CN104531397A - Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof - Google Patents
Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof Download PDFInfo
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- CN104531397A CN104531397A CN201410659453.5A CN201410659453A CN104531397A CN 104531397 A CN104531397 A CN 104531397A CN 201410659453 A CN201410659453 A CN 201410659453A CN 104531397 A CN104531397 A CN 104531397A
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Abstract
The invention discloses a cleaning solution for sheet display sheet glass substrate thinning pre-cleaning. The cleaning solution comprises, by mass, 1-20% of potassium hydroxide, 1-15% of alcohol amine, 5-35% of a sulfone or sulfoxide compound, 1-25% of an alcohol compound, 0.1-15% of a surfactant, and the balance of water. The cleaning solution for sheet glass substrate thinning pre-cleaning can remove organic and inorganic impurities and solid particles on the surface of the sheet glass, can also remove UV-curable adhesive residues on the surface of the sheet glass, is environmentally-friendly, and can be used in a large temperature range.
Description
Technical field
The present invention relates to a kind of TFT-LCD (Thin Film Transistor-LCD: Thin film TransistorLiquid Crystal Display) flat glass substrate attenuation pre-washing scavenging solution, being specifically related to for cleaning UV solidified glue film scavenging solution residual on glass baseplate surface in flat glass substrate attenuation process.
Background technology
Along with mobile phone, the thickness requirement to liquid crystal display such as panel computer is high, generally the first liquid crystal display prepared will carry out slimming process, or is called reduction processing, and glass substrate slimming has become prerequisite and the power of terminal demonstration product slimming as the core showing product slimming.The method of reduction processing is with hydrofluoric acid etch,---thinning---grinding that its technological process is generally sealing, wherein sealing operation is because liquid-crystalline glasses screen adopts double-sided adhesive to form, liquid crystal display is easily invaded from gap inner during hydrofluoric acid etch, affect product performance, so, need before etching to carry out encapsulation process to the edge of liquid-crystalline glasses, namely admittedly to be hardened by light with photocuring edge sealing adhesive thus liquid-crystalline glasses four banding is stopped; Thinning process comprises pre-washing unit, etching unit, cleaning unit and drying unit etc., and pre-washing unit wherein the glass substrate of sealing is immersed at a certain temperature scavenging solution to remove surperficial organic and inorganic impurity and solid particulate etc.; Finally, grinding step is for obtaining light, even curface.
In reduction process, in its sealing operation, glue is inevitably excessive to glass baseplate surface, although through wiping, but also can leave the organic membrane of thin layer, this layer of organic membrane also can be cured thus adhere to glass baseplate surface in edge sealing adhesive UV solidification process subsequently, form UV and solidify glue resistates, and UV solidifies, and glue resistates is very difficult in glass substrate pre-cleaning process to be washed, thus etching solution can be hindered in subsequent etching processes to the etching of glass substrate, cause glass substrate etching heterogeneity, and a projection can be formed by the position that UV solidification glue resistates covers, if the position of being solidified the covering of glue resistates by UV forms defect, defect can be caused to expand through over etching, last in grinding technics due to the existence of this kind of defect, glass substrate unbalance stress can be caused to cause fragment, product yield significantly reduces.
At present, the cleaning liquid composition of thinning glass substrate is mainly made up of highly basic, tensio-active agent, polar organic solvent and water etc., first this scavenging solution is mixed according to a certain percentage with water in use procedure, subsequently the glass substrate after sealing is immersed in scavenging solution, soaking and washing glass substrate at 45 ~ 90 DEG C, organic and inorganic impurity on this based cleaning liquid effects on surface and solid particulate etc. are effective, but the UV that can not remove completely on glass baseplate surface solidifies glue resistates, cleansing power is not enough.
Highly basic can solidify the UV that glue and/or etching produce and solidifies glue resistates by dissolving U V, and when highly basic content is too low, the removal ability that scavenging solution solidifies glue resistates to UV is not enough; But during highly basic too high levels, scavenging solution easily causes the corrosion of edge sealing adhesive, requirements at the higher level are proposed to the acid-proof alkaline of edge sealing adhesive, increases production cost.
