CN104451596A - Composite material based on diamond crystals and preparation method of composite material - Google Patents
Composite material based on diamond crystals and preparation method of composite material Download PDFInfo
- Publication number
- CN104451596A CN104451596A CN201410638045.1A CN201410638045A CN104451596A CN 104451596 A CN104451596 A CN 104451596A CN 201410638045 A CN201410638045 A CN 201410638045A CN 104451596 A CN104451596 A CN 104451596A
- Authority
- CN
- China
- Prior art keywords
- diamond
- barrier layer
- preparation
- matrix material
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910003460 diamond Inorganic materials 0.000 title claims abstract 24
- 239000010432 diamond Substances 0.000 title claims abstract 24
- 239000013078 crystal Substances 0.000 title claims abstract 19
- 238000002360 preparation method Methods 0.000 title claims abstract 13
- 239000002131 composite material Substances 0.000 title abstract 3
- 230000004888 barrier function Effects 0.000 claims abstract 13
- 238000000576 coating method Methods 0.000 claims abstract 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract 5
- 229920000049 Carbon (fiber) Polymers 0.000 claims abstract 4
- 239000004917 carbon fiber Substances 0.000 claims abstract 4
- 239000002041 carbon nanotube Substances 0.000 claims abstract 3
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract 3
- 238000000151 deposition Methods 0.000 claims abstract 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract 3
- 238000010899 nucleation Methods 0.000 claims abstract 3
- 230000006911 nucleation Effects 0.000 claims abstract 3
- 239000011159 matrix material Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 3
- 230000008021 deposition Effects 0.000 claims 2
- 239000002113 nanodiamond Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000376 reactant Substances 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract 3
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 239000002070 nanowire Substances 0.000 abstract 2
- 238000010900 secondary nucleation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
技术领域technical field
本发明属于复合材料技术领域,具体涉及一种基于金刚石晶体的复合材料及其制备方法。The invention belongs to the technical field of composite materials, and in particular relates to a diamond crystal-based composite material and a preparation method thereof.
背景技术Background technique
碳纳米管以及碳纤维材料具有一系列与众不同的属性,如机械强度高,韧性优良和导电性强等。另一方面,众所周知金刚石有特殊的物理性质,如高硬度,被广泛应用于耐磨硬质涂层、切割及抛光工具。尽管金刚石薄膜硬度很高,但是韧性低,有机械脆性。碳纳米管和/或碳纤维和金刚石的复合物通过相互的补充,实现非常适合用于制造同时具有优良的机械性能,导电性和热性能的材料,因此具有很高的使用价值。复合物材料中金刚石包覆碳纳米管和/或碳纤维纱线从综合性能,以及生产效率和成本上均具有很高的使用价值。Carbon nanotubes and carbon fiber materials have a series of distinctive properties, such as high mechanical strength, excellent toughness and strong electrical conductivity. On the other hand, it is well known that diamond has special physical properties, such as high hardness, and is widely used in wear-resistant hard coatings, cutting and polishing tools. Although the diamond film has high hardness, it has low toughness and mechanical brittleness. The composite of carbon nanotubes and/or carbon fibers and diamond is very suitable for manufacturing materials with excellent mechanical properties, electrical conductivity and thermal properties through mutual complementarity, so it has high use value. Diamond-coated carbon nanotubes and/or carbon fiber yarns in composite materials have high use value in terms of comprehensive performance, production efficiency and cost.
而现有制备金刚石涂层的方法中,通常是利用沉积化学气相沉积(CVD),在强的富氢等离子体、温度高于700℃条件下进行,氢作为催化剂促进碳的SP3杂化键的形成,破坏SP2杂化键的形成。但是这种环境也会对同样是SP2键的碳纳米管/碳纤维造成破坏,从而降低碳纳米管和/或碳纤维的质量。In the existing methods for preparing diamond coatings, deposition chemical vapor deposition (CVD) is usually carried out under conditions of strong hydrogen-rich plasma and a temperature higher than 700 ° C. Hydrogen acts as a catalyst to promote the formation of SP3 hybrid bonds of carbon. Formation, destruction of SP2 hybrid bond formation. But this environment can also cause damage to the carbon nanotubes/carbon fibers that are also SP2 bonds, thereby reducing the quality of the carbon nanotubes and/or carbon fibers.
为了弥补传统的化学气相沉积法制备存在上述不足的情形,M.Terranova(Chemistry of Materials 17.2005.3214)等人利用热丝化学气相沉积(HFCVD)装置,以铁为催化剂涂覆在硅衬底上,在氩氛围中用碳纳米粒子流一步合成出碳纳米管和金刚石纳米晶,实现金刚石纳米晶颗粒在单壁碳纳米管束上的生长。N.Shankar(Diamond Related Matter,17.2008,PP.79一83,)等人先在硅基底上分散多壁碳纳米管,然后用热丝化学气相沉积(HFCVD)装置使金刚石沉积在这个结构上,成功生长出了碳纳米管/金刚石复合材料。他们发现在金刚石生长的典型沉积条件下,即1%甲烷和99%氢气,碳纳米管被破坏。然而增加甲烷流量至2%-5%,即降低氢气部分刻蚀作用,他们发现碳纳米管没有被刻蚀,金刚石能够在碳纳米管上形核和生长。然而,降低了刻蚀活性会对金刚石粒子的表面形貌产生负面作用,使它的微晶结构变成“菜花”形貌,即许多纳米尺寸(100—400nm)的金刚石颗粒在碳纳米管上随机形核,生长。In order to make up for the above shortcomings of the traditional chemical vapor deposition method, M. Terranova (Chemistry of Materials 17.2005.3214) et al. used a hot wire chemical vapor deposition (HFCVD) device to coat iron as a catalyst on a silicon substrate. , using carbon nanoparticle flow in an argon atmosphere to synthesize carbon nanotubes and diamond nanocrystals in one step, and realize the growth of diamond nanocrystal particles on single-walled carbon nanotube bundles. N. Shankar (Diamond Related Matter, 17.2008, PP.79-83,) and others first dispersed multi-walled carbon nanotubes on a silicon substrate, and then deposited diamond on this structure with a hot wire chemical vapor deposition (HFCVD) device. A carbon nanotube/diamond composite was successfully grown. They found that under typical deposition conditions for diamond growth, 1% methane and 99% hydrogen, the carbon nanotubes were destroyed. However, increasing the methane flow rate to 2%-5%, that is, reducing the partial etching effect of hydrogen, they found that the carbon nanotubes were not etched, and diamond could nucleate and grow on the carbon nanotubes. However, reducing the etching activity will have a negative effect on the surface morphology of diamond particles, making its microcrystalline structure into a "cauliflower" morphology, that is, many nanometer-sized (100-400nm) diamond particles on carbon nanotubes. Random nucleation, growth.
采用上述方法制备得到的金刚石包覆碳纳米管和/或碳纤维材料,其碳纳米管的质量、金刚石的质量或者二者质量仍会受损。同时在Terranova等人和Shankar等人所做的两项工作中,所形成的金刚石是极小的纳米晶组成的单一晶体,没有微晶金刚石的形成,并且进一步复合过程只能在一个狭窄的参数窗口进行,在合成不同类型或结构的复合材料方面的灵活性非常小,在应用中仍然存在缺陷。For the diamond-coated carbon nanotube and/or carbon fiber material prepared by the above method, the quality of the carbon nanotube, the diamond or both will still be damaged. At the same time, in the two works done by Terranova et al. and Shankar et al., the formed diamond is a single crystal composed of extremely small nanocrystals, without the formation of microcrystalline diamond, and the further recombination process can only be performed within a narrow parameter window, there is very little flexibility in synthesizing composites of different types or structures, and there are still drawbacks in application.
发明内容Contents of the invention
本发明实施例的目的在于克服现有技术的上述不足,提供一种可以实现高质量的金刚石晶体牢固地附着在碳纳米管或者碳纤维表面上,同时又不会损伤质量的碳纳米管线和金刚石晶体复合材料及其制备方法。The purpose of the embodiments of the present invention is to overcome the above-mentioned deficiencies in the prior art, and provide a carbon nanotube wire and diamond crystal that can achieve high-quality diamond crystals firmly attached to the surface of carbon nanotubes or carbon fibers without damaging the quality. Composite materials and methods for their preparation.
为了实现上述发明目的,本发明实施例的技术方案如下:In order to achieve the above-mentioned purpose of the invention, the technical solutions of the embodiments of the present invention are as follows:
一种基于金刚石晶体的复合材料的制备方法,包括如下步骤:A method for preparing a composite material based on diamond crystals, comprising the steps of:
在碳纳米管和/或碳纤维的表面上形成阻隔层;forming a barrier layer on the surface of the carbon nanotubes and/or carbon fibers;
在所述阻隔层上形成用于引导金刚石晶体沉积的形核位点;forming nucleation sites for directing deposition of diamond crystals on said barrier layer;
在所述阻隔层上沉积金刚石涂层。A diamond coating is deposited on the barrier layer.
