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CN104388006A - Ultra-small stripping force anti-sticking film and preparation method thereof - Google Patents

Ultra-small stripping force anti-sticking film and preparation method thereof Download PDF

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Publication number
CN104388006A
CN104388006A CN201410754826.7A CN201410754826A CN104388006A CN 104388006 A CN104388006 A CN 104388006A CN 201410754826 A CN201410754826 A CN 201410754826A CN 104388006 A CN104388006 A CN 104388006A
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CN
China
Prior art keywords
agent
ultralight
peeling force
antiadhesion barrier
barrier according
Prior art date
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Pending
Application number
CN201410754826.7A
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Chinese (zh)
Inventor
潘成诚
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ANHUI MINGXUN NEW MATERIAL TECHNOLOGY Co Ltd
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ANHUI MINGXUN NEW MATERIAL TECHNOLOGY Co Ltd
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Priority to CN201410754826.7A priority Critical patent/CN104388006A/en
Publication of CN104388006A publication Critical patent/CN104388006A/en
Pending legal-status Critical Current

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  • Adhesive Tapes (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

The invention discloses an ultra-small stripping force anti-sticking film which comprises a base material and a composite release layer, wherein the composite release layer is coated on the base material, and the composite release layer is formed by solidifying a composite release agent; the composite release agent comprises a release agent, a thermal expansive microcapsule, a dispersing agent, an anchoring agent, a bridging agent, a catalyst and a solvent; and the thermal expansive microcapsule accounts for 1%-50% of the dry weight of the release agent. A preparation method of the ultra-small stripping force anti-sticking film comprises the following steps of: sequentially preparing foaming agent dispersion liquid, a bridging agent diluent and a catalyst diluent, uniformly mixing with a solvent, and standing to prepare a composite release agent coating agent; then coating the composite release agent coating agent on the surface of the base material; finally desolventizing, solidifying and foaming in a drying box.

Description

A kind of ultralight peeling force antiadhesion barrier and preparation method thereof
Technical field
The present invention relates to film class non-stick material field, particularly a kind of ultralight peeling force antiadhesion barrier and preparation method thereof.
Background technology
Non-stick material is made up of the release layer of base material and surface-coated thereof; release layer has extremely low surface free energy; non-stick material film and pressure-sensitive when supporting the use with adhesive tape/protective membrane; the low surface free energy characteristic of release layer by guarantee pressure-sensitive adhesive layer because contact angle θ is greater than 90 ° and be difficult to effective wetting; thus meet the service requirements of adhesive tape/protective membrane, be widely used in the aspects such as cross cutting, electronics, medical science, optics, plating protection and materials processing.
Common non-stick material and the pressure-sensitive adhesive layer of adhesive tape/protective membrane contact with the form in face-face, can form a kind of more weak adhesive effect between them, so the peeling force of common non-stick material is generally not less than 0.05N/25mm.
In order to meet the requirement of modern production process, external non-stick material manufacturers starts to adopt the methods such as plasma etching, the release layer of non-stick material etches striped artificially, make release layer and the way of contact of pressure-sensitive adhesive layer become line-face to contact or point-face contact, thus produced the non-stick material that peeling force is less than 0.03N/25mm, but to be equipment requirements high, investment is large, parting agent waste is serious for the feature of this production technique.
Summary of the invention
For above-mentioned technical problem, the present invention discloses a kind of ultralight peeling force antiadhesion barrier, comprise: base material and coating compound release layer on the substrate, described compound release layer is solidify to form by compound parting agent, and described compound parting agent comprises parting agent, accounts for the heat expansion microcapsule of parting agent dry weight 1% ~ 50% mass parts, dispersion agent, breaking-down agent, bridging agent, catalyzer and solvent.
Preferably, the core of described heat expansion microcapsule is one or more in organic blowing agent or inorganic foaming agent.
Preferably; described organic blowing agent is hydro carbons, Cellmic C 121, hydrazo-dicarbonamide, 4; 4 '-bis oxide sulfonyl hydrazide, 2-((4-oxyethyl group-6-methylamino-1; 3; 5-triazine-2-base) carbamoylamino alkylsulfonyl) methyl benzoate, dinitropentamethylenetetramine, 5-phenyltetrazole, p-toluene sulfonyl hydrazide, p-toluenesulfonyl Urea,amino-, azo-bis-isobutyl cyanide, disulfonyl hydrazide sulfobenzide; two benzene disulfohydrazides, one or more in benzene disulfohydrazide and hydrazo-dicarbonamide.
Preferably, described inorganic foaming agent is one or more in supercarbonate and Citric Acid, usp, Anhydrous Powder salt.
Preferably, core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 35 micron.
Preferably, core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 10 micron.
Preferably, the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 60 DEG C ~ 160 DEG C.
Preferably, the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 100 DEG C ~ 130 DEG C.
Preferably, described heat expansion microcapsule account for 10% ~ 50% mass parts of parting agent dry weight.
The preparation method of ultralight peeling force antiadhesion barrier of the present invention, comprises the following steps:
Step one, joins dispersion mixing in container, obtained whipping agent dispersion liquid by heat expansion microcapsule, end group polyisobutene class hyper-dispersant, breaking-down agent, solvent and parting agent;
Step 2, by bridging agent and solvent mixing, obtained bridging agent diluent;
Step 3, mixes catalysts and solvents, obtained catalyst dilution liquid;
Step 4, mixes whipping agent dispersion liquid, bridging agent diluent, catalyst dilution liquid and solvent, leaves standstill, obtained compound parting agent coating agent;
Step 5, is coated in compound parting agent coating agent the substrate surface that surface free energy is not less than 52 dynes per centimeter;
Step 6, carries out precipitation, solidification and foaming by the base material being coated with compound parting agent in baking oven.
The invention has the beneficial effects as follows: make compound parting agent by adding the heat expansion microcapsule with specific expansion temperature scope in described parting agent, be coated on base material with this compound parting agent and make film class non-stick material, heat expansion microcapsule in non-stick material release layer within specified temperatures foaming and intumescing form a large amount of cavitys, destroy the physical structure of release layer and to form a large amount of point-like protruding on release layer surface, the contact form of this non-stick material and matching used Pressuresensitive Tape is contacted from face-face and becomes point-face contact, thus make actual use peeling force be reduced to below 0.02N/25mm, change the particle size range of heat expansion microcapsule, the antiseized of the thick sizing agent of different glue can be adapted to, change the consumption of heat expansion microcapsule, actual anti-adhesion effects can be adjusted.
 
