CN104266792B - A kind of micro-nano force value standard set-up based on electromagnetic compensation balance and source tracing method thereof - Google Patents

Abstract

The invention provides a micro-nano force value standard device based on an electromagnetic compensation balance and a traceability method thereof, comprising: an electromagnetic compensation balance for measuring tiny force values; a load column installed in the middle of the electromagnetic compensation balance, and a contactor Micro-motion table, connected with the tested micro-cantilever or micro-force sensor through the cantilever beam installation rod, used to make the measured micro-cantilever or micro-force sensor move linearly along the Z axis; cantilever position coarse adjustment unit, connected with the micro-motion table , used to realize the displacement adjustment of the micro-motion stage in the X-axis, Y-axis, and Z-axis directions, and the angle adjustment in the X-axis and Y-axis directions; in the traceability method, the cantilever is corrected by using the electromagnetic compensation balance stiffness and the installation angle of the measured microcantilever Elastic constant, or use the installation angle of the micro force sensor to correct the force value sensitivity of the micro force sensor. The invention improves the positioning accuracy of the measured micro-cantilever or micro-force sensor, and corrects the elastic constant of the cantilever and the sensitivity of the force value of the micro-force sensor to make the result more accurate.

Description

A micro-nano force value standard device based on electromagnetic compensation balance and its traceability method

technical field

The invention relates to the field of measurement and testing of micro-force values, in particular to a micro-nano force value standard device based on an electromagnetic compensation balance and a traceability method thereof.

Background technique

With the continuous development of micro-nano technology, new materials, biology, microelectronics and other fields have an increasing demand for micro-force measurement. The elastic constant of the atomic force microscope micro-cantilever used in the study of nanomechanical properties of materials and the force value of the tiny force sensor in the nanomechanical measurement system need to be traced to the source. At present, the micro-nano force value traceability system in my country is still blank, and there is still a lack of measurement standard devices and effective traceability methods traceable to the SI unit (nN-mN) range in China. Under the existing technical conditions, all kinds of users, instrument manufacturers and research institutions can only use a variety of methods based on different principles to measure small force values, which cannot be traced to the SI unit. Therefore, the accuracy of the measurement results of material mechanical properties Low and highly dispersed, the product quality of micro-nano devices/micro-nano systems in related fields in my country cannot be guaranteed, and it has become a bottleneck for the development of my country's micro-nano technology products to high-end.

In order to reproduce and transmit micro-nano force values, some foreign metrology research institutions have developed and established micro-nano force value standard devices in the past ten years. In the measurement range of micronewton and nanonewton, two methods are usually adopted according to the principle of reappearance of force value. One is a mass-based method. The micro-force standard device consists of a three-dimensional linear motion stage (displacement coarse adjustment unit), a one-dimensional piezoelectric ceramic micro-motion stage (displacement fine adjustment) and an electromagnetic compensation balance (mass comparator). The measured micro-cantilever or micro-nano force sensor is installed on the piezoelectric ceramic micro-motion stage. The sensor moves along a straight line with the micro-motion stage at a certain displacement interval, and its probe tip is in contact with the mark of the mass comparator until the maximum force is applied. The computer measurement and control system precisely controls the displacement of the micro-motion stage, and collects the displacement of the micro-motion stage, the output of the electromagnetic compensation balance and the output signal of the measured micro-cantilever or sensor at each displacement interval point, and its elasticity can be calculated. Constant or force value sensitivity. Due to the limitations of weight quality and micro-motion table displacement measurement technology, as well as the influence of the installation of the measured sensor and environmental factors, the measurement results of the measurement device based on the mass method have a large uncertainty, and its value traceability method still needs further research. Improve and perfect.

The other is an electrical method, which usually uses a capacitive sensor to reproduce the electrostatic force value standard device, which is composed of a capacitive sensor (electrostatic force generator), an elastic support mechanism, a displacement measurement and control system, etc. The structure of the device is different, some adopt coaxial cylindrical capacitor structure, and some adopt parallel plate capacitor structure.

