CN104317094B - Black matrix structure, mask plate, color membrane substrates and display device - Google Patents

Abstract

The invention provides a black matrix structure, a mask plate, a color filter substrate and a display device, which belong to the field of display technology and can solve the problem of poor display caused by errors in splicing positions in the existing black matrix structure. The black matrix structure of the present invention includes a pixel unit array composed of multiple sub-black matrices, each pixel unit includes a pixel opening area and a black matrix pattern area surrounding the pixel opening area, and two adjacent sub-black matrices are formed by splicing The splicing line is a curve; wherein, the splicing line includes at least one curved unit, the maximum width of the curved unit in the row direction is not less than the width of the pixel unit, and the maximum height in the column direction is greater than that of two adjacent rows. The height of the black matrix pattern area between the pixel opening areas. The black matrix and mask plate of the present invention are especially suitable for large-scale display devices.

Description

Black matrix structure, mask plate, color filter substrate and display device

technical field

The invention belongs to the field of display technology, and in particular relates to a black matrix structure, a mask plate, a color filter substrate and a display device.

Background technique

Currently, Liquid Crystal Display (LCD for short) has become a mainstream product in the market due to its excellent performance and mature technology. With the development of display technology, high transmittance, large size, low power consumption, and low cost have become the development direction of the display field in the future.

In the process of preparing the color filter substrate of the existing ultra-large-sized liquid crystal display, due to the large size of the substrate, it is impossible to form the entire basic pattern with a single exposure, so a splicing method has to be used to realize the exposure process of the entire substrate. In the traditional splicing exposure method, because the splicing process on both sides of the splicing area is not completed at one time, there will inevitably be differences between the pattern of the splicing area and the pattern of the non-splicing area. 1 and 2, especially the black matrix pattern formed by splicing exposure, that is to say, the black matrix structure is an array of pixel units composed of sub-black matrices 100 spliced, wherein each pixel unit 10 includes a pixel opening area 11 With the black matrix pattern area 12 surrounding the pixel opening area 11, the splicing line 20 formed by splicing two sub-black matrices 100 is located in the black matrix pattern area 12 between the pixel opening areas 11 of the two columns of pixel units 10 to form a straight line, as shown in the figure 1; or located in a straight line through the pixel opening area 11 of a certain column, as shown in Figure 2, since the splicing position of the sub-black matrix 100 must have unavoidable errors, so that the black matrix pattern in the area where the splicing line 20 is located The width B of the area 12 is different from the width a of the black matrix pattern area 12 between the pixel opening areas 11 of two adjacent columns of pixel units, or the width d of the spliced pixel opening area 11 is different from that of the pixel opening area 11 without splicing. The width c is different, and the splicing positions are concentrated on a straight line, so the bad positions are concentrated on a straight line, which leads to bad display and seriously affects the picture quality.

Contents of the invention

The technical problems to be solved by the present invention include, aiming at the above-mentioned problems existing in the existing black matrix structure, providing a black matrix structure, a mask plate, a color filter substrate and a display device that avoid poor display caused by splicing of the black matrix structure.

The technical solution adopted to solve the technical problem of the present invention is a black matrix structure, including a pixel unit array composed of multiple sub-black matrices, each pixel unit includes a pixel opening area and a black matrix pattern area surrounding the pixel opening area, and The splicing line formed by splicing two adjacent sub-black matrices is a curve; wherein, the splicing line includes at least one curved unit, and the maximum width of the curved unit in the row direction is not less than the width of the pixel unit, and in the column direction The maximum height on the top is greater than the height of the black matrix pattern area between the pixel opening areas in two adjacent rows.

It should be noted that the “pixel unit array” in the present invention refers to a plurality of pixel units arranged in rows and columns. "Row direction" refers to the horizontal direction as shown in Figures 3 and 4, and "column direction" refers to the direction perpendicular to the row direction, that is, the vertical direction as shown in Figures 3 and 4.

In the black matrix structure of the present invention, the splicing line formed by splicing two sub-black matrices is a curve, so it can avoid poor display caused by splicing lines concentrated on a straight line in the prior art. Specifically, the splicing line is a rectangular wave located in the black matrix pattern area, and the width of the curved unit of the rectangular wave in the row direction is the width of the pixel unit, and the height in the column direction is the height of two rows of pixel units. In the prior art, when the splicing line is a straight line located in the black matrix pattern area, the size of the pixel units located in two adjacent columns to the splicing line will be affected due to the splicing error of the sub-black matrix. In other words, the pixels of the two columns Every two adjacent pixel units in the unit cause a defect at the position of the splicing line, which is equivalent to a point, so all the points caused by the two columns of pixel units are connected in a straight line, which will seriously affect the display during display. quality. The splicing line of the rectangular wave is scattered between three adjacent columns of pixel units, and the defect caused by splicing between two adjacent columns of pixel units is equivalent to a point, and the splicing position of these three columns of pixel units produces The badly formed points are connected together to form a curve, and these bad points will not be concentrated on a line, but scattered, so the display quality will not be greatly affected. Similarly, even when a part of the splicing line is located in the pixel opening area, the defects caused by poor splicing will be dispersed, so the display quality will not be greatly affected.

Preferably, the stitching line is located in the black matrix pattern area.

Further preferably, the stitching line includes a plurality of curved units connected together, the maximum width of each curved unit in the row direction is equal to the width of N pixel units, and the height in the column direction is equal to M The sum of the heights of the pixel units, wherein N is an integer greater than or equal to 1, and M is an integer greater than or equal to 2.

Preferably, the stitching line is at least partially located in the pixel opening area.

Preferably, the bending unit is any one of rectangular wave, sawtooth wave and sine wave.

The technical solution adopted to solve the technical problem of the present invention is a mask plate, which is used to form the above-mentioned black matrix pattern.

Preferably, the mask includes a non-light-transmitting area corresponding to the pixel opening area in the sub-black matrix and a light-transmitting area corresponding to the black matrix pattern area.

Preferably, the mask includes a light-transmitting area corresponding to the pixel opening area in the sub-black matrix and a non-light-transmitting area corresponding to the black matrix pattern area.

The technical solution adopted to solve the technical problem of the present invention is a color filter substrate, which includes the above-mentioned black matrix structure.

The technical solution adopted to solve the technical problem of the present invention is a display device, which includes the above-mentioned color filter substrate.

Description of drawings

Fig. 1 is a kind of mosaic schematic diagram of existing black matrix structure;

Fig. 2 is another splicing diagram of the existing black matrix structure;

Fig. 3 is a kind of mosaic schematic diagram of the black matrix structure of embodiment 1 of the present invention;

Fig. 4 is another splicing diagram of the black matrix structure of Embodiment 1 of the present invention;

5 is a schematic structural view of a mask plate in Embodiment 2 of the present invention;

FIG. 6 is a schematic diagram of another structure of the mask plate according to Embodiment 2 of the present invention.

Wherein reference signs are: 100, sub-black matrix; 10, pixel unit; 11, pixel opening area; 12, black matrix pattern area; 20, stitching line; 31, light-transmitting area; 32, non-light-transmitting area.

detailed description

In order to enable those skilled in the art to better understand the technical solutions of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

Example 1:

This embodiment provides a black matrix structure, which includes an array of pixel units 10 spliced by a plurality of sub-black matrices 100, each pixel unit 10 includes a pixel opening area 11 and a black matrix pattern area 12 surrounding the pixel opening area 11, and The splicing line 20 formed by splicing two adjacent sub-black matrices 100 is a curve; wherein, the splicing line 20 includes at least one curved unit, and the maximum width of the curved unit in the row direction is not less than the width of the pixel unit 10 , the maximum height in the column direction is greater than the height of the black matrix pattern area 12 between the pixel opening areas 11 in two adjacent rows.

In the black matrix structure of this embodiment, the splicing line 20 formed by splicing the two sub-black matrices 100 is a curved line, so that poor display caused by the concentrating of the splicing lines 20 on a straight line in the prior art can be avoided. Specifically, the splicing line 20 is a rectangular wave located in the black matrix pattern area 12, and the width of the curved unit of the rectangular wave in the row direction is the width of the pixel unit 10, and the height in the column direction is two rows of pixel units 10. The height of the pixel unit 10 is For example, when the splicing line 20 in the prior art is a straight line located in the black matrix pattern area 12, the error in splicing of the sub-black matrix 100 will affect the pixel units 10 located in two columns adjacent to the splicing line 20. In other words, every two adjacent pixel units 10 in these two columns of pixel units 10 cause defects at the splicing line 20, which is equivalent to one point, so all the defective points generated by these two columns of pixel units 10 are connected to form On a straight line, it will seriously affect the display quality when displaying. The splicing line 20 of the rectangular wave is scattered between the three adjacent pixel units 10, wherein the defect caused by splicing between two adjacent columns of pixel units 10 is equivalent to one point, and the three columns of pixel units 10 The poorly formed points of the splicing position are connected together into a curve, and these bad points will not be concentrated on a line, but scattered, so the display quality will not be greatly affected. . Similarly, even when a part of the splicing line 20 is located in the pixel opening area 11 , the defects caused by poor splicing are dispersed, and therefore, the display quality will not be greatly affected.

As a preferred manner of this embodiment, the splicing line 20 formed by splicing the sub-black matrices 100 of the black matrix structure is located in the black matrix pattern area 12 . At this time, the black matrix pattern area 12 is the non-transmissive area 32 , and there is a small deviation at this position, which has relatively less impact on display than the light-transmissive area 31 . Further preferably, the splicing line 20 formed by splicing the sub-black matrices 100 of the black matrix structure in this embodiment includes a plurality of curved units connected together, and the maximum width of each curved unit in the row direction is equal to N said The width of the pixel unit 10 and the height in the column direction are equal to the sum of the heights of M pixel units 10 , wherein N is an integer greater than or equal to 1, and M is an integer greater than or equal to 2. At this time, the size of each pixel opening area 11 will not be non-uniform during splicing, so as to avoid the influence on display uniformity.

Specifically, as shown in FIG. 3 , the splicing line 20 formed by splicing the sub-black matrices 100 of the black matrix structure is located in the black matrix pattern area 12, and the splicing line 20 is located in the black matrix image area of the three-column pixel unit 10, that is, every The maximum width of each of the curved units in the row direction is equal to the width of the two pixel units 10, and the height in the column direction is equal to the sum of the heights of the two pixel units 10, if two adjacent to the splicing position The display defect of the pixel unit 10 is regarded as a point, and at this time, multiple points are scattered to the splicing positions in the three-column pixel unit 10, and the points between the points in the same column are relatively sparse, so it will not affect the display quality. influences. Similarly, as shown in FIG. 4, the stitching line 20 is located in the black matrix image area of four columns of pixel units 10, that is, the maximum width of each curved unit in the row direction is equal to the width of two pixel units 10. The height in the direction is equal to the sum of the heights of the three pixel units 10. If the poor display of the two adjacent pixel units 10 at the splicing position is regarded as a point, not only the pixels located between the points in the same column It is relatively sparse, and the points between points in the row direction are also relatively sparse, so it will not affect the display quality.

As another preferred manner of this embodiment, the splicing line 20 formed by splicing the sub-black matrices 100 of the black matrix structure is located in the pixel opening area 11 . The splicing principle of this splicing method is the same as that of the splicing line 20 located in the black matrix pattern area 12 , which will not be described in detail here.

Preferably, the bending unit in this embodiment can be a rectangular wave, a sawtooth wave, and a sine wave. Since these three patterns are relatively regular and regular, it is relatively easy to splice them together. Of course, other patterns are also feasible.

Example 2:

This embodiment provides a mask for forming the pattern of the sub-black matrix 100 in the first embodiment.

As shown in Figure 5, as a preferred structure of this embodiment, the mask includes a non-transparent region 32 corresponding to the pixel opening region 11 in the sub-black matrix 100 and a pattern region corresponding to the black matrix pattern. 12 corresponds to the transparent area 31. At this time, it is required to coat a negative photoresist on the substrate forming the black matrix material film, and use the mask to expose, so that the photoresist located in the black matrix pattern area 12 will be denatured; Removing the photoresist at position 11; removing the black matrix material film at position 11 of the pixel opening area; finally stripping off the remaining photoresist to form the pattern of the sub-black matrix 100 in the first embodiment.

As shown in Figure 6, as another preferred structure of this embodiment, the mask includes a light-transmitting area 31 corresponding to the pixel opening area 11 in the sub-black matrix 100 and a light-transmitting area 31 corresponding to the black matrix pattern area. 12 corresponds to the non-transparent region 32. At this time, it is required to coat a positive photoresist on the substrate forming the black matrix material film, and use the mask to expose, so that the photoresist located in the pixel opening area 11 will be denatured; Remove the photoresist at the position; then remove the black matrix material film at the position of the pixel opening area 11; finally strip off the remaining photoresist to form the pattern of the sub-black matrix 100 in the first embodiment.

Example 3:

This embodiment provides a color filter substrate, which includes the black matrix structure in Embodiment 1, so the performance of the color filter substrate in this embodiment is better.

Of course, the color filter substrate also includes known structures such as color filters, which will not be described here.

Example 4:

This embodiment provides a display device, which includes the color filter substrate described in Embodiment 3. The display device may be any product or component with a display function such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, and the like.

Since the display device of this embodiment includes the color filter substrate of Embodiment 3, its display effect is better.

Certainly, the display device of this embodiment may also include other conventional structures, such as a display driving unit and the like.

It can be understood that, the above embodiments are only exemplary embodiments adopted for illustrating the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.

Claims (10)

1. a kind of black matrix structure, it is characterised in that include the pixel unit array being made up of many sub- black matrix splicings, each Pixel cell includes pixel openings area and surrounds the black matrix pattern area in pixel openings area, and the two adjacent sub- black matrix splicings The splicing line of formation is curve；Wherein, the splicing line includes at least one bending unit, and the bending unit is in the row direction Breadth Maximum not less than the pixel cell width, the height of maximum height in a column direction more than two adjacent pixel units Degree sum.

2. black matrix structure according to claim 1, it is characterised in that the splicing line is located at the black matrix pattern Area.

3. black matrix structure according to claim 2, it is characterised in that it is multiple that the splicing line includes linking together Bending unit, each bending unit Breadth Maximum in the row direction are equal to the width of N number of pixel cell, in row side Height sum of the height upwards equal to the M pixel cell, wherein N is the integer more than or equal to 1, and M is more than or equal to 2 Integer.

4. black matrix structure according to claim 1, it is characterised in that the splicing line is at least partially disposed at the pixel Open region.

5. the black matrix structure according to any one in Claims 1-4, it is characterised in that the bending unit is square Any one in shape ripple, sawtooth waveforms, sine wave.

6. a kind of mask plate, it is characterised in that for being formed in the black matrix structure in claim 1 to 5 described in any one Sub- black matrix pattern.

7. mask plate according to claim 6, it is characterised in that the mask plate include with described in the sub- black matrix The corresponding alternatively non-transparent district in pixel openings area and transparent area corresponding with the black matrix pattern area.

8. mask plate according to claim 6, it is characterised in that the mask plate include with described in the sub- black matrix The corresponding transparent area in pixel openings area and alternatively non-transparent district corresponding with the black matrix pattern area.

9. a kind of color membrane substrates, it is characterised in that the color membrane substrates include black described in any one in claim 1 to 5 Matrix structure.

10. a kind of display device, it is characterised in which includes the color membrane substrates described in claim 9.