CN104769208A - Ultra-hard constructions with improved attachment strength - Google Patents
Ultra-hard constructions with improved attachment strength Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/007—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent between different parts of an abrasive tool
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- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
- B24D3/10—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements for porous or cellular structure, e.g. for use with diamonds as abrasives
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- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B10/00—Drill bits
- E21B10/46—Drill bits characterised by wear resisting parts, e.g. diamond inserts
- E21B10/56—Button-type inserts
- E21B10/567—Button-type inserts with preformed cutting elements mounted on a distinct support, e.g. polycrystalline inserts
- E21B10/573—Button-type inserts with preformed cutting elements mounted on a distinct support, e.g. polycrystalline inserts characterised by support details, e.g. the substrate construction or the interface between the substrate and the cutting element
- E21B10/5735—Interface between the substrate and the cutting element
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
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- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
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- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
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- E21B10/46—Drill bits characterised by wear resisting parts, e.g. diamond inserts
- E21B10/54—Drill bits characterised by wear resisting parts, e.g. diamond inserts the bit being of the rotary drag type, e.g. fork-type bits
- E21B10/55—Drill bits characterised by wear resisting parts, e.g. diamond inserts the bit being of the rotary drag type, e.g. fork-type bits with preformed cutting elements
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- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B10/00—Drill bits
- E21B10/46—Drill bits characterised by wear resisting parts, e.g. diamond inserts
- E21B10/56—Button-type inserts
- E21B10/567—Button-type inserts with preformed cutting elements mounted on a distinct support, e.g. polycrystalline inserts
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Abstract
Description
背景技术Background technique
使用包括接合在一起的超硬与金属部件的结构是本领域中公知的。这种结构的一个例子可见于切割元件的形式,该切割元件包括接合至金属部件上的超硬部件。在这样的切割元件的实施例中,磨损或切割部分由所述超硬部件形成,并且所述切割元件的金属部分被附接至磨损和/或切割装置。在这种已知的结构中,超硬部件可以由诸如多晶金刚石(PCD)、多晶立方氮化硼(PcBN)等多晶材料制成,该材料具有比所述金属部件更高程度的耐磨损性。The use of structures comprising superhard and metallic components bonded together is known in the art. An example of such a structure can be found in the form of a cutting element comprising a superhard component bonded to a metal component. In an embodiment of such a cutting element, the wearing or cutting portion is formed by said superhard component and the metal portion of said cutting element is attached to the wearing and/or cutting means. In this known structure, superhard components may be made of polycrystalline materials such as polycrystalline diamond (PCD), polycrystalline cubic boron nitride (PcBN), etc., which have a higher degree of abrasion resistance.
在特定的例子中,所述超硬部件可以是经过处理以使其基本不含用于在高压/高温条件下形成/烧结PCD的催化剂材料(例如选自元素周期表第VIII族的金属)的PCD,且包括结合在一起的金刚石晶体。被处理为基本不含所述催化剂材料的PCD被称为热稳定的多晶金刚石(TSP),因为已经发现,所述催化剂材料的移除通过消除了随着温度升高时可能对所述金刚石本体的有效使用寿命有不利影响的不希望的退化及热膨胀不匹配而改善了所得金刚石本体的热稳定性。In particular examples, the superhard component may be treated to render it substantially free of catalyst material (e.g., a metal selected from Group VIII of the Periodic Table) for forming/sintering PCD under high pressure/high temperature conditions PCD, and includes diamond crystals bonded together. PCD treated to be substantially free of the catalyst material is referred to as thermally stable polycrystalline diamond (TSP) because it has been found that removal of the catalyst material eliminates possible damage to the diamond as the temperature increases. The thermal stability of the resulting diamond body is improved by undesired degradation and thermal expansion mismatch that adversely affect the useful life of the body.
尽管TSP提供了所需要的热稳定性的改进,但是现有的TSP的一个公知的问题是它的本体内缺少催化剂材料,从而妨碍了后续通过溶剂催化剂渗入将TSP本体附接到金属基体上。此外,这样的TSP本体具有的热膨胀系数与典型地渗入或以其它方式附接到PCD本体上的传统基体材料(如像的WC--Co等的金属陶瓷)显著不同。为了提供一种可以容易地适用于许多期望的应用中的TSP复合片,高度需要将这些基体附接到所述TSP本体上。但是,由于TSP本体与基体之间不同的热膨胀性,以及由于基本不含催化剂材料导致的TSP本体的弱润湿性,使得很难将TSP本体结合到传统使用的基体上。因此,一些TSP本体直接附接或安装到所需的最终用途的设备上,而不存在相接基体。While TSPs provide the desired improvement in thermal stability, a well-known problem with existing TSPs is the lack of catalyst material within their bodies, preventing subsequent attachment of the TSP body to the metal substrate by solvent catalyst infiltration. Furthermore, such TSP bodies have a coefficient of thermal expansion that is significantly different from conventional matrix materials (such as cermets like WC—Co, etc.) that are typically infiltrated or otherwise attached to PCD bodies. Attaching these substrates to the TSP body is highly desirable in order to provide a TSP compact that can be easily adapted for use in many desired applications. However, due to the different thermal expansion properties between the TSP body and the substrate, and the poor wettability of the TSP body due to the substantial absence of catalyst materials, it is difficult to bond the TSP body to the conventionally used substrate. Accordingly, some TSP bodies are directly attached or mounted to the desired end-use equipment without the presence of a mating substrate.
众所周知,可以通过使用公知的具有相对低熔点及低屈服强度的活性硬焊材料将TSP本体附接到所需的金属基体上。结合活性硬焊材料的公知的限制与TSP本体的固有的弱润湿性,可知形成于所述TSP本体与所述基体之间硬焊接合连接,不如通过渗透而形成于传统的PCD与金属基体之间的连接强壮。由于所述硬焊材料的屈服强度较低,所得结构的使用寿命减少,这将导致TSP本体和基体在工作期间分层。It is well known that the TSP body can be attached to the desired metal substrate by using known active brazing materials having relatively low melting points and low yield strengths. Combining the known limitations of active brazing materials with the inherent poor wettability of the TSP body, it follows that the brazed bond formed between the TSP body and the substrate is not as good as that formed by infiltration in conventional PCD and metal substrates. The connection between them is strong. Due to the lower yield strength of the brazing material, the resulting structure has a reduced service life, which will lead to delamination of the TSP body and matrix during operation.
