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CN104624358A - Diamond abrasive material impurity removing method - Google Patents

Diamond abrasive material impurity removing method Download PDF

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Publication number
CN104624358A
CN104624358A CN201310546146.1A CN201310546146A CN104624358A CN 104624358 A CN104624358 A CN 104624358A CN 201310546146 A CN201310546146 A CN 201310546146A CN 104624358 A CN104624358 A CN 104624358A
Authority
CN
China
Prior art keywords
diamond abrasive
removing method
abrasive materials
soaked
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310546146.1A
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Chinese (zh)
Inventor
孔龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201310546146.1A priority Critical patent/CN104624358A/en
Publication of CN104624358A publication Critical patent/CN104624358A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03BSEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
    • B03B7/00Combinations of wet processes or apparatus with other processes or apparatus, e.g. for dressing ores or garbage

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  • Polishing Bodies And Polishing Tools (AREA)

Abstract

The invention discloses a diamond abrasive material impurity removing method. The method comprises the steps that: magnetic separation is carried out on used diamond abrasive materials, metal impurities are removed, the magnetic separated diamond abrasive materials are soaked in a sodium hydroxide solution, the soaked diamond abrasive materials are filtered, and the filtered diamond abrasive materials are washed repeatedly by using clean water; the alkaline soaked diamond abrasive materials are soaked in concentrated sulphuric acid, the soaked diamond abrasive materials are filtered, the filtered diamond abrasive materials are washed repeatedly by using the clean water, and drying is conducted. According to the diamond abrasive material impurity removing method, impurity removing can be carried out repeatedly on the used diamond abrasive materials, the utilizing times of the diamond abrasive materials is further increased.

Description

A kind of diamond abrasive impurity-removing method
Technical field
The present invention relates to a kind of material impurity-removing method, be specifically related to a kind of diamond abrasive impurity-removing method.
Background technology
Diamond abrasive and goods are widely used in the departments such as automobile, machinery, electronics, Aeronautics and Astronautics, optical instrument, glass, pottery, oil, geology, along with the development of technology and product, the field that utilizes of diamond abrasive and goods is also constantly being widened.Diamond abrasive is a kind of valuable abrasive material, when high hardness materials such as grinding and polishing carbide alloy, pottery, jewel, optical glass, is often mixed into the device particle being polished in a large number, make diamond abrasive efficiency of reusing greatly reduce.
Summary of the invention
Technical problem to be solved by this invention is for the deficiencies in the prior art, provides a kind of new diamond abrasive impurity-removing method.
Technical problem to be solved by this invention is realized by following technical scheme.The present invention is a kind of diamond abrasive impurity-removing method, is characterized in: used diamond abrasive is carried out magnetic separation, removes metal impurities, and the sodium hydroxide solution of the diamond abrasive after magnetic separation soaks, filters, and repeatedly rinses with clear water.The diamond abrasive concentrated sulfuric acid after being soaked by alkali soaks, filters, with clear water rinsing, drying repeatedly.
Compared with prior art, the technology of the present invention method, can carry out removal of impurities by the diamond abrasive crossed through Reusability, the access times of diamond abrasive are further enhanced.
Detailed description of the invention
Below further describe concrete technical scheme of the present invention, so that those skilled in the art understands the present invention further, and do not form the restriction to its right.
Embodiment 1, a kind of diamond abrasive impurity-removing method, by used diamond abrasive artificial removal impurity, put into the sodium hydroxide solution of 60 DEG C, solution pH value 12, stir 1 hour, with the impurity such as organics removal, silicon, then filter, repeatedly rinse 6 times with clear water.The concentrated sulfuric acid diamond abrasive soaked through alkali being put into 95% soaks 1 hour, and temperature controls more than 80 DEG C, and constantly stirs 1 hour.Filter, repeatedly rinse to neutrality with clear water.Finally the oven dry of the diamond abrasive of acidleach or natural drying can be obtained the very high diamond abrasive of purity.

Claims (4)

1. a diamond abrasive impurity-removing method, it is characterized in that reusing and can not continue again use diamond abrasive through preliminary removal of impurities, alkali leaching, washing, acidleach, washing, drying.
2. a kind of diamond abrasive impurity-removing method according to claim 1, it is characterized in that the leaching of described alkali be by artificial removal's impurity after the diamond abrasive sodium hydroxide solution of putting into 50-80 DEG C soak 0.5-2 hour, solution pH value 10-14.
3. a kind of diamond abrasive impurity-removing method according to claim 1, it is characterized in that described acidleach is that the concentrated sulfuric acid diamond abrasive soaked through alkali being put into 90-98% soaks 0.5-2 hour, temperature controls at 60-100 DEG C.
4. a kind of diamond abrasive impurity-removing method according to claim 1, is characterized in that described washing is that the diamond abrasive clear water of alkali leaching or acidleach is washed till neutrality repeatedly.
CN201310546146.1A 2013-11-07 2013-11-07 Diamond abrasive material impurity removing method Pending CN104624358A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310546146.1A CN104624358A (en) 2013-11-07 2013-11-07 Diamond abrasive material impurity removing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310546146.1A CN104624358A (en) 2013-11-07 2013-11-07 Diamond abrasive material impurity removing method

Publications (1)

Publication Number Publication Date
CN104624358A true CN104624358A (en) 2015-05-20

Family

ID=53203876

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310546146.1A Pending CN104624358A (en) 2013-11-07 2013-11-07 Diamond abrasive material impurity removing method

Country Status (1)

Country Link
CN (1) CN104624358A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107128908A (en) * 2017-04-17 2017-09-05 安徽卡尔森新材料科技有限公司 The potent pre-treating method of diamond super fine
CN108793154A (en) * 2018-07-20 2018-11-13 河南省亚龙超硬材料有限公司 A kind of processing method of high-purity diadust impurity
WO2020195999A1 (en) * 2019-03-26 2020-10-01 株式会社ダイセル Method for producing nanodiamonds doped with group 14 element, and method for purifying same
RU2825658C2 (en) * 2019-03-26 2024-08-28 Дайсел Корпорэйшн Method of producing nanodiamonds doped with element of group 14, and method for purifying thereof
CN118851169A (en) * 2024-07-04 2024-10-29 山东大学 A method for recovering diamond abrasive from waste slurry from wire-cutting of silicon carbide wafers

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3239321A (en) * 1960-07-22 1966-03-08 Adamant Res Lab Diamond abrasive particles in a metal matrix
SU1379066A1 (en) * 1986-06-23 1988-03-07 Научно-производственное объединение по механизации и автоматизации производства машин для хлопководства "Технолог" Method of processing diamond powders for manufacturing tools on electroplating bond
CN1108287A (en) * 1994-11-04 1995-09-13 成都成华恒达科贸公司 Method for prodn. of blue corundum abrasive
CN1693188A (en) * 2005-04-19 2005-11-09 中国地质大学(武汉) Refining Method of Synthetic Ultrafine Diamond
CN101033065A (en) * 2007-04-13 2007-09-12 中国地质大学(武汉) Method of purifying environment-friendly type ultra-fine diamond
CN102774831A (en) * 2012-07-30 2012-11-14 新疆天科合达蓝光半导体有限公司 Method for extracting diamond abrasives from silicon carbide crystal grinding waste materials
CN103101951A (en) * 2011-11-14 2013-05-15 雅宝研磨材(苏州)有限公司 Method for separating mineral impurities in corundum abrasive materials

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3239321A (en) * 1960-07-22 1966-03-08 Adamant Res Lab Diamond abrasive particles in a metal matrix
SU1379066A1 (en) * 1986-06-23 1988-03-07 Научно-производственное объединение по механизации и автоматизации производства машин для хлопководства "Технолог" Method of processing diamond powders for manufacturing tools on electroplating bond
CN1108287A (en) * 1994-11-04 1995-09-13 成都成华恒达科贸公司 Method for prodn. of blue corundum abrasive
CN1693188A (en) * 2005-04-19 2005-11-09 中国地质大学(武汉) Refining Method of Synthetic Ultrafine Diamond
CN101033065A (en) * 2007-04-13 2007-09-12 中国地质大学(武汉) Method of purifying environment-friendly type ultra-fine diamond
CN103101951A (en) * 2011-11-14 2013-05-15 雅宝研磨材(苏州)有限公司 Method for separating mineral impurities in corundum abrasive materials
CN102774831A (en) * 2012-07-30 2012-11-14 新疆天科合达蓝光半导体有限公司 Method for extracting diamond abrasives from silicon carbide crystal grinding waste materials

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
樊亮等: "人造金刚石微粉提纯工艺技术研究", 《非金属矿》 *

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107128908A (en) * 2017-04-17 2017-09-05 安徽卡尔森新材料科技有限公司 The potent pre-treating method of diamond super fine
CN108793154A (en) * 2018-07-20 2018-11-13 河南省亚龙超硬材料有限公司 A kind of processing method of high-purity diadust impurity
WO2020195999A1 (en) * 2019-03-26 2020-10-01 株式会社ダイセル Method for producing nanodiamonds doped with group 14 element, and method for purifying same
CN113631252A (en) * 2019-03-26 2021-11-09 株式会社大赛璐 Manufacturing method and purification method of nanodiamond doped with carbon group elements
US20220331766A1 (en) * 2019-03-26 2022-10-20 Daicel Corporation Method for producing nanodiamonds doped with group 14 element, and method for purifying same
EP3950109A4 (en) * 2019-03-26 2023-06-07 Daicel Corporation Method for producing nanodiamonds doped with group 14 element, and method for purifying same
JP7526164B2 (en) 2019-03-26 2024-07-31 株式会社ダイセル Method for producing and purifying nanodiamonds doped with group 14 elements
RU2825658C2 (en) * 2019-03-26 2024-08-28 Дайсел Корпорэйшн Method of producing nanodiamonds doped with element of group 14, and method for purifying thereof
CN113631252B (en) * 2019-03-26 2025-05-23 株式会社大赛璐 Method for producing and purifying nanodiamond doped with carbon group element
AU2020246206B2 (en) * 2019-03-26 2025-07-03 Daicel Corporation Method for producing nanodiamonds doped with Group 14 element, and method for purifying same
CN118851169A (en) * 2024-07-04 2024-10-29 山东大学 A method for recovering diamond abrasive from waste slurry from wire-cutting of silicon carbide wafers

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Application publication date: 20150520