CN104658641A - Low-resistance transparent conductive laminate, low-resistance patterned transparent conductive laminate, and touch panel - Google Patents

Abstract

A low-resistance transparent conductive laminate comprises a transparent substrate, a transparent optical adjustment layer, a silicon oxide layer and a transparent conductive layer, wherein the silicon oxide is made of SiO_x(x is more than 1.6 and less than 2.0). The transparent optical adjustment layer has a thickness in the range of 50nm to 4,000nm and a refractive index in the range of 1.58 to 1.70. The transparent conductive layer has a thickness ranging from 20nm to 25nm and a surface resistance value ranging less than 200 Ω/sq. The absolute value range of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer is 0.05 or less. The low-resistance transparent conductive lamination body has no interference fringes, and the low-resistance patterned transparent conductive lamination body formed by the low-resistance transparent conductive lamination body can be used for users to observe when applied to a touch panelThe patterned trace of the transparent conductive layer is not easy to see when the touch panel is seen, so that the touch panel has better display quality.

Description

Low-resistance transparent conductive laminate, low-resistance patterned transparent conductive laminate, and touch panel

technical field

The invention relates to a low-resistance transparent conductive laminate for a touch panel, in particular to a low-resistance transparent conductive laminate comprising a transparent substrate, a transparent optical adjustment layer, a silicon oxide layer and a transparent conductive layer. the

Background technique

In recent years, many convenient smart products have been launched on the market, such as smart phones, touch screens, touch panels, and e-books. With the introduction of these highly applied touch technologies, the use of the entire touch panel has been driven. And the touch panel is for example but not limited to a resistive touch panel or a capacitive touch panel. The touch panel is a transparent conductive laminate including a transparent organic polymer substrate and a transparent conductive film disposed on the transparent organic polymer substrate. the

The above-mentioned transparent conductive laminate can be further patterned to form a patterned transparent conductive laminate according to requirements, wherein the patterning process is to remove part of the transparent conductive film to form a non-conductive region , and the remaining part of the transparent conductive film forms a conductive region. However, when light enters the patterned transparent conductive laminate and is reflected, since the reflectivity of the transparent organic polymer substrate and the transparent conductive film are different for light, the light passing through the conductive area is different from the light passing through the non-conductive area. The reflectance of light varies greatly, and when applied to the touch panel, the user can easily and clearly see and distinguish the conductive area and the non-conductive area, which in turn affects the display quality of the touch panel. the

China Taiwan Patent Publication No. 201213136 discloses a transparent conductive film. The transparent conductive film includes a transparent substrate, a first hard coat layer, a first transparent dielectric layer and a first transparent conductor layer. The film thickness of the transparent base material ranges from 2 μm to 250 μm. The film thickness of the first hard coat layer ranges from 0.5 μm to 6 μm, and the refractive index ranges from 1.40 to 1.90. The film thickness of the first transparent dielectric layer ranges from 10nm to 50nm, and the refractive index ranges from 1.30 to 1.50. The first transparent conductor layer is patterned and has a film thickness ranging from 10 nm to 2 μm. From the disclosure in Table 1 in the specification of the Taiwan case, it can be seen that when the surface resistance value of the first transparent conductor layer after crystallization is above 270Ω/sq, the light passing through the conductive region can be reduced by adjusting the parameter conditions. The difference between the reflectivity of the reflectivity and the reflectivity of light passing through the non-conductive area makes it difficult for the user to see the conductive area and the non-conductive area when using, so as to achieve the effect of no patterning. However, since the size of the touch panel is getting bigger and bigger, if the surface resistance of the first transparent conductor layer is too high, it is easy to generate noise when it is applied to a touch panel with a large size. However, in order to avoid the generation of noise, by increasing the thickness of the first transparent conductor layer to reduce the surface resistance value, the difference between the reflectivity of light passing through the conductive region and the reflectivity of light passing through the non-conductive region will become larger, As a result, the user can easily see and identify the conductive area and the non-conductive area when looking at the touch panel. the

In view of the above, improve the transparent conductive film to reduce the difference between the reflectivity of light passing through the conductive area and the reflectance of light passing through the non-conductive area, so as to solve the problem that the user can easily see the patterning of the transparent conductive layer when viewing the touch panel. The problem of traces, and then improving the display quality of the touch panel, is still a subject that relevant technical personnel in this technical field can make breakthroughs. the

Contents of the invention

The first object of the present invention is to provide a low-resistance transparent conductive laminate without interference fringes after light is reflected. the

The low-resistance transparent conductive laminate of the present invention comprises:

a transparent substrate;

A transparent optical adjustment layer, disposed on the transparent substrate, has a thickness ranging from 50nm to 4,000nm, and a refractive index ranging from 1.58 to 1.70;

