CN104575656B - Multi-inclination-angle composite multi-film Laue lens and design method thereof - Google Patents
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Abstract
本发明公开了一种多倾斜角复合多层膜劳厄透镜。本发明的透镜包括m个沿垂直于入射光方向排列的倾斜型多层膜劳厄透镜;其中,每一所述倾斜型多层膜劳厄透镜内的所有膜层与入射光具有相同的夹角;该多倾斜角复合多层膜劳厄透镜能够实现衍射极限聚焦;m大于2;靠近中心区域的倾斜型多层膜劳厄透镜的膜层厚度较大,其膜层与入射光具有较小的夹角;靠近外层区域的倾斜型多层膜劳厄透镜的膜层厚度较小,其膜层与入射光具有较大的夹角。该具有与Wedge MLL相接近的聚焦性能,且易于加工实现。
The invention discloses a multi-inclination angle compound multi-layer Laue lens. The lens of the present invention comprises m inclined multilayer film Laue lenses arranged along the direction perpendicular to the incident light; wherein, all film layers in each said inclined multilayer film Laue lens have the same clamping distance as the incident light angle; the multi-inclination angle compound multilayer Laue lens can achieve diffraction-limited focusing; m is greater than 2; the film thickness of the inclined multilayer Laue lens near the central area is relatively large, and its film layer has a relatively large relationship with the incident light Small included angle; the inclined multilayer Laue lens near the outer layer has a smaller film thickness, and its film layer has a larger included angle with the incident light. It has a focusing performance close to that of Wedge MLL, and is easy to process and realize.
Description
技术领域technical field
本发明涉及一种硬X射线纳米聚焦光学元件及其设计方法,尤其涉及多层膜劳厄透镜,属于同步辐射光束线工程、同步辐射光学领域The invention relates to a hard X-ray nano-focusing optical element and a design method thereof, in particular to a multilayer Laue lens, belonging to the fields of synchrotron radiation beamline engineering and synchrotron radiation optics
背景技术Background technique
第三代同步辐射所具有的高亮度、高准直性等特性以及硬X射线所具有的独特性质,例如强穿透能力、对结构信息和化学信息的敏感性、对电磁场的不敏感性等,使得硬X射线显微镜在材料学、医学、生物学以及环境科学等诸多领域具有广泛的使用。X射线显微镜的性能取决于聚焦光斑的光强与大小。迄今为止,各种各样利用反射、折射以及衍射的聚焦光学元件已经能够将硬X射线聚焦到几十纳米大小的量级。在这些聚焦光学元件中,衍射型聚焦元件——多层膜劳厄透镜(MLL)最有希望实现真正意义上的纳米量级(1nm)的聚焦(参考文献:H.Yan et al.,Multilayer Laue Lens:A Path Toward One Nanometer X-RayFocusing,X-ray Opt.Instrum.2010,401845(2010))。目前MLL在实验上已经对硬X射线实现最高分辨率约11nm的一维聚焦,效率约15%;25×27nm的二维聚焦,效率约2%。The third-generation synchrotron radiation has the characteristics of high brightness and high collimation, and the unique properties of hard X-rays, such as strong penetrating ability, sensitivity to structural information and chemical information, insensitivity to electromagnetic fields, etc. , making hard X-ray microscopes widely used in many fields such as materials science, medicine, biology and environmental science. The performance of an X-ray microscope depends on the intensity and size of the focused spot. So far, a variety of focusing optics using reflection, refraction, and diffraction have been able to focus hard X-rays down to the order of tens of nanometers. Among these focusing optical elements, the diffractive focusing element—Multilayer Laue lens (MLL) is the most promising to achieve true nanoscale (1nm) focusing (reference: H.Yan et al., Multilayer Laue Lens: A Path Toward One Nanometer X-RayFocusing, X-ray Opt.Instrum.2010, 401845(2010)). At present, MLL has experimentally realized one-dimensional focusing of hard X-rays with the highest resolution of about 11nm, with an efficiency of about 15%; two-dimensional focusing of 25×27nm, with an efficiency of about 2%.
