CN104317094B - Black matrix structure, mask plate, color membrane substrates and display device - Google Patents
Black matrix structure, mask plate, color membrane substrates and display device Download PDFInfo
- Publication number
- CN104317094B CN104317094B CN201410432232.4A CN201410432232A CN104317094B CN 104317094 B CN104317094 B CN 104317094B CN 201410432232 A CN201410432232 A CN 201410432232A CN 104317094 B CN104317094 B CN 104317094B
- Authority
- CN
- China
- Prior art keywords
- black matrix
- pixel
- area
- mask plate
- matrix structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011159 matrix material Substances 0.000 title claims abstract description 97
- 239000000758 substrate Substances 0.000 title claims abstract description 22
- 239000012528 membrane Substances 0.000 title claims abstract description 17
- 238000005452 bending Methods 0.000 claims abstract description 21
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 abstract description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005755 formation reaction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000012141 concentrate Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000007850 degeneration Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The present invention provides a kind of black matrix structure, mask plate, color membrane substrates and display device, belongs to display technology field, and which can solve the problems, such as that existing black matrix structure has error at stitching position and causes to show bad.The black matrix structure of the present invention includes the pixel unit array being made up of many sub- black matrix splicings, and each pixel cell includes pixel openings area and surrounds the black matrix pattern area in pixel openings area, and the splicing line that the two adjacent sub- black matrix are spliced to form is curve；Wherein, the splicing line includes at least one bending unit, width of the bending unit Breadth Maximum in the row direction not less than the pixel cell, the height of maximum height in a column direction more than the black matrix pattern area described in two adjacent lines between pixel openings area.The black matrix and mask plate of the present invention is particularly well-suited in large-sized display device.
Description
Technical field
The invention belongs to display technology field, and in particular to a kind of black matrix structure, mask plate, color membrane substrates and display dress
Put.
Background technology
At present, liquid crystal display (Liquid Crystal Display：Abbreviation LCD) with its excellent performance and maturation
Technology becomes the main product on market.Along with the development of Display Technique, high permeability, large scale low-power consumption, low cost are
Become the developing direction in future display field.
In the preparation process of the color membrane substrates of the liquid crystal display of existing oversize, because substrate size it is larger, it is impossible to
Realize that single exposure forms whole fundamental figure, the exposure technology of whole substrate is realized so as to have to using connecting method.
Under traditional splicing Exposure mode, as the splicing process on splice region both sides is not once to complete, splice region is necessarily caused
Pattern is had differences with the figure of non-splice region.With reference to Fig. 1 and Fig. 2, especially by the black matrix that splicing Exposure mode is formed
Figure, also just say black matrix structure by the pixel unit array that constitutes of splicing of sub- black matrix 100, wherein, each pixel list
Unit 10 includes pixel openings area 11 and surrounds the black matrix pattern area 12 in pixel openings area 11, and two sub- black matrix 100 are spliced to form
Splicing line 20 be located at two row pixel cells 10 pixel openings area 11 between black matrix pattern area 12 at it is in alignment, such as
Shown in Fig. 1；Or be located at through certain string pixel openings area 11, it is in alignment, as shown in Fig. 2 due to sub- black matrix 100
Stitching position certainly exists inevitable error, so that the width in the black matrix pattern area 12 of 20 region of splicing line
The width a in the black matrix pattern area 12 between B and the pixel openings area 11 of two adjacent column pixel cells is different, or is spliced
Pixel openings area 11 width d it is different from the width c in the pixel openings area 11 for not having to splice, and stitching position concentrates on one
On straight line, therefore produce bad position and concentrate point-blank, and then cause to show bad, serious impact picture quality.
The content of the invention
The technical problem to be solved includes, for the above-mentioned problem that existing black matrix structure is present, carries
Black matrix structure stitching portion is avoided to cause to show bad black matrix structure, mask plate, color membrane substrates and display device for a kind of.
The technical scheme adopted by solution present invention problem is a kind of black matrix structure, including by many sub- black matrix
The pixel unit array of splicing composition, each pixel cell include pixel openings area and surround the black matrix pattern in pixel openings area
Area, and the splicing line that the two adjacent sub- black matrix are spliced to form is curve；Wherein, the splicing line includes at least one bending
Unit, width of the bending unit Breadth Maximum in the row direction not less than the pixel cell, in a column direction most
Height of the big height more than the black matrix pattern area described in two adjacent lines between pixel openings area.
It should be noted that " pixel unit array " in the present invention refers to multiple pixels of the arrangement embarked on journey in column
Unit." line direction " refers to horizontal direction as shown in Figure 3,4, and " column direction " then refers to the direction vertical with line direction, i.e., as schemed
3rd, the vertical direction shown in 4.
The splicing line that two sub- black matrix in the black matrix structure of the present invention are spliced to form is curve, therefore can be avoided existing
Technology is concentrated point-blank due to splicing line, and the display for causing is bad.Specifically, it is positioned at black matrix pattern with splicing line
Width of the width on the square wave in area, and the line direction of the bending unit of the square wave for pixel cell, the height of column direction
Illustrate as a example by height for two row pixel cells, in prior art splicing line be positioned at the straight line in black matrix pattern area when,
Due to the error of sub- black matrix splicing, it will have influence on the size of the pixel cell located at adjacent with the splicing line two row, change speech
It, the adjacent pixel cell of each two in this two row pixel cell splicing line position cause it is bad be equivalent to a point,
So this two row pixel cell produce it is bad draw a straight line a little on, thus will have a strong impact in display aobvious
Show quality.And the splicing line of the square wave, be dispersed between three adjacent row pixel cells, wherein two adjacent column pixel cells it
Between due to splicing produce it is bad be equivalent to a point, the stitching position of this three row pixel cell produces the point of bad formation
Link together as a curve, while these bad points are not concentrated on a line yet, but it is scattered, therefore aobvious
Large effect will not be caused to the quality for showing when showing.Even if in the same manner when the part in splicing line is located at pixel openings area,
Be also what is be dispersed due to splicing the bad of bad student, therefore be also large effect will not to be caused to display quality.
Preferably, the splicing line is located at the black matrix pattern area.
It may further be preferable that the splicing line includes the multiple bending units for linking together, each described bending is single
Unit's Breadth Maximum in the row direction is equal to the width of N number of pixel cell, and height in a column direction is equal to the M picture
The height sum of plain unit, wherein N are that M is the integer more than or equal to 2 more than the integer for waiting 1.
Preferably, the splicing line is at least partially disposed at the pixel openings area.
Preferably, the bending unit be square wave, sawtooth waveforms, any one in sine wave.
It is a kind of mask plate to solve the technical scheme that adopted of present invention problem, and the mask plate is used to form above-mentioned black
Matrix pattern.
Preferably, the mask plate include alternatively non-transparent district corresponding with pixel openings area described in the sub- black matrix and
Transparent area corresponding with the black matrix pattern area.
Preferably, the mask plate include transparent area corresponding with pixel openings area described in the sub- black matrix and with
The corresponding alternatively non-transparent district in the black matrix pattern area.
The technical scheme adopted by solution present invention problem is a kind of color membrane substrates, and the color membrane substrates include above-mentioned black
Matrix structure.
It is a kind of display device to solve the technical scheme that adopted of present invention problem, and the display device includes above-mentioned coloured silk
Ilm substrate.
Description of the drawings
Fig. 1 is a kind of splicing schematic diagram of existing black matrix structure；
Fig. 2 is another kind of splicing schematic diagram of existing black matrix structure；
A kind of splicing schematic diagrams of the Fig. 3 for the black matrix structure of embodiments of the invention 1；
Another kind of splicing schematic diagrams of the Fig. 4 for the black matrix structure of embodiments of the invention 1；
A kind of structural representations of the Fig. 5 for the mask plate of embodiments of the invention 2；
Another kind of structural representations of the Fig. 6 for the mask plate of embodiments of the invention 2.
Wherein reference is：100th, sub- black matrix；10th, pixel cell；11st, pixel openings area；12nd, black matrix pattern
Area；20th, splicing line；31st, transparent area；32nd, alternatively non-transparent district.
Specific embodiment
To make those skilled in the art more fully understand technical scheme, below in conjunction with the accompanying drawings and specific embodiment party
Formula is described in further detail to the present invention.
Embodiment 1：
The present embodiment provides a kind of black matrix structure, and which includes the pixel cell being made up of many splicings of sub- black matrix 100
10 arrays, each pixel cell 10 include pixel openings area 11 and surround the black matrix pattern area 12 in pixel openings area 11, and two
The splicing line 20 that the adjacent sub- black matrix 100 is spliced to form is curve；Wherein, the splicing line 20 includes at least one bending
Unit, width of the bending unit Breadth Maximum in the row direction not less than the pixel cell 10, in a column direction
Height of the maximum height more than the black matrix pattern area 12 described in two adjacent lines between pixel openings area 11.
The splicing line 20 that two sub- black matrix 100 in the black matrix structure of the present embodiment are spliced to form is curve, therefore can be with
Prior art is avoided to concentrate the display for point-blank, causing bad due to splicing line 20.Specifically, with splicing line 20 as position
In the square wave in black matrix pattern area 12, and the width on the line direction of the bending unit of the square wave is the width of pixel cell 10
Degree, the height of column direction be two row pixel cells 10 height as a example by illustrate, in prior art, splicing line 20 is positioned at black
During the straight line in matrix pattern area 12, due to the error of the splicing of sub- black matrix 100, it will have influence on located at adjacent with the splicing line 20
The size of the pixel cells 10 of two row, in other words, the adjacent pixel cell 10 of each two in this two row pixel cell 10 is being spelled
20 position of wiring cause it is bad be equivalent to a point, so this two row pixel cell 10 produce bad be linked to be a little one
On bar straight line, thus display quality will be had a strong impact on when showing.And the splicing line 20 of the square wave, it is dispersed in adjacent three
Between row pixel cell 10, wherein bad being equivalent to one due to what splicing was produced between two adjacent column pixel cells 10
Point, the stitching position of this three row pixel cell 10 produce the point of bad formation and link together as a curve, while these are not
Good point is not concentrated on a line yet, but scattered, therefore will not cause larger to the quality for showing when showing
Affect.Even if in the same manner when the part in splicing line 20 is located at pixel openings area 11, being also to be divided due to splicing the bad of bad student
Scatter, therefore be also large effect will not to be caused to display quality.
As a kind of optimal way of the present embodiment, the splicing line that the sub- black matrix 100 of the black matrix structure is spliced to form
20 is positioned at black matrix pattern area 12.Now black matrix pattern area 12 is alternatively non-transparent district 32, should be produced less at the position
Deviation, to show when impact compared with transparent area 31 for it is relatively small.It is further preferred that the black matrix knot in the present embodiment
The splicing line 20 that the sub- black matrix 100 of structure is spliced to form includes the multiple bending units for linking together, and each described bending is single
Unit's Breadth Maximum in the row direction is equal to the width of N number of pixel cell 10, and height in a column direction is described equal to M
The height sum of pixel cell 10, wherein N are the integer more than or equal to 1, and M is the integer more than or equal to 2.Now in splicing not
The size heterogeneity in each pixel openings area 11 can be caused, it is to avoid the impact to showing homogeneity.
Specifically, as shown in figure 3, the splicing line 20 that the sub- black matrix 100 of black matrix structure is spliced to form is positioned at black square
System of battle formations case area 12, and splicing line 20 is located at the black matrix image district of three row pixel cells 10, i.e. each described bending unit exists
Breadth Maximum on line direction is equal to the width of 2 pixel cells 10, and height in a column direction is equal to 2 pixels
The height sum of unit 10, if regarding a point as bad with the display of two adjacent pixel cells 10 of stitching position, now
Multiple points are distributed to the stitching position in three row pixel cells 10, and positioned between points more sparse of same row, because
This will not be impacted to display quality.In the same manner, as shown in figure 4, splicing line 20 is located at the black matrix figure of four row pixel cells 10
As area, i.e. each bending unit Breadth Maximum in the row direction are equal to the width of 2 pixel cells 10, in row side
Height upwards be equal to 3 pixel cells 10 height sum, if with two adjacent pixel cells 10 of stitching position
Display it is bad regard a point as, be now not only located at same row between points more sparse, and point in the row direction
It is also more sparse between point, therefore equally will not be to impacting to display quality.
As another kind of optimal way of the present embodiment, the splicing that the sub- black matrix 100 of the black matrix structure is spliced to form
Line 20 is positioned at pixel openings area 11.The splicing principle of this kind of connecting method is to be located at black matrix pattern area 12 with splicing line 20
Identical, is not described here in detail.
Preferably, the bending unit in the present embodiment can be with square wave, sawtooth waveforms, sine wave, due to the figure of these three
It is more regular and regular, therefore be stitched together and be relatively easy to, other figures are also feasible certainly.
Embodiment 2：
The present embodiment provides a kind of mask plate, for forming the pattern of the sub- black matrix 100 in embodiment 1.
As shown in figure 5, as a kind of preferred structure of the present embodiment, the mask plate include with the sub- black matrix 100
11 corresponding alternatively non-transparent district 32 of the pixel openings area and with 12 corresponding transparent area 31 of the black matrix pattern area.Now require
Negative photoresist is coated in the substrate for forming black matrix material film, using the mask board to explosure so that positioned at black square
The photoresist degeneration in system of battle formations case area 12；Then the photoresist positioned at 11 position of pixel openings area is removed by developer solution；Go again
Remove the black matrix material film at 11 position of pixel openings area；Remaining photoresist is finally peeled away away, is formed in embodiment 1
Sub- black matrix 100 pattern.
