CN104458370A - Method for preparing glow discharge mass spectrometer analysis test sample - Google Patents
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- 238000004458 analytical method Methods 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000843 powder Substances 0.000 claims abstract description 41
- 238000005245 sintering Methods 0.000 claims abstract description 24
- 238000002360 preparation method Methods 0.000 claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 13
- 239000010439 graphite Substances 0.000 claims abstract description 13
- 238000007514 turning Methods 0.000 claims abstract description 11
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 10
- 238000001036 glow-discharge mass spectrometry Methods 0.000 claims abstract description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 53
- 229910052707 ruthenium Inorganic materials 0.000 claims description 53
- 239000000523 sample Substances 0.000 claims description 53
- 238000004544 sputter deposition Methods 0.000 claims description 20
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052582 BN Inorganic materials 0.000 claims description 9
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical group [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- 239000000538 analytical sample Substances 0.000 claims description 7
- 238000007088 Archimedes method Methods 0.000 claims description 5
- 238000007731 hot pressing Methods 0.000 claims description 5
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 5
- 239000012498 ultrapure water Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 1
- 238000011156 evaluation Methods 0.000 claims 1
- 238000004506 ultrasonic cleaning Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 10
- 238000000465 moulding Methods 0.000 abstract description 3
- 239000003870 refractory metal Substances 0.000 abstract description 3
- 230000000052 comparative effect Effects 0.000 description 5
- 238000011109 contamination Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000007516 diamond turning Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005464 sample preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002490 spark plasma sintering Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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Abstract
本发明公开了一种辉光放电质谱仪分析试样的制备方法,其包括如下步骤:a)将需要分析的难熔金属粉末放置于内部涂有脱模剂的石墨模具中;b)使用加压烧结的方法对粉末进行成型;c)对成型的坯料进行车削。使用本发明的分析方法:在尽可能保持本身杂质含量的同时,具有较高的致密度,同时表面洁净,从而保证辉光放电质谱分析结果的准确性和精确度,同时本制备方法制备的样品还有分析速度快,效率高的优点。
The invention discloses a method for preparing an analysis sample of a glow discharge mass spectrometer, which comprises the following steps: a) placing the refractory metal powder to be analyzed in a graphite mold coated with a release agent; molding the powder by pressing and sintering; c) turning the formed blank. Using the analysis method of the present invention: while maintaining its own impurity content as much as possible, it has a higher density and a clean surface, thereby ensuring the accuracy and precision of the glow discharge mass spectrometry analysis results. At the same time, the sample prepared by this preparation method It also has the advantages of fast analysis speed and high efficiency.
Description
技术领域technical field
本发明涉及一种辉光放电质谱仪(GDMS)分析试样的制备方法。The invention relates to a method for preparing a sample analyzed by a glow discharge mass spectrometer (GDMS).
背景技术Background technique
当前很多高纯元素或合金的纯度分析中,需要用到辉光放电质谱仪(GDMS)。辉光放电质谱仪是一种能直接对固态导电样品进行杂质分析的仪器,其原理是辉光放电离子源利用惰性气体(一般为氩气)在上千伏特的电压下产生的离子撞击样品表面使之发生溅射,溅射产生的样品原子扩散至等离子体中进一步离子化,进而被质谱分析器收集检测。目前世界上主要在产和销售的辉光放电质谱仪是由美国Thermo Electron公司生产的Element GD型辉光放电质谱仪,该种设备能检测并定量分析固态样品中的几乎所有的元素,包括碳、氧和氮。很多元素可以精确到ppb(十亿分之一)以上的量级。In the purity analysis of many high-purity elements or alloys, a glow discharge mass spectrometer (GDMS) is required. Glow discharge mass spectrometer is an instrument that can directly analyze impurities in solid-state conductive samples. The principle is that the glow discharge ion source uses inert gas (usually argon) to produce ions at a voltage of thousands of volts to hit the surface of the sample. Sputtering occurs, and the sample atoms produced by sputtering diffuse into the plasma for further ionization, and then are collected and detected by a mass spectrometer. At present, the glow discharge mass spectrometer that is mainly produced and sold in the world is the Element GD glow discharge mass spectrometer produced by Thermo Electron Company of the United States. This kind of equipment can detect and quantitatively analyze almost all elements in solid samples, including carbon. , oxygen and nitrogen. Many elements can be accurate to more than ppb (parts per billion).