Accompanying drawing explanation
Fig. 1 is the cross-sectional view of ultralight peeling force antiadhesion barrier of the present invention.
Wherein, 1-base material; 2-compound parting agent; 3-heat expansion microcapsule.
 
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail, can implement according to this with reference to specification sheets word to make those skilled in the art.
As shown in the figure, the present invention discloses a kind of ultralight peeling force antiadhesion barrier, comprise: base material 1 and coating compound release layer on the substrate, described compound release layer is solidify to form by compound parting agent 2, and compound parting agent 2 comprises parting agent, accounts for the heat expansion microcapsule 3 of parting agent dry weight 1% ~ 50% mass parts, dispersion agent, breaking-down agent, bridging agent, catalyzer and trace solvent.
Preferably, the core of described heat expansion microcapsule 3 is one or more in organic blowing agent or inorganic foaming agent.
Preferably; described organic blowing agent is hydro carbons, Cellmic C 121, hydrazo-dicarbonamide, 4; 4 '-bis oxide sulfonyl hydrazide, 2-((4-oxyethyl group-6-methylamino-1; 3; 5-triazine-2-base) carbamoylamino alkylsulfonyl) methyl benzoate, dinitropentamethylenetetramine, 5-phenyltetrazole, p-toluene sulfonyl hydrazide, p-toluenesulfonyl Urea,amino-, azo-bis-isobutyl cyanide, disulfonyl hydrazide sulfobenzide; two benzene disulfohydrazides, one or more in benzene disulfohydrazide and hydrazo-dicarbonamide.
Preferably, described inorganic foaming agent is one or more in supercarbonate and Citric Acid, usp, Anhydrous Powder salt.
Preferably, core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 35 micron.
Preferably, core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 10 micron.
Preferably, the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 60 DEG C ~ 160 DEG C.
Preferably, the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 100 DEG C ~ 130 DEG C.
Preferably, described heat expansion microcapsule 3 account for 10% ~ 50% mass parts of parting agent dry weight.
The preparation method of ultralight peeling force antiadhesion barrier of the present invention, comprises the following steps:
Step one, joins dispersion mixing in container, obtained whipping agent dispersion liquid by heat expansion microcapsule, end group polyisobutene class hyper-dispersant, breaking-down agent, solvent and parting agent;
Step 2, by bridging agent and solvent mixing, obtained bridging agent diluent;
Step 3, mixes catalysts and solvents, obtained catalyst dilution liquid;
Step 4, mixes whipping agent dispersion liquid, bridging agent diluent, catalyst dilution liquid and solvent, leaves standstill, obtained compound parting agent coating agent;
Step 5, is coated in compound parting agent coating agent the substrate surface that surface free energy is not less than 52 dynes per centimeter;
Step 6, carries out precipitation, solidification and foaming by the base material being coated with compound parting agent in baking oven.
Specifically tell about ultralight peeling force antiadhesion barrier of the present invention and preparation method thereof below.
Embodiment 1
A kind of reality uses peeling force to be less than the ultralight peeling force antiadhesion barrier of 0.01N/25mm, by PET base material and the compound release layer be coated in described PET base material, described compound release layer is solidify to form by compound parting agent, and described compound parting agent comprises organosilicon parting agent Syl-Off ?sB 7458, Syl-Off sB 7200, end group polyisobutene class hyper-dispersant, initial blowing temperature are 100 DEG C ~ 110 DEG C, particle diameter is 100nm heat expansion microcapsule, bridging agent Syl-Off ?7672, catalyst S yl-Off ?4000 and solvent toluene.
The preparation method of described ultralight peeling force antiadhesion barrier is:
First, in only clean stainless steel vessel, pour 3000g toluene into, then pour the Syl-Off of 100g into ?sB 7200, stirring and dissolving; To Syl-Off ?the heat expansion microcapsule that the initial blowing temperature of the end group polyisobutene class hyper-dispersant and 100g that slowly add 3g in SB 7200 toluene solution is 100 DEG C ~ 110 DEG C, particle diameter is 100nm, add the Syl-Off of 900g again after stirring 5min mix is even ?sB 7458, stirs 5min mix even, then disperses more than 15 minutes with shearing dispersion machine, dispersion effect microscopic, regulates dispersion intensity and jitter time, until be uniformly dispersed, obtains compound parting agent dispersion liquid; In compound parting agent dispersion liquid, 1% Syl-Off of 600g is added successively under whipped state ?1% Syl-Off of 7672 toluene solutions and 500g ?4000 toluene solutions, and add about 900g toluene, leave standstill 5min again after continuing to stir more than 10min, obtain compound parting agent coating agent.
By the compound parting agent coating agent release film coating machine prepared, the PET base material being not less than 52 dynes per centimeter at surface free energy is coated with, controlling wet film glue spread is 10g/m 2-20g/m 2between; Coating Speed is depending on baking oven length, and generally between 15m/min ~ 60m/min, oven temperature is 60 DEG C ~ 80 DEG C in precipitation section, and solidification-foaming section is at 120 DEG C ~ 150 DEG C; Require release layer completion of cure.
To be coated with and the dry silicon glue spread Xray fluorescence spectrometer of the ultralight peeling force antiadhesion barrier solidified detects, to control the dry silicon glue spread of parting agent at 0.5 g/m 2-1.0 g/m 2between; Detect the actual off-type force of ultralight peeling force antiadhesion barrier prepared by embodiment 1, test with the polyacrylate pressure-sensitive band that dry glue thickness is 0.015mm, actual peeling force is less than 0.01N/25mm.
 