由于MLL具有极大的深宽比(沿着入射光方向的深度与最外层膜层厚度的比值),X射线在其中的传播必须采用衍射动力学来描述,此时每一层膜层是否满足Bragg条件MLL能否获得高效率高分辨率的关键。根据膜层满足Bragg条件的程度,可以将多层膜劳厄透镜分为四种类型:水平型(Flat)、倾斜型(Tilted)、Wedge(楔形)以及弯曲型(Curved)(参考文献:H.Yan et al.,Takagi-Taupin description ofx-ray dynamical diffraction fromdiffractive optics with large numerical aperture,Phys.Rev.B 76,115438(2007))。在这四种类型中,Flat和Tilted MLL在结构本质上是一样的,不同的是Flat MLL其所有膜层与入射光的夹角都为0,所有膜层都不满足Bragg条件,而Tilted MLL其所有膜层与入射光具有相同的角度,只有一部分膜层满足Bragg条件。因此对于Tilted MLL而言,要实现衍射极限聚焦,必须减小深度,尽量降低衍射动力学效应的影响,这必然会导致其只有较低的效率(参考文献:Hanfei Yan et al.,Optimization of multilayer Laue lenses for ascanning X-ray microscope,J.Synchrotron Rad.20,89(2013))。Wedge MLL其每一个膜层都具有不同的倾斜角,所有膜层都近似满足Bragg条件,理论计算结果显示其可以实现高效率的衍射极限聚焦。Tilted MLL镀制工艺相对简单,目前实验上报道的MLL基本上都属于此种类型,而Wedge MLL由于其结构的复杂性,导致其镀制工艺比较困难,目前还未见实验上的报道。Since the MLL has a very large aspect ratio (the ratio of the depth along the incident light direction to the thickness of the outermost layer), the propagation of X-rays in it must be described by diffraction dynamics. At this time, whether each layer of the film layer Satisfying the Bragg condition is the key to whether MLL can obtain high efficiency and high resolution. According to the degree to which the film layer satisfies the Bragg condition, the multilayer Laue lens can be divided into four types: horizontal (Flat), inclined (Tilted), wedge (wedge) and curved (Curved) (reference: H . Yan et al., Takagi-Taupin description of x-ray dynamical diffraction from diffractive optics with large numerical aperture, Phys. Rev. B 76, 115438 (2007)). Among these four types, the structure of Flat and Tilted MLL is essentially the same, the difference is that the angle between all layers of Flat MLL and the incident light is 0, and all layers do not satisfy the Bragg condition, while Tilted MLL All its layers have the same angle with the incident light, and only a part of the layers satisfy the Bragg condition. Therefore, for Tilted MLL, in order to achieve diffraction-limited focusing, the depth must be reduced to minimize the influence of diffraction dynamics, which will inevitably lead to lower efficiency (reference: Hanfei Yan et al., Optimization of multilayer Laue lenses for ascanning X-ray microscope, J. Synchrotron Rad. 20, 89(2013)). Each film layer of Wedge MLL has a different tilt angle, and all film layers approximately satisfy the Bragg condition. Theoretical calculation results show that it can achieve high-efficiency diffraction-limited focusing. The plating process of Tilted MLL is relatively simple, and the MLLs reported in experiments basically belong to this type. However, due to the complexity of its structure, the plating process of Wedge MLL is relatively difficult, and no experimental reports have been seen so far.
发明内容Contents of the invention
本发明的目的在于提出一种新的MLL结构——多倾斜角复合MLL,以解决TiltedMLL实现衍射极限聚焦时效率低和Wedge MLL镀制工艺难的问题。The purpose of the present invention is to propose a new MLL structure - multi-tilt angle composite MLL to solve the problems of low efficiency when TiltedMLL realizes diffraction-limited focusing and difficult Wedge MLL plating process.
本发明可以通过以下技术方案来实现:The present invention can be realized through the following technical solutions:
一种多倾斜角复合MLL,其特征在于:该多倾斜角复合MLL是由一系列Tilted MLL沿着垂直于入射光方向排列而成;对于其中单个Tilted MLL,其所有膜层与入射光具有相同的夹角;靠近中心区域膜层厚度较大的Tilted MLL,其膜层与入射光具有较小的夹角;靠近外层区域膜层厚度较小的Tilted MLL,其膜层与入射光具有较大的夹角;该多倾斜角复合MLL能够实现衍射极限聚焦,具有与Wedge MLL相接近的聚焦性能。A multi-tilt composite MLL is characterized in that: the multi-tilt composite MLL is formed by a series of Tilted MLLs arranged along a direction perpendicular to the incident light; for a single Tilted MLL, all of its film layers have the same The included angle of the Tilted MLL with thicker film near the central area has a smaller angle between the film and the incident light; the Tilted MLL with smaller film thickness near the outer area has a relatively small angle between the film and the incident light Large included angle; the multi-tilt-angle composite MLL can achieve diffraction-limited focusing, and has a focusing performance close to that of Wedge MLL.
所述的每个Tilted MLL具有相等或者近似相等的膜层数量。Each of the Tilted MLLs has an equal or approximately equal number of film layers.
所述的单个Tilted MLL中,其膜层与入射光的夹角θ使得该Tilted MLL中膜层编号为最中间的相邻两个膜层满足Bragg条件。In the single Tilted MLL, the included angle θ between the film layer and the incident light makes the two adjacent film layers whose film layer number is the middlemost in the Tilted MLL satisfy the Bragg condition.
所述的多倾斜角复合MLL,其入射面和出射面相互平行,且垂直于入射光。The incident plane and the outgoing plane of the multi-tilt composite MLL are parallel to each other and perpendicular to the incident light.
