 330 to 700, the absorptivity of the high-temperature-resistant polymer film covering the protective film of the printed circuit board with high-temperature resistance and high reflectivity of embodiment 8 is below 35%, and the high-temperature-resistant high-molecular film of embodiment 9 The absorptivity of the high-temperature-resistant polymer film covering the protective film for printed circuit boards with anti-corrosion properties and high reflectivity is also 35% or less. And under the wave band of 330 to 700, the reflectivity of the cover protection film with high temperature resistance and high reflectivity of the printed circuit board of embodiment 8 and embodiment 9 is more than 89%; the thickness of the high temperature resistant polymer film is shown The difference will not affect the reflectivity of the high-temperature-resistant and high-reflectivity printed circuit board cover protection film of embodiment 8 and embodiment 9.

请参阅表3、表4及图5所示,实施例8的耐高温高分子膜为50微米厚的聚对苯二甲酸乙二醇酯膜,实施例10的耐高温高分子膜为50微米厚的聚苯硫醚膜,在415至700纳米的波段下,两者的吸收率均小于35%。请参阅图7表3所示,在415至700纳米的波段下,实施例8及实施例10的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率皆为89%以上。在经耐热性检测(表面粘着,300℃/30秒)后,发现因实施例8的聚对苯二甲酸乙二醇酯膜耐温性不足而热胀冷缩过大,进而使高反射高分子复合材料层与聚对苯二甲酸乙二醇酯膜之间、聚对苯二甲酸乙二醇酯膜与粘着层之间或粘着层与印刷电路板之间剥离而产生脱层现象(de-lamination),而实施例10的聚苯硫醚膜则未发生脱层现象,经比较后得知,是由于聚对苯二甲酸乙二醇酯膜的熔点小于260℃,而聚苯硫醚膜的熔点大于260℃;此可证明,当耐高温高分子膜的熔点大于260℃时,具耐高温性及高反射率的印刷电路板用覆盖保护胶片能进行表面粘着工艺而不发生脱层现象。Please refer to table 3, table 4 and shown in Fig. 5, the high temperature resistant polymer film of embodiment 8 is the thick polyethylene terephthalate film of 50 microns, and the high temperature resistant polymer film of embodiment 10 is 50 microns Thick polyphenylene sulfide film, both have less than 35% absorption in the 415 to 700 nm band. Please refer to Figure 7 and Table 3, under the wave band of 415 to 700 nanometers, the reflectivity of the high temperature resistance and high reflectivity printed circuit board cover protection film of embodiment 8 and embodiment 10 is more than 89%. . After the heat resistance test (surface adhesion, 300°C/30 seconds), it was found that the polyethylene terephthalate film in Example 8 had insufficient temperature resistance and thermal expansion and contraction were too large, thereby causing high reflection Delamination occurs between the polymer composite layer and the polyethylene terephthalate film, between the polyethylene terephthalate film and the adhesive layer, or between the adhesive layer and the printed circuit board (de -lamination), and the polyphenylene sulfide film of Example 10 does not have delamination phenomenon. After comparison, it is known that the melting point of the polyethylene terephthalate film is less than 260 ° C, while the polyphenylene sulfide film The melting point of the film is greater than 260°C; this proves that when the melting point of the high-temperature resistant polymer film is greater than 260°C, the covering protective film for printed circuit boards with high temperature resistance and high reflectivity can carry out surface adhesion process without delamination Phenomenon.

请参阅表2及表4所示,实施例6的耐高温高分子膜为12.5微米的聚对苯二甲酸乙二醇酯膜,实施例11的耐高温高分子膜为12.5微米的聚醚醚酮膜,该聚对苯二甲酸乙二醇酯膜的熔点小于260℃,且该聚醚醚酮膜的熔点大于260℃。在经耐高温检测后,实施例6及实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片皆未发生脱层现象。然而,请参阅表2、图5及图6所示,在415至520纳米的波段下,实施例6的耐高温高分子膜的吸收率大于35%,且在415未满420纳米的波段下,实施例6的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率未达89%,即在415至700纳米的波段下,其反射率并非全然为89%以上;请参阅表4、图5及图6所示,在415至700纳米的波段下,实施例11的耐高温高分子膜的吸收率为35%以下,且实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片 的反射率均为89%以上。Please refer to table 2 and shown in table 4, the high temperature resistant polymer film of embodiment 6 is the polyethylene terephthalate film of 12.5 microns, and the high temperature resistant polymer film of embodiment 11 is the polyether ether of 12.5 microns For the ketone film, the melting point of the polyethylene terephthalate film is less than 260°C, and the melting point of the polyether ether ketone film is greater than 260°C. After the high temperature resistance test, no delamination occurred in the cover protective films for printed circuit boards with high temperature resistance and high reflectivity in Example 6 and Example 11. However, as shown in Table 2, Figure 5 and Figure 6, under the wave band of 415 to 520 nanometers, the absorption rate of the high temperature resistant polymer film of Example 6 is greater than 35%, and under the wave band of 415 to less than 420 nanometers , the reflectivity of the cover protection film with high temperature resistance and high reflectivity of the printed circuit board of embodiment 6 does not reach 89%, that is, under the wave band of 415 to 700 nanometers, its reflectivity is not completely more than 89%; please Referring to Table 4, Figure 5 and Figure 6, under the wave band of 415 to 700 nanometers, the absorptivity of the high temperature resistant polymer film of Example 11 is below 35%, and the high temperature resistant and high reflective film of Example 11 The reflectivity of the cover protective film for printed circuit boards is above 89%.

请参阅表1至表4所示,实施例1至8的粘着层皆含有10体积百分比的第二反光色料,实施例10及实施例11的粘着层则不含。以波长为550纳米为例,实施例1至实施例3及实施例5至实施例8的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率皆大于89%,实施例10及实施例11的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率也大于89%,显示实施例1至实施例3及实施例5至实施例8的反射率与实施例10及实施例11相当接近的反射率。因此,通过第二反光色料的使用,可增加本发明的具耐高温性及高反射率的印刷电路板用覆盖保护胶片的反射率。Please refer to Table 1 to Table 4, the adhesive layers of Examples 1 to 8 all contain 10 volume percent of the second reflective colorant, while the adhesive layers of Examples 10 and 11 do not. Taking the wavelength of 550 nanometers as an example, the reflectivity of the high temperature resistance and high reflectivity printed circuit board covering protection film of embodiment 1 to embodiment 3 and embodiment 5 to embodiment 8 is greater than 89%. 10 and Example 11 have high temperature resistance and high reflectivity printed circuit board cover protective film reflectivity is also greater than 89%, showing that the reflectivity and the reflectivity of embodiment 1 to embodiment 3 and embodiment 5 to embodiment 8 The reflectivity of Example 10 and Example 11 is quite close. Therefore, the use of the second reflective colorant can increase the reflectance of the cover protection film for printed circuit boards of the present invention with high temperature resistance and high reflectivity.

基于上述,经反射率检测及耐高温检测证实,相较于对比例1及对比例2,实施例1至实施例3及实施例5至实施例11均具有更佳的反射率及耐高温性;而通过实施例1至实施例3及实施例5至实施例11之间的比较后证实,通过熔点为260℃以上且在415至700纳米的波段下具有35%以下的吸收率的耐高温高分子膜及含有第一反光色料的高反射高分子复合材料层的使用,可以令本发明的具耐高温性及高反射率的印刷电路板用覆盖保护胶片,在波长为415至700纳米的波段下,具有89%以上的反射率、以及经表面粘着工艺(工艺温度为300℃,工艺时间为30秒)而不产生黄变及脱层现象的优点,则能达到增加电子产品的整体出光强度、减少电子产品的光源元件的功率并提升电子产品的光演色性。Based on the above, it is confirmed by reflectivity detection and high temperature resistance detection that compared with Comparative Example 1 and Comparative Example 2, Embodiment 1 to Embodiment 3 and Embodiment 5 to Embodiment 11 all have better reflectivity and high temperature resistance ; And confirmed by the comparison between Example 1 to Example 3 and Example 5 to Example 11, through the melting point is more than 260 ℃ and under the wave band of 415 to 700 nanometers has absorptivity below 35% high temperature resistance The use of the polymer film and the high-reflection polymer composite material layer containing the first reflective pigment can make the covering protective film for printed circuit boards with high temperature resistance and high reflectivity of the present invention, at a wavelength of 415 to 700 nanometers Under the wavelength band, it has the advantages of more than 89% reflectivity and the surface adhesion process (the process temperature is 300 ° C, the process time is 30 seconds) without yellowing and delamination, which can increase the overall quality of electronic products. Light intensity, reduce the power of light source components of electronic products and improve the light color rendering of electronic products.

Claims (16)

