CN104077453A - Semiconductor nanometer device rapid simulation method based on historical information - Google Patents
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Abstract
本发明涉及一种基于历史信息的半导体纳米器件快速仿真方法,进行迭代运算时包括:记录保存输入输出信息组成输入矢量空间和输出矢量空间其中:Vin表示输入电压,Vout表示输出电压,i是当前迭代次数,M是自然数;利用线性方程x=A-1b求取加权系数其中:A为M×M维的矩阵,Anm=(di-di-n,di-di-m),b和x都是M×1维矢量,m、n都是1至M的自然数,余量计算第i+1次迭代输入这种仿真方法大大减少了迭代次数,加快了收敛速度。
The invention relates to a fast simulation method for semiconductor nano-devices based on historical information, which includes: recording and saving input and output information to form an input vector space when performing iterative calculations and the output vector space Among them: V in represents the input voltage, V out represents the output voltage, i is the current iteration number, M is a natural number; use the linear equation x=A -1 b to find the weighting coefficient Where: A is a matrix of M×M dimensions, A nm =(d i -d in ,d i -d im ), b and x are both M×1 dimensional vectors, Both m and n are natural numbers from 1 to M, and the remainder Calculate the i+1th iteration input This simulation method greatly reduces the number of iterations and speeds up the convergence.
Description
技术领域technical field
本发明涉及集成电路测试和设计技术领域,具体涉及一种基于历史信息的半导体纳米器件快速仿真方法。The invention relates to the technical field of integrated circuit testing and design, in particular to a fast simulation method for semiconductor nanometer devices based on historical information.
背景技术Background technique
近年来,随着半导体器件尺寸的不断缩小,器件进入纳米尺度,利用计算机对器件进行仿真,是研究器件结构,改善器件性能的重要手段。对纳米器件的仿真,随着尺度的缩小,对精度要求越来越高。在器件三维仿真时,假定每个方向100个格点,就需要求解100*100*100个未知数的方程,带来了运算的复杂度。对半导体器件进行仿真,需要同时求解电势方程和载流子输运方程。其中在电势方程中,电势是载流子密度的函数,在载流子输运方程中,载流子密度是电势的函数,这两个方程相互耦合,形成非线性的方程组,对这样的非线性方程组进行求解,需要对两个方程进行迭代。每进行一次迭代,就需要求解两个输运方程各一次,耗费大量的机时。In recent years, with the continuous shrinking of the size of semiconductor devices, the devices have entered the nanometer scale, and the use of computers to simulate devices is an important means to study device structures and improve device performance. For the simulation of nano-devices, as the scale shrinks, the precision requirements are getting higher and higher. In the three-dimensional simulation of the device, assuming that there are 100 grid points in each direction, it is necessary to solve 100*100*100 unknown equations, which brings computational complexity. Simulating semiconductor devices requires solving both the potential equation and the carrier transport equation. Among them, in the potential equation, the potential is a function of the carrier density, and in the carrier transport equation, the carrier density is a function of the potential. These two equations are coupled with each other to form a nonlinear equation system. For such To solve a system of nonlinear equations, two equations need to be iterated. For each iteration, the two transport equations need to be solved once, which consumes a lot of computer time.
传统方法是:在半导体器件的电子设计自动化中,需要求解相互耦合的电势方程和载流子输运方程。把两个相互耦合的方程看作一个黑盒子,设其第第i次迭代的输入量为输出量为等输入量与输出量之间的差小于一个预定的判定标准ε时,即时,认为两个方程通过迭代达到了自洽。求解这一问题的关键就是如何选取下一次(第i+1次)迭代的输入量使得方程尽快收敛。一般的方法是通过松弛法进行迭代,即通过一个松弛因子α获得下一次的输入量的,即The traditional method is: In the electronic design automation of semiconductor devices, it is necessary to solve the coupled potential equation and carrier transport equation. Consider two mutually coupled equations as a black box, and suppose the input quantity of the i-th iteration is The output is When the difference between the input quantity and the output quantity is less than a predetermined criterion ε, that is , it is considered that the two equations have reached self-consistency through iteration. The key to solving this problem is how to select the input amount of the next (i+1th) iteration make the equation converge as quickly as possible. The general method is to iterate through the relaxation method, that is, to obtain the next input amount through a relaxation factor α, that is
这种方法的局限是对α比较依赖,如果α过大,容易导致不收敛,如果α过小,则需要较多的迭代次数,收敛速度过慢。这种方法下一次(第i+1次)迭代的输入量,只与第i次的输入和输出相关,之前的历史迭代信息则被忽略了。The limitation of this method is that it is relatively dependent on α. If α is too large, it is easy to cause non-convergence. If α is too small, more iterations are required, and the convergence speed is too slow. The input amount of the next (i+1th) iteration of this method is only the same as the input of the ith time and output relevant, previous historical iteration information is ignored.
上述传统方法在进行迭代时,一般的方法是基于上一次计算的结果,而不计入历史信息,我们的研究发现,历史迭代信息可以用于加速迭代。因此,我们引入了一种减少迭代次数,加快收敛速度的计算方法,对半导体器件的电子设计自动化具有积极作用。When performing iterations in the above-mentioned traditional methods, the general method is based on the results of the last calculation without taking into account historical information. Our research has found that historical iteration information can be used to speed up iterations. Therefore, we introduce a calculation method that reduces the number of iterations and speeds up the convergence speed, which has a positive effect on the automation of electronic design of semiconductor devices.
发明内容Contents of the invention
本发明需要解决的技术问题是,如何提供一种基于历史信息的半导体纳米器件快速仿真方法,能减少迭代次数,从而加快收敛速度,对半导体器件的电子设计自动化具有积极作用。The technical problem to be solved in the present invention is how to provide a fast simulation method for semiconductor nano-devices based on historical information, which can reduce the number of iterations, thereby speeding up the convergence speed, and has a positive effect on the electronic design automation of semiconductor devices.
本发明的上述技术问题这样解决:构建一种基于历史信息的半导体纳米器件快速仿真方法,其特征在于,该仿真方法在对求解电势方程和载流子输运方程进行迭代运算时包括以下步骤:The above-mentioned technical problem of the present invention is solved like this: build a kind of semiconductor nano-device rapid simulation method based on historical information, it is characterized in that, this simulation method comprises the following steps when performing iterative calculation to solving potential equation and carrier transport equation:
利用历史迭代信息:记录保存最近的M次迭代的输入输出历史信息和以及本次输入输出信息和组成输入矢量空间和输出矢量空间其中:Vin表示输入电压,Vout表示输出电压,i是当前迭代次数,M是自然数;Use historical iteration information: record and save the input and output historical information of the latest M iterations and And this input and output information and Compose the input vector space and the output vector space Among them: V in represents the input voltage, V out represents the output voltage, i is the current iteration number, M is a natural number;
利用线性方程x=A-1b求取加权系数其中:A为M×M维的矩阵,Anm=(di-di-n,di-di-m);b和x都是M×1维矢量,m,n都是1至M的自然数;余量 Use the linear equation x=A -1 b to find the weighting coefficient Where: A is a matrix of M×M dimensions, A nm =(d i -d in ,d i -d im ); b and x are both M×1 dimensional vectors, Both m and n are natural numbers from 1 to M; the remainder
计算第i+1次迭代输入
按照本发明提供的快速仿真方法,M是能调整或改变的参数,包括自动调整和人为调整。According to the fast simulation method provided by the present invention, M is a parameter that can be adjusted or changed, including automatic adjustment and artificial adjustment.
按照本发明提供的快速仿真方法,当参数M为0时,
按照本发明提供的快速仿真方法,当i<M+1时,M自动调整为i-1。According to the fast simulation method provided by the present invention, when i<M+1, M is automatically adjusted to i-1.
按照本发明提供的快速仿真方法,当i>M时,M等于原始M值。According to the fast simulation method provided by the present invention, when i>M, M is equal to the original M value.
本发明提供的基于历史信息的半导体纳米器件快速仿真方法,在相同的器件结构参数,相同的初始猜测值条件,与传统的松弛法进行比较,分别使用不同的开放源代码纳米器件仿真工具,NanoMOS和FeMOS对不同尺寸的器件结构进行了仿真,对收敛速度进行了比较。在达到相同的求解精度的同时,减少了达到迭代所引入的迭代次数,从而减小了计算的时间,额外引入的内存消耗和计算时间消耗仅用于求解一个普通的M×M维的线性方程组。因此本发明提高了纳米器件的仿真效率,在不同器件结构,利用不同软件都达到了加速收敛的效果。The rapid simulation method of semiconductor nano-devices based on historical information provided by the present invention is compared with the traditional relaxation method under the same device structure parameters and the same initial guess value conditions, using different open-source nano-device simulation tools, NanoMOS The device structures of different sizes were simulated with FeMOS, and the convergence speed was compared. While achieving the same solution accuracy, the number of iterations introduced to achieve the iteration is reduced, thereby reducing the calculation time, and the additional memory consumption and calculation time consumption are only used to solve an ordinary M×M dimensional linear equation Group. Therefore, the invention improves the simulation efficiency of nanometer devices, and achieves the effect of accelerating convergence in different device structures and using different software.
附图说明Description of drawings
下面结合附图和具体实施例进一步对本发明进行详细说明。The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
图1是本发明在实例1中应用NanoMOS仿真的器件结构示意图;Fig. 1 is the device structural representation of the present invention application NanoMOS emulation in example 1;
图2是在相同的输入起始条件下,基于NanoMOS有限差分法纳米器件仿真工具和Matlab工具包,分别应用本发明方法和不应用本发明的传统方法,对计算误差进行对比;Fig. 2 is under the same input initial condition, based on the NanoMOS finite difference method nano-device simulation tool and the Matlab toolkit, respectively applying the method of the present invention and the traditional method without applying the present invention, and comparing the calculation errors;
图3是本发明在实例2中应用FeMOS仿真的器件结构示意图;Fig. 3 is a schematic diagram of the device structure of the present invention using FeMOS simulation in Example 2;
图4是在相同起始条件下,基于FeMOS有限元纳米器件仿真工具和Octave工具包,分别应用本发明方法和不应用本发明的传统方法,对计算误差和收敛速度对比;Fig. 4 is under the same initial condition, based on FeMOS finite element nano-device simulation tool and Octave toolkit, apply the method of the present invention and the traditional method of not applying the present invention respectively, compare calculation error and convergence speed;
图5是图4中的局部放大。FIG. 5 is a partial enlargement of FIG. 4 .
具体实施方式Detailed ways
首先,说明本发明基于历史信息的半导体纳米器件快速仿真方法的核心算法:First, the core algorithm of the semiconductor nano-device fast simulation method based on historical information of the present invention is described:
㈠算法原理(1) Algorithm principle
由于第i次迭代之前的历史信息也是通过计算获取的,可以作为获取第(i+1)次迭代输入的参考,通过计入这种历史信息,更有效得达到快速收敛的目的。首先定义第i次迭代的余量为Since the historical information before the i-th iteration is also obtained through calculation, it can be used as a reference for obtaining the input of the (i+1)-th iteration. By including this historical information, it is more effective to achieve the purpose of rapid convergence. First define the margin of the i-th iteration as
考虑前M次迭代的输入输出历史信息和本次输入输出信息,用这些输入输出组成矢量空间和把这些历史信息综合起来,加权后对输入矢量和输出矢量在以上空间中展开,记为和为展开时的加权系数,求取加权系数是有效利用历史迭代信息的关键Consider the input and output history information of the previous M iterations and the current input and output information, and use these input and output to form a vector space and Combine these historical information, after weighting, expand the input vector and output vector in the above space, denoted as and is the weighting coefficient when unfolding, and find the weighting coefficient is the key to effective use of historical iterative information
则相应的余量表达式为:Then the corresponding margin expression is:
为了使方程尽快收敛,就要使余量尽可能的小,记余量的内积为使余量的模最小化则有:In order to make the equation converge as soon as possible, it is necessary to make the margin As small as possible, the inner product of the margin is Minimizing the modulus of the remainder has:
化简上式,可以得到一个线性方程组Simplifying the above formula, we can get a system of linear equations
x=A-1bx=A - 1b
其中A为M×M维的矩阵,Anm=(di-di-n,di-di-m),b和x为M×1维矢量,分别为bm=(di-di-m,di),A和b均为已知量,解方程得到展开系数从而可以在历史迭代信息中展开,获取第(i+1)次迭代输入为Where A is an M×M dimensional matrix, A nm =(d i -d in ,d i -d im ), b and x are M×1 dimensional vectors, b m =(d i -d im ,d i ), Both A and b are known quantities, and the expansion coefficient can be obtained by solving the equation Therefore, it can be expanded in the historical iteration information, and the input of the (i+1)th iteration is obtained as
与不使用本发明的一般方法相比,通过使余量最小,包含了前M次迭代的输入输出历史信息。Compared with the general method without using the present invention, by making the margin Minimum, contains the input and output history information of the previous M iterations.