所述的多倾斜角复合MLL,其具体结构参数可以通过以下的步骤来实现:Described multi-inclination composite MLL, its specific structural parameters can be realized through the following steps:
(1)首先根据入射X射线的能量(波长λ)、镀膜的能力(膜层总厚度L)和聚焦分辨率r选择合适的焦距f,f可由瑞利判据公式得到,r=0.5λ/NA≈λf/L;再根据要求的工作距离wd以及实际镀膜的精度选择一个折衷的方案,确定Flat MLL中最外层膜层厚度、最内层膜层的厚度、总的膜层数N以及每一层膜层的编号n,具体而言即先通过工作距离公式wd=fε求得ε,这儿ε=(xo-L)/xo,xo指的是最外层膜层的位置,此时根据波带片公式即可得到最外层膜层厚度、最内层膜层厚度、总的膜层数N以及每一层膜层的编号n。这儿需要特别指出的是在本技术方案中,Flat MLL中每一层膜层的编号n是固定,其由波带片公式所决定x(n)2=nλf,x(n)指的是编号为n的膜层的位置;并且多倾斜角复合MLL中每一层膜层的编号和Flat MLL相同,即多倾斜角复合MLL中第i层膜层和Flat MLL中第i层膜层的编号是一样的,它们总的膜层数N也是一样的。(1) First, select the appropriate focal length f according to the energy of the incident X-ray (wavelength λ), the ability of the coating (total thickness L of the film layer) and the focusing resolution r, f can be obtained by the Rayleigh criterion formula, r=0.5λ/ NA≈λf/L; then choose a compromise solution according to the required working distance w d and the accuracy of the actual coating, and determine the thickness of the outermost layer, the innermost layer, and the total number of layers N in Flat MLL And the number n of each film layer, specifically, first obtain ε through the working distance formula w d = fε, where ε=(x o -L)/x o , x o refers to the outermost film layer At this time, according to the zone plate formula, the thickness of the outermost layer, the thickness of the innermost layer, the total number of layers N and the number n of each layer can be obtained. What needs to be pointed out here is that in this technical solution, the number n of each film layer in Flat MLL is fixed, which is determined by the zone plate formula x(n) 2 =nλf, x(n) refers to the number is the position of the film layer of n; and the number of each film layer in the multi-slope composite MLL is the same as that of the Flat MLL, that is, the number of the i-th film layer in the multi-slope composite MLL and the i-th film layer in the Flat MLL are the same, and their total number of film layers N is also the same.
(2)根据所述的波长、焦距、最外层和最内层膜层厚度,运用衍射动力学理论Takagi-Taupin description of dynamical diffraction theory(TTD)或者Coupledwave theory(CWT)计算Wedge MLL不同深度下的波前分布和衍射效率(参考文献:H.Yan etal.,Takagi-Taupin description of x-ray dynamical diffraction from diffractiveoptics with large numerical aperture,Phys.Rev.B 76,115438(2007);J.Maser etal.,Coupled wave description ofthe diffraction by zone plates with highaspect ratios,Opt.Commun.89,355(1992)),得到最佳深度(衍射效率最大值所对应的深度);同时根据最佳深度处出射面上的波前分布,再运用菲涅尔-基尔霍夫衍射积分计算焦点附近的光强分布,得到焦点附近的最强峰值。(2) According to the wavelength, focal length, outermost layer and innermost layer thickness, use the Takagi-Taupin description of dynamical diffraction theory (TTD) or Coupledwave theory (CWT) to calculate the different depths of Wedge MLL The wavefront distribution and diffraction efficiency (references: H.Yan et al., Takagi-Taupin description of x-ray dynamical diffraction from diffractiveoptics with large numerical aperture, Phys.Rev.B 76,115438(2007); J.Maser et al ., Coupled wave description of the diffraction by zone plates with highaspect ratios, Opt.Commun.89, 355(1992)), to obtain the optimal depth (the depth corresponding to the maximum diffraction efficiency); at the same time, according to the wave on the exit surface at the optimal depth Then use the Fresnel-Kirchhoff diffraction integral to calculate the light intensity distribution near the focus, and get the strongest peak near the focus.
(3)根据波带片公式计算Flat MLL中每一层膜层的厚度,d(n)=x(n)-x(n-1),式中d(n)指的是编号为n的膜层的厚度。(3) Calculate the thickness of each film layer in the Flat MLL according to the zone plate formula, d(n)=x(n)-x(n-1), where d(n) refers to the number n The thickness of the film layer.
(4)假设多倾斜角复合MLL由m个Tilted MLL组合而成,每个Tilted MLL的膜层数为N/m。如果N/m不是整数,则对其四舍五入取整Int(N/m+0.5),将多出或少掉的层数算在最外层区域的Tilted MLL上,其膜层数为N-(m-1)×Int(N/m+0.5),而且其他的Tilted MLL的膜层数为Int(N/m+0.5)。(4) Assume that the multi-tilt composite MLL is composed of m Tilted MLLs, and the number of layers of each Tilted MLL is N/m. If N/m is not an integer, it is rounded to an integer Int(N/m+0.5), and the extra or missing layers are counted on the Tilted MLL in the outermost area, and the number of layers is N-( m-1)×Int(N/m+0.5), and the number of layers of other Tilted MLLs is Int(N/m+0.5).