发明内容Contents of the invention
本文所述的超硬结构包括金刚石结合本体,所述金刚石结合本体包括结合在一起的金刚石晶粒的基质相以及置于所述结合在一起的金刚石晶粒之间的多个间隙区域。所述间隙区域基本不含用于在高压/高温条件下烧结金刚石结合本体的催化剂材料。金属材料设置于所述金刚石本体的基体界面表面上。在一个示例性实施例中,所述金属材料具有碳化物成分。在一个示例性实施例中,所述金属材料的层厚在约0.1至10微米范围内。所述结构进一步包括与所述金刚石结合本体连接的基体。所述基体可以包括碳化物成分。所述基体通过置于所述金属材料与基体之间的硬焊接合部被附接于所述金刚石结合本体。由与所述基体及金属材料反应的非活性硬焊材料形成所述硬焊接合部。在一个示例性实施例中,在所述非活性硬焊材料的熔点下且无高压条件下形成所述硬焊接合部。这样的超硬结构的金刚石结合本体是在高压/高温条件下制成的。处理如此形成的本体的基体界面表面,使该表面上包括所述金属材料层。在大约所述硬焊材料的熔点下且无高压条件下通过包含所述非活性硬焊材料的硬焊接合部将金属基体附接到所述金刚石结合本体上。如果需要,在附接所述基体之前可以执行渗碳处理。提供本发明内容部分是为了介绍一系列概念,其将在下面的详细描述中进一步描述。本发明内容不旨在标识所要求保护的主题的关键或必要特征,也不旨在用于帮助限制所要求保护的主题的范围。The superhard structures described herein comprise a diamond bonded body comprising a matrix phase of bonded diamond grains and a plurality of interstitial regions interposed between the bonded diamond grains. The interstitial region is substantially free of catalyst material for sintering the diamond bonded body under high pressure/high temperature conditions. Metal material is disposed on the matrix interface surface of the diamond body. In an exemplary embodiment, the metallic material has a carbide composition. In an exemplary embodiment, the layer thickness of the metallic material is in the range of about 0.1 to 10 microns. The structure further includes a matrix coupled to the diamond bonded body. The matrix may include a carbide component. The base body is attached to the diamond bonded body by a brazed joint interposed between the metallic material and the base body. The braze joint is formed from a non-reactive braze material that reacts with the substrate and metallic material. In one exemplary embodiment, the brazed joint is formed at the melting point of the non-reactive brazing material without high pressure. Such superhard structured diamond bonded bodies are produced under high pressure/high temperature conditions. The substrate interface surface of the body thus formed is treated to include said metallic material layer thereon. A metal matrix is attached to the diamond bonded body by a braze joint comprising the non-reactive brazing material at about the melting point of the brazing material and in the absence of high pressure. A carburizing treatment may be performed before attaching the base body, if desired. This Summary is provided to introduce a selection of concepts that are further described below in the Detailed Description. This Summary is not intended to identify key or essential features of the claimed subject matter, nor is it intended to be used as an aid in limiting the scope of the claimed subject matter.
附图说明Description of drawings
参考下图描述超硬结构的实施例:An embodiment of a superhard structure is described with reference to the following figures:
图1是金刚石结合本体的一部分的视图,其已经被处理为移除了用于形成金刚石结合本体的催化剂材料;Figure 1 is a view of a portion of a diamond bonded body that has been processed to remove catalyst material used to form the diamond bonded body;
图2是金刚石结合本体的立体图,其已经被处理为移除了用于形成金刚石结合本体的催化剂材料;Figure 2 is a perspective view of a diamond bonded body which has been processed to remove catalyst material used to form the diamond bonded body;
图3是金刚石结合本体的截面侧视图,其包括设置于本体基体界面表面上的金属材料;Figure 3 is a cross-sectional side view of a diamond bonded body including metallic material disposed on the body-matrix interface surface;
图4是如本文所述的超硬结构的截面侧视图,其包括设置于本体基体界面表面上的金属材料的金刚石结合本体,并进一步包括置于之间形成硬焊接合部并将基体结合至所述本体的硬焊材料;4 is a cross-sectional side view of a superhard structure as described herein, comprising a diamond-bonded body of metallic material disposed on a body-matrix interface surface, and further comprising a brazed joint interposed therebetween and bonding the matrix to brazing material of the body;
图5是如本文所述的以镶齿形式实施的超硬结构的侧视图;Figure 5 is a side view of a superhard structure implemented in the form of an insert as described herein;
图6是包括图5中示出的多个镶齿的旋转锥钻头的侧立体图;6 is a side perspective view of a rotary cone drill bit including a plurality of inserts shown in FIG. 5;
图7是包括图5中示出的多个镶齿的冲击或震击钻头的侧立体图;7 is a side perspective view of an impact or percussion drill bit including a plurality of inserts shown in FIG. 5;
图8是如本文所述的以剪切切割器形式实施的超硬结构的立体图;以及Figure 8 is a perspective view of a superhard structure implemented as a shear cutter as described herein; and
图9是包括图8中示出的多个剪切切割器的刮刀钻头的侧立体图。9 is a side perspective view of a drag bit including the plurality of shear cutters shown in FIG. 8 .
具体实施方式Detailed ways
本文所公开的超硬及金属结构包括热稳定的多晶金刚石(TSP)结合本体,该本体基本不含最初用于烧结所述本体的催化剂材料,并且被专门设计为适于通过硬焊接合而以如下方式附接于基体或最终应途装置:提供了比传统的TSP结构增强的附接强度。The superhard and metallic structures disclosed herein comprise a thermally stable polycrystalline diamond (TSP) bonded body that is substantially free of the catalyst material originally used to sinter the body and is specifically designed to be bonded by brazing. Attachment to a substrate or end-use device in a manner that provides enhanced attachment strength over conventional TSP structures.
如本文所述,术语“超硬”应理解为指的是那些在本领域中公知的具有约4000HV或更大的晶粒硬度的材料。这样的超硬材料可以包括由固结材料构成的那些能够在高于约750℃、对于某些应用来说高于约1000℃的温度下展现出物理稳定性的材料。这样的超硬材料可包括但不限于:金刚石、立方氮化硼(cBN)、金刚石状碳、次氧化硼、铝锰硼化物及在硼-氮-碳相图中显示出类似于cBN及其他陶瓷材料的硬度值的其他材料。As used herein, the term "superhard" is understood to refer to those materials known in the art to have a grain hardness of about 4000 HV or greater. Such superhard materials may include those composed of consolidated materials capable of exhibiting physical stability at temperatures above about 750°C, and for some applications above about 1000°C. Such superhard materials may include, but are not limited to, diamond, cubic boron nitride (cBN), diamond-like carbon, boron suboxide, aluminum manganese borides, and those exhibiting similarities in the boron-nitrogen-carbon phase diagram to cBN and other Ceramic materials have hardness values for other materials.
一旦已处理多晶金刚石(PCD)而移除了最初用于在高压/高温(HPHT)条件下烧结或形成所述PCD的催化剂材料(例如上文所述的第VIII族物质),其便是用于形成所述超硬部件的有用材料。如本文所述,术语“催化剂材料”是指最初用来在HPHT处理条件下促进用于形成所述PCD的金刚石-金刚石结合或烧结的材料。Once polycrystalline diamond (PCD) has been treated to remove the catalyst material (such as the Group VIII species described above) originally used to sinter or form the PCD under high pressure/high temperature (HPHT) conditions, it is Useful materials for forming the superhard components. As used herein, the term "catalyst material" refers to a material originally used to promote diamond-diamond bonding or sintering for forming said PCD under HPHT processing conditions.
TSP具有这样的材料微观结构,其特征为包括结合在一起的金刚石晶粒或晶体的多晶基质相以及存在于所述基质内的间隙区域中的多个空隙或空孔,所述间隙区域布置于所述结合在一起的金刚石晶粒间。最初通过将邻近的金刚石晶粒或晶体在HPHT处理条件下结合在一起,形成所述TSP材料。使用合适的催化剂材料(例如选自元素周期表第VIII族的金属溶剂催化剂)促进所述金刚石晶粒在HPHT条件下结合在一起,从而形成传统的PCD,其包括布置于所述多个空隙或孔内的催化剂材料。TSP has a material microstructure characterized by a polycrystalline matrix phase comprising diamond grains or crystals bonded together and a plurality of voids or voids present within the matrix in interstitial regions arranged Between the bonded diamond grains. The TSP material is initially formed by bonding adjacent diamond grains or crystals together under HPHT treatment conditions. The use of a suitable catalyst material (such as a metal solvent catalyst selected from Group VIII of the Periodic Table of the Elements) promotes the bonding of the diamond grains together under HPHT conditions, thereby forming a conventional PCD, which includes being disposed in the plurality of voids or catalyst material in the pores.
能用于形成所述TSP部件或本体的金刚石晶粒可以包括平均粒径在从亚微米大小至100微米范围内、例如在约1至80微米范围内的天然和/或合成金刚石粉末。所述金刚石粉末可以含有具有单或多模态尺寸分布的晶粒。在一个示例性实施例中,金刚石粉末的平均粒径大约是20微米。在所使用的金刚石粉末具有不同尺寸的晶粒的情况下,通过传统的工艺例如通过球磨机或磨碎机将所述金刚石晶粒混合在一起足够时间,以确保良好的均匀分布。Diamond grains that can be used to form the TSP component or body may include natural and/or synthetic diamond powder having an average particle size ranging from submicron sizes to 100 microns, for example in the range of about 1 to 80 microns. The diamond powder may contain grains with a mono- or multi-modal size distribution. In an exemplary embodiment, the average particle size of the diamond powder is about 20 microns. Where the diamond powder used has grains of different sizes, the diamond grains are mixed together by conventional processes, for example by ball mills or attritors, for a sufficient time to ensure a good homogeneous distribution.
清洁金刚石晶粒粉末,以通过在高温、真空或减压时的处理提高粉末的烧结性。将所述金刚石粉末混合物加载至所需容器内,该容器用于放置于合适的HPHT固结和烧结装置中。Clean diamond grain powder to improve sinterability of powder by treatment at high temperature, vacuum or reduced pressure. The diamond powder mixture is loaded into the desired container for placement in a suitable HPHT consolidation and sintering apparatus.
在HPHT处理期间,成粉末的形式的期望的催化剂材料例如溶剂金属催化剂可与金刚石粉末组合,以在HPHT处理期间便于金刚石结合,和/或催化剂材料可以通过从邻近金刚石粉末定位且包括催化剂材料的基体的渗入提供。可以用作用于渗入催化剂材料的源的合适的基体可包括那些用于形成传统PCD材料的基体,且可以以是粉末、生坯状态和/或已烧结形式提供。这种基体的特征在于它包括金属溶剂催化剂,所述金属溶剂催化剂能够融化并渗入金刚石粉末的相邻区域,以便于在HPHT处理中金刚石晶粒结合在一起。在一个示例实施例中,催化剂材料为钴(Co),可用于提供催化剂材料的基体为含钴金属陶瓷,例如WC--Co。During HPHT processing, a desired catalyst material in powdered form, such as a solvent metal catalyst, can be combined with diamond powder to facilitate diamond bonding during HPHT processing, and/or the catalyst material can be obtained from Infiltration of the substrate is provided. Suitable substrates that may be used as a source for infiltrating catalyst material may include those used to form conventional PCD materials, and may be provided in powder, green state and/or sintered form. This matrix is characterized in that it includes a metal solvent catalyst capable of melting and infiltrating adjacent regions of the diamond powder to facilitate bonding of the diamond grains together during HPHT processing. In an example embodiment, the catalyst material is cobalt (Co), and the substrate that may be used to provide the catalyst material is a cobalt-containing cermet, such as WC—Co.
金刚石粉末混合物可以以包括与结合剂组合的金刚石粉末的生坯状态部件或混合物的形式提供,以提供适合的材料产品,例如,成金刚石带或其他可成型/适合的金刚石混合物产品的形式,以便于制造过程。在金刚石粉末以这种生坯状态部件的形式提供的情况下,期望在HPHT固结及烧结之前采取预热步骤,以驱除所述结合剂材料。在一个示例性实施例中,由上述HPHT处理得到的所述PCD材料中的金刚石体积含量可以在约85%至95%范围内。The diamond powder mixture may be provided in the form of a green state part or mixture comprising diamond powder combined with a binder to provide a suitable product of material, for example, in the form of a diamond ribbon or other formable/suitable diamond mixture product for in the manufacturing process. Where diamond powder is provided in such green state parts, it is desirable to take a preheating step prior to HPHT consolidation and sintering to drive off the binder material. In an exemplary embodiment, the volume content of diamond in the PCD material resulting from the above HPHT treatment may be in the range of about 85% to 95%.
金刚石粉末混合物或生坯状态部件被加载到所需容器内,该容器用于放置于合适的HPHT固结和烧结装置中。启动HPHT装置将所需HPHT条件施加到所述容器上,以发生金刚石粉末固化及烧结。在一个示例性实施例中,控制所述装置,以使所述容器在5000MPa或以上的压力以及从约1350℃至1500℃的温度的HPHT处理下承受预定长的时间。在此压力及温度下,催化剂材料熔化并渗入所述金刚石粉末混合物中,从而烧结所述金刚石晶粒以形成PCD。当完成HPHT处理后,从HPHT装置移除所述容器,并从所述容器移除如此形成的PCD材料。The diamond powder mixture or green state part is loaded into the desired container for placement in a suitable HPHT consolidation and sintering apparatus. The HPHT unit is activated to apply the desired HPHT conditions to the vessel for diamond powder solidification and sintering to occur. In an exemplary embodiment, the apparatus is controlled to subject the container to HPHT treatment at a pressure of 5000 MPa or above and a temperature of from about 1350°C to 1500°C for a predetermined length of time. At this pressure and temperature, the catalyst material melts and infiltrates the diamond powder mixture, sintering the diamond grains to form PCD. When the HPHT treatment is complete, the container is removed from the HPHT unit, and the PCD material so formed is removed from the container.
在HPHT处理期间使用基体(例如,作为催化剂材料的来源)的情况下,在处理PCD材料以从其移除所述催化剂材料以形成TSP之前,移除基体。可以在处理以形成TSP期间或之后移除基体。在一个实施例中,在处理之前移除任何基体,以加快从PCD本体移除催化剂材料的过程。Where a substrate is used during HPHT processing (eg, as a source of catalyst material), the substrate is removed prior to treating the PCD material to remove the catalyst material therefrom to form the TSP. The matrix may be removed during or after processing to form the TSP. In one embodiment, any matrix is removed prior to processing to speed up the process of removing catalyst material from the PCD body.
针对经处理过程后形成TSP的催化剂材料所使用的术语“移除”应该被理解为在剩余的金刚石结合本体中已经不存在所述催化剂材料的明显部分。然而,应该理解,在所得的金刚石结合本体中可能仍然残留一些少量的催化剂材料,例如在间隙区域和/或附着于金刚石晶体的表面。另外,如本文所使用的指代经过所述处理步骤后的所述金刚石结合本体中的催化剂材料的术语“基本不含”应该被理解为是指在如上所述的TSP材料中仍然可能残留有一些少/微量催化剂材料。与从所述PCD移除所述催化剂材料不同,可以通过处理用于形成所述PCD的催化剂材料以使所述催化剂材料在结构的操作温度下不反应或不催化,使所述PCD成为TSP。The term "removed" as used with respect to the catalyst material forming the TSP after the treatment process should be understood as the absence of a significant portion of said catalyst material in the remaining diamond bonded body. However, it should be understood that some small amounts of catalyst material may still remain in the resulting diamond bonded body, for example in interstitial regions and/or attached to the surface of the diamond crystals. In addition, the term "substantially free" as used herein to refer to the catalyst material in the diamond bonded body after the treatment step should be understood to mean that there may still be residual catalyst material in the TSP material as described above. Some small/trace amounts of catalyst material. Instead of removing the catalyst material from the PCD, the PCD can be made a TSP by treating the catalyst material used to form the PCD so that the catalyst material does not react or catalyze at the operating temperature of the structure.
在一个示例性实施例中,处理PCD本体使整个本体基本不含催化剂材料。这可以通过使PCD本体经受例如酸性浸滤或王水浴的化学处理、如电解法的电化学处理来实现,通过液态金属溶解或者通过在液相烧结过程中将存在的催化剂材料清除并用另一非催化材料替换的液态金属渗入来完成,或通过上述组合完成。可以在高温、高压、高频震动及其组合的条件下执行此过程。在一个示例性实施例中,通过例如在诸如美国专利第4224380号专利中公开的酸性浸滤技术将催化剂材料从PCD本体移除。In an exemplary embodiment, the PCD body is treated such that the entire body is substantially free of catalyst material. This can be achieved by subjecting the PCD body to chemical treatment such as acid leaching or an aqua regia bath, electrochemical treatment such as electrolysis, by liquid metal dissolution or by removing the catalyst material present during liquid phase sintering and replacing it with another This is accomplished by infiltration of liquid metal with replacement of the catalytic material, or by a combination of the above. This process can be performed under conditions of high temperature, high pressure, high frequency vibration and combinations thereof. In an exemplary embodiment, the catalyst material is removed from the PCD body by acid leaching techniques such as disclosed in US Patent No. 4,224,380.
可以使用热稳定催化剂系,例如碳酸盐、亚硫酸盐或黄铁矿来形成TSP。在此情况下,可能需要高于2000℃的温度及高于7.0GPa的压力来形成所述TSP本体。在一个附加实施例中,可以由石墨的或非金刚石的碳源形成所述TSP,其需要高于2000℃的温度及高于10.0GPa的压力。TSPs can be formed using thermally stable catalyst systems such as carbonates, sulfites, or pyrites. In this case, temperatures above 2000° C. and pressures above 7.0 GPa may be required to form the TSP body. In an additional embodiment, the TSP may be formed from a graphitic or non-diamond carbon source, which requires temperatures above 2000°C and pressures above 10.0 GPa.
图1示出了从其移除了催化剂材料而形成的金刚石结合TSP本体10的一部分。所述TSP本体具有的材料微观结构包括由结合在一起的多个金刚石晶粒或晶体12构成的多晶金刚石基质相,以及由于从其移除了催化剂材料而布置于所述基质内所述结合在一起的金刚石晶粒之间的多个间隙区域14,所述间隙区域以空孔或空隙而存在于所述材料微观结构中。Figure 1 shows a portion of a diamond-bonded TSP body 10 from which catalyst material has been removed. The TSP body has a material microstructure comprising a polycrystalline diamond matrix phase consisting of a plurality of diamond grains or crystals 12 bonded together, and the bonds are disposed within the matrix due to removal of catalyst material therefrom. A plurality of interstitial regions 14 between adjacent diamond grains, which exist as voids or voids in the material microstructure.
图2示出了TSP本体16的一个示例性实施例,其中,所述TSP本体包括沿金刚石台延伸的顶面22以及沿所述本体的壁部分延伸的侧面24。所述TSP本体包括工作面,根据特定的最终用途应用,该工作面可以包括所述顶面和/或侧面的全部或一部分。尽管图2中示出的TSP本体是具有大致圆柱形侧面及平的顶面及平的底面的晶圆或圆盘的形式,但是应该理解,意图将不同结构的TSP本体包含于本文公开的超硬结构的范围之内。此外,所述TSP本体16可以包括提供为便于所述结构在其最终用途应用中使用的一个或多个表面特征。例如,在这一阶段的处理中TSP本体可以在其顶面与侧面间包括切角或斜表面部分(其例如沿圆周围绕顶面的边缘延伸),并且此表面可以是工作面。Figure 2 shows an exemplary embodiment of a TSP body 16, wherein the TSP body includes a top surface 22 extending along a diamond table and side surfaces 24 extending along a wall portion of the body. The TSP body includes a working surface, which may include all or a portion of the top and/or sides, depending on the particular end-use application. Although the TSP body shown in FIG. 2 is in the form of a wafer or disk having generally cylindrical sides and flat top and bottom surfaces, it should be understood that TSP bodies of different configurations are intended to be included in the superstructures disclosed herein. Within the bounds of the hard structure. Additionally, the TSP body 16 may include one or more surface features provided to facilitate use of the structure in its end-use application. For example, the TSP body at this stage of processing may include a chamfered or beveled surface portion between its top and sides (eg extending circumferentially around the edge of the top surface), and this surface may be the working surface.
在通过使用硬焊接合附接到基体上之前处理如此形成的TSP本体,其中,基体可以是与最终用途装置分离的部件的形式,例如传统的用于制造PCD复合片的基体,或者是最终用途装置自身的形式。所述处理包括向所述TSP本体的定位成与所述基体交界的表面(即基体界面表面)施加一层金属材料。所述金属材料用于增强通过所述硬焊接合与所述基体形成的附接强度的目的,从而通过避免基体脱层而延长使用寿命。The TSP body so formed is processed prior to being attached to a substrate, which may be in the form of a separate component from the end-use device, such as conventionally used in the manufacture of PCD compacts, or an end-use The form of the device itself. The processing includes applying a layer of metallic material to a surface of the TSP body positioned to interface with the substrate (ie, a substrate interface surface). Said metallic material serves the purpose of increasing the strength of the attachment formed by said brazed joint with said substrate, thereby prolonging the service life by avoiding delamination of the substrate.
在一个示例性实施例中,通过将金属材料沉积到TSP本体上来处理所述TSP本体,所述沉积是任意合适的沉积工艺,例如,浸渍、喷涂、化学气相沉积(CVD)工艺、溅射等。在一个示例性实施例中,金属材料期望是包括碳化物的材料和/或是碳化物形成物、例如在后续处理中形成碳化物的材料。期望以足够量和/或厚度施加所述金属材料,以在所述基体界面上提供所需量的碳化物,用于允许利用非活性硬焊将基体与TSP本体连接在一起的目的。在一些情况下,可以施加多于一层的金属材料,以在所述TSP本体表面上获得所需量或含量的碳化物。In an exemplary embodiment, the TSP body is processed by depositing a metallic material onto the TSP body, said deposition being any suitable deposition process, such as dipping, spraying, chemical vapor deposition (CVD) process, sputtering, etc. . In an exemplary embodiment, the metallic material is desirably a material that includes carbides and/or is a carbide former, eg, a material that forms carbides in subsequent processing. It is desirable to apply the metallic material in a sufficient amount and/or thickness to provide the desired amount of carbides at the substrate interface for the purpose of allowing non-reactive brazing to join the substrate and TSP body together. In some cases, more than one layer of metallic material may be applied to achieve a desired amount or content of carbides on the surface of the TSP body.