Embodiment 2:
The actual ultralight peeling force antiadhesion barrier using peeling force to be less than 0.02N/25mm, is made up of PET base material and the compound release layer be coated in described PET base material; Described compound release layer is solidify to form by compound parting agent, and described compound parting agent comprises organosilicon parting agent Syl-off ?sB 7688, end group polyisobutene class hyper-dispersant, breaking-down agent Syl-off ?sB 297, initial blowing temperature are 100 DEG C ~ 110 DEG C, particle diameter is 100nm heat expansion microcapsule, bridging agent Syl-off ?sB 7672, catalyst S yl-off ?sB 4000 and solvent toluene.
The preparation method of described ultralight peeling force antiadhesion barrier is:
First, 3000g toluene is poured in only clean stainless steel vessel, the heat expansion microcapsule that the initial blowing temperature of the end group polyisobutene class hyper-dispersant and 100g that slowly add 3g is 100 DEG C ~ 110 DEG C, particle diameter is 100nm, add the Syl-Off of 3g more respectively after stirring 5min mix is even ?297 and the Syl-Off of 1000g ?sL 7688, stirs 5min mix even, then with shearing dispersion machine dispersion more than 15min, dispersion effect microscopic, regulating dispersion intensity and jitter time until be uniformly dispersed, obtaining compound parting agent dispersion liquid; In compound parting agent dispersion liquid, 1% Syl-Off of 600g is added successively under whipped state ?1% Syl-Off of 7672 toluene solutions, 500g ?4000 toluene solutions, and add about 900g toluene, leave standstill 5min again after continuing to stir more than 10min, obtain compound parting agent coating agent.
By the compound parting agent coating agent release film coating machine prepared, the PET base material being not less than 52 dynes per centimeter at surface free energy is coated with, controlling wet film glue spread is 10g/m 2-20g/m 2between; Coating Speed is depending on baking oven length, and generally between 15m/min ~ 60m/min, oven temperature is 60 DEG C ~ 80 DEG C in precipitation section, and solidification-foaming section is at 120 DEG C ~ 150 DEG C; Require release layer completion of cure.
To be coated with and the dry silicon glue spread Xray fluorescence spectrometer of the ultralight peeling force antiadhesion barrier solidified detects, to control the dry silicon glue spread of parting agent at 0.5g/m 2-1.0 g/m 2between; Detect the actual off-type force of ultralight peeling force antiadhesion barrier prepared by embodiment 2, test with the polyacrylate pressure-sensitive band that dry glue thickness is 0.015mm, actual peeling force is less than 0.02N/25mm.
Although embodiment of the present invention are open as above, but it is not restricted to listed in specification sheets and embodiment utilization, it can be applied to various applicable the field of the invention completely, for those skilled in the art, can easily realize other amendment, therefore do not deviating under the universal that claim and equivalency range limit, the present invention is not limited to specific details and illustrates here and the legend described.

Claims (10)

1. a ultralight peeling force antiadhesion barrier, it is characterized in that, comprise: base material and coating compound release layer on the substrate, described compound release layer is solidify to form by compound parting agent, and described compound parting agent comprises parting agent, accounts for the heat expansion microcapsule of parting agent dry weight 1% ~ 50% mass parts, dispersion agent, breaking-down agent, bridging agent, catalyzer and solvent.
2. ultralight peeling force antiadhesion barrier according to claim 1, is characterized in that: the core of described heat expansion microcapsule is one or more in organic blowing agent or inorganic foaming agent.
3. ultralight peeling force antiadhesion barrier according to claim 2; it is characterized in that: described organic blowing agent is hydro carbons, Cellmic C 121, hydrazo-dicarbonamide, 4; 4 '-bis oxide sulfonyl hydrazide, 2-((4-oxyethyl group-6-methylamino-1; 3; 5-triazine-2-base) carbamoylamino alkylsulfonyl) methyl benzoate, dinitropentamethylenetetramine, 5-phenyltetrazole, p-toluene sulfonyl hydrazide, p-toluenesulfonyl Urea,amino-, azo-bis-isobutyl cyanide, disulfonyl hydrazide sulfobenzide; two benzene disulfohydrazides, one or more in benzene disulfohydrazide and hydrazo-dicarbonamide.
4. ultralight peeling force antiadhesion barrier according to claim 2, is characterized in that: described inorganic foaming agent is one or more in supercarbonate and Citric Acid, usp, Anhydrous Powder salt.
5. ultralight peeling force antiadhesion barrier according to claim 2, is characterized in that: core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 35 micron.
6. ultralight peeling force antiadhesion barrier according to claim 1 or 5, is characterized in that: core is the particle size range of organic blowing agent or inorganic foaming agent heat expansion microcapsule is 0.05 ~ 10 micron.
7. ultralight peeling force antiadhesion barrier according to claim 2, is characterized in that: the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 60 DEG C ~ 160 DEG C.
8. ultralight peeling force antiadhesion barrier according to claim 1, is characterized in that: the initial blowing temperature of described organic blowing agent or inorganic foaming agent is 100 DEG C ~ 130 DEG C.
9. ultralight peeling force antiadhesion barrier according to claim 1, is characterized in that: described heat expansion microcapsule account for 10% ~ 50% mass parts of parting agent dry weight.
10. the preparation method of the ultralight peeling force antiadhesion barrier according to any one of claim 1 ~ 9, is characterized in that, be made up of following step:
Step one, joins dispersion mixing in container, obtained whipping agent dispersion liquid by heat expansion microcapsule, end group polyisobutene class hyper-dispersant, breaking-down agent, solvent and parting agent;
Step 2, by bridging agent and solvent mixing, obtained bridging agent diluent;
Step 3, mixes catalysts and solvents, obtained catalyst dilution liquid;
Step 4, mixes whipping agent dispersion liquid, bridging agent diluent, catalyst dilution liquid and solvent, leaves standstill, obtained compound parting agent coating agent;
Step 5, is coated in compound parting agent coating agent the substrate surface that surface free energy is not less than 52 dynes per centimeter;
Step 6, carries out precipitation, solidification and foaming by the base material being coated with compound parting agent in baking oven.
CN201410754826.7A 2014-12-11 2014-12-11 Ultra-small stripping force anti-sticking film and preparation method thereof Pending CN104388006A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105128469A (en) * 2015-05-05 2015-12-09 东莞市鼎力薄膜科技有限公司 Anti-static functional film with ultra-light release force
CN106497489A (en) * 2016-10-26 2017-03-15 沈阳万合胶业股份有限公司 A kind of porous type pressure sensitive adhesive and preparation method thereof
CN107078102A (en) * 2015-09-16 2017-08-18 古河电气工业株式会社 Semiconductor back surface film
CN109835002A (en) * 2017-11-29 2019-06-04 宁波长阳科技股份有限公司 Release film and preparation method thereof
CN110736763A (en) * 2019-10-29 2020-01-31 东莞捷邦实业有限公司 Silicon transfer rapid detection method for silicon-containing release films
JP2020097718A (en) * 2018-12-13 2020-06-25 日東電工株式会社 Adhesive composition and pressure sensitive adhesive sheet
CN111440576A (en) * 2019-01-17 2020-07-24 中山荣思东数码科技有限公司 Water-based repeatedly-removable pressure-sensitive adhesive containing microcapsules and preparation method thereof

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CN1693395A (en) * 2005-06-16 2005-11-09 海南赛诺实业有限公司 Release coating film and manufacturing method thereof
CN101233204A (en) * 2005-08-01 2008-07-30 艾利丹尼森公司 Release liner and method of using same
CN101235260A (en) * 2008-02-28 2008-08-06 永大(中山)有限公司 Low-noise adhesive tape and preparation method thereof
JP2013511415A (en) * 2009-11-24 2013-04-04 フータマキ フィルムズ ジャーマニー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト Release film with foam structure
CN103627336A (en) * 2013-05-14 2014-03-12 苏州邦立达新材料有限公司 Pressure sensitive adhesive tape and preparation method thereof

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Publication number Priority date Publication date Assignee Title
CN1693395A (en) * 2005-06-16 2005-11-09 海南赛诺实业有限公司 Release coating film and manufacturing method thereof
CN101233204A (en) * 2005-08-01 2008-07-30 艾利丹尼森公司 Release liner and method of using same
CN101235260A (en) * 2008-02-28 2008-08-06 永大(中山)有限公司 Low-noise adhesive tape and preparation method thereof
JP2013511415A (en) * 2009-11-24 2013-04-04 フータマキ フィルムズ ジャーマニー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト Release film with foam structure
CN103627336A (en) * 2013-05-14 2014-03-12 苏州邦立达新材料有限公司 Pressure sensitive adhesive tape and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105128469A (en) * 2015-05-05 2015-12-09 东莞市鼎力薄膜科技有限公司 Anti-static functional film with ultra-light release force
CN107078102A (en) * 2015-09-16 2017-08-18 古河电气工业株式会社 Semiconductor back surface film
CN106497489A (en) * 2016-10-26 2017-03-15 沈阳万合胶业股份有限公司 A kind of porous type pressure sensitive adhesive and preparation method thereof
CN109835002A (en) * 2017-11-29 2019-06-04 宁波长阳科技股份有限公司 Release film and preparation method thereof
CN109835002B (en) * 2017-11-29 2022-05-31 宁波长阳科技股份有限公司 Release film and preparation method thereof
JP2020097718A (en) * 2018-12-13 2020-06-25 日東電工株式会社 Adhesive composition and pressure sensitive adhesive sheet
CN111440576A (en) * 2019-01-17 2020-07-24 中山荣思东数码科技有限公司 Water-based repeatedly-removable pressure-sensitive adhesive containing microcapsules and preparation method thereof
CN110736763A (en) * 2019-10-29 2020-01-31 东莞捷邦实业有限公司 Silicon transfer rapid detection method for silicon-containing release films

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