CN104730784B - Array base palte and its manufacture method, display panel and display device - Google Patents
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Abstract
本发明提供一种阵列基板,所述阵列基板被划分为多个像素单元,所述阵列基板包括第一电极层、覆盖该第一电极层的绝缘层和形成在所述绝缘层上的第二电极层,所述第一电极层包括设置在每个所述像素单元内的第一电极,所述绝缘层包括覆盖在每个所述第一电极表面的绝缘层单元,所述第二电极层包括设置在所述绝缘层单元上方的第二电极,其中,在每个所述像素单元内,所述绝缘层单元包括多个绝缘区,至少一个所述绝缘区的介电常数不同于其他所述绝缘区的介电常数。本发明还提供一种显示面板、一种显示装置和一种阵列基板的制造方法。在本发明中,通过简单地改变绝缘层单元的结构即可实现多畴液晶显示装置,从而可以降低制造阵列基板的工艺成本。
The present invention provides an array substrate. The array substrate is divided into a plurality of pixel units. The array substrate includes a first electrode layer, an insulating layer covering the first electrode layer, and a second electrode layer formed on the insulating layer. An electrode layer, the first electrode layer includes a first electrode arranged in each of the pixel units, the insulating layer includes an insulating layer unit covering the surface of each of the first electrodes, and the second electrode layer It includes a second electrode disposed above the insulating layer unit, wherein, in each of the pixel units, the insulating layer unit includes a plurality of insulating regions, and at least one of the insulating regions has a dielectric constant different from that of the other ones. The dielectric constant of the insulating region. The invention also provides a display panel, a display device and a manufacturing method of an array substrate. In the present invention, a multi-domain liquid crystal display device can be realized by simply changing the structure of the insulating layer unit, thereby reducing the process cost of manufacturing the array substrate.
Description
技术领域technical field
本发明涉及显示装置领域,具体地,涉及一种阵列基板、一种包括该阵列基板的显示面板、一种包括该显示面板的显示装置和所述阵列基板的制造方法。The present invention relates to the field of display devices, and in particular, to an array substrate, a display panel including the array substrate, a display device including the display panel, and a manufacturing method of the array substrate.
背景技术Background technique
为了使得液晶显示装置具有较宽的视角,通常可以将液晶显示装置设置成双畴液晶显示,即,在进行显示时,一个像素单元内的液晶分子朝向两种不同的方向偏转。In order to make the liquid crystal display device have a wider viewing angle, the liquid crystal display device can generally be configured as a dual-domain liquid crystal display, that is, when displaying, the liquid crystal molecules in one pixel unit deflect in two different directions.
目前,通常通过改变像素单元中像素电极的电极条方向来实现双畴显示,但是这种工艺较为复杂。At present, dual-domain display is usually achieved by changing the direction of the electrode strips of the pixel electrodes in the pixel unit, but this process is relatively complicated.
如何以简单的工艺实现能够进行双畴显示的显示装置成为本领域亟待解决的技术问题。How to realize a display device capable of dual-domain display with a simple process has become a technical problem to be solved urgently in this field.
发明内容Contents of the invention
本发明的目的在于提供一种阵列基板、一种包括该阵列基板的显示面板、一种包括该显示面板的显示装置和所述阵列基板的制造方法。仅通过简单改变阵列基板中绝缘层的结构即可使得所述显示装置实现多畴显示。The object of the present invention is to provide an array substrate, a display panel including the array substrate, a display device including the display panel, and a manufacturing method of the array substrate. The display device can realize multi-domain display only by simply changing the structure of the insulating layer in the array substrate.
为了实现上述目的,作为本发明的一个方面,提供一种阵列基板,所述阵列基板被划分为多个像素单元,所述阵列基板包括第一电极层、覆盖该第一电极层的绝缘层和形成在所述绝缘层上的第二电极层,所述第一电极层包括设置在每个所述像素单元内的第一电极,所述绝缘层包括覆盖在每个所述第一电极表面的绝缘层单元,所述第二电极层包括设置在所述绝缘层单元上方的第二电极,其中,在每个所述像素单元内,所述绝缘层单元包括多个绝缘区,至少一个所述绝缘区的介电常数不同于其他所述绝缘区的介电常数。In order to achieve the above object, as one aspect of the present invention, an array substrate is provided, the array substrate is divided into a plurality of pixel units, the array substrate includes a first electrode layer, an insulating layer covering the first electrode layer, and a second electrode layer formed on the insulating layer, the first electrode layer includes a first electrode arranged in each of the pixel units, and the insulating layer includes a first electrode covering the surface of each of the first electrodes An insulating layer unit, the second electrode layer includes a second electrode disposed above the insulating layer unit, wherein, in each of the pixel units, the insulating layer unit includes a plurality of insulating regions, at least one of the The dielectric constant of the insulating region is different from the dielectric constant of the other said insulating regions.
优选地,在每个所述像素单元内,所述绝缘层单元包括第一绝缘区、第二绝缘区和第三绝缘区,所述第一绝缘区和所述第三绝缘区的介电常数相同,所述第二绝缘区的介电常数不同与所述第一绝缘区的介电常数,所述第二绝缘区位于所述第一绝缘区和所述第三绝缘区之间。Preferably, in each pixel unit, the insulating layer unit includes a first insulating region, a second insulating region and a third insulating region, and the dielectric constant of the first insulating region and the third insulating region Similarly, the dielectric constant of the second insulating region is different from that of the first insulating region, and the second insulating region is located between the first insulating region and the third insulating region.
优选地,所述第二绝缘区的面积为所述像素单元面积的一半,所述第一绝缘区和所述第三绝缘区面积相等。Preferably, the area of the second insulating region is half of the area of the pixel unit, and the areas of the first insulating region and the third insulating region are equal.
优选地,在每个所述像素单元内,所述第一绝缘区包括第一底绝缘层和第一顶绝缘层,所述第三绝缘区包括第三底绝缘层和第三顶绝缘层,所述第一底绝缘层、所述第二绝缘区和所述第三底绝缘层形成为一体,所述第一顶绝缘层的介电常数与所述第三顶绝缘层的介电常数相同,所述第一顶绝缘层的顶表面、所述第三顶绝缘层的顶表面以及所述第二绝缘区的顶表面平齐。Preferably, in each pixel unit, the first insulating region includes a first bottom insulating layer and a first top insulating layer, and the third insulating region includes a third bottom insulating layer and a third top insulating layer, The first bottom insulating layer, the second insulating region and the third bottom insulating layer are integrally formed, and the dielectric constant of the first top insulating layer is the same as that of the third top insulating layer , the top surface of the first top insulating layer, the top surface of the third top insulating layer, and the top surface of the second insulating region are even.
优选地,所述第一底绝缘层、所述第二绝缘区和所述第三底绝缘层由硅的氮化物制成,所述第一顶绝缘层和所述第三顶绝缘层由透明的树脂制成。Preferably, the first bottom insulating layer, the second insulating region and the third bottom insulating layer are made of silicon nitride, and the first top insulating layer and the third top insulating layer are made of transparent made of resin.
优选地,所述第一绝缘区的材料与所述第三绝缘区的材料相同,且所述第一绝缘区的材料不同于所述第二绝缘区的材料。Preferably, the material of the first insulating region is the same as that of the third insulating region, and the material of the first insulating region is different from that of the second insulating region.
优选地,所述第一绝缘区由硅的氧化物制成,所述第二绝缘区由硅的氮化物制成。Preferably, the first insulating region is made of silicon oxide, and the second insulating region is made of silicon nitride.
优选地,在每个所述像素单元中,所述第二电极包括第二左电极和第二右电极,所述第二左电极包括多个互相平行的第二左电极条,所述第二右电极包括多个互相平行的第二右电极条,所述第二左电极条和所述第二右电极条的倾斜方向不同。Preferably, in each of the pixel units, the second electrode includes a second left electrode and a second right electrode, the second left electrode includes a plurality of parallel second left electrode strips, the second The right electrode includes a plurality of second right electrode strips parallel to each other, and the inclination directions of the second left electrode strips and the second right electrode strips are different.
优选地,所述第二左电极和所述第二右电极关于所述像素单元的中线镜像对称,所述中线将所述像素单元沿长度方向划分为两部分,所述第二左电极条与所述中线之间的夹角为7°至11°。Preferably, the second left electrode and the second right electrode are mirror-symmetrical about the center line of the pixel unit, the center line divides the pixel unit into two parts along the length direction, and the second left electrode strip and The included angle between the midlines is 7° to 11°.
优选地,所述第一电极为块状电极。Preferably, the first electrode is a bulk electrode.
作为本发明的另一方面,提供一种显示面板,所述显示面板包括阵列基板,其中,所述阵列基板为本发明所提供的上述阵列基板。As another aspect of the present invention, a display panel is provided, and the display panel includes an array substrate, wherein the array substrate is the above-mentioned array substrate provided by the present invention.
作为本发明的再一个方面,提供一种显示装置,所述显示装置包括显示面板,其中,所述显示面板为本发明所提供的上述显示面板。As yet another aspect of the present invention, a display device is provided, and the display device includes a display panel, wherein the display panel is the above-mentioned display panel provided by the present invention.
作为本发明的还一个方面,提供一种阵列基板的制造方法,所述阵列基板被划分为多个像素单元,其中,所述制造方法包括:As yet another aspect of the present invention, a method for manufacturing an array substrate is provided, the array substrate is divided into a plurality of pixel units, wherein the method for manufacturing includes:
形成第一电极层,所述第一电极层包括设置在每个所述像素单元内的第一电极;forming a first electrode layer, the first electrode layer including a first electrode disposed in each of the pixel units;
形成绝缘层,所述绝缘层覆盖所述第一电极层,且所述绝缘层包括覆盖在每个所述第一电极表面的绝缘层单元,在每个所述像素单元内,所述绝缘层单元包括多个绝缘区,至少一个所述绝缘区的介电常数不同于其他所述绝缘区的介电常数;forming an insulating layer, the insulating layer covers the first electrode layer, and the insulating layer includes an insulating layer unit covering the surface of each of the first electrodes, and in each of the pixel units, the insulating layer a cell comprising a plurality of insulating regions, at least one of said insulating regions having a different dielectric constant than the other said insulating regions;
形成第二电极层,所述第二电极层包括设置在所述绝缘层单元上的第二电极。A second electrode layer is formed, the second electrode layer including a second electrode disposed on the insulating layer unit.