在一个示例性实施例中,所述金属层的厚度可以在约0.1至10微米范围内,在约0.5至5微米范围内,在约1至3微米范围内。应该理解,所述所使用的金属层的精确厚度将依赖于所施加的金属材料类型以及所使用的硬焊材料类型。所述处理可以是向所述基体界面表面提供金属材料表面涂层的处理和/或将所述金属材料引入到TSP本体的从基体界面表面延伸一部分深度的区域中的处理。In an exemplary embodiment, the metal layer may have a thickness in a range of about 0.1 to 10 microns, in a range of about 0.5 to 5 microns, in a range of about 1 to 3 microns. It should be understood that the exact thickness of the metal layer used will depend on the type of metal material being applied as well as the type of brazing material being used. The treatment may be a treatment that provides a surface coating of a metallic material to the substrate interface surface and/or a treatment that introduces the metallic material into a region of the TSP body extending a fraction of the depth from the substrate interface surface.
能用于该处理的金属材料可以包括:含金属的材料、金属、金属合金等,其要么包括碳化物,要么在后续处理时生成碳化物,例如是碳化物形成物。如上所述,所述金属材料用于在所述TSP本体上提供所需量的碳化物,以允许在将所述TSP本体连接到所述基体时使用非活性硬焊材料。期望使用这些非活性硬焊材料是因为它们提供了与所述金属基体的牢固连接结合,并且比在将金刚石结合本体(PCD及TSP)连接至金属陶瓷基体的过程中使用的传统活性硬焊材料相比,其具有相对较高的屈服强度及熔点。如本文所述,术语“活性硬焊”是指与多晶超硬材料(未经处理的)发生反应的硬焊材料。术语“非活性硬焊”是指不与所述多晶超硬材料(未经处理的)发生发应的硬焊材料。Metallic materials that can be used for this treatment may include: metal-containing materials, metals, metal alloys, etc., which either include carbides or form carbides during subsequent processing, such as carbide formers. As mentioned above, the metallic material is used to provide the required amount of carbides on the TSP body to allow the use of non-reactive brazing materials in joining the TSP body to the substrate. The use of these non-reactive brazing materials is desirable because they provide a strong bond to the metal substrate and are superior to traditional reactive brazing materials used in bonding diamond bonded bodies (PCD and TSP) to cermet substrates. In contrast, it has a relatively high yield strength and melting point. As used herein, the term "active brazing" refers to a brazing material that reacts with polycrystalline superhard material (untreated). The term "non-reactive brazing" refers to a brazing material that does not react with the polycrystalline superhard material (untreated).
能用于此处理的合适的含碳化物的金属材料包括B、Si、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo及W、它们的组合及合金。示例性含碳化物的金属材料包括但不限于B4C、SiC、TiC、ZrC、HfC、VC、NbC、TaC、Cr2C3、CrC2、Mo2C、MoC、W2C及WC。Suitable carbide-containing metallic materials that can be used for this treatment include B, Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, combinations and alloys thereof. Exemplary carbide-containing metal materials include, but are not limited to, B4C , SiC, TiC, ZrC, HfC, VC , NbC, TaC, Cr2C3 , CrC2 , Mo2C , MoC, W2C , and WC.
能用于此处理的合适的形成碳化物的金属材料包括那些当置于渗碳处理中时能够形成碳化物的材料,可以作为与硬焊相分离的步骤或在所述硬焊过程中执行所述渗碳处理。合适的形成碳化物的材料包括耐熔金属,例如那些选自元素周期表第IV族至第VII族中的金属。在一个示例性实施例中,所述金属材料是钨(W),并且所述钨层被渗碳,以使所述基体界面表面上的主要成分是碳化钨(WC)。所述金属材料是钛并且所述碳化物是碳化钛(TiC)。Suitable carbide-forming metallic materials that can be used in this process include those that are capable of forming carbides when placed in a carburizing process, which can be performed as a separate step from or during the brazing process. Carburizing treatment. Suitable carbide-forming materials include refractory metals, such as those selected from Groups IV to VII of the Periodic Table of the Elements. In an exemplary embodiment, the metal material is tungsten (W), and the tungsten layer is carburized so that the main component on the interface surface of the substrate is tungsten carbide (WC). The metal material is titanium and the carbide is titanium carbide (TiC).
能用于此处理的金属材料期望是在所述基体界面表面上产生所需水平或含量的碳化物的材料,以便于使用非活性硬焊材料将所述基体与所述TSP本体连接在一起。非活性硬焊材料是独特适于与含碳化物表面形成牢固结合的材料。因此,以此方式处理所述TSP本体基体界面表面,在所述TSP本体上提供了这样的碳化物表面,其与已经存在于所述基体表面上的碳化物相匹配,从而保证在它们之间形成牢固的硬焊连接。此外,因为非活性硬焊材料具有比活性硬焊材料(通常用于将多晶本体连接至金属基体)相对较高的屈服强度及熔点,因此,由所述非活性硬焊材料形成的硬焊接合不易于在使用期间脱层及失效,从而延长了由其形成的超硬结构的使用寿命。Metallic materials that can be used for this treatment are desirably those that produce the desired level or content of carbides on the substrate interface surface to facilitate joining the substrate to the TSP body using a non-reactive brazing material. Non-reactive brazing materials are uniquely suited to form a strong bond with carbide-containing surfaces. Thus, treating the TSP body-matrix interface surface in this manner provides a carbide surface on the TSP body that matches the carbides already present on the substrate surface, thereby ensuring Forms a strong brazed connection. Furthermore, because non-reactive brazing materials have relatively higher yield strengths and melting points than reactive brazing materials (typically used to join polycrystalline bodies to metal substrates), brazes formed from such non-reactive brazing materials The combination is less prone to delamination and failure during use, thereby prolonging the service life of the superhard structure formed from it.
能用于帮助在TSP本体与基体间形成硬焊连接的金属材料还可以用作阻挡,以防止在所述硬焊作业期间材料向所述TSP本体内的任意不需要的迁移或渗入。此外,所述金属材料可有助于适配存在于所述TSP本体、硬焊材料及基体之间任意的机械属性不匹配,例如热膨胀属性的不同,在附接过程期间该不匹配可以在所述结构中产生高残余应力。使用含有渐变的碳化物含量的钨或钛层可以避免所述残余应力不匹配,例如在超硬材料界面附近含有大约90%或更高的碳化物,并且在要与非活性硬焊接合连接的界面处含有50%或更低的碳化物含量。The metallic material that can be used to help form the brazed connection between the TSP body and the substrate can also act as a barrier to prevent any unwanted migration or infiltration of material into the TSP body during the brazing operation. In addition, the metal material can help to accommodate any mechanical property mismatch that exists between the TSP body, braze material and substrate, such as differences in thermal expansion properties, which can occur during the attachment process. High residual stresses are generated in the structures described above. This residual stress mismatch can be avoided by using a tungsten or titanium layer with a graded carbide content, for example about 90% or more carbide near the superhard material interface, and at the part to be bonded with a non-active braze. The interface contains 50% or less carbide content.
图3示出了如本文所述的超硬结构的一个示例性实施例,在这一阶段的处理中已经将所述金属材料30层施加或沉积到所述TSP本体34的基体界面表面32上,用于后续的基体接接的目的。在一个示例性实施例中,金属材料30是钨,并且通过CVD、PVD或溅射工艺提供。所施加的金属材料30的量依赖于是需要沿所述基体界面表面32的表面涂层还是需要在所述TSP本体中形成从所述基体界面表面延伸一部分深度的渗入区域。是需要表面层还是渗入区域将依赖于多个因素,例如所使用的基体及硬焊材料的类型,以及最终用途应用。Figure 3 shows an exemplary embodiment of a superhard structure as described herein, at this stage of processing the layer of metallic material 30 has been applied or deposited onto the substrate interface surface 32 of the TSP body 34 , for subsequent substrate bonding purposes. In an exemplary embodiment, metallic material 30 is tungsten and is provided by a CVD, PVD or sputtering process. The amount of metallic material 30 applied depends on whether a surface coating along the substrate interface surface 32 or an infiltrated region in the TSP body extending a portion of the depth from the substrate interface surface is desired. Whether a surface layer or an infiltrated area is required will depend on factors such as the type of substrate and brazing material used, and the end-use application.
在TSP切割边缘或工作面需要最大热保护的情形中,可能需要提供了涂覆表面的处理。附加阻挡涂层可以优化所述TSP本体内的热梯度,并且从而延长切割寿命。在一个提供了涂覆表面的示例性实施例中,所述涂层可使从TSP本体的基体界面表面测量的厚度增加约1至5微米、约5至20微米以及多于约20微米。Where TSP cutting edges or work faces require maximum thermal protection, it may be necessary to provide a coated surface treatment. Additional barrier coatings can optimize thermal gradients within the TSP body and thereby extend cut life. In an exemplary embodiment providing a coated surface, the coating can increase the thickness measured from the substrate interface surface of the TSP body by about 1 to 5 microns, about 5 to 20 microns, and greater than about 20 microns.
在所述基体与TSP本体之间需要增强的附接强度的情形中,可能需要在所述TSP本体内提供渗入区域的处理,所述附接强度由硬焊材料(除了所述TSP本体的表面)与TSP本体中包含所述金属材料的区域的结合来提供。在一个需要金属材料渗入的示例性实施例中,所述渗入深度可以在约1至20微米范围内。Treatments that provide infiltrated regions within the TSP body may be required where enhanced attachment strength is required between the substrate and the TSP body, the attachment strength being formed by brazing material (except for the surface of the TSP body). ) in combination with regions of the TSP body comprising said metallic material. In an exemplary embodiment where infiltration of a metallic material is desired, the infiltration depth may be in the range of about 1 to 20 microns.
在金属材料被另外选择为用作阻挡材料的实施例中,所述金属材料的存在用于防止来自硬焊接合和/或基体的成分向所述TSP本体内不需要的迁移。另外,此阻挡金属材料的存在可以用于阻止来自所述TSP本体的任意材料向邻近的硬焊接合部或基体不需要的渗入。In embodiments where a metallic material is additionally selected for use as a barrier material, the presence of the metallic material serves to prevent unwanted migration of components from the braze joint and/or matrix into the body of the TSP. Additionally, the presence of this barrier metal material can serve to prevent unwanted infiltration of any material from the body of the TSP into adjacent brazed joints or substrates.
一旦所述TSP本体被处理为包括所述金属材料,在硬焊附接至所述基体之前可以对其进一步处理。在施加到所述TSP本体上的所述金属材料已经包含碳化物的情况下,可以不经过进一步处理而将TSP本体硬焊。在施加到所述TSP本体上的所述金属材料是碳化物形成物并且尚不含有碳化物的情况下,需要进行进一步处理以形成所需碳化物成分。在一个示例性实施例中,这样的进一步处理可以包括在约700至1500℃范围内的高温下渗碳所述金属材料。在一个示例性实施例中,所述渗碳处理在约900℃的温度下执行充足时间以产生所需碳化物。还可以操纵温度及时间以在所述金属层中产生所需的梯度条件。Once the TSP body is processed to include the metallic material, it may be further processed prior to brazing attachment to the substrate. In case the metallic material applied to the TSP body already contains carbides, the TSP body may be brazed without further treatment. Where the metallic material applied to the TSP body is a carbide former and does not yet contain carbides, further processing is required to form the desired carbide composition. In an exemplary embodiment, such further processing may include carburizing the metallic material at an elevated temperature in the range of about 700 to 1500°C. In an exemplary embodiment, the carburizing process is performed at a temperature of about 900° C. for a sufficient time to produce the desired carbides. Temperature and time can also be manipulated to create the desired gradient conditions in the metal layer.
在所述金属材料中形成所述碳化物成分的步骤(例如通过渗碳)可以与将TSP本体硬焊到基体上的步骤相互分开地及独立地执行。可以在硬焊步骤期间执行形成所述碳化物成分的步骤,例如在将TSP本体与硬焊材料连接在一起的前一刻。The step of forming said carbide composition in said metallic material, for example by carburizing, may be performed separately and independently from the step of brazing the TSP body to the substrate. The step of forming the carbide composition may be performed during the brazing step, for example immediately before joining the TSP body with the brazing material.
本文所述的能用于形成超硬结构的合适的非活性硬焊材料包括那些选自包含下面的组的材料:Cu、Ni、Mn、Au、Pd、它们的组合及合金。示例性合金包括那些具有下面的组分及液体温度(LT)与固体温度(ST)的合金,其中组分含量以重量百分比计:40Ni,60Pd,LT=ST=1238℃;70Au,22Ni,8Pd,LT=1037℃,ST=1005℃;35Au,31.5Cu,14Ni,10Pd,9.5Mn,LT=1004℃,ST=971℃;52.5Cu,9.5Ni,38Mn,LT=925℃,ST=880℃;31Au,43.5Cu,9.75Ni,9.75Pd,16Mn,LT=949℃,ST=927℃;54Ag,21Cu,25Pd,LT=950℃,ST=900℃;67.5Cu,9Ni,23.5Mn,LT=955℃,ST=925℃;58.5Cu,10Co,31.5Mn,LT=999℃,ST=896℃;35Au,31.5Cu,14Ni,10Pd,9.5Mn,LT=1004℃,ST=971℃;25Su,37Cu,10Ni,15Pd,13Mn,LT=1013℃,ST=970℃;以及35Au,62Cu,3Ni,LT=1030℃,ST=1000℃。Suitable non-reactive brazing materials described herein that can be used to form superhard structures include those selected from the group consisting of Cu, Ni, Mn, Au, Pd, combinations and alloys thereof. Exemplary alloys include those having the following composition and liquid temperature (LT) and solid temperature (ST) alloys, wherein the composition content is expressed in weight percent: 40Ni, 60Pd, LT = ST = 1238 ° C; 70Au, 22Ni, 8Pd , LT=1037℃, ST=1005℃; 35Au, 31.5Cu, 14Ni, 10Pd, 9.5Mn, LT=1004℃, ST=971℃; 52.5Cu, 9.5Ni, 38Mn, LT=925℃, ST=880℃ ; 31Au, 43.5Cu, 9.75Ni, 9.75Pd, 16Mn, LT=949°C, ST=927°C; 54Ag, 21Cu, 25Pd, LT=950°C, ST=900°C; 67.5Cu, 9Ni, 23.5Mn, LT= 955°C, ST=925°C; 58.5Cu, 10Co, 31.5Mn, LT=999°C, ST=896°C; 35Au, 31.5Cu, 14Ni, 10Pd, 9.5Mn, LT=1004°C, ST=971°C; 25Su, 37Cu, 10Ni, 15Pd, 13Mn, LT=1013°C, ST=970°C; and 35Au, 62Cu, 3Ni, LT=1030°C, ST=1000°C.