对于粉末样品来说,不能直接采用辉光放电质谱仪进行分析,必须将粉末制备成块体样品后才能进行分析。对辉光放电质谱仪分析用样品的要求包括高的致密度和洁净的表面。要求高的致密度的原因是避免因致密度低而导致样品不均匀剥离和样品中气体的释放对分析结果产生不良影响;同时,低致密度样品分解时也有对分析装置产生污染的风险。For powder samples, the glow discharge mass spectrometer cannot be used directly for analysis, and the powder must be prepared into a bulk sample before analysis. Requirements for samples analyzed by glow discharge mass spectrometers include high density and clean surfaces. The reason for requiring high density is to avoid adverse effects on the analysis results caused by uneven stripping of the sample due to low density and the release of gas in the sample; at the same time, there is also a risk of contamination of the analysis device when the low-density sample is decomposed.
通常,GDMS的试样前处理方法包括机械或电火花切割、机械打磨、酸溶解和清洗等步骤,但是在前处理的过程中,样品的表面往往容易引入杂质,尤其是Na、Fe、Ca等,为了消除制样带来的表面污染,通常需要进行时间为半个小时到一个小时不等的预溅射,以确保采集信号的准确性和稳定性。这种样品制备方法工艺比较复杂,且预溅射时间也较长,效率低下。此外,对于很多粉末样品,尤其是难熔金属,其体材料是高熔点难加工的材料,因此,如何制备满足分析要求的样品,且不改变样品本身的杂质含量,是辉光放电质谱仪样品分析过程当中常常遇到的问题。Usually, the sample pretreatment method of GDMS includes steps such as mechanical or electric discharge cutting, mechanical grinding, acid dissolution and cleaning, but in the process of pretreatment, the surface of the sample is often easy to introduce impurities, especially Na, Fe, Ca, etc. , in order to eliminate surface contamination caused by sample preparation, it is usually necessary to perform pre-sputtering for half an hour to an hour to ensure the accuracy and stability of the collected signal. The process of this sample preparation method is relatively complicated, and the pre-sputtering time is also long, and the efficiency is low. In addition, for many powder samples, especially refractory metals, the bulk material is a material with a high melting point and is difficult to process. Therefore, how to prepare a sample that meets the analysis requirements without changing the impurity content of the sample itself is an important issue for glow discharge mass spectrometer samples. Frequently encountered problems in the analysis process.
其中的一个例子是钌粉。高纯钌是在半导体、计算机硬盘等行业广泛应用的原料。因此,需要分析高纯度钌粉和钌块体中的杂质含量。由于钌难溶于酸的特性,使得采用ICP-MS等湿法分析方法成为不可能。因此,实际应用中通常采用辉光放电质谱仪来分析钌中的杂质含量。对于钌粉,在用辉光放电质谱仪分析钌之前需要制备高密度、高洁净度的钌样品。中国发明专利200610148577.2公开了一种钌分析试料的制作方法,该方法是在利用辉光放电质谱装置分析钌粉末的品味的工序中,使用材质为钇稳定氧化锆的冲压成型用的模具来模塑钌粉末,使用还原性气体的气氛中煅烧钌粉末,从而制备GDMS分析样品。这种方法制备的GDMS样品密度较低,影响样品分析结果的稳定性。同时,在还原性气氛中煅烧钌粉末,有可能在煅烧过程中将粉末中本来存在的部分元素被还原掉了,从而影响分析结果的准确性。因此,如何制备高密度、表面无污染的GDMS样品,提高分析的效率和准确性是急需解决的问题。An example of this is ruthenium powder. High-purity ruthenium is a raw material widely used in semiconductor, computer hard disk and other industries. Therefore, it is necessary to analyze the impurity content in high-purity ruthenium powder and ruthenium bulk. Due to the poor solubility of ruthenium in acid, it is impossible to use wet analysis methods such as ICP-MS. Therefore, in practical applications, a glow discharge mass spectrometer is usually used to analyze the impurity content in ruthenium. For ruthenium powder, it is necessary to prepare a high-density, high-clean ruthenium sample before analyzing ruthenium with a glow discharge mass spectrometer. Chinese invention patent 200610148577.2 discloses a method for making a ruthenium analysis sample. The method is to use a stamping mold made of yttrium-stabilized zirconia in the process of using a glow discharge mass spectrometer to analyze the quality of the ruthenium powder. Plastic ruthenium powder, use reducing gas atmosphere to calcinate ruthenium powder, so as to prepare GDMS analysis sample. The density of GDMS samples prepared by this method is low, which affects the stability of sample analysis results. At the same time, calcining ruthenium powder in a reducing atmosphere may reduce some elements originally present in the powder during the calcination process, thereby affecting the accuracy of the analysis results. Therefore, how to prepare high-density, surface-free GDMS samples and improve the efficiency and accuracy of analysis is an urgent problem to be solved.
发明内容Contents of the invention
本发明的目的在于提供一种辉光放电质谱仪(GDMS)分析试样的制备方法,所述的试样,在尽可能保持本身杂质含量的同时,具有较高的致密度,同时表面洁净,从而保证辉光放电质谱分析结果的准确性和精确度,同时本制备方法制备的样品还有分析速度快,效率高的优点。The object of the present invention is to provide a kind of preparation method of glow discharge mass spectrometer (GDMS) analysis sample, described sample, while keeping itself impurity content as far as possible, has higher compactness, and surface is clean simultaneously, Therefore, the accuracy and precision of the analysis results of the glow discharge mass spectrometry are guaranteed, and at the same time, the sample prepared by the preparation method has the advantages of fast analysis speed and high efficiency.
本发明的目的是这样实现的:The purpose of the present invention is achieved like this:
将需要分析的难熔金属粉末放置于内部涂有脱模剂的石墨模具中,使用加压烧结的方法对粉末Place the refractory metal powder to be analyzed in a graphite mold coated with a release agent, and use the method of pressure sintering to sinter the powder
进行成型;对成型的坯料进行车削。Forming; turning the formed blank.
使用脱模剂的原因在于一方面有助于成型后料坯从模具中脱出,另一方面也阻止了样品与模具The reason for using a release agent is that on the one hand, it helps the preform to come out of the mold after molding, and on the other hand, it also prevents the sample from contacting the mold.
产生化学反应,从而污染样品。A chemical reaction occurs that contaminates the sample.
优选的,所述的脱模剂为氧化铝、氧化锆、或氮化硼,采用这些脱模剂,能很容易的将粉末样Preferably, the release agent is aluminum oxide, zirconia, or boron nitride. Using these release agents, the powder sample can be easily
品从石墨模具中脱出。The product comes out of the graphite mold.
优选的,所述的加压烧结方法包括真空热压、放电等离子体烧结和直流加热烧结。Preferably, the pressure sintering method includes vacuum hot pressing, discharge plasma sintering and direct current heating sintering.
优选的,所述的车削采用金刚石刀具、硬质合金刀具或立方氮化硼刀具,选择这些刀具的原因Preferably, the turning uses a diamond tool, a carbide tool or a cubic boron nitride tool, the reason for choosing these tools
在于,这些刀具具有较高的硬度,不仅能保证对试样的车削,还不会再样品表面产生残留。The reason is that these tools have high hardness, which not only can ensure the turning of the sample, but also will not leave residue on the surface of the sample.
优选的,所述的粉末是钌粉。Preferably, the powder is ruthenium powder.
本发明通过加压烧结的工艺,制备出了致密度在95%以上的分析料坯,通过对分析料坯进行车削表面处理,使分析料坯的表面具有良好的表面洁净度;同时,使用加压烧结加机械加工的制备方法,制备过程不会带入或减少任何杂质,保证了样品用于辉光放电质谱分析的结果的准确性和精确度。因此制备的分析试样具有致密度高,表面洁净等特点,从而保证辉光放电质谱分析结果的准确性和精确度,同时本制备方法制备的样品还有分析速度快,效率高的优点。The present invention prepares an analysis blank with a density of more than 95% through the process of pressurized sintering, and makes the surface of the analysis blank have a good surface cleanliness by performing turning surface treatment on the analysis blank; at the same time, using The preparation method of pressure sintering plus mechanical processing will not bring or reduce any impurities during the preparation process, which ensures the accuracy and precision of the results of the sample used for glow discharge mass spectrometry analysis. Therefore, the prepared analysis sample has the characteristics of high density and clean surface, so as to ensure the accuracy and precision of the analysis results of glow discharge mass spectrometry. At the same time, the sample prepared by this preparation method has the advantages of fast analysis speed and high efficiency.
附图说明Description of drawings
图1是本发明的实施例的流程图。Figure 1 is a flowchart of an embodiment of the present invention.
图2是实施例1中Fe、Ca、Na含量与溅射时间的关系。Fig. 2 is the relation of Fe, Ca, Na content and sputtering time in embodiment 1.
具体实施方式Detailed ways
下面结合附图对本发明作进一步的说明,但不以任何方式对本发明加以限制,基于本发明教导所作的任何变更或改进,均属于本发明的保护范围。The present invention will be further described below in conjunction with the accompanying drawings, but the present invention is not limited in any way. Any changes or improvements made based on the teaching of the present invention belong to the protection scope of the present invention.
首先,提供需要分析的粉末,比如钌粉。将粉末装填于内部涂有脱模剂的石墨模具中,使用加压烧结的方法对粉末进行成型;对成型的坯料进行车削。First, provide the powder to be analyzed, such as ruthenium powder. The powder is filled in a graphite mold coated with a release agent, and the powder is formed by pressure sintering; the formed blank is turned.
优选的,所述的脱模剂为氧化铝、氧化锆、或氮化硼。使用脱模剂的原因在于一方面有助于成型后料坯从模具中脱出,另一方面也阻止了样品与模具产生化学反应,从而污染样品。Preferably, the release agent is alumina, zirconia, or boron nitride. The reason for using a release agent is that on the one hand, it helps the preform to escape from the mold after molding, and on the other hand, it also prevents the sample from chemically reacting with the mold, thereby contaminating the sample.
所述的加压烧结方法包括真空热压、放电等离子体烧结和直流加热烧结。加压烧结的优点在于一方面能提高试样的密度,同时由于烧结过程处于真空状态,避免了外界的污染,同时能保持粉末原有的杂质不发生变化。The pressure sintering method includes vacuum hot pressing, discharge plasma sintering and direct current heating sintering. The advantage of pressure sintering is that on the one hand, it can increase the density of the sample, and at the same time, because the sintering process is in a vacuum state, it avoids external pollution, and at the same time, it can keep the original impurities of the powder unchanged.
优选的,所述的车削采用金刚石刀具、硬质合金刀具或立方氮化硼刀具,选择这些刀具的原因Preferably, the turning uses a diamond tool, a carbide tool or a cubic boron nitride tool, the reason for choosing these tools
在于,这些刀具具有较高的硬度,不仅能保证对试样的车削,还不会在样品表面产生残留。The reason is that these tools have high hardness, which can not only ensure the turning of the sample, but also will not produce residue on the surface of the sample.
优选的,所述的粉末是钌粉。Preferably, the powder is ruthenium powder.
下面结合具体实施例对本发明中用于辉光放电质谱仪分析用分析样品的制备方法进行具体说明。The preparation method of the analytical sample used in the analysis of the glow discharge mass spectrometer in the present invention will be specifically described below in conjunction with specific examples.
实施例1将待分析的钌粉装入涂有氧化铝的石墨模具当中,石墨模具的内径为30mm,采用真空热压的方法,在1300℃的温度下将钌粉加压烧结,所施加的压力为40MPa。烧结完成后采用阿基米德法对所得钌块测密度,可达钌理论密度的99%。采用聚晶立方氮化硼车刀将钌块车削成直径为28mm的钌样品。分别用丙酮、乙醇和超纯水对钌样品进行超声清洗,并烘干。将样品放入ElementGD块状样品台中,并进行一定时间的预溅射,以容易污染的Na、Fe、Ca为标的,以浓度基本稳定时开始采集数据,记录预溅射的时间,同时采集部分典型元素的五组数据,并计算其相对标准误差(RSD%),以此来评价分析结果的重复性。其结果如表1和表2所示。从表1和表2可以看出,本实施例中制备的样品的预溅射时间为10分钟,表面较洁净。同时典型元素含量的RSD%均小于7.5%,具有较好的分析重复性。Example 1 Put the ruthenium powder to be analyzed into a graphite mold coated with alumina. The inner diameter of the graphite mold is 30 mm. The ruthenium powder is pressurized and sintered at a temperature of 1300° C. by vacuum hot pressing, and the applied The pressure is 40MPa. After the sintering is completed, the density of the obtained ruthenium block is measured by the Archimedes method, which can reach 99% of the theoretical density of ruthenium. A polycrystalline cubic boron nitride turning tool was used to turn the ruthenium block into a ruthenium sample with a diameter of 28 mm. The ruthenium samples were ultrasonically cleaned with acetone, ethanol and ultrapure water, and dried. Put the sample into the ElementGD block sample stage, and carry out pre-sputtering for a certain period of time, with easily polluted Na, Fe, Ca as the target, start to collect data when the concentration is basically stable, record the time of pre-sputtering, and collect part of it at the same time Five sets of data of typical elements, and calculate the relative standard error (RSD%), in order to evaluate the repeatability of the analysis results. The results are shown in Table 1 and Table 2. It can be seen from Table 1 and Table 2 that the pre-sputtering time of the sample prepared in this embodiment is 10 minutes, and the surface is relatively clean. At the same time, the RSD% of the typical element content is less than 7.5%, which has good analysis repeatability.
实施例2Example 2
将待分析的钌粉装入涂有氧化锆的石墨模具当中,石墨模具的内径为30mm,采用放电等离子体烧结的方法,在1000℃的温度下将钌粉加压烧结,所施加的压力为20MPa。烧结完成后采用阿基米德法对所得钌块测密度,可达钌理论密度的95%。采用硬质合金车刀将钌块车削成直径为28mm的钌样品。分别用丙酮、乙醇和超纯水对钌样品进行超声清洗,并烘干。将样品放入Element GD块状样品台中,并进行一定时间的预溅射。以容易污染的Na、Fe、Ca为标的,以其浓度基本稳定时开始采集数据,记录预溅射的时间,同时采集部分典型元素的五组数据,并计算其相对标准误差(RSD%),以此来评价分析结果的重复性。其结果如表1和表2所示。表1和表2可以看出,本实施例中制备的样品的预溅射时间为8分钟,表面较洁净。同时典型元素含量的RSD%均小于8.4%,具有较好的分析重复性。Put the ruthenium powder to be analyzed into a graphite mold coated with zirconia. The inner diameter of the graphite mold is 30mm. The ruthenium powder is pressure-sintered at a temperature of 1000°C by spark plasma sintering. The applied pressure is 20MPa. After the sintering is completed, the density of the obtained ruthenium block is measured by the Archimedes method, which can reach 95% of the theoretical density of ruthenium. The ruthenium block was turned into a ruthenium sample with a diameter of 28 mm using a cemented carbide turning tool. The ruthenium samples were ultrasonically cleaned with acetone, ethanol and ultrapure water, and dried. Put the sample into the Element GD block sample stage and perform pre-sputtering for a certain period of time. Taking easily polluted Na, Fe, Ca as the target, start collecting data when its concentration is basically stable, record the time of pre-sputtering, and collect five sets of data of some typical elements at the same time, and calculate their relative standard error (RSD%), This was used to evaluate the repeatability of the analysis results. The results are shown in Table 1 and Table 2. It can be seen from Table 1 and Table 2 that the pre-sputtering time of the sample prepared in this embodiment is 8 minutes, and the surface is relatively clean. At the same time, the RSD% of the typical element content is less than 8.4%, which has good analysis repeatability.