1. the use in printed circuit board covering protection film of a kind of tool heat-resisting quantity and high reflectance, wherein includes:
One fire resistant polymer film, its thickness are 12.5 to 125 microns, and fusing point is more than 260 DEG C, and there are two sides;
One high reflection polymer composite layer, is arranged on the one side of the fire resistant polymer film, and its thickness is 11 to 31 Micron, wherein comprising one first reflective colorant and one first tool reactive functional group resin, the refractive index of the first reflective colorant It is more than 1, the first tool reactive functional group resin is the polyester-polyalcohols resin copolymer for having hydroxyl;
One adhesion coating, its are arranged at another side of the fire resistant polymer film away from the high reflection polymer composite layer On, its thickness is 10 to 75 microns;
Wherein, it is more than 89% in the overall reflectance of the use in printed circuit board covering protection film of tool heat-resisting quantity and high reflectance Wave band, the absorbance of the fire resistant polymer thin film is less than 35%.
2. according to claim 1 tool heat-resisting quantity and high reflectance use in printed circuit board covering protection film, wherein, The adhesion coating includes one second reflective colorant.
3. according to claim 2 tool heat-resisting quantity and high reflectance use in printed circuit board covering protection film, wherein, The refractive index of the second reflective colorant is more than 1.
4. according to claim 1 tool heat-resisting quantity and high reflectance use in printed circuit board covering protection film, wherein, The fire resistant polymer film includes one the 3rd reflective colorant.
5. according to claim 4 tool heat-resisting quantity and high reflectance use in printed circuit board covering protection film, wherein, The refractive index of the 3rd reflective colorant is more than 1.
6. the use in printed circuit board of tool heat-resisting quantity according to any one of claim 1 to 5 and high reflectance is covered and is protected Shield film, wherein, the first reflective colorant accounts for 20 to 70 overall volume basis of the high reflection polymer composite layer Than.
7. tool heat-resisting quantity according to Claims 2 or 3 and the use in printed circuit board covering protection film of high reflectance, its In, the second reflective colorant accounts for 10 to 50 overall percents by volume of the adhesion coating.
8. tool heat-resisting quantity according to claim 4 or 5 and the use in printed circuit board covering protection film of high reflectance, its In, the 3rd reflective colorant accounts for 1 to 20 overall percent by volume of the fire resistant polymer film.
9. the use in printed circuit board of tool heat-resisting quantity according to any one of claim 1 to 5 and high reflectance is covered and is protected Shield film, wherein, the thickness of the high reflection polymer composite layer is 11 to 20 microns.
10. the use in printed circuit board of tool heat-resisting quantity according to any one of claim 1 to 5 and high reflectance is covered and is protected Shield film, wherein, the thickness of the adhesion coating is 10 to 35 microns.
The use in printed circuit board of 11. tool heat-resisting quantities according to any one of claim 1 to 5 and high reflectance is covered protects Shield film, wherein, the high reflection polymer composite layer include one first cross-linking agent, first cross-linking agent include containing The aromatic compound of two or more crosslinking reactivity functional group and the aliphatic containing two or more crosslinking reactivity functional group The combination of one or more in compound, the crosslinking reactivity functional group of first cross-linking agent include carboxyl, anhydride, amine The combination of one or more in base, hydroxyl, epoxy radicals, isocyanate group and double bond.
The use in printed circuit board of 12. tool heat-resisting quantities according to any one of claim 1 to 5 and high reflectance is covered protects Shield film, wherein, the adhesion coating includes one second tool reactive functional group resin, the second tool reactive functional group resin bag Contain an at least reactive functional group, the reactive functional group includes one or more in carboxyl, amido, epoxy radicals and hydroxyl Combination.
13. tool heat-resisting quantities according to claim 12 and the use in printed circuit board covering protection film of high reflectance, its In, the adhesion coating includes one second cross-linking agent, and second cross-linking agent is included containing two or more crosslinking reactivity functional group's The combination of one or more in aromatic compound and the aliphatic compound containing two or more crosslinking reactivity functional group, The crosslinking reactivity functional group of second cross-linking agent is included in carboxyl, anhydride, amido, hydroxyl, epoxy radicals and isocyanate group The combination of one or more.
The use in printed circuit board of 14. tool heat-resisting quantities according to any one of claim 1 to 5 and high reflectance is covered protects Shield film, wherein, the fire resistant polymer film includes polyphenylene sulfide and/or polyether-ether-ketone.
The use in printed circuit board of 15. tool heat-resisting quantities according to any one of claim 1 to 5 and high reflectance is covered protects Shield film, wherein, the fire resistant polymer film includes PEN.
The use in printed circuit board of 16. tool heat-resisting quantities according to any one of claim 1 to 5 and high reflectance is covered protects Shield film, wherein, in 415 to 700 nanometers of wave band, fire resistant polymer film absorption rate less than 35%, tool heat-resisting quantity and The overall reflectance of the use in printed circuit board covering protection film of high reflectance is more than 89%.
CN201410031886.6A 2014-01-23 2014-01-23 Cover protection film for printed circuit boards with high temperature resistance and high reflectivity Expired - Fee Related CN104804660B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101024756A (en) * 2006-02-21 2007-08-29 日东电工株式会社 Pressure-sensitive adhesive tape or sheet having light-reflective property and/or light-sheilding property, and liquid crystal display
TWM366860U (en) * 2009-06-25 2009-10-11 Asia Electronic Material Co Covering film for printed circuit board
CN102893417A (en) * 2010-03-23 2013-01-23 株式会社朝日橡胶 Silicone resin reflective substrate, manufacturing method for same, and base material composition used in reflective substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101024756A (en) * 2006-02-21 2007-08-29 日东电工株式会社 Pressure-sensitive adhesive tape or sheet having light-reflective property and/or light-sheilding property, and liquid crystal display
TWM366860U (en) * 2009-06-25 2009-10-11 Asia Electronic Material Co Covering film for printed circuit board
CN102893417A (en) * 2010-03-23 2013-01-23 株式会社朝日橡胶 Silicone resin reflective substrate, manufacturing method for same, and base material composition used in reflective substrate

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