㈡边界值(ii) Boundary value
所述快速迭代方法的所用的历史迭代信息的步数M参数可调,M的取值范围是大于等于1的自然数,几个边界值如下;The step number M parameter of the historical iteration information used in the fast iterative method is adjustable, and the value range of M is a natural number greater than or equal to 1, and several boundary values are as follows;
1、当M为0时,仅使用本次迭代的信息,即退化为不使用历史信息的松弛法;1. When M is 0, only the information of this iteration is used, that is, it degenerates into a relaxation method that does not use historical information;
2、当M为1时,使用本次迭代的信息和上次迭代的信息;2. When M is 1, use the information of this iteration and the information of the last iteration;
3、当M大于等于1小于迭代次数i时,使用第i-M到第i次的历史信息;3. When M is greater than or equal to 1 and less than the number of iterations i, use the historical information from the i-M to the i-th;
4、当M大于迭代次数i时,使用从第1步到第i步的所有历史信息。4. When M is greater than the number of iterations i, use all historical information from step 1 to step i.
第二,下面结合具体实施实例和附图对本发明作进一步阐述,但本发明并不限于以下两种实施例以及NanoMOS和FeMOS两种计算工具,其中FeMOS基于有限元方法实现。Second, the present invention will be further described below in conjunction with specific implementation examples and accompanying drawings, but the present invention is not limited to the following two embodiments and the two calculation tools of NanoMOS and FeMOS, wherein FeMOS is realized based on the finite element method.
实例1Example 1
基于NanoMOS工具,不使用本发明的方法,与使用本发明的方法进行比较。(NanoMOS是由美国普渡大学的Ren Zhibin博士开发的开放源代码纳米器件二维仿真软件,利用有限差分计算方法,基于Matlab工具包,本身不使用本发明的迭代方法)。Based on the NanoMOS tool, the method without using the present invention was compared with the method using the present invention. (NanoMOS is an open source nano-device two-dimensional simulation software developed by Dr. Ren Zhibin of Purdue University in the United States, which utilizes the finite difference calculation method, based on the Matlab toolkit, and does not use the iterative method of the present invention).
器件结构如图1所示,源漏为n型掺杂,掺杂浓度1020m-3,沟道为p型掺杂,浓度为1016m-3。沟道长度为10nm,源漏长度为5nm,源漏和沟道之间有一个过渡区,长度为8nm。体硅的宽度为4nm,栅氧层的厚度为1nm,基于高性能器件的要求,电源电压为0.8V,对栅电压和漏电压进行从0.1V到0.8V的直流扫描,扫描步长为0.1V,在改变漏电压/栅电压的同时,把栅电压/漏电压固定在0.8V,收敛标准设为0.5毫电子伏特。首先设固定栅电压,然后对漏电压以0V为起始值,以0.1V为步长扫描至0.8V。然后,再对栅电压自0V为起始值,以0.1V为步长扫描至0.8V。一共有64((0.8/0.1)*(0.8/0.1))个偏置点,每当栅电压变化时,对0V的漏电压以经典近似结果为初始值,对其他偏置点以上一个偏置点的结果为初始值。在Matlab中运行,基于内置cputime命令计时,不使用本发明的方法的迭代次数为125次,仿真时间为949秒,使用本发明的方法(M值取2)的迭代次数为75次,仿真时间为624秒,如图2所示。The device structure is shown in Figure 1. The source and drain are n-type doped with a doping concentration of 1020m-3, and the channel is p-type doped with a concentration of 1016m-3. The length of the channel is 10nm, the length of the source and drain is 5nm, and there is a transition region between the source and drain and the channel with a length of 8nm. The width of the bulk silicon is 4nm, and the thickness of the gate oxide layer is 1nm. Based on the requirements of high-performance devices, the power supply voltage is 0.8V, and the gate voltage and drain voltage are scanned from 0.1V to 0.8V with a step size of 0.1 V, while changing the drain voltage/gate voltage, the gate voltage/drain voltage was fixed at 0.8 V, and the convergence criterion was set at 0.5 meV. First set a fixed gate voltage, and then take 0V as the initial value for the drain voltage, and scan to 0.8V with a step size of 0.1V. Then, the gate voltage is scanned from 0V to 0.8V with a step size of 0.1V. There are a total of 64 ((0.8/0.1)*(0.8/0.1)) bias points. Whenever the gate voltage changes, the drain voltage of 0V is taken as the initial value of the classical approximation result, and the other bias points are biased one above the other. Point the result to the initial value. Run in Matlab, based on the built-in cputime command timing, the number of iterations that does not use the method of the present invention is 125 times, and the simulation time is 949 seconds, and the number of iterations that uses the method of the present invention (M value gets 2) is 75 times, and the simulation time is 624 seconds, as shown in Figure 2.