Polar organic solvent can solidify glue resistates by dissolving U V, improves scavenging solution to organic cleansing power.When polar organic solvent content is too low, the removal ability that scavenging solution solidifies glue resistates to UV is not enough; But during polar organic solvent too high levels, the corresponding reduction of highly basic content in scavenging solution, makes scavenging solution weaken the removal ability that UV solidifies glue resistates.In addition, if try out high boiling aprotic polar solvent separately, then cross strong due to its polarity and cause the edge sealing adhesive after solidifying to be washed, causing acid & alkali liquid to infiltrate liquid crystal display.If aromatic hydrocarbon compound on probation is as organic solvent separately, then the UV being difficult to wash glass surface because its polarity is on the weak side solidifies glue resistates.
In addition, for the scavenging solution containing cationic, anionic species, nonionic class tensio-active agent, its foaminess becomes problem, a large amount of new scavenging solutions just must be used in order to obtain sufficient cleaning performance, liquid waste disposal amount increases, thus there is the problem that carrying capacity of environment is larger, certain pollution is caused to environment.
In sum, the scavenging solution of existing flat glass substrate attenuation pre-washing solidifies glue resistates cleansing power deficiency to the UV on glass substrate, or the waste liquid produced after cleaning causes certain pollution to environment.
Summary of the invention
Technical problem to be solved by this invention is: provide one not only can remove organic and inorganic impurity or solid particulate, can also remove UV and solidify resistates, environmental friendliness and the scavenging solution of the flat glass substrate attenuation pre-washing that can use in larger temperature range.
For solving the problems of the technologies described above, the technical solution adopted in the present invention is: a kind of flat glass substrate attenuation pre-washing scavenging solution, by mass percentage, its component is: potassium hydroxide 1 ~ 20%, hydramine 1 ~ 15%, sulfone and/or sulfoxide compound 5 ~ 35%, alcohol compound 1 ~ 25%, tensio-active agent 0.1 ~ 15%, residual content is water.
Described hydramine is one or more in Monoethanolamine MEA BASF, trolamine, diglycolamine, α-amino isopropyl alcohol, methyldiethanolamine, dimethylethanolamine, hydroxyethylethylene diamine;
The preferred percentage composition of described hydramine is 1% ~ 8%; Its per-cent is too low, and degreasing result can be bad, poor compatibility; Per-cent is too high, can reduce the preservative property of glass substrate.
Described sulfone and/or sulfoxide compound be selected from following substances one or more: 2, 4-dihydroxy diphenylsulphone, 4-hydroxyl-4-isopropoxy sulfobenzide, 3, 3-diphenylsulfone dinitro, Trimethylsulfoxonium Iodide, 4, two (4-amino-benzene oxygen) sulfobenzide of 4-, trifluoromethylphenyl sulfone, dibenzothiophene sulphone, 3, 3-diamino-4, 4-dihydroxy diphenylsulphone, first mercapto methyl is to toluene sulfone, 3-methoxycarbonyl-3-sulfoxide, benzyl methyl sulphone, two [4-(2-hydroxyl-oxethyl) phenyl] sulfone, 3-aminophenyl trifluoromethyl sulfone, two (p-nitrophenyl) sulphur sulfone, 3, 4-bis-bromo tetramethylene sulfone, 3-methyl sulfolane, 4-hydroxyl-4-benzyloxy sulfobenzide, 2, 4-dimethylsulfolane, phenyl vinyl sulfoxide, 4-Chlorophenylmethyl sulfone, to fluorobenzene MSM, 4-sulfonyloxy methyl benzyl bromoethyl