CN104215625B - The Raman spectrum base background signal minimizing technology that electrodeposition process makes - Google Patents
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- 238000004070 electrodeposition Methods 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000001237 Raman spectrum Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 238000001069 Raman spectroscopy Methods 0.000 claims abstract description 20
- 239000003792 electrolyte Substances 0.000 claims abstract description 18
- 238000004140 cleaning Methods 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 239000012535 impurity Substances 0.000 claims abstract description 6
- 238000000479 surface-enhanced Raman spectrum Methods 0.000 claims abstract description 4
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 5
- 239000012498 ultrapure water Substances 0.000 claims description 5
- 239000013049 sediment Substances 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims description 2
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 abstract description 20
- 230000000694 effects Effects 0.000 abstract description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 101710134784 Agnoprotein Proteins 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000002082 metal nanoparticle Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229910000367 silver sulfate Inorganic materials 0.000 description 2
- RHUVFRWZKMEWNS-UHFFFAOYSA-M silver thiocyanate Chemical compound [Ag+].[S-]C#N RHUVFRWZKMEWNS-UHFFFAOYSA-M 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000000289 electrochemical surface enhanced Raman spectroscopy Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000002073 nanorod Substances 0.000 description 1
- 239000002135 nanosheet Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
本发明提供的电沉积法制作的表面增强拉曼光谱基底背景信号去除方法,利用电沉积反应增大基体表面的拉曼检测信号,并对留在其表面的杂质进行清洗。本发明对应用于电催化领域的纳米金属电极进行改性,使其具备SERS效应,从而应用于SERS领域,实现痕量分子的检测。另一方面从电解液的组合和电沉积后表面沉积物清洗的角度出发,选用比沉积物稳定常数更大的络合物,同时保证该络合物本身没有或仅有很小的干扰,解决电沉积法制备的SERS基底中拉曼背景干扰问题。
The method for removing the background signal of the surface-enhanced Raman spectrum substrate produced by the electrodeposition method provided by the present invention uses the electrodeposition reaction to increase the Raman detection signal on the surface of the substrate, and cleans the impurities left on the surface. The invention modifies the nanometer metal electrode used in the field of electrocatalysis so that it has the SERS effect, thereby being applied in the field of SERS and realizing the detection of trace molecules. On the other hand, from the perspective of the combination of the electrolyte and the cleaning of the surface deposits after electrodeposition, a complex with a larger stability constant than the deposits is selected, and at the same time, the complex itself has no or only small interference to solve the problem. Raman background interference in SERS substrates prepared by electrodeposition.
Description
技术领域technical field
本发明涉及拉曼光谱检测领域,尤其属于一种表面增强拉曼光谱(Electrochemical-Surface enhanced raman scattering,SERS)基底背景信号去除方法。The invention relates to the field of Raman spectroscopy detection, in particular to a method for removing background signals of a surface-enhanced Raman spectroscopy (Electrochemical-Surface enhanced raman scattering, SERS) substrate.
背景技术Background technique
SERS效应即利用激光与金属粒子形成激元等离共振效应,使待测分子产生增大约104-106倍甚至更高的检测信号,在痕量分子的检测中有很大的应用前景。迄今,有很多研究聚焦于开发各种具有SERS效应的基底,如有利用氧化还原反应作用处理后的粗糙金属表面及利用电化学方法制备的基底;用物理蒸镀、溅射等手段将金属纳米粒子沉积于玻璃等不同材质表面的基底;球状、棒状、核壳结构等的金属溶胶;将单分散的金或者银纳米颗粒通过某种方式自组装于惰性衬底形成阵列的MFON;光子晶体衬底等。其中,由于电沉积法能够通过简单地控制电流、电压等条件在较短时间内使基底表面形成金属纳米粒子、纳米片、纳米棒等,方法简便、基底易得,现已有很多相关报道。但该类电极大多用于电催化领域,而鲜有应用于拉曼光谱检测领域,仅有少量相关报道,如利用AgNO3和柠檬酸作为电解液的组装了纳米片的银微球基底,利用Au(SO3)2 3-电解液制得的星形金纳米SERS基底,利用HAuCl4和NaClO4作为电解液的金纳米颗粒镀膜等。其中,主要的难点在于在利用电沉积法制备SERS基底时,由于SERS效应能使信号增大104以上,大大提高了拉曼信号的检测灵敏度。因此表面含量很低的杂质也会产生一定的背景干扰,从另一方面来说,若表面存在杂质不能使纳米金属颗粒裸露,也会降低SERS效应。而现有报道的应用于电催化领域的纳米金属基底,仅需考虑电信号干扰问题,而无需考虑拉曼背景信号干扰问题。因此将种类繁多的应用于电催化领域的纳米金属基底应用于拉曼检测中,需要解决一个关键的技术问题,即为了使制备的基底能够应用于拉曼光谱检测,基底的没有或仅有较小的背景干扰。The SERS effect is to use laser light and metal particles to form an excimer plasmon resonance effect, so that the detection signal of the molecule to be detected is increased by about 10 4 -10 6 times or even higher. It has great application prospects in the detection of trace molecules. So far, many studies have focused on the development of various substrates with SERS effects, such as rough metal surfaces treated by redox reactions and substrates prepared by electrochemical methods; Particles deposited on substrates of different materials such as glass; metal sols with spherical, rod-shaped, core-shell structures, etc.; MFON in which monodisperse gold or silver nanoparticles are self-assembled on an inert substrate to form an array; photonic crystal lining Bottom etc. Among them, the electrodeposition method can form metal nanoparticles, nanosheets, nanorods, etc. on the surface of the substrate in a short period of time by simply controlling the current, voltage and other conditions. The method is simple and the substrate is easy to obtain. There have been many related reports. However, this type of electrode is mostly used in the field of electrocatalysis, and is rarely used in the field of Raman spectroscopy detection. Au(SO 3 ) 2 3- star-shaped gold nano-SERS substrate prepared by electrolyte, gold nanoparticle coating using HAuCl 4 and NaClO 4 as electrolyte, etc. Among them, the main difficulty is that when the SERS substrate is prepared by the electrodeposition method, the signal can be increased by more than 10 4 due to the SERS effect, which greatly improves the detection sensitivity of the Raman signal. Therefore, impurities with a very low content on the surface will also produce certain background interference. On the other hand, if the impurities on the surface cannot expose the metal nanoparticles, the SERS effect will also be reduced. However, the reported nano-metal substrates used in the field of electrocatalysis only need to consider the problem of electrical signal interference, and do not need to consider the problem of Raman background signal interference. Therefore, to apply a wide variety of nano-metal substrates in the field of electrocatalysis to Raman detection, a key technical problem needs to be solved, that is, in order to make the prepared substrates applicable to Raman spectroscopy detection, the substrates have no or only relatively small Minor background distractions.
发明内容Contents of the invention
为了克服现有技术的上述缺陷,本发明提供一种能够去除SERS基底拉曼背景信号的方法。In order to overcome the above-mentioned defects of the prior art, the present invention provides a method capable of removing the Raman background signal of the SERS substrate.
本发明提供的一种电沉积法制作的表面增强拉曼光谱基底背景信号去除方法,利用电沉积反应增大基体表面的拉曼检测信号,并对留在其表面的杂质进行清洗,包含以下步骤:(1)选择三种以下的离子种类作为电解液对导电基底进行电沉积反应,应选择对拉曼背景干扰较少的离子对;(2)对在电沉积反应后的基底用超纯水进行清洗;(3)对残留在基底表面的沉积物进行清洗,选择比沉积物稳定常数更大的络合物进行清洗,络合物本身对基体拉曼背应当没有或仅有少量干扰;(4)再次对基底用超纯水进行清洗。The present invention provides a surface-enhanced Raman spectroscopy substrate background signal removal method made by electrodeposition, using electrodeposition reaction to increase the Raman detection signal on the surface of the substrate, and cleaning the impurities left on the surface, including the following steps : (1) Select three or less ion species as the electrolyte to carry out the electrodeposition reaction on the conductive substrate, and the ion pair with less interference to the Raman background should be selected; (2) Use ultrapure water for the substrate after the electrodeposition reaction Cleaning; (3) The sediment remaining on the surface of the substrate is cleaned, and the complex compound with a larger stability constant than the sediment is selected for cleaning, and the complex itself should have no or only a small amount of interference to the Raman back of the matrix; ( 4) Clean the substrate with ultrapure water again.