The Chinese patent with the authorized notification number CN 201477009U discloses a technical solution named "miniature force value measuring device" for a utility model, which adopts the previous principle and method of force value reproduction. The device installs a linear driving force value loading module based on the principle of piezoelectric ceramics under the moving beam, and connects it with the motion controller. The displacement of the piezoelectric ceramic module is given and controlled by the computer and the controller, and the 1mN- Force measurement in the 2N range. The device is still unable to achieve force measurement below 1mN; the force loading module does not have a Z-axis guide, which cannot ensure that the direction of the force is consistent with the vertical direction; the stiffness of the electromagnetic compensation balance, the tip of the micro-cantilever or micro-force sensor and the balance are not considered in the measurement process The contact instability of the weighing pan, the installation angle of the micro-cantilever or the micro-force sensor and other factors affect the measurement results, resulting in low measurement accuracy and large uncertainty.

Contents of the invention

Features and advantages of the invention are set forth in part in the description which follows, or may be obvious from the description, or may be learned by practice of the invention.

In order to overcome the problems of the prior art, the present invention provides a micro-nano force value standard device based on an electromagnetic compensation balance and its traceability method. The cantilever position coarse adjustment unit is used to adjust the displacement of the micro-cantilever or micro-force sensor in the XYZ axis, XY axis The pitch angle is adjusted to improve the positioning accuracy. The piezoelectric ceramic micro-motion table used in the fine-tuning part has a guiding function to ensure that the force direction of the measured micro-cantilever or micro-force sensor is always consistent with the vertical direction during the entire measurement process; in the traceability method, the electromagnetic compensation balance stiffness, The installation angle of the micro-cantilever to be tested is used to correct the elastic constant of the micro-cantilever, and the force value sensitivity of the micro-force sensor is corrected by using the installation angle of the micro-force sensor.

The technical solution adopted by the present invention to solve the problems of the technologies described above is as follows:

According to one aspect of the present invention, there is provided a micro-nano force value standard device based on an electromagnetic compensation balance, which is characterized in that it includes: an electromagnetic compensation balance for measuring tiny force values; a load column fixed in the middle of the electromagnetic compensation balance, The top of the load column is provided with a contact piece; the micro-motion table is connected with the measured micro-cantilever or micro-force sensor through the cantilever beam mounting rod, and is used to make the measured micro-cantilever or micro-force sensor move linearly along the Z axis; the position of the cantilever The coarse adjustment unit is connected with the micro-motion stage, and is used to realize the displacement adjustment of the micro-motion stage in the X-axis, Y-axis, and Z-axis directions and the angle adjustment in the X-axis and Y-axis directions.

According to an embodiment of the present invention, a high-viscosity medium is attached to the top of the contact sheet, or an atomic force microscope standard calibration device is provided.

According to an embodiment of the present invention, the contact piece is a silicon piece.

According to an embodiment of the present invention, the cantilever position coarse adjustment unit includes: a three-dimensional manual platform, wherein a Z-direction displacement platform is connected to the bottom of the micro-motion platform; a two-dimensional manual swing platform is connected to the bottom of the three-dimensional manual platform; The one-dimensional manual lifting platform is connected with the bottom of the two-dimensional manual swinging platform.

According to an embodiment of the present invention, also include:

The horizontal observation microscope lens is located on the side of the contact piece, and is used to horizontally observe the contact state between the contact piece and the measured microcantilever or micro force sensor from the side of the contact piece;

The position adjustment unit of the horizontal observation microscope head is composed of a three-dimensional manual platform and a manual turntable, the three-dimensional manual platform is connected with the horizontal observation microscope head, and the manual turntable is connected with the bottom of the three-dimensional manual platform;

A vertical observation microscope lens, located directly above the contact piece, is used to observe the contact state between the contact piece and the measured microcantilever or micro force sensor from the top surface of the contact piece;