优选地,在每个所述像素单元内,所述绝缘层单元包括第一绝缘区、第二绝缘区和第三绝缘区,所述第一绝缘区和所述第三绝缘区的介电常数相同,所述第二绝缘区的介电常数不同与所述第一绝缘区的介电常数,所述第二绝缘区位于所述第一绝缘区和所述第三绝缘区之间。Preferably, in each pixel unit, the insulating layer unit includes a first insulating region, a second insulating region and a third insulating region, and the dielectric constant of the first insulating region and the third insulating region Similarly, the dielectric constant of the second insulating region is different from that of the first insulating region, and the second insulating region is located between the first insulating region and the third insulating region.
优选地,所述第二绝缘区的面积为所述像素单元面积的一半,所述第一绝缘区和所述第三绝缘区面积相等。Preferably, the area of the second insulating region is half of the area of the pixel unit, and the areas of the first insulating region and the third insulating region are equal.
优选地,形成绝缘层的步骤包括:Preferably, the step of forming the insulating layer includes:
形成底绝缘材料层,在每个所述像素单元内,所述底绝缘材料层包括第一底绝缘层、第二绝缘区和第三底绝缘层;forming a bottom insulating material layer, in each of the pixel units, the bottom insulating material layer includes a first bottom insulating layer, a second insulating region and a third bottom insulating layer;
形成顶绝缘材料层,所述顶绝缘材料层包括设置在每个所述像素单元内的顶绝缘材料单元,所述顶绝缘材料单元包括设置在所述第一底绝缘材料层上的第一顶绝缘材料层和设置在所述第三底绝缘层上的第三顶绝缘材料层,所述第一顶绝缘层的介电常数与所述第三顶绝缘层的介电常数相同,所述第一顶绝缘层的顶表面、所述第三顶绝缘层的顶表面以及所述第二绝缘区的顶表面平齐。forming a top insulating material layer, the top insulating material layer including a top insulating material unit arranged in each of the pixel units, the top insulating material unit including a first top insulating material layer arranged on the first bottom insulating material layer an insulating material layer and a third top insulating material layer disposed on the third bottom insulating layer, the dielectric constant of the first top insulating layer is the same as that of the third top insulating layer, and the first top insulating layer A top surface of a top insulating layer, a top surface of the third top insulating layer, and a top surface of the second insulating region are flush.
优选地,所述底绝缘材料层由硅的氮化物制成,所述顶绝缘材料层由透明的树脂制成。Preferably, the bottom insulating material layer is made of silicon nitride, and the top insulating material layer is made of transparent resin.
优选地,形成绝缘层的步骤包括:Preferably, the step of forming the insulating layer includes:
形成第一绝缘材料层;forming a first insulating material layer;
在第一绝缘层上对应于第一绝缘区位置的第一通孔,并在所述第一绝缘层上对应于所述第三绝缘区的位置形成第三通孔,从而利用所述第一绝缘层形成第二绝缘区;A first through hole corresponding to the position of the first insulating region is formed on the first insulating layer, and a third through hole is formed on the first insulating layer corresponding to the position of the third insulating region, thereby utilizing the first The insulating layer forms a second insulating region;
在所述第一通孔中形成所述第一绝缘区,并在所述第三通孔中形成所述第三绝缘区。The first insulating region is formed in the first through hole, and the third insulating region is formed in the third through hole.
优选地,所述第一绝缘区由硅的氧化物制成,所述第二绝缘区由硅的氮化物制成。Preferably, the first insulating region is made of silicon oxide, and the second insulating region is made of silicon nitride.
优选地,在每个所述像素单元中,所述第二电极包括第二左电极和第二右电极,所述第二左电极包括多个互相平行的第二左电极条,所述第二右电极包括多个互相平行的第二右电极条,所述第二左电极条和所述第二右电极条的倾斜方向不同。Preferably, in each of the pixel units, the second electrode includes a second left electrode and a second right electrode, the second left electrode includes a plurality of parallel second left electrode strips, the second The right electrode includes a plurality of second right electrode strips parallel to each other, and the inclination directions of the second left electrode strips and the second right electrode strips are different.
优选地,所述第二左电极和所述第二右电极关于所述像素单元的中线镜像对称,所述中线将所述像素单元沿长度方向划分为两部分,所述第二左电极条与所述中线之间的夹角为7°至11°。Preferably, the second left electrode and the second right electrode are mirror-symmetrical about the center line of the pixel unit, the center line divides the pixel unit into two parts along the length direction, and the second left electrode strip and The included angle between the midlines is 7° to 11°.
优选地,所述第一电极为块状电极。Preferably, the first electrode is a bulk electrode.
由于在每个像素单元中,第一电极和第二电极之间的电场强度与第一电极和第二电极之间的绝缘单元层的介电常数有关,由于绝缘层单元中至少存在一个介电常数不同于其他绝缘区,因此,在一个像素单元中,至少存在两种不同的电场强度,从而可以使得一个像素单元中至少存在两种不同的液晶分子偏转方向,由此可知,本发明所提供的阵列基板可以实现液晶显示面板的多畴显示。Because in each pixel unit, the electric field intensity between the first electrode and the second electrode is related to the dielectric constant of the insulating unit layer between the first electrode and the second electrode, because there is at least one dielectric constant in the insulating layer unit The constant is different from other insulating regions. Therefore, in a pixel unit, there are at least two different electric field strengths, so that there are at least two different deflection directions of liquid crystal molecules in a pixel unit. It can be seen that the present invention provides The array substrate can realize the multi-domain display of the liquid crystal display panel.
