CN104730087B - Observe the device of bubble in quartz glass crucibles hyaline layer - Google Patents
Observe the device of bubble in quartz glass crucibles hyaline layer Download PDFInfo
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- CN104730087B CN104730087B CN201510111215.5A CN201510111215A CN104730087B CN 104730087 B CN104730087 B CN 104730087B CN 201510111215 A CN201510111215 A CN 201510111215A CN 104730087 B CN104730087 B CN 104730087B
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- Prior art keywords
- guide rail
- observation
- bubble
- hyaline layer
- quartz glass
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 210000004276 hyalin Anatomy 0.000 title claims abstract description 27
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 37
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000004364 calculation method Methods 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 230000002547 anomalous effect Effects 0.000 claims abstract description 10
- 239000013307 optical fiber Substances 0.000 claims abstract description 4
- 239000010453 quartz Substances 0.000 claims description 10
- 238000011017 operating method Methods 0.000 claims description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 239000010438 granite Substances 0.000 claims description 3
- 239000004579 marble Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 2
- 238000005259 measurement Methods 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 239000006004 Quartz sand Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052916 barium silicate Inorganic materials 0.000 description 1
- HMOQPOVBDRFNIU-UHFFFAOYSA-N barium(2+);dioxido(oxo)silane Chemical compound [Ba+2].[O-][Si]([O-])=O HMOQPOVBDRFNIU-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention discloses a kind of device for observing bubble in quartz glass crucibles hyaline layer, silica crucible placement platform is set on assistance platform pedestal, vertical fixed guide rail is fixedly connected on the side of pedestal, horizontal anomalous movement guide rail is connected on vertical fixed guide rail, horizontal anomalous movement guide rail front end is connected with Vertical movements guide rail, the lower end of Vertical movements guide rail is equipped with connecting rod, and connecting rod is inserted in matched motor-driven lenses support, and zoom lens is assemblied on motor-driven lenses support；Zoom lens is connected by optical fiber with calculation display, and motor-driven lenses support is connected by cable with calculation display.The invention has the advantages that：Microbubble quantity, volume etc. in quartz glass crucibles hyaline layer can accurately be measured；Measurement process will not be polluted and destroyed to silica crucible；The optional position of quartz glass crucibles inner transparency layer can be observed by the three-dimensional regulation of assistance platform.
Description
Technical field
It can be used to observe air bubble content and the device of size in transparency silica glass crucible the present invention relates to a kind of, be applied to
Crystal growth can be used for the vacuum transparent layer of observation silica crucible with translucent silica crucible field, this device.
Background technology
Quartz glass crucibles load container as silicon material, are the important auxiliaries in silicon single crystal rod production, in photovoltaic and partly lead
Bulk single crystal si industry has substantial amounts of application.The quality of quartz glass crucibles directly influences monocrystalline silicon quality, and then has influence on
The performance of final products solar cell and semiconductor devices.In recent years, the dog-eat-dog of solar photovoltaic industry, silicon single crystal rod
Manufacturing enterprise is also constantly reducing into original holding enterprise competitiveness, such as takes single stove persistently to feed many silicon rods of drawing to improve
The measures such as efficiency.Therefore quartz glass crucibles also need higher quality to meet the requirement of monocrystalline silicon production enterprise.Hyaline layer
Bubble improvement is silica crucible manufacturing enterprise in an important directions being continually striving to.According to disclosed known technology, quartz
The manufacturing process of glass pot typically uses vacuum arc Process.Utilize based on centrifugal forming, using moulding stick, make stone
Sand powder is preforming in the graphite jig cavity for vacuumizing stomata（Graphite jig is inserted in metal water-cooling set）, and
Start to vacuumize.Then by the graphite electrode starting the arc and insert in molded quartz sand powder cavity, by high-temperature electric arc to base
Body carries out calcination, makes its rapid melting into the vitreous silica of crucible shape.Wherein stop vacuumizing after melting starts 3 ~ 5min.
After quartz glass crucibles cooling after take out, that is, complete a blank production, then it is cleaved it is clean wait handle after carry out inner surface
Spraying forms coating, and then completes the making of a quartz glass crucibles finished product.
The vacuum transparent layer of silica crucible is initially formed after the starting the arc, and required thickness is reached after 3 ~ 5min.Vacuum transparent layer
In forming process, due to there is the reasons such as gap, evacuation process design and impurity pollution between quartz sand particle, it can produce
Some raw bubbles.Wherein larger bubble, visually can distinguish and judge；The microbubble that some minimum naked eyes difficulties are shown in（Typically
Below 0.5mm）, just can not observe and distinguish.But these micro-bubble majorities are enriched in 0 ~ 500um below hyaline layer top layer
Area, during quartz glass crucibles long-time crystal pulling use, constantly expansion can become big, or even be spilled over to inner surface of crucible,
Molten silicon corrodes lower rupture, and the gaseous impurity of the interior parcel of bubble, which can dissolve in, may influence silicon rod quality in silicon liquid.If a large amount of small
Bubble ruptures in quartz crucible surface, can also destroy the barium crystallizing layer of coating.The barium silicate crystallizing layer of quartz crucible surface is played
The molten silicon of barrier protects the effect of silica crucible, and table in silica crucible is likely to result in after being destroyed and produces the bad of Pinhole-shaped siliconising
Phenomenon, also results in coating shedding when serious, can have a strong impact on single crystal growth process, reduces yield rate.Therefore, a kind of see is developed
The bubble density of crucible hyaline layer is surveyed, the method and apparatus of top layer microbubble density are anticipated to management and control and improvement silica crucible quality
Justice is great.
The content of the invention
It is an object of the invention to provide one kind noncontact and it is lossless under the conditions of, effectively observation quartz glass crucibles are different
The device for observing bubble in quartz glass crucibles hyaline layer of microbubble in location transparency layer.
The present invention technical solution be：
A kind of device for observing bubble in quartz glass crucibles hyaline layer, it is characterized in that：Including assistance platform pedestal, auxiliary
Silica crucible placement platform is set on platform base, and vertical fixed guide rail is fixedly connected on the side of pedestal, horizontal anomalous movement guide rail
It is connected on vertical fixed guide rail, horizontal anomalous movement guide rail front end is connected with Vertical movements guide rail, the lower end dress of Vertical movements guide rail
There is connecting rod, connecting rod is inserted in matched motor-driven lenses support, and zoom lens is assemblied on motor-driven lenses support；Become
Zoom lens are connected by optical fiber with calculation display, and motor-driven lenses support is connected by cable with calculation display.
Zoom lens is the camera lens of the digit microscope with the three-dimensional micrometering function of the super depth of field；It is three-dimensional with the super depth of field
The digit microscope of micrometering function selects the VHX-2000C that KEYENCE is produced, the microminiature high-performance of 20 ~ 200 times of matching
Zoom lens VH-Z20W.
The assistance platform pedestal selects SUS304, granite or marble.
The silica crucible placement platform on assistance platform pedestal, states silica crucible placement by assistance platform guide rail
Platform avoids debris from falling into inside silica crucible using protective cover.
The mobile of the assistance platform guide rail adjusts using electronic mode
The assistance platform guide material uses the stainless steel of chromium plating process.
Connecting rod on the Vertical movements guide rail is angle adjustable pattern, can adjust zoom lens to silica crucible
Side wall, corner and bottom.
Observe operating procedure：
（1）Switch on power unlatching whole system, and the push button of regulation Vertical movements guide rail makes it rise to highest order；
（2）By adjusting the direction that connecting rod makes zoom lens be observed needed for calibrating to, such as regulation to horizontal level observation
Quartz crucible lateral wall hyaline layer bubble；
（3）Silica crucible to be measured is placed on silica crucible placement platform, regulation horizontal anomalous movement guide rail and Vertical movements
Guide rail makes zoom lens close to observation position；
（4）The enlargement ratio of zoom lens is set, observes that silica crucible hyaline layer will by regulating calculation display
The depth location of observation is sought, the size of bubble on photo is calculated after taking pictures by software；
（5）When observing Quartz crucible lateral wall other positions, rotatable silica crucible and regulation Vertical movements guide rail reach institute
Need position.When need to observe the positions such as corner, bottom, connecting rod need to be adjusted to required angle, then repeat step（4）.
The invention has the advantages that：Microbubble quantity, volume etc. in quartz glass crucibles hyaline layer can accurately be measured；Measurement
Process will not be polluted and destroyed to silica crucible；It can be observed by the three-dimensional regulation of assistance platform in quartz glass crucibles
The optional position of portion's hyaline layer.
Brief description of the drawings
The invention will be further described with reference to the accompanying drawings and examples.
Fig. 1 is overall structure diagram of the invention；
Fig. 2 is the observation figure using present invention observation silica crucible hyaline layer microbubble.
Embodiment
A kind of device for observing bubble in quartz glass crucibles hyaline layer, including assistance platform pedestal 4, assistance platform pedestal
Upper setting silica crucible placement platform 5, vertical fixed guide rail 6 is fixedly connected on the side of pedestal, and horizontal anomalous movement guide rail 7 is connected to
On vertical fixed guide rail, horizontal anomalous movement guide rail front end is connected with Vertical movements guide rail 8, and the lower end of Vertical movements guide rail is equipped with connection
Bar 9, connecting rod is inserted in matched motor-driven lenses support 2 ［ can carry out horizontal direction, vertical direction movement, ］, is become
Zoom lens 1 are assemblied on motor-driven lenses support 2；Zoom lens is connected by optical fiber with calculation display, and motor-driven lenses support leads to
Cable is crossed to be connected with calculation display 3.
Zoom lens is the camera lens of the digit microscope with the three-dimensional micrometering function of the super depth of field；It is three-dimensional with the super depth of field
The digit microscope of micrometering function selects the VHX-2000C that KEYENCE is produced, the microminiature high-performance of 20 ~ 200 times of matching
Zoom lens VH-Z20W.
The assistance platform pedestal selects SUS304, granite or marble.
The silica crucible placement platform on assistance platform pedestal, states silica crucible placement by assistance platform guide rail
Platform avoids debris from falling into inside silica crucible using protective cover.
The mobile of the assistance platform guide rail adjusts using electronic mode
The assistance platform guide material uses the stainless steel of chromium plating process.
Connecting rod on the Vertical movements guide rail is angle adjustable pattern, can adjust zoom lens to silica crucible
Side wall, corner and bottom.
Observe operating procedure：
（1）Switch on power unlatching whole system, and the push button of regulation Vertical movements guide rail makes it rise to highest order；
（2）By adjusting the direction that connecting rod makes zoom lens be observed needed for calibrating to, such as regulation to horizontal level observation
Quartz crucible lateral wall hyaline layer bubble；
（3）Silica crucible to be measured is placed on silica crucible placement platform, regulation horizontal anomalous movement guide rail and Vertical movements
Guide rail makes zoom lens close to observation position；
（4）The enlargement ratio of zoom lens is set, observes that silica crucible hyaline layer will by regulating calculation display
The depth location of observation is sought, the size of bubble on photo is calculated after taking pictures by software；
（5）When observing Quartz crucible lateral wall other positions, rotatable silica crucible and regulation Vertical movements guide rail reach institute
Need position.When need to observe the positions such as corner, bottom, connecting rod need to be adjusted to required angle, then repeat step（4）.
Claims (7)
1. a kind of observation operating method for observing the device of bubble in quartz glass crucibles hyaline layer, it is characterized in that：The observation
The device of bubble includes setting silica crucible to place on assistance platform pedestal, assistance platform pedestal in quartz glass crucibles hyaline layer
Platform, vertical fixed guide rail is fixedly connected on the side of pedestal, and horizontal anomalous movement guide rail is connected on vertical fixed guide rail, and level is lived
Dynamic guide rail front end is connected with Vertical movements guide rail, and the lower end of Vertical movements guide rail is equipped with connecting rod, and connecting rod inserts phase therewith
In the motor-driven lenses support matched somebody with somebody, zoom lens is assemblied on motor-driven lenses support；Zoom lens passes through optical fiber and calculation display
Connection, motor-driven lenses support is connected by cable with calculation display；
Observe operating procedure：
(1) switch on power unlatching whole system, and the push button of regulation Vertical movements guide rail makes it rise to highest order；
(2) by adjusting the direction that connecting rod makes zoom lens be observed needed for calibrating to, such as regulation to horizontal level observes quartz
Crucible wall hyaline layer bubble；
(3) silica crucible to be measured is placed on silica crucible placement platform, regulation horizontal anomalous movement guide rail and Vertical movements guide rail
Make zoom lens close to observation position；
(4) enlargement ratio of zoom lens is set, observes that the requirement of silica crucible hyaline layer is seen by regulating calculation display
The depth location of survey, calculates the size of bubble on photo by software after taking pictures；
(5) when observing Quartz crucible lateral wall other positions, rotate silica crucible and regulation Vertical movements guide rail reaches required position；
When need to observe the positions such as corner, bottom, connecting rod need to be adjusted to required angle, then repeat step (4).
2. the observation operating method of the device of bubble in observation quartz glass crucibles hyaline layer according to claim 1, its
It is characterized in：Zoom lens is the camera lens of the digit microscope with the three-dimensional micrometering function of the super depth of field；It is three-dimensional with the super depth of field
The digit microscope of micrometering function selects the VHX-2000C that KEYENCE is produced, the high property of microminiature of 20~200 times of matching
Can zoom lens VH-Z20W.
3. the observation operating method of the device of bubble in observation quartz glass crucibles hyaline layer according to claim 1, its
It is characterized in：The assistance platform pedestal selects SUS304, granite or marble.
4. the observation operating method of the device of bubble in observation quartz glass crucibles hyaline layer according to claim 1, its
It is characterized in：The silica crucible placement platform is mounted on assistance platform pedestal by assistance platform guide rail, and silica crucible is put
Horizontalization platform can do X guide rails to moving along guide rail；Silica crucible placement platform is stated using protective cover to avoid debris from falling into stone
Inside English crucible.
5. the observation operating method of the device of bubble in observation quartz glass crucibles hyaline layer according to claim 4, its
It is characterized in：The mobile of the assistance platform guide rail is adjusted using electronic mode.
6. the observation operating method of the device of bubble in observation quartz glass crucibles hyaline layer according to claim 4, its
It is characterized in：The assistance platform guide material uses the stainless steel of chromium plating process.
7. the observation operation of the device of bubble in the observation quartz glass crucibles hyaline layer according to claim 1,2,3 or 4
Method, it is characterized in that：Connecting rod on the Vertical movements guide rail is angle adjustable pattern, can adjust zoom lens to quartz
Side wall, corner and the bottom of crucible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510111215.5A CN104730087B (en) | 2014-12-12 | 2015-03-16 | Observe the device of bubble in quartz glass crucibles hyaline layer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2014107602721 | 2014-12-12 | ||
| CN201410760272 | 2014-12-12 | ||
| CN201510111215.5A CN104730087B (en) | 2014-12-12 | 2015-03-16 | Observe the device of bubble in quartz glass crucibles hyaline layer |
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| CN104730087A CN104730087A (en) | 2015-06-24 |
| CN104730087B true CN104730087B (en) | 2017-09-08 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107543824B (en) * | 2016-06-23 | 2022-03-22 | 中国科学院长春光学精密机械与物理研究所 | Surface defect detection device and detection method of flat optical element |
| CN109191440A (en) * | 2018-08-24 | 2019-01-11 | 上海应用技术大学 | Glass blister detection and method of counting |
| CN109584259B (en) * | 2019-01-18 | 2021-10-01 | 赵谦 | Quartz crucible bubble layered counting device and method |
| CN109827962A (en) * | 2019-03-15 | 2019-05-31 | 浙江飞哲工贸有限公司 | A kind of method and apparatus for detecting aluminium alloy melt hydrogen content |
| CN112147710B (en) * | 2019-06-26 | 2022-02-18 | 上海微电子装备（集团）股份有限公司 | Detection method and detection device of wet-process optical cement device |
| CN119245538A (en) * | 2024-12-04 | 2025-01-03 | 杭州利珀科技股份有限公司 | Quartz glass crucible visual inspection system and inspection method based on binocular vision |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0813340B2 (en) * | 1989-08-30 | 1996-02-14 | 三菱マテリアル株式会社 | Optical nondestructive inspection method for quartz crucible and its equipment |
| FR2742865B1 (en) * | 1995-12-22 | 1998-01-16 | Saint Gobain Cinematique | METHOD FOR CHECKING A GLASS CONTAINER |
| JP2001027613A (en) * | 1999-07-13 | 2001-01-30 | Toshiba Ceramics Co Ltd | Apparatus for detecting foreign matter in transparent body ingot and method for manufacturing transparent body using the same |
| KR20060003731A (en) * | 2004-07-07 | 2006-01-11 | 윈텍 주식회사 | Display glass disc inspection device and method |
| CN101750422A (en) * | 2010-01-07 | 2010-06-23 | 秦皇岛凯维科技有限公司 | On-line automatic detection device for glass defect |
| CN102183530A (en) * | 2011-05-02 | 2011-09-14 | 苏州工业园区高登威科技有限公司 | Adjustable charge coupled device (CCD) optical check device |
| CN104145051B (en) * | 2011-12-22 | 2018-08-10 | 株式会社Sumco | The evaluation method of silica glass crucible, the manufacturing method of monocrystalline silicon |
| CN202643923U (en) * | 2012-05-19 | 2013-01-02 | 鸿福晶体科技(安徽)有限公司 | Device for observing crystal growth situation |
| CN202994684U (en) * | 2012-12-09 | 2013-06-12 | 滁州德丰高科机械有限公司 | Air bubble detection device for glass production |
| CN203275317U (en) * | 2013-05-20 | 2013-11-06 | 浙江矽盛电子有限公司 | Detection device of quartz crucible |
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Address after: When the industrial park of Nantong city in Jiangsu Province Haimen 226100 Applicant after: NANTONG ROBUST QUARTZ MATERIAL CO.,LTD. Address before: When the industrial park of Nantong city in Jiangsu Province Haimen 226100 Applicant before: Nantong Robust Quartz Material Co.,Ltd. |
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Effective date of registration: 20200820 Address after: 200120 building C, No. 888, Huanhu West 2nd Road, Lingang xinpian District, Pudong New Area, Shanghai Patentee after: Shanghai hengmujing New Material Co.,Ltd. Address before: When the industrial park of Nantong city in Jiangsu Province Haimen 226100 Patentee before: NANTONG ROBUST QUARTZ MATERIAL Co.,Ltd. |
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Effective date of registration: 20230510 Address after: 661100 Intersection of No.5 Road and Honghe Avenue, Mengzi Economic Development Zone, Honghe Hani and Yi Autonomous Prefecture, Yunnan Province Patentee after: Honghe Bangde New Materials Co.,Ltd. Address before: 200120 building C, No. 888, Huanhu West 2nd Road, Lingang xinpian District, Pudong New Area, Shanghai Patentee before: Shanghai hengmujing New Material Co.,Ltd. |