CN104096318A - Hadron beam monitoring device and method based on pixel sensor chip - Google Patents
Hadron beam monitoring device and method based on pixel sensor chip Download PDFInfo
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Abstract
基于像素传感芯片的强子束流监控装置,包括一个垂直支架和两套独立的二维监控装置,两套二维监控装置固定在垂直支架的两垂向板上;每套二维监控装置均由硅像素芯片、芯片bonding电路板、阳极板、阴极板组成。装置的监控方法为:强子束流穿过硅像素芯片上方的气体,使气体电离产生电子簇,电子簇在硅像素芯片上方的电场的作用下漂移,由硅像素芯片上相应的像素收集;根据硅像素芯片上像素的响应,得到强子束流在硅像素芯片所在平面的二维信息;通过使强子束流依次从两套二维监控装置上相互垂直的硅像素芯片上方穿过,重建强子束流的三维分布。本发明实时监控强子束流的三维分布信息,具有束流非拦截性、抗辐射性和高的位置分辨率。
The hadron beam current monitoring device based on the pixel sensor chip includes a vertical support and two sets of independent two-dimensional monitoring devices, and the two sets of two-dimensional monitoring devices are fixed on the two vertical plates of the vertical support; each set of two-dimensional monitoring devices Both are composed of silicon pixel chips, chip bonding circuit boards, anode plates, and cathode plates. The monitoring method of the device is as follows: the hadron beam passes through the gas above the silicon pixel chip, ionizes the gas to generate electron clusters, and the electron clusters drift under the action of the electric field above the silicon pixel chip, and are collected by the corresponding pixels on the silicon pixel chip; According to the response of the pixels on the silicon pixel chip, the two-dimensional information of the hadron beam on the plane where the silicon pixel chip is located is obtained; Reconstruction of the three-dimensional distribution of hadron beams. The invention monitors the three-dimensional distribution information of the hadron beam in real time, and has the characteristics of beam non-interception, radiation resistance and high position resolution.
Description
技术领域technical field
本发明涉及强子治疗领域,具体涉及一种基于像素传感芯片的强子束流监控装置及方法,用于实时监控强子束流。The invention relates to the field of hadron therapy, in particular to a hadron beam current monitoring device and method based on a pixel sensor chip, which is used for real-time monitoring of hadron beam current.
背景技术Background technique
强子进入物质后不会马上大量释放能量,只有在强子快停下来的位置才会释放其大部分能量,形成一个尖锐的能量峰-布拉格峰,称为布拉格峰效应。根据布拉格峰效应,使用强子来替代光子、电子进行肿瘤治疗,可以避开肿瘤周围的健康组织,给肿瘤投入更多的辐射剂量,并且相对电子、光子有更强的生物效应。After the hadron enters the matter, it will not release a large amount of energy immediately, but will release most of its energy only at the position where the hadron is about to stop, forming a sharp energy peak - the Bragg peak, which is called the Bragg peak effect. According to the Bragg peak effect, using hadrons instead of photons and electrons for tumor treatment can avoid healthy tissues around the tumor, inject more radiation dose into the tumor, and have stronger biological effects than electrons and photons.
目前,强子治疗有两种束流配送技术:束流散射和束流扫描。束流散射技术是使用散射体来发散束流,再使用用户定制的准直器和补偿器使散射后的剂量分布与目标肿瘤体积一致。束流扫描技术是在电脑的控制下,使用磁铁操纵一个窄的单能束流按体元扫描目标肿瘤。由于束流散射技术需要按病人定制设备,并且散射过程中会产生大量次级粒子,所以束流扫描技术更具优势:便捷,对健康的组织损害小。使用束流扫描技术的强子治疗需要实时监控束流的强度及位置分布,并且及时反馈束流信息到控制端,使控制端对束流进行调整。Currently, there are two beam delivery techniques for hadron therapy: beam scattering and beam scanning. Beam scattering technology uses scatterers to diverge the beam, and then uses custom collimators and compensators to make the scattered dose distribution consistent with the target tumor volume. Beam scanning technology uses a magnet to manipulate a narrow mono-energy beam to scan the target tumor volume by volume under the control of a computer. Since the beam scattering technology needs to customize equipment according to the patient, and a large number of secondary particles will be generated during the scattering process, the beam scanning technology has more advantages: it is convenient and has little damage to healthy tissues. Hadron therapy using beam scanning technology requires real-time monitoring of beam intensity and position distribution, and timely feedback of beam information to the control terminal, so that the control terminal can adjust the beam current.
发明内容Contents of the invention
本发明要解决的技术问题是,针对现有束流扫描技术的强子治疗需要实时监控束流的强度及位置分布的问题,提供一种基于像素传感芯片的强子束流监控装置及方法,使用硅像素芯片实时监控强子束流,具有束流非拦截性、抗辐射性和高的位置分辨率。The technical problem to be solved by the present invention is to provide a hadron beam monitoring device and method based on a pixel sensor chip for the problem that the hadron therapy of the existing beam scanning technology needs to monitor the intensity and position distribution of the beam in real time , using silicon pixel chips to monitor hadron beams in real time, with beam non-interception, radiation resistance and high position resolution.
本发明为解决上述技术问题所采用的技术方案是:The technical scheme that the present invention adopts for solving the problems of the technologies described above is:
基于像素传感芯片的强子束流监控装置,包括一个垂直支架和两套独立的二维监控装置,垂直支架由两垂向板固接而成,两套二维监控装置分别固定在垂直支架的两垂向板上;每套二维监控装置均由硅像素芯片、芯片bonding电路板、阳极板、阴极板组成,所述阳极板与阴极板之间由氧化铝陶瓷结构分隔、并通过第一圆柱头螺栓固定连接;所述芯片bonding电路板通过环氧树脂胶固定在阳极板上,阳极板接地;所述硅像素芯片固定安装在芯片bonding电路板上。The hadron beam current monitoring device based on the pixel sensor chip includes a vertical bracket and two sets of independent two-dimensional monitoring devices. Each set of two-dimensional monitoring device consists of a silicon pixel chip, a chip bonding circuit board, an anode plate, and a cathode plate. The anode plate and the cathode plate are separated by an alumina ceramic structure and passed through a second A cylindrical head bolt is fixedly connected; the chip bonding circuit board is fixed on the anode plate through epoxy resin glue, and the anode plate is grounded; the silicon pixel chip is fixedly installed on the chip bonding circuit board.
按上述方案,所述两套二维监控装置上的氧化铝陶瓷结构分别设置在阳极板与阴极板之间位于垂直支架两垂向板不交接的端部;同时,所述两套二维监控装置的芯片bonding电路板上的硅像素芯片相互垂直布置并均设置在阳极板与阴极板之间位于垂直支架两垂向板交接的端部。According to the above scheme, the alumina ceramic structures on the two sets of two-dimensional monitoring devices are respectively arranged between the anode plate and the cathode plate at the ends where the two vertical plates of the vertical support do not meet; at the same time, the two sets of two-dimensional monitoring The silicon pixel chips on the chip bonding circuit board of the device are arranged vertically to each other and are arranged between the anode plate and the cathode plate at the end where the two vertical plates of the vertical bracket meet.
按上述方案,所述两套二维监控装置分别通过第二圆柱头螺栓固定在垂直支架的两垂向板上。According to the above scheme, the two sets of two-dimensional monitoring devices are respectively fixed on the two vertical plates of the vertical support through the second cylindrical head bolts.
按上述方案,所述阳极板、阴极板正对分布,硅像素芯片居中设置在阳极板、阴极板之间(用于保证硅像素芯片上方的电场均匀分布)。According to the above scheme, the anode plate and the cathode plate are arranged facing each other, and the silicon pixel chip is centrally arranged between the anode plate and the cathode plate (for ensuring uniform distribution of the electric field above the silicon pixel chip).
按上述方案,所述硅像素芯片基于CMOS集成电路,由像素陈列构成,像素尺寸在微米量级,每个像素都包含顶层金属,硅像素芯片用于直接收集外部空间的气体漂移来的电子、并产生电荷信号,电荷信号在像素内可以转换成模拟信号或数字信号读出。According to the above scheme, the silicon pixel chip is based on a CMOS integrated circuit and is composed of pixel arrays, the pixel size is on the order of microns, and each pixel includes a top layer of metal, and the silicon pixel chip is used to directly collect electrons drifting from the gas in the external space, And generate a charge signal, which can be converted into an analog signal or a digital signal and read out in the pixel.
按上述方案,所述芯片bonding电路板包括3.3V电压转换电路、5.0V电压转换电路、模拟输出电压驱动电路、数模转换器、数字信号处理电路和MCX适配器;所述3.3V电压转换电路分别与数字信号处理电路、硅像素芯片、数模转换器连接,用于为数字信号处理电路、硅像素芯片、数模转换器提供模拟电源和数字电源;所述数字信号处理电路与硅像素芯片连接,用于把差分数字信号转换成单端数字信号,为硅像素芯片提供数字控制信号;所述数模转换器与硅像素芯片连接,用于把数字信号转化成模拟信号,为硅像素芯片提供外部复位电压;所述5.0V电压转换电路与模拟输出电压驱动电路连接、用于为模拟输出电压驱动电路提供电压;硅像素芯片的模拟输出端经模拟输出电压驱动电路与MCX适配器连接,模拟输出电压驱动电路用于为硅像素芯片的模拟读出提供电压驱动、使硅像素芯片的模拟读出通过MCX适配器输出。According to the above scheme, the chip bonding circuit board includes a 3.3V voltage conversion circuit, a 5.0V voltage conversion circuit, an analog output voltage drive circuit, a digital-to-analog converter, a digital signal processing circuit and an MCX adapter; the 3.3V voltage conversion circuit is respectively Connected with digital signal processing circuit, silicon pixel chip, digital-to-analog converter, used to provide analog power and digital power for digital signal processing circuit, silicon pixel chip, digital-to-analog converter; said digital signal processing circuit is connected with silicon pixel chip , for converting differential digital signals into single-ended digital signals to provide digital control signals for silicon pixel chips; the digital-to-analog converter is connected to silicon pixel chips for converting digital signals into analog signals to provide silicon pixel chips External reset voltage; the 5.0V voltage conversion circuit is connected with the analog output voltage drive circuit to provide voltage for the analog output voltage drive circuit; the analog output terminal of the silicon pixel chip is connected with the MCX adapter through the analog output voltage drive circuit, and the analog output The voltage drive circuit is used to provide voltage drive for the analog readout of the silicon pixel chip, so that the analog readout of the silicon pixel chip is output through the MCX adapter.
按上述方案,所述3.3V电压转换电路、5.0V电压转换电路分别采用LM1117-3.3芯片、LM1117-5.0芯片,所述模拟输出电压驱动电路采用THS4281芯片,所述数模转换器采用DAC8568芯片,所述数字信号处理电路采用SN65LVDT14芯片。According to the above scheme, the 3.3V voltage conversion circuit and the 5.0V voltage conversion circuit adopt LM1117-3.3 chip and LM1117-5.0 chip respectively, the analog output voltage drive circuit adopts THS4281 chip, and the digital-to-analog converter adopts DAC8568 chip, The digital signal processing circuit adopts SN65LVDT14 chip.
本发明还提供了一种根据上述基于像素传感芯片的强子束流监控装置进行强子束流监控的方法,包括以下步骤:The present invention also provides a method for monitoring hadron beam current according to the hadron beam current monitoring device based on the pixel sensor chip, comprising the following steps:
1)两套二维监控装置的阴极板和阳极板之间产生电场,强子束流穿过硅像素芯片上方的气体,使气体电离产生电子簇,电子簇在硅像素芯片上方的电场的作用下漂移,由硅像素芯片上相应的像素收集;1) An electric field is generated between the cathode plate and the anode plate of the two sets of two-dimensional monitoring devices, and the hadron beam passes through the gas above the silicon pixel chip, ionizing the gas to generate electron clusters, and the electron cluster acts on the electric field above the silicon pixel chip The lower drift is collected by the corresponding pixel on the silicon pixel chip;
2)根据硅像素芯片上像素的响应,得到强子束流在硅像素芯片所在平面的二维信息;2) Obtain the two-dimensional information of the hadron beam on the plane where the silicon pixel chip is located according to the response of the pixels on the silicon pixel chip;
3)通过使强子束流依次从两套二维监控装置上相互垂直的硅像素芯片上方穿过,重建强子束流的三维分布。3) Reconstruct the three-dimensional distribution of the hadron beam by passing the hadron beam sequentially over the silicon pixel chips perpendicular to each other on two sets of two-dimensional monitoring devices.
按上述方案,所述步骤1)中强子束流从硅像素芯片的上方穿过,不直接击中硅像素芯片。According to the above scheme, in the step 1), the hadron beam passes above the silicon pixel chip and does not directly hit the silicon pixel chip.
按上述方案,所述步骤1)中所述阳极板、阴极板正对分布,硅像素芯片居中设置在阳极板、阴极板之间,用于保证硅像素芯片上方的电场均匀分布(阴极板和阳极板之间产生电场)。According to the above scheme, the anode plate and the cathode plate described in the step 1) are distributed oppositely, and the silicon pixel chip is centrally arranged between the anode plate and the cathode plate to ensure that the electric field above the silicon pixel chip is evenly distributed (cathode plate and cathode plate) An electric field is generated between the anode plates).
本发明的有益效果:能够实时监控强子束流的三维分布信息,位置分辨率高,抗辐射性,束流非拦截性,不需要密封的气体环境。The beneficial effect of the invention is that the three-dimensional distribution information of the hadron beam can be monitored in real time, the position resolution is high, the radiation resistance is good, the beam is non-intercepting, and a sealed gas environment is not required.
附图说明Description of drawings
图1是本发明的总体结构示意图;Fig. 1 is the overall structural representation of the present invention;
图2是本发明每套二维监控装置的结构示意图;Fig. 2 is the structural representation of every set of two-dimensional monitoring device of the present invention;
图3是本发明芯片bonding电路板与硅像素芯片配合连接的结构框图;Fig. 3 is a structural block diagram of the chip bonding circuit board and the silicon pixel chip of the present invention being cooperatively connected;
图4是图3中硅像素芯片及其外围电路的实施例结构示意图;Fig. 4 is a schematic structural view of an embodiment of the silicon pixel chip and its peripheral circuits in Fig. 3;
图5是图3中3.3V电压转换电路的实施例结构示意图;Fig. 5 is the embodiment structure diagram of 3.3V voltage conversion circuit in Fig. 3;
图6是图3中5V电压转换电路的实施例结构示意图;Fig. 6 is a schematic structural view of an embodiment of a 5V voltage conversion circuit in Fig. 3;
图7是图3中模拟输出电压驱动电路的实施例结构示意图;Fig. 7 is a schematic structural diagram of an embodiment of the analog output voltage drive circuit in Fig. 3;
图8是图3中MCX适配器的结构示意图;Fig. 8 is a structural representation of the MCX adapter in Fig. 3;
图9是图3中数模转换器的实施例结构示意图;Fig. 9 is a schematic structural diagram of an embodiment of a digital-to-analog converter in Fig. 3;
图10是图3中数字信号处理电路的实施例结构示意图;Fig. 10 is a schematic structural diagram of an embodiment of a digital signal processing circuit in Fig. 3;
图11是图3中硅像素芯片与外部输入连接的接插件的电路结构示意图;Fig. 11 is a schematic diagram of the circuit structure of the connector connecting the silicon pixel chip and the external input in Fig. 3;
图1~图2中,1-垂直支架,2-二维监控装置,3-硅像素芯片,4-芯片bonding电路板,5-阳极板,6-阴极板,7-氧化铝陶瓷结构,8-第一圆柱头螺栓,9-第二圆柱头螺栓。In Figures 1 to 2, 1-vertical support, 2-two-dimensional monitoring device, 3-silicon pixel chip, 4-chip bonding circuit board, 5-anode plate, 6-cathode plate, 7-alumina ceramic structure, 8 - 1st cylinder head bolt, 9 - 2nd cylinder head bolt.