所述TSP本体(包括含碳化物基体界面表面)通过所述硬焊材料在足够熔化所述硬焊材料的高温条件下被连接至所述基体。可以通过使用传统的硬焊技术形成所述硬焊接合,例如通过真空硬焊、感应硬焊等。因此本文所公开的超硬结构的另一个特征在于所述TSP本体在高温而非高压下通过硬焊被附接至基体,即不需要将TSP本体置于第二HPHT处理中。极度希望避免需要依靠HPHT处理来将TSP本体附接至基体,因为其增加了制造效率并减少了相关的制造成本,并且避免了不需要的渗入问题。The TSP body (including the carbide-containing matrix interface surface) is joined to the substrate by the brazing material under high temperature conditions sufficient to melt the brazing material. The brazed bond may be formed using conventional brazing techniques, such as by vacuum brazing, induction brazing, or the like. It is thus another feature of the superhard structures disclosed herein that the TSP body is attached to the substrate by brazing at high temperature rather than high pressure, ie without subjecting the TSP body to a second HPHT process. It is highly desirable to avoid the need to rely on HPHT processing to attach the TSP body to the substrate, as it increases manufacturing efficiency and reduces associated manufacturing costs, and avoids unwanted bleeding problems.
图4示出了示例性实施例的TSP结构40,其包括通过硬焊接合部46附接至基体44的TSP本体42。所述TSP本体包括可以沿顶面48存在的工作面、侧面50和/或边缘面52。所述TSP本体包括基体界面表面54以及布置于其上的含有碳化物成分的金属材料56,与不包括所述金属材料的传统的TSP结构相比,该金属材料用于提供与用于形成所述硬焊接合部46的非活性硬焊材料的增强附接。FIG. 4 illustrates an exemplary embodiment TSP structure 40 that includes a TSP body 42 attached to a substrate 44 by a brazed joint 46 . The TSP body includes working faces, side faces 50 and/or edge faces 52 which may exist along top face 48 . The TSP body includes a substrate interface surface 54 and a metallic material 56 having a carbide composition disposed thereon for providing the same properties as for forming the Enhanced attachment of the non-reactive brazing material of the brazed joint 46 described above.
能用于形成所述硬焊接合部的示例性硬焊材料包括能够在所述TSP本体与所需基体之间形成牢固化学结合的材料。所述硬焊材料期望包括能够与所述TSP本体中的一种或多种元素反应以形成此牢固化学结合的一种或多种元素。由于这个原因,能用于形成所述硬焊材料的材料可以被称为是“活性”硬焊材料或合金。Exemplary braze materials that can be used to form the braze joint include materials capable of forming a strong chemical bond between the TSP body and the desired substrate. The brazing material desirably includes one or more elements capable of reacting with one or more elements in the TSP body to form this strong chemical bond. For this reason, materials that can be used to form the brazing material may be referred to as "active" brazing materials or alloys.
如上所述,如本文所述的在形成超硬结构中有用的基体可以是与最终用途装置分离的部件的形式,例如金属陶瓷或碳化物部件,或者可以是所述最终用途装置自身的一部分的形式。因此,应该理解,以如上所述方式处理过的TSP本体可以通过上述的硬焊接合直接地或间接地附接至所述最终用途装置。As noted above, substrates useful in forming superhard structures as described herein may be in the form of a component separate from the end-use device, such as a cermet or carbide component, or may be part of the end-use device itself. form. Accordingly, it should be understood that a TSP body treated in the manner described above may be directly or indirectly attached to the end-use device by the brazing bond described above.
与最终用途装置分离提供的合适的基体可以选自那些通常用作形成PCD复合片的基体的材料,并且可以包括金属材料、陶瓷材料、金属陶瓷材料及其组合。一个示例性基体是碳化物基体,例如由WC--Co形成的基体。根据所述TSP本体的尺寸与结构以及最终用途应用,所述基体的尺寸及结构可以并且将要改变。可以使用不同类型的钢作为基体,并且各种类型的钢可以包括或随后被机械加工为包含例如螺纹或其他紧固装置的特征,以助其便于与钻头机械连接。其中,能用作基体的钢的类型包括那些洛氏硬度C在50及以上的那些钢。Suitable substrates provided separately from the end-use device may be selected from those materials commonly used as substrates for forming PCD compacts, and may include metallic materials, ceramic materials, cermet materials, and combinations thereof. An exemplary matrix is a carbide matrix, such as a matrix formed of WC—Co. Depending on the size and configuration of the TSP body and the end use application, the size and configuration of the matrix can and will vary. Different types of steel may be used as the matrix, and each type of steel may include or be subsequently machined to include features such as threads or other fastening means to facilitate its mechanical attachment to the drill bit. Among them, the types of steel that can be used as the base include those having a Rockwell hardness C of 50 and above.
尽管上文已经公开并示出了特定的示例性实施例的超硬结构,但是应该理解,这些示例性实施例的变化被理解为在本文公开的范围之内。Although specific exemplary embodiments of superhard structures have been disclosed and illustrated above, it should be understood that variations of these exemplary embodiments are intended to be within the scope of the disclosure herein.
如本文所述的超硬结构的特征在于,本文包括的TSP本体在被硬焊附接至基体之前,已经被处理为包括金属材料,其中,这种金属材料要么包括要么被处理为包括碳化物成分。如本文所述的这种超硬结构的另一个特征在于,用于形成所述硬焊接合的硬焊材料是非活性硬焊材料,其很适合于在含碳化物表面之间形成增强的结合强度,因为它们同时存在于所述TSP本体及所述基体上。这种超硬结构的另一个特征在于,与通常用于在所述TSP本体及基体之间形成硬焊接合的活性硬焊材料相比,所述非活性硬焊材料具有相对较高的屈服强度及熔点,从而通过最小化使用期间的不希望的脱层而延长了使用寿命。这种超硬结构的另一个特征在于,其避免了必须经受HPHT处理以将所述TSP本体附接至所述基体,其中,所述硬焊接合在所述硬焊材料的熔点下而不需要高压时形成,从而增加了制造效率并减少了相关的制造成本。A superhard structure as described herein is characterized in that the TSP body comprised herein has been treated to comprise a metallic material prior to being attached to the substrate by brazing, wherein such metallic material either comprises or is treated to comprise carbides Element. Another feature of such superhard structures as described herein is that the brazing material used to form said brazing joint is a non-reactive brazing material well suited to form enhanced bond strength between carbide-containing surfaces , because they exist on both the TSP body and the substrate. Another feature of this superhard structure is that the non-reactive brazing material has a relatively high yield strength compared to reactive brazing materials typically used to form the brazed bond between the TSP body and substrate and melting point, thereby extending service life by minimizing undesired delamination during use. Another feature of this superhard structure is that it avoids having to undergo HPHT processing to attach the TSP body to the substrate, wherein the brazing bond is at the melting point of the brazing material without the need for Formed at high pressure, thereby increasing manufacturing efficiency and reducing associated manufacturing costs.
如本文所述的超硬结构可以被用于多种不同应用场合,例如用于极度需要剪切强度、热稳定性、耐磨损性、机械强度和/或降低的热残余应力的采矿、切割、机加工、研磨和建筑应用的工具中。如本文所述的超硬结构特别好地适合用于形成机床中的工作元件、磨损元件和/或切割元件以及诸如地下钻井应用中使用的牙轮钻头、冲击钻头或震击钻头、金刚石钻头以及剪切切割器的钻井和采矿钻头。Superhard structures as described herein can be used in a variety of different applications, such as mining, cutting, where shear strength, thermal stability, wear resistance, mechanical strength and/or reduced thermal residual stress are critically needed. , machining, grinding and tools for construction applications. The superhard structures as described herein are particularly well suited for use in forming working, wear and/or cutting elements in machine tools and such as roller cone bits, percussion or vibration bits, diamond bits and Drilling and mining bits with shear cutters.
图5示出了如本文所述的以切割元件形式提供的超硬结构的一个实施例,其被实施为用于磨损或切割应用中的牙轮钻头或冲击或震击钻头中的镶齿60。例如,这样的镶齿60可以由坯件形成,该坯件包括由上文所述的一个或多个基体材料64形成的基体部62,以及具有由所述超硬本体的热稳定区域形成的工作面68的超硬材料本体66。所述坯件被挤压或机械加工成所需形状的牙轮钻头镶齿。Figure 5 shows one embodiment of a superhard structure provided in the form of a cutting element as described herein implemented as an insert 60 in a roller cone bit or a percussion or percussion drill bit for use in abrasive or cutting applications . For example, such an insert 60 may be formed from a blank comprising a base portion 62 formed from one or more base materials 64 as described above, and having a thermally stable region formed from the superhard body. The superhard material body 66 of the working face 68 . The blank is extruded or machined into the desired shape of the roller cone bit insert.
图6示出了成牙轮钻头70的形式的旋转或滚子锥钻头,所述牙轮钻头70包含如上所述及示于图5中的多个磨损或切割镶齿60。所述牙轮钻头70包含具有三个支腿74的本体72,以及安装于每个支腿下端的滚轮切割锥76。可以根据上述方法制造所述镶齿60。所述镶齿60位于每个切割锥76的表面中以向正在钻探的岩石层施加压力。FIG. 6 shows a rotary or roller cone bit in the form of a roller cone bit 70 comprising a plurality of wear or cutting inserts 60 as described above and shown in FIG. 5 . The roller cone bit 70 includes a body 72 having three legs 74, and a roller cutting cone 76 mounted to the lower end of each leg. The insert 60 can be manufactured according to the method described above. The inserts 60 are located in the face of each cutting cone 76 to apply pressure to the rock formation being drilled.
图7示出了与冲击钻头或震击钻头80共同使用的如上所述的镶齿60。所述震击钻头包含中空的钢本体82,螺纹销84在所述本体的一端上将所述钻头安装至钻柱(未示出),用于钻探油井等。多个所述镶齿60(示出图7中)位于所述本体96的头部100的表面中以向正在钻探的地下岩层施加压力。FIG. 7 shows an insert 60 as described above for use with a percussion drill bit or hammer bit 80 . The hammer bit comprises a hollow steel body 82 with a threaded pin 84 on one end of the body to mount the bit to a drill string (not shown) for drilling an oil well or the like. A plurality of the inserts 60 (shown in FIG. 7 ) are located in the surface of the head 100 of the body 96 to apply pressure to the subterranean formation being drilled.
图8示出了如本文所述的超硬结构,其被实施为与例如用于钻探地下岩层的刮刀钻头共同使用的剪切切割器90的形式。所述剪切切割器90包含烧结或以其他方式附接/连接至切割器基体94的热稳定超硬本体92。所述热稳定超硬材料本体包括工作或切割面96。Figure 8 shows a superhard structure as described herein implemented in the form of a shear cutter 90 for use with, for example, a drag bit for drilling subterranean formations. The shear cutter 90 includes a thermally stable superhard body 92 sintered or otherwise attached/connected to a cutter base 94 . The body of thermally stable superhard material includes a working or cutting face 96 .
图9示出了刮刀钻头100,其包括上文所述并示于图8中的多个剪切切割器90。所述剪切切割器各附接于刀片102,每个刀片从所述刮刀钻头的头部104延伸,用于切割正在钻探的地下岩层。FIG. 9 shows a drag bit 100 including a plurality of shear cutters 90 as described above and shown in FIG. 8 . The shear cutters are each attached to a blade 102 each extending from a head 104 of the drag bit for cutting the subterranean formation being drilled.
虽然上文描述了几个示例性的实施例,所属领域技术人员应该容易理解,在实质上不脱离本公开的范围的情况下,可以对示例性的实施例进行多种变型。因此,所有这样的变型应当被包含于权利要求所限定的本公开的范围内。在权利要求中,功能模块的条款被预期覆盖在此描述的执行所述功能的结构,不仅限于在结构上的等价,还包括等价的结构。因此,尽管钉子和螺钉可能在结构上不等价,因为钉子具有圆柱形表面,以便紧固木质零件,而螺钉具有螺旋形表面,然而在紧固木质零件的环境下,钉子和螺钉可以是等价的结构。申请人的明确意图是不为本文的任何权利要求的任何限制援引35U.S.C.§112第6段,除了权利要求明确使用词语“用于…的装置”和相关联的功能。While a few exemplary embodiments have been described above, those skilled in the art will readily appreciate that various modifications can be made to the exemplary embodiments without materially departing from the scope of the present disclosure. Accordingly, all such modifications are intended to be included within the scope of this disclosure as defined in the claims. In the claims, clauses of functional means are intended to cover the structures described herein as performing the recited function and not only structural equivalents but also equivalent structures. Thus, although nails and screws may not be structurally equivalent in that nails have cylindrical surfaces for fastening wooden parts and screws have helical surfaces, in the context of fastening wooden parts nails and screws may be equal price structure. It is Applicant's express intent not to invoke 35 U.S.C. §112, paragraph 6, for any limitation of any claim herein, except where the claim expressly uses the words "means for" and the associated function.
Claims (23)
Applications Claiming Priority (5)
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| US14/019,411 US20140069727A1 (en) | 2012-09-07 | 2013-09-05 | Ultra-hard constructions with improved attachment strength |
| PCT/US2013/058425 WO2014039771A1 (en) | 2012-09-07 | 2013-09-06 | Ultra-hard constructions with improved attachment strength |
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| EP2893118A1 (en) | 2015-07-15 |
| US20140069727A1 (en) | 2014-03-13 |
| EP2893118A4 (en) | 2015-10-28 |
| WO2014039771A1 (en) | 2014-03-13 |
| CA2883776A1 (en) | 2014-03-13 |
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