CN104624358A - Diamond abrasive material impurity removing method - Google Patents
Diamond abrasive material impurity removing method Download PDFInfo
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- CN104624358A CN104624358A CN201310546146.1A CN201310546146A CN104624358A CN 104624358 A CN104624358 A CN 104624358A CN 201310546146 A CN201310546146 A CN 201310546146A CN 104624358 A CN104624358 A CN 104624358A
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- China
- Prior art keywords
- diamond abrasive
- removing method
- abrasive materials
- soaked
- impurity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
- B03B7/00—Combinations of wet processes or apparatus with other processes or apparatus, e.g. for dressing ores or garbage
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- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention discloses a diamond abrasive material impurity removing method. The method comprises the steps that: magnetic separation is carried out on used diamond abrasive materials, metal impurities are removed, the magnetic separated diamond abrasive materials are soaked in a sodium hydroxide solution, the soaked diamond abrasive materials are filtered, and the filtered diamond abrasive materials are washed repeatedly by using clean water; the alkaline soaked diamond abrasive materials are soaked in concentrated sulphuric acid, the soaked diamond abrasive materials are filtered, the filtered diamond abrasive materials are washed repeatedly by using the clean water, and drying is conducted. According to the diamond abrasive material impurity removing method, impurity removing can be carried out repeatedly on the used diamond abrasive materials, the utilizing times of the diamond abrasive materials is further increased.
Description
Technical field
The present invention relates to a kind of material impurity-removing method, be specifically related to a kind of diamond abrasive impurity-removing method.
Background technology
Diamond abrasive and goods are widely used in the departments such as automobile, machinery, electronics, Aeronautics and Astronautics, optical instrument, glass, pottery, oil, geology, along with the development of technology and product, the field that utilizes of diamond abrasive and goods is also constantly being widened.Diamond abrasive is a kind of valuable abrasive material, when high hardness materials such as grinding and polishing carbide alloy, pottery, jewel, optical glass, is often mixed into the device particle being polished in a large number, make diamond abrasive efficiency of reusing greatly reduce.
Summary of the invention
Technical problem to be solved by this invention is for the deficiencies in the prior art, provides a kind of new diamond abrasive impurity-removing method.
Technical problem to be solved by this invention is realized by following technical scheme.The present invention is a kind of diamond abrasive impurity-removing method, is characterized in: used diamond abrasive is carried out magnetic separation, removes metal impurities, and the sodium hydroxide solution of the diamond abrasive after magnetic separation soaks, filters, and repeatedly rinses with clear water.The diamond abrasive concentrated sulfuric acid after being soaked by alkali soaks, filters, with clear water rinsing, drying repeatedly.
Compared with prior art, the technology of the present invention method, can carry out removal of impurities by the diamond abrasive crossed through Reusability, the access times of diamond abrasive are further enhanced.
Detailed description of the invention
Below further describe concrete technical scheme of the present invention, so that those skilled in the art understands the present invention further, and do not form the restriction to its right.
Embodiment 1, a kind of diamond abrasive impurity-removing method, by used diamond abrasive artificial removal impurity, put into the sodium hydroxide solution of 60 DEG C, solution pH value 12, stir 1 hour, with the impurity such as organics removal, silicon, then filter, repeatedly rinse 6 times with clear water.The concentrated sulfuric acid diamond abrasive soaked through alkali being put into 95% soaks 1 hour, and temperature controls more than 80 DEG C, and constantly stirs 1 hour.Filter, repeatedly rinse to neutrality with clear water.Finally the oven dry of the diamond abrasive of acidleach or natural drying can be obtained the very high diamond abrasive of purity.
Claims (4)
1. a diamond abrasive impurity-removing method, it is characterized in that reusing and can not continue again use diamond abrasive through preliminary removal of impurities, alkali leaching, washing, acidleach, washing, drying.
2. a kind of diamond abrasive impurity-removing method according to claim 1, it is characterized in that the leaching of described alkali be by artificial removal's impurity after the diamond abrasive sodium hydroxide solution of putting into 50-80 DEG C soak 0.5-2 hour, solution pH value 10-14.
3. a kind of diamond abrasive impurity-removing method according to claim 1, it is characterized in that described acidleach is that the concentrated sulfuric acid diamond abrasive soaked through alkali being put into 90-98% soaks 0.5-2 hour, temperature controls at 60-100 DEG C.
4. a kind of diamond abrasive impurity-removing method according to claim 1, is characterized in that described washing is that the diamond abrasive clear water of alkali leaching or acidleach is washed till neutrality repeatedly.
Priority Applications (1)
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CN201310546146.1A CN104624358A (en) | 2013-11-07 | 2013-11-07 | Diamond abrasive material impurity removing method |
Applications Claiming Priority (1)
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CN201310546146.1A CN104624358A (en) | 2013-11-07 | 2013-11-07 | Diamond abrasive material impurity removing method |
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CN104624358A true CN104624358A (en) | 2015-05-20 |
Family
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CN201310546146.1A Pending CN104624358A (en) | 2013-11-07 | 2013-11-07 | Diamond abrasive material impurity removing method |
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CN (1) | CN104624358A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107128908A (en) * | 2017-04-17 | 2017-09-05 | 安徽卡尔森新材料科技有限公司 | The potent pre-treating method of diamond super fine |
CN108793154A (en) * | 2018-07-20 | 2018-11-13 | 河南省亚龙超硬材料有限公司 | A kind of processing method of high-purity diadust impurity |
WO2020195999A1 (en) * | 2019-03-26 | 2020-10-01 | 株式会社ダイセル | Method for producing nanodiamonds doped with group 14 element, and method for purifying same |
RU2825658C2 (en) * | 2019-03-26 | 2024-08-28 | Дайсел Корпорэйшн | Method of producing nanodiamonds doped with element of group 14, and method for purifying thereof |
CN118851169A (en) * | 2024-07-04 | 2024-10-29 | 山东大学 | A method for recovering diamond abrasive from waste slurry from wire-cutting of silicon carbide wafers |
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CN1693188A (en) * | 2005-04-19 | 2005-11-09 | 中国地质大学(武汉) | Refining Method of Synthetic Ultrafine Diamond |
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CN102774831A (en) * | 2012-07-30 | 2012-11-14 | 新疆天科合达蓝光半导体有限公司 | Method for extracting diamond abrasives from silicon carbide crystal grinding waste materials |
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SU1379066A1 (en) * | 1986-06-23 | 1988-03-07 | Научно-производственное объединение по механизации и автоматизации производства машин для хлопководства "Технолог" | Method of processing diamond powders for manufacturing tools on electroplating bond |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107128908A (en) * | 2017-04-17 | 2017-09-05 | 安徽卡尔森新材料科技有限公司 | The potent pre-treating method of diamond super fine |
CN108793154A (en) * | 2018-07-20 | 2018-11-13 | 河南省亚龙超硬材料有限公司 | A kind of processing method of high-purity diadust impurity |
WO2020195999A1 (en) * | 2019-03-26 | 2020-10-01 | 株式会社ダイセル | Method for producing nanodiamonds doped with group 14 element, and method for purifying same |
CN113631252A (en) * | 2019-03-26 | 2021-11-09 | 株式会社大赛璐 | Manufacturing method and purification method of nanodiamond doped with carbon group elements |
US20220331766A1 (en) * | 2019-03-26 | 2022-10-20 | Daicel Corporation | Method for producing nanodiamonds doped with group 14 element, and method for purifying same |
EP3950109A4 (en) * | 2019-03-26 | 2023-06-07 | Daicel Corporation | Method for producing nanodiamonds doped with group 14 element, and method for purifying same |
JP7526164B2 (en) | 2019-03-26 | 2024-07-31 | 株式会社ダイセル | Method for producing and purifying nanodiamonds doped with group 14 elements |
RU2825658C2 (en) * | 2019-03-26 | 2024-08-28 | Дайсел Корпорэйшн | Method of producing nanodiamonds doped with element of group 14, and method for purifying thereof |
CN113631252B (en) * | 2019-03-26 | 2025-05-23 | 株式会社大赛璐 | Method for producing and purifying nanodiamond doped with carbon group element |
AU2020246206B2 (en) * | 2019-03-26 | 2025-07-03 | Daicel Corporation | Method for producing nanodiamonds doped with Group 14 element, and method for purifying same |
CN118851169A (en) * | 2024-07-04 | 2024-10-29 | 山东大学 | A method for recovering diamond abrasive from waste slurry from wire-cutting of silicon carbide wafers |
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Application publication date: 20150520 |