CN104345501B - The method for preparing narrow frame display device - Google Patents
The method for preparing narrow frame display device Download PDFInfo
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- CN104345501B CN104345501B CN201310337313.1A CN201310337313A CN104345501B CN 104345501 B CN104345501 B CN 104345501B CN 201310337313 A CN201310337313 A CN 201310337313A CN 104345501 B CN104345501 B CN 104345501B
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- 238000000034 method Methods 0.000 title claims abstract description 52
- 230000005855 radiation Effects 0.000 claims abstract description 66
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- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000007789 sealing Methods 0.000 claims abstract description 27
- 229920001721 polyimide Polymers 0.000 claims abstract description 26
- 150000003254 radicals Chemical class 0.000 claims abstract description 16
- 239000012528 membrane Substances 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 239000004952 Polyamide Substances 0.000 claims 1
- 150000002466 imines Chemical class 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 10
- 238000005336 cracking Methods 0.000 abstract description 7
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 33
- 238000012986 modification Methods 0.000 description 9
- 230000004048 modification Effects 0.000 description 9
- 238000007711 solidification Methods 0.000 description 7
- 230000008023 solidification Effects 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000001723 curing Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
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- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
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- 230000000694 effects Effects 0.000 description 1
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- 238000005265 energy consumption Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
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- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 238000012216 screening Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/02—Materials and properties organic material
- G02F2202/022—Materials and properties organic material polymeric
- G02F2202/023—Materials and properties organic material polymeric curable
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The present invention provides a kind of method for preparing narrow frame display device, it is characterised in that methods described includes：Radiation treatment is located at the polyimide film of the sealing opening position of substrate, the polyimide film of the sealing opening position positioned at substrate is produced free radical；Sealant is coated in the sealing opening position, and solidified.By carrying out radiation treatment to polyimide film, make the surface group of polyimide film that cracking reaction generation free radical occur, the active group of itself and sealant reacts to each other, and then increases adhesion strength, avoids the poor situation of liquid crystal puncture, liquid crystal pollution, reliability and occurs.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of method for preparing narrow frame display device.
Background technology
Liquid crystal display（Liquid Crystal Display, LCD）Because its small volume, it is low in energy consumption, radiationless the features such as
The main product in current flat-panel monitor is turned into, and slim, lightweight requirement has increasingly been strengthened.
The narrow frame design of display device is a trend of display field development.TFT-LCD (thin film transistor (TFT)s at present
LCD）The narrow frame design method of product is shown, mostly using polyimide film（PI films）With sealant（Seal）It is overlapping
（Overlap）Mode realize.But because PI films and sealant caking property are poor, easily in terms of generation reliability not
It is good, as cohesive force is weak, because precipitate is polluted caused by poor compatibility and caused by image retention problem, final PI films and sealant can not
The factor of control causes narrow frame to be difficult to the design requirement for reaching ideal product.And use PI films and the nonoverlapping mode of sealant
Narrow frame design, although avoiding the problem of above-mentioned, this method can not realize narrow frame to greatest extent.So PI
Film overlapping with sealant is a best solution, and the caking property for improving PI films and sealant is also a new class
Topic.
The method for realizing narrow frame of current generally use is that sealant is directly overlappingly coated on PI films, after cured
Form sealing.But the sealing strength obtained in this way is poor, easily there is the puncture of liquid crystal, the precipitation of pollutant, trust
The problems such as property is bad.
The content of the invention
Therefore, the present invention is intended to provide a kind of method for preparing ultra-narrow frame display device, is not changing display device
The mode of radiation modification is utilized in design basis, stronger caking property is realized between sealant and PI films.According to the present invention
Method effectively can be realized using the PI films mode overlapping with sealant 6~11mm narrow frame display device system
It is standby, the problems such as and can prevents the puncture of liquid crystal, the precipitation of pollutant, reliability is bad.
It is an object of the invention to provide a kind of method for preparing narrow frame display device, methods described includes：
Radiation treatment is located at the polyimide film of the sealing opening position of substrate, makes the sealing opening position positioned at substrate
Polyimide film produces free radical；
Sealant is coated in the sealing opening position, and solidified.
Wherein, the polyimide film, which has, is selected from-COO- ,-OH and-NH2The first active group, preferably have be located at
- COO- on side chain.
The sealant, which has, is selected from-COOH ,-OH and-NH2The second active group.
According to an embodiment of the invention, the radiation treatment is carried out with the radiation source for launching linear ultraviolet light.Institute
State radiation source and carry out radiation treatment by radiating sealing position of the light shield to the substrate.By adjusting the radiation light shield
The distance between described substrate, to make the light transmission part of the radiation light shield and the sealing aligned in position of the substrate.
The wavelength of the linear ultraviolet light is preferably 254nm and/or 313nm.
In the method according to the invention, the intensity of the linear ultraviolet light can be 1.0~4.0J/cm2。
According to an embodiment of the invention, first active group occurs cracking and produces free radical afterwards via radiation.
When carrying out the curing schedule, the second active group of the free radical and the sealant, which is formed, to be chemically bonded.
The substrate is array base palte or color membrane substrates.
According to another embodiment of the present invention, methods described is included in before carrying out the irradiation treatment step, to institute
State polyimide film and carry out orientation process.
In the method for preparation narrow frame display device provided by the invention, to sealant coating zone（Seal position）It is interior
PI films surface molecules carry out radiation modification, its crack caused by free radical and polarity can be with the active group of sealant component both
Good wellability and adsorptivity can be reached before curing, the chemical bonding of PI films-sealant occurs in solidification for and can, and it is produced
Raw intramolecule bonding force is much larger than intermolecular force, so as to realize adhesion strength between polyimide film and sealant
Enhancing.Pass through the above method, it is possible to achieve the preparation of 6~11mm narrow frame display devices, and ensure its good display performance
And stability.
Brief description of the drawings
Fig. 1 is according to the polyimide film of the narrow frame display device of the present invention schematic diagram overlapping with sealant；
Fig. 2 is the structural representation according to radiation light shield used in method of the invention；
Fig. 3 is the schematic diagram that radiation modification is carried out to polyimide film according to embodiment of the present invention.
Embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below in conjunction with the embodiment of the present invention
Accompanying drawing, the technical scheme of the embodiment of the present invention is clearly and completely described.Obviously, described embodiment is this hair
Bright part of the embodiment, rather than whole embodiments.Based on described embodiments of the invention, ordinary skill
The every other embodiment that personnel are obtained on the premise of without creative work, belongs to the scope of protection of the invention.
The present invention provides a kind of method for preparing narrow frame display device, including：Radiation treatment is located at the sealing position of substrate
The polyimide film at place is put, the polyimide film of the sealing opening position positioned at substrate is produced free radical；Then frame will be sealed
Glue is coated in the sealing opening position, and is solidified, and now the free radical of polyimide film and the active group of sealant are sent out
Raw reaction so that stronger cohesive force is produced between polyimide film and sealant.
Fig. 1 shows the method according to the invention narrow frame display surface made from by the way of PI films are overlapping with sealant
Plate, wherein there is no distance restraint between PI films and sealant, can effectively reduce frame area.
In the method according to the invention, aforesaid substrate can such as glass substrate or the transparency and have good stability
Substrate formed with array pattern or color film pattern, i.e. array base palte or color membrane substrates on plastic base.
In the above-mentioned methods, the method for alignment of routine is utilized（Such as friction treatment）Make coated in the polyimides on substrate
After film orientation, the substrate through orientation is positioned on objective table.Objective table can be placed in radiating enclosures.The radiating enclosures can be carried out
Vacuumize or be filled with the processing of inert gas.
The radiation light shield for limiting radiation areas is disposed with above objective table.It can be this area to radiate light shield
The conventional light screening material with specific transmission region.As shown in Fig. 2 the shading light part 1 of radiation light shield can be metallic plate,
Either opaque plastic plate or other any shelters that can block radiation source radiation.And radiate the printing opacity of light shield
Part 2, then being can be through the material for the ray that radiation source is launched, such as glass, transparent plastic.
Rotatable stage causes the substrate of processing to be irradiated to be in the position corresponding with radiation light shield, i.e. light transmission part
2 is corresponding with the sealing position of substrate, and shading light part 1 is corresponding with the graphics field of substrate.The substrate of fixed processing to be irradiated.
The distance between regulation radiation light shield and the substrate of processing to be irradiated, and aligned them so that substrate
Sealing position with radiate light shield printing opacity aligned in position.The contraposition process generally includes to make radiation light shield drop to necessarily
Behind position, slightly aligned, then carefully aligned.Then, with Electron microscopy alignment, and it is finely adjusted.
Fig. 3 shows the schematic diagram of radiation modification polyimide film, wherein radiating effective area in radiation light shield（That is,
The area of each light transmission part）Relation between the area W ' 1 to be irradiated of W1, W2, W3 and PI film, W ' 2, W ' 3 is W1 ＞ W ' 1,
W2 ＞ W ' 2, W3 ＞ W ' 3.
The ray for the side that offside reflection plate positioned at both ends sends radiation source is reflected, and then is ensured to substrate
Side carries out radiation modification.
In the above method, the distance between radiation light shield and substrate of processing to be irradiated can be set in advance as needed
It is fixed, specifically can be depending on the constituent of PI films and the radiation areas area of PI films.If the radiation areas area of PI films is big,
Default distance is then arranged to smaller；If the radiation areas area of PI films is small, default distance is arranged to larger.
The angle range that above-mentioned radiation source is moved by it can control the radiation areas of PI films.Radiation source can be launched various
The electromagnetic wave of wavelength, such as visible ray, ultraviolet, X ray, the laser of gamma-rays and different wave length, alpha ray, β rays and
Neutron ray etc..The number of radiation source can be one or more, be adjusted according to being actually needed.
Above-mentioned radiation source is preferably the device that linear ultraviolet light occurs.Its track moved is using the both ends of substrate as level
Range of movement, horizontal movement speed can be 20~50mm/s.Simultaneously radiation source also centered on vertical direction line carry out -30 °~
30 ° of motion, angular speed can be 0-30 °/s.
Wherein, the intensity of above-mentioned linear ultraviolet light can be configured according to the composition of PI films, such as can be 1.0~4.0J/
cm2（254nm wavelength）, or 1.0~4.0J/cm2（313nm wavelength）.
Above-mentioned polyimide film, which can have, is selected from-COO- ,-OH and-NH2The first active group, preferably have positioned at branch
- COO- on chain.Above-mentioned first active group can crack by the radiation treatment of above-mentioned radiation source, generate free radical.
Above-mentioned sealant, which can have, is selected from-COOH ,-OH and-NH2The second active group.
After radiation treatment, radiation source reversion is in situ, radiation light shield rises to initial position, and will be through overshoot
The substrate of processing transfers out radiating enclosures.
Then, sealant is coated on the sealing position of the substrate Jing Guo radiation treatment, and carried out to box, solidification（Example
Such as UV solidifications or heat cure）.Now, the second active group has good infiltration with the free radical as caused by the first active group
Performance, and the chemical bonding of intramolecular can be formed.Thus, good adhesive property is obtained.
Following cracking reaction can occur for example, when the side chain of polyimide film contains ester group, during radiation treatment：
In UV solidifications or during heat cure, the free radical that is generated easily with the second active group（Such as-COOH）Occur
Bonding, so as to realize the high strength bond of sealant and PI films, prevents the puncture of liquid crystal and the precipitation of pollutant.
The display device sealed using the method for the invention described above, following technology and economic effect can be achieved：
（1）By radioreaction, cracking reaction occurs for the surface group of PI films, and it is mutually reciprocal with the active group of sealant
Should, and then adhesion strength is increased, avoid the poor situation generation of liquid crystal punctures, liquid crystal pollution, reliability.
（2）Because sealant is applied only to the sealing opening position of PI layers, the use of sealant is reduced compared with traditional approach
Amount, and adhesion strength will not be reduced, the reliability of display device is not influenceed.
（3）Avoid changing the design of display device, reduce development cost, only changed from manufacturing process, simultaneously
Its equipment applied to and the equipment of current UV solidifications have larger matching, reduce the input in scrap build, have
Larger cost performance.
Embodiment
With PI liquid（polyimide AL-00010）Exemplified by radiation modification is carried out to it.
Using this area conventional method, above-mentioned PI liquid is coated on array base palte and forms PI films, and rubbed orientation position
Reason.Array base palte Jing Guo orientation process is placed on the objective table in radiation precursor.Rotatable stage, and adjust radiation shading
Cover position so that the process part to be irradiated of array base palte（Seal position）Alignd with the light transmission part for radiating light shield.
Wherein, radiation source is uviol lamp, and the wavelength of the linear ultraviolet light sent is 254nm, radiation intensity 1.0J/cm2。
The radiation modification process of above-mentioned PI films is as shown in formula illustrated below：
The cracking reaction of ester group on the side chain of a.PI films
PI films are modified via radiation, the active group in its structure（That is, the signified ester group on side chain of arrow）It is main
To be cracked with cracking mode 1, generate free radical derivative 1, while also there is a small amount of cracking mode 2 routinely to split
Solution, generates free radical derivative 2.
By acrylate sealant（Exemplified by WB73）Sealing position coated in the above-mentioned array base palte by radiation treatment
Place, and routinely carried out with color membrane substrates to techniques such as box, ultra-violet curings, liquid crystal display device is made.In the curing process, pass through
Following bonding process is carried out between PI films and sealant that overshoot is modified：
B. the solidification process of sealant
Surface molecular after c.PI membrane modifyings is bonded with sealant（By taking derivative 1 as an example）.
By the above method, PI films with sealant be no longer by it is traditional based on intermolecular force in a manner of bond,
But it is converted into by the bonding force of chemical bond to bond.Therefore, obvious increase occurs for the cementation between PI films and sealant
By force.
Using above same procedure, radiation treatment can be carried out to the PI films on color membrane substrates, can equally realize color membrane substrates
On PI films and sealant between good sealing.By routine to the technique such as box and solidification, reliability, stably is thus made
The more preferable display device of property.
The evaluation of adhesion strength
Using thickness 0.4T glass substrate, PI liquid is polyimide AL-00010, sealant WB-73, and glue is a width of
0.7mm, using the method for above example（Wherein respectively by radiation treatment and without radiation treatment）Form PI films and envelope frame
The sealing structure of glue.4.5 inches of stripping of measure gained sealing structure（peel off）Data, wherein left side binding part
（pad）With the right binding part（pad）Average peel force >=1.25kgf be OK, otherwise NG.
| Sample | Non- radiation modification | Radiation modification |
| Left side binding part（kgf） | 1.02 | 1.68 |
| The right binding part（kgf） | 1.09 | 1.60 |
| Evaluation result | NG | OK |
It can be seen that by result above, by the sealing method of radiation treatment, the adhesion strength being remarkably reinforced can be obtained.More than
Described is only the exemplary embodiment of the present invention, not for limiting the scope of the invention, protection scope of the present invention
Determined by appended claim.
Claims (11)
- A kind of 1. method for preparing narrow frame display device, it is characterised in that methods described includes：Radiation treatment is located at the polyimide film of the sealing opening position of substrate, makes the polyamides of the sealing opening position positioned at substrate Imines film produces free radical；Sealant is coated in the sealing opening position, and solidified；When carrying out the curing schedule, the second active group of the free radical and the sealant, which is formed, to be chemically bonded, described Second active group is selected from-COOH and-NH2。
- 2. the method according to claim 1 for preparing narrow frame display device, it is characterised in that the polyimide film tool Have and be selected from-COO- ,-OH and-NH2The first active group.
- 3. the method according to claim 1 for preparing narrow frame display device, it is characterised in that the polyimide film tool There is-the COO- on side chain.
- 4. the method according to claim 1 for preparing narrow frame display device, it is characterised in that the radiation treatment hair The radiation source of ray ultraviolet light is carried out.
- 5. the method according to claim 4 for preparing narrow frame display device, it is characterised in that the linear ultraviolet light Wavelength is 254nm, or 313nm, or 254nm and 313nm.
- 6. the method according to claim 5 for preparing narrow frame display device, it is characterised in that the linear ultraviolet light Intensity is 1.0~4.0J/cm2。
- 7. the method according to claim 2 for preparing narrow frame display device, it is characterised in that first active group Produce free radical afterwards via radiation.
