CN104502193B - Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor - Google Patents
Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor Download PDFInfo
- Publication number
- CN104502193B CN104502193B CN201410765597.9A CN201410765597A CN104502193B CN 104502193 B CN104502193 B CN 104502193B CN 201410765597 A CN201410765597 A CN 201410765597A CN 104502193 B CN104502193 B CN 104502193B
- Authority
- CN
- China
- Prior art keywords
- comb
- teeth
- tooth
- semi
- rectangular configuration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012360 testing method Methods 0.000 title claims abstract description 36
- 239000003990 capacitor Substances 0.000 title description 8
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000007789 sealing Methods 0.000 claims 8
- 238000010276 construction Methods 0.000 claims 2
- 244000126211 Hericium coralloides Species 0.000 abstract description 22
- 230000002457 bidirectional effect Effects 0.000 abstract description 14
- 238000001514 detection method Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 11
- 238000005259 measurement Methods 0.000 description 8
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000005459 micromachining Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Landscapes
- Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
Abstract
本发明公开了一种基于纵向梳齿式电容检测的微梁断裂强度的测试结构，所述双向梳齿结构由一个条形锚区和连接在锚区两侧面的梳齿构成；所述半封口式矩形结构的竖直边外侧面连接有一排梳齿，与该边垂直的两条横边的末端连接在各自的锚区的侧面；所述两个带有梳齿的半封口式矩形结构对称分布在双向梳齿结构的左右两侧，梳齿端与双向梳齿结构的梳齿交错相对，其中半封口式矩形结构所带有的梳齿为动齿，双向梳齿结构的梳齿为定齿；所述被测微梁的一端连接在其中一个半封口式矩形结构的竖直边内侧面的中部处，另一端固定在一个锚区的侧面，另一个不带有被测微梁的半封口式矩形结构为参考结构；所述半封口式矩形、被测微粱和梳齿均位于同一平面，且平行悬置在衬底上方。本发明灵敏度高、方便可行。
The invention discloses a test structure for the fracture strength of microbeams based on longitudinal comb-teeth type capacitance detection. The bidirectional comb-tooth structure is composed of a bar-shaped anchor area and comb teeth connected to both sides of the anchor area; the half-sealed A row of comb teeth is connected to the outer side of the vertical side of the rectangular structure, and the ends of the two horizontal sides perpendicular to the side are connected to the sides of the respective anchor areas; the two semi-closed rectangular structures with comb teeth are symmetrical Distributed on the left and right sides of the bidirectional comb structure, the comb teeth end are opposite to the comb teeth of the bidirectional comb structure. The comb teeth of the semi-closed rectangular structure are movable teeth, and the comb teeth of the bidirectional comb structure are fixed teeth. Teeth; one end of the microbeam to be measured is connected to the middle part of the vertical side inner side of one of the semi-closed rectangular structures, the other end is fixed to the side of an anchor area, and the other half without the microbeam to be measured The sealed rectangular structure is a reference structure; the semi-closed rectangular structure, the measured microbeam and the comb teeth are all located on the same plane and suspended above the substrate in parallel. The invention has high sensitivity, convenience and feasibility.
Description
技术领域technical field
本发明涉及一种微机电系统(MEMS)微梁断裂强度的测试领域，尤其是一种纵向梳齿式电容检测微梁断裂强度的测试结构。The invention relates to the field of testing the breaking strength of a micro-electromechanical system (MEMS), in particular to a testing structure for longitudinal comb-teeth capacitance detection of the breaking strength of the micro-beam.
背景技术Background technique
MEMS利用微电子技术、微加工技术相结合的制造工艺制造微传感器、微执行器、微驱动器以及微系统。由不同的加工技术，如硅体微加工、硅表面微加工、LIGA技术、键合技术等，加工而成的MEMS微结构其力学性能会有很大差别，即使是相同技术，但不同生产线加工的产品也会存在差异。因此，对于MEMES设计、加工和应用的可靠性而言，设计测试结构，提取相关力学参数是非常重要的，断裂强度是重要力学性能之一。目前，断裂强度常用的测量方法有被动式和主动式两种，前者预先在一批试样上制作不同尺寸的凹槽，释放时利用残余拉应力使梁断裂，通过测量凹槽临界长度获得材料的断裂强度。主动测量是通过制备执行器产生量程大、数值可变的力对测试样品进行加载，通过直接测量样品被拉断时的力确定样品的断裂强度。被动测量方法需要大量制造和测试一批带有不同凹槽的样品，工艺和测试效率都不够理想。因此，目前断裂强度的测量大多采用主动测量方法。MEMS uses the combination of microelectronics technology and micromachining technology to manufacture microsensors, microactuators, microdrivers and microsystems. The mechanical properties of MEMS microstructures processed by different processing technologies, such as silicon body micromachining, silicon surface micromachining, LIGA technology, bonding technology, etc., will have very different mechanical properties. products will also vary. Therefore, for the reliability of MEMES design, processing and application, it is very important to design the test structure and extract the relevant mechanical parameters, and the fracture strength is one of the important mechanical properties. At present, there are two commonly used measurement methods for fracture strength: passive and active. The former makes grooves of different sizes on a batch of samples in advance, and uses the residual tensile stress to break the beam when releasing it. Breaking strength. Active measurement is to load the test sample by preparing an actuator to generate a force with a large range and variable value, and determine the breaking strength of the sample by directly measuring the force when the sample is broken. The passive measurement method needs to manufacture and test a batch of samples with different grooves in large quantities, and the process and test efficiency are not ideal. Therefore, most of the current fracture strength measurements use active measurement methods.
对于主动式测量断裂强度的测试结构主要由两部分构成，一部分是实现拉伸力的加载；另一部分是断裂强度信号的测量和提取。加载可以通过机械方法，如借助于纳米压痕仪、原子力显微镜等在被测样品上施加微力；也可以采用施加静电力使样品发生弯曲直至断裂；还可以通过电-热驱动的方式，通电使结构受热膨胀拉伸样品。其中电-热驱动，拉伸距离长，常被人们采用。断裂信号的测量和提取，可以直接测量所加载荷大小，如借助压电控制器等，精度有一定保证，但测试复杂且成本高。也可以通过拉伸位移的测量来推算拉伸力，如测试结构做标记或设计标尺等，再利用高倍显微镜、干涉应变计或光钎法等获取拉伸位移量。但这些方法对于捕获被测梁断裂瞬间时刻对应的驱动力还是存在一定难度，而且需要使用价格相对昂贵的测试仪器，且不利于在线测试。The test structure for active measurement of breaking strength is mainly composed of two parts, one is to realize the loading of tensile force; the other is to measure and extract the breaking strength signal. Loading can be done by mechanical methods, such as applying micro force on the sample to be tested by means of nano-indentation instrument, atomic force microscope, etc.; it can also be used to bend the sample until it breaks by applying electrostatic force; The structure expands and stretches the sample when heated. Among them, electric-thermal drive and long stretching distance are often used by people. The measurement and extraction of the fracture signal can directly measure the magnitude of the applied load. For example, with the help of piezoelectric controllers, the accuracy is guaranteed to a certain extent, but the test is complicated and costly. The tensile force can also be calculated by measuring the tensile displacement, such as marking the test structure or designing a scale, etc., and then using a high-power microscope, interference strain gauge or optical brazing method to obtain the tensile displacement. However, these methods still have certain difficulties in capturing the driving force corresponding to the moment when the measured beam breaks, and require the use of relatively expensive testing instruments, which are not conducive to online testing.
综上，对于断裂强度的测试，设计一种简单易行的断裂强度测试结构，为测试提供更多地选择是很有意义的。为此，本发明设计了一种基于纵向式梳齿电容的微梁断裂强度的测试结构，采用的是常用的电-热驱动方式，而断裂信号的提取则通过两个梳齿电容(测量电容和参考电容)的相互配合和比对，很好地解决了测试信号捕获和测量精度的难题，且测试方便、简单易行，适用于在线测试。To sum up, for the test of breaking strength, it is meaningful to design a simple and easy breaking strength testing structure to provide more choices for the test. For this reason, the present invention has designed a kind of test structure of the fracture strength of the microbeam based on longitudinal comb-tooth capacitor, what adopt is commonly used electro-thermal driving mode, and the extraction of fracture signal is then passed through two comb-tooth capacitors (measuring capacitor The mutual cooperation and comparison with the reference capacitance) solves the problem of test signal capture and measurement accuracy well, and the test is convenient, simple and easy, and is suitable for online testing.
发明内容Contents of the invention
技术问题：本发明的目的是提供一种基于纵向梳齿式电容的微梁断裂强度的测试结构，利用电容法捕获被测微梁断裂瞬间所对应的驱动力，直观、易于实现。但检测中的电容变化量决定了该方法的有效性和灵敏度。本发明利用纵向梳齿式电容来反映被测梁的拉伸量，可根据测量要求，通过增加梳齿数来提高电容变化的检测量，因此相对于一般电容法检测灵敏度更高。Technical problem: The object of the present invention is to provide a test structure for the fracture strength of microbeams based on longitudinal comb-tooth capacitors, which uses the capacitance method to capture the driving force corresponding to the moment of fracture of the measured microbeams, which is intuitive and easy to implement. However, the amount of capacitance change in detection determines the effectiveness and sensitivity of the method. The invention uses the longitudinal comb-tooth capacitance to reflect the stretching amount of the measured beam, and can increase the detection amount of capacitance change by increasing the number of comb teeth according to the measurement requirements, so the detection sensitivity is higher than that of the general capacitance method.
技术方案：本发明的一种基于纵向梳齿式电容的微梁断裂强度的测试结构包括衬底、一个双向梳齿结构、两个尺寸和结构完全相同的带有梳齿的半封口式矩形结构、被测微粱结构；Technical solution: A test structure for the fracture strength of microbeams based on longitudinal comb-tooth capacitors of the present invention includes a substrate, a bidirectional comb-tooth structure, and two half-sealed rectangular structures with comb teeth that are identical in size and structure , the measured microbeam structure;
所述双向梳齿结构由一个条形锚区和分别连接在锚区左右两侧面的左梳齿和右梳齿构成；The two-way comb structure consists of a bar-shaped anchor area and left and right comb teeth respectively connected to the left and right sides of the anchor area;
所述带有梳齿的半封口式矩形结构的半封闭框由一条左竖直边和两条垂直相连的左横边构成，其中，左竖直边外侧面连接有一排左动梳齿，两条左横边的末端连接在各自的左锚区的侧面，The semi-enclosed frame of the semi-sealed rectangular structure with comb teeth is composed of a left vertical side and two vertically connected left horizontal sides, wherein a row of left movable comb teeth is connected to the outer side of the left vertical side, and the two The ends of the left transverse sides of the bars are connected to the sides of the respective left anchor regions,
所述被测微梁结构位于半封口式矩形结构的半封闭框内，被测微梁的一端与半封闭框的竖直边的中部内侧面相连，另一端被固定在一个被测微梁锚区的侧面；The measured microbeam structure is located in a semi-closed frame of a semi-closed rectangular structure, one end of the measured microbeam is connected to the middle inner side of the vertical side of the semi-closed frame, and the other end is fixed on a measured microbeam anchor side of the area;
所述两个带有梳齿的半封口式矩形结构对称分布在双向梳齿结构的左右两侧，半封口式矩形结构所带有左动梳齿和右动梳齿分别与双向梳齿结构的左梳齿和右梳齿交错相对，其中，半封口式矩形结构所带有左动梳齿或右动梳齿为动齿，双向梳齿结构的左梳齿或右梳齿为定齿；The two half-sealed rectangular structures with comb teeth are symmetrically distributed on the left and right sides of the two-way comb structure. The left comb teeth and the right comb teeth are staggered and opposite, wherein, the left or right movable comb teeth of the semi-closed rectangular structure are movable teeth, and the left or right comb teeth of the bidirectional comb structure are fixed teeth;
除了锚区和条形锚区，所述部件均位于同一平面，且平行悬置在衬底上方。With the exception of the anchor region and the strip-shaped anchor region, the components lie in the same plane and are suspended in parallel above the substrate.
连接有被测微梁结构的那个半封口式矩形结构为主测试结构，另一侧不带有被测微梁的半封口式矩形结构为参考结构。The semi-closed rectangular structure connected with the microbeam structure under test is the main test structure, and the semi-closed rectangular structure without the microbeam under test on the other side is the reference structure.
当左右两个半封口式矩形结构通电受热膨胀时，梳齿端相向运动，均移向双向梳齿结构，各自与双向梳齿结构中定齿的交叠面积都会增大，相应的电容也变大。同时，连接有被测微梁的那个半封口式矩形结构受热膨胀时还不断拉伸被测微梁，直至断裂。通过对比双向梳齿结构左右两侧形成的纵向梳齿电容的大小，能够获取被测微梁所受的拉伸作用，进而确定被测微梁的断裂强度。When the two half-sealed rectangular structures on the left and right are energized and expanded by heat, the ends of the comb teeth move towards each other, and both move to the two-way comb structure. The overlapping area between each and the fixed teeth in the two-way comb structure will increase, and the corresponding capacitance will also change. big. At the same time, when the semi-sealed rectangular structure connected with the microbeam under test is heated and expanded, the microbeam under test is continuously stretched until it breaks. By comparing the magnitudes of the longitudinal comb capacitors formed on the left and right sides of the bidirectional comb structure, the tensile effect on the tested microbeam can be obtained, and then the fracture strength of the tested microbeam can be determined.
有益效果：本发明利用两个带有梳齿的半封口式矩形结构与简单的双向梳齿结构相配合，在实现对微梁拉伸的同时还可检测拉伸长度的变化，进而确定微梁的断裂强度。测试结构简单、灵敏度高且易于操作。Beneficial effects: the present invention utilizes two half-sealed rectangular structures with comb teeth to cooperate with a simple two-way comb structure, and can detect the change of the stretched length while stretching the micro-beam, and then determine the micro-beam breaking strength. The test structure is simple, high sensitivity and easy to operate.
附图说明Description of drawings
图1为本发明的结构示意图。Fig. 1 is a structural schematic diagram of the present invention.
其中有：条形锚区201、左梳齿202、右梳齿203，左动梳齿301、左竖直边302、左横边303、左锚区304，右动梳齿401、右竖直边402、右横边403、右锚区404，被测微梁501、被测微梁锚区502。Wherein there are: strip anchor area 201, left comb 202, right comb 203, left moving comb 301, left vertical edge 302, left horizontal edge 303, left anchor area 304, right moving comb 401, right vertical Side 402 , right transverse side 403 , right anchor area 404 , microbeam to be tested 501 , anchor area 502 to be tested microbeam.
具体实施方式detailed description
本发明的一种基于纵向梳齿式电容的微梁断裂强度的测试结构，包括衬底、一个双向梳齿结构、两个完全相同的带有单排梳齿的半封口式矩形结构和一个被测微梁结构。所述双向梳齿结构由一个条形锚区和连接在锚区两侧面的梳齿构成；所述半封口式矩形结构的竖直边外侧面连接有一排梳齿，与该边垂直的两条横边的末端连接在各自的锚区的侧面；所述两个带有梳齿的半封口式矩形结构对称分布在双向梳齿结构的左右两侧，梳齿端与双向梳齿结构的梳齿交错相对，其中半封口式矩形结构所带有的梳齿为动齿，双向梳齿结构的梳齿为定齿；所述被测微梁的一端连接在其中一个半封口式矩形结构的竖直边内侧面的中部处，另一端固定在一个锚区的侧面，另一个不带有被测微梁的半封口式矩形结构为参考结构；所述半封口式矩形、被测微粱和梳齿均位于同一平面，且平行悬置在衬底上方。A test structure of the fracture strength of a microbeam based on a longitudinal comb-tooth capacitor of the present invention includes a substrate, a bidirectional comb-tooth structure, two identical semi-sealed rectangular structures with a single row of comb-tooths, and a quilt Micrometer beam structure. The two-way comb structure is composed of a bar-shaped anchor area and comb teeth connected to both sides of the anchor area; a row of comb teeth is connected to the outer side of the vertical side of the semi-sealed rectangular structure, and two comb teeth perpendicular to the side The ends of the transverse sides are connected to the sides of the respective anchor areas; the two half-sealed rectangular structures with comb teeth are symmetrically distributed on the left and right sides of the two-way comb structure, and the comb ends are connected with the comb teeth of the two-way comb structure. The comb teeth of the semi-closed rectangular structure are movable teeth, and the comb teeth of the bidirectional comb structure are fixed teeth; one end of the measured microbeam is connected to the vertical part of one of the semi-closed rectangular structures. The middle part of the inner side of the side, the other end is fixed on the side of an anchor area, and another semi-closed rectangular structure without the measured microbeam is the reference structure; the semi-closed rectangle, the measured microbeam and the comb teeth All lie in the same plane and are suspended in parallel above the substrate.
下面结合附图对本发明做更进一步的解释。The present invention will be further explained below in conjunction with the accompanying drawings.
结合图1所示，一种基于纵向梳齿式电容的微梁断裂强度的测试结构，包括衬底1、双向梳齿结构、两个带有梳齿的半封口式矩形结构以及被测微粱结构；As shown in Figure 1, a test structure for the fracture strength of a microbeam based on a longitudinal comb-tooth capacitance, including a substrate 1, a bidirectional comb-tooth structure, two semi-sealed rectangular structures with comb teeth, and the microbeam to be tested structure;
双向梳齿结构由一个条形锚区201和连接在条形锚区201左右两侧面的两排左梳齿202、右梳齿203形成；The two-way comb structure is formed by a bar-shaped anchor area 201 and two rows of left comb teeth 202 and right comb teeth 203 connected to the left and right sides of the bar-shaped anchor area 201;
带有梳齿的半封口式矩形结构的半封闭框由一条左竖直边302和两条垂直相连的左横边303构成。其中，左竖直边302外侧面连接有一排左梳齿301，两条左横边303的末端连接在各自的左锚区304的侧面。The semi-closed frame of the half-closed rectangular structure with comb teeth is composed of a left vertical side 302 and two vertically connected left transverse sides 303 . Wherein, a row of left comb teeth 301 is connected to the outer side of the left vertical side 302 , and the ends of the two left horizontal sides 303 are connected to the sides of the respective left anchor regions 304 .
被测微梁结构5位于半封口式矩形结构的半封闭框内，被测微梁501的一端与半封闭框的左竖直边302的中部内侧面相连，另一端被固定在一个被测微梁锚区502的侧面；The measured microbeam structure 5 is located in a semi-closed frame of a semi-closed rectangular structure, one end of the measured microbeam 501 is connected to the middle inner surface of the left vertical side 302 of the semi-closed frame, and the other end is fixed on a measured microbeam. the sides of the beam anchorage area 502;
两个带有梳齿的半封口式矩形结构对称分布在双向梳齿结构的左右两侧，梳齿端301和401分别与双向梳齿结构的左梳齿202、右梳齿203交错相对，其中半封口式矩形结构所带有的左梳齿301或右梳齿401为动齿，双向梳齿结构的左梳齿202、右梳齿203为定齿。连接有被测微梁结构的那个半封口式矩形结构为主测试结构，另一个不带有被测微梁的半封口式矩形结构为参考结构；Two half-sealed rectangular structures with comb teeth are symmetrically distributed on the left and right sides of the bidirectional comb tooth structure, and the comb tooth ends 301 and 401 are respectively opposite to the left comb tooth 202 and the right comb tooth 203 of the bidirectional comb tooth structure. The left comb 301 or the right comb 401 of the semi-sealed rectangular structure are movable teeth, and the left comb 202 and right comb 203 of the bidirectional comb structure are fixed teeth. The semi-closed rectangular structure connected with the microbeam structure under test is the main test structure, and the other semi-closed rectangular structure without the microbeam under test is the reference structure;
半封口式矩形结构的各边左竖直边302、左横边303和右竖直边402、右横边403、被测微粱501、左梳齿202、右梳齿203、左动齿301和右动齿401均位于同一平面，且平行悬置在衬底上方。Left vertical side 302, left horizontal side 303 and right vertical side 402, right horizontal side 403, tested microbeam 501, left comb teeth 202, right comb teeth 203, left movable teeth 301 on each side of the semi-closed rectangular structure and the right movable tooth 401 are located on the same plane, and are suspended above the substrate in parallel.
该测量结构的制备可采用基于SOI(Silion-on-Insulator的简称)的体加工技术。如可选用上层掺杂单晶硅层厚约为100μm，下层单晶硅衬底厚度约400μm，中间绝缘氧化会产层为4μm的SOI片。加工中，借助于光刻胶和掩模板暴露出部分上层单晶硅，然后用深层等离子体反应方法(DRIE)腐蚀掉暴露的单晶硅直至氧化层。再利用氟化氢溶液腐蚀掉结构图形下的氧化层，形成可活动部件，而那些被单晶硅覆盖面积大的氧化层不能被完全腐蚀掉，这些单晶硅依旧被固定在衬底上，形成锚区。需要指出的是，以上工艺的选择不仅限于提到的优选工艺，也可选择表面微加工工艺，衬底为单晶硅，结构层为掺杂多晶硅或金属。The preparation of the measurement structure can be based on SOI (short for Silion-on-Insulator) body processing technology. If the thickness of the upper doped monocrystalline silicon layer is about 100 μm, and the thickness of the lower layer of single crystal silicon substrate is about 400 μm, an SOI sheet with a layer of 4 μm will be produced by intermediate insulating oxidation. During processing, part of the upper layer of single crystal silicon is exposed with the help of photoresist and mask, and then the exposed single crystal silicon is etched away to the oxide layer by deep plasma reaction method (DRIE). Then use hydrogen fluoride solution to etch away the oxide layer under the structural pattern to form movable parts, and those oxide layers covered by single crystal silicon cannot be completely etched away, and these single crystal silicon are still fixed on the substrate to form anchors. Area. It should be pointed out that the selection of the above process is not limited to the preferred process mentioned above, and the surface micromachining process can also be selected, the substrate is monocrystalline silicon, and the structural layer is doped polysilicon or metal.
被测悬臂梁断裂强度的测试方法如下：The test method for the fracture strength of the measured cantilever beam is as follows:
1)在半封口式矩形结构的两左锚区304之间施加直流电压，电流流经左横边303和左竖直边302；同时，在半封口式矩形结构的两右锚区404之间也同步施加直流电压，电流流经右横边403和右竖直边402；1) A DC voltage is applied between the two left anchor regions 304 of the semi-closed rectangular structure, and the current flows through the left lateral side 303 and the left vertical side 302; meanwhile, between the two right anchor regions 404 of the semi-closed rectangular structure A DC voltage is also applied synchronously, and the current flows through the right horizontal side 403 and the right vertical side 402;
2)半封口式矩形结构的两左横边303通电受热发生膨胀，使左动梳齿301向右前方移动，并拉伸被测微梁501。同时，左动梳齿301的各动齿与双向梳齿结构左梳齿202中的各定齿之间的相对面积增大，相应地纵向梳齿电容CL变大，测量和记录CL的变化；2) The two left lateral sides 303 of the semi-sealed rectangular structure are energized and heated to expand, so that the left movable comb 301 moves forward to the right and stretches the microbeam 501 to be measured. Simultaneously, the relative area between each movable tooth of the left movable comb tooth 301 and each fixed tooth in the left comb tooth 202 of the bidirectional comb tooth structure increases, correspondingly, the longitudinal comb tooth capacitance C L becomes larger, and the value of C L is measured and recorded Variety;
3)半封口式矩形结构的两右横边403通电受热发生膨胀，使右动梳齿401向左前方移动，右动梳齿401的各动齿与双向梳齿结构左竖直边302的各定齿之间的相对面积增大，相应地纵向梳齿电容CR变大，测量和记录CR的变化；3) The two right horizontal sides 403 of the semi-sealed rectangular structure are energized and heated to expand, so that the right moving comb 401 moves forward to the left, and each moving tooth of the right moving comb 401 and each of the left vertical side 302 of the two-way comb structure The relative area between the fixed teeth increases, correspondingly the capacitance C R of the longitudinal comb tooth becomes larger, and the change of C R is measured and recorded;
4)逐渐加大外界施加在半封口式矩形结构的锚区端上的直流电压，直至被测微梁501发生断裂，拉伸负载消失，此时，纵向梳齿电容CL变化明显；4) Gradually increase the external DC voltage applied to the anchor region end of the semi-sealed rectangular structure until the measured microbeam 501 breaks and the tensile load disappears. At this time, the longitudinal comb capacitance CL changes significantly;
5)当观察到测量电容突然变化时，左锚区304和右锚区40上施加的电压终止。5) When a sudden change in measured capacitance is observed, the applied voltage across the left anchor region 304 and the right anchor region 40 is terminated.
根据测量和记录，分析两个梳齿电容CL和CR的变化形态和相对大小，考虑到梳齿电容CL和CR的变化与被测微梁501的伸长量成正比，因此通过测量差分电容的变化量，并由电容变化突变点可确定被测微梁501断裂时所对应的拉伸长度，进而确定被微梁的断裂强度。According to the measurement and records, analyze the change form and relative size of the two comb capacitances CL and CR , considering that the changes of the comb capacitance CL and CR are proportional to the elongation of the measured microbeam 501, so by The variation of the differential capacitance is measured, and the elongation length corresponding to the breakage of the measured microbeam 501 can be determined from the sudden change point of the capacitance change, thereby determining the fracture strength of the tested microbeam.
以上所述仅是本发明的优选实施方式，应当指出：对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。The above is only a preferred embodiment of the present invention, it should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, some improvements and modifications can also be made, and these improvements and modifications are also possible. It should be regarded as the protection scope of the present invention.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410765597.9A CN104502193B (en) | 2014-12-12 | 2014-12-12 | Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410765597.9A CN104502193B (en) | 2014-12-12 | 2014-12-12 | Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104502193A CN104502193A (en) | 2015-04-08 |
| CN104502193B true CN104502193B (en) | 2017-01-25 |
Family
ID=52943612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410765597.9A Expired - Fee Related CN104502193B (en) | 2014-12-12 | 2014-12-12 | Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104502193B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105606283B (en) * | 2016-01-15 | 2018-05-15 | 东南大学 | A kind of test structure and measuring method of the micro- stress beam gradients of MEMS that structure is compared based on more beams |
| CN105547558B (en) * | 2016-01-15 | 2018-04-24 | 东南大学 | The anisotropy test structure and measuring method of a kind of micro- stress beam gradients of MEMS based on accumbency tee girder |
| CN114347333B (en) * | 2021-12-31 | 2024-12-17 | 上海凯众聚氨酯有限公司 | Polyurethane compression sample pouring device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100489485C (en) * | 2004-09-24 | 2009-05-20 | 中国科学院力学研究所 | Micromechanics measurer and measuring method |
| CN1828308A (en) * | 2006-04-07 | 2006-09-06 | 东南大学 | On-line test and analysis device and method for material parameters of MEMS devices |
| CN100498276C (en) * | 2006-11-10 | 2009-06-10 | 北京工业大学 | MEMS stretching twisted fatigue feature testing apparatus |
| JP2012137368A (en) * | 2010-12-27 | 2012-07-19 | Mitsubishi Electric Corp | Acceleration sensor |
| CN103003704B (en) * | 2011-05-23 | 2016-05-04 | 深迪半导体(上海)有限公司 | Both MEMS devices of sensing rotation and acceleration |
| CN103115703B (en) * | 2013-01-21 | 2015-07-08 | 西北工业大学 | Manufacturing method of micro capacitance-type wall shear stress sensor based on through silicon via (TSV) technology |
-
2014
- 2014-12-12 CN CN201410765597.9A patent/CN104502193B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN104502193A (en) | 2015-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104458072B (en) | A kind of test structure of comb capacitance type MEMS micro-stress beam gradient | |
| CN104483196B (en) | Test structure of micro-beam fracture strength based on lateral comb tooth type capacitance | |
| Ruzziconi et al. | Nonlinear dynamics of an electrically actuated imperfect microbeam resonator: experimental investigation and reduced-order modeling | |
| JP4510068B2 (en) | Displacement measuring apparatus and displacement measuring method for microstructure | |
| US20150114118A1 (en) | Variable Area Capacitive Lateral Acceleration Sensor and Preparation Method Thereof | |
| CN101858927A (en) | Low Stress Silicon Microresonant Accelerometer | |
| CN104502193B (en) | Structure for testing micro-beam breaking strength based on longitudinal comb-tooth-type capacitor | |
| CN101271124B (en) | L-shaped beam piezoresistive micro-accelerometer and manufacturing method thereof | |
| Pan et al. | A microstructure for in situ determination of residual strain | |
| CN104045049A (en) | Processing method of high-precision accelerometer based on silicon layer transfer (SOLT) technology | |
| CN101792108B (en) | Large capacitance micro inertial sensor based on slide-film damping and manufacturing method thereof | |
| CN102353609A (en) | MEMS fluid density sensor chip with dual Wheatstone full bridges structure and its preparation method | |
| CN102944515B (en) | Measurement structure for adhesive force of micro-cantilever in micro-mechanical system and measurement method of measurement structure | |
| CN102980506B (en) | Measurement structure for critical contact length and adhesive force of contacting adhesive of micro cantilever beam | |
| CN201673168U (en) | Low Stress Silicon Microresonant Accelerometer | |
| Langfelder et al. | Analysis of mode-split operation in MEMS based on piezoresistive nanogauges | |
| CN104729919B (en) | A kind of method and system for the micro- beam tensile break strength for extracting bulk silicon technological manufacture | |
| CN101792109A (en) | Micro inertial sensor with transversely movable electrodes embedded and manufacturing method thereof | |
| CN103604533B (en) | A kind of test structure deflecting condenser type surface micromachined unrelieved stress | |
| CN103913596B (en) | The preparation method of silicon micro-resonance type accelerometer | |
| CN104390777B (en) | A kind of electrothermal drive declines the test structure of Mechatronic Systems torsion beam fatigue strength | |
| CN104034575B (en) | Thin film silicon material Poisson ratio test structure and method in dielectric substrate | |
| CN102156202A (en) | Fixing structure for electrode pad | |
| CN202404055U (en) | Polycrystalline silicon fracture strength on-line testing structure | |
| Tez et al. | Comparison of two alternative fabrication processes for a three-axis capacitive MEMS accelerometer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 210093 Nanjing University Science Park, 22 Hankou Road, Gulou District, Nanjing City, Jiangsu Province Patentee after: SOUTHEAST University Address before: 210033 Xigang office, Qixia District, Nanjing, Jiangsu, No. 8, Qi Min Dong Road, Xingshan City, Patentee before: Southeast University |
|
| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 210093 Nanjing University Science Park, 22 Hankou Road, Gulou District, Nanjing City, Jiangsu Province Patentee after: SOUTHEAST University Address before: 210033 Xigang office, Qixia District, Nanjing, Jiangsu, No. 8, Qi Min Dong Road, Xingshan City, Patentee before: Southeast University |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170125 Termination date: 20211212 |