vinyl base sulfone, connection-(4-chloro-diphenyl sulfone), methylsulfonyl ethyl ketone, 2, 2-alkylsulfonyl di-methylcarbinol, trans-1, two (phenyl sulfonyl) ethene of 2-, 4, two (3-amino-benzene oxygen) sulfobenzide of 4-, benzyl phenyl sulfone, vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan), chloromethylbenzene sulfone, 2-chloroethyl-phenylsulfone, 3-cyclobufene sultone, allyl benzene sulfone, 3, 3-diaminodiphenylsulfone(DDS), methyl sulfo-MSM, sulfo-phenyl chloroformate trimethyl ammonia chloride sulfoxide, butyl sulphoxide, tetramethyl-sulfoxide, ponazuril, isopropyl methyl sulfone, trimethylammonium thionyl bromide, two dodecyl diethyl sulfoxides, first ethyl-sulfoxide, 2-chloroethyl-4-sulphenone, bis-xylene base sulfone, trans phenylc sulfone, 3-heptyl sulphur sulfone, methiocarb sulfone, N-Acedapsone, dibromo sulfoxide, 2-fluorophenyl methyl sulfone, nitre methylbenzene sulfone, 2-chloroethyl 4-fluorophenyl sulfone, 4, 4-dibromo sulfobenzide, 3-methyl-3-cyclobufene sultone, two [3, the bromo-4-of 5-bis-(2-hydroxy ethoxy) phenyl] sulfone, the amino tetramethylene sulfone of 3-, the silica-based MSM of phenyl trimethicone, two (2-ethylhexyl) sulfoxide, Tinidazole glucose injection, 2-chloroethyl p-methylphenyl sulfone, ethylisopropyl base sulfone, 5-(the different azoles of 5-) thiophene phenol-2-chlorine sulfone, 4-anisole anxious family base sulfone, 4-nitrobiphenyl sulfone, two (4-isothiocyanic acid phenyl) sulfone, 2-bromobenzyl phenylsulfone, 4-tolyl-diiodomethyl sulfone, sulfoxide, aniline phosphorus sulfone, two just pungent sulfones, 3, 3, 4, 4-tetrachloro tetramethylene sulfone, p-methylphenyl vinyl sulphone, two [the chloro-3-oil of mirbane of 4-] sulfone, 2-benzoxazolone-5-MSM, vamidothion sulfoxide, fenamiphos sulfoxide, ethiofencarb sulfone, Tiguvon sulfoxide, sulprofos sulfoxide, Tiguvon oxygen sulfoxide, phorate sulfone, second the third two sulfone, PMZSO, tertiary butyl MSM, azanol dapsone, Terbufos sulfoxide, methiocarb sulfoxide, butocarboxim sulfoxide, S-phenylthiophenyl sulfone, fenbendazole sulfone, triclabendazole sulfoxide, Terbufos sulfone, 2-phenylsulfmyl methyl acetate chloromethylbenzene sulfoxide, methyl is to toluene sulfoxide, dodecyl methyl sulfoxide, 4, 4-bis-fluoro-3, 3-diphenylsulfone dinitro, ethynyl p-methylphenyl sulfone, ethylene methacrylic sulfone, fenoendazole sulfone, the positive fourth sulfone of 2-fluoro-5-sulfonyloxy methyl oil of mirbane, phenyl TRANS-styryl sulfone, 2-bromomethylphenyl sulfone, 2-benzene sulfonyl-1, 3-cycloheptadiene 1, two (phenyl sulfonyl) ethene of 1-, 1-methyl-2-[(benzene sulfonyl) methyl] benzene first thiomethyl phenylsulfone, benzyl sulfone, ethyl sulfone, 3, 5-dichlorobenzene MSM, 2-Chlorophenylmethyl sulfone, Tiguvon oxygen sulfone, 3, 3, 4, 4-tedion, thiofanox sulfone, toltrazuril sulfoxide, trimethyl ammonia chloride sulfoxide, thiofanox sulfoxide, 3-chloro-4, 4, the fluoro-crotyl phenylsulfone of 4-tri-, Montelukast sulfoxide, vamidothion sulfone, albendazole sulfoxide, than Shandong card amine sulfoxide, 2-Bromophenylmethyl sulfoxide, 4, 4-difluorobenzene sulfone, trisbromomethyl benzene sulphur sulfone, 4, 4-diepoxy propoxy-sulfobenzide, 4-hydroxyl-4-benzyloxy sulfobenzide, dioxy sulfoxide, polyamine sulfone, 4, 4-dibromo sulfobenzide, two-(3, 4-dimethyl) sulfobenzide, amidapsone, thiofanox sulfoxide, 3, 7-diamino-2, 8-dimethyl dibenzo thiophene phenol sulfone, second fourth two sulfone, succisulfone, petrolenum sulfoxide, 4, 4-dihydroxy ethoxy diphenyl sulfone, 3-nitro-4-Chlorophenylmethyl sulfone, dipropyl sulfone, thymol sulfone, 2-bromotrifluoromethane methyl sulfone, cevimeline sulfoxide, 4-methoxyphenyl methyl sulfone, 3, 3-diamino-4, 4-difluorodiphenyl sulfone, 4, 4-dimethoxydiphenyl sulfoxide, triclabendazole sulfone, fensulfothion sulfone, chlordene trimethylene three sulfone, CL-556, 4-benzyloxy-4-hydroxyl-sulfobenzide, benzyl phenyl sulfone, phenylsulfone, 4, 4-dihydroxyl-3, 3, 5, 5-tetrabromo sulfobenzide, Thiazosulfone, SS, 4-benzophenone methyl sulfoxide, (methylthio group) methyl P-tolyl sulfone, biotinylsulfoxide, 4, 4-dimethyl thionyl benzene, sulprofos sulfone, 2-Chlorophenylmethyl sulfone, 3-fluorophenyl methyl sulfone, glucosulfone, 6, 6-dibromo penicillanic acid sulfone, 3-aminophenyl sulfone, chlorbenside sulfone, Tinidazole glucose injection, AMICAL 48, sulphadione, to rattle away sulfone, to chloromethylbenzene MSM, chloroacetic acid, 2-xenyl trifluoromethyl sulfoxide, 4-allyloxy-4-dihydroxy diphenylsulphone, 4, 4 dichloro diphenyl sulfones, methyl-sulphoxide, to methylphenyl acetic acid sulfone, 4-ethanoyl sulfobenzide, thiofanox sulfoxide, 3-nitro-4-hydroxyphenylmethyl sulfone, vinyl phenyl sulfone, methylthiomethyl MSM, 3 (4)-(ethylene benzyl)-2-chloroethyl sulfones, 3, 3-diamino-4, 4-dichloro diphenyl sulfone, polyether sulphone, between Bromophenylmethyl sulfone, p-Chlorophenylmethyl sulfoxide, p-methylphenyl [2-(trimethyl silyl) ethynyl] sulfone,
Described alcohol compound be selected from following substances one or more: butanols, primary isoamyl alcohol, isooctyl alcohol, furfuryl alcohol, diacetone alcohol, vinylcarbinol, ethylene glycol, Diethylene Glycol, glycol ether, to methylbenzene ethanol, O-methoxy phenylcarbinol, meta-methoxy phenylcarbinol, p-methoxybenzyl alcohol, o-Methoxyphenthyl Alcohol, Pentyl alcohol, diethylene glycol monobutyl ether, propylene glycol, sorbyl alcohol, hexalin, vinylcarbinol, C3-Fluoroalcohol, phenylcarbinol, phenylethyl alcohol, o-methyl-benzene methyl alcohol, between methylbenzyl alcohol, to methylbenzyl alcohol, o-methyl-benzene ethanol, between methylbenzene ethanol, meta-methoxy phenylethyl alcohol, to anisole ethanol, o-benzyl alcohol, Xylitol, 2 mercapto ethanol, m-aminophenyl methyl alcohol, p-aminophenyl methyl alcohol, adjacent Aminophenethyl alcohol, m-aminophenyl ethanol, equal amido phenenyl alcohol.
Described alcohol compound is preferred at least one in Diethylene Glycol, hexalin, glycol ether, o-Methoxyphenthyl Alcohol, o-methyl-benzene ethanol further;
The per-cent that the gross weight of described hydramine, sulfone and/or sulfoxide compound and alcohol compound accounts for described scavenging solution gross weight is 1% ~ 60%, preferably 10% ~ 45%; Its per-cent is too low, and cleaning performance can be bad; Per-cent is too high, and the preservative property of glass substrate can reduce.
Described tensio-active agent is alkyl glycoside (APG), synthesized by renewable resources natural fat alcohol and glucose, it is the more comprehensive new non-ionic surfactants of a kind of performance, have the characteristic of conventional nonionic and anion surfactant concurrently, having high surface, good ecological security and intermiscibility, is internationally recognized first-selection " green " functional surfactant.APG compounds is natural fat alcohol and glucose under an acidic catalyst effect, the compound generated through acetal dehydration.Described tensio-active agent preferred proportion is 2 ~ 10%; Its per-cent is too low, and cleaning performance can decline; Per-cent is too high, and cleaning performance improves not obvious, and the eccysis ability of scavenging solution itself declines and can increase cost.
Described water is preferably deionized water, and be the water filtered through ion exchange resin, described resistivity of water is at least 15 megaohms.
In technical scheme, agents useful for same and raw material are all commercially.
The preparation method of a kind of flat glass substrate attenuation pre-washing scavenging solution described in the application, the steps include: said components to mix, namely obtains flat glass substrate attenuation pre-washing scavenging solution.
The using method of photoresist material scavenging solution disclosed in the present application can refer to following steps: by the scavenging solution for preparing and pure water according to certain ratio mixing and stirring, glass substrate after sealing is immersed 10 ~ 15min in the scavenging solution of the rear temperature 25 ~ 60 DEG C of dilution, then enter in etching bath after deionized water soaks and etch.
Second technical problem to be solved by this invention is: the application providing a kind of flat glass substrate attenuation pre-washing scavenging solution.
For solving second technical problem, the technical scheme of employing is: the application of a kind of flat glass substrate attenuation pre-washing scavenging solution in liquid-crystal display (LCD) glass substrate, touch-screen (TP) display glass substrate, organic electroluminescent (OLED) display glass substrate or other display thinning glass substrate pre-washing.
Beneficial effect: the scavenging solution that the application provides, effectively can not only remove the organic and inorganic impurity above glass substrate and solids, and effectively can also remove UV solidification glue resistates on glass baseplate surface, its cleansing power is strong, and environmentally safe, cleaning temperature is in extensive range.
Embodiment
Below in conjunction with specific embodiment, the present invention is further elaborated, but the present invention is not limited to following examples.Described method is ordinary method if no special instructions.Described raw material all can obtain from open commercial sources if no special instructions.
Embodiment 1
Each component of following weight percent is at room temperature stirred, obtains the scavenging solution that the application provides: potassium hydroxide 15%, trolamine 10%, surfactant compounds 5%, organic solvent ethylene glycol 15%, dimethyl sulfoxide (DMSO) 15%, residual content are deionized water; This deionization resistivity of water is 18 megaohms.
Above-mentioned scavenging solution and pure water are pressed the proportions of 2.5:97.5, be warming up to 50 DEG C, the flat glass substrate after sealing is immersed in scavenging solution, clean 15 minutes, then flooded 15 minutes in the pure water of 25 DEG C by the face glass cleaned, take out panel thereafter, nitrogen gas stream is dry.
Amplify 100 times of observed results with electron microscope (Nikon, ECLIPSE L300), the clearance of finger-marks and greasy dirt can reach the clearance that 100%, UV solidifies glue resistates can reach 100%.The requirement of lower continuous operation after meeting cleaning.
Embodiment 2
Each component of following weight percent is at room temperature stirred, obtains the scavenging solution that the application provides: potassium hydroxide 10%, trolamine 10%, surfactant compounds 8%, organic solvent ethylene glycol 20%, dimethyl sulfoxide (DMSO) 20%, residual content are deionized water; This deionization resistivity of water is 18 megaohms.
Above-mentioned scavenging solution and pure water are pressed the proportions of 5:95, be warming up to 50 DEG C, the flat glass substrate after sealing is immersed in scavenging solution, clean 15 minutes, then flooded 15 minutes in the pure water of 25 DEG C by the face glass cleaned, take out panel thereafter, nitrogen gas stream is dry.
Amplify 100 times of observed results with electron microscope (Nikon, ECLIPSE L300), the clearance of finger-marks and greasy dirt can reach the clearance that 100%, UV solidifies glue resistates can reach 100%.The requirement of lower continuous operation after meeting cleaning.
Embodiment 3
Each component of following weight percent is at room temperature stirred, obtains scavenging solution provided by the invention: potassium hydroxide 12%, diethanolamine 5%, trolamine 5%, surfactant compounds 8%, organic solvent glycol ether 10%, phenylethyl alcohol 10%, ethyl sulfone 10%, dimethyl sulfoxide (DMSO) 10%, residual content are deionized water; This deionization resistivity of water is 18 megaohms.
Above-mentioned scavenging solution and pure water are pressed the proportions of 3:97, be warming up to 50 DEG C, the flat glass substrate after sealing is immersed in scavenging solution, clean 15 minutes, then flooded 15 minutes in the pure water of 25 DEG C by the face glass cleaned, take out panel thereafter, nitrogen gas stream is dry.
Amplify 100 times of observed results with electron microscope (Nikon, ECLIPSE L300), the clearance of finger-marks and greasy dirt can reach the clearance that 100%, UV solidifies glue resistates can reach 100%.The requirement of lower continuous operation after meeting cleaning.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; change can be expected easily or replace, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claim.
Claims (8)
1. a flat glass substrate attenuation pre-washing scavenging solution, by mass percentage, its component is: potassium hydroxide 1 ~ 20%, hydramine 1 ~ 15%, sulfone and/or sulfoxide compound 5 ~ 35%, alcohol compound 1 ~ 25%, tensio-active agent 0.1 ~ 15%, surplus is water.
2. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1, is characterized in that: described hydramine is one or more in Monoethanolamine MEA BASF, trolamine, diglycolamine, α-amino isopropyl alcohol, methyldiethanolamine, dimethylethanolamine, hydroxyethylethylene diamine; Described hydramine mass percentage is 1% ~ 8%.
3. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1, it is characterized in that: described sulfone and/or sulfoxide compound be selected from following substances one or more: 2, 4-dihydroxy diphenylsulphone, 4-hydroxyl-4-isopropoxy sulfobenzide, 3, 3-diphenylsulfone dinitro, Trimethylsulfoxonium Iodide, 4, two (4-amino-benzene oxygen) sulfobenzide of 4-, trifluoromethylphenyl sulfone, dibenzothiophene sulphone, 3, 3-diamino-4, 4-dihydroxy diphenylsulphone, first mercapto methyl is to toluene sulfone, 3-methoxycarbonyl-3-sulfoxide, benzyl methyl sulphone, two [4-(2-hydroxyl-oxethyl) phenyl] sulfone, 3-aminophenyl trifluoromethyl sulfone, two (p-nitrophenyl) sulphur sulfone, 3, 4-bis-bromo tetramethylene sulfone, 3-methyl sulfolane, 4-hydroxyl-4-benzyloxy sulfobenzide, 2, 4-dimethylsulfolane, phenyl vinyl sulfoxide, 4-Chlorophenylmethyl sulfone, to fluorobenzene MSM, 4-sulfonyloxy methyl benzyl bromoethyl vinyl base sulfone, connection-(4-chloro-diphenyl sulfone), methylsulfonyl ethyl ketone, 2, 2-alkylsulfonyl di-methylcarbinol, trans-1, two (phenyl sulfonyl) ethene of 2-, 4, two (3-amino-benzene oxygen) sulfobenzide of 4-, benzyl phenyl sulfone, vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan), chloromethylbenzene sulfone, 2-chloroethyl-phenylsulfone, 3-cyclobufene sultone, allyl benzene sulfone, 3, 3-diaminodiphenylsulfone(DDS), methyl sulfo-MSM, sulfo-phenyl chloroformate trimethyl ammonia chloride sulfoxide, butyl sulphoxide, tetramethyl-sulfoxide, ponazuril, isopropyl methyl sulfone, trimethylammonium thionyl bromide, two dodecyl diethyl sulfoxides, first ethyl-sulfoxide, 2-chloroethyl-4-sulphenone, bis-xylene base sulfone, trans phenylc sulfone, 3-heptyl sulphur sulfone, methiocarb sulfone, N-Acedapsone, dibromo sulfoxide, 2-fluorophenyl methyl sulfone, nitre methylbenzene sulfone, 2-chloroethyl 4-fluorophenyl sulfone, 4, 4-dibromo sulfobenzide, 3-methyl-3-cyclobufene sultone, two [3, the bromo-4-of 5-bis-(2-hydroxy ethoxy) phenyl] sulfone, the amino tetramethylene sulfone of 3-, the silica-based MSM of phenyl trimethicone, two (2-ethylhexyl) sulfoxide, Tinidazole glucose injection, 2-chloroethyl p-methylphenyl sulfone, ethylisopropyl base sulfone, 5-(the different azoles of 5-) thiophene phenol-2-chlorine sulfone, 4-anisole anxious family base sulfone, 4-nitrobiphenyl sulfone, two (4-isothiocyanic acid phenyl) sulfone, 2-bromobenzyl phenylsulfone, 4-tolyl-diiodomethyl sulfone, sulfoxide, aniline phosphorus sulfone, two just pungent sulfones, 3, 3, 4, 4-tetrachloro tetramethylene sulfone, p-methylphenyl vinyl sulphone, two [the chloro-3-oil of mirbane of 4-] sulfone, 2-benzoxazolone-5-MSM, vamidothion sulfoxide, fenamiphos sulfoxide, ethiofencarb sulfone, Tiguvon sulfoxide, sulprofos sulfoxide, Tiguvon oxygen sulfoxide, phorate sulfone, second the third two sulfone, PMZSO, tertiary butyl MSM, azanol dapsone, Terbufos sulfoxide, methiocarb sulfoxide, butocarboxim sulfoxide, S-phenylthiophenyl sulfone, fenbendazole sulfone, triclabendazole sulfoxide, Terbufos sulfone, 2-phenylsulfmyl methyl acetate chloromethylbenzene sulfoxide, methyl is to toluene sulfoxide, dodecyl methyl sulfoxide, 4, 4-bis-fluoro-3, 3-diphenylsulfone dinitro, ethynyl p-methylphenyl sulfone, ethylene methacrylic sulfone, fenoendazole sulfone, the positive fourth sulfone of 2-fluoro-5-sulfonyloxy methyl oil of mirbane, phenyl TRANS-styryl sulfone, 2-bromomethylphenyl sulfone, 2-benzene sulfonyl-1, 3-cycloheptadiene 1, two (phenyl sulfonyl) ethene of 1-, 1-methyl-2-[(benzene sulfonyl) methyl] benzene first thiomethyl phenylsulfone, benzyl sulfone, ethyl sulfone, 3, 5-dichlorobenzene MSM, 2-Chlorophenylmethyl sulfone, Tiguvon oxygen sulfone, 3, 3, 4, 4-tedion, thiofanox sulfone, toltrazuril sulfoxide, trimethyl ammonia chloride sulfoxide, thiofanox sulfoxide, 3-chloro-4, 4, the fluoro-crotyl phenylsulfone of 4-tri-, Montelukast sulfoxide, vamidothion sulfone, albendazole sulfoxide, than Shandong card amine sulfoxide, 2-Bromophenylmethyl sulfoxide, 4, 4-difluorobenzene sulfone, trisbromomethyl benzene sulphur sulfone, 4, 4-diepoxy propoxy-sulfobenzide, 4-hydroxyl-4-benzyloxy sulfobenzide, dioxy sulfoxide, polyamine sulfone, 4, 4-dibromo sulfobenzide, two-(3, 4-dimethyl) sulfobenzide, amidapsone, thiofanox sulfoxide, 3, 7-diamino-2, 8-dimethyl dibenzo thiophene phenol sulfone, second fourth two sulfone, succisulfone, petrolenum sulfoxide, 4, 4-dihydroxy ethoxy diphenyl sulfone, 3-nitro-4-Chlorophenylmethyl sulfone, dipropyl sulfone, thymol sulfone, 2-bromotrifluoromethane methyl sulfone, cevimeline sulfoxide, 4-methoxyphenyl methyl sulfone, 3, 3-diamino-4, 4-difluorodiphenyl sulfone, 4, 4-dimethoxydiphenyl sulfoxide, triclabendazole sulfone, fensulfothion sulfone, chlordene trimethylene three sulfone, CL-556, 4-benzyloxy-4-hydroxyl-sulfobenzide, benzyl phenyl sulfone, phenylsulfone, 4, 4-dihydroxyl-3, 3, 5, 5-tetrabromo sulfobenzide, Thiazosulfone, SS, 4-benzophenone methyl sulfoxide, (methylthio group) methyl P-tolyl sulfone, biotinylsulfoxide, 4, 4-dimethyl thionyl benzene, sulprofos sulfone, 2-Chlorophenylmethyl sulfone, 3-fluorophenyl methyl sulfone, glucosulfone, 6, 6-dibromo penicillanic acid sulfone, 3-aminophenyl sulfone, chlorbenside sulfone, Tinidazole glucose injection, AMICAL 48, sulphadione, to rattle away sulfone, to chloromethylbenzene MSM, chloroacetic acid, 2-xenyl trifluoromethyl sulfoxide, 4-allyloxy-4-dihydroxy diphenylsulphone, 4, 4 dichloro diphenyl sulfones, methyl-sulphoxide, to methylphenyl acetic acid sulfone, 4-ethanoyl sulfobenzide, thiofanox sulfoxide, 3-nitro-4-hydroxyphenylmethyl sulfone, vinyl phenyl sulfone, methylthiomethyl MSM, 3 (4)-(ethylene benzyl)-2-chloroethyl sulfones, 3, 3-diamino-4, 4-dichloro diphenyl sulfone, polyether sulphone, between Bromophenylmethyl sulfone, p-Chlorophenylmethyl sulfoxide, p-methylphenyl [2-(trimethyl silyl) ethynyl] sulfone.
4. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1, it is characterized in that: described alcohol compound be selected from following substances one or more: butanols, primary isoamyl alcohol, isooctyl alcohol, furfuryl alcohol, diacetone alcohol, vinylcarbinol, ethylene glycol, Diethylene Glycol, glycol ether, to methylbenzene ethanol, O-methoxy phenylcarbinol, meta-methoxy phenylcarbinol, p-methoxybenzyl alcohol, o-Methoxyphenthyl Alcohol, Pentyl alcohol, diethylene glycol monobutyl ether, propylene glycol, sorbyl alcohol, hexalin, vinylcarbinol, C3-Fluoroalcohol, phenylcarbinol, phenylethyl alcohol, o-methyl-benzene methyl alcohol, between methylbenzyl alcohol, to methylbenzyl alcohol, o-methyl-benzene ethanol, between methylbenzene ethanol, meta-methoxy phenylethyl alcohol, to anisole ethanol, o-benzyl alcohol, Xylitol, 2 mercapto ethanol, m-aminophenyl methyl alcohol, p-aminophenyl methyl alcohol, adjacent Aminophenethyl alcohol, m-aminophenyl ethanol, equal amido phenenyl alcohol.
5. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 4, is characterized in that: described alcohol compound is selected from least one in Diethylene Glycol, hexalin, glycol ether, o-Methoxyphenthyl Alcohol, o-methyl-benzene ethanol.
6. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1, is characterized in that: described tensio-active agent is alkyl glycoside.
7. a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1, is characterized in that: described water is deionized water, and described resistivity of water is at least 15 megaohms.
8. the application of a kind of flat glass substrate attenuation pre-washing scavenging solution according to claim 1 in Glass for Liquid Crystal Display substrate, touch-screen display glass substrate, the pre-washing of ORGANIC ELECTROLUMINESCENCE DISPLAYS thinning glass substrate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410659453.5A CN104531397A (en) | 2014-11-18 | 2014-11-18 | Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof |
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| CN201410659453.5A CN104531397A (en) | 2014-11-18 | 2014-11-18 | Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof |
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| CN201410659453.5A Pending CN104531397A (en) | 2014-11-18 | 2014-11-18 | Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof |
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| CN106833958A (en) * | 2017-03-17 | 2017-06-13 | 希玛石油制品（镇江）有限公司 | A kind of handset touch panel polarisation chip detergent and its preparation and application |
| CN106867694A (en) * | 2016-12-29 | 2017-06-20 | 芜湖乐普汽车科技有限公司 | The cleaning method of glass substrate |
| CN107955744A (en) * | 2017-11-29 | 2018-04-24 | 惠州市清洋实业有限公司 | A kind of production method of cleaning solution before glass thinning |
| CN108776554A (en) * | 2018-06-26 | 2018-11-09 | 赵宗轩 | Integrated module of ultrathin touch display and preparation method thereof |
| CN110158024A (en) * | 2019-05-15 | 2019-08-23 | 惠晶显示科技（苏州）有限公司 | Crystal liquid substrate plates ito film pre-treating method |
| CN110437941A (en) * | 2018-05-02 | 2019-11-12 | 蓝思科技（长沙）有限公司 | A kind of glass degumming agent and Degumming method |
| EP3289098B1 (en) * | 2015-04-30 | 2024-03-20 | Sakura Finetek U.S.A., Inc. | Methods to reduce evaporation during elevated temperature |
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