A silicon monoxide layer disposed on the transparent optical adjustment layer and having a thickness ranging from 23nm to 27nm; and

A transparent conductive layer disposed on the silicon oxide layer with a thickness in the range of 20nm to 25nm and a surface resistance in the range of less than 200Ω/sq;

Wherein, the absolute value range of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer is less than 0.05, and the silicon oxide is represented by formula (I);

SiO _x (I)

In formula (I), x is greater than 1.6 to less than 2.0. the

The second object of the present invention is to provide a low-resistance patterned transparent conductive laminate that does not generate interference fringes after light reflection and that is difficult for users to see patterned traces of the transparent conductive layer. the

The low-resistance patterned transparent conductive laminate of the present invention comprises:

a transparent substrate;

A transparent optical adjustment layer, disposed on the transparent substrate, has a thickness ranging from 50nm to 4,000nm, and a refractive index ranging from 1.58 to 1.70;

A silicon monoxide layer disposed on the transparent optical adjustment layer and having a thickness ranging from 23nm to 27nm; and

A patterned transparent conductive layer disposed on the silicon oxide layer with a thickness in the range of 20nm to 25nm and a surface resistance in the range of less than 200Ω/sq;

Wherein, the absolute value range of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer is less than 0.05, and silicon oxide is represented by formula (I);

SiO _x (I)

In formula (I), x is greater than 1.6 to less than 2.0. the

The third objective of the present invention is to provide a touch panel with better display quality. the

The touch panel of the present invention includes the above-mentioned low-resistance transparent conductive laminate or the above-mentioned low-resistance patterned transparent conductive laminate. the

The beneficial effect of the present invention is that: through the adjustment and control of the parameter conditions, the low-resistance transparent conductive laminate of the present invention has no interference fringe, and the low-resistance patterned transparent conductive laminate formed by the low-resistance transparent conductive laminate When the laminate is applied to the touch panel, it is difficult for the user to see the traces of the patterning of the transparent conductive layer when viewing, which in turn makes the touch panel have better display quality. the

Detailed ways

The content of the present invention will be described in detail below:

The low-resistance transparent conductive laminate of the present invention comprises:

a transparent substrate;

A transparent optical adjustment layer, disposed on the transparent substrate, has a thickness ranging from 50nm to 4,000nm, and a refractive index ranging from 1.58 to 1.70;

A silicon monoxide layer disposed on the transparent optical adjustment layer and having a thickness ranging from 23nm to 27nm; and

A transparent conductive layer disposed on the silicon oxide layer with a thickness in the range of 20nm to 25nm and a surface resistance in the range of less than 200Ω/sq;

Wherein, the absolute value range of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer is less than 0.05, and silicon oxide is represented by formula (I);

SiO _x (I)

In formula (I), x is greater than 1.6 to less than 2.0. the

In the present invention, the absolute value range of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer is adjusted to be 0.05 or less, so that the interface between the transparent substrate and the transparent optical adjustment layer does not cause reflection, so as to reduce interference fringes generation. At the same time, through the adjustment of the parameter conditions, when the low-resistance patterned transparent conductive laminate is applied to the touch panel, it is difficult for the user to see the patterned traces of the transparent conductive layer when viewing, and then the touch panel has Better display quality. the

Preferably, the low-resistance transparent conductive laminate of the present invention further includes a functional layer disposed on the transparent substrate and opposite to the transparent optical adjustment layer. the

The method for preparing the low-resistance transparent conductive laminate of the present invention can adopt the existing method for preparing the low-resistance transparent conductive laminate for the touch panel. For example, the method for preparing a low-resistance transparent conductive laminate of the present invention includes the following steps: providing a transparent substrate; forming a transparent optical adjustment layer on the transparent substrate to obtain a first laminate; A silicon oxide layer is formed on the transparent optical adjustment layer of the layer to obtain a second laminate; a transparent conductive layer is formed on the silicon oxide layer of the second laminate to obtain the low-resistance transparent conductive product of the present invention. layers. the

The method for forming the transparent optical adjustment layer is not particularly limited. The forming method is, for example but not limited to, a roll coating method, a spin coating method, or a dip coating method. From the viewpoint of continuous production, preferably, the forming method is a roll coating method. the

The method for forming the silicon oxide layer is not particularly limited. The forming method is, for example but not limited to, a dry coating method or a wet coating method. The dry coating method is, for example but not limited to, vapor deposition, sputtering, ion plating, chemical vapor deposition or electroplating. From the viewpoint of continuous production, preferably, the dry coating method is a sputtering method. The wet coating method is, for example but not limited to, roll coating, spin coating or dip coating. From the viewpoint of continuous production, preferably, the wet coating method is a roll coating method. the

The method for forming the transparent conductive layer is not particularly limited. The forming method is, for example but not limited to, evaporation method, sputtering method, ion plating method, chemical vapor deposition method, or electroplating method. From the viewpoint of effectively controlling the thickness of the transparent conductive layer, preferably, the forming method is an evaporation method or a sputtering method. the

The preparation method of the low-resistance transparent conductive laminated body of the present invention also includes a pair of steps of annealing the transparent conductive layer to crystallize the transparent conductive layer and adjust its resistance value, wherein the operating temperature range of the annealing treatment is 100°C to 200°C. the

The method for preparing the low-resistance transparent conductive laminate of the present invention further includes a step of forming a functional layer on the transparent substrate opposite to the transparent optical adjustment layer. The method for forming the functional layer is not particularly limited. The forming method is, for example but not limited to, roll coating, spin coating, dip coating, bar coating, or gravure coating. the

The preparation method of the low-resistance patterned transparent conductive laminate of the present invention includes the preparation method of the above-mentioned low-resistance transparent conductive laminate, and applying a patterning treatment to the transparent conductive layer of the low-resistance transparent conductive laminate to form a The patterned transparent conductive layer can be used to obtain the low-resistance patterned transparent conductive laminate of the present invention, wherein the annealing step can be performed after forming the transparent conductive layer or after the patterned transparent conductive layer. the

In the patterning process, part of the transparent conductive layer is removed to form a non-conductive region, and the remaining part of the transparent conductive layer forms a conductive region. The patterning process is, for example but not limited to, dry etching or wet etching. the

The transparent substrate, the transparent optical adjustment layer, the silicon oxide layer, the transparent conductive layer and the functional layer will be described in detail below one by one. the

<<Transparent Substrate>>

In the present invention, the material of the transparent substrate is not particularly limited, such as but not limited to polyester-based resin or polycar-bonate-based resin. The polyester resin is for example but not limited to polyethylene terephthalate (PET for short) and the like. The polycarbonate resin is for example but not limited to polycarbonate (polycarbonate, PC for short) and the like. Preferably, the material of the transparent substrate is polyethylene terephthalate. the

Preferably, the refractive index of the transparent substrate in the present invention ranges from 1.58 to 1.80. When the refractive index of the transparent substrate is less than 1.58, after the transparent conductive layer is patterned, the reflectance of the light passing through the formed conductive area is much different from the reflectance of light passing through the formed non-conductive area, and the application When it comes to the touch panel, the user can easily see the patterned traces of the transparent conductive layer when watching. the

In the present invention, the thickness of the transparent substrate is not particularly limited. Preferably, the thickness of the transparent substrate ranges from 2 μm to 300 μm; more preferably, it ranges from 10 μm to 250 μm. When the thickness of the transparent substrate is less than 2 μm, there will be a problem of insufficient mechanical strength, which makes subsequent process operations difficult. When the thickness of the transparent substrate is greater than 300 μm, the production cost will increase, and the total light transmittance of the low-resistance transparent conductive laminate or the low-resistance patterned transparent conductive laminate will decrease. Thinning needs. the

<<Transparent optical adjustment layer>>

The transparent optical adjustment layer is disposed on the transparent substrate, and has a thickness ranging from 50nm to 4,000nm and a refractive index ranging from 1.58 to 1.70. When the thickness of the transparent optical adjustment layer is less than 50 nm, it is difficult to control the thickness uniformity. When the thickness of the transparent optical adjustment layer is greater than 4,000 nm, the production cost will increase. Preferably, the transparent optical adjustment layer has a thickness ranging from 50 nm to less than 500 nm. the

When the refractive index of the transparent optical adjustment layer is greater than 1.70, it is difficult to control the absolute value range of the refractive index difference between the transparent optical adjustment layer and the transparent substrate below 0.05, which will easily lead to interference fringes. When the refractive index of the transparent optical adjustment layer is less than 1.58, the refractive index of the first laminate cannot be increased. Therefore, after the transparent conductive layer is patterned, the reflectivity of the light passing through the formed conductive region is related to the reflectivity of the light passing through the formed layer. The reflectivity of light in the formed non-conductive area varies greatly, and when applied to a touch panel, users can easily see patterned traces of the transparent conductive layer when watching. Preferably, the refractive index of the transparent optical adjustment layer ranges from 1.63 to 1.68. the

Preferably, the transparent optical adjustment layer is formed from a composition for forming a transparent optical adjustment layer including metal oxide particles and a functional component, wherein the functional component includes a photohardenable binder and a photoactivator starter. The metal oxide particles are, for example but not limited to, titanium oxide or zirconium oxide. Preferably, the metal oxide particles have a refractive index ranging from 2.0 to 3.0. Preferably, the average particle diameter of the metal oxide particles ranges from 5 nm to 20 nm. Preferably, based on 100 parts by weight of the total amount of the functional components, the content of the metal oxide particles ranges from 2 parts by weight to 50 parts by weight. The photohardenable binder is, for example but not limited to, a multifunctional monomer with (meth)acrylic groups, an oligomer with (meth)acrylic groups, or a polymer with (meth)acrylic groups. The photoinitiator can make the photohardenable adhesive undergo photocuring reaction, and the photoinitiator can be used alone or in combination, such as but not limited to vinyl phenones, benzophenone derivatives , Michler's ketone, benzyne, benzyl derivatives, benzoin derivatives, benzoin methyl ethers, α-acyloxy esters, thioxanthones and anthraquinones. Preferably, based on the total amount of the functional components as 100wt%, the content of the photoinitiator ranges from 0.1wt% to 10wt%. the

<<Silicon oxide layer>>

The silicon oxide layer is disposed on the transparent optical adjustment layer, and has a thickness ranging from 23nm to 27nm. When the thickness of the silicon oxide layer is greater than 27 nm, the b ^* value in the transmission color of the silicon oxide layer becomes large, and it becomes yellowish. When the thickness of the silicon oxide layer is less than 23 nm, the total light transmittance of the low-resistance transparent conductive laminate or the low-resistance patterned transparent conductive laminate decreases. The oxygen content of the silicon oxide layer can be adjusted by controlling the amount of oxygen introduced during the preparation. When x in the formula (I) is less than 1.6, the transparency of the silicon oxide layer is not good due to incomplete oxidation, which in turn leads to the total light penetration of the low-resistance transparent conductive laminate or the low-resistance patterned transparent conductive laminate. The transmittance decreases, and the difference between the reflectance of light passing through the conductive area and the reflectance of light passing through the non-conductive area becomes larger. When it is applied to a touch panel, the user can easily see the patterned pattern of the transparent conductive layer. trace. Since the maximum value of x in SiO _x is 2.0 in nature, if the amount of oxygen continues to be increased, the sputtering rate will be reduced, resulting in a decrease in productivity.

<<Transparent conductive layer>>

The material of the transparent conductive layer can be used alone or in combination, and the material of the transparent conductive layer is such as but not limited to indium oxide, tin oxide, titanium oxide, aluminum oxide, zinc oxide, gallium oxide, or indium tin oxide (tin dioxide and Composed of indium trioxide, Indium tin oxide, referred to as ITO). Preferably, the material of the transparent conductive layer is indium tin oxide. the

When the material of the transparent conductive layer is indium tin oxide, after crystallization (such as annealing treatment), tin (Sn ⁴⁺ ) replaces the position of indium (In ³⁺ ) in the lattice, and releases an electron, and then The surface resistance value can be reduced. Preferably, based on the total amount of the indium tin oxide as 100wt%, the content of the tin dioxide is in the range of 3wt% to 10wt%. When the content of the tin dioxide is greater than 10wt%, the transparent conductive layer is not easy to crystallize. More preferably, the tin dioxide content ranges from 5wt% to 7wt%.

According to the theory of solid optics, when the transparent conductive layer is crystallized, the increased electron concentration will cause the refractive index of the transparent conductive layer to decrease. Therefore, the refractive index before crystallization is higher than that after crystallization. Preferably, the refractive index of the transparent conductive layer ranges from 1.85 to 2.15. When the refractive index of the transparent conductive layer is lower than 1.85 or higher than 2.15, the transparent conductive layer will be colored and the transmittance will be reduced. At the same time, the low-resistance patterned transparent conductive laminate is applied to a touch panel When viewing, users can easily see patterned traces of the transparent conductive layer. More preferably, the refractive index of the transparent conductive layer ranges from 1.90 to 2.05. the

The thickness of the transparent conductive layer ranges from 20nm to 25nm. When the film thickness of this transparent conductive layer is less than 20 nm, the surface resistance value becomes too high. When the film thickness of the transparent conductive layer is higher than 25 nm, the value of b ₁ ^* in the transparent color of the low-resistance transparent conductive laminate becomes large, resulting in a yellowish tinge.