- 8. the method according to claim 1 for preparing narrow frame display device, it is characterised in that the substrate is array base Plate or color membrane substrates.
- 9. it is according to claim 1 prepare narrow frame display device method, it is characterised in that methods described be included in into Before the row irradiation treatment step, orientation process is carried out to the polyimide film.
- 10. the method according to claim 4 for preparing narrow frame display device, it is characterised in that the radiation source passes through Radiate sealing position of the light shield to the substrate and carry out radiation treatment.
- 11. the method according to claim 10 for preparing narrow frame display device, it is characterised in that by adjusting the spoke The distance between light shield and the substrate are penetrated, to make the light transmission part and the sealing position of the substrate of the radiation light shield Alignment.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310337313.1A CN104345501B (en) | 2013-08-05 | 2013-08-05 | The method for preparing narrow frame display device |
| PCT/CN2013/089143 WO2015018155A1 (en) | 2013-08-05 | 2013-12-11 | Method for manufacturing display apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310337313.1A CN104345501B (en) | 2013-08-05 | 2013-08-05 | The method for preparing narrow frame display device |
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| CN104345501A CN104345501A (en) | 2015-02-11 |
| CN104345501B true CN104345501B (en) | 2018-01-19 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105700208B (en) * | 2016-04-13 | 2019-07-05 | 京东方科技集团股份有限公司 | A kind of method for manufacturing display panel, display panel and display device |
| CN107884995B (en) * | 2017-12-22 | 2021-06-22 | 苏州华星光电技术有限公司 | Display panel |
| CN110426877B (en) * | 2019-07-08 | 2020-10-27 | 深圳市华星光电技术有限公司 | A narrow-frame display panel and its manufacturing method, and a narrow-frame display device |
| CN111176022B (en) * | 2020-03-12 | 2022-02-22 | Tcl华星光电技术有限公司 | Display panel, preparation method thereof and display device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4391491A (en) * | 1979-05-04 | 1983-07-05 | Ebauches Electroniques, S.A. | Passive electro-optic display cell and method of manufacturing thereof |
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| CN102608811A (en) * | 2012-03-22 | 2012-07-25 | 深圳市华星光电技术有限公司 | Liquid crystal display device and manufacturing method thereof |
| CN102643424A (en) * | 2011-08-25 | 2012-08-22 | 北京京东方光电科技有限公司 | Polyimide, as well as preparation method and application thereof |
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| JP5121432B2 (en) * | 2007-12-11 | 2013-01-16 | キヤノン株式会社 | Liquid crystal display device, manufacturing method thereof, and liquid crystal projection device |
| JP2011064866A (en) * | 2009-09-16 | 2011-03-31 | Canon Inc | Method for manufacturing liquid crystal display element and image display apparatus using the element produced thereby |
| JP5522384B2 (en) * | 2010-04-20 | 2014-06-18 | Ｊｓｒ株式会社 | Manufacturing method of liquid crystal display element |
| JP5238910B1 (en) * | 2011-08-17 | 2013-07-17 | 積水化学工業株式会社 | Sealant for liquid crystal display element and liquid crystal display element |
| CN102629031B (en) * | 2012-04-24 | 2014-08-27 | 深圳市华星光电技术有限公司 | Method for improving PI non-stickness of substrate and PI liquid |
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| US4391491A (en) * | 1979-05-04 | 1983-07-05 | Ebauches Electroniques, S.A. | Passive electro-optic display cell and method of manufacturing thereof |
| CN1841168A (en) * | 2005-03-28 | 2006-10-04 | 精工爱普生株式会社 | Sealing structure, sealing method, liquid crystal device and manufacturing method thereof, projector |
| CN102695732A (en) * | 2009-12-08 | 2012-09-26 | 光学转变公司 | Photoalignment materials having improved adhesion |
| CN102643424A (en) * | 2011-08-25 | 2012-08-22 | 北京京东方光电科技有限公司 | Polyimide, as well as preparation method and application thereof |
| CN102608811A (en) * | 2012-03-22 | 2012-07-25 | 深圳市华星光电技术有限公司 | Liquid crystal display device and manufacturing method thereof |
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| WO2015018155A1 (en) | 2015-02-12 |
| CN104345501A (en) | 2015-02-11 |
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