作为优选,步骤(1)中对导电基底进行电沉积反应的电解液选择为Ag2SO4和H2SO4的混合液;步骤(3)中对沉积物进行清洗的络合物选择为Na2S2O3。由于Ag+和S2O3 2-络合物的稳定常数为1014.15,稳定常数较大,形成的Ag+和S2O3 2-络合物能够溶解于水中,不会形成固体。经过清洗后纳米银裸露。因此用更加稳定且溶于水的Ag络合物除去Ag2SO4的方法是可行的,能够用来处理通过该电沉积方法得到的基底的表面干扰。As a preference, the electrolytic solution for electrodeposition of the conductive substrate in step (1) is selected as a mixture of Ag 2 SO 4 and H 2 SO 4 ; the complex for cleaning the deposit in step (3) is selected as Na 2 S 2 O 3 . Since the stability constant of the Ag + and S 2 O 3 2- complex is 10 14.15 , which is relatively large, the formed Ag + and S 2 O 3 2- complex can be dissolved in water without forming a solid. After cleaning, the nano-silver is exposed. Therefore, the method of removing Ag2SO4 with more stable and water - soluble Ag complexes is feasible and can be used to deal with the surface interference of the substrate obtained by this electrodeposition method.
作为优选,步骤(1)中选择0.01mol/L的Ag2SO4和0.6mol/L的H2SO4和水的混合液作为电解液,以0.03A的恒电流通电30s对导电基体进行电沉积反应。As preferably, in the step (1), select 0.01mol/L of Ag 2 SO 4 and the mixed solution of 0.6 mol/L of H 2 SO 4 and water as the electrolyte, and electrify the conductive substrate with a constant current of 0.03A for 30s. deposition reaction.
本发明对应用于电催化领域的纳米金属电极进行改性,使其具备SERS效应,从而应用于SERS领域,实现痕量分子的检测。另一方面从电解液的组合和电沉积后表面沉积物清洗的角度出发,选用比沉积物稳定常数更大的络合物,同时保证该络合物本身没有或仅有很小的干扰,解决电沉积法制备的SERS基底中拉曼背景干扰问题。The invention modifies the nanometer metal electrode used in the field of electrocatalysis so that it has the SERS effect, thereby being applied in the field of SERS and realizing the detection of trace molecules. On the other hand, from the perspective of the combination of the electrolyte and the cleaning of the surface deposits after electrodeposition, a complex with a larger stability constant than the deposits is selected, and at the same time, the complex itself has no or only small interference to solve the problem. Raman background interference in SERS substrates prepared by electrodeposition.
附图说明Description of drawings
图1是经电沉积后,未经清洗的基底表面(a),用KSCN漂洗后(b),用Na2S2O3漂洗后(c)的激光拉曼谱图;Figure 1 is the laser Raman spectrum of the unwashed substrate surface (a) after electrodeposition, (b) after rinsing with KSCN, and (c) after rinsing with Na 2 S 2 O 3 ;
图2是清洗前(A)与清洗后(B)的扫描电镜图。Fig. 2 is a scanning electron microscope image before (A) and after (B) cleaning.
具体实施方式detailed description
本实施例以多孔银膜的改性为例。在一定的电流密度下,0.01mol/l Ag2SO4,1.5mol/lKSCN和0-2mol/L NH4Cl的电解液,可得到多孔银膜。文献中选择KSCN是为了防止Ag2SO4与Cl-产生沉淀,采用NH4Cl是因为能够产生一定量的H+而产生氢气泡,使电极产生多孔状结构。但是,在此电解液组合中,AgSCN和AgCl均会带来较大的拉曼背景干扰。因此在电解液的选择上,应选择尽量少的离子种类进行组合。为了获得多孔银膜,电解液中必须含有一定量的Ag+和H+。若选择AgNO3和HNO3作为电解液,由于NO3 +在酸性环境下能够直接将Ag溶解,所以当电沉积完成后,电解液中的HNO3会直接与沉积下来的银膜反应,而破坏它的多孔状结构,所以排除AgNO3。本实施例最后以Ag2SO4和H2SO4为电解液,在导电基质上进行电沉积,得到具有SERS效应的基底。该电解液组合避免了一些离子的拉曼谱图干扰,同时在合适的电流密度下具有较好的多孔形貌及膜厚。This embodiment takes the modification of the porous silver membrane as an example. Under a certain current density, the electrolyte solution of 0.01mol/l Ag 2 SO 4 , 1.5mol/l KSCN and 0-2mol/L NH 4 Cl can obtain a porous silver film. In the literature, KSCN is selected to prevent the precipitation of Ag 2 SO 4 and Cl-, and NH 4 Cl is used because it can generate a certain amount of H + to generate hydrogen bubbles, so that the electrode has a porous structure. However, in this electrolyte combination, both AgSCN and AgCl will bring large Raman background interference. Therefore, in the choice of electrolyte, the combination of as few ion species as possible should be selected. In order to obtain a porous silver film, the electrolyte must contain a certain amount of Ag + and H + . If AgNO 3 and HNO 3 are selected as the electrolyte, since NO 3 + can directly dissolve Ag in an acidic environment, after the electrodeposition is completed, the HNO 3 in the electrolyte will directly react with the deposited silver film and destroy the silver film. Its porous structure excludes AgNO 3 . Finally, in this embodiment, Ag 2 SO 4 and H 2 SO 4 are used as electrolytes to conduct electrodeposition on the conductive substrate to obtain a substrate with SERS effect. The electrolyte combination avoids the interference of the Raman spectrum of some ions, and at the same time has a better porous morphology and film thickness at a suitable current density.
图1(a)所示是在0.01mol/L的Ag2SO4和0.6mol/L的H2SO4的电解液中,以0.03A的恒电流沉积30s后得到的基底的拉曼谱图。可以看到在500cm-1,600cm-1,1000cm-1,1200cm-1和2150cm-1左右各有一个峰,考虑到电解液中的存在物质和可能出现的杂质,怀疑这些峰可能是由于电解液中的SO4 2-在电极沉积完成后取出时残留在电极表面。对Ag2SO4的纯固体样品进行测试,可得在500cm-1,600cm-1,1000cm-1,1200cm-1这四个峰与Ag2SO4固体纯样在拉曼下测得的峰重合,因而可以推断在制得的基底表面的纳米银上有Ag2SO4的存在,且Ag2SO4的峰高很高,会严重干扰待测样品的检测。此外,由于纳米银有SERS效应而Ag2SO4没有,因此,Ag2SO4会影响基底表面的SERS效应,所以必须去除或减少Ag2SO4的含量,降低拉曼背景干扰。Figure 1(a) shows the Raman spectrum of the substrate obtained after deposition at a constant current of 0.03A for 30s in an electrolyte of 0.01mol/L Ag 2 SO 4 and 0.6 mol/L H 2 SO 4 . It can be seen that there is a peak at 500cm -1 , 600cm -1 , 1000cm -1 , 1200cm -1 and 2150cm -1 respectively. Considering the presence of substances and possible impurities in the electrolyte, it is suspected that these peaks may be due to electrolysis SO 4 2- in the liquid remains on the electrode surface when it is taken out after the electrode deposition is completed. The pure solid sample of Ag 2 SO 4 is tested, and the four peaks at 500cm -1 , 600cm -1 , 1000cm -1 , and 1200cm -1 can be obtained, which are the same as the peaks measured under Raman for the pure solid sample of Ag 2 SO 4 Therefore, it can be inferred that Ag 2 SO 4 exists on the nano-silver on the surface of the prepared substrate, and the peak height of Ag 2 SO 4 is very high, which will seriously interfere with the detection of the sample to be tested. In addition, since nano-silver has SERS effect but Ag 2 SO 4 does not, Ag 2 SO 4 will affect the SERS effect on the substrate surface, so the content of Ag 2 SO 4 must be removed or reduced to reduce Raman background interference.
本实施例尝试使用比Ag2SO4稳定常数更大的Ag+和SCN-络合物(kw=1010.8)和Ag+和S2O3 2-络合物(kw=1014.15)对基底表面进行清洗,使清洗离子与Ag+形成比Ag2SO4更稳定的络合物,从而达到洗脱SO4 2-的目的。将经过电沉积后的基底先用超纯水进行清洗,后在KSCN溶液中浸泡3min,再用超水清洗基底表面。因KSCN可以和Ag+形成比Ag2SO4更稳定的络合物,可以将基底表面的Ag2SO4进一步转化为Ag+与SCN2-的络合物。得到的图谱如图1(b)所示,可以看到原来的Ag2SO4的峰几乎消失,但在2200cm-1左右有一个很大的峰,在743cm-1和888cm-1处新出现两个小峰,推测该峰为AgSCN沉淀物带来的新的干扰,因此不能采用KSCN进行清洗。This example tries to use Ag + and SCN - complexes (k w = 10 10.8 ) and Ag + and S 2 O 3 2- complexes (k w = 10 14.15 ) with larger stability constants than Ag 2 SO 4 The surface of the substrate is cleaned so that the cleaning ions and Ag + form a more stable complex than Ag 2 SO 4 , so as to achieve the purpose of eluting SO 4 2- . The electrodeposited substrate was first cleaned with ultrapure water, then soaked in KSCN solution for 3 minutes, and then the surface of the substrate was cleaned with superwater. Because KSCN can form a more stable complex with Ag + than Ag 2 SO 4 , the Ag 2 SO 4 on the surface of the substrate can be further converted into a complex of Ag + and SCN 2- . The obtained spectrum is shown in Figure 1(b). It can be seen that the original peak of Ag 2 SO 4 has almost disappeared, but there is a large peak at around 2200cm -1 , and new ones appear at 743cm -1 and 888cm -1 Two small peaks, it is presumed that this peak is a new interference brought by the AgSCN precipitate, so KSCN cannot be used for cleaning.
由于Ag+和S2O3 2-络合物的稳定常数为1014.15,与Ag+和SCN-络合物的稳定常数相比,增加了4个数量级,而且形成的Ag+和S2O3 2-络合物能够溶解于水中,不会形成固体。图1(c)即为经电沉积后的基底在Na2S2O3中漂洗后的SERS图谱。可以看到,Ag2SO4消失,仅在1600cm-1左右有一个比较小的峰,推测为少量残留的S2O3 2-的峰,所制得的基底具有较好的基线。进一步从扫描电镜图(图2)可以看出,清洗前纳米银表面覆盖了一层Ag2SO4,而经过清洗后纳米银裸露,Ag2SO4去除。因此用更加稳定且溶于水的Ag络合物除去Ag2SO4的方法是可行的,能够用来处理通过该电沉积方法得到的基底的表面干扰。Since the stability constant of the Ag + and S 2 O 3 2- complex is 10 14.15 , which is 4 orders of magnitude higher than that of the Ag + and SCN - complex, and the formed Ag + and S 2 O 3 The 2- complex is soluble in water without forming a solid. Figure 1(c) is the SERS spectrum of the electrodeposited substrate after rinsing in Na 2 S 2 O 3 . It can be seen that Ag 2 SO 4 disappears, and there is only a relatively small peak around 1600cm -1 , which is presumed to be the peak of a small amount of residual S 2 O 3 2- , and the prepared substrate has a better baseline. Further, it can be seen from the scanning electron microscope image (Fig. 2) that the surface of nano-silver is covered with a layer of Ag 2 SO 4 before cleaning, but after cleaning, the nano-silver is exposed and Ag 2 SO 4 is removed. Therefore, the method of removing Ag2SO4 with more stable and water - soluble Ag complexes is feasible and can be used to deal with the surface interference of the substrate obtained by this electrodeposition method.
综上所述,本发明提出了一种可用于电沉积法制作的SERS基底拉曼背景信号去除的方法,该方法可以将在电催化领域普遍使用的纳米金属电极经过适当的电解液选择和表面干扰去除应用于拉曼光谱检测中,具有较大的应用前景。In summary, the present invention proposes a method for removing the Raman background signal of a SERS substrate made by electrodeposition, which can make nano-metal electrodes commonly used in the field of electrocatalysis through appropriate electrolyte selection and surface Interference removal is applied to Raman spectroscopy detection, which has a great application prospect.
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