The vertical observation microscope head position adjustment unit, the vertical observation microscope head position adjustment unit, consists of a vertical frame arranged along the Z axis and a horizontal frame connected to the top of the vertical frame, a one-dimensional manual lifting platform, a two-dimensional manual platform and a manual turntable The horizontal frame is used to fix the vertical observation microscope lens; the one-dimensional manual lifting platform is connected with the bottom of the vertical frame; the two-dimensional manual platform is connected with the bottom of the one-dimensional manual lifting platform; the manual turntable is connected with the bottom of the one-dimensional manual lifting platform; the bottom of the two-dimensional manual platform is connected;

The vibration isolation optical platform is used to place the electromagnetic compensation balance, the cantilever position rough adjustment unit, the horizontal observation microscope lens position adjustment unit, and the vertical observation microscope lens position adjustment unit;

The sealing cover is located on the vibration-isolation optical platform, and is used to cover the electromagnetic compensation balance, the load column, the measured micro-cantilever or micro-force sensor, the micro-motion stage, the rough adjustment unit of the cantilever position, the horizontal observation microscope lens, and the horizontal observation microscope lens A position adjustment unit, a vertical observation microscope lens, and a vertical observation microscope lens position adjustment unit.

According to an embodiment of the present invention, it also includes: a control calculation unit, which is composed of a control module, an acquisition module and a calculation adjustment module, the control module is used to control the displacement of the micro-motion table; the acquisition module is used to acquire the electromagnetic compensation balance , the output data of the micro-motion table and the measured micro-cantilever or micro-force sensor; the calculation and adjustment module is used to derive the elastic constant of the cantilever and the force value sensitivity of the micro-force sensor according to the output data collected by the acquisition module, and use electromagnetic compensation for balance stiffness , the installation angle of the tested micro-cantilever corrects the elastic constant of the micro-cantilever, and the force value sensitivity of the micro-force sensor is corrected by using the installation angle of the micro-force sensor.

According to another aspect of the present invention, there is provided a method for tracing the elastic constant of the measured microcantilever or the force value sensitivity of the microforce sensor using a micronano force value standard device based on an electromagnetic compensation balance, characterized in that it includes the steps:

Adjust the rough adjustment unit of the cantilever position so that the measured micro-cantilever or micro-force sensor is located directly above the load column, which is located in the middle of the electromagnetic compensation balance;

Control the micro-motion table connected to the micro-cantilever or micro-force sensor through the cantilever beam installation rod, so that the micro-motion table drives the micro-cantilever or micro-force sensor to move linearly downward along the Z axis at a certain displacement interval, so that the The tested microcantilever or micro force sensor is in contact with the load column, and the tested micro cantilever or micro force sensor is stressed;

Collect the output data of the electromagnetic compensation balance, the micro-motion stage and the measured micro-cantilever, draw the force-deformation curve, and derive the elastic constant of the measured micro-cantilever from its linear regression equation; or collect the electromagnetic compensation balance, micro-motion stage And the output data of the micro force sensor, draw force-voltage (or resistance) curve, derive the force value sensitivity of this micro force sensor by its linear regression equation;

The elastic constant of the micro-cantilever is corrected by electromagnetically compensating the balance stiffness and the installation angle of the tested micro-cantilever, or the force value sensitivity of the micro-force sensor is corrected by using the installation angle of the micro-force sensor.

According to an embodiment of the present invention, when using the electromagnetic compensation balance stiffness to correct the elastic constant of the measured microcantilever, the steps are:

The load column is loaded by using a rigid member with great rigidity instead of the measured cantilever beam;

According to the output data of the electromagnetic compensation balance and the micro-motion table, the force value F _C and the displacement x _L of the load column are obtained;

The actual electromagnetic compensation balance stiffness k _i =F _C /x _L is obtained by the force value F _C and the displacement x _L of the load column.

use the formula The elastic constant is corrected, wherein the kc and km are respectively the corrected elastic constant and the elastic constant calculated according to the output data.