采用本发明的上述制备方法,通过阻隔层可以在不破坏碳纳米线或者碳纤维的情况下在其上面涂覆高质量金刚石晶体,并且还可以使金刚石晶体与碳纳米线或者碳纤维之间有非常高的结合力;同时通过形核位点引导金刚石涂层的沉积,防止发生二次形核的现象导致降低金刚石的涂层的品质的问题。Using the above-mentioned preparation method of the present invention, the carbon nanowire or carbon fiber can be coated with high-quality diamond crystals without damaging the carbon nanowire or carbon fiber through the barrier layer, and the gap between the diamond crystal and the carbon nanowire or carbon fiber can also be very high. At the same time, the deposition of the diamond coating is guided through the nucleation site to prevent the phenomenon of secondary nucleation from reducing the quality of the diamond coating.
本发明进一步还保护按照上述方法制备得到的基于金刚石晶体的复合材料,以及由该复合材料制备的微米级线锯。The present invention further protects the diamond crystal-based composite material prepared according to the above method, and the micron-scale wire saw prepared from the composite material.
本发明制备得到的上述基于金刚石晶体的复合材料,可以实现高质量的金刚石晶体牢固地附着在碳纳米管或者碳纤维表面上,或者二者形成的结构上而又不会损伤碳纳米管和碳纤维,品质相比现有的复合材料大大提升。同时制备得到的微米级线锯,与现有方法制造的金刚石线锯相比,本发明中制备得到的线锯直径在20微米左右,而现有做法中线锯的直径都在1毫米以上;因此本发明不仅降低了线锯的制造成本,同时在应用方面,例如在硅片的切割方面,可以实现无锯末切割,平均可以节省约三分之一的硅片材料成本,可以极大地降低硅基器件材料(如太阳能光伏电池板)的成本。The above diamond crystal-based composite material prepared by the present invention can achieve high-quality diamond crystals firmly attached to the surface of carbon nanotubes or carbon fibers, or on the structure formed by the two without damaging the carbon nanotubes and carbon fibers. Compared with the existing composite materials, the quality is greatly improved. The micron wire saw that prepares simultaneously, compares with the diamond wire saw that existing method makes, and the diameter of the wire saw that prepares in the present invention is about 20 microns, and the diameter of wire saw in existing practice is all more than 1 millimeter; Therefore The invention not only reduces the manufacturing cost of the wire saw, but also in terms of application, such as cutting of silicon wafers, can realize sawdust-free cutting, can save about one-third of the cost of silicon wafer materials on average, and can greatly reduce the cost of silicon substrates. The cost of device materials such as solar photovoltaic panels.
附图说明Description of drawings
下面将结合附图及实施例对本发明作进一步说明,附图中:The present invention will be further described below in conjunction with accompanying drawing and embodiment, in the accompanying drawing:
图1为本发明实施例基于金刚石晶体的复合材料制备方法示意图;1 is a schematic diagram of a method for preparing a composite material based on diamond crystals according to an embodiment of the present invention;
图2为本发明实施例碳纳米管阵列上制备金刚石涂层的形态变化示意图。Fig. 2 is a schematic diagram of the morphological change of a diamond coating prepared on a carbon nanotube array according to an embodiment of the present invention.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
本发明实施例提供一种基于金刚石晶体的复合材料制备方法,如图1所示,包括如下步骤:The embodiment of the present invention provides a method for preparing a composite material based on diamond crystals, as shown in Figure 1, comprising the following steps:
S10,在碳纳米管和/或碳纤维的表面上形成阻隔层;S10, forming a barrier layer on the surface of carbon nanotubes and/or carbon fibers;
S20,在阻隔层上形成用于引导金刚石晶体沉积的形核位点;S20, forming nucleation sites for guiding diamond crystal deposition on the barrier layer;
S30,在阻隔层上沉积金刚石涂层。S30, depositing a diamond coating on the barrier layer.
本发明的上述方法中,步骤S10中首先采用在复合材料的制备过程中在碳纳米管和/或碳纤维的表面先形成一阻隔层,其目的是在后续金刚石的沉积过程中,保护碳纳米管和/或碳纤维结构不受用于形成高质量金刚石所需的活性气体和温度的影响。其中,这一措施的优势是没有采用折中的CNT和金刚石生长参数,可以自由选择金刚石晶体沉积的过程条件来获得高质量金刚石晶体,而不用考虑必需的活性气体氛围会产生损伤碳纳米管和/或碳纤维结构的影响。同时,阻隔层也可以支撑金刚石形核或者作为粘附促进剂允许金刚石和碳纳米管和/或碳纤维间有更大的负荷转移。因此,大大提升了复合材料制备过程中的灵活性。In the above method of the present invention, in step S10, a barrier layer is first formed on the surface of carbon nanotubes and/or carbon fibers during the preparation of the composite material, the purpose of which is to protect the carbon nanotubes during the subsequent diamond deposition process. And/or carbon fiber structures are not affected by the reactive gases and temperatures required to form high quality diamond. Among them, the advantage of this measure is that no compromise between CNT and diamond growth parameters is used, and the process conditions of diamond crystal deposition can be freely selected to obtain high-quality diamond crystals, regardless of the necessary active gas atmosphere that will damage carbon nanotubes and / or the effect of carbon fiber structure. At the same time, the barrier layer can also support diamond nucleation or act as an adhesion promoter to allow greater load transfer between diamond and carbon nanotubes and/or carbon fibers. Therefore, the flexibility in the preparation process of composite materials is greatly improved.
其中,基于上述要求和条件,对于阻隔层要求是能实现保护碳纳米管和/或碳纤维结构抵抗在金刚石沉积过程中恶劣条件的功能;因此阻隔层的材质选择,在满足上述条件下理论上本领技术人员皆可常识采用。进一步在本发明中,为了保证结合强度等品质,阻隔层采用无定形的硅基缓冲膜,它是以四甲基硅烷和氧作为前体,通过电感耦合PECVD过程沉积得到的几纳米厚度的薄层;或者阻隔层采用一层无定形氧化硅或碳化硅,性能和使用效果上能最大限度地满足中对于品质的要求。同时,为了达到所需的保护作用,要求阻隔层以最小厚度包覆在碳纳米管和/或碳纤维上或者碳纳米管和/或碳纤维复合物的结构上,通常要求这种阻隔层的厚度小于100nm。实施过程中出于金刚石沉积的品质,首选的阻隔层厚度小于20nm,更加优选的厚度小于10nm或者仅仅只有几纳米。Among them, based on the above requirements and conditions, the requirement for the barrier layer is to realize the function of protecting the carbon nanotube and/or carbon fiber structure against the harsh conditions in the diamond deposition process; therefore, the material selection of the barrier layer should theoretically be able to meet the above conditions. All technicians can use common sense. Further in the present invention, in order to ensure quality such as bonding strength, the barrier layer adopts an amorphous silicon-based buffer film, which uses tetramethylsilane and oxygen as precursors, and is deposited by an inductively coupled PECVD process with a thickness of several nanometers. layer; or the barrier layer adopts a layer of amorphous silicon oxide or silicon carbide, which can meet the quality requirements of China in terms of performance and use effect. At the same time, in order to achieve the desired protective effect, the barrier layer is required to be coated on the carbon nanotube and/or carbon fiber or the structure of the carbon nanotube and/or carbon fiber composite with a minimum thickness, and the thickness of the barrier layer is generally required to be less than 100nm. Due to the quality of diamond deposition during implementation, the preferred thickness of the barrier layer is less than 20 nm, more preferably less than 10 nm or only a few nanometers.
同时,该阻隔层的形成优选采用电容耦合等离子体化学气相沉积法实现,在高频或直流电场作用下,源气体电离形成等离子体,利用低温等离子体作为能量源,通入适量的阻隔层材料的反应气体,利用等离子体放电,使阻隔层材料的反应气体激活并实现化学气相沉积。采用该方法可以促进阻隔层材料的反应气体分子的化学键断裂和重新组合,生成活性更高的化学基团,增强结合性;同时整个反应体系却保持较低的温度,避免对碳纤维/碳纳米管产生影响。At the same time, the formation of the barrier layer is preferably realized by capacitively coupled plasma chemical vapor deposition method. Under the action of high frequency or DC electric field, the source gas is ionized to form plasma, and the low temperature plasma is used as the energy source to introduce an appropriate amount of barrier layer material The reactive gas of the barrier layer material is activated by plasma discharge to realize chemical vapor deposition. This method can promote the breakage and recombination of the chemical bonds of the reactive gas molecules of the barrier layer material, generate more active chemical groups, and enhance the binding; at the same time, the entire reaction system maintains a lower temperature to avoid damage to carbon fibers/carbon nanotubes. make an impact.
进一步在步骤S10之后,步骤S20中采用在阻隔层的表面上形成用于引导金刚石晶体沉积的形核位点,从而在沉积的过程中引导在最初形核位点促进晶粒生长,防止发生二次形核的现象导致降低金刚石的涂层的品质。Further after step S10, in step S20, a nucleation site for guiding diamond crystal deposition is formed on the surface of the barrier layer, so as to guide the initial nucleation site to promote grain growth during the deposition process and prevent secondary diamond crystals from occurring. The phenomenon of secondary nucleation leads to a reduction in the quality of the diamond coating.
在该步骤S20中,该引导的形核位点可以简单的采用纳米金刚石籽晶即可实现,在沉积过程中作为引导晶核,引导金刚石涂层的沉积和增长。形成该形核位点的方式,在发明实施过程中,可以采用过偏压增强成核的办法进行,或者将镀有硅基薄膜阻隔层的碳纳米管和/或碳纤维浸没在悬浮着纳米金刚石微粒的乙醇溶液中用超声浴方法种上金刚石籽晶,皆可;技术人员可以根据制备条件和效果进行选择,在此不做限定。In the step S20, the guided nucleation sites can be realized simply by using nano-diamond seed crystals, which serve as guiding crystal nuclei during the deposition process to guide the deposition and growth of the diamond coating. The way to form the nucleation site, in the implementation of the invention, can be carried out by using overbias to enhance the nucleation method, or immerse the carbon nanotubes and/or carbon fibers coated with a silicon-based thin film barrier layer in the suspended nano-diamond Diamond seed crystals can be planted in the ethanol solution of the microparticles by means of an ultrasonic bath; technicians can choose according to the preparation conditions and effects, and there is no limitation here.
最后步骤S30中进行金刚石沉积的步骤,在碳纳米管和/或碳纤维的阻隔层上形成金刚石涂层。该过程可以采用化学气相沉积,在有利于碳的SP3杂化键生成的反应气体氛围下,在碳纳米管/碳纤维或碳纳米管碳纤维复合物上的阻隔层上实现金刚石晶体的沉积或合成;或者也可以采用其他涂层技术进行,均可。In the last step S30, a diamond deposition step is performed to form a diamond coating on the barrier layer of carbon nanotubes and/or carbon fibers. This process can use chemical vapor deposition to realize the deposition or synthesis of diamond crystals on the barrier layer on the carbon nanotube/carbon fiber or carbon nanotube carbon fiber composite under the reaction gas atmosphere that is conducive to the formation of SP3 hybrid bonds of carbon; Alternatively, other coating techniques can also be used.
进一步在本发明中为了避免涂层步骤损伤碳纳米管和/或碳纤维,优先选用等离子体加强化学气相沉积(PECVD)来实现碳纳米管/碳纤维或者碳纳米管/碳纤维结构的涂层。同时在实施过程中,更保证高质量金刚石晶体在最初形核位点促进晶粒生长,而没有二次形核发生。等离子体加强的反应性气体气氛中利用超过98%的氢气产生强烈的富氢等离子体环境,能最终形成一个由金刚石颗粒完整包覆封闭的碳纳米管和/或碳纤维结构。当然,为了避免涂层步骤损伤碳纳米管和/或碳纤维,PECVD过程应在低压、适中温度下进行。Further in the present invention, in order to avoid damage to carbon nanotubes and/or carbon fibers during the coating step, plasma-enhanced chemical vapor deposition (PECVD) is preferably used to coat carbon nanotubes/carbon fibers or carbon nanotubes/carbon fibers. At the same time, in the implementation process, it is more guaranteed that high-quality diamond crystals promote grain growth at the initial nucleation site without secondary nucleation. In the plasma-enhanced reactive gas atmosphere, more than 98% hydrogen is used to generate a strong hydrogen-rich plasma environment, which can finally form a carbon nanotube and/or carbon fiber structure completely covered and closed by diamond particles. Of course, in order to avoid damaging the carbon nanotubes and/or carbon fibers during the coating step, the PECVD process should be performed at low pressure and moderate temperature.
在带有阻隔层的碳纳米管/碳纤维或者碳纳米管/碳纤维结构上沉积金刚石晶体的步骤中,可以优先选用微波类化学气相沉积法。沉积高质量金刚石过程中,选用的反应气体氛围可能包括任何利于金刚石沉积的气体成分,而不应包含能产生二次成核的气体成分。比如,反应气体包括超过98%的氢气和少于2%的甲烷,避免诱导产生二次成核。同时在这个过程中,为了实现在碳纳米管/碳纤维或者其结构上获得高质量金刚石层,应选择合适的温度和压强,在本发明实施中根据阻隔层厚度,以及所需形成金刚石体层晶晶型品质控制,优选压力低于100hPa,温度高于700℃。In the step of depositing diamond crystals on the carbon nanotube/carbon fiber or carbon nanotube/carbon fiber structure with a barrier layer, a microwave-like chemical vapor deposition method can be preferably used. In the process of depositing high-quality diamond, the selected reaction gas atmosphere may include any gas components that are conducive to diamond deposition, and should not contain gas components that can produce secondary nucleation. For example, the reaction gas contains more than 98% hydrogen and less than 2% methane, avoiding the induction of secondary nucleation. Simultaneously in this process, in order to realize obtaining high-quality diamond layer on carbon nanotube/carbon fiber or its structure, should select suitable temperature and pressure, according to barrier layer thickness in the present invention's implementation, and required formation diamond body layer crystal For crystal quality control, the preferred pressure is lower than 100hPa, and the temperature is higher than 700°C.