(5)对于第i个Tilted MLL,其膜层与入射光的夹角θi使得该Tilted MLL中膜层编号为最中间的相邻两个膜层满足Bragg条件。夹角θi可由Bragg公式得到,2[2d(im)]sinθi=λ,式中im为该Tilted MLL中最中间膜层的编号,im=(if+il)/2,if和il分别是该Tilted MLL第一层和最后一层的编号,d(im)为编号为im的膜层的厚度,其值由步骤(3)所给出。(5) For the i-th Tilted MLL, the angle θ i between its film layer and the incident light makes the two adjacent film layers whose film layer number is the middlemost in the Tilted MLL satisfy the Bragg condition. The included angle θ i can be obtained by Bragg's formula, 2[2d(i m )] sinθ i =λ, where i m is the serial number of the most middle film layer in the Tilted MLL, i m =(i f +i l )/2 ,if and i l are the numbers of the first and last layers of the Tilted MLL respectively, d(i m ) is the thickness of the film layer numbered i m , and its value is given by step (3).
(6)对于多倾斜角复合MLL中第1个Tilted MLL(最内层区域的Tilted MLL),其第一层膜层(假设膜层编号为k)在出射面上的位置由波带片公式给定,xre(k)=(kλf)1/2,在入射面上的位置xin(k)=xre(k)+w×tan(θ1),式中w是根据Wedge MLL计算得到的最佳深度,θ1是第1个Tilted MLL中膜层与入射光的夹角。第二层膜层在出射面上的位置为xre(k+1)=xre(k)+d(k+1)/cos(θ1),在入射面上的位置为xin(k+1)=xin(k)+d(k+1)/cos(θ1),后续膜层的位置以此类推。(6) For the first Tilted MLL (the Tilted MLL in the innermost region) in the multi-tilt composite MLL, the position of the first film layer (assuming that the film layer number is k) on the exit surface is determined by the zone plate formula Given, x re (k)=(kλf) 1/2 , the position x in (k)=x re (k)+w×tan(θ 1 ) on the incident surface, where w is calculated according to Wedge MLL The best depth obtained, θ 1 is the angle between the film layer and the incident light in the first Tilted MLL. The position of the second film layer on the outgoing surface is x re (k+1)=x re (k)+d(k+1)/cos(θ 1 ), and the position on the incident surface is x in (k +1)=x in (k)+d(k+1)/cos(θ 1 ), and so on for the positions of subsequent film layers.
(7)对于多倾斜角复合MLL中第2个Tilted MLL,其第一层膜层(假设膜层编号为p)在出射面上的位置,xre(p)=xre(p-1)+d(p)/cos(θ1),在入射面上的位置xin(p)=xre(p)+w×tan(θ2)。第二层膜层在出射面上的位置为xre(p+1)=xre(p)+d(p+1)/cos(θ2),在入射面上的位置为xin(p+1)=xin(p)+d(p+1)/cos(θ2),后续膜层的位置以此类推。(7) For the second Tilted MLL in the multi-tilt composite MLL, the position of the first film layer (assuming the film layer number is p) on the exit surface, x re (p) = x re (p-1) +d(p)/cos(θ 1 ), the position x in (p) on the incident plane=x re (p)+w×tan(θ 2 ). The position of the second film layer on the outgoing surface is x re (p+1)=x re (p)+d(p+1)/cos(θ 2 ), and the position on the incident surface is x in (p +1)=x in (p)+d(p+1)/cos(θ 2 ), and so on for the positions of subsequent film layers.
(8)对于多倾斜角复合MLL中第2个以后的Tilted MLL,其膜层位置的推导与第2个Tilted MLL相同。(8) For the second and subsequent Tilted MLLs in the multi-tilt angle composite MLL, the derivation of the film layer position is the same as that of the second Tilted MLL.
(9)根据二分法的原则,首先计算多倾斜角复合MLL由2个(21)Tilted MLL构成时的情形。具体来说即先将m=21代入步骤(4)、(5)、(6)、(7)及(8)中得到多倾斜角复合MLL的具体结构参数,再运用TTD或者CWT计算在最佳深度处的波前分布,然后再运用菲涅尔-基尔霍夫衍射积分计算焦点附近的光强分布以及焦点附近的最强峰值;判断焦点附近的光强分布图是否有明显的干涉条纹,判断Strehl Ratio是否大于0.8,这儿Strehl Ratio指的是多倾斜角复合MLL的最强峰值与Wedge MLL最强峰值(由步骤(2)计算得到)的比值。如果焦点附近具有明显的干涉条纹且Strehl Ratio<0.8,则依次计算多倾斜角复合MLL由22、23、24、……、2j、……个Tilted MLL构成时的情形。如果当多倾斜角复合MLL由2j个Tilted MLL构成时,焦点附近没有明显的干涉条纹且Strehl Ratio>0.8,则停止计算。此时多倾斜角复合MLL由2j个Tilted MLL构成,其每一层膜层在入射面和出射面的位置参数可以由前述的步骤所得到。这儿需要指出的是根据二分法的原则m通常等于2l(l=1,2,3,……),但是这并不是绝对的,其可以取任意正整数值,只要满足本步骤的中要求即可,即焦点附近的光强分布图是否有明显的干涉条纹,Strehl Ratio是否大于0.8。(9) According to the principle of dichotomy, first calculate the situation when the multi-tilt composite MLL is composed of two (2 1 ) Tilted MLLs. Specifically, m = 2 1 is first substituted into steps (4), (5), (6), (7) and (8) to obtain the specific structural parameters of the multi-tilt composite MLL, and then use TTD or CWT to calculate the The wavefront distribution at the optimal depth, and then use the Fresnel-Kirchhoff diffraction integral to calculate the light intensity distribution near the focus and the strongest peak near the focus; judge whether there is obvious interference in the light intensity distribution near the focus Stripe, determine whether the Strehl Ratio is greater than 0.8, where the Strehl Ratio refers to the ratio of the strongest peak of the multi-tilt composite MLL to the strongest peak of the Wedge MLL (calculated by step (2)). If there are obvious interference fringes near the focal point and Strehl Ratio<0.8, then calculate the situation when the multi-tilt composite MLL is composed of 2 2 , 2 3 , 2 4 ,..., 2 j ,... Tilted MLLs. If there is no obvious interference fringe near the focus and the Strehl Ratio>0.8 when the multi-tilt composite MLL is composed of 2 j Tilted MLLs, stop the calculation. At this time, the multi-tilt composite MLL is composed of 2 j Tilted MLLs, and the position parameters of each film layer on the incident surface and the outgoing surface can be obtained through the aforementioned steps. What needs to be pointed out here is that according to the principle of dichotomy, m is usually equal to 2 l (l=1,2,3,...), but this is not absolute, it can take any positive integer value, as long as it meets the requirements of this step That is, whether there are obvious interference fringes in the light intensity distribution near the focus, and whether the Strehl Ratio is greater than 0.8.
(10)根据步骤(9)的计算结果,运用CWT或者TTD计算由2j个Tilted MLL构成的多倾斜角复合MLL在不同深度下的衍射效率,得到新的最佳深度值。计算在最佳深度时出射面上的波前分布,运用菲涅尔-基尔霍夫衍射积分计算焦点附近的光强分布和焦点附近的最强峰值,得到该多倾斜角复合MLL所对应的效率、聚焦分辨率以及Strehl Ratio。(10) According to the calculation results of step (9), use CWT or TTD to calculate the diffraction efficiency of the multi-tilt composite MLL composed of 2 j Tilted MLLs at different depths, and obtain a new optimal depth value. Calculate the wavefront distribution on the exit surface at the optimum depth, use the Fresnel-Kirchhoff diffraction integral to calculate the light intensity distribution near the focus and the strongest peak near the focus, and obtain the corresponding multi-tilt angle composite MLL Efficiency, focus resolution, and Strehl Ratio.
与现有技术相比,本发明具有以下的优点:Compared with the prior art, the present invention has the following advantages:
1,在物理口径相同的情况下,与单个Tilted MLL相比,多倾斜角复合MLL在实现衍射极限聚焦时具有更高的效率。1. In the case of the same physical aperture, compared with a single Tilted MLL, the multi-tilt composite MLL has higher efficiency in achieving diffraction-limited focusing.
2,与Wedge MLL相比,由于多倾斜角复合MLL只有很少的几层膜层具有不同的倾斜角,因此能极大的降低工艺难度,同时又具有与Wedge MLL相似的效率。2. Compared with Wedge MLL, multi-tilt angle composite MLL has only a few layers with different tilt angles, so it can greatly reduce the process difficulty, and at the same time has similar efficiency to Wedge MLL.
附图说明Description of drawings
图1为本发明的结构示意图;Fig. 1 is a structural representation of the present invention;
图2为单个Tilted MLL、Wedge MLL以及多倾斜角复合MLL在实现衍射极限聚焦时出射面上的衍射效率分布图。Fig. 2 is a distribution diagram of the diffraction efficiency on the exit surface of a single Tilted MLL, Wedge MLL, and multi-tilt composite MLL when diffraction-limited focusing is achieved.
图3为不同MLL在实现衍射极限聚焦时焦点附近的强度分布图,z沿着入射光方向,x垂直于入射光方向;其中图(a)为单个Tilted MLL、图(b)单个Wedge MLL、图(c)为多倾斜角复合MLL。Figure 3 is the intensity distribution near the focal point of different MLLs when diffraction-limited focusing is achieved, z is along the direction of incident light, and x is perpendicular to the direction of incident light; Figure (a) is a single Tilted MLL, Figure (b) is a single Wedge MLL, Figure (c) is a composite MLL with multiple tilt angles.
图4为单个Tilted MLL、Wedge MLL以及多倾斜角复合MLL在实现衍射极限聚焦时在最佳焦平面上的光强分布曲线,x垂直于入射光方向。Figure 4 shows the light intensity distribution curves of a single Tilted MLL, Wedge MLL, and multi-tilt composite MLL on the best focal plane when diffraction-limited focusing is achieved, and x is perpendicular to the direction of incident light.
图5为不同MLL构成多倾斜角复合MLL在焦点附近的强度分布图,z沿着入射光方向,x垂直于入射光方向;其中,图(a)由2个Tilted MLL构成、(b)由4个Tilted MLL构成、图(c)由8个Tilted MLL构成。Figure 5 is the intensity distribution diagram of multi-tilt composite MLL composed of different MLLs near the focus. It consists of 4 Tilted MLLs, and Figure (c) consists of 8 Tilted MLLs.
其中,1、2和3分别为多倾斜角复合MLL中第1个、第2个及第3个Tilted MLL;4和5分别为第1个Tilted MLL中第一层膜层在入射面和出射面上的位置;6和7分别为第2个TiltedMLL中第一层膜层在入射面和出射面上的位置;8为入射X射线。Among them, 1, 2, and 3 are the first, second, and third Tilted MLLs in the multi-tilt angle composite MLL; 6 and 7 are the positions of the first film layer in the second TiltedMLL on the incident surface and the outgoing surface respectively; 8 is the incident X-ray.
具体实施方式detailed description
下面结合附图和实施例对本发明进行详细说明。The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
实施例:Example:
1,假定入射X射线能量为12.0keV,要求的衍射极限聚焦分辨率为10nm,根据镀膜的能力,选定焦距f为4mm,此时膜层总厚度约41.3微米;根据镀膜的精度以及工作距离,选定最外层膜层厚度为4nm,其膜层编号为6458,最内层膜层厚度为20nm,膜层编号为258,总的膜层数N为6200层。1. Assume that the incident X-ray energy is 12.0keV, and the required diffraction-limited focusing resolution is 10nm. According to the coating ability, the focal length f is selected as 4mm. At this time, the total thickness of the coating is about 41.3 microns; according to the coating accuracy and working distance , the outermost film thickness is selected as 4nm, its film number is 6458, the innermost film thickness is 20nm, the film number is 258, and the total film number N is 6200 layers.
2,运用TTD计算Wedge MLL在不同深度下的衍射效率,得到最佳深度值约12微米。其衍射效率分布如图2所示,总的效率约47.06%,焦点附近强度分布如图3所示,最佳焦平面上的光强分布曲线如图4所示,最强峰值约1944。2. Using TTD to calculate the diffraction efficiency of Wedge MLL at different depths, the best depth value is about 12 microns. The diffraction efficiency distribution is shown in Figure 2, the total efficiency is about 47.06%, the intensity distribution near the focus is shown in Figure 3, the light intensity distribution curve on the best focal plane is shown in Figure 4, and the strongest peak is about 1944.
3,根据波带片公式计算Flat MLL中每一个膜层的厚度。3. Calculate the thickness of each film layer in the Flat MLL according to the zone plate formula.
4,首先假设多倾斜角复合MLL由2个Tilted MLL构成,每个Tilted MLL的膜层数为3100层。第1个Tilted MLL中膜层与入射X光的夹角为3.42mrad,其第1、2层膜层在入射面上的位置分别为10.36699、10.38698微米,在出射面上的位置分别为10.32599、10.34599微米;第2个Tilted MLL中膜层与入射光的夹角为5.63mrad,其第1、2层膜层在入射面上的位置分别为37.32636、37.33191微米,在出射面上的位置分别为37.25881、37.26435微米。运用CWT计算得到在最佳深度12微米处出射面上的波前分布,在运用菲涅尔-基尔霍夫衍射积分计算焦点附近的光强分布和焦点附近的最强峰值,焦点附近光强分布如图5所示,最强峰值约422.5,从图5可以看出焦点附近存在明显的干涉条纹,且Strehl Ratio约为0.217。因此2个Tilted MLL构成的多倾斜角复合MLL不满足要求。4. First assume that the multi-tilt composite MLL is composed of 2 Tilted MLLs, and the number of layers of each Tilted MLL is 3100 layers. The included angle between the film layer and the incident X-ray in the first Tilted MLL is 3.42mrad, and the positions of the first and second film layers on the incident surface are 10.36699 and 10.38698 microns respectively, and the positions on the exit surface are 10.32599 and 10.32599 microns respectively. 10.34599 microns; the angle between the second Tilted MLL film layer and the incident light is 5.63mrad, the positions of the first and second film layers on the incident surface are 37.32636 and 37.33191 microns respectively, and the positions on the exit surface are respectively 37.25881, 37.26435 microns. Using CWT to calculate the wavefront distribution on the exit surface at the optimal depth of 12 microns, using the Fresnel-Kirchhoff diffraction integral to calculate the light intensity distribution near the focus and the strongest peak near the focus, the light intensity near the focus The distribution is shown in Figure 5. The strongest peak is about 422.5. It can be seen from Figure 5 that there are obvious interference fringes near the focus, and the Strehl Ratio is about 0.217. Therefore, the multi-tilt composite MLL composed of two Tilted MLLs does not meet the requirements.