According to an embodiment of the present invention, when using the installation angle of the tested microcantilever to correct the elastic constant of the cantilever, the formula $\frac{k_{\mathrm{\θ}}}{k_0}=\frac{1}{\cos \mathrm{\θ}(\cos \mathrm{\θ}-\mathrm{\μ}\sin \mathrm{\θ})}$ Make corrections, where k _θ and k ₀ are the elastic constants when the installation angle of the tested microcantilever is θ and 0° respectively, and μ is the coefficient of static friction;

According to an embodiment of the present invention, when using the installation angle of the micro force sensor to correct the force value sensitivity of the micro force sensor, the formula Correction is carried out, where S _θ and S ₀ are the force sensitivity when the installation angle is θ and 0° respectively, and μ is the coefficient of static friction.

Those of ordinary skill in the art will better understand the features and contents of these technical solutions by reading the description.

Description of drawings

The advantages and implementation methods of the present invention will be more obvious by referring to the accompanying drawings and describing the present invention in conjunction with examples below, wherein the content shown in the accompanying drawings is only used for explaining the present invention, and does not constitute any sense of the present invention The constraints, in the attached image:

FIG. 1 is a schematic structural diagram of a micro-nano force value standard device based on an electromagnetic compensation balance according to an embodiment of the present invention.

FIG. 2 is a schematic flowchart of a traceability method for a micro-nano force value standard device based on an electromagnetic compensation balance according to an embodiment of the present invention.

detailed description

As shown in Figure 1, the present invention provides a kind of micro-nano force value standard device based on electromagnetic compensation balance, comprising: electromagnetic compensation balance 10, for measuring micro force value, is provided with load column 21 on it, and this load column 21 Installed in the middle of the electromagnetic compensation balance, replacing the weighing pan in the prior art, the top of the load column 21 is provided with a contact piece 22; the measured micro-cantilever or micro-force sensor 31 is fixedly installed on the end of the cantilever beam installation rod 32 The micro-movement stage 41 is connected with the cantilever beam installation rod 32, and is used to make the measured micro-cantilever or the micro-force sensor 31 move linearly along the Z axis; the cantilever position coarse adjustment unit 40 is connected with the micro-motion stage 41, for realizing The micro-motion table 41 can be adjusted for displacement in the X-axis, Y-axis, and Z-axis directions, and can be adjusted for angles in the X-axis and Y-axis directions.

In order to reduce or avoid the relative movement between the tip of the micro-cantilever or the micro-force sensor and the load column 21 during the measurement process, causing contact instability, a high-viscosity medium, such as high-viscosity polydimethylsiloxane, can be attached to the top of the contact piece 22 alkane, improve the energy dissipation caused by sliding motion; also can adopt atomic force microscope standard calibration utensil on the top of contact piece 22, such as deep 0.2 micron grid two-dimensional array, place the needle tip at the grid place, reduce or avoid A stick-slip phenomenon occurs. In a specific implementation, the load column 21 can be cylindrical; the contact piece 22 can be a silicon chip, which can better meet the measurement requirements and ensure the measurement accuracy.

In this embodiment, the cantilever position rough adjustment unit 40 specifically includes: a three-dimensional manual platform 42, including an X-direction translation platform, a Y-direction translation platform, and a Z-direction translation platform, wherein the Z-direction translation platform is connected to the bottom of the micro-motion platform 41 Two-dimensional manual swing platform 43 is connected with the bottom of three-dimensional manual platform 42; The three-dimensional manual platform 42 can adjust the displacement of the micro-movement stage 41 on the X-axis, the Y-axis and the Z-axis direction. In this embodiment, the three-dimensional manual platform 42 can realize the displacement adjustment of the X-axis, the Y-axis and the Z-axis by 18mm; in order to increase The Z-axis displacement adjustment range adopts the one-dimensional manual lift table 44 to realize the Z-axis 120mm displacement adjustment; and the two-dimensional manual swing table 43 is used to adjust the pitch angle of the X-axis and Y-axis to realize ±20° of the X-axis and Y-axis /±15°pitch angle adjustment.

Since the cantilever position coarse adjustment unit 40 is connected to the micro-motion table, and the micro-motion table is connected to the measured micro-cantilever or the micro-force sensor 31 through the cantilever beam mounting rod 32, the measured micro-cantilever or the micro-force sensor 31 can be adjusted by the cantilever position coarse adjustment unit 40. The micro force sensor 31 adjusts the position of 5 degrees of freedom, so that the measured micro cantilever or micro force sensor 31 is located directly above the load column 21; and the fine adjustment part is realized by the micro motion table 41. The moving stage realizes fine adjustment of Z-axis displacement of 100 μm, and the (closed-loop) resolution is 0.4 nm.

In this embodiment, the micro-nano force value standard device based on the electromagnetic compensation balance also includes: a horizontal observation microscope lens 51, located on the side of the contact piece 22, for horizontally observing the contact piece 22 and the contact piece 22 from the side of the contact piece 22. The contact state of the measured microcantilever or micro force sensor 31; the position adjustment unit of the horizontal observation microscope head is composed of a three-dimensional manual platform 52 and a manual turntable 53. The three-dimensional manual platform 52 is connected with the horizontal observation microscope lens 51. The bottom of the manual platform 52 is connected.

In addition, it also includes: a vertical observation microscope lens 61, positioned directly above the contact piece 22, for observing the contact state between the contact piece 22 and the measured microcantilever or micro force sensor 31 from the top surface of the contact piece 22; the vertical observation microscope lens position The adjustment unit is composed of a vertical frame 62 arranged along the Z axis, a horizontal frame 63 connected to the top of the vertical frame 62, a one-dimensional manual lifting platform 64, a two-dimensional manual platform 65 and a manual turntable 66. The horizontal frame 63 is used for Fixed vertical observation microscope head 61; This one-dimensional manual lifting platform 64 links to each other with the bottom of this vertical frame 62; This two-dimensional manual platform 65 links to each other with the bottom of this one-dimensional manual lifting platform 64; This manual turntable 66 and this two-dimensional The bottom of manual platform 65 is connected.

In order to reduce the interference of the air flow, it may also include: a vibration isolation optical platform 72, which is used to place the electromagnetic compensation balance 10, the cantilever position rough adjustment unit 40, the horizontal observation microscope lens position adjustment unit, and the vertical observation microscope lens position adjustment unit. Vibration isolation treatment: the sealing cover 71 is located on the vibration isolation optical platform 72, and is used to cover all parts of the above-mentioned micro-nano force value standard device based on the electromagnetic compensation balance, that is, to cover the electromagnetic compensation balance, load column, The tested microcantilever or microforce sensor, micro-motion stage, cantilever position coarse adjustment unit, horizontal observation microscope lens, horizontal observation microscope lens position adjustment unit, vertical observation microscope lens, vertical observation microscope lens position adjustment unit, so that the air flow can be effectively Interference shielding.

Although not shown in the figure, in this embodiment, it also includes: a control calculation unit, which is composed of a control module, an acquisition module and a calculation adjustment module. The control module is used to control the displacement of the micro-motion stage; Electromagnetically compensate the output data of the balance, micro-motion stage and the measured micro-cantilever or micro-force sensor; the calculation and adjustment module is used to derive the elastic constant of the micro-cantilever and the force value sensitivity of the micro-force sensor according to the output data collected by the acquisition module, and use electromagnetic compensation The stiffness of the balance and the installation angle of the tested micro-cantilever correct the elastic constant of the micro-cantilever, and the force value sensitivity of the micro-force sensor is corrected by using the installation angle of the micro-force sensor.

As shown in Figure 2, the present invention also provides a traceability method for the elastic constant of the measured micro-cantilever or the force value sensitivity of the micro-force sensor using a micro-nano force value standard device based on an electromagnetic compensation balance, including steps:

S1. Adjust the rough adjustment unit of the cantilever position so that the measured micro-cantilever or micro-force sensor is located directly above the load column, which is located in the middle of the electromagnetic compensation balance;

S2. Control the micro-motion table connected to the micro-cantilever or micro-force sensor through the cantilever beam installation rod, so that the micro-motion table drives the micro-cantilever or micro-force sensor to move linearly downward along the Z axis at a certain displacement interval, so that The tested microcantilever or micro force sensor is in contact with the load column, and the tested micro cantilever or micro force sensor is stressed;

S3. Collect the output data of the electromagnetic compensation balance, the micro-motion stage and the measured micro-cantilever, draw the force-deformation curve, and derive the elastic constant of the measured micro-cantilever from its linear regression equation; or collect the electromagnetic compensation balance, the micro-motion stage and the micro-force The output data of the sensor is used to draw the force-voltage (or resistance) curve, and the force value sensitivity of the micro force sensor is derived from its linear regression equation;

S4. Correct the elastic constant of the micro-cantilever by using the electromagnetic compensation balance stiffness and the installation angle of the tested micro-cantilever, or correct the force value sensitivity of the micro-force sensor by using the installation angle of the micro-force sensor.

Specifically, when using the micro-nano force standard device based on the electromagnetic compensation balance provided by the present invention, in step S1, through the three-dimensional manual platform 42, the one-dimensional manual lifting platform 44 and the two-dimensional manual swing platform 43, the The position coarse adjustment unit 40 performs position adjustment of 5 degrees of freedom until the measured microcantilever or micro force sensor 31 is located directly above the load column 21 .

In step S2, the displacement of the micro-movement table 41 can be precisely given and controlled by the control module, so that the measured micro-cantilever or micro-force sensor moves linearly downward along the Z-axis with the micro-motion table at a certain displacement interval. When it is observed that the output value of the electromagnetic compensation balance increases significantly from zero, it indicates that the measured microcantilever or micro force sensor 31 has been in contact with the load column 21, that is, the measured micro cantilever or micro force sensor 31 has been subjected to an external force.

In step S3, specifically at different given points, the output signals (voltage or resistance) of the electromagnetic compensation balance, the micro-motion stage and the measured micro-cantilever or micro-force sensor are collected.

The invention adopts a feedback control strategy to accurately specify and control the displacement of the micro-movement stage. The microcantilever or micro force sensor to be tested moves linearly downward along the Z-axis with a certain displacement interval along with the micro-motion table. The output signals (voltage or resistance) of the electromagnetic compensation balance, the micro-motion stage and the tested micro-cantilever or micro-force sensor will be collected simultaneously, based on which the force-deformation curve or force-voltage (or resistance) curve can be drawn and derived through linear regression The elastic constant of the tested microcantilever or the force value sensitivity of the micro force sensor.

In step S4, when using the electromagnetic compensation balance stiffness to correct the elastic constant of the electromagnetic compensation balance, the steps include:

The load column is loaded by using a rigid member with great rigidity instead of the measured cantilever beam;

According to the output data of the electromagnetic compensation balance and the micro-motion stage, the force value F _C on the load column and the displacement x _L of the load column are obtained;

The actual electromagnetic compensation balance stiffness k _i =F _C /x _L is obtained by the force value F _C and the displacement x _L of the load column.

use the formula The elastic constant is corrected, wherein the _{k c} and km are respectively the corrected elastic constant and the elastic constant calculated according to the output data.

When using the installation angle of the tested microcantilever to correct the elastic constant of the cantilever, the formula Make corrections, where k _θ and k ₀ are the elastic constants when the installation angle of the tested microcantilever is θ and 0° respectively, and μ is the coefficient of static friction;

When using the installation angle of the micro force sensor to correct the force value sensitivity of the micro force sensor, the formula Correction is carried out, where S _θ and S ₀ are the force sensitivity when the installation angle is θ and 0° respectively, and μ is the coefficient of static friction.

The above-mentioned static friction coefficient μ is measured by experiments, using a relevant friction testing machine and a fixture that matches the installation of the cantilever beam to be tested, and loading a small force value within a certain range (the loading range is 10mN to 30mN). The sliding speed of s is used to reciprocate the friction pair, or to drive the friction pair with a sinusoidal motion with an amplitude of 0.1mm and a period of 60s, track the change of the friction coefficient, and determine the static friction coefficient according to the maximum point of the actual friction value and the distribution of the movement speed.

The invention provides a micro-nano force value standard device based on an electromagnetic compensation balance and a traceability method thereof. The surface of the contact sheet is properly modified to reduce the probability of stick-slip, reduce the probability of instability, and reduce the size of the micro-cantilever or micro-force sensor. The impact caused by the unstable contact between the needle tip and the load column; through the use of the sealed cover, the interference of environmental factors is reduced. When correcting the measurement results, measure the stiffness of the electromagnetic compensation balance, and use it to correct the measurement results of the elastic constant of the measured micro-cantilever or micro-force sensor; determine the installation angle of the micro-cantilever through the microscopic observation system, and use it to measure the measured micro-cantilever The measurement results of the elastic constant of the micro-cantilever or the micro-force sensor are corrected.

The preferred embodiments of the present invention have been described above with reference to the accompanying drawings. Those skilled in the art can implement the present invention with various variants without departing from the scope and essence of the present invention. For example, features illustrated or described as part of one embodiment can be used on another embodiment to yield a still further embodiment. The above are only preferred feasible embodiments of the present invention, and are not intended to limit the scope of rights of the present invention. All equivalent changes made by using the description and drawings of the present invention are included in the scope of rights of the present invention.

Claims (9)

1. A micro-nano force value standard device based on an electromagnetic compensation balance, characterized in that it comprises: Electromagnetic compensation balance for measuring small force values; The load column is fixed in the middle of the electromagnetic compensation balance, and the top of the load column is provided with a contact piece for contacting with the measured microcantilever or micro force sensor; The micro-motion table is connected with the tested micro-cantilever or micro-force sensor through the cantilever beam mounting rod, and is used to make the measured micro-cantilever or micro-force sensor move linearly along the Z axis; Cantilever position coarse adjustment unit, connected with the micro-motion stage, used to realize the displacement adjustment of the micro-motion stage in the X-axis, Y-axis, and Z-axis directions and the angle adjustment in the X-axis and Y-axis directions; a horizontal observation microscope lens, located on the side of the contact piece, for horizontally observing the contact state between the contact piece and the measured microcantilever or micro force sensor from the side of the contact piece; The position adjustment unit of the horizontal observation microscope head is composed of a three-dimensional manual platform and a manual turntable, the three-dimensional manual platform is connected to the horizontal observation microscope head, and the manual turntable is connected to the bottom of the three-dimensional manual platform; a vertical observation microscope lens, located directly above the contact piece, for observing the contact state between the contact piece and the measured microcantilever or micro force sensor from the top surface of the contact piece; The vertical observation microscope head position adjustment unit is composed of a vertical frame arranged along the Z axis and a horizontal frame connected to the top of the vertical frame, a one-dimensional manual lifting platform, a two-dimensional manual platform and a manual turntable. The vertical observation microscope head is fixed; the one-dimensional manual lifting platform is connected with the bottom of the vertical frame; the two-dimensional manual platform is connected with the bottom of the one-dimensional manual lifting platform; the manual turntable is connected with the connected to the bottom of the two-dimensional manual platform; A vibration-isolated optical platform, used for placing the electromagnetic compensation balance, the coarse cantilever position adjustment unit, the horizontal observation microscope lens position adjustment unit, and the vertical observation microscope lens position adjustment unit; The sealing cover is located on the vibration-isolation optical platform and is used to cover the electromagnetic compensation balance, load column, micro-cantilever or micro-force sensor to be measured, micro-movement stage, cantilever position coarse adjustment unit, horizontal observation microscope lens, horizontal observation microscope A head position adjustment unit, a vertical observation microscope lens, and a vertical observation microscope lens position adjustment unit. 2. The micro-nano force value standard device based on the electromagnetic compensation balance according to claim 1, characterized in that, the top of the contact piece is attached with a high-viscosity medium, or is provided with an atomic force microscope standard calibration device. 3. The micro-nano force value standard device based on an electromagnetic compensation balance according to claim 1 or 2, wherein the contact piece is a silicon chip. 4. The micro-nano force value standard device based on the electromagnetic compensation balance according to claim 1, wherein the rough position adjustment unit of the cantilever comprises: a three-dimensional manual platform, wherein the Z-direction displacement stage and the micro-motion stage The bottom is connected; the two-dimensional manual swing platform is connected with the bottom of the three-dimensional manual platform; the one-dimensional manual lifting platform is connected with the bottom of the two-dimensional manual swing platform. 