Background technique
The resonating device driven in using face is known.All these devices all include parallel with the substrate of these devices
Bar.Referring to following file:
The invention of WO2012/034949, S.Hentz;
The invention of WO2012/034951, S.Hentz et al.;
The invention of WO2012/034990, S.Hentz.
Principle of tuned mass detection is summarized at this.
It is the particle or one group of particle of mp that considering, which has gross mass, positioned at the resonator with rigidity k and effective mass m
Surface.The resonance frequency of resonator is then equal toThus, frequency before and after deposition quality mp is rung
Answer peak value (under open loop case) deviate one withThe little amount Δ f of difference.Thus, when resonator be used to close
When in ring, resonance frequency can be monitored in real time by means of electrical switching device and closed-loop device.
It can be seen that the single or a group particle of the analyte in resonator surface causes the prominent of the resonance frequency of resonator
So decline.The quality of particle or population can be derived from the measured value Δ f of the sudden change of the frequency.
The testing principle just summarized is completely general and various devices become known for will test principle investment application, especially
It is SAW resonator, bulk acoustic wave resonator, quartz crystal microbalance and MEMS (Micro-Electro-Mechanical
System) bar.
However, resonating device advantageously can be NEMS, because being given above the expression formula Δ f table for frequency agility
Show, frequency increases the sensitivity of additional mass with the reduction of resonator gross mass.Thus, the resonator of nano-scale
In terms of part has the advantages that sensitivity and in terms of detectable limit.It therefore, can be than using using the quality of NEMS systematic survey
The quality of quartz crystal microbalance measurement is small by 1012Times.About this problem, referring to following file:
K.L.Ekinci, Y.T.Tang and M.L.Roukes, 2004, " Ultimate limits to inertial
Mass sensing based upon nanoelectromechanical systems (the inertia matter based on nano electromechanical systems
Measure the final limit of sensing) ", Journal of Applied Physics (applied physics magazine) 95 (5): 2682.doi:
10.1063/1.1642738。
Similarly, it is recently measured about 1yg (yoctogram, gram) (10-27Kg quality).About this problem,
Referring to following file:
J.Chaste, A.Eichler, J.Moser, G.Ceballos, R.Rurali and A.Bachtold, 2012, " A
Nanomechanical mass sensor with yoctogram resolution (the mechanical matter of receiving with gram resolution ratio
Quantity sensor) ", Nature Nanotechnology (natural nanotechnology) 7:301-304.doi:10.1038/
nnano.2012.42。
Quality Resonance detector has very more applications.For example, (1) is used for the chemical sensor of gas detection, (2) are in liquid
Body environment is used to detect the mass spectral analysis (NEMS-MS) of biosensor and (3) based on NEMS of biological cell.For these
Using detectable limit (the smallest detectable quality) obviously has importance above all, not just more accurately determining
Measured quality total amount, and be to the type for being fine distributed very much or being diluted in the carrier components of significant volume into
Row detection.
(1) in the case of chemical sensors for gas detection, NEMS be used to be functionalized layer covering
Surface, functionalization layer have specific chemical affinity for some substances to be measured.Particle corresponding to these substances exists
It is absorbed in the layer, or by uniform pickup in the whole surface of NEMS.
When the concentration to be measured is very low, become very small by the probability of the very small area capture substance of NEMS.Selection
Property addressing array can then be used to make full use of the extraordinary sensitivity of multiple resonators.However it is also able to use big
Capture area.About this problem, with reference to following file:
I.Bargatin, E.B.Myers, J.S.Aldridge, C.Marcoux, P.Brianceau, L.Duraffourg,
E.Colinet, S.Hentz, P.Andreucci and M.L.Roukes, 2012, " Large-scale integration of
Nanoelectromechanical systems for gas sensing applications is (for gas sensing application
The large scale of nano electromechanical systems is integrated) ", Nano letters (nanometer communication) 12 (3) (in March, 14): 1269-74.doi:
10.1021/nl2037479
It and is more specifically Fig. 1 in this document.
