CN104695209A - Novel antibacterial textile fabric preparation method - Google Patents

Abstract

The invention discloses a preparation method of a novel antibacterial textile fabric, which belongs to the field of textile processing. In the present invention, nano-silver and nano-titanium dioxide particles are respectively sputtered onto the fabric substrate by magnetron sputtering technology to form a uniform nano-composite film covering the fibers to obtain antibacterial fabrics. The preparation process includes: 1. Fabric pretreatment : Cleaning and drying; 2. Sputtering nanoparticles: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 40-100mm; use a water cooling device to cool the substrate ; The reaction chamber is evacuated to the background vacuum, and then flushed with a volume fraction of 99.999% high-purity argon as a sputtering gas. The method of the invention has the advantages of simple processing, easy manipulation, low cost, high efficiency, energy saving and no pollution, and is convenient for realizing industrialized production. The invention combines nano-silver and nano- _TiO2 to prepare antibacterial textile fabrics, greatly improves the antibacterial performance of the material, and provides a new idea and a new method for the preparation of antibacterial fabrics.

Description

A kind of preparation method of novel antibacterial textile fabric

technical field

The invention relates to a textile fabric, in particular to a preparation method of a novel antibacterial textile fabric, which belongs to the field of textile processing.

Background technique

Microbes play a vital role in the material cycle in nature. In the environment of human life, microbes are everywhere, and people are dealing with microbes all the time in their lives. At the same time, some microorganisms also threaten human health, even life-threatening. Textiles are the most contacted materials for human beings. In the process of contact with them, human sweat, sebum and other secretions become a good source of nutrition for various microorganisms. Under suitable external conditions (including humidity, temperature, etc.) Under the environment, microorganisms grow rapidly, multiply, and spread diseases through various channels, threatening the survival and development of human beings themselves. With the rapid development of industry and the improvement of people's living standards, people's requirements for quality of life are getting higher and higher, and they pay more and more attention to environmental hygiene and self-health. Therefore, antibacterial sanitary textiles are getting more and more attention.

Some commonly used organic antibacterial materials have weak antibacterial properties, poor heat resistance and stability, self-decomposition products and volatiles may be harmful to the human body, and are not suitable for high-temperature processing. , Inorganic antibacterial materials with good safety are replaced. Nano antibacterial agent is a new type of antibacterial product developed on the basis of nanotechnology, which has excellent antibacterial effect that cannot be compared with traditional inorganic antibacterial agents. Nano-silver and TiO ₂ are two kinds of inorganic antibacterial materials that have developed rapidly in recent years. Due to their excellent antibacterial properties, safety, non-toxicity, and no secondary pollution, they have been widely used in textiles and sanitary products. application prospects.

Magnetron sputtering technology is a relatively mature technology for preparing high-quality thin films. The film prepared by magnetron sputtering technology has a uniform and dense film structure, excellent performance, high adhesion fastness between the film and the substrate material, fast deposition speed, easy to sputter any substance, does not change the nature of the substrate, has no environmental pollution, and is easy to sputter. Realize the advantages of industrialization, so this technology has significant advantages in the application of conductivity, antistatic, antireflective coating, antibacterial and other aspects.

Contents of the invention

The primary purpose of the present invention is to provide a method for preparing a novel antibacterial textile fabric, which is required to have excellent antibacterial performance, and at the same time, the method is simple in processing, easy to control, low in cost, high in energy saving, pollution-free, and convenient for industrialized production.

The technical scheme of the present invention is to sputter nano-silver and nano-titanium dioxide particles onto the fabric base material respectively by magnetron sputtering technology to form a uniform nano-composite film covering the fiber to obtain an antibacterial fabric. Specific steps are as follows:

1. Fabric pretreatment

Put the fabric substrate into the acetone solution and wash it with an ultrasonic cleaner for 30-60 minutes to remove impurities such as organic solvents and dust on the surface of the fabric, then rinse it repeatedly with deionized water and put it in an oven at 40-45°C drying.

2. Sputtering Nanoparticles

Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 40-100mm; in order to control the temperature of the substrate during deposition, avoid the deformation of the substrate due to high temperature , using a water-cooling device to cool the substrate; in order to prevent impurity particles from falling on the surface of the substrate, a structure with the substrate on the top and the target on the bottom is adopted, that is, the bottom-up sputtering method; in order to ensure the purity of the sputtered nano-film, the experimental process In the process, the reaction chamber is first evacuated to the background vacuum, and then high-purity argon is flushed into it as the sputtering gas; the specific sputtering process parameters are as follows:

(1) adopting silver target and _TiO2 target respectively as target material, adopt interval sputtering to prepare composite thin film, and described target material purity is 99.99%;

(2) The sputtering process conditions are as _follows : when sputtering the silver target first, the sputtering power is 20-80W, and the sputtering time is 10-30min; The time is 30-60 minutes; when sputtering silver targets and TiO ₂ targets, the sputtering pressure is 0.5-1Pa, and the gas flow rate is 5-30mL/min.

The fabric base material adopts polyester, polypropylene fiber and other non-woven fabrics.

Compared with prior art, the present invention has following advantage and effect:

(1) The antibacterial textile fabric of the present invention utilizes magnetron sputtering technology, and the film prepared has high adhesion fastness to the fabric substrate. Silver is a broad-spectrum antibacterial and bactericidal material with strong bactericidal ability. Among the known metal ions, its antibacterial performance is the strongest, and the required concentration is extremely low. Because of its unique catalytic performance and biological activity, which are different from conventional materials, nano silver has super antibacterial ability against viruses, bacteria, fungi, etc. Nano-TiO ₂ uses photocatalytic holes and reactive oxygen species formed on the surface to conduct biochemical reactions with bacterial cells or components in cells, which can not only reduce the vitality of bacteria, but also attack bacteria and outer cells and penetrate cell membranes , Destroy the cell membrane structure of bacteria, thereby completely killing bacteria, and at the same time degrade the toxic compounds released by bacteria. Therefore, the combination of nano-silver and nano- _TiO2 for the preparation of antibacterial textile fabrics greatly improves the antibacterial performance of the material.

(2) The antibacterial textile fabric of the present invention has simple preparation process, low cost, no pollution, and is convenient for industrialized production.

Description of drawings

Fig. 1 is the video micrograph of the antibacterial textile fabric prepared in the present invention.

Detailed ways

Example 1

(1) Cleaning: select polyester fabric, put the fabric base material into acetone solution, and wash it with an ultrasonic cleaner for 30 minutes to remove organic solvents, dust and other impurities on the surface of the fabric, then rinse it repeatedly with deionized water and put it in Dry in an oven at 45°C.

(2) Sputtering: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 60 mm; use a water cooling device to cool the substrate; pump the reaction chamber to the background Vacuum, and then rush into high-purity argon gas with a volume fraction of 99.999% as the sputtering gas; the specific sputtering process parameters are as follows: first, the silver target is sputtered, the sputtering power is 60W, and the sputtering time is 20min; then the _TiO2 target is sputtered , the sputtering power is 100W, and the sputtering time is 30min; when sputtering the silver target and _TiO2 target, the sputtering pressure is 0.8Pa, and the gas flow rate is 20mL/min. Finally, a silver/ _TiO2 nanocomposite film-structured fabric with antibacterial properties was obtained.

Example 2

(1) Cleaning: select polyester fabric, put the fabric base material in acetone solution, and wash it with an ultrasonic cleaner for 40 minutes to remove organic solvents, dust and other impurities on the surface of the fabric, then rinse it repeatedly with deionized water and put it in Dry in an oven at 45°C.

(2) Sputtering: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 80mm; use a water cooling device to cool the substrate; pump the reaction chamber to the background Vacuum, and then rush into high-purity argon with a volume fraction of 99.999% as the sputtering gas; the specific sputtering process parameters are as follows: first, the silver target is sputtered, the sputtering power is 40W, and the sputtering time is 10min; then the _TiO2 target is sputtered , the sputtering power is 80W, and the sputtering time is 45min; when sputtering the silver target and _TiO2 target, the sputtering pressure is 0.8Pa, and the gas flow rate is 10mL/min. Finally, a silver/ _TiO2 nanocomposite film-structured fabric with antibacterial properties was obtained.

Example 3

(1) Cleaning: Use polypropylene fabric, put the fabric base material into the acetone solution, and wash it with an ultrasonic cleaner for 30 minutes to remove organic solvents, dust and other impurities on the surface of the fabric, then rinse it repeatedly with deionized water and put it in Dry in an oven at 40°C.

(2) Sputtering: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 60 mm; use a water cooling device to cool the substrate; pump the reaction chamber to the background Vacuum, and then rush into the high-purity argon gas with a volume fraction of 99.999% as the sputtering gas; the specific sputtering process parameters are as follows: first, the silver target is sputtered, the sputtering power is 80W, and the sputtering time is 30min; then the _TiO2 target is sputtered , the sputtering power is 100W, and the sputtering time is 30min; when sputtering the silver target and _TiO2 target, the sputtering pressure is 0.8Pa, and the gas flow rate is 20mL/min. Finally, a silver/ _TiO2 nanocomposite film-structured fabric with antibacterial properties was obtained.

Example 4

(1) Cleaning: Use polypropylene fabric, put the fabric base material into the acetone solution, and wash it with an ultrasonic cleaner for 45 minutes to remove organic solvents, dust and other impurities on the surface of the fabric, then rinse it repeatedly with deionized water and put it in Dry in an oven at 45°C.

(2) Sputtering: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 100mm; use a water cooling device to cool the substrate; pump the reaction chamber to the background Vacuum, and then rush into high-purity argon gas with a volume fraction of 99.999% as the sputtering gas; the specific sputtering process parameters are as follows: first, the silver target is sputtered, the sputtering power is 60W, and the sputtering time is 20min; then the _TiO2 target is sputtered , the sputtering power is 150W, and the sputtering time is 50min; when sputtering the silver target and _TiO2 target, the sputtering pressure is 0.8Pa, and the gas flow rate is 30mL/min. Finally, a silver/ _TiO2 nanocomposite film-structured fabric with antibacterial properties was obtained.

Example 5

(1) Cleaning: Use polypropylene fabric, put the fabric base material into the acetone solution, and wash it with an ultrasonic cleaner for 50 minutes to remove organic solvents, dust and other impurities on the surface of the fabric, then rinse it repeatedly with deionized water and put it in Dry in an oven at 50°C.

(2) Sputtering: Put the pretreated fabric substrate on the sample holder in the sputtering chamber, the distance between the target material and the fabric substrate is 120mm; use a water cooling device to cool the substrate; pump the reaction chamber to the background Vacuum, and then rush into high-purity argon gas with a volume fraction of 99.999% as the sputtering gas; the specific sputtering process parameters are as follows: first, the silver target is sputtered, the sputtering power is 70W, and the sputtering time is 15min; then the _TiO2 target is sputtered , the sputtering power is 120W, and the sputtering time is 25min; when sputtering the silver target and _TiO2 target, the sputtering pressure is 0.8Pa, and the gas flow rate is 20mL/min. Finally, a silver/ _TiO2 nanocomposite film-structured fabric with antibacterial properties was obtained.

Claims (3)

1. a preparation method for novel antibacterial weaving face fabric, is characterized in that being obtained by following concrete steps:

(1) fabric preliminary treatment: fabric substrate is put into acetone soln, with ultrasonic washer washing 30 ~ 60min, to remove the impurity such as organic solvent, dust of fabric face, the baking oven putting into 40 ~ 45 DEG C after then it repeatedly being rinsed with deionized water is dried.

(2) nano particle is sputtered: put on the specimen holder of sputtering chamber by pretreated fabric substrate, the spacing of target and fabric substrate is 40 ~ 100mm; For controlling the temperature that deposition is base material, avoiding the substrate deformation occurred due to high temperature, adopting water cooling plant cooling base material; For avoiding impurity particle to fall substrate surface, adopt base material upper, target under structure, i.e. sputtering mode from bottom to top; For ensureing the purity of sputtering nano thin-film, first reative cell being evacuated to base vacuum in experimentation, then pouring high-purity argon gas as sputter gas; Concrete splash-proofing sputtering process parameter is as follows:

1) silver-colored target and TiO is adopted respectively ₂target is as target, and adopt interval Slag coating laminated film, described target purity is 99.99%;

2) sputtering technology condition is: first during sputtering silver target, and sputtering power is 20 ~ 80W, and sputtering time is 10 ~ 30min; Then sputtered with Ti O ₂during target, sputtering power is 60 ~ 150W, and sputtering time is 30 ~ 60min; Sputtering silver target and TiO ₂during target, sputtering pressure is 0.5 ~ 1Pa, and gas flow is 5 ~ 30mL/min.

2. the preparation method of a kind of novel antibacterial weaving face fabric according to claim 1, is characterized in that: the target described in step (2) is silver-colored target and TiO ₂target.

3. the preparation method of a kind of novel antibacterial weaving face fabric according to claim 1, is characterized in that: the silver-colored target sputtering power described in step (2) is 20 ~ 80W, and sputtering time is 10 ~ 30min TiO ₂target sputtering power is 60 ~ 150W, and sputtering time is 30 ~ 60min; Sputtering silver target and TiO ₂during target, sputtering pressure is 0.5 ~ 1Pa, and gas flow is 5 ~ 30mL/min.