5. The micro-nano force value standard device based on electromagnetic compensation balance according to claim 1, is characterized in that, also comprises: control calculation unit, is made up of control module, acquisition module and calculation adjustment module, and described control module is used for controlling the displacement of the micro-motion table; the acquisition module is used to collect the output data of the electromagnetic compensation balance, the micro-motion table and the measured micro-cantilever or micro-force sensor; the calculation and adjustment module is used to The output data collected by the acquisition module derives the elastic constant of the cantilever and the force value sensitivity of the micro-force sensor, and uses the electromagnetic compensation balance stiffness and the installation angle of the micro-cantilever to correct the elastic constant of the cantilever, and uses the installation angle of the micro-force sensor to correct the cantilever elastic constant. The force value sensitivity of the micro force sensor. 6. A method for tracing the origin of the elastic constant of the measured microcantilever or the force value sensitivity of the micro force sensor using a micro-nano force value standard device based on an electromagnetic compensation balance, characterized in that it comprises the steps: Adjust the cantilever position coarse adjustment unit so that the measured microcantilever or micro force sensor is located directly above the load column, and the load column is located in the middle of the electromagnetic compensation balance; Control the micro-motion table connected to the micro-cantilever or micro-force sensor through the cantilever beam installation rod, so that the micro-motion table drives the micro-cantilever or micro-force sensor to move linearly downward along the Z axis at a certain displacement interval, making the tested microcantilever or micro force sensor contact with the load column, and force the tested micro cantilever or micro force sensor; Collecting the output data of the electromagnetic compensation balance, the micro-moving stage and the measured microcantilever, drawing a force-deformation curve, and deriving the elastic constant of the measured microcantilever from its linear regression equation; or collecting the electromagnetic compensation balance , the output data of the micro-motion stage and the micro-force sensor, drawing a force-voltage or resistance curve, and deriving the force value sensitivity of the micro-force sensor from its linear regression equation; The elastic constant of the cantilever is corrected by electromagnetically compensating the balance stiffness and the installation angle of the measured micro-cantilever, or the force value sensitivity of the micro-force sensor is corrected by using the installation angle of the micro-force sensor. 7. according to claim 6 adopting the micro-nano force value standard device based on the electromagnetic compensation balance to the traceability method carried out to the elastic constant of the micro-cantilever or the force value sensitivity of the micro-force sensor, it is characterized in that, after utilizing the electromagnetic compensation balance stiffness When correcting the elastic constant of the tested microcantilever, steps are included: Using a rigid member to replace the measured cantilever beam to load the load column; According to the output data of the electromagnetic compensation balance and the micro-motion stage, the force value F _C received by the load column and the displacement x _L of the load column are obtained; The actual electromagnetic compensation balance stiffness k _i =F _C /x _L is obtained by the force value F _C and the displacement x _L of the load column; use the formula Correcting the elastic constant, wherein the _{k c} and km are respectively the corrected elastic constant and the elastic constant calculated according to the output data. 8. according to claim 6, adopt the micro-nano force value standard device based on the electromagnetic compensation balance to trace the source method of the elastic constant of the micro-cantilever or the force value sensitivity of the micro-force sensor to be measured, it is characterized in that, when using the measured When correcting the spring constant of the cantilever by the installation angle of the micro-cantilever, use the formula Correction is carried out, where k _θ and k ₀ are the elastic constants when the installation angle of the tested microcantilever is θ and 0° respectively, and μ is the coefficient of static friction. 9. according to claim 6, adopt the micro-nano force value standard device based on the electromagnetic compensation balance to trace the source method of the elastic constant of the micro-cantilever or the force value sensitivity of the micro-force sensor to be measured, it is characterized in that, when using the micro-force sensor When correcting the force value sensitivity of the micro force sensor by the installation angle, use the formula Correction is carried out, where S _θ and S ₀ are the force sensitivity when the installation angle is θ and 0° respectively, and μ is the coefficient of static friction.