具体实施方式Detailed ways
下面结合附图和实施例对本发明进行详细说明。The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
参照图1~图2所示,本发明所述的基于像素传感芯片的强子束流监控装置,包括一个垂直支架1和两套独立的二维监控装置2,垂直支架1由两垂向板固接而成,两套二维监控装置2分别固定在垂直支架1的两垂向板上(两垂向板的外侧);每套二维监控装置2均由硅像素芯片3、芯片bonding电路板4、阳极板5、阴极板6组成,所述阳极板5与阴极板6之间由氧化铝陶瓷结构7分隔、并通过第一圆柱头螺栓8固定连接;所述芯片bonding电路板4通过环氧树脂胶固定在阳极板5上,阳极板5接地;所述硅像素芯片3固定安装在芯片bonding电路板4上。Referring to Figures 1 to 2, the hadron beam monitoring device based on the pixel sensor chip of the present invention includes a vertical support 1 and two sets of independent two-dimensional monitoring devices 2, the vertical support 1 is composed of two vertical The two sets of two-dimensional monitoring devices 2 are respectively fixed on the two vertical plates of the vertical support 1 (the outer sides of the two vertical plates); each set of two-dimensional monitoring devices 2 is composed of a silicon pixel chip 3, chip bonding Composed of a circuit board 4, an anode plate 5, and a cathode plate 6, the anode plate 5 and the cathode plate 6 are separated by an alumina ceramic structure 7 and fixedly connected by first cylindrical head bolts 8; the chip bonding circuit board 4 The anode plate 5 is fixed on the anode plate 5 by epoxy glue, and the anode plate 5 is grounded; the silicon pixel chip 3 is fixedly installed on the chip bonding circuit board 4 .
所述两套二维监控装置2上的氧化铝陶瓷结构7分别设置在阳极板5与阴极板6之间位于垂直支架1两垂向板不交接的端部;同时,所述两套二维监控装置2的芯片bonding电路板4上的硅像素芯片3相互垂直布置并均设置在阳极板5与阴极板6之间位于垂直支架1两垂向板交接的端部。The alumina ceramic structures 7 on the two sets of two-dimensional monitoring devices 2 are respectively arranged between the anode plate 5 and the cathode plate 6 at the ends where the two vertical plates of the vertical support 1 do not meet; at the same time, the two sets of two-dimensional The silicon pixel chips 3 on the chip bonding circuit board 4 of the monitoring device 2 are arranged perpendicular to each other and are arranged between the anode plate 5 and the cathode plate 6 at the end of the vertical support 1 where the two vertical plates meet.
所述两套二维监控装置2分别通过第二圆柱头螺栓9固定在垂直支架1的两垂向板上。The two sets of two-dimensional monitoring devices 2 are respectively fixed on the two vertical plates of the vertical support 1 through the second cylindrical head bolts 9 .
所述阳极板5、阴极板6正对分布,硅像素芯片3居中设置在阳极板5、阴极板6之间,用于保证硅像素芯片3上方的电场均匀分布(阴极板6和阳极板5之间产生电场)。The anode plate 5 and the cathode plate 6 are oppositely distributed, and the silicon pixel chip 3 is centrally arranged between the anode plate 5 and the cathode plate 6 to ensure that the electric field above the silicon pixel chip 3 is evenly distributed (the cathode plate 6 and the anode plate 5 generate an electric field between them).
所述硅像素芯片3基于CMOS集成电路,由像素陈列构成,像素尺寸在微米量级,每个像素都包含顶层金属,硅像素芯片3用于直接收集外部空间的气体漂移来的电子、并产生电荷信号,电荷信号在像素内可以转换成模拟信号或数字信号读出。实施例中硅像素芯片3具体为专利公开号为CN102931202A公开设计的硅像素芯片。The silicon pixel chip 3 is based on a CMOS integrated circuit and is composed of pixel arrays. The pixel size is on the order of microns. Each pixel contains a top layer of metal. The silicon pixel chip 3 is used to directly collect electrons drifting from the gas in the external space and generate Charge signal, charge signal can be converted into analog signal or digital signal readout in the pixel. In the embodiment, the silicon pixel chip 3 is specifically a silicon pixel chip designed and disclosed in the patent publication number CN102931202A.
参照图3~图4所示,所述芯片bonding电路板4包括3.3V电压转换电路、5.0V电压转换电路、模拟输出电压驱动电路、数模转换器、数字信号处理电路和MCX适配器;所述3.3V电压转换电路分别与数字信号处理电路、硅像素芯片3、数模转换器连接,用于为数字信号处理电路、硅像素芯片、数模转换器提供模拟电源和数字电源;所述数字信号处理电路与硅像素芯片3连接,用于把差分数字信号转换成单端数字信号,为硅像素芯片3提供数字控制信号;所述数模转换器与硅像素芯片3连接,用于把数字信号转化成模拟信号,为硅像素芯片3提供外部复位电压;所述5.0V电压转换电路与模拟输出电压驱动电路连接、用于为模拟输出电压驱动电路提供电压;硅像素芯片3的模拟输出端经模拟输出电压驱动电路与MCX适配器连接,模拟输出电压驱动电路用于为硅像素芯片3的模拟读出提供电压驱动、使硅像素芯片3的模拟读出通过MCX适配器输出。Referring to Figures 3 to 4, the chip bonding circuit board 4 includes a 3.3V voltage conversion circuit, a 5.0V voltage conversion circuit, an analog output voltage drive circuit, a digital-to-analog converter, a digital signal processing circuit and an MCX adapter; The 3.3V voltage conversion circuit is respectively connected with the digital signal processing circuit, the silicon pixel chip 3, and the digital-to-analog converter, and is used to provide analog power and digital power for the digital signal processing circuit, the silicon pixel chip, and the digital-to-analog converter; the digital signal The processing circuit is connected to the silicon pixel chip 3, and is used to convert the differential digital signal into a single-ended digital signal, and provides a digital control signal for the silicon pixel chip 3; the digital-to-analog converter is connected to the silicon pixel chip 3, and is used to convert the digital signal Convert into analog signal, provide external reset voltage for silicon pixel chip 3; Described 5.0V voltage conversion circuit is connected with analog output voltage drive circuit, is used for providing voltage for analog output voltage drive circuit; The analog output end of silicon pixel chip 3 is passed through The analog output voltage drive circuit is connected to the MCX adapter, and the analog output voltage drive circuit is used to provide voltage drive for the analog readout of the silicon pixel chip 3, so that the analog readout of the silicon pixel chip 3 is output through the MCX adapter.
所述3.3V电压转换电路、5.0V电压转换电路分别采用图5所示的LMS1117-3.3芯片、图6所示的LM1117-5.0芯片,所述模拟输出电压驱动电路采用图7所示的德州仪器(TexasInstruments)公司的THS4281芯片,THS4281芯片的输出端与图8所示的MCX适配器连接,所述数模转换器采用图9所示的DAC8568芯片,所述数字信号处理电路采用图10所示的SN65LVDT14芯片;硅像素芯片3与外部输入通过图11所示的接插件连接。The 3.3V voltage conversion circuit and the 5.0V voltage conversion circuit adopt the LMS1117-3.3 chip shown in Figure 5 and the LM1117-5.0 chip shown in Figure 6 respectively, and the analog output voltage drive circuit adopts the Texas Instruments shown in Figure 7 (TexasInstruments) company's THS4281 chip, the output end of THS4281 chip is connected with the MCX adapter shown in Figure 8, and described digital-to-analog converter adopts DAC8568 chip shown in Figure 9, and described digital signal processing circuit adopts the shown in Figure 10 SN65LVDT14 chip; the silicon pixel chip 3 is connected to the external input through the connector shown in FIG. 11 .
所述硅像素芯片3通过bonding技术固定在芯片bonding电路板4上,芯片bonding电路板4用于为硅像素芯片3提供模拟电源、数字电源、数字控制信号、外部复位电压和模拟输出电压驱动,硅像素芯片3转换的模拟读出经过芯片bonding电路板4上的MCX适配器输出。The silicon pixel chip 3 is fixed on the chip bonding circuit board 4 by bonding technology, and the chip bonding circuit board 4 is used to provide the silicon pixel chip 3 with analog power supply, digital power supply, digital control signal, external reset voltage and analog output voltage drive, The analog readout converted by the silicon pixel chip 3 is output through the MCX adapter on the chip bonding circuit board 4 .
本发明基于像素传感芯片的强子束流监控装置进行强子束流监控的方法,包括以下步骤:The method for monitoring the hadron beam current by the hadron beam current monitoring device based on the pixel sensor chip of the present invention comprises the following steps:
1)两套二维监控装置2的阴极板6和阳极板5之间产生电场,强子束流穿过硅像素芯片3上方的气体,保证强子束流从硅像素芯片3的上方穿过,不直接击中硅像素芯片3,使气体电离产生电子簇,电子簇在硅像素芯片3上方的电场的作用下漂移,由硅像素芯片3上相应的像素收集;同时,硅像素芯片3居中设置在阳极板5、阴极板6之间,用于保证硅像素芯片3上方的电场均匀分布;1) An electric field is generated between the cathode plate 6 and the anode plate 5 of the two sets of two-dimensional monitoring devices 2, and the hadron beam passes through the gas above the silicon pixel chip 3 to ensure that the hadron beam passes above the silicon pixel chip 3 , does not directly hit the silicon pixel chip 3, so that the gas is ionized to generate electron clusters, and the electron clusters drift under the action of the electric field above the silicon pixel chip 3, and are collected by the corresponding pixels on the silicon pixel chip 3; meanwhile, the silicon pixel chip 3 is centered It is arranged between the anode plate 5 and the cathode plate 6 to ensure that the electric field above the silicon pixel chip 3 is evenly distributed;
2)根据硅像素芯片3上像素的响应,得到强子束流在硅像素芯片3所在平面的二维信息;2) According to the response of the pixels on the silicon pixel chip 3, obtain the two-dimensional information of the hadron beam on the plane where the silicon pixel chip 3 is located;
3)通过使强子束流依次从两套二维监控装置2上相互垂直的硅像素芯片3上方穿过,重建强子束流的三维分布。3) Reconstruct the three-dimensional distribution of hadron beams by passing the hadron beams sequentially over the silicon pixel chips 3 perpendicular to each other on the two sets of two-dimensional monitoring devices 2 .
最后应当说明的是,以上内容仅用以说明本发明的技术方案,而非对本发明保护范围的限制,本领域的普通技术人员对本发明的技术方案进行的简单修改或者等同替换,均不脱离本发明技术方案的实质和范围。Finally, it should be noted that the above content is only used to illustrate the technical solution of the present invention, rather than to limit the scope of protection of the present invention. Simple modifications or equivalent replacements to the technical solution of the present invention by those skilled in the art will not depart from the present invention. The essence and scope of the technical solution of the invention.
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