<<Functional Layer>>

The functional layer is for example but not limited to a hard coat layer, an anti-glare layer, an anti-fingerprint layer, or a self-healing layer. Preferably, in the low-resistance transparent conductive laminate of the present invention, the thickness of the functional layer ranges from 1 μm to 10 μm. The hard coat can strengthen the hardness of the transparent substrate. When the film thickness of the functional layer is less than 1.0 μm, the standard of pencil hardness H or higher cannot be satisfied. When the thickness of the functional layer is greater than 10 μm, during the process of preparing the functional layer, the film will shrink due to hardening, which will cause curling of the transparent substrate, and the production cost will increase. the

The present invention will be further described with reference to the following examples, but it should be understood that the examples are for illustrative purposes only and should not be construed as limitations on the implementation of the present invention. the

<<Synthesis example 1>>Composition for forming a transparent optical adjustment layer

Mix 40wt% of acrylic ultraviolet curable resin, 20wt% of propylene glycol methyl ether, and 35wt% of methyl isobutyl ketone, and then add 5wt% of photoinitiator (brand: Ciba; model: IRGACURE184 ) to form a functional component, and finally, 20 parts by weight of zirconia (brand: Sakai Chemical Industry Co., Ltd.; model: SZR-K) is dispersed in the functional component to obtain a transparent optical adjustment layer The composition used is hereinafter referred to as H-1. the

<<Synthesis Example 2>>

Mix 40wt% of acrylic ultraviolet curable resin, 20wt% of propylene glycol methyl ether, and 35wt% of methyl isobutyl ketone, and then add 5wt% of photoinitiator (brand: Ciba; model: IRGACURE184 ) to form a functional component, and finally, 28 parts by weight of zirconia (brand: Sakai Chemical Industry Co., Ltd.; model: SZR-K) is dispersed in the functional component to obtain a transparent optical adjustment layer The composition is referred to as H-2 hereinafter. the

<<Synthesis Example 3>>

Mix 44wt% acrylic UV curable resin and 55wt% methyl isobutyl ketone, then add 1wt% photoinitiator (brand: Ciba; model: IRGACURE184) to form a functional component, Finally, 25 parts by weight of silicon dioxide (manufactured by Nissan Chemical; model: MIBK-ST) was dispersed in the functional component to obtain a composition for forming a transparent optical adjustment layer, hereinafter referred to as H-3. the

<<Synthesis Example 4>>

Mix 40wt% of acrylic ultraviolet curable resin, 20wt% of propylene glycol methyl ether, and 35wt% of methyl isobutyl ketone, and then add 5wt% of photoinitiator (brand: Ciba; model: IRGACURE184 ) to form a functional component, and finally, 36 parts by weight of zirconia (brand: Sakai Chemical Industry Co., Ltd.; model: SZR-K) is dispersed in the functional component to obtain a transparent optical adjustment layer The composition used is hereinafter referred to as H-4. the

<<Synthesis Example 5>>

Mix 40wt% acrylic UV curable resin and 59wt% methyl isobutyl ketone, then add 1wt% photoinitiator (brand: Ciba; model: IRGACURE184) to form a functional component, Finally, 33 parts by weight of silicon dioxide (manufactured by Nissan Chemical; model: MIBK-ST) were dispersed in the functional component to obtain a composition for forming a transparent optical adjustment layer, hereinafter referred to as H-5. the

<<Example 1>>

A polyethylene terephthalate transparent substrate with a thickness of 125 μm was produced using polyethylene terephthalate (manufactured by TOYOBO, trade name: A4300, PET for short). A mixture of 32.5wt% acrylic resin and 67.5wt% 2-butanone (methyl ehtyl ketone) was coated on the surface of a polyethylene terephthalate transparent substrate with a wire-bar. solution. Next, dry at 80° C. for 2 minutes, and then irradiate with ultraviolet light with an exposure amount of 200 mJ/cm ² to form a hard coat layer with a thickness of 4 μm on the polyethylene terephthalate transparent substrate. .

Coat H-1 of Synthesis Example 1 on the polyethylene terephthalate transparent substrate on the side opposite to the hard coat layer with a wire-wound bar, and then irradiate with ultraviolet light with an exposure amount of 600mJ/ ^cm2 , A transparent optical adjustment layer with a thickness of 0.05 μm was formed on the polyethylene terephthalate transparent substrate to obtain a first laminate. Then, place the first laminated body in the magnetron sputtering chamber, use silicon as the target material, and after reducing the vacuum degree of the chamber to 3×10 ^-6 torr, argon gas and Oxygen, wherein the flow ratio of oxygen to argon is 0.23, and the vacuum degree of the chamber is controlled at 5×10 ^-3 torr. Using a power of 4KW and controlling the temperature of the first laminate at room temperature, a silicon oxide layer with a thickness of 25 nm was formed on the transparent optical adjustment layer of the first laminate to obtain a second laminate. Next, indium tin oxide is used as the target material, wherein the content of tin is 5wt%, and then argon and oxygen are introduced into the cavity, wherein the flow ratio of oxygen to argon is 0.02, and the vacuum of the cavity is The temperature is controlled at 5×10 ^-4 torr. Using a power of 4KW, and the temperature of the second laminate is controlled at room temperature, a transparent conductive layer with a thickness of 25nm is formed on the silicon oxide layer of the second laminate, and the low-resistance transparent conductive layer of the present invention can be obtained. layers. Next, cut the low-resistance transparent conductive laminate into a size of 6cm×6cm, and soak it vertically in a 5wt% hydrochloric acid solution for 3 minutes to remove part of the transparent conductive layer to form a conductive area and a non-conductive area , and then placed in an oven at 150° C., annealing the patterned transparent conductive layer for 1 hour to obtain the low-resistance patterned transparent conductive laminate of the present invention.

<<Examples 2 to 8 and Comparative Examples 1 to 9>>

Examples 2 to 8 and Comparative Examples 1 to 9 are prepared in the same steps as in Example 1 to prepare low-resistance transparent conductive laminates and low-resistance patterned transparent conductive laminates. The differences are shown in Table 1 and Table 2 shown. the

<<Example 9>>

Example 9 uses the same steps as in Example 1 to prepare a low-resistance transparent conductive laminate and a low-resistance patterned transparent conductive laminate. The difference is that when preparing the transparent conductive layer, indium tin oxide is used as the target , wherein the content of tin is 5wt%, and then argon and oxygen are introduced into the cavity, wherein the flow ratio of oxygen to argon is 0.01, and the vacuum degree of the cavity is controlled at 5×10 ^-4 torr Down. Using a power of 4KW and controlling the temperature of the second laminate at room temperature, a transparent conductive layer with a thickness of 25 nm was formed on the silicon oxide layer of the second laminate.

<<Comparative example 10>>

In Comparative Example 10, a low-resistance transparent conductive laminate and a low-resistance patterned transparent conductive laminate were prepared in the same steps as in Example 1, except that the transparent conductive layer was not annealed. the

<<Evaluation item>>

1. Refractive index and thickness measurement:

<Refractive index and thickness of transparent optical adjustment layer>

(1) Using the product name "A4300" [manufactured by TOYOBO] PET as a base material, the compositions for forming a transparent optical adjustment layer in Synthesis Examples 1 to 5 were coated on the surface of the above base material using a wire-bar. , followed by drying at 80°C for 2 minutes, and hardening and drying with 200mJ/cm ² of UV energy, to form a transparent optical adjustment layer.

(2) The refractive index was measured with an Abbe refractometer manufactured by Atago Corporation. the

(3) The thickness of the transparent optical adjustment layer was observed and measured by a transmission electron microscope (model: JEM-2100F) manufactured by JEOL Corporation. the

<Refractive index and thickness of transparent conductive layer>

Use the Si wafer as the substrate. After the ITO sputtering is completed, put the Si wafer with ITO on the surface into a hot air oven, bake at 150°C for 60min, and carry out crystallization treatment. Then, use an ellipsometer (Ellipsomete ; model; GES5) for refractive index determination. The thickness of the transparent conductive layer was observed and measured by a transmission electron microscope (model: JEM-2100F) manufactured by JEOL Corporation. the

2. Silicon and oxygen ratio determination method in the silicon oxide layer: use an energy distributed spectrometer (Energy Dispersive Spectrometer; manufactured by Oxford Company; model: Inca Energy), measure the atomic number ratio of silicon and oxygen in the silicon oxide layer, x =(number of oxygen atoms/number of silicon atoms). the

3. Transmission color measurement: The low-resistance patterned transparent conductive laminates of Examples 1 to 9 and Comparative Examples 1 to 10 were measured according to the JISZ8722 standard using a spectrometer (brand: Hitachi; model: U4100 ) for measurement, based on the blue-yellow sensitivity index b ^* of the L ^* a ^* b ^* color system defined in JIS.

4. Measurement of total light transmittance (unit: TT%): The low-resistance patterned transparent conductive laminates of Examples 1 to 9 and Comparative Examples 1 to 10 were measured according to the JISK7105 standard using Nippon Denshoku The measuring instrument (model NDH-2000) manufactured by Industrial Co., Ltd. was used for measurement. the

5. Surface resistance value (unit: Ω/sq) measurement: The low-resistance patterned transparent conductive laminates of Examples 1 to 9 and Comparative Examples 1 to 10 were measured according to the JISK7194 standard and using Mitsubishi Oil Chemical ( Stock) manufactured four-terminal measuring instrument (model: Loretest AMCP-T400MCP-T610) for measurement. the

6. Measurement of the difference in reflectance (unit: %): Place the low-resistance patterned transparent conductive laminates of Examples 1 to 9 and Comparative Examples 1 to 10 in a spectrometer (brand: Hitachi; model: U4100) aim the light at the conductive region for measurement, take 380nm as the initial measurement wavelength and irradiate, and measure to 780nm, and record the reflection intensity of each wavelength to obtain a reflection spectrum (A _k ). Next, aim the light at the non-conductive area, and then measure according to the above method to obtain a reflectance spectrum (B _k ). The reflectance difference ΔR is obtained by the following formula:

$\mathrm{<span\; class="notranslate">\; \&Delta;R</span>}<span\; class="notranslate">\; =</span>\frac{\mathrm{<span\; class="notranslate">\; 1</span>}}{\mathrm{<span\; class="notranslate">\; no</span>}}\underset{\mathrm{<span\; class="notranslate">\; 380</span>}}{\overset{\mathrm{<span\; class="notranslate">\; 780</span>}}{\mathrm{<span\; class="notranslate">\; \&Sigma;</span>}}}<span\; class="notranslate">\; |</span>{\mathrm{<span\; class="notranslate">\; A</span>}}_{\mathrm{<span\; class="notranslate">\; k</span>}}<span\; class="notranslate">\; -</span>{\mathrm{<span\; class="notranslate">\; B</span>}}_{\mathrm{<span\; class="notranslate">\; k</span>}}<span\; class="notranslate">\; |</span>$

n: total number of measurements; A _k and B _k : reflectance spectra.

7. Interference fringe evaluation: Place the low-resistance transparent conductive laminates of Examples 1 to 9 and Comparative Examples 1 to 10 on the appearance inspection table, turn on the fluorescent lamp so that the central illuminance is above 2000LUX, observe with human eyes, and visually inspect The angle is 45° to 60°, and the detection distance is 50cm to 100cm. The evaluation methods are as follows: ○ means no rainbow phenomenon; X means rainbow phenomenon exists. the

8. Patterning evaluation: 16 black adhesive tapes were respectively pasted on the hard coat layer of the low-resistance patterned transparent conductive laminate of Examples 1 to 9 and Comparative Examples 1 to 10, and then, visually inspected by human eyes Observe the patterned transparent conductive layer and confirm whether conductive areas can be distinguished from non-conductive areas. The evaluation methods are as follows: ◎ means that the conductive area and the non-conductive area cannot be distinguished; ○ means that the conductive area and the non-conductive area can be distinguished slightly; X means that the conductive area and the non-conductive area can be identified. the

Table 1

PC: polycarbonate (brand: Longhua Longhua; model: PC-811);

TAC: cellulose triacetate (brand: Dahui TacBright; model: N980). the

Table 2

PC: polycarbonate (brand: Longhua Longhua; model: PC-811);

TAC: cellulose triacetate (brand: Dahui TacBright; model: N980). the

From the data results in Table 1, it can be seen that through the regulation of the parameter conditions, the low-resistance transparent conductive laminate of the present invention has no interference fringes, and the low-resistance patterned structure formed by the low-resistance transparent conductive laminate is Under the observation of the human eye, the transparent conductive laminate is not easy to distinguish the conductive area and the non-conductive area of the patterned transparent conductive layer, which effectively improves and alleviates the existing problem of obvious patterning traces of the transparent conductive layer, and then can make The touch panel has better display quality. the

From the results of the data in Table 2, it can be seen that the refractive index of the transparent optical adjustment layer of Comparative Examples 1 to 3 and 5, and the absolute value of the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer are not included in the design of this case. Within the range, the obtained low-resistance transparent conductive laminate has the generation of interference fringes, and the low-resistance patterned transparent conductive laminate formed therefrom has obvious patterning traces under observation by human eyes. the

Although the absolute value of the difference between the refractive index of the transparent substrate of Comparative Example 4 and the refractive index of the transparent optical adjustment layer is within the design range of this case, the refractive index of the transparent optical adjustment layer is not within the design range of this case, although The obtained low-resistance transparent conductive laminate has no interference fringe, but the low-resistance patterned transparent conductive laminate formed by it has obvious patterning traces under the observation of human eyes. the

Although the refractive index of the transparent optical adjustment layer of Comparative Examples 6 and 7, and the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer are within the design range of this case, the thickness of the silicon oxide layer is not within the scope of this case. Within the design range, although the obtained low-resistance transparent conductive laminate has no interference fringes, the low-resistance patterned transparent conductive laminate formed by it has significant patterning trace. the

Although the refractive index of the transparent optical adjustment layer of Comparative Example 8 and the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer are within the design range of this case, the oxygen ratio in the silicon oxide layer is not within the range of this case. Within the scope of the design, although the obtained low-resistance transparent conductive laminate has no interference fringes, the low-resistance patterned transparent conductive laminate formed by it has a significant pattern under the observation of the human eye. chemical traces. the

Although the refractive index of the transparent optical adjustment layer of Comparative Example 9 and the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer are within the design range of this case, the thickness of the transparent conductive layer is not within the design range of this case. Within the range, although the obtained low-resistance transparent conductive laminate has no interference fringes, the low-resistance patterned transparent conductive laminate formed by it has obvious patterning traces under human observation. . the

Although the refractive index of the transparent optical adjustment layer of Comparative Example 10 and the difference between the refractive index of the transparent substrate and the refractive index of the transparent optical adjustment layer are within the design range of this case, the surface resistance value and thickness of the transparent conductive layer are not. Within the scope of the design of this case, although the obtained low-resistance transparent conductive laminate has no interference fringes, the low-resistance patterned transparent conductive laminate formed by it has obvious pattern traces. the

In summary, through the control of the parameter conditions, the low-resistance transparent conductive laminate of the present invention does not produce interference fringes, and the low-resistance patterned transparent conductive laminate formed by the low-resistance transparent conductive laminate Under the observation of human eyes, it is difficult to see patterned traces of the transparent conductive layer. When applied to a touch panel, the touch panel can have better display quality, so the object of the present invention can indeed be achieved. the

Claims (13)

1. a low resistance transparent Electroconductive lamination body, is characterized in that comprising:

One transparency carrier;

One transparent optical adjustment layer, is arranged on this transparency carrier, and thickness range is 50nm to 4,000nm, and ranges of indices of refraction is 1.58 to 1.70;

One silica layer, be arranged in this transparent optical adjustment layer, and thickness range is 23nm to 27nm; And

One transparency conducting layer, is arranged on this silicon oxide layer, and thickness range is 20nm to 25nm, and sheet resistance value scope is for being less than 200 Ω/sq;

Wherein, the absolute value range of the difference of the refractive index of the refractive index of this transparency carrier and this transparent optical adjustment layer is less than 0.05, and this silica is by shown in formula (I);

SiO _x(I)

In formula (I), x is for being greater than 1.6 to being less than 2.0.

2. low resistance transparent Electroconductive lamination body according to claim 1, is characterized in that: the ranges of indices of refraction of this transparent optical adjustment layer is 1.63 to 1.68.

3. low resistance transparent Electroconductive lamination body according to claim 1, is characterized in that: the thickness range of this transparent optical adjustment layer is that 50nm is to being less than 500nm.

4. low resistance transparent Electroconductive lamination body according to claim 1, is characterized in that: the ranges of indices of refraction of this transparency carrier is 1.58 to 1.80.

5. low resistance transparent Electroconductive lamination body according to claim 1, is characterized in that: the ranges of indices of refraction of this transparency conducting layer is 1.85 to 2.15.

6. low resistance transparent Electroconductive lamination body according to claim 1, is characterized in that: described low resistance transparent Electroconductive lamination body also comprise one to be arranged on this transparency carrier and with the functional layer of transparent optical adjustment layer opposition side.

7. a transparent conductive lamination body for low resistance patterning, is characterized in that comprising:

One transparency carrier;

One transparent optical adjustment layer, is arranged on this transparency carrier, and thickness range is 50nm to 4,000nm, and ranges of indices of refraction is 1.58 to 1.70;

One silica layer, be arranged in this transparent optical adjustment layer, and thickness range is 23nm to 27nm; And

The transparency conducting layer of one patterning, is arranged on this silicon oxide layer, and thickness range is 20nm to 25nm, and sheet resistance value scope is for being less than 200 Ω/sq;

Wherein, the absolute value range of the difference of the refractive index of the refractive index of this transparency carrier and this transparent optical adjustment layer is less than 0.05, and this silica is by shown in formula (I);

SiO _x(I)

In formula (I), x is for being greater than 1.6 to being less than 2.0.

8. the transparent conductive lamination body of low resistance patterning according to claim 7, is characterized in that: the ranges of indices of refraction of this transparent optical adjustment layer is 1.63 to 1.68.

9. the transparent conductive lamination body of low resistance patterning according to claim 7, is characterized in that: the thickness range of this transparent optical adjustment layer is that 50nm is to being less than 500nm.

10. the transparent conductive lamination body of low resistance patterning according to claim 7, is characterized in that: the ranges of indices of refraction of this transparency carrier is 1.58 to 1.80.

The transparent conductive lamination body of 11. low resistance patternings according to claim 7, is characterized in that: the ranges of indices of refraction of this transparency conducting layer is 1.85 to 2.15.

The transparent conductive lamination body of 12. low resistance patternings according to claim 7, is characterized in that: the transparent conductive lamination body of described low resistance patterning also comprise one to be arranged on this transparency carrier and with the functional layer of transparent optical adjustment layer opposition side.

13. 1 kinds of contact panels, is characterized in that: described contact panel comprises the transparent conductive lamination body of low resistance transparent Electroconductive lamination body according to claim 1 or low resistance patterning according to claim 7.