实例2Example 2
基于FeMOS工具,不使用本发明的方法,与使用本发明的方法进行比较。(FeMOS是由新加坡高性能计算中心的Oka Kurniawan博士开发的开放源代码纳米器件二维仿真软件,利用有限元计算方法,基于Octave工具包,本身不是用本发明的方法。)Based on the FeMOS tool, without using the method of the present invention, a comparison was made with the method of the present invention. (FeMOS is the open-source nano-device two-dimensional simulation software developed by Dr. Oka Kurniawan of the Singapore High Performance Computing Center, which utilizes the finite element calculation method, based on the Octave toolkit, and does not use the method of the present invention itself.)
器件结构如图3所示,采用FeMOS的默认器件结构,其中体硅厚度3nm,栅氧层厚度1nm,源漏各5nm,沟道长度10nm,器件总长度20nm。在输运方向上采用0.25nm的均匀格点离散化,源漏为n型掺杂,掺杂浓度1020m-3,沟道为p型掺杂,浓度为1016m-3,电源电压为0.4V,对栅极和漏极分别从0V起扫描,以0.05V为步长。其中,栅电压为外层扫描,漏电压为内层扫描。首先设固定栅电压,然后对漏电压以0V为起始值,以0.05V为步长扫描至0.4V。然后,再对栅电压自0V为起始值,以0.05V为步长扫描至0.4V。一共有81((0.4/0.05+1)*(0.4/0.05+1))个偏置点,每当栅电压变化时,对0V的漏电压以经典近似结果为初始值,对其他偏置点以上一个偏置点的结果为初始值。收敛的判断标准定位1毫电子伏特,使用Octave软件包的内置命令cputime进行计时,在同一台电脑上比较,不使用本发明的方法时,耗费时间为33207秒,使用本发明的方法(M值取3),耗费时间为17309秒。不使用本发明的方法,迭代次数为611次,使用本发明的方法,迭代次数为317次,如图4所示。The device structure is shown in Figure 3. The default device structure of FeMOS is adopted. The bulk silicon thickness is 3nm, the gate oxide layer thickness is 1nm, the source and drain are 5nm each, the channel length is 10nm, and the total device length is 20nm. In the transport direction, a uniform grid point discretization of 0.25nm is adopted, the source and drain are n-type doped, the doping concentration is 1020m-3, the channel is p-type doped, the concentration is 1016m-3, and the power supply voltage is 0.4V. The gate and the drain are scanned from 0V respectively, with a step size of 0.05V. Among them, the gate voltage is the scan of the outer layer, and the drain voltage is the scan of the inner layer. First set a fixed gate voltage, and then take 0V as the initial value for the drain voltage, and scan to 0.4V with a step size of 0.05V. Then, the gate voltage is scanned from 0V to 0.4V with a step size of 0.05V. There are a total of 81 ((0.4/0.05+1)*(0.4/0.05+1)) bias points. Whenever the gate voltage changes, the drain voltage of 0V is taken as the initial value of the classical approximation result, and other bias points The result at the previous bias point is the initial value. The judging standard location of convergence is 1 millielectron volts, use the built-in order cputime of Octave software package to carry out timing, compare on the same computer, when not using the method of the present invention, time-consuming is 33207 seconds, using the method of the present invention (M value Taking 3), the time spent is 17309 seconds. Without using the method of the present invention, the number of iterations is 611, and using the method of the present invention, the number of iterations is 317, as shown in FIG. 4 .
局部放大图如图5所示,可以看到,对于一个偏置点,自相同的初始值开始进行迭代,在使用本发明的情况下通过5次迭代达到收敛,不使用本发明的情况下需要9次迭代。The partial enlarged view is shown in Figure 5. It can be seen that for a bias point, iterations are performed from the same initial value. In the case of using the present invention, convergence is achieved through 5 iterations. In the case of not using the present invention, it is required 9 iterations.
由实例1-2可知,本发明提出的基于历史迭代信息的纳米器件仿真技术,可以有效地应用于不同的纳米器件仿真工具,基于历史迭代信息的应用,有效减小迭代次数,加快仿真效率。It can be seen from Examples 1-2 that the nano-device simulation technology based on historical iteration information proposed by the present invention can be effectively applied to different nano-device simulation tools, and the application of historical iteration information can effectively reduce the number of iterations and speed up simulation efficiency.
以上所述仅为本发明的较佳实施例,凡依本发明权利要求范围所做的均等变化与修饰,皆应属本发明权利要求的涵盖范围。The above descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made according to the scope of the claims of the present invention shall fall within the scope of the claims of the present invention.
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