在显示装置中,对绝缘层单元尺寸精度要求较低,并且绝缘层单元与电极条相比具有较大的尺寸,因此,通过简单地改变绝缘层单元的结构即可实现多畴液晶显示装置,从而可以降低制造阵列基板的工艺成本。In the display device, the requirement for the dimensional accuracy of the insulating layer unit is low, and the insulating layer unit has a larger size compared with the electrode strips. Therefore, a multi-domain liquid crystal display device can be realized by simply changing the structure of the insulating layer unit, Therefore, the process cost of manufacturing the array substrate can be reduced.
附图说明Description of drawings
附图是用来提供对本发明的进一步理解,并且构成说明书的一部分,与下面的具体实施方式一起用于解释本发明,但并不构成对本发明的限制。在附图中:The accompanying drawings are used to provide a further understanding of the present invention, and constitute a part of the description, together with the following specific embodiments, are used to explain the present invention, but do not constitute a limitation to the present invention. In the attached picture:
图1是本发明所提供的阵列基板的第一种实施方式的剖视示意图;FIG. 1 is a schematic cross-sectional view of a first embodiment of an array substrate provided by the present invention;
图2是本发明所提供的阵列基板的第二种实施方式的剖视示意图;FIG. 2 is a schematic cross-sectional view of a second embodiment of the array substrate provided by the present invention;
图3是本发明所提供的阵列基板的俯视示意图;3 is a schematic top view of the array substrate provided by the present invention;
图4是本发明所提供的显示面板在关闭态(off态)时液晶分子的状态示意图;4 is a schematic diagram of the state of liquid crystal molecules in the off state (off state) of the display panel provided by the present invention;
图5是本发明所提供的显示面板在开启态(on态)时液晶分子的状态示意图。FIG. 5 is a schematic diagram of the state of liquid crystal molecules when the display panel provided by the present invention is in the on state (on state).
附图标记说明Explanation of reference signs
100:第一电极 200:绝缘层单元100: first electrode 200: insulating layer unit
210:第一绝缘区 210a:第一底绝缘层210: first insulating region 210a: first bottom insulating layer
210b:第一顶绝缘层 300:第二电极210b: first top insulating layer 300: second electrode
310:第二左电极条 320:第二右电极310: second left electrode strip 320: second right electrode
410、420、430、440:液晶分子410, 420, 430, 440: liquid crystal molecules
具体实施方式detailed description
以下结合附图对本发明的具体实施方式进行详细说明。应当理解的是,此处所描述的具体实施方式仅用于说明和解释本发明,并不用于限制本发明。Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
作为本发明的一个方面的一个方面,提供一种阵列基板,所述阵列基板被划分为多个像素单元,所述阵列基板包括第一电极层、覆盖该第一电极层的绝缘层和形成在所述绝缘层上的第二电极层,所述第一电极层包括设置在每个所述像素单元内的第一电极100,所述绝缘层包括覆盖在每个第一电极100表面的绝缘层单元200,所述第二电极层包括设置在绝缘层单元200上方的第二电极300,其中,在每个所述像素单元内,绝缘层单元200包括多个绝缘区,至少一个所述绝缘区的介电常数不同于其他所述绝缘区的介电常数。As an aspect of one aspect of the present invention, an array substrate is provided, the array substrate is divided into a plurality of pixel units, the array substrate includes a first electrode layer, an insulating layer covering the first electrode layer, and an insulating layer formed on The second electrode layer on the insulating layer, the first electrode layer includes a first electrode 100 arranged in each of the pixel units, and the insulating layer includes an insulating layer covering the surface of each first electrode 100 Unit 200, the second electrode layer includes a second electrode 300 disposed above the insulating layer unit 200, wherein, in each pixel unit, the insulating layer unit 200 includes a plurality of insulating regions, at least one of the insulating regions The dielectric constant of is different from the dielectric constant of the other said insulating regions.
在液晶显示装置中,根据第一电极和第二电极之间的电场产生的扭转力来驱动液晶分子的偏转。In a liquid crystal display device, liquid crystal molecules are driven to deflect according to a torsional force generated by an electric field between a first electrode and a second electrode.
众所周知的是,介质在外加电场时会产生感应电荷而削弱电场,介质中电场与原外加电场(真空中)的比值即为相对介电常数。介电常数是相对介电常数与真空中绝对介电常数乘积。如果有高介电常数的材料放在电场中,电场的强度会在电介质内有可观的下降。It is well known that when the medium is applied with an electric field, it will generate induced charges and weaken the electric field. The ratio of the electric field in the medium to the original applied electric field (in vacuum) is the relative permittivity. The dielectric constant is the product of the relative permittivity and the absolute permittivity in vacuum. If a material with a high dielectric constant is placed in the electric field, the strength of the electric field will drop appreciably within the dielectric.
向第一电极和第二电极通电时,第一电极和第二电极之间会产生电场,而绝缘层单元200是位于第一电极和第二电极之间的介质。由于绝缘层单元200中至少有一个绝缘区的介电常数不同于其他绝缘区的介电常数,因此,在该介电常数不同于其他绝缘区的绝缘区处,第一电极和第二电极之间的电场强度是不同于其他区域的电场的强度的。When electricity is supplied to the first electrode and the second electrode, an electric field will be generated between the first electrode and the second electrode, and the insulating layer unit 200 is a medium between the first electrode and the second electrode. Since the dielectric constant of at least one insulating region in the insulating layer unit 200 is different from that of other insulating regions, at the insulating region where the dielectric constant is different from other insulating regions, the gap between the first electrode and the second electrode The strength of the electric field between them is different from the strength of the electric field in other regions.
换言之,在一个像素单元中,至少存在两种不同的电场强度,从而可以使得一个像素单元中至少存在两种不同的液晶分子偏转方向,由此可知,本发明所提供的阵列基板可以实现液晶显示面板的多畴显示。In other words, in a pixel unit, there are at least two different electric field strengths, so that there are at least two different deflection directions of liquid crystal molecules in a pixel unit. It can be seen that the array substrate provided by the present invention can realize liquid crystal display Multi-domain display of the panel.
由于在显示装置中,对绝缘层单元尺寸精度要求较低,并且绝缘层单元与电极条相比具有较大的尺寸,因此,通过简单地改变绝缘层单元的结构即可实现多畴液晶显示装置,从而可以降低制造阵列基板的工艺成本。Since in the display device, the requirement for the dimensional accuracy of the insulating layer unit is low, and the insulating layer unit has a larger size compared with the electrode strip, therefore, a multi-domain liquid crystal display device can be realized by simply changing the structure of the insulating layer unit , so that the process cost of manufacturing the array substrate can be reduced.
作为本发明的一中具体实施方式,如图3所示,在每个所述像素单元内,所述绝缘层单元包括第一绝缘区210、第二绝缘区220和第三绝缘区230,第一绝缘区210和第三绝缘区230的介电常数相同,第二绝缘区220的介电常数不同与第一绝缘区210的介电常数,第二绝缘区220位于第一绝缘区210和第三绝缘区230之间。容易理解的是,由于第三绝缘区230的介电常数小于第一绝缘区210的介电常数相同,因此,第二绝缘区220的介电常数也不同于第三绝缘区230的介电常数。As a specific embodiment of the present invention, as shown in FIG. 3, in each pixel unit, the insulating layer unit includes a first insulating region 210, a second insulating region 220, and a third insulating region 230. The dielectric constant of the first insulating region 210 and the third insulating region 230 is the same, the dielectric constant of the second insulating region 220 is different from the dielectric constant of the first insulating region 210, and the second insulating region 220 is located between the first insulating region 210 and the second insulating region 210. Between the three insulating regions 230 . It is easy to understand that since the dielectric constant of the third insulating region 230 is the same as that of the first insulating region 210, the dielectric constant of the second insulating region 220 is also different from that of the third insulating region 230. .
在图3中所示的实施方式中,至少可以实现三畴液晶显示。液晶显示装置中,畴数越多,越能够有效地改善液晶显示装置中的色偏。In the embodiment shown in FIG. 3, at least three-domain liquid crystal display can be realized. In a liquid crystal display device, the larger the number of domains, the more effectively the color shift in the liquid crystal display device can be improved.
作为本发明的一种优选实施方式,第二绝缘区220的面积为所述像素单元面积的一半,第一绝缘区210和第三绝缘区220面积相等。As a preferred embodiment of the present invention, the area of the second insulating region 220 is half of the area of the pixel unit, and the areas of the first insulating region 210 and the third insulating region 220 are equal.
在本发明中,可以通过多种实施方式实现第一绝缘区和第二绝缘区介电常数不同。In the present invention, the dielectric constants of the first insulating region and the second insulating region are different through various implementation methods.
作为本发明的一种优选实施方式,如图1所示,在每个所述像素单元内,第一绝缘区210包括第一底绝缘层210a和第一顶绝缘层210b,所述第三绝缘区包括第三底绝缘层和第三顶绝缘层(未示出),第一底绝缘层210a、第二绝缘区220和所述第三底绝缘层形成为一体,第一顶绝缘层210b的介电常数与所述第三顶绝缘层的介电常数相同,第一顶绝缘层210b的顶表面、所述第三顶绝缘层的顶表面以及第二绝缘区220的顶表面平齐。As a preferred embodiment of the present invention, as shown in FIG. 1, in each pixel unit, the first insulating region 210 includes a first bottom insulating layer 210a and a first top insulating layer 210b, and the third insulating The region includes a third bottom insulating layer and a third top insulating layer (not shown), the first bottom insulating layer 210a, the second insulating region 220 and the third bottom insulating layer are integrally formed, and the first top insulating layer 210b The dielectric constant is the same as that of the third top insulating layer, and the top surface of the first top insulating layer 210b, the top surface of the third top insulating layer and the top surface of the second insulating region 220 are even.
下文中将详细介绍这种实施方式的形成方法,这里不再赘述。The method for forming this embodiment will be described in detail below, and will not be repeated here.
优选地,第一底绝缘层210a、第二绝缘区220和所述第三底绝缘层由硅的氮化物(SiNx)制成,第一顶绝缘层210b和所述第三顶绝缘层由透明的树脂制成。可以利用化学气相沉积法形成硅的氮化物,利用涂布的方法形成所述透明的树脂。由此可知,这种实施方式的绝缘层单元可以降低工艺成本。Preferably, the first bottom insulating layer 210a, the second insulating region 220 and the third bottom insulating layer are made of silicon nitride (SiNx), and the first top insulating layer 210b and the third top insulating layer are made of transparent made of resin. Silicon nitride can be formed by chemical vapor deposition, and the transparent resin can be formed by coating. It can be seen that the insulating layer unit in this embodiment can reduce the process cost.
作为本发明的另一种实施方式,如图2所示,第一绝缘区210的材料与所述第三绝缘区的材料相同,且第一绝缘区210的材料不同于第二绝缘区220的材料。As another embodiment of the present invention, as shown in FIG. 2, the material of the first insulating region 210 is the same as that of the third insulating region, and the material of the first insulating region 210 is different from that of the second insulating region 220. Material.
需要指出的是,在这种实施方式中,第一绝缘区210由同一种材料制成,并且第三绝缘区由同一种材料制成,第二绝缘区220由同一种材料制成。It should be noted that, in this embodiment, the first insulating region 210 is made of the same material, the third insulating region is made of the same material, and the second insulating region 220 is made of the same material.
优选地,所述第一绝缘区由硅的氧化物(SiOx)制成,所述第二绝缘区由硅的氮化物(SiNx)制成。Preferably, the first insulating region is made of silicon oxide (SiOx), and the second insulating region is made of silicon nitride (SiNx).
为了实现更多畴的液晶显示,优选地,如图3所示,在每个所述像素单元中,所述第二电极包括第二左电极和第二右电极,所述第二左电极包括多个互相平行的第二左电极条310,所述第二右电极包括多个互相平行的第二右电极条320,第二左电极条310和第二右电极条320的倾斜方向不同。In order to realize liquid crystal display with more domains, preferably, as shown in FIG. 3 , in each pixel unit, the second electrode includes a second left electrode and a second right electrode, and the second left electrode includes There are a plurality of second left electrode strips 310 parallel to each other, and the second right electrode includes a plurality of second right electrode strips 320 parallel to each other. The second left electrode strips 310 and the second right electrode strips 320 have different inclination directions.
由于第二左电极条310和第二右电极条320的倾斜反向不同,第二左电极与公共电极与第一电极之间产生的电场以及第二右电极与第一电极之间产生的电场不同。再加上绝缘区的介电常数不同,因此,可以实现更多畴的显示。Since the inclinations of the second left electrode strip 310 and the second right electrode strip 320 are different, the electric field generated between the second left electrode and the common electrode and the first electrode and the electric field generated between the second right electrode and the first electrode different. In addition, the dielectric constants of the insulating regions are different, so more domains can be displayed.
为了便于制造以及便于涉及并使得像素单元中产生的电场更加均匀,优选地,所述第二左电极和所述第二右电极关于所述像素单元的中线M镜像对称。如图3所示,中线M将像素单元的长度方向分为两部分。第二左电极条310与中线M之间的夹角大小为α,第二右电极条320与中线M之间的夹角大小也为α。优选地,7°≤α≤11°。In order to facilitate manufacturing and reference and make the electric field generated in the pixel unit more uniform, preferably, the second left electrode and the second right electrode are mirror-symmetrical about the centerline M of the pixel unit. As shown in FIG. 3 , the middle line M divides the length direction of the pixel unit into two parts. The included angle between the second left electrode strip 310 and the midline M is α, and the included angle between the second right electrode strip 320 and the midline M is also α. Preferably, 7°≤α≤11°.
如图3中所示,第二左电极的一部分位于第一绝缘区210上,第二左电极的另一部分位于第二绝缘区220上,第二右电极的一部分位于第二绝缘区220上,第二右电极的另一部分位于第三绝缘区230上,因此,图3中所示的显示装置可以实现四畴液晶显示。As shown in FIG. 3, a part of the second left electrode is located on the first insulating region 210, another part of the second left electrode is located on the second insulating region 220, and a part of the second right electrode is located on the second insulating region 220, Another part of the second right electrode is located on the third insulating region 230, therefore, the display device shown in FIG. 3 can realize four-domain liquid crystal display.
图1和图2中所示的剖视图是图3中所示的像素单元的A-A剖视图。The sectional views shown in FIGS. 1 and 2 are A-A sectional views of the pixel unit shown in FIG. 3 .
如图4所示,当显示面板处于关闭态时,液晶分子均不发生偏转。As shown in FIG. 4 , when the display panel is in the off state, the liquid crystal molecules are not deflected.
如图5所示,当显示面板处于开启态时,一个像素单元中形成四种不同强度的电场。第二左电极位于第一绝缘区上的部分与第一电极之间产生的电场为E1,第二左电极位于第二绝缘区上的部分与第一电极之间产生的电场为E2,第二右电极位于第二绝缘区上的部分与第一电极之间产生的电场为E3,第二右电极位于第三绝缘区上的部分与第一电极之间产生的电场为E4。因此,电场E1对应的一组液晶分子410的偏转方向、电场E2对应的一组液晶分子420的偏转方向、电场E3对应的一组液晶分子430的偏转反向以及电场E4对应的一组液晶分子的偏转反向互不相同,即,当所述显示面板处于开启态时,一个像素单元中液晶分子具有四种偏转方向,即,可以实现四畴显示。As shown in FIG. 5 , when the display panel is in an on state, four electric fields with different intensities are formed in one pixel unit. The electric field generated between the part of the second left electrode on the first insulating region and the first electrode is E1, the electric field generated between the part of the second left electrode on the second insulating region and the first electrode is E2, and the second The electric field generated between the part of the right electrode on the second insulating region and the first electrode is E3, and the electric field generated between the part of the second right electrode on the third insulating region and the first electrode is E4. Therefore, the deflection direction of a group of liquid crystal molecules 410 corresponding to the electric field E1, the deflection direction of a group of liquid crystal molecules 420 corresponding to the electric field E2, the deflection direction of a group of liquid crystal molecules 430 corresponding to the electric field E3, and the deflection direction of a group of liquid crystal molecules 430 corresponding to the electric field E4 The deflection directions are different from each other, that is, when the display panel is in the on state, the liquid crystal molecules in one pixel unit have four deflection directions, that is, four-domain display can be realized.
通常,第一电极100为块状电极。Usually, the first electrode 100 is a bulk electrode.
在本发明中,第一电极可以为公共电极,第二电极可以为像素电极。In the present invention, the first electrode may be a common electrode, and the second electrode may be a pixel electrode.
作为本发明的另一个方面,提供一种显示面板,所述显示面板包括阵列基板,其中,所述阵列基板为本发明所提供的上述阵列基板。As another aspect of the present invention, a display panel is provided, and the display panel includes an array substrate, wherein the array substrate is the above-mentioned array substrate provided by the present invention.
由于所述阵列基板的制造工艺简单,且成本低,因此,而已利用简单的制造工艺获得多畴显示的显示面板。Since the manufacturing process of the array substrate is simple and the cost is low, a multi-domain display panel has been obtained by using a simple manufacturing process.
作为本发明的再一个方面,提供一种显示装置,所述显示装置包括显示面板,其中,所述显示面板为本发明所提供的上述显示面板。As yet another aspect of the present invention, a display device is provided, and the display device includes a display panel, wherein the display panel is the above-mentioned display panel provided by the present invention.
所述显示装置可以是手机、电脑、电视等显示装置。The display device may be a display device such as a mobile phone, a computer, or a television.
作为本发明的还一个方面,提供一种阵列基板的制造方法,所述阵列基板被划分为多个像素单元,其中,所述制造方法包括:As yet another aspect of the present invention, a method for manufacturing an array substrate is provided, the array substrate is divided into a plurality of pixel units, wherein the method for manufacturing includes:
形成第一电极层,所述第一电极层包括设置在每个所述像素单元内的第一电极;forming a first electrode layer, the first electrode layer including a first electrode disposed in each of the pixel units;
形成绝缘层,所述绝缘层覆盖所述第一电极层,且所述绝缘层包括覆盖在每个所述第一电极表面的绝缘层单元,在每个所述像素单元内,所述绝缘层单元包括多个绝缘区,至少一个所述绝缘区的介电常数不同于其他所述绝缘区的介电常数;forming an insulating layer, the insulating layer covers the first electrode layer, and the insulating layer includes an insulating layer unit covering the surface of each of the first electrodes, and in each of the pixel units, the insulating layer a cell comprising a plurality of insulating regions, at least one of said insulating regions having a different dielectric constant than the other said insulating regions;
形成第二电极层,所述第二电极层包括设置在所述绝缘层单元上的第二电极。A second electrode layer is formed, the second electrode layer including a second electrode disposed on the insulating layer unit.
与形成具有多种不同倾斜方向的电极条相比,形成具有多个绝缘区的绝缘层单元工艺更为简单。Compared with forming electrode strips with various inclination directions, the process of forming an insulating layer unit with multiple insulating regions is simpler.
如上文中所述,在每个所述像素单元内,所述绝缘层单元包括第一绝缘区、第二绝缘区和第三绝缘区,所述第一绝缘区和所述第三绝缘区的介电常数相同,所述第二绝缘区的介电常数不同与所述第一绝缘区的介电常数,所述第二绝缘区位于所述第一绝缘区和所述第三绝缘区之间。As mentioned above, in each of the pixel units, the insulating layer unit includes a first insulating region, a second insulating region and a third insulating region, and the insulating region between the first insulating region and the third insulating region The dielectric constants are the same, the dielectric constant of the second insulating region is different from that of the first insulating region, and the second insulating region is located between the first insulating region and the third insulating region.
如上文中所述,作为本发明的一种实施方式,所述第二绝缘区的面积为所述像素单元面积的一半,所述第一绝缘区和所述第三绝缘区面积相等。As mentioned above, as an embodiment of the present invention, the area of the second insulating region is half of the area of the pixel unit, and the areas of the first insulating region and the third insulating region are equal.
为了实现图1中所示的实施方式,优选地,形成绝缘层的步骤包括:In order to realize the embodiment shown in FIG. 1, preferably, the step of forming the insulating layer includes:
形成底绝缘材料层,在每个所述像素单元内,所述底绝缘材料层包括第一底绝缘层、第二绝缘区和第三底绝缘层;forming a bottom insulating material layer, in each of the pixel units, the bottom insulating material layer includes a first bottom insulating layer, a second insulating region and a third bottom insulating layer;
形成顶绝缘材料层,所述顶绝缘材料层包括设置在每个所述像素单元内的顶绝缘材料单元,所述顶绝缘材料单元包括设置在所述第一底绝缘材料层上的第一顶绝缘材料层和设置在所述第三底绝缘层上的第三顶绝缘材料层,所述第一顶绝缘层的介电常数与所述第三顶绝缘层的介电常数相同,所述第一顶绝缘层的顶表面、所述第三顶绝缘层的顶表面以及所述第二绝缘区的顶表面平齐。forming a top insulating material layer, the top insulating material layer including a top insulating material unit arranged in each of the pixel units, the top insulating material unit including a first top insulating material layer arranged on the first bottom insulating material layer an insulating material layer and a third top insulating material layer disposed on the third bottom insulating layer, the dielectric constant of the first top insulating layer is the same as that of the third top insulating layer, and the first top insulating layer A top surface of a top insulating layer, a top surface of the third top insulating layer, and a top surface of the second insulating region are flush.
在本发明中,可以通过干刻工艺形成底绝缘材料层。具体地,首先形成一层底绝缘材料;在底绝缘材料上形成掩膜层,该掩膜层上对应于第一底绝缘层和第二底绝缘层的位置分别形成有通孔;通入工艺气体,通过控制通入工艺气体的持续时间可以形成第一底绝缘层、第二绝缘区和第三底绝缘层。In the present invention, the bottom insulating material layer may be formed by a dry etching process. Specifically, a layer of bottom insulating material is first formed; a mask layer is formed on the bottom insulating material, and through holes are respectively formed on the mask layer corresponding to the positions of the first bottom insulating layer and the second bottom insulating layer; the access process gas, and the first bottom insulating layer, the second insulating region and the third bottom insulating layer can be formed by controlling the duration of feeding the process gas.
优选地,所述底绝缘材料层由硅的氮化物制成,所述顶绝缘材料层由透明的树脂制成。Preferably, the bottom insulating material layer is made of silicon nitride, and the top insulating material layer is made of transparent resin.
为了形成图2中所示的实施方式,优选地,形成绝缘层的步骤包括:In order to form the embodiment shown in FIG. 2, preferably, the step of forming the insulating layer includes:
形成第一绝缘材料层;forming a first insulating material layer;
在第一绝缘层上对应于第一绝缘区位置的第一通孔,并在所述第一绝缘层上对应于所述第三绝缘区的位置形成第三通孔,从而利用所述第一绝缘层形成第二绝缘区;A first through hole corresponding to the position of the first insulating region is formed on the first insulating layer, and a third through hole is formed on the first insulating layer corresponding to the position of the third insulating region, thereby utilizing the first The insulating layer forms a second insulating region;
在所述第一通孔中形成所述第一绝缘区,并在所述第三通孔中形成所述第三绝缘区。The first insulating region is formed in the first through hole, and the third insulating region is formed in the third through hole.
也可以通过干刻工艺形成第一通孔和第三通孔,具体工艺与上文中形成第一底绝缘层、第二绝缘区和第三底绝缘层的工艺类似,这里不再赘述。The first through hole and the third through hole may also be formed by a dry etching process. The specific process is similar to the process of forming the first bottom insulating layer, the second insulating region and the third bottom insulating layer above, and will not be repeated here.
优选地,所述第一绝缘区由硅的氧化物制成,所述第二绝缘区由硅的氮化物制成。Preferably, the first insulating region is made of silicon oxide, and the second insulating region is made of silicon nitride.
如上文中所述,优选地,在每个所述像素单元中,所述第二电极包括第二左电极和第二右电极,所述第二左电极包括多个互相平行的第二左电极条,所述第二右电极包括多个互相平行的第二右电极条,所述第二左电极条和所述第二右电极条的倾斜方向不同。As mentioned above, preferably, in each of the pixel units, the second electrode includes a second left electrode and a second right electrode, and the second left electrode includes a plurality of parallel second left electrode strips , the second right electrode includes a plurality of second right electrode strips parallel to each other, and the second left electrode strips and the second right electrode strips have different inclination directions.
如上文中所述,优选地,所述第二左电极和所述第二右电极关于所述像素单元的中线镜像对称,所述中线将所述像素单元沿长度方向划分为两部分,所述第二左电极条与所述中线之间的夹角为7°至11°。容易理解的是,由于第二左电极和第二右电极关于所述像素单元的中线镜像对称,那么,所述第二左电极条与所述中线之间的夹角与所述第二右电极条与所述中线之间的夹角大小是相等的。As mentioned above, preferably, the second left electrode and the second right electrode are mirror-symmetrical about the center line of the pixel unit, the center line divides the pixel unit into two parts along the length direction, and the first The angle between the two left electrode strips and the midline is 7° to 11°. It is easy to understand that since the second left electrode and the second right electrode are mirror-symmetrical with respect to the center line of the pixel unit, the angle between the second left electrode strip and the center line is the same as that of the second right electrode The angles between the bars and the midline are equal in size.
如上文中所述,优选地,所述第一电极为块状电极。As mentioned above, preferably, the first electrode is a bulk electrode.
在本发明中,可以利用与传统构图工艺相同的构图工艺形成第一电极和第二电极。In the present invention, the first electrode and the second electrode can be formed using the same patterning process as the conventional patterning process.
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。It can be understood that, the above embodiments are only exemplary embodiments adopted for illustrating the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.
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