基于本实现本发明上述相同目的,采用电容耦合PECVD过程实现在碳纳米管和/或碳纤维,或者碳纳米管和/或碳纤维复合结构上涂覆阻隔层,而后续金刚石的合成过程采用在微波CVD或者热丝CVD中进行。Based on the realization of the above-mentioned same purpose of the present invention, the capacitively coupled PECVD process is used to coat the barrier layer on carbon nanotubes and/or carbon fibers, or carbon nanotubes and/or carbon fiber composite structures, and the subsequent diamond synthesis process adopts microwave CVD Or in hot wire CVD.
根据制备复合材料过程中的需要,实施过程在步骤S10之前,还可以包括如下步骤:According to the needs in the process of preparing composite materials, the implementation process may also include the following steps before step S10:
S00,将碳纳米管和/或碳纤维按照所需制备的复合材料的结构处理,生成预期的碳纳米管和/或碳纤维结构;比如将碳纳米管进行处理形成碳纳米管阵列或碳纳米线的结构形态,或者碳纳米管形成的结构可能是这样的纳米管的任意排列,其中包括大片耸立的碳纳米管,在不同基底上分散的碳纳米管自旋涂层膜,碳纳米管网或碳纤维纱线等等。当然其结构和形态,可以根据所需制备的复合材料的要求进行选择,在此不做限定。S00, process carbon nanotubes and/or carbon fibers according to the structure of the composite material to be prepared to generate the expected carbon nanotubes and/or carbon fiber structures; for example, process carbon nanotubes to form carbon nanotube arrays or carbon nanowires Structural morphology, or the structure formed by carbon nanotubes may be any arrangement of such nanotubes, including large sheets of towering carbon nanotubes, dispersed carbon nanotube spin-coated films on different substrates, carbon nanotube networks or carbon fibers yarn and more. Of course, its structure and shape can be selected according to the requirements of the composite material to be prepared, which is not limited here.
采用本发明的上述制备方法,通过阻隔层可以在不破坏碳纳米线或者碳纤维的情况下在其上面涂覆高质量金刚石晶体,并且还可以使金刚石晶体与碳纳米线或者碳纤维之间有非常高的结合力;同时通过形核位点引导金刚石涂层的沉积,防止发生二次形核的现象导致降低金刚石的涂层的品质。Using the above-mentioned preparation method of the present invention, the carbon nanowire or carbon fiber can be coated with high-quality diamond crystals without damaging the carbon nanowire or carbon fiber through the barrier layer, and the gap between the diamond crystal and the carbon nanowire or carbon fiber can also be very high. At the same time, the deposition of the diamond coating is guided through the nucleation site to prevent the phenomenon of secondary nucleation from reducing the quality of the diamond coating.
并且采用本发明的上述方法制备,金刚石涂层可应用于各种碳纳米管和/或碳纤维结构,例如大片排列的碳纳米管,碳纳米管网和碳纤维纱线。它也提供了调节碳纳米管和/或碳纤维在复合材料和研发中的层状复合材料,以及实现规模化生产薄、硬、耐磨的涂层等中的体积配比的灵活性。And prepared by the above method of the present invention, the diamond coating can be applied to various carbon nanotube and/or carbon fiber structures, such as carbon nanotubes arranged in large sheets, carbon nanotube network and carbon fiber yarn. It also provides the flexibility to adjust the volume ratio of carbon nanotubes and/or carbon fibers in composite materials and layered composites in research and development, as well as to achieve large-scale production of thin, hard, wear-resistant coatings, etc.
同时本发明进一步还可以将上述复合材料制备的微米级线锯。其中,所得到的微米级线锯可以替换传统线锯用来切割硅片;与现有依靠电镀或者镶嵌将金刚石晶体连接到金属线上制备金刚石线锯或者锯丝的制造方法相比,本发明中制备得到的线锯直径在20微米左右,而现有做法中线锯的直径都在1毫米以上;因此本发明得到的不仅降低了线锯的制造成本,同时在应用方面,例如在硅片的切割方面,可以实现无锯末切割,平均可以节省约三分之一的硅片材料成本,可以极大地降低硅基器件材料(如太阳能光伏电池板)的成本。At the same time, the present invention can further use the micron-scale wire saw prepared from the above-mentioned composite material. Among them, the obtained micron-scale wire saw can replace the traditional wire saw to cut silicon wafers; compared with the existing manufacturing method that relies on electroplating or inlaying to connect diamond crystals to metal wires to prepare diamond wire saws or saw wires, the present invention The diameter of the wire saw prepared in the method is about 20 microns, while the diameter of the wire saw in the existing practice is more than 1 millimeter; In terms of cutting, sawdust-free cutting can be realized, which can save about one-third of the cost of silicon wafer materials on average, and can greatly reduce the cost of silicon-based device materials (such as solar photovoltaic panels).
采用本发明制备可以得到均匀分布的金刚石线,其具有多种多样的使用价值,比如:①纳米管/碳纳米线增强金刚石用在超硬耐磨薄膜涂层;②金刚石包覆的线,由微米级金刚石在碳纳米管和/或碳纤维组成,可以替换传统的替换传统的镶嵌或者电镀金刚石的金属线切割器不锈钢上镶钻来切割半导体材料如硅材料;③高温高压传感器;④场发射器件;⑤微观力学和传感应用;⑥灵活可弯曲的金刚石涂层;⑦基于碳纳米管和/或碳纤维覆盖硅基薄膜的纳米线。The preparation of the present invention can obtain uniformly distributed diamond wires, which have a variety of use values, such as: 1. nanotube/carbon nanowire reinforced diamond is used in superhard wear-resistant film coatings; 2. diamond-coated wires are made of Micron-sized diamonds are composed of carbon nanotubes and/or carbon fibers, which can replace traditional inlaid or electroplated diamond metal wire cutters with diamonds on stainless steel to cut semiconductor materials such as silicon materials; ③High temperature and high pressure sensors; ④Field emission devices ; ⑤ micromechanics and sensing applications; ⑥ flexible and bendable diamond coating; ⑦ nanowires based on carbon nanotubes and/or carbon fibers covered with silicon-based films.
为使本发明上述方法过程的实施细节更加清楚完整、易于本领域技术人员的实施参考,以及使本发明的突出的进步性效果更加显著,以下通过实施例对上述过程的实施进行具体举例说明。In order to make the implementation details of the above-mentioned method process of the present invention more clear and complete, to facilitate the implementation reference of those skilled in the art, and to make the outstanding progressive effect of the present invention more remarkable, the implementation of the above-mentioned process is specifically illustrated by examples below.
实施例1Example 1
S00,对碳纳米管处理生成预期碳纳米管阵列(如图2所示);S00, processing the carbon nanotubes to generate a desired carbon nanotube array (as shown in Figure 2);
S10,在较低压力下和适宜的温度下通过电容耦合PECVD的办法在四甲基硅烷和氧气条件下,在碳纳米管和/或碳纤维结构上覆盖上硅基薄阻隔层;S10, cover the carbon nanotube and/or carbon fiber structure with a silicon-based thin barrier layer by capacitively coupled PECVD under the conditions of tetramethylsilane and oxygen at a relatively low pressure and a suitable temperature;
S20,将镀有硅基薄膜缓冲层的碳纳米管和/或碳纤维浸没在悬浮着纳米金刚石微粒的乙醇溶液中用超声浴方法种上金刚石籽晶;S20, immersing the carbon nanotubes and/or carbon fibers coated with a silicon-based film buffer layer in an ethanol solution in which nano-diamond particles are suspended, and planting diamond seed crystals with an ultrasonic bath method;
S30,利用微波CVD法,在反应器中适宜的条件下(98%以上的氢气和少于2%的甲烷在70hpa的压力和850℃下)制备沉积金刚石涂层。S30, using the microwave CVD method to prepare a deposited diamond coating under suitable conditions in the reactor (more than 98% hydrogen and less than 2% methane at a pressure of 70hpa and 850°C).
图2展示出了本实施例制备碳纳米阵列上覆盖金刚石过程示意。在图2中单个碳纳米管的阵列放在合适的基板上;硅基薄膜阻隔层能够保证在合成金刚石时碳纳米管的顶部不会遭到破坏;并最终形成金刚石涂层。Fig. 2 shows a schematic diagram of the process of preparing carbon nano-array covered with diamond in this embodiment. In Figure 2, the array of single carbon nanotubes is placed on a suitable substrate; the silicon-based thin film barrier layer can ensure that the top of the carbon nanotubes will not be damaged when synthesizing diamond; and finally form a diamond coating.
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包括在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention should be included in the protection of the present invention. within range.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410638045.1A CN104451596A (en) | 2014-11-12 | 2014-11-12 | Composite material based on diamond crystals and preparation method of composite material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410638045.1A CN104451596A (en) | 2014-11-12 | 2014-11-12 | Composite material based on diamond crystals and preparation method of composite material |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104451596A true CN104451596A (en) | 2015-03-25 |
Family
ID=52898331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410638045.1A Pending CN104451596A (en) | 2014-11-12 | 2014-11-12 | Composite material based on diamond crystals and preparation method of composite material |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104451596A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107443602A (en) * | 2017-09-11 | 2017-12-08 | 湖南七纬科技有限公司 | A kind of high-performance diamond line and preparation method thereof |
CN110734726A (en) * | 2018-10-23 | 2020-01-31 | 嘉兴学院 | A kind of preparation method of carbon nanotube/diamond composite thermally conductive adhesive material |
WO2020163909A1 (en) | 2019-02-11 | 2020-08-20 | The University Of Melbourne | A method of forming a diamond coating on a carbon material |
CN114606465A (en) * | 2022-01-27 | 2022-06-10 | 深圳富联智能制造产业创新中心有限公司 | Method for producing cutting wire and cutting wire |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013113493A1 (en) * | 2012-01-30 | 2013-08-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the manufacture of composites consisting of carbon nanotubes and crystalline diamond |
-
2014
- 2014-11-12 CN CN201410638045.1A patent/CN104451596A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013113493A1 (en) * | 2012-01-30 | 2013-08-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the manufacture of composites consisting of carbon nanotubes and crystalline diamond |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107443602A (en) * | 2017-09-11 | 2017-12-08 | 湖南七纬科技有限公司 | A kind of high-performance diamond line and preparation method thereof |
CN107443602B (en) * | 2017-09-11 | 2019-04-19 | 秦皇岛星晟科技股份有限公司 | A kind of high-performance diamond line and preparation method thereof |
CN110734726A (en) * | 2018-10-23 | 2020-01-31 | 嘉兴学院 | A kind of preparation method of carbon nanotube/diamond composite thermally conductive adhesive material |
CN110734726B (en) * | 2018-10-23 | 2021-10-29 | 嘉兴学院 | A kind of preparation method of carbon nanotube/diamond composite thermally conductive adhesive material |
WO2020163909A1 (en) | 2019-02-11 | 2020-08-20 | The University Of Melbourne | A method of forming a diamond coating on a carbon material |
CN114606465A (en) * | 2022-01-27 | 2022-06-10 | 深圳富联智能制造产业创新中心有限公司 | Method for producing cutting wire and cutting wire |
CN114606465B (en) * | 2022-01-27 | 2024-05-17 | 深圳富联智能制造产业创新中心有限公司 | Method for preparing cutting line and cutting line |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103773985B (en) | A kind of efficient original position prepares the method that Graphene strengthens Cu-base composites | |
CN101811690B (en) | A method of forming a carbon composite structure with carbon nanotubes and graphene | |
CN106191807B (en) | A kind of hard alloy piece and preparation method thereof with diamond coatings | |
CN106835064B (en) | A kind of tool and preparation method thereof with diamond/silicon carbide composite coating | |
CN108149219B (en) | Diamond composite coating cutter and preparation method thereof | |
CN107326339B (en) | A kind of diamond gradient film on the surface of alloy cutting tool and preparation method thereof | |
CN102965666B (en) | A kind of flexible substrate nano-diamond film and preparation method thereof | |
CN104451596A (en) | Composite material based on diamond crystals and preparation method of composite material | |
CN101487121A (en) | Diamond / W-C gradient structure composite coating and preparing method thereof | |
CN108545738B (en) | A method for improving the hardness and toughness of CVD single crystal diamond | |
EP2809613B1 (en) | Method for the manufacture of composites consisting of carbon nanotubes and crystalline diamond | |
CN102367570B (en) | A kind of method for preparing diamond-graphene composite film | |
CN102330328A (en) | Three-dimensional fiber/carbon nano tube multistage reinforcement and preparation method thereof | |
CN103757601B (en) | Preparation method of diamond coating high temperature and high pressure spray nozzle | |
CN102586762A (en) | Method for preparing diamond film through multiple-doped hot filament chemical vapor deposition | |
CN105543803A (en) | Diamond/boron carbide composite coating of hard alloy substrate and preparation method thereof | |
TW201215701A (en) | Process to grow carbon nanotubes onto fibers | |
CN102337515A (en) | Preparation method for high-temperature high-differential pressure valve of diamond coating | |
CN101318839B (en) | Preparation method of silicon carbide ceramic and diamond composite drawing die | |
CN105986247A (en) | Fluidized bed device for coating film on surface of diamond, method and product prepared through method | |
CN102320590A (en) | Method for directly growing single and double-spiral nano carbon fibers on copper matrix | |
CN1233870C (en) | Method of coating diamond on gradient hard alloy with cobalt-lean surface layer | |
CN107128901A (en) | A kind of oriented and ordered preparation method of carbon nano-tube | |
CN106319518A (en) | Diamond/metal carbide composite coating layer and preparation method and application thereof | |
CN102351164B (en) | Method for Direct Growth of Vertical Carbon Nanofiber Arrays on Copper Substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150325 |
|
WD01 | Invention patent application deemed withdrawn after publication |