实施例3Example 3
将待分析的钌粉装入涂有氮化硼的石墨模具当中,石墨模具的内径为30mm,采用直流加热烧结的方法,在1200的温度下将钌粉加压烧结,所施加的压力为30MPa。烧结完成后采用阿基米德法对所得钌块测密度,可达钌理论密度的97%。采用金刚石车刀将钌块车削成直径为28mm的钌样品。分别用丙酮、乙醇和超纯水对钌样品进行超声清洗,并烘干。将样品放入Element GD块状样品台中,并进行一定时间的预溅射。以容易污染的Na、Fe、Ca为标的,以其浓度基本稳定时开始采集数据,记录预溅射的时间,同时采集部分典型元素的五组数据,并计算其相对标准误差(RSD%),以此来评价分析结果的重复性。其结果如表1和表2所示。表1和表2可以看出,本实施例中制备的样品的预溅射时间为10分钟,表面较洁净。同时典型元素含量的RSD%均小于7.2%,具有较好的分析重复性。Put the ruthenium powder to be analyzed into a graphite mold coated with boron nitride. The inner diameter of the graphite mold is 30 mm. The ruthenium powder is pressure sintered at a temperature of 1200 by direct current heating and sintering, and the applied pressure is 30 MPa. . After the sintering is completed, the density of the obtained ruthenium block is measured by the Archimedes method, which can reach 97% of the theoretical density of ruthenium. A diamond turning tool was used to turn the ruthenium block into a ruthenium sample with a diameter of 28 mm. The ruthenium samples were ultrasonically cleaned with acetone, ethanol and ultrapure water, and dried. Put the sample into the Element GD block sample stage and perform pre-sputtering for a certain period of time. Taking easily polluted Na, Fe, Ca as the target, start collecting data when its concentration is basically stable, record the time of pre-sputtering, and collect five sets of data of some typical elements at the same time, and calculate their relative standard error (RSD%), This was used to evaluate the repeatability of the analysis results. The results are shown in Table 1 and Table 2. It can be seen from Table 1 and Table 2 that the pre-sputtering time of the sample prepared in this embodiment is 10 minutes, and the surface is relatively clean. At the same time, the RSD% of the typical element content is less than 7.2%, which has good analysis repeatability.
比较例1Comparative example 1
将待分析的钌粉装入钇稳定氧化锆模具当中,模具的内径为30mm,采用普通烧结的方法,在1000的温度下将钌粉烧结。烧结完成后采用阿基米德法对所得钌块测密度,可达钌理论密度的80%。分别用丙酮、乙醇和超纯水对钌样品进行超声清洗,并烘干。将样品放入Element GD块状样品台中,并进行一定时间的预溅射。以容易污染的Na、Fe、Ca为标的,以其浓度基本稳定时开始采集数据,记录预溅射的时间,同时采集部分典型元素的五组数据,并计算其相对标准误差(RSD%),以此来评价分析结果的重复性。其结果如表1和表2所示。表1和表2可以看出,比较例1中制备的样品的预溅射时间为24分钟,制样过程可能存在污染。同时典型元素含量的最大RSD%为11.8%,其分析重复性与比较例相比较差。Put the ruthenium powder to be analyzed into the yttrium-stabilized zirconia mold, the inner diameter of the mold is 30 mm, and sinter the ruthenium powder at a temperature of 1000 by using the common sintering method. After the sintering is completed, the density of the obtained ruthenium block is measured by the Archimedes method, which can reach 80% of the theoretical density of ruthenium. The ruthenium samples were ultrasonically cleaned with acetone, ethanol and ultrapure water, and dried. Put the sample into the Element GD block sample stage and perform pre-sputtering for a certain period of time. Taking easily polluted Na, Fe, Ca as the target, start collecting data when its concentration is basically stable, record the time of pre-sputtering, and collect five sets of data of some typical elements at the same time, and calculate their relative standard error (RSD%), This was used to evaluate the repeatability of the analysis results. The results are shown in Table 1 and Table 2. It can be seen from Table 1 and Table 2 that the pre-sputtering time of the sample prepared in Comparative Example 1 is 24 minutes, and there may be contamination in the sample preparation process. At the same time, the maximum RSD% of the typical element content is 11.8%, and its analytical repeatability is worse than that of the comparative example.
表1在实施例及比较例中所测钌粉的杂质含量及相应标准差The impurity content and corresponding standard deviation of measured ruthenium powder in embodiment and comparative example in table 1
表2实施例及比较例预溅射时间及标准偏差统计数据Table 2 embodiment and comparative example pre-sputtering time and standard deviation statistical data
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