CN104131286A - Stable-quality high-polishing-efficiency metal polishing fluid and preparation method thereof - Google Patents
Stable-quality high-polishing-efficiency metal polishing fluid and preparation method thereof Download PDFInfo
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- CN104131286A CN104131286A CN201410308708.3A CN201410308708A CN104131286A CN 104131286 A CN104131286 A CN 104131286A CN 201410308708 A CN201410308708 A CN 201410308708A CN 104131286 A CN104131286 A CN 104131286A
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- polishing
- auxiliary agent
- polishing fluid
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- 238000005498 polishing Methods 0.000 title claims abstract description 36
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000012530 fluid Substances 0.000 title abstract description 9
- 229910052751 metal Inorganic materials 0.000 title abstract description 6
- 239000002184 metal Substances 0.000 title abstract description 6
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 238000002156 mixing Methods 0.000 claims abstract description 10
- 229940051841 polyoxyethylene ether Drugs 0.000 claims abstract description 9
- 229920000056 polyoxyethylene ether Polymers 0.000 claims abstract description 9
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000001768 carboxy methyl cellulose Substances 0.000 claims abstract description 7
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims abstract description 7
- 239000008112 carboxymethyl-cellulose Substances 0.000 claims abstract description 7
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims abstract description 7
- 239000008367 deionised water Substances 0.000 claims abstract description 7
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 7
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 claims abstract description 5
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims abstract description 4
- 235000011130 ammonium sulphate Nutrition 0.000 claims abstract description 4
- NVIFVTYDZMXWGX-UHFFFAOYSA-N sodium metaborate Chemical compound [Na+].[O-]B=O NVIFVTYDZMXWGX-UHFFFAOYSA-N 0.000 claims abstract description 4
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229940062776 zinc aspartate Drugs 0.000 claims abstract description 4
- POEVDIARYKIEGF-CEOVSRFSSA-L zinc;(2s)-2-aminobutanedioate;hydron Chemical compound [Zn+2].[O-]C(=O)[C@@H](N)CC(O)=O.[O-]C(=O)[C@@H](N)CC(O)=O POEVDIARYKIEGF-CEOVSRFSSA-L 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- 229920002785 Croscarmellose sodium Polymers 0.000 claims description 6
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims description 6
- 229960001681 croscarmellose sodium Drugs 0.000 claims description 6
- 235000010947 crosslinked sodium carboxy methyl cellulose Nutrition 0.000 claims description 6
- 239000003995 emulsifying agent Substances 0.000 claims description 6
- 239000012467 final product Substances 0.000 claims description 6
- 238000009413 insulation Methods 0.000 claims description 6
- 239000011863 silicon-based powder Substances 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- -1 Lauryl Alcohol ester Chemical class 0.000 claims description 3
- 235000019353 potassium silicate Nutrition 0.000 claims description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000000227 grinding Methods 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 150000002191 fatty alcohols Chemical class 0.000 abstract 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 abstract 1
- 235000021314 Palmitic acid Nutrition 0.000 abstract 1
- 239000012528 membrane Substances 0.000 abstract 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 241000533950 Leucojum Species 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
A disclosed stable-quality high-polishing-efficiency metal polishing fluid is characterized by being prepared from the following raw materials in parts by weight: 11-13 parts of cerium dioxide, 0.7-1.5 parts of zinc aspartate, 1-2 parts of p-phenylenediamine, 1.5-3 parts of sodium tungstate, 2-3 parts of sodium metaborate, 5-7 parts of palmitic acid, 7-9 parts of silicon micro powder, 2.5-4 parts of ammonium sulfate, 3.5-5 parts of fatty alcohol polyoxyethylene ether, 4-6 parts of carboxymethyl cellulose, 5-7 parts of an auxiliary agent, and 300 parts of deionized water. The polishing fluid is reasonable in formula and high in technology operationality. By together grinding the abrasive, fatty alcohol polyoxyethylene ether and other surfactants and uniformly mixing with other compositions, the prepared polishing fluid is stable in quality, and does not have precipitate phenomenon. By adding the auxiliary agent, the polishing fluid has good dispersity and lubricity, is capable of forming a protective membrane layer on a workpiece processed surface, is capable of avoiding air corrosion and is convenient to clean. The polishing fluid is low in cost and high in polishing efficiency, and is applicable to polishing of multiple metals.
Description
Technical field
The present invention relates to technical field of surface, metal-polishing liquid that particularly a kind of steady quality polishing efficiency is high and preparation method thereof.
Background technology
Hardware shapes rear surface can adhere to one deck greasy dirt or other chemicals conventionally, utensil uses after for some time the corrosion by environment for use, can produce rusty stain on surface, for attractive in appearance and increase the service life, conventional special metal cleaner or rumbling compound cleared up surperficial dirt, but existing rumbling compound product exists quality unstable, return rust fast, applicable metal species is narrow, clean not thorough, polishing performance a little less than, easily produce smell, surface of polished dust, after polishing, get rusty easily, the problems such as the easy corruption of polishing fluid, the present invention i.e. the technological improvement to this mixed polishing solution.
Summary of the invention
The object of this invention is to provide metal-polishing liquid that a kind of steady quality polishing efficiency is high and preparation method thereof.
In order to realize object of the present invention, the present invention passes through following scheme implementation:
The metal-polishing liquid that steady quality polishing efficiency is high, is made up of the raw material of following weight part: cerium dioxide 11-13, Zinc aspartate 0.7-1.5, Ursol D 1-2, sodium wolframate 1.5-3, sodium metaborate 2-3, palmitinic acid 5-7, silicon powder 7-9, ammonium sulfate 2.5-4, fatty alcohol-polyoxyethylene ether 3.5-5, carboxymethyl cellulose 4-6, auxiliary agent 5-7, deionized water 300;
Described auxiliary agent is made up of the raw material of following weight part: aluminium sesquioxide 4-6, nano titanium oxide 5-7, water glass 1-2,1-Methoxy-2-propyl acetate 3-4, Lauryl Alcohol ester 2-3, methyl acrylate 2-4, croscarmellose sodium 2-3, emulsifier BP 4-5, water 50-54; First preparation method adds aluminium sesquioxide, nano titanium oxide, croscarmellose sodium, emulsifier BP in the water of half amount, grind 1-2 hour, then slowly add all the other remaining components, slowly be heated to 70 DEG C-80 DEG C, stirring reaction 30-50 minute under 300-500 rev/min of condition, is cooled to room temperature and get final product.
The high metal-polishing liquid of a kind of steady quality polishing efficiency of the present invention, made by following concrete steps:
(1) cerium dioxide, silicon powder, fatty alcohol-polyoxyethylene ether, carboxymethyl cellulose are mixed, add appropriate deionized water, be heated to 30 DEG C-35 DEG C, grind 30-40 minute, obtain mixing A material;
(2) all the other remaining components except auxiliary agent are joined in reactor, be uniformly mixed, be slowly heated to 35 DEG C-45 DEG C, insulation 1-1.5 hour, obtains mixing B material;
(3) the mixing B material of insulation is slowly joined while stirring and mixed in A material, after fully stirring, add auxiliary agent, continue to stir 20-30 minute, be cooled to room temperature and get final product.
Excellent effect of the present invention is: the present invention fills a prescription rationally, technological operation is strong, to after common the tensio-active agents such as abrasive material and fatty alcohol-polyoxyethylene ether grinding, mix with other compositions, the polishing fluid steady quality of making, there will not be deposited phenomenon, polishing effect is good, and interpolation auxiliary agent, have good wear-resisting, disperse, lubricated, film-forming properties, can form layer protecting film at workpiece machining surface, not only can prevent air corrosion, and be convenient to clean; Polishing fluid cost of the present invention is low, and polishing efficiency is high, is applicable to various metals polishing.
Embodiment
Below by specific examples, the present invention is described in detail.
The metal-polishing liquid that steady quality polishing efficiency is high, by following weight part (kilogram) raw material make: cerium dioxide 11, Zinc aspartate 0.7, Ursol D 1, sodium wolframate 1.5, sodium metaborate 2, palmitinic acid 5, silicon powder 7, ammonium sulfate 2.5, fatty alcohol-polyoxyethylene ether 3.5, carboxymethyl cellulose 4, auxiliary agent 5, deionized water 300;
Described auxiliary agent by following weight part (kilogram) raw material make: aluminium sesquioxide 4, nano titanium oxide 5, water glass 1,1-Methoxy-2-propyl acetate 3, Lauryl Alcohol ester 2, methyl acrylate 2, croscarmellose sodium 2, emulsifier BP 4, water 50; First preparation method adds aluminium sesquioxide, nano titanium oxide, croscarmellose sodium, emulsifier BP in the water of half amount, grind 1-2 hour, then slowly add all the other remaining components, slowly be heated to 70 DEG C-80 DEG C, stirring reaction 30-50 minute under 300-500 rev/min of condition, is cooled to room temperature and get final product.
The high metal-polishing liquid of a kind of steady quality polishing efficiency of the present invention, made by following concrete steps:
(1) cerium dioxide, silicon powder, fatty alcohol-polyoxyethylene ether, carboxymethyl cellulose are mixed, add appropriate deionized water, be heated to 30 DEG C-35 DEG C, grind 30-40 minute, obtain mixing A material;
(2) all the other remaining components except auxiliary agent are joined in reactor, be uniformly mixed, be slowly heated to 35 DEG C-45 DEG C, insulation 1-1.5 hour, obtains mixing B material;
(3) the mixing B material of insulation is slowly joined while stirring and mixed in A material, after fully stirring, add auxiliary agent, continue to stir 20-30 minute, be cooled to room temperature and get final product.
Laboratory test results: the surface of the each workpiece of visual inspection, workpiece surface outward appearance evenly, without heterochromatic or have slight aberration and without snowflake; Adopt BYK company of miniature glossometer A-4430(Germany) glossiness of testing each polishing workpiece surface, glossiness is 49Gu.
Claims (2)
1. the metal-polishing liquid that steady quality polishing efficiency is high, it is characterized in that, made by the raw material of following weight part: cerium dioxide 11-13, Zinc aspartate 0.7-1.5, Ursol D 1-2, sodium wolframate 1.5-3, sodium metaborate 2-3, palmitinic acid 5-7, silicon powder 7-9, ammonium sulfate 2.5-4, fatty alcohol-polyoxyethylene ether 3.5-5, carboxymethyl cellulose 4-6, auxiliary agent 5-7, deionized water 300;
Described auxiliary agent is made up of the raw material of following weight part: aluminium sesquioxide 4-6, nano titanium oxide 5-7, water glass 1-2,1-Methoxy-2-propyl acetate 3-4, Lauryl Alcohol ester 2-3, methyl acrylate 2-4, croscarmellose sodium 2-3, emulsifier BP 4-5, water 50-54; First preparation method adds aluminium sesquioxide, nano titanium oxide, croscarmellose sodium, emulsifier BP in the water of half amount, grind 1-2 hour, then slowly add all the other remaining components, slowly be heated to 70 DEG C-80 DEG C, stirring reaction 30-50 minute under 300-500 rev/min of condition, is cooled to room temperature and get final product.
2. the high metal-polishing liquid of a kind of steady quality polishing efficiency according to claim 1, is characterized in that, is made up of following concrete steps:
(1) cerium dioxide, silicon powder, fatty alcohol-polyoxyethylene ether, carboxymethyl cellulose are mixed, add appropriate deionized water, be heated to 30 DEG C-35 DEG C, grind 30-40 minute, obtain mixing A material;
(2) all the other remaining components except auxiliary agent are joined in reactor, be uniformly mixed, be slowly heated to 35 DEG C-45 DEG C, insulation 1-1.5 hour, obtains mixing B material;
(3) the mixing B material of insulation is slowly joined while stirring and mixed in A material, after fully stirring, add auxiliary agent, continue to stir 20-30 minute, be cooled to room temperature and get final product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410308708.3A CN104131286B (en) | 2014-07-01 | 2014-07-01 | Metal-polishing liquid that a kind of steady quality polishing efficiency is high and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410308708.3A CN104131286B (en) | 2014-07-01 | 2014-07-01 | Metal-polishing liquid that a kind of steady quality polishing efficiency is high and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104131286A true CN104131286A (en) | 2014-11-05 |
| CN104131286B CN104131286B (en) | 2015-10-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201410308708.3A Expired - Fee Related CN104131286B (en) | 2014-07-01 | 2014-07-01 | Metal-polishing liquid that a kind of steady quality polishing efficiency is high and preparation method thereof |
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| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11161751B2 (en) | 2017-11-15 | 2021-11-02 | Saint-Gobain Ceramics & Plastics, Inc. | Composition for conducting material removal operations and method for forming same |
| CN114959713A (en) * | 2021-02-26 | 2022-08-30 | 上海梅山钢铁股份有限公司 | Corrosion inhibitor for inhibiting pitting corrosion of low-carbon steel metallographic phase sample |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010036804A1 (en) * | 1998-05-26 | 2001-11-01 | Mueller Brian L. | CMP polishing pad including a solid catalyst |
| JP2006519490A (en) * | 2003-02-27 | 2006-08-24 | キャボット マイクロエレクトロニクス コーポレイション | CMP method for precious metals |
| CN101532142A (en) * | 2009-01-22 | 2009-09-16 | 上海瑞尔实业有限公司 | Novel surface processing technology of ordinary aluminum plate |
| CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
| CN103695912A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Metal polishing agent |
| CN103695911A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Water-soluble metal polishing agent |
-
2014
- 2014-07-01 CN CN201410308708.3A patent/CN104131286B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010036804A1 (en) * | 1998-05-26 | 2001-11-01 | Mueller Brian L. | CMP polishing pad including a solid catalyst |
| JP2006519490A (en) * | 2003-02-27 | 2006-08-24 | キャボット マイクロエレクトロニクス コーポレイション | CMP method for precious metals |
| CN101532142A (en) * | 2009-01-22 | 2009-09-16 | 上海瑞尔实业有限公司 | Novel surface processing technology of ordinary aluminum plate |
| CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
| CN103695912A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Metal polishing agent |
| CN103695911A (en) * | 2013-12-25 | 2014-04-02 | 广西博士海意信息科技有限公司 | Water-soluble metal polishing agent |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11161751B2 (en) | 2017-11-15 | 2021-11-02 | Saint-Gobain Ceramics & Plastics, Inc. | Composition for conducting material removal operations and method for forming same |
| CN114959713A (en) * | 2021-02-26 | 2022-08-30 | 上海梅山钢铁股份有限公司 | Corrosion inhibitor for inhibiting pitting corrosion of low-carbon steel metallographic phase sample |
| CN114959713B (en) * | 2021-02-26 | 2023-10-10 | 上海梅山钢铁股份有限公司 | Corrosion inhibitor for inhibiting low-carbon steel metallographic phase sample pitting corrosion |
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| CN104131286B (en) | 2015-10-28 |
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