(2) in the case where being located at the biosensor of liquid environment, problem is identical as chemical sensor even more tight
Weight: in the case, resonating device is placed in that there are in the liquid environment of biomone to be detected.These biomones are possible must
It must detect respectively, the concentration of particle can become very low at this time.Similarly it is possible to need using passing through or not by individually seeking
The resonator array of location and functionalization or non-functionalization.About this problem, with reference to following file:
S.Guillon, S.Salomon, F.Seichepine, D.Dezest, F.Mathieu, A.Bouchier,
L.Mazenq, C.Thibault, C.Vieu, T.And L.Nicu, 2012, " Biological
functionalization of massively parallel arrays of nanocantilevers using
Microcontact printing (using the biological functional of the large-scale parallel array of the nanometer cantilever of microcontact printing) ",
Sensors and Actuators (sensor and driver) B: chemical 161 (January): 1135-1138.doi:10.1016/
j.snb.2011.10.084
It and is more specifically Fig. 1 in this document.
(3) in the case where NEMS-MS system, this includes each particle (for example, biomone) for mixture
Quality, which measures, deposits, which is initially liquid phase and is projected onto NEMS under vacuum to determine the matter of mixture content
Spectrum, such as in biological medicine identification application.Such system is shown in Fig. 1 in following file, and this document is related to:
A.K.Naik, M.S.Hanay, W.K.Hiebert, X.L.Feng and M.L.Roukes, 2009, " Towards
Single-molecule nanomechanical mass spectrometry (receives mechanical mass spectroscopy about unimolecule
Method) ", Nature Nanotechnology (natural nanotechnology) 4:445-450.doi:10.1038/NNANO.2009.152.
One main problem of the system is to be detected using single NEMS to the particle being incident upon on the surface NEMS:
In general, surface has 1 μm2Area, while the particle beams may have about several squares millis according to the difference of projection system type
Rice arrives several square centimeters of projected area.
This again show using high density NEMS array it is decisive for the use of to maximize capture area.But in NEMS-
In the case of MS, the additional problem that is not present in the first two cases there are one: this is related to as point mass or to when young
In resonator area and the quality of particle that is not distributed in resonator surface measures.However, by the additional of particle
The frequency displacement of initiation depends not only on quality, additionally depends on the position on particle arrival resonator.It is necessary to multiple resonance frequencies
Rate carries out real-time measurement, rather than only measures to one.About this problem, with reference to following file:
S.Dohn, W.Svendsen, A.Boisen and O.Hansen, 2007, " Mass and position
Determination of attached particles on cantilever based mass sensors (is based on quality
Sensor is determined the quality of the attachment particle on cantilever and position) ", Review of Scientific
Instruments (scientific instrument comment) 78:103303.doi:10.1063/1.2804074.
The case where the power for wanting to apply adventive object, particle or the molecule in mechanical structure measures
Under, mechanical structure need not necessarily be resonance.
(1) to (3) in the case of, such as bar or cantilever for detecting particle etc (three-dimensional) element tool
There is 10 times of size (length) (and being therefore taken as one-dimensional) bigger than size under other two dimensions.The size will formed
In the plane of the substrate of device.
In addition, the conversion equipment (a) used is in the same plane of the device, (b) or parallel with the plane of device
It is equal in plane and at a distance from device multiple layers of thickness being deposited on device.
About situation (a), with reference to following file:
E.Mile, G.Jourdan, I.Bargatin, S.Labarthe, C.Marcoux, P.Andreucci, S.Hentz,
C.Kharrat, E.Colinet and L.Duraffourg, 2010, " In-plane nanoelectromechanical
Resonators based on silicon nanowire piezoresistive detection (is based on silicon nanowires pressure
Electromechanical resonator is received in the face of resistive detection) ", Nanotechnology (nanotechnology) 21 (16) (23Aoril):
165504.doi:10.1088/0957‐4484/21/16/165504
It and is specifically Fig. 1 in this document.
About situation (b), with reference to following file:
Mo Li, H.X.Tang and M.L.Roukes, 2007, " Ultra-sensitive NEMS-based
Cantilevers for sensing, scanned probe and very high-frequency applications,
(cantilever applied for sensing, scanning probe and hyperfrequency based on hypersensitization NEMS) " Nature nanotechnology
(natural nanotechnology) 2 (2) (2 months): 114-20.doi:10.1038/nnano.2006.208
It and is specifically Fig. 1 in this document.Following file also relates to:
P.Ivaldi, J.Abergel, M.H.Matheny, L.G.Villanueva, R.B.Karabalin,
M.L.Roukes, P.Andreucci, S.Hentz and E.2011, " 50nm thick AlN film-based
Piezoelectric cantilevers for gravimetric detection (is used for weight based on 50nm thickness AlN film
The cantilever of detection) ", Journal of Micromechanics and Microengineering (micromechanics and micro engineering
Magazine) 21:085023.doi:10.1088/0960-1317/21/8/085023
It and is specifically Fig. 3 in this document.
Connection thus must be present in plane identical with device itself.
These features (the one-dimensional element in substrate plane, need to draw line in the plane of the device) allow to obtain
Good SA/SI ratio, wherein SA deputy activity area, that is, the vibration surface area of obtained MEMS or NEMS, with
And SI is inactive area, that is, non-vibrating surface area.Therefore, the capture area of element to be detected is very small.For example,
It is difficult to obtain the activity surface density for being greater than 1% with these.
Summary of the invention
The purpose of the present invention is overcome disadvantages described above.
According to an aspect of the present invention, crystal column surface is divided into basic " pixel " with high coverage density, and
All not as not or the part on surface (for example, conversion equipment, line, contact) is located at below these pixels.
It should be noted that the present invention is not limited to use wafer;Support included by device disclosed in this invention can lead to
Cross other way acquisition.
Light conversion has been used according to another aspect of the present invention.The electricity conversion of such light conversion proportion such as pressure resistance type system
System is simpler, and power conversion system needs the junior's production tool for being interconnected in active surface by usage type in CMOS method
There is highdensity small size contact point.In practice, this even causes that CMOS is needed to integrate altogether, because there may be a large number of
Electrical connection.
Specifically, the purpose of the present invention is a kind of opto-mechanical devices, comprising:
Support, and included on the support
At least one mechanical organ, at least one described mechanical organ are anchored to the support and are designed to phase
For the support movement, and
For driving the variation of the mechanical organ and/or movement or motion frequency for detecting the mechanical organ
Device, wherein it is described driving and/or detection device at least part between the mechanical organ and the support by cloth
The lower section of the entirety or a part in the mechanical organ is set,
Wherein, the driving and/or detection device include the optical device fixed relative to the support, the optics device
Part includes at least one optical waveguide, at least one described optical waveguide is disposed in institute at the distance determined away from the mechanical organ
State the entirety of mechanical organ or the lower section of a part, and at least one described optical waveguide is designed to propagate at least one and has
The light wave of setted wavelength, the light wave is designed to interact with the mechanical organ, and wherein, the optical waveguide is located at
At the distance determined away from the mechanical organ, so that the evanescent field of the optical waveguide and the mechanical organ interact.
" evanescent field and the mechanical organ interact " refers to that the evanescent field is interfered in the displacement of the mechanical organ.
Mechanical organ or multiple mechanical organs can be resonance or non-resonant.
The support can have plane surface.Mechanical organ can also have the shape of elongation, such as in rod, the shape
Shape can or out of plumb vertical with the surface.
Preferably, the mechanical organ have with made by the device in the vertical element of the plane of layer, the member
Part has the one end that anchors to one end of the support and can move in the plane parallel with the plane of the layer, or tool
There is the element parallel with the plane of the layer, the element suspends relative to the support by least both ends and can be with institute
State the plane vertical ground motion of layer.
A specific embodiment according to the present invention, it is humorous that the mechanical organ forms the machinery with given resonance frequency
Shake device.
The quantity of optical device can be less than or equal to the quantity of the mechanical organ.
In the case where above-mentioned specific embodiment, device disclosed in this invention may include one of each mechanical organ
Optical device or for one group with mutually different resonance frequency mechanical organ an Optical devices.
A specific embodiment of disclosed opto-mechanical device according to the present invention, the optical device further includes optical resonance
Device, the optical resonator is optically coupling to the waveguide.The optical resonator can be in the form of ring.However it the present invention and not only limits
In the shape;Other shapes are also it is contemplated that for example, the combination of " runway " shape, elliptical shape etc. or these shapes.
A specific embodiment according to the present invention, the mechanical organ include being designed to receive one or more particles
Receiving area, one or more of particles can cause or change the movement of the mechanical organ, will pass through by described
The signal that detection device provides determines the physical property of the particle or the multiple particle.
The mechanical organ may include the bar of substantially linear, the bar have anchor to the first end of the support with
And it is provided with the second end of plate, the plate forms the receiving area.
In the case, a specific embodiment according to the present invention, the bar are approximately perpendicular to the support and institute
It states plate and is approximately perpendicular to the bar.
A specific embodiment of disclosed opto-mechanical device according to the present invention, the mechanical organ form mechanical resonant
Device, when the receiving area receives the particle or the multiple particle, the resonance frequency variation of the mechanical resonator.
First specific embodiment according to the present invention, the receiving area are designed to receive material particle.
Term " material particle " is used to refer to atom or the atom set linked by non-covalent bond, elements collection very
To being a group element (especially cell or protein).
Second specific embodiment according to the present invention, the receiving area include being designed to by the electricity in preset range
The material that the particle that photon in magnet rate is formed is absorbed.
Specific embodiment
According to an aspect of the present invention, near field light conversion has been used rather than electricity conversion.The principle of the conversion process exists
It is schematically shown in Fig. 1.
It, should be referring to following documents about this problem:
T.J.Kippenberg's et al., 2008, Cavity optomechanics:back-action at the
Mesoscale (chamber photodynamics: the reaction of meso-scale), Science (Scientific Magazine) (New York, N.Y.), 321
(5893), pp.1172-6.
Conversion process is based on (mechnical oscillator 2) mechanical freedom, and (it is to generate in such as optical cavity 4 with light freedom degree
Electromagnetic field result) coupling.As can be seen, which is provided and by the laser beam 6 for passing through pellicle mirror 8 by another
The flexible mirror 12 of a part of one pellicle mirror 10 and formation mechnical oscillator defines.In practice, when the displacement of flexible mirror 12 changes
Above-mentioned coupling is obtained when becoming the resonant mode of chamber 4.
Appended drawing reference 13 indicates the photodetector of the phase/amplitude of the light from pellicle mirror 10.
In addition, the evanescent field of optical waveguide to the variation of surrounding medium (for example, the presence or absence of refractive index, object, relative to
The distance change of the object) it is sensitive, therefore the variation of surrounding medium has influence to the circulation way of electromagnetic field.
In micro- dish-type resonant cavity with high-precision angle value, this will lead to the significant displacement of optical resonance frequency.Pass through light wave
The evanescent field led is coupled to the object at resonant cavity can be in the optical resonance of the mechanical oscillation frequencies modulated resonant cavity of resonant cavity
Frequency.
This conversion has been used for nanoscale, as shown in Fig. 2, by nano-machine device 14 and being coupled to optical waveguide 18
On resonant mode annular optical resonator 16 coupled.
It, should be referring to following documents about this problem:
G.Anetsberger's et al., 2009, Near-field cavity optomechanics with
Nanomechanical oscillators (using the near field chamber photodynamics of mechnical oscillator is received), Nature Physics (from
Right physics), 5 (12), pp.909-914.
This makes it possible to obtain the displacement resolution for being less than 1fm/Hz1/2.
This conversion also allows drive because of optical gradient forces and the complete light of mechanical resonator is therefore allowed to convert.About
This problem, should be referring to Gu following documents:
M.Li's et al., 2009, Broadband all-photonic transduction of
Nanocantilevers (broad band full of nanometer cantilever swashs property conversion), Nature Nanotechnology (natural nanometer skill
Art), 4 (June), pp.377-382.
It is this other than a possibility that outstanding mechanical displacement Measurement Resolution, wide dynamic range and complete light operate
The conversion of type also has the advantages that many other.
For example, under certain condition (close coupling, comparable smooth time constant and mechanical time constant), can be caused
The bucking effect of self-vibration.The control and servo operation or to make an uproar which strongly simplifies mechanical devices under its resonance frequency
Sound can be reduced.It, should be referring to following documents about this problem:
M.Hossein-zadeh's et al., 2010, An Optomechanical Oscillator on a Silicon
Chip (the opto-mechanical oscillator on silicon chip), IEEE Journal of selected topics in quantum
Electronics, 16 (1), pp.276-287.
In addition it is possible to use any kind of material, and be not only conductive of material.
Light belt is wide also very big, it means that (usually several girz) resonance at very high frequencies can be used
The mechanical device of very small quality.It is still not achievable that this passes through electricity conversion in practice.The bandwidth also allows for pair
A large amount of mechanical devices are multiplexed.
The present invention proposes to utilize these advantages.According to an aspect of the present invention, all or part of light conversion device quilt
It is placed on mechanical activity lower face, especially includes one or more mechanical organs and one or more driving/detection devices,
Wherein, these devices are corresponding with the optical device 21 in Fig. 3 A and Fig. 3 B.
Fig. 3 A and Fig. 3 B schematically show the example of opto-mechanical device disclosed by the invention.Fig. 3 A is bowing for the device
View and Fig. 3 B are the sectional view of the section AA along Fig. 3 A.In this example, which constitutes base pixel.
The device includes the optical device 21 on support 20 and support 20, optical device 21 fixed relative to support and
Including optical waveguide 22 (there may be have several optical waveguides 22 for multi-port operation) and toroidal cavity resonator 24, toroidal cavity resonator 24
Waveguide 22 is coupled to by fadout coupling and is tuned to the optical wavelength for example close to 1550nm.
It should be pointed out that Fig. 3 A and Fig. 3 B shown in device by optically coupling to the unshowned laser in waveguide 22 Lai
Supply luminous energy.
A certain number of mechanical organs 26 are anchored to support 20 and are designed to move relative to support 20.Mechanical member
Part 26 forms mechanical resonator.In this example, there are four resonators 26, but can have the number of single resonator and resonator
Amount can be with up to tens.
Resonator 26 has resonance frequency close to each other but differing from each other.Each resonator 26 is thus in its own frequency
Rate modulated luminous energy.Information in each of these frequencies therefore can be by optically coupling to the unshowned light in optical waveguide
The optical output signal of detection device is demodulated to restore.
This addressing based on frequency is similar to and should carry out technology disclosed in the following documents of reference:
WO 2012/172204, Systeme de mesure à r é sonateurs é lectrom é caniques, proc
édé de fabrication d’un tel système et procédé de lecture d’au moins deux ré
(measuring system of electromechanical resonator makes the method for the system and at least two to sonateurs é lectrom é caniques
The method that a electromechanical resonator is read out), the invention of E.Colinet et al..
Back to Fig. 3 A and Fig. 3 B, it can be appreciated that each mechanical organ 26 includes the bar 28 of substantially straight line, 28 quilt of bar
It is designed to move relative to support 20.One end of bar 28 is anchored to support 20 and the other end is equipped with the plate of substantially flat shape
30, plate 30 is perpendicular to bar and forms region for receiving particle 31, wherein expectation detects and measures the object of these particles
Rationality matter.These particles change the respective resonance frequency of bar.
As can be seen, bar is surrounded by annular optical resonator 24 and optical resonator 24 is located at 26 lower section of plate.
Each of these mechanical organs can be vibrated in the following manner:
With its fundamental mode (can be the bending die of vertical bar 28 for sufficiently rigid plate 30);
Or with one in higher mode, it can be the bending die (mechanical movement in face) of vertical bar 28;
Or with extension die (in the case where plate 30 keeps rigidity vertical bar along its axis vibration);
Or the crooked syntony mould (vertical mechanical movement) with plate 30 alone again.
In all cases, bar 28 and plate 30 must close enough optical resonator 24, usually receive away from optical resonator 24 is several hundred
Rice, so as to optical resonator there is good opto-mechanical to couple.
It is uniformly distributed in the range of adding quality (that it changes the movements of bar) in plate caused by the reception because of particle 31
In the case where (such as gas detection), the single mould of each mechanical organ enables the quality of addition to be measured.
In the case where adding point mass (such as inspection of cell or simple protein), under first three operational circumstances,
Single mould can be used to measure additional mass, and be different from the situation with conventional NEMS bar or the contemplated the 4th kind
The situation (mould of the experience bending vibration of plate 30) of the case where operation, because frequency shift at this time additionally depends on particle to be measured
Position.
The case where conventional NEMS bar and it is related to the quantity of mould required for quantified additional to point mass
The case where should be referring to following documents:
M.S.Hanay et al., 2012, Single-protein nanomechanical mass spectrometry in
Real time (simple protein receive in real time mechanical mass spectral analysis), Nature Nanotechnology, 7 (Septembers), pp.602-
608。
It is also contemplated that using type shown by Fig. 3 A and Fig. 3 B but without the arrangement of optical resonator.In such case
Under, mechanical resonator 26 must be placed along waveguide 22.Mechanical resonator 26 does not modulate optical resonance frequency: mechanical resonator then
The luminous energy that 26 modulation are projected by waveguide 22.The corresponding resonance frequency of mechanical resonator 26 must be mutually different again.
On the other hand, in the case where mechanical structure is not resonance, mechanical structure changes the luminous energy or optical resonator projected
Frequency, this change is measured to establish the static state or quail-static displacement of mechanical structure.
With the opto-mechanical device of same type shown in Fig. 3 A and Fig. 3 B make extremely lightweight and therefore to addition
The very sensitive mechanical resonator to be directed at high-frequency resonance of quality can be used.In addition, being shown in Fig. 3 A and Fig. 3 B
The use of pixel of type directly enable to be addressed various mechanical resonators that required port number is reduced.
In addition, the device of the type shown in these Fig. 3 A and 3B allows this pixel to be installed into along single waveguide
Tandem, and allow to be formed the very intensive array including a large amount of mechanical resonators, so that it is minimal number of to have component
Input terminal/output end.It is this to significantly reduce the needs of interconnection.In this case, optical resonator is adjusted to mutually respectively
Slightly different wavelength, so that each of these resonators be allowed to be addressed by specific optical wavelength.All these letters
It number is sent in same waveguide and at the same time the output in the waveguide is demodulated.
The single mechanical resonator for covering entire optical resonator can be used only, and the mechanical resonator includes example thus
Such as film.However, needing minimum diameter (usually 10 μm), thus for optical resonator to ensure excellent tuned mass.
Generated mechanical devices have large scale, and this reduce the sensibility to addition quality, except non-device is ultra-thin and elongated
's.
Fig. 4 A and Fig. 4 B schematically show the example of pixel, the pixel include for optical resonator single machinery it is humorous
Shake device.Fig. 4 A is the top view of pixel, and Fig. 4 B is the sectional view along the section AA cutting of Fig. 4 A.
It can again be seen that the support 20 of carrying optical waveguide 22 and annular optical resonator 24.Form the element of mechanical resonator
44 is associated with optical resonator 24 and including film 46, and film 46 covers entire resonator 24 and is shelved on by pillar 48
On support 20.In the illustrated example, film is substantially square form and pillar is located at four of the square and turns
At angle, as can see in Figure 4 A.
In the examples described above, for simplicity, it is implicitly assumed that the driving element and this yuan of each mechanical organ
The detection device of the variation of the displacement frequency of part is all optical system.
However, driving element be also possible to it is external and for example real by vibration piezoelectric element (or piezoelectric vibrator)
It is existing, or can be DYN dynamic such as electrostatic (by close to mechanical resonator, such as in the substrate for constituting support 20
Doped region in place electrode), or using being formed in and conducting electrode at mechanical resonator same position is realized.
In addition, being given above example of the invention is related to the detection of weight measurement.However, the present invention is not limited to one this
The application of sample: (or static displacement) detection based on frequency that present invention can also apply to any kind of, such as in Terahertz
In imaging or bolometer field.
In this case, the plate 30 in Fig. 3 A and Fig. 3 B and the film 46 in Fig. 4 A and Fig. 4 B can be covered with or very
To being made of single piece of material 49 (Fig. 4 B), material 49 absorbs the photon P in studied EM frequencies.For example,
In the case where infra-red radiation for bolometer, which can be titanium.
The manufacture of device according to the present invention will be considered below.
Waveguide can be formed on rigid mount by silicon or silicon nitride, such as be made of plate silicon.Photon can also be returned
Road makes on flexible substrates, and wherein optical waveguide is made of polymer.
The MEMS or NEMS that may be used in the present invention can be made or by even of silicon, silicon nitride, silica, silicon carbide
Any other material of polymer is made, and mounting structure is preferably made of silicon, silicon nitride or silicon carbide.
I. the first example (Fig. 5 A to Fig. 5 J) of manufacturing method
I.1 the manufacture (Fig. 5 A) of photon chip
The starting point for manufacturing the device is buried oxide (BOX) plate 50, and plate 50 includes that a layer thickness on silicon substrate 54 is
The silica 52 of 200nm.The plate 50 is constructed to obtain desired photon circuit (standard procedure).Each waveguide 56 is by silicon
It is made and is of approximately such as 100 × 100nm2To 500 × 500nm2Cross section.Each annular optical resonator 58 has
Internal diameter, about 200 to 500nm width and the thickness of about 200nm to 500nm about from 5 μm to 20 μm.Inside chip
The typical length of waveguide is from 100 μm to several millimeters.
About this problem, following documents should be see, for example:
US 2012/0063717,Method of producing a photonic device and
The invention of corresponding photonic device, Laurent Grenouillet et al..
US2010/0265504,Optical device with superimposed photonic circuits for
The invention of coupling to one or more optical waveguides, Christophe Kopp et al..
I.2 prepare/protect chip (Fig. 5 B and Fig. 5 C)
The oxide 60 of a thin layer is for example deposited using PECVD to protect the optical waveguide being made of silicon.The layer 60 has
Such as the thickness of 10nm.
Then, depth is more than that the sacrificial layer 62 of the polysilicon of 500nm is deposited.The depth is such as 550nm so as to most
There are the spaces of 50nm between used MEMS or NEMS and waveguide when discharging afterwards.It (alternatively, can be by HfO2Erosion
Carve trapping layer be deposited directly in waveguide, or deposit to several nanometers before deposit silica on, then carry out such as 500nm
Silica deposition, will be used as the sacrificial layer discharged using hydrofluoric acid).
Then, using the last thin oxide layer 64 with a thickness of 10nm of PECVD deposition, (this step is unsuitable for above-mentioned alternative
Case).
The surface of thus obtained structure 66 is leveled and is cleaned so that it prepares for bonding.Layer 64 is constructing
It is used as trapping layer during MEMS or NEMS.
I.3 MEMS or NEMS layers (Fig. 5 D to Fig. 5 F) on upper layer, future are bonded.
SOI formula including 500 μm of pedestal silicon 70, the top silicon 74 of the buried oxide BOX 72 of 400nm and 200nm
Chip 68 is glued to the surface of the photon chip formed by structure 66.The bonding of chip 66 and 68 for example bonds skill by molecule
Art is realized.It should be noted that replacing SOI formula chip, it can be used and be thinned and be then leveled until obtaining desired thickness
The silicon wafer of degree.
The structure of generation then passes through the silicon 70 (that is, 500 μm) for removing whole thickness and ends at buried oxide
(BOX) it is thinned.
Then, buried oxide 72 be removed (Fig. 5 F) and top silicon 74 be leveled with obtain about from 200nm to
The desired thickness of 10nm.The stacked group with two chips of silicon/oxide interface is obtained as a result,.In this way in construction NEMS
Or between MEMS, the configuration of SOI: top silicon/10nm oxide/550nm polysilicon of 200nm thereby is achieved.
I.4 it is configured to MEMS or NEMS array (Fig. 5 G to Fig. 5 I)
Conventional active ion corrosion (RIE) photoetching/etching step is executed to construct MEMS or NEMS (ginseng in silicon layer 74
See the paper of E.Mile for example above quoted et al.).Then the step ends at the oxide skin(coating) 62 of 10nm thickness.(however,
In above-mentioned alternative solution, which directly ends at the silica of the 550nm as sacrificial layer).
Then (Fig. 5 I), MEMS or NEMS by correspondingly oxidation be more than such as 10nm thickness, so as to discharge silicon be made
Sacrificial layer during protect these MEMS or NEMS structures.The oxide layer of generation has appended drawing reference 76.(in above-mentioned alternative solution
In the step be unnecessary).
MEMS or NEMS array will have the surface area smaller than photon circuit, to leave sky to introduce light by optical fiber
Between.
Then, photoetching is executed on the region that must be released using RIE (anisotropic etching), is followed by oxide
It etches (10nm+10nm) (step is unnecessary in above-mentioned alternative solution).
I.5 movable structure (Fig. 5 J) is discharged
MEMS or NEMS structure is released by using the isotropic etching of the XeF2 polysilicon carried out.It (is replaced above-mentioned
For in scheme, having used another method: release use hydrofluoric acid, by the silica of etching 550nm and by HfO2On
It carries out preventing to be performed).
Finally, obtain MEMS the or NEMS structure of suspension, the structure by 10nm oxide/200nm to 50nm silicon/
The oxide of 20nm is covered with oxide of a layer thickness between 5nm and 10nm and the above-mentioned silicon wave for example equal to 10nm
Lead composition.
II. the second example (Fig. 6 A to Fig. 6 E) of manufacturing method
Between second example and the first example is not both due to will be on MEMS or NEMS wafer bonding to photon chip
Keep profile (being bonded on cavity) simultaneously.
Photon circuit keeps identical.However, design exemplary for second, should advantageously provide big bonding surface.One
A chip is for example bonded directly on another chip by molecule bonding technology.Support the chip of the MEMS or NEMS in future
It is made of silicon and is coated with oxide, which will constitute both bonding interface and sacrificial layer.
Fig. 6 A shows the chip 80 of carrying waveguide 82 and the ring of light 84.Waveguide 82 and the ring of light 84 rest on included by chip 80
Silica layer 86 on.It can also be seen that the bonding surface 88 for bond wafer.
It can also be seen that the chip 90 being made of silicon.Chip 90 has the superficial layer 92 of silica, and the superficial layer 92 of silica is logical
Cross the thickness that PECVD is obtained and is of approximately such as 10nm to 500nm.The layer 92 will act as sacrificial layer, so that light be arranged
Interval between resonator and MEMS or NEMS structure.
Fig. 6 B shows the chip 80 and 90 being bonded to one another.The layer 92 of chip 90 be glued to chip 80 in fig. 6
It is 88 surface in appended drawing reference.
Then (Fig. 6 C), chip 90 are thinned by physical chemistry grinding, execute last leveling (polishing) then to obtain
Obtain the desired thickness between 10nm and 200nm.
MEMS or NEMS then passes through photoetching/etching and is constructed out (Fig. 6 D).Appended drawing reference 94 correspond to the MEMS or
The NEMS and appended drawing reference 96 correspond to its mechanical support.
Then, institute's some need (Fig. 6 E) is for example to execute release by HF vapor etch.In the illustrated example, in light
The oxide occurred below sub-loop will be subjected to some etchings in deenergized period.This can be controlled by different modes: sacrificial
Oxide in domestic animal layer is smaller than the density for being placed in the thermal oxide below photon circuit and therefore than being placed in below photon circuit
Thermal oxide etches faster.The earlier anisotropic etching of Si oxide can also be executed to limit HF isotropic etching
Time.
III. the third example of manufacturing method
From the viewpoint of manufacturing method, standard " photon circuit on silicon " and " MEMS or NEMS on silicon " method can
With combination:
Base portion chip can be SOI wafer, including for example with a thickness of the top layer of 220nm and with a thickness of 2 μm of BOX layer.
- the first photoetching/etch cycle allows waveguide and optical resonator and coupling array to be built in the top layer of SOI wafer
Mould, coupling array are needed for connecting with optical fiber, and fiber design is at being connected to laser for opto-mechanical device and couple
To the device of light detection.
Then the SiO for example with a thickness of 500nm is executed2Deposition.
Then, it is performed using the leveling of chemically mechanical polishing (CMP), prevents the CMP to limit optical resonator and machine
Vertical optical interval between tool resonator.
Then, one layer of HfO of such as thickness with 20nm is deposited2Trapping layer, to ensure that the release of mechanical structure will not
Lead to the release of light guide and optical resonator.
Photoetching/etching is executed to disconnect trapping layer/oxide stacked group and build to the anchoring of the mechanical structure in future
Mould.
Wish that form the material layer of mechanical structure is deposited.The material layer is the more of such as one layer thickness with 100nm
Crystal silicon.
The opto-mechanical device according to the present invention being described referring to Fig. 3 A, Fig. 3 B and Fig. 4 A, Fig. 4 B includes constituting resonance
The mechanical organ of device.However, the present invention is not limited to such situations: opto-mechanical device according to the present invention can be used one or
More disresonance mechanical organs, such as in order to detect the power of such as cell power.In this case, opto-mechanical device does not use
For driving the device of mechanical organ or multiple element, using only (logical for detecting element or the device of the displacement of multiple element
It crosses using light wave, as can be hereinbefore seen).
In addition, particularly referring to Fig. 3 B and Fig. 4 B, it should be noted that the mechanical organ of device according to the present invention can be with
With perpendicular to made by the device in layer plane element, the element have anchors to support possessed by the device
End and the end that can be moved in the plane for being parallel to this layer, or the element with the plane for being parallel to this layer, this yuan
Part suspends relative to support via at least end and can be perpendicular to the plane motion of this layer.