As shown in fig. 6, used as another kind of preferred structure of the present embodiment, the mask plate includes and the sub- black matrix 100
Described in 11 corresponding transparent area 31 of pixel openings area and with 12 corresponding alternatively non-transparent district 32 of the black matrix pattern area.Now to
Ask and positive photoresist is coated in the substrate for forming black matrix material film, using the mask board to explosure so that positioned at picture
The photoresist degeneration of plain open region 11；Then the photoresist positioned at 11 position of pixel openings area is removed by developer solution；Go again
Remove the black matrix material film at 11 position of pixel openings area；Remaining photoresist is finally peeled away away, is formed in embodiment 1
Sub- black matrix 100 pattern.
Embodiment 3：
A kind of color membrane substrates are present embodiments provided, the color membrane substrates include black matrix structure in embodiment 1, therefore this enforcement
The performance of the color membrane substrates of example is more preferable.
Certain color membrane substrates known structure also including colored filter etc., here are not illustrated one by one.
Embodiment 4：
A kind of display device is present embodiments provided, which includes the color membrane substrates described in embodiment 3.The display device can be with
For：Mobile phone, panel computer, television set, display, notebook computer, DPF, navigator etc. are any with display function
Product or part.
As the display device of the present embodiment includes the color membrane substrates of embodiment 3, therefore its display effect is more preferable.
Certainly, other conventional structures, such as display driver element etc. can also be included in the display device of the present embodiment.
It is understood that the embodiment of above principle being intended to be merely illustrative of the present and the exemplary enforcement for adopting
Mode, but the invention is not limited in this.For those skilled in the art, in the essence without departing from the present invention
In the case of god and essence, various modifications and improvement can be made, these modifications and improvement are also considered as protection scope of the present invention.
Claims (10)
1. a kind of black matrix structure, it is characterised in that include the pixel unit array being made up of many sub- black matrix splicings, each
Pixel cell includes pixel openings area and surrounds the black matrix pattern area in pixel openings area, and the two adjacent sub- black matrix splicings
The splicing line of formation is curve；Wherein, the splicing line includes at least one bending unit, and the bending unit is in the row direction
Breadth Maximum not less than the pixel cell width, the height of maximum height in a column direction more than two adjacent pixel units
Degree sum.
2. black matrix structure according to claim 1, it is characterised in that the splicing line is located at the black matrix pattern
Area.
3. black matrix structure according to claim 2, it is characterised in that it is multiple that the splicing line includes linking together
Bending unit, each bending unit Breadth Maximum in the row direction are equal to the width of N number of pixel cell, in row side
Height sum of the height upwards equal to the M pixel cell, wherein N is the integer more than or equal to 1, and M is more than or equal to 2
Integer.
4. black matrix structure according to claim 1, it is characterised in that the splicing line is at least partially disposed at the pixel
Open region.
5. the black matrix structure according to any one in Claims 1-4, it is characterised in that the bending unit is square
Any one in shape ripple, sawtooth waveforms, sine wave.
6. a kind of mask plate, it is characterised in that for being formed in the black matrix structure in claim 1 to 5 described in any one
Sub- black matrix pattern.
7. mask plate according to claim 6, it is characterised in that the mask plate include with described in the sub- black matrix
The corresponding alternatively non-transparent district in pixel openings area and transparent area corresponding with the black matrix pattern area.
8. mask plate according to claim 6, it is characterised in that the mask plate include with described in the sub- black matrix
The corresponding transparent area in pixel openings area and alternatively non-transparent district corresponding with the black matrix pattern area.
9. a kind of color membrane substrates, it is characterised in that the color membrane substrates include black described in any one in claim 1 to 5
Matrix structure.
