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CN104034693B - A kind of method that porous silicon micro-cavity biosensor based on reflective light intensity detects biomolecule - Google Patents

A kind of method that porous silicon micro-cavity biosensor based on reflective light intensity detects biomolecule Download PDF

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CN104034693B
CN104034693B CN201410194334.7A CN201410194334A CN104034693B CN 104034693 B CN104034693 B CN 104034693B CN 201410194334 A CN201410194334 A CN 201410194334A CN 104034693 B CN104034693 B CN 104034693B
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porous silicon
silicon
corrosion
refractive index
alkoxy silane
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CN104034693A (en
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贾振红
李鹏
吕小毅
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Xinjiang University
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Abstract

The present invention a kind of method that porous silicon micro-cavity biosensor based on reflective light intensity detects biomