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CN104461211B - A kind of 3D manufacture methods of resistive touch screen - Google Patents

A kind of 3D manufacture methods of resistive touch screen Download PDF

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CN104461211B
CN104461211B CN201410237620.7A CN201410237620A CN104461211B CN 104461211 B CN104461211 B CN 104461211B CN 201410237620 A CN201410237620 A CN 201410237620A CN 104461211 B CN104461211 B CN 104461211B
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electrode
printing
touch screen
metal
layer
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CN104461211A (en
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郭太良
张永爱
周雄图
叶芸
林志贤
林金堂
林婷
林木飞
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Fujian Hongshuochuang Electronic Technology Co ltd
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Fuzhou University
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/045Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20Direct sintering or melting
    • B22F10/28Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/10Formation of a green body
    • B22F10/12Formation of a green body by photopolymerisation, e.g. stereolithography [SLA] or digital light processing [DLP]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/10Formation of a green body
    • B22F10/14Formation of a green body by jetting of binder onto a bed of metal powder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/10Formation of a green body
    • B22F10/18Formation of a green body by mixing binder with metal in filament form, e.g. fused filament fabrication [FFF]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/80Data acquisition or data processing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/30Platforms or substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/22Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces for producing castings from a slip
    • B22F3/225Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces for producing castings from a slip by injection molding
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

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Abstract

本发明涉及一种电阻式触摸屏的3D制造方法,其特征在于,包括以下步骤:步骤1:提供一上基板;步骤2:提供一下基板;步骤3:提供一绝缘隔离层;步骤4:提供一封框体;步骤5:所述上基板与所述下基板对准贴合;步骤6:提供一导电柱;步骤7:将带有触控IC芯片的FPC通过热压与所述第一电极和所述第二电极的连接引脚进行电学连接,形成最终的电阻式触摸屏。本发明采用3D制造的方法来进行电阻式触摸屏的制造,工艺较传统方法大大简化,省去传统工艺曝光、显影、刻蚀等多道复杂工艺,节约生产原料和制造成本。

The invention relates to a 3D manufacturing method of a resistive touch screen, which is characterized in that it comprises the following steps: step 1: providing an upper substrate; step 2: providing a lower substrate; step 3: providing an insulating isolation layer; step 4: providing an Sealing the frame; step 5: aligning and laminating the upper substrate and the lower substrate; step 6: providing a conductive column; step 7: connecting the FPC with the touch IC chip to the first electrode by hot pressing and electrically connecting with the connecting pins of the second electrodes to form a final resistive touch screen. The present invention adopts the method of 3D manufacturing to manufacture the resistive touch screen, and the process is greatly simplified compared with the traditional method, which saves multiple complex processes such as exposure, development, and etching in the traditional process, and saves production raw materials and manufacturing costs.

Description

一种电阻式触摸屏的3D制造方法A kind of 3D manufacturing method of resistive touch screen

技术领域technical field

本发明涉及触摸屏的制造领域,尤其涉及一种电阻式触摸屏的3D打印制造方法。The invention relates to the field of manufacturing touch screens, in particular to a 3D printing manufacturing method for resistive touch screens.

背景技术Background technique

触摸屏是触摸感应技术的主要应用之一,其作为一种全新的人机交流方式,在电子产品输入设备的新操作方式上逐渐占据重要的地位。它以捕捉人体手指的触摸动作信息为基本出发点,将手指触摸动作的信息转化成电信号并加以判断识别,使之与传统机械轻触案按键的“按压”和释放动作等价。Touch screen is one of the main applications of touch sensing technology. As a new way of human-computer communication, it gradually occupies an important position in the new operation mode of electronic product input devices. It takes capturing the touch action information of human fingers as the basic starting point, converts the information of finger touch action into electrical signals and judges and recognizes them, making them equivalent to the "press" and release actions of traditional mechanical light touch buttons.

现有触摸屏的制造多采用光刻、印刷及镀膜等技术,其中光刻技术和镀膜技术需要很多道工艺,如光刻法就包括了曝光、显影、刻蚀、清洗等多道工序,制作工艺相对繁琐,并且其属于“减材制造”,不可避免的造成材料的浪费。印刷法虽克服了材料浪费的问题,但其制作的触摸屏精确度不高,分辨率也较低。这些传统工艺,需要多道黄光与镀膜工艺,采用减法制作器件,所以造成工艺的复杂,成品率,以及原料浪费等问题。The manufacture of existing touch screens mostly uses technologies such as photolithography, printing and coating, among which photolithography and coating technologies require many processes. For example, photolithography includes multiple processes such as exposure, development, etching, and cleaning. It is relatively cumbersome, and it belongs to "subtractive manufacturing", which inevitably leads to waste of materials. Although the printing method overcomes the problem of material waste, the precision of the touch screen produced by it is not high, and the resolution is also low. These traditional processes require multiple yellow light and coating processes, and the devices are made by subtraction, which causes problems such as complex processes, yield, and waste of raw materials.

发明内容Contents of the invention

本发明的目的在于克服现有技术的不足,结合了3D打印的优势,提供一种电阻式触摸屏的3D打印制造方法。The object of the present invention is to overcome the deficiencies of the prior art, combine the advantages of 3D printing, and provide a 3D printing manufacturing method of a resistive touch screen.

本发明的技术方案在于:Technical scheme of the present invention is:

一种电阻式触摸屏的3D制造方法,其特征在于,包括以下步骤:A 3D manufacturing method for a resistive touch screen, comprising the following steps:

步骤1:提供一上基板;所述上基板包括第一玻璃基板、设置于第一玻璃基板可视区域的第一导电层、设置于第一基板边缘的第一电极、设置于第一电极上的若干个第一导通通道和若干个第二导通通道;其中,Step 1: Provide an upper substrate; the upper substrate includes a first glass substrate, a first conductive layer disposed on the visible area of the first glass substrate, a first electrode disposed on the edge of the first substrate, and a first electrode disposed on the first electrode A number of first conduction channels and a number of second conduction channels; wherein,

所述第一导电层采用3D打印一层或若干层的导电材料所构成的透明导电层;The first conductive layer is a transparent conductive layer composed of 3D printed one or several layers of conductive material;

所述第一电极采用3D打印一层或若干层的金属导电材料所构成的导电层;The first electrode adopts a conductive layer composed of 3D printing one or several layers of metal conductive material;

步骤2:提供一下基板;所述下基板包括第二玻璃基板、设置于第二玻璃基板可视区域的第二导电层、设置于第二基板边缘的第二电极、第三电极和第四电极;其中,Step 2: Provide a lower substrate; the lower substrate includes a second glass substrate, a second conductive layer disposed on the visible area of the second glass substrate, a second electrode, a third electrode, and a fourth electrode disposed on the edge of the second substrate ;in,

所述第二导电层采用3D打印一层或若干层的导电材料所构成的透明导电层;The second conductive layer is a transparent conductive layer composed of 3D printed one or several layers of conductive material;

所述第二电极采用3D打印一层或若干层的金属导电材料所构成的导电层;The second electrode adopts a conductive layer formed by 3D printing one or several layers of metal conductive material;

所述第三电极采用3D打印一层或若干层的金属导电材料所构成的导电层;The third electrode adopts a conductive layer composed of 3D printing one or several layers of metal conductive material;

所述第四电极采用3D打印一层或若干层的金属导电材料所构成的导电层;The fourth electrode adopts a conductive layer composed of 3D printing one or several layers of metal conductive material;

步骤3:提供一绝缘隔离层;在所述下基板表面采用3D打印一层或若干层的绝缘隔离柱,形成一绝缘隔离层;Step 3: providing an insulating isolation layer; using 3D printing of one or several layers of insulating isolation columns on the surface of the lower substrate to form an insulating isolation layer;

步骤4:提供一封框体;在所述下基板的四周采用3D打印一层或若干层的绝缘封框胶,形成所述封框体;Step 4: providing a frame; 3D printing one or more layers of insulating frame sealant around the lower substrate to form the frame seal;

步骤5:所述上基板与所述下基板对准贴合;Step 5: Aligning and laminating the upper substrate and the lower substrate;

步骤6:提供一导电柱;在所述第一导通通道和第二导通通道内采用3D制造一层或若干层的金属导电材料所构成一导电柱,用于连接所述第三电极和所述第四电极;Step 6: providing a conductive column; using 3D to manufacture one or several layers of metal conductive material in the first conduction channel and the second conduction channel to form a conductive column for connecting the third electrode and the the fourth electrode;

步骤7: 将带有触控IC芯片的FPC通过热压与所述第一电极和所述第二电极的连接引脚进行电学连接,形成最终的电阻式触摸屏;Step 7: Electrically connect the FPC with the touch IC chip to the connecting pins of the first electrode and the second electrode by hot pressing to form a final resistive touch screen;

其中,所述3D打印具体步骤如下:Wherein, the specific steps of the 3D printing are as follows:

S11:依次设计生成电阻式触摸屏的第一导电层、第一电极、第二导电层、第二电极、第三电极、第四电极、隔离层、封框体和导电柱的三维数字模型;S11: sequentially design and generate a three-dimensional digital model of the first conductive layer, the first electrode, the second conductive layer, the second electrode, the third electrode, the fourth electrode, the isolation layer, the sealing frame and the conductive column of the resistive touch screen;

S12:利用软件对所建立的第一导电层、第一电极、第二导电层、第二电极、第三电极、第四电极、隔离层、封框体和导电柱三维模型依次进行分层,获得Z轴方向的二维子层;S12: Use software to sequentially layer the established three-dimensional models of the first conductive layer, the first electrode, the second conductive layer, the second electrode, the third electrode, the fourth electrode, the isolation layer, the sealing frame and the conductive column, Obtain the two-dimensional sublayer in the Z-axis direction;

S13:将所述二维子层导入3D打印机程序中,根据所建模型得出每层二维平面上的材料和形状,设计出打印路径;S13: Import the two-dimensional sub-layer into the 3D printer program, obtain the material and shape on the two-dimensional plane of each layer according to the built model, and design the printing path;

S14:将所述玻璃基板层放在3D打印装置台面上,在上基板表面依次打印所述第一导电层和第一电极,在下基板表面依次打印第二导电层、第二电极、第三电极、第四电极、隔离层、封框体和导电柱。S14: Put the glass substrate layer on the table of the 3D printing device, print the first conductive layer and the first electrode on the surface of the upper substrate in sequence, and print the second conductive layer, the second electrode, and the third electrode on the surface of the lower substrate in sequence , a fourth electrode, an isolation layer, a sealing frame and a conductive post.

其中,所述若干个第一导通通道和所述第二导通通道的结构为圆柱体、长方体、正方体,采用激光加工或机械钻孔而成。Wherein, the structures of the plurality of first conduction channels and the second conduction channels are cylinders, cuboids, and cubes, which are formed by laser processing or mechanical drilling.

所述第一导电层和所述第二导电层为透明导电层,所述透明导电层的结构为有序网格状或无序网格状,或为面状结构;所述网格状导电层由透明导电材料或非透明导电材料构成;所述面状结构导电层由透明导电材料构成。The first conductive layer and the second conductive layer are transparent conductive layers, and the structure of the transparent conductive layer is an ordered grid or a disordered grid, or a planar structure; the grid conductive The layer is made of transparent conductive material or non-transparent conductive material; the planar structure conductive layer is made of transparent conductive material.

所述透明导电层包括金属纳米颗粒、金属量子点、金属氧化物、石墨烯、碳纳米管、金属纳米线中的一种或两种及其以上复合而成。The transparent conductive layer is composed of one or two or more of metal nanoparticles, metal quantum dots, metal oxides, graphene, carbon nanotubes, and metal nanowires.

所述第一电极、第二电极、第三电极和所述第四电极的形状为网格状、条状、面状;所述所述第一电极、第二电极、第三电极和所述第四电极可由金属纳米颗粒、金属量子点、金属浆料、碳浆一种或两种及其以上复合而成的条状结构导电层。The shapes of the first electrode, the second electrode, the third electrode and the fourth electrode are grid-like, strip-like and plane-like; the first electrode, the second electrode, the third electrode and the The fourth electrode can be a strip-shaped conductive layer composed of metal nanoparticles, metal quantum dots, metal paste, and carbon paste, or two or more of them.

所述隔离层由若干个透明隔离柱构成,所述隔离柱在水平方向上自左到右均匀间隔排列构成一个水平行,在竖直方向上匀间隔排列构成一个垂直列,在水平和竖直方向上相邻隔离子之间的距离均为1-100毫米,隔离柱高度为10-5000微米,直径为10-3000微米。The isolation layer is composed of several transparent isolation columns, the isolation columns are evenly spaced from left to right in the horizontal direction to form a horizontal row, and evenly spaced in the vertical direction to form a vertical column. The distance between adjacent spacers in the direction is 1-100 millimeters, the height of the spacers is 10-5000 microns, and the diameter is 10-3000 microns.

所述封框体由不透明的封框胶组成,所述封框胶的厚度大于或等于隔离柱的高度。The sealing frame body is composed of opaque sealing glue, and the thickness of the sealing glue is greater than or equal to the height of the isolation column.

所述导电柱可由金属纳米颗粒、金属量子点、金属浆料、碳浆一种或两种及其以上复合而成的导电层。The conductive pillar may be a conductive layer composed of one or more of metal nanoparticles, metal quantum dots, metal paste, and carbon paste.

所述3D打印方法包括立体光固化成型、选择性激光烧结、熔融沉积制造、三维印刷和喷墨打印成型。The 3D printing methods include stereolithography, selective laser sintering, fusion deposition manufacturing, three-dimensional printing and inkjet printing.

在同一基板上打印一个触摸屏或多个触摸屏阵列,所述多个触摸屏阵列采用切割的方式进行分离。One touch screen or multiple touch screen arrays are printed on the same substrate, and the multiple touch screen arrays are separated by cutting.

本发明的优点在于:The advantages of the present invention are:

本发明采用3D制造的方法来进行电阻式触摸屏的制造,工艺较传统方法大大简化,省去传统工艺曝光、显影、刻蚀等多道复杂工艺,节约生产原料和制造成本。The present invention adopts the method of 3D manufacturing to manufacture the resistive touch screen, and the process is greatly simplified compared with the traditional method, which saves multiple complex processes such as exposure, development, and etching in the traditional process, and saves production raw materials and manufacturing costs.

附图说明Description of drawings

图1 是本发明提供的一种3D制造电阻式触摸屏的流程图。Fig. 1 is a flowchart of a 3D manufacturing resistive touch screen provided by the present invention.

图2 是本发明提供的一种3D制造电阻式触摸屏结构示意图。FIG. 2 is a schematic structural diagram of a 3D-manufactured resistive touch screen provided by the present invention.

图3 是本发明提供的一种3D制造电阻式触摸屏上基板平面示意图。FIG. 3 is a schematic plan view of a substrate on a 3D-manufactured resistive touch screen provided by the present invention.

图4为本发明提供的一种3D制造电阻式触摸屏下基板平面示意图。FIG. 4 is a schematic plan view of a lower substrate of a 3D-manufactured resistive touch screen provided by the present invention.

具体实施方式detailed description

为让本发明的上述特征和优点能更明显易懂,下文特举实施例,结合附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

以下将通过具体实施例对本发明做进一步的详细描述。The present invention will be further described in detail through specific examples below.

参照图1至图4,电阻式触摸屏的3D制造方法,包括了以下几个步骤:Referring to Figures 1 to 4, the 3D manufacturing method of the resistive touch screen includes the following steps:

(S1)提供一上基板10。所述上基板10包括第一玻璃基板11、设置于第一玻璃基板可视区域的第一导电层12、设置于第一基板边缘的第一电极13、设置于第一电极13上的若干个第一导通通道14和若干个第二导通通道15。其中,所述第一导电层12、所述第一电极13可采用3D制造技术来实现,具体制造步骤如下:( S1 ) Provide an upper substrate 10 . The upper substrate 10 includes a first glass substrate 11, a first conductive layer 12 disposed on the visible area of the first glass substrate, a first electrode 13 disposed on the edge of the first substrate, and several electrodes disposed on the first electrode 13. A first conduction channel 14 and several second conduction channels 15 . Wherein, the first conductive layer 12 and the first electrode 13 can be realized by using 3D manufacturing technology, and the specific manufacturing steps are as follows:

(S11)提供一玻璃基板11。根据设计尺寸,选取一合适玻璃基板,将所述玻璃基板110置于按体积比为Win-10 : DI水 = 3 : 97清洗液中,利用频率为32KHz的超声机清洗15min,喷淋2min后,再置于体积比为Win41 : DI水 = 5 : 95清洗液中,利用频率为40KHz的超声机清洗10min,经循环自来水喷淋漂洗2min后,再利用频率为28KHz的超声机在DI纯净水中清洗10min,经风刀吹干后置于50℃洁净烘箱中保温30min。( S11 ) Provide a glass substrate 11 . According to the design size, select a suitable glass substrate, place the glass substrate 110 in a cleaning solution with a volume ratio of Win-10: DI water = 3: 97, use an ultrasonic machine with a frequency of 32KHz to clean for 15 minutes, and spray for 2 minutes. , and then placed in a cleaning solution with a volume ratio of Win41: DI water = 5: 95, using an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, spraying and rinsing with circulating tap water for 2 minutes, and then using an ultrasonic machine with a frequency of 28KHz in DI pure water Wash for 10 minutes, dry with an air knife, and then place in a clean oven at 50°C for 30 minutes.

(S12)第一导电层12制作。参照图3,所述导电层12为透明导电层,所述透明导电层的结构为有序网格状或无序网格状,也可为面状结构。所述网格状导电层由透明导电材料或非透明导电材料构成;所述面状结构导电层由透明导电材料构成。所述透明导电层的材料包括金属纳米颗粒、金属量子点、金属氧化物、石墨烯、碳纳米管、金属纳米线中的一种或两种及其以上复合而成。所述第一导电层可采用激光烧结或熔融挤出成型来制备,也可采用光敏材料的立体光固化、三维印刷或喷墨打印来制备。其中,金属纳米颗粒、金属量子点或金属氧化物可采用选择性激光烧结或熔融挤出成型制作而成;金属量子点、石墨烯、碳纳米管、金属纳米线、金属氧化物纳米结构也可采用光敏材料的立体光固成型、三维印刷或三维喷墨打印制作而成。( S12 ) Fabrication of the first conductive layer 12 . Referring to FIG. 3 , the conductive layer 12 is a transparent conductive layer, and the structure of the transparent conductive layer is an ordered grid or a disordered grid, or a planar structure. The grid-shaped conductive layer is made of transparent conductive material or non-transparent conductive material; the planar conductive layer is made of transparent conductive material. The material of the transparent conductive layer includes one or two kinds of metal nanoparticles, metal quantum dots, metal oxides, graphene, carbon nanotubes, metal nanowires, or more than one of them. The first conductive layer can be prepared by laser sintering or melt extrusion molding, and can also be prepared by stereolithography, three-dimensional printing or inkjet printing of photosensitive materials. Among them, metal nanoparticles, metal quantum dots or metal oxides can be made by selective laser sintering or melt extrusion; metal quantum dots, graphene, carbon nanotubes, metal nanowires, metal oxide nanostructures can also be It is made by stereolithography, three-dimensional printing or three-dimensional inkjet printing of photosensitive materials.

本实施例优选选择性激光烧结金属纳米银颗粒制作网格状透明导第一导电层12,具体步骤如下:In the present embodiment, selective laser sintering of metal nano-silver particles is preferred to make the grid-shaped transparent conductive first conductive layer 12, and the specific steps are as follows:

(S121)设计生成电阻式触摸屏中的第一导电层12的三维数字模型;(S121) Design and generate a three-dimensional digital model of the first conductive layer 12 in the resistive touch screen;

(S122)利用软件对所建立的图形化透明导电层12的三维模型依次进行分层,确定有序网格状的面状透明导电层的参数,包括网格厚度、线径和孔径;本实施优选面状导电层的金属网格线的厚度为0.2微米,金属网格线的宽度为3微米,金属网格孔径为8微米;(S122) Using software to sequentially layer the three-dimensional model of the established graphic transparent conductive layer 12, and determine the parameters of the ordered grid-shaped planar transparent conductive layer, including grid thickness, wire diameter and aperture; this implementation Preferably, the thickness of the metal grid lines of the planar conductive layer is 0.2 microns, the width of the metal grid lines is 3 microns, and the metal grid aperture is 8 microns;

(S123)将所述二维子层导入3D打印机程序中,根据所建模型得出每层二维平面上的材料和形状,设计出打印路径;(S123) importing the two-dimensional sub-layer into a 3D printer program, obtaining the material and shape of each layer on a two-dimensional plane according to the built model, and designing a printing path;

(S124)将上述玻璃基板层放在3D打印装置台面上,打印所述第一导电层12。具体原理如下:利用铺粉辊设备沿水平方向将金属银纳米颗粒均匀转移至玻璃基底表面的可视区域,控制激光束使其烧结温度为金属银纳米颗粒的溶解温度,激光头沿设定方向移动,激光发出的高能激光通对基底表面的金属银纳米颗粒粉末进行照射,并溶化其扫描路径上的银纳米颗粒;重复上述过程得到所需的图形化透明导电层12。(S124) Put the above glass substrate layer on the table of the 3D printing device, and print the first conductive layer 12 . The specific principle is as follows: Use the powder spreading roller equipment to uniformly transfer the metallic silver nanoparticles to the visible area on the surface of the glass substrate along the horizontal direction, control the laser beam so that the sintering temperature is the melting temperature of the metallic silver nanoparticles, and the laser head moves along the set direction. Moving, the high-energy laser beam emitted by the laser irradiates the metal silver nanoparticle powder on the surface of the substrate, and melts the silver nanoparticle on its scanning path; repeat the above process to obtain the required patterned transparent conductive layer 12 .

(S125)基片表面处理。将制造完成的基片移出3D打印设备,清理阵列表面与内部,包括喷涂打印和激光烧结过程中残留在基片表面多余的金属铜纳米颗粒。(S125) Substrate surface treatment. The finished substrate is removed from the 3D printing equipment, and the surface and interior of the array are cleaned, including excess metal copper nanoparticles remaining on the surface of the substrate during spray printing and laser sintering.

(S13)第一电极13制作。参照图3,所述第一电极的形状为网格状、条状、面状或其它图案;所述第一电极可由金属纳米颗粒、金属量子点、金属浆料、碳浆一种或两种及其以上复合而成的条状结构导电层。所述第一电极可采用可选择性激光烧结或熔融挤出成型来制备,也可采用光敏材料的立体光固化、三维印刷或三维喷墨打印来制备;其中,金属纳米颗粒、金属量子点可采用选择性激光烧结或熔融挤出成型制作而成;金属量子点、金属浆料、碳浆也可采用光敏材料的立体光固成型、三维印刷或三维喷墨打印制作而成( S13 ) Fabrication of the first electrode 13 . Referring to Fig. 3, the shape of the first electrode is grid, strip, planar or other patterns; the first electrode can be made of one or two kinds of metal nanoparticles, metal quantum dots, metal paste, carbon paste And the strip structure conductive layer formed by compounding above. The first electrode can be prepared by selective laser sintering or melt extrusion molding, and can also be prepared by stereolithography, three-dimensional printing or three-dimensional inkjet printing of photosensitive materials; wherein, metal nanoparticles and metal quantum dots can be It is made by selective laser sintering or melt extrusion molding; metal quantum dots, metal paste, and carbon paste can also be made by stereolithography, three-dimensional printing or three-dimensional inkjet printing of photosensitive materials

本实施例优选三维打印金属银量子点制作条状结构的第一电极13,具体步骤如下:In this embodiment, it is preferable to three-dimensionally print metallic silver quantum dots to make the first electrode 13 of a strip structure, and the specific steps are as follows:

(S131)设计生成电阻式触摸屏中的第一电极130的三维数字模型;(S131) Design and generate a three-dimensional digital model of the first electrode 130 in the resistive touch screen;

(S132)利用软件对所建立的第二连接电极160的三维模型依次进行分层,确定第一电极13的结构参数,包括电极厚度、宽度和相邻电极之间的间距;本实施优选条状导电层的宽度为150um,相邻条状导电层之间的间距为80um;组成每条条状导电层的金属厚度为250nm。;(S132) Use software to sequentially layer the established three-dimensional model of the second connecting electrode 160 to determine the structural parameters of the first electrode 13, including electrode thickness, width and the distance between adjacent electrodes; The width of the conductive layer is 150um, and the distance between adjacent strip-shaped conductive layers is 80um; the thickness of the metal forming each strip-shaped conductive layer is 250nm. ;

(S133)将所述二维子层导入3D打印机程序中,根据所建模型得出每层二维平面上的材料和形状,设计出打印路径;(S133) importing the two-dimensional sub-layer into a 3D printer program, obtaining the material and shape of each layer on a two-dimensional plane according to the built model, and designing a printing path;

(S134)将所述玻璃基板层放在3D打印装置台面上,打印所述第一电极13。具体原理如下:将金属银量子点由储料桶送出,再用滚筒将送出的金属银量子点在玻璃基底11四周铺上一层很薄的金属银量子点层,3D打印喷嘴依照计算机模型切片后定义出来的轮廓喷出粘结剂,黏着金属银量子点;一层完成后,加工台自动下降一点,储料桶上升一点,重复上述过程得到所需的第一电极13。(S134) Put the glass substrate layer on the table of the 3D printing device, and print the first electrode 13 . The specific principle is as follows: the metal silver quantum dots are sent out from the storage barrel, and then a roller is used to spread a thin layer of metal silver quantum dots around the glass substrate 11, and the 3D printing nozzle slices according to the computer model The final defined contour is sprayed with adhesive to adhere to the metallic silver quantum dots; after one layer is completed, the processing table is automatically lowered a little, the storage tank is raised a little, and the above process is repeated to obtain the required first electrode 13 .

(S135)将制造完成的基片移出3D打印设备,清理阵列表面与内部,包括喷涂打印成型过程中残留在基片表面多余的金属银量子点。,(S135) The finished substrate is removed from the 3D printing device, and the surface and interior of the array are cleaned, including excess metallic silver quantum dots remaining on the surface of the substrate during the spray printing molding process. ,

(S14)第一导通通道14和第二导通通道15制作。参照图3,所述若干个第一导通通道14和所述第二导通通道15的结构可为圆柱体、长方体、正方体或其它图案,可采用激光加工或机械钻孔而成。本实例优选激光加工成正方体结构的第一导通通道14和所述第二导通通道15,具体步骤如下:( S14 ) Fabricating the first conduction channel 14 and the second conduction channel 15 . Referring to FIG. 3 , the structures of the plurality of first conducting channels 14 and the second conducting channels 15 can be cylinders, cuboids, cubes or other patterns, which can be formed by laser processing or mechanical drilling. In this example, the first conduction channel 14 and the second conduction channel 15 are preferably laser-processed into a cube structure, and the specific steps are as follows:

(S141)设计第一导通通道14和所述第二导通通道15的结构参数,包括第一导通通道14的个数、导通通道的大小、导通通道与导通通道之间的间距,第二导通通道15的个数、导通通道的大小、导通通道与导通通道之间的间距;(S141) Designing structural parameters of the first conduction channel 14 and the second conduction channel 15, including the number of the first conduction channel 14, the size of the conduction channel, and the distance between the conduction channels. Spacing, the number of the second conduction channels 15, the size of the conduction channels, the distance between the conduction channels and the conduction channels;

(S142)选择合适的激光器,控制激光能量,激光加工形成第一导通通道14和第二导通通道15。( S142 ) Select a suitable laser, control laser energy, and laser process to form the first conduction channel 14 and the second conduction channel 15 .

(S2)提供一下基板20。所述下基板20包括第二玻璃基板21、设置于第二玻璃基板21可视区域的第二导电层22、设置于第二基板边缘的第二电极23、第三电极24和第四电极25。其中,所述第二导电层22、所述第二电极23、第三电极24和第四电极25可采用3D制造技术来实现,具体制造步骤如下:(S2) The following substrate 20 is provided. The lower substrate 20 includes a second glass substrate 21, a second conductive layer 22 disposed on the visible area of the second glass substrate 21, a second electrode 23, a third electrode 24 and a fourth electrode 25 disposed on the edge of the second substrate . Wherein, the second conductive layer 22, the second electrode 23, the third electrode 24 and the fourth electrode 25 can be realized by using 3D manufacturing technology, and the specific manufacturing steps are as follows:

(S21)提供一玻璃基板11。根据设计尺寸,选取一合适玻璃基板,将所述玻璃基板110置于按体积比为Win-10 : DI水 = 3 : 97清洗液中,利用频率为32KHz的超声机清洗15min,喷淋2min后,再置于体积比为Win41 : DI水 = 5 : 95清洗液中,利用频率为40KHz的超声机清洗10min,经循环自来水喷淋漂洗2min后,再利用频率为28KHz的超声机在DI纯净水中清洗10min,经风刀吹干后置于50℃洁净烘箱中保温30min。( S21 ) Provide a glass substrate 11 . According to the design size, select a suitable glass substrate, place the glass substrate 110 in a cleaning solution with a volume ratio of Win-10: DI water = 3: 97, use an ultrasonic machine with a frequency of 32KHz to clean for 15 minutes, and spray for 2 minutes. , and then placed in a cleaning solution with a volume ratio of Win41: DI water = 5: 95, using an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, spraying and rinsing with circulating tap water for 2 minutes, and then using an ultrasonic machine with a frequency of 28KHz in DI pure water Wash for 10 minutes, dry with an air knife, and then place in a clean oven at 50°C for 30 minutes.

(S22)第二导电层22制作。参照图4,所述导电层22为透明导电层,所述透明导电层的结构为有序网格状或无序网格状,也可为面状结构。所述网格状导电层由透明导电材料或非透明导电材料构成;所述面状结构导电层由透明导电材料构成。所述透明导电层的材料包括金属纳米颗粒、金属量子点、金属氧化物、石墨烯、碳纳米管、金属纳米线中的一种或两种及其以上复合而成。所述第一导电层可采用激光烧结或熔融挤出成型来制备,也可采用光敏材料的立体光固化、三维印刷或喷墨打印来制备。其中,金属纳米颗粒、金属量子点或金属氧化物可采用选择性激光烧结或熔融挤出成型制作而成;金属量子点、石墨烯、碳纳米管、金属纳米线、金属氧化物纳米结构也可采用光敏材料的立体光固成型、三维印刷或三维喷墨打印制作而成。本实施例优选选择性激光烧结金属纳米银颗粒制作网格状透明导第一导电层22,具体步骤与(S12)一致。( S22 ) Fabrication of the second conductive layer 22 . Referring to FIG. 4 , the conductive layer 22 is a transparent conductive layer, and the structure of the transparent conductive layer is an ordered grid or a disordered grid, or a planar structure. The grid-shaped conductive layer is made of transparent conductive material or non-transparent conductive material; the planar conductive layer is made of transparent conductive material. The material of the transparent conductive layer includes one or two kinds of metal nanoparticles, metal quantum dots, metal oxides, graphene, carbon nanotubes, metal nanowires, or more than one of them. The first conductive layer can be prepared by laser sintering or melt extrusion molding, and can also be prepared by stereolithography, three-dimensional printing or inkjet printing of photosensitive materials. Among them, metal nanoparticles, metal quantum dots or metal oxides can be made by selective laser sintering or melt extrusion; metal quantum dots, graphene, carbon nanotubes, metal nanowires, metal oxide nanostructures can also be It is made by stereolithography, three-dimensional printing or three-dimensional inkjet printing of photosensitive materials. In this embodiment, selective laser sintering of metal nano-silver particles is preferred to fabricate the grid-shaped transparent conductive first conductive layer 22 , and the specific steps are consistent with ( S12 ).

(S23)第二电极23、第三电极24和第四电极25制作。参照图4,所述第二电极23、第三电极24和第四电极25的形状为网格状、条状、面状或其它图案;所述第一电极可由金属纳米颗粒、金属量子点、金属浆料、碳浆一种或两种及其以上复合而成的条状结构导电层。所述所述第二电极23、第三电极24和第四电极25可采用可选择性激光烧结或熔融挤出成型来制备,也可采用光敏材料的立体光固化、三维印刷或三维喷墨打印来制备;其中,金属纳米颗粒、金属量子点可采用选择性激光烧结或熔融挤出成型制作而成;金属量子点、金属浆料、碳浆也可采用光敏材料的立体光固成型、三维印刷或三维喷墨打印制作而成本实施例优选三维打印金属银量子点制作条状结构的所述第二电极23、第三电极24和第四电极25,具体步骤与(S23)步骤一致。( S23 ) Fabrication of the second electrode 23 , the third electrode 24 and the fourth electrode 25 . Referring to Fig. 4, the shape of the second electrode 23, the third electrode 24 and the fourth electrode 25 is grid-like, strip-like, planar or other patterns; the first electrode can be made of metal nanoparticles, metal quantum dots, A conductive layer with a strip structure formed by compounding one or more of metal paste and carbon paste. The second electrode 23, the third electrode 24, and the fourth electrode 25 can be prepared by selective laser sintering or melt extrusion molding, or by stereolithography, three-dimensional printing or three-dimensional inkjet printing of photosensitive materials. Among them, metal nanoparticles and metal quantum dots can be made by selective laser sintering or melt extrusion; metal quantum dots, metal paste, and carbon paste can also be formed by stereolithography and three-dimensional printing of photosensitive materials. Or three-dimensional inkjet printing, and the cost embodiment is preferably three-dimensional printing metal silver quantum dots to make the second electrode 23, third electrode 24 and fourth electrode 25 of the strip structure, and the specific steps are consistent with the step (S23).

(S3)隔离层制作。所述隔离层由若干个透明隔离柱30构成,所述隔离柱30在水平方向上自左到右均匀间隔排列构成一个水平行,在竖直方向上匀间隔排列构成一个垂直列,在水平和竖直方向上相邻隔离柱30之间的距离均为1-100毫米,隔离柱高度为10-5000微米,直径为10-3000微米。所述隔离柱30可采用可选择性激光烧结或熔融透明介质来制作。(S3) Fabrication of the isolation layer. The isolation layer is composed of several transparent isolation columns 30, the isolation columns 30 are evenly spaced from left to right in the horizontal direction to form a horizontal row, and evenly spaced in the vertical direction to form a vertical column. The distance between adjacent spacers 30 in the vertical direction is 1-100 mm, the height of the spacers is 10-5000 microns, and the diameter is 10-3000 microns. The spacer 30 can be fabricated by selective laser sintering or fusing transparent medium.

本发明优选激光烧结聚乙烯颗粒制作成透明隔离柱30。具体步骤如下:In the present invention, the laser sintered polyethylene particles are preferably made into the transparent isolation column 30 . Specific steps are as follows:

(S31)设计生成电阻式触摸屏中的隔离柱30的三维数字模型;(S31) Design and generate a three-dimensional digital model of the isolation column 30 in the resistive touch screen;

(S32)利用软件对所建立的隔离柱30的三维模型依次进行分层,确定隔离柱30的结构参数,包括隔离柱30的高度、直径、相邻隔离柱之间的距离;(S32) Using software to sequentially layer the established three-dimensional model of the isolation column 30, and determine the structural parameters of the isolation column 30, including the height, diameter, and distance between adjacent isolation columns of the isolation column 30;

(S33)将所述二维子层导入3D打印机程序中,根据所建模型得出每层二维平面上的材料和形状,设计出打印路径;(S33) importing the two-dimensional sub-layer into a 3D printer program, obtaining the material and shape of each layer on a two-dimensional plane according to the built model, and designing a printing path;

(S34)聚乙烯颗粒转移。利用铺粉辊设备沿水平方向将聚乙烯颗粒均匀转移至基底表面,或利用增材设备(3D打印)中的喷头沿其扫描路径(金属网格线径方向)移动将聚乙烯颗粒均匀涂布在基底表面;本实施优选铺粉辊设备沿水平方向将聚乙烯颗粒均匀转移至基底表面。(S34) Transfer of polyethylene particles. Use the powder spreading roller equipment to evenly transfer the polyethylene particles to the substrate surface in the horizontal direction, or use the nozzle in the additive equipment (3D printing) to move along its scanning path (the wire diameter direction of the metal grid) to evenly coat the polyethylene particles On the surface of the substrate; in this implementation, it is preferred that the powder spreading roller equipment evenly transfer the polyethylene particles to the surface of the substrate along the horizontal direction.

(S35)聚乙烯颗粒熔融。控制激光束使其烧结温度为132℃,激光头沿设定的面状方向移动,激光发出的高能激光对基底表面的聚乙烯颗粒进行照射,并溶化其扫描路径上的聚乙烯颗粒。熔化后聚乙烯颗粒与基底粘在一起;(S35) The polyethylene particles are melted. Control the laser beam so that the sintering temperature is 132°C, the laser head moves along the set planar direction, and the high-energy laser emitted by the laser irradiates the polyethylene particles on the surface of the substrate and melts the polyethylene particles on the scanning path. Polyethylene particles stick to the substrate after melting;

(S36)重复(S34)和(S35)步骤,形成所需的隔离柱30。(S36) Steps (S34) and (S35) are repeated to form the required isolation column 30 .

(S37)将制造完成的基片移出3D打印设备,清理阵列表面与内部,包括激光烧结过程中残留在基片表面多余的聚乙烯颗粒。(S37) The finished substrate is removed from the 3D printing device, and the surface and interior of the array are cleaned, including excess polyethylene particles remaining on the surface of the substrate during laser sintering.

(S4)封框体40制作。所述封框体可由3D打印不透明的封框胶形成,所述封框胶的厚度大于或等于所述隔离柱30的高度。(S4) Fabrication of the sealing frame body 40 . The sealing frame body can be formed by 3D printing opaque sealing glue, and the thickness of the sealing glue is greater than or equal to the height of the isolation column 30 .

(S5)对准贴合。将所述上基板10和下基板20对准,热压贴合。(S5) Align and fit. The upper substrate 10 and the lower substrate 20 are aligned, and bonded by thermocompression.

(S6)导电柱50制作。所述导电柱50可通过立体光固化、选择性激光烧结、熔融沉积制造、三维印刷或喷墨打印金属纳米颗粒、金属量子点、金属浆料、碳浆一种或两种及其以上复合而成。( S6 ) Fabrication of the conductive pillar 50 . The conductive pillars 50 can be fabricated by stereolithography, selective laser sintering, fused deposition manufacturing, three-dimensional printing or inkjet printing of metal nanoparticles, metal quantum dots, metal paste, carbon paste, or two or more of them. become.

本实施例优选喷墨打印纳米银电子墨水制作导电柱50,具体实验步骤如下:In this embodiment, inkjet printing nano-silver electronic ink is preferred to make conductive pillars 50, and the specific experimental steps are as follows:

(S61)设计生成电阻式触摸屏中的导电柱50的三维数字模型;(S61) Design and generate a three-dimensional digital model of the conductive column 50 in the resistive touch screen;

(S62)利用软件对所建立的导电柱50三维模型依次进行分层,获得Z轴方向的二维子层;(S62) Using software to sequentially layer the established three-dimensional model of the conductive pillar 50 to obtain two-dimensional sub-layers in the Z-axis direction;

(S63)将所述二维子层导入3D打印机程序中,根据所建模型得出每层二维平面上的材料和形状,设计出打印路径;(S63) importing the two-dimensional sub-layer into a 3D printer program, obtaining the material and shape of each layer on a two-dimensional plane according to the built model, and designing a printing path;

(S64)将上述玻璃基板层放在3D打印装置台面上,打印所述导电柱50。具体原理如下:将纳米银颗粒分散到溶液中配制3D打印用纳米银电子墨水,将电子墨水移入储液罐中,通过喷墨打印的微打印头将纳米银电子墨水打印在第一导通通道14和第二导通通道15内,低温干燥处理以除去溶剂,再进行退火处理,重复上述过程形成所需的导电柱50。(S64) Put the above glass substrate layer on the table of the 3D printing device, and print the conductive pillars 50 . The specific principle is as follows: disperse nano-silver particles into the solution to prepare nano-silver electronic ink for 3D printing, move the electronic ink into the liquid storage tank, and print the nano-silver electronic ink on the first conduction channel through the inkjet printing micro print head 14 and the second conduction channel 15 are dried at a low temperature to remove the solvent, and then annealed, and the above process is repeated to form the desired conductive pillar 50 .

(S65)将制造完成的基片移出3D打印设备,清理阵列表面与内部,包括喷涂打印和退火处理过程中残留在基片表面多余的电子墨水。(S65) The finished substrate is removed from the 3D printing device, and the surface and interior of the array are cleaned, including excess electronic ink remaining on the surface of the substrate during spray printing and annealing.

(S7)FPC与电极引脚压合。将带有触控IC芯片的FPC60通过热压与所述第一电极13和所述第二电极23的引脚进行电学连接,形成最终的电阻式触摸屏,如图2所示。(S7) The FPC is pressed together with the electrode pins. The FPC60 with the touch IC chip is electrically connected to the pins of the first electrode 13 and the second electrode 23 by hot pressing to form a final resistive touch screen, as shown in FIG. 2 .

至此,本发明第一优选实施例的一种电阻式触摸屏的3D打印制造方法完成。So far, the 3D printing manufacturing method of a resistive touch screen according to the first preferred embodiment of the present invention is completed.

以上所述仅为本发明的较佳实施例,凡依本发明申请专利范围所做的均等变化与修饰,皆应属本发明的涵盖范围。The above descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made according to the scope of the patent application of the present invention shall fall within the scope of the present invention.

Claims (10)

1. A3D manufacturing method of a resistive touch screen is characterized by comprising the following steps:
step 1: providing an upper substrate; the upper substrate comprises a first glass substrate, a first conducting layer arranged in a visible area of the first glass substrate, a first electrode arranged at the edge of the first substrate, a plurality of first conduction channels and a plurality of second conduction channels arranged on the first electrode; wherein,
the first conducting layer is a transparent conducting layer formed by 3D printing one or a plurality of layers of conducting materials;
the first electrode is a conducting layer formed by 3D printing one or a plurality of layers of metal conducting materials;
step 2: providing a lower substrate; the lower substrate comprises a second glass substrate, a second conducting layer arranged in a visible area of the second glass substrate, a second electrode arranged at the edge of the second substrate, a third electrode and a fourth electrode; wherein,
the second conducting layer is a transparent conducting layer formed by 3D printing one or a plurality of layers of conducting materials;
the second electrode is a conducting layer formed by 3D printing one or a plurality of layers of metal conducting materials;
the third electrode is a conducting layer formed by 3D printing one or a plurality of layers of metal conducting materials;
the fourth electrode is a conducting layer formed by 3D printing one or a plurality of layers of metal conducting materials;
and step 3: providing an insulating isolation layer; 3D printing one or more layers of insulating isolation columns on the surface of the lower substrate to form an insulating isolation layer;
and 4, step 4: providing a sealing frame body; printing one or more layers of insulating frame sealing glue on the periphery of the lower substrate in a 3D mode to form the frame sealing body;
and 5: the upper substrate is aligned and attached to the lower substrate;
step 6: providing a conductive column; a conductive column made of one or more layers of metal conductive materials is/are manufactured in the first conduction channel and the second conduction channel in a 3D mode and used for connecting the third electrode and the fourth electrode;
and 7: electrically connecting the FPC with the touch IC chip with the connecting pins of the first electrode and the second electrode through hot pressing to form a final resistance-type touch screen;
the 3D printing method comprises the following specific steps:
s11: sequentially designing and generating a three-dimensional digital model of a first conducting layer, a first electrode, a second conducting layer, a second electrode, a third electrode, a fourth electrode, an isolating layer, a sealing frame body and a conducting column of the resistive touch screen;
s12: sequentially layering the established three-dimensional models of the first conducting layer, the first electrode, the second conducting layer, the second electrode, the third electrode, the fourth electrode, the isolating layer, the sealing frame body and the conducting column by using software to obtain a two-dimensional sublayer in the Z-axis direction;
s13: importing the two-dimensional sub-layers into a 3D printer program, obtaining materials and shapes on two-dimensional planes of each layer according to the established model, and designing a printing path;
s14: and placing the glass substrate layer on a table board of a 3D printing device, printing the first conducting layer and the first electrode on the surface of the upper substrate in sequence, and printing the second conducting layer, the second electrode, the third electrode, the fourth electrode, the isolating layer, the sealing frame body and the conducting column on the surface of the lower substrate in sequence.
2. The 3D manufacturing method of the resistive touch screen according to claim 1, wherein the plurality of first conduction channels and the plurality of second conduction channels are cylinders, cuboids, or cubes, and are formed by laser processing or mechanical drilling.
3. The 3D manufacturing method of the resistive touch screen according to claim 1, wherein the first conductive layer and the second conductive layer are transparent conductive layers, and the structure of the transparent conductive layers is an ordered grid or an unordered grid, or a planar structure; the grid-shaped conducting layer is made of transparent conducting materials or non-transparent conducting materials; the planar structure conducting layer is made of transparent conducting materials.
4. The 3D manufacturing method of the resistive touch screen according to claim 3, wherein the transparent conductive layer comprises one or more of metal nanoparticles, metal quantum dots, metal oxides, graphene, carbon nanotubes, and metal nanowires.
5. The 3D manufacturing method of the resistive touch screen according to claim 1, wherein the first electrode, the second electrode, the third electrode and the fourth electrode are in a shape of a grid, a strip or a surface; the first electrode, the second electrode, the third electrode and the fourth electrode can be strip-shaped conductive layers formed by compounding one or two or more of metal nanoparticles, metal quantum dots, metal slurry and carbon slurry.
6. The 3D manufacturing method of a resistive touch screen according to claim 1, wherein the isolation layer is composed of a plurality of transparent isolation columns, the isolation columns are uniformly arranged from left to right in a horizontal direction at intervals to form a horizontal row, the isolation columns are uniformly arranged in a vertical direction at intervals to form a vertical column, the distance between adjacent isolation columns in the horizontal direction and the vertical direction is 1-100 mm, the height of each isolation column is 10-5000 microns, and the diameter of each isolation column is 10-3000 microns.
7. The 3D manufacturing method of the resistive touch screen according to claim 1, wherein the frame sealing body is made of opaque frame sealing glue, and the thickness of the frame sealing glue is greater than or equal to the height of the isolation pillars.
8. The 3D manufacturing method of a resistive touch screen according to claim 1, wherein the conductive pillar is a conductive layer formed by combining one or two or more of metal nanoparticles, metal quantum dots, metal paste, and carbon paste.
9. The 3D manufacturing method of the resistive touch screen according to claim 1, wherein the 3D printing method comprises stereolithography, selective laser sintering, fused deposition manufacturing, three-dimensional printing and inkjet printing.
10. The 3D method of claim 1, wherein one or more touch screen arrays are printed on a same substrate, and the touch screen arrays are separated by cutting.
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