5,继续计算多倾斜角复合MLL由4个Tilted MLL构成时的情形,每个Tilted MLL的膜层数为1550层。第1个Tilted MLL中膜层与入射X光的夹角为2.58mrad,其第1、2层膜层在入射面上的位置分别为10.35698、10.37697微米,在出射面上的位置分别为10.32599、10.34599微米;第2个Tilted MLL中膜层与入射光的夹角为4.08mrad,其第1、2层膜层在入射面上的位置分别为27.39176、27.39932微米,在出射面上的位置分别为27.34276、27.35031微米;第3个Tilted MLL中膜层与入射光的夹角为5.17mrad,其第1、2层膜层在入射面上的位置分别为37.32078、37.32633微米,在出射面上的位置分别为37.25879、37.26434微米;第4个Tilted MLL中膜层与入射光的夹角为6.06mrad,其第1、2层膜层在入射面上的位置分别为45.11504、45.11963微米,在出射面上的位置分别为45.04235、45.04693微米。其焦点附近光强分布如图5所示,最强峰值约848.7,从图5可以看出焦点附近存在明显的干涉条纹,且Strehl Ratio约为0.437。因此4个Tilted MLL构成的多倾斜角复合MLL不满足要求。5. Continue to calculate the situation when the multi-tilt composite MLL is composed of 4 Tilted MLLs, and the number of layers of each Tilted MLL is 1550 layers. The angle between the film layer and the incident X-ray in the first Tilted MLL is 2.58mrad, and the positions of the first and second film layers on the incident surface are 10.35698 and 10.37697 microns respectively, and the positions on the exit surface are 10.32599 and 10.32599 microns respectively. 10.34599 microns; the angle between the second Tilted MLL film layer and the incident light is 4.08mrad, the positions of the first and second film layers on the incident surface are 27.39176 and 27.39932 microns respectively, and the positions on the exit surface are respectively 27.34276, 27.35031 microns; the angle between the third Tilted MLL film layer and the incident light is 5.17mrad, the positions of the first and second film layers on the incident surface are 37.32078, 37.32633 microns, and the position on the exit surface They are 37.25879 and 37.26434 microns respectively; the angle between the film layer of the fourth Tilted MLL and the incident light is 6.06mrad, and the positions of the first and second film layers on the incident surface are 45.11504 and 45.11963 microns respectively, and on the exit surface The positions are 45.04235, 45.04693 microns, respectively. The light intensity distribution near the focus is shown in Figure 5, and the strongest peak is about 848.7. From Figure 5, it can be seen that there are obvious interference fringes near the focus, and the Strehl Ratio is about 0.437. Therefore, the multi-tilt composite MLL composed of four Tilted MLLs does not meet the requirements.
6,继续计算多倾斜角复合MLL由8个Tilted MLL构成时的情形,前7个Tilted MLL的膜层数为776层,最后一个Tilted MLL的膜层数为768层。第1个Tilted MLL中膜层与入射X光的夹角为2.04mrad,其第1、2层膜层在入射面上的位置分别为10.35049、10.37049微米,在出射面上的位置分别为10.32599、10.34599微米;第8个Tilted MLL中膜层与入射X光的夹角为6.23mrad,其第1、2层膜层在入射面上的位置分别为48.57265、48.57691微米,在出射面上的位置分别为48.49747、48.50173微米。其焦点附近光强分布如图5所示,最强峰值约1328,从图5可以看出焦点附近存着一定的干涉条纹,且Strehl Ratio约为0.683。因此8个Tilted MLL构成的多倾斜角复合MLL不是太满足要求。6. Continue to calculate the situation when the multi-tilt composite MLL is composed of 8 Tilted MLLs. The number of layers of the first 7 Tilted MLLs is 776 layers, and the number of layers of the last Tilted MLL is 768 layers. The angle between the film layer and the incident X-ray in the first Tilted MLL is 2.04mrad, and the positions of the first and second film layers on the incident surface are 10.35049 and 10.37049 microns respectively, and the positions on the exit surface are 10.32599 and 10.32599 microns respectively. 10.34599 microns; the angle between the eighth Tilted MLL film layer and the incident X-ray is 6.23mrad, the positions of the first and second film layers on the incident surface are 48.57265 and 48.57691 microns respectively, and the positions on the exit surface are respectively For 48.49747, 48.50173 microns. The light intensity distribution near the focus is shown in Figure 5, and the strongest peak is about 1328. It can be seen from Figure 5 that there are certain interference fringes near the focus, and the Strehl Ratio is about 0.683. Therefore, the multi-tilt composite MLL composed of eight Tilted MLLs does not quite meet the requirements.
7,继续计算多倾斜角复合MLL由16个Tilted MLL构成时的情形,前15个TiltedMLL的膜层数为388层,最后一个Tilted MLL的膜层数为380层。第1个Tilted MLL中膜层与入射X光的夹角为1.71mrad,其第1、2层膜层在入射面上的位置分别为10.34648、10.36648微米,在出射面上的位置分别为10.32599、10.34599微米;第16个Tilted MLL中膜层与入射X光的夹角为6.36mrad,其第1、2层膜层在入射面上的位置分别为50.19983、50.20395微米,在出射面上的位置分别为50.12346、50.12758微米。其焦点附近光强分布如图3所示,最强峰值约1746,从图3可以看出焦点附近基本不存在干涉条纹,且Strehl Ratio约为0.898。因此由16个Tilted MLL构成的多倾斜角复合MLL满足要求。7. Continue to calculate the situation when the multi-tilt composite MLL is composed of 16 Tilted MLLs. The first 15 Tilted MLLs have 388 layers, and the last Tilted MLL has 380 layers. The angle between the film layer and the incident X-ray in the first Tilted MLL is 1.71mrad, the positions of the first and second film layers on the incident surface are 10.34648 and 10.36648 microns respectively, and the positions on the exit surface are 10.32599 and 10.32599 microns respectively. 10.34599 microns; the angle between the film layer of the 16th Tilted MLL and the incident X-ray is 6.36mrad, the positions of the first and second film layers on the incident surface are 50.19983 and 50.20395 microns respectively, and the positions on the exit surface are respectively 50.12346, 50.12758 microns. The light intensity distribution near the focus is shown in Figure 3, and the strongest peak is about 1746. It can be seen from Figure 3 that there are basically no interference fringes near the focus, and the Strehl Ratio is about 0.898. Therefore, the multi-tilt composite MLL composed of 16 Tilted MLLs meets the requirements.
8,重新计算由16个Tilted MLL构成的多倾斜角复合MLL的最佳深度,仍然是12微米。8. Recalculate the optimal depth of the multi-tilt composite MLL composed of 16 Tilted MLLs, which is still 12 microns.
9,单个Tilted MLL、Wedge MLL以及由16个Tilted MLL构成的多倾斜角复合MLL在实现衍射极限聚焦时出射面上的衍射效率分布、焦点附近的强度分布以及最佳焦平面上的光强分布分别如图2、3及4所示,这儿单个Tilted MLL在实现具有最大效率的衍射极限聚焦时,深度为5微米,倾斜角为4.85mrad。从图中可以看出,在实现衍射极限聚焦时,多倾斜角复合MLL具有远高于单个Tilted MLL的衍射效率和聚焦光斑峰值强度,其聚焦性能接近于Wedge MLL,同时又具有更简单的结构,能极大的降低工艺难度。9. Diffraction efficiency distribution on the exit plane, intensity distribution near the focal point, and light intensity distribution on the best focal plane when a single Tilted MLL, Wedge MLL, and multi-tilt composite MLL composed of 16 Tilted MLLs achieve diffraction-limited focusing As shown in Figures 2, 3 and 4, here a single Tilted MLL achieves diffraction-limited focusing with maximum efficiency at a depth of 5 microns and a tilt angle of 4.85 mrad. It can be seen from the figure that when achieving diffraction-limited focusing, the multi-tilt compound MLL has much higher diffraction efficiency and peak intensity of the focused spot than a single Tilted MLL, and its focusing performance is close to that of Wedge MLL, while having a simpler structure , can greatly reduce the difficulty of the process.
本申请并不局限于本发明详细记载的实施例,本领域技术人员可以对此做出各种修改,例如改变焦距、聚焦分辨率等,但是只要这些修改不背离本发明的精神和意图,仍在本发明的保护范围内。The present application is not limited to the embodiments described in detail in the present invention, and those skilled in the art can make various modifications to this, such as changing the focal length, focusing resolution, etc., but as long as these modifications do not deviate from the spirit and intent of the present invention, they are still Within the protection scope of the present invention.
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CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
-
2015
- 2015-01-15 CN CN201510021478.7A patent/CN104575656B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US4709384A (en) * | 1985-02-12 | 1987-11-24 | U.S. Philips Corporation | Laue camera |
CN103021496A (en) * | 2011-09-24 | 2013-04-03 | 同济大学 | Advanced multilayered Laue lens for hard X-ray focusing |
CN103151089A (en) * | 2011-12-06 | 2013-06-12 | 同济大学 | Hard X-ray micro-focus multi-thickness-ratio composite multi-layer film Laue lens |
DE102013005845B3 (en) * | 2013-04-02 | 2014-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Wedge-shaped multilayer laue lens for e.g. nano-focus at synchrotron radiation source, has layers altered along radiography direction on basis of X-ray radiation that impinges up to changed surface from emerged X-ray radiation |
Non-Patent Citations (2)
Title |
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Multilayer Laue Lens: A Path Toward One Nanometer X-Ray Focusing;Hanfei Yan et al.;《X-Ray Optics and Instrumentation》;20101231;第2010卷;第1-10页 * |
Takagi-Taupin description of x-ray dynamical diffraction from diffractive optics with large numerical aperture;Hanfei Yan et al.;《PHYSICAL REVIEW B》;20070927;第76卷;第115438页 * |
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