10. a kind of display device, it is characterised in which includes the color membrane substrates described in claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410432232.4A CN104317094B (en) | 2014-08-28 | 2014-08-28 | Black matrix structure, mask plate, color membrane substrates and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410432232.4A CN104317094B (en) | 2014-08-28 | 2014-08-28 | Black matrix structure, mask plate, color membrane substrates and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104317094A CN104317094A (en) | 2015-01-28 |
| CN104317094B true CN104317094B (en) | 2017-03-29 |
Family
ID=52372346
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410432232.4A Active CN104317094B (en) | 2014-08-28 | 2014-08-28 | Black matrix structure, mask plate, color membrane substrates and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104317094B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405924A (en) * | 2016-11-11 | 2017-02-15 | 深圳市华星光电技术有限公司 | Black matrix photomask, black matrix production method and display panel |
| CN107065428B (en) * | 2016-12-29 | 2021-01-15 | Tcl华星光电技术有限公司 | Spliced unit photomask for forming color resistance layer and black matrix |
| CN107145034B (en) * | 2017-06-23 | 2020-11-27 | 武汉华星光电技术有限公司 | Half-tone mask plate |
| CN107290909B (en) * | 2017-06-30 | 2020-09-29 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal display panel |
| CN107329364B (en) * | 2017-07-20 | 2020-06-05 | 武汉华星光电技术有限公司 | Light shielding layer, color filter and display panel |
| TWI700846B (en) * | 2019-03-11 | 2020-08-01 | 佳世達科技股份有限公司 | Display device and manufacturing method for the same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202177777U (en) * | 2011-05-16 | 2012-03-28 | 京东方科技集团股份有限公司 | Mask plate for LCD |
| CN102629016A (en) * | 2011-05-19 | 2012-08-08 | 京东方科技集团股份有限公司 | Color film structure, manufacturing method of color film structure and liquid crystal display applying color film structure |
| CN103033975A (en) * | 2012-12-12 | 2013-04-10 | 京东方科技集团股份有限公司 | Mask plate and method for composing a picture with same |
| CN103268037A (en) * | 2013-05-15 | 2013-08-28 | 京东方科技集团股份有限公司 | Color filter substrate, manufacturing method of color filter substrate and display device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101068285B1 (en) * | 2004-09-13 | 2011-09-28 | 엘지디스플레이 주식회사 | LCD display exposure mask pattern and exposure method |
-
2014
- 2014-08-28 CN CN201410432232.4A patent/CN104317094B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202177777U (en) * | 2011-05-16 | 2012-03-28 | 京东方科技集团股份有限公司 | Mask plate for LCD |
| CN102629016A (en) * | 2011-05-19 | 2012-08-08 | 京东方科技集团股份有限公司 | Color film structure, manufacturing method of color film structure and liquid crystal display applying color film structure |
| CN103033975A (en) * | 2012-12-12 | 2013-04-10 | 京东方科技集团股份有限公司 | Mask plate and method for composing a picture with same |
| CN103268037A (en) * | 2013-05-15 | 2013-08-28 | 京东方科技集团股份有限公司 | Color filter substrate, manufacturing method of color filter substrate and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104317094A (en) | 2015-01-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104317094B (en) | Black matrix structure, mask plate, color membrane substrates and display device | |
| CN103268037B (en) | A kind of color membrane substrates, preparation method and display device | |
| CN102062979B (en) | Pixel electrode and relevant liquid crystal display panel thereof | |
| CN104407469A (en) | Cambered liquid crystal display panel and cambered liquid crystal display device | |
| CN104575322A (en) | Plane display panel and display device | |
| CN206400216U (en) | A kind of color membrane substrates and display device | |
| US9091879B2 (en) | Liquid crystal display panel and liquid crystal display apparatus | |
| CN103472614B (en) | A kind of display floater and preparation method thereof, display | |
| KR20140008338A (en) | Liquid crystal display substrate and liquid crystal display device | |
| KR20120034202A (en) | Information displaying panel | |
| CN107741669A (en) | Liquid crystal display panel and its manufacture method | |
| CN106125394A (en) | A kind of virtual curved face display floater, display device and display packing | |
| CN103412441A (en) | Array substrate, color-filter substrate, display device and manufacturing method of orientation layers | |
| CN108614374A (en) | A kind of flexible liquid crystal panel and flexible liquid crystal display | |
| CN104423096A (en) | Liquid crystal display panel | |
| CN107068099A (en) | Display panel and display device | |
| CN105869597A (en) | Pixel structure and corresponding LCD (Liquid Crystal Display) panel | |
| CN106527041A (en) | Mask and exposure method thereof and liquid crystal display panel | |
| CN105182620A (en) | Pixel structure and drive method, display panel and display device | |
| CN105487299A (en) | Display baseplate as well as manufacture method and display device thereof | |
| CN105607338B (en) | Display base plate and its manufacturing method and display device | |
| TWI691759B (en) | Display device | |
| KR20160059548A (en) | Curved liquid crystal display | |
| CN103076696B (en) | A kind of display device, colored filter and preparation method thereof | |
| CN103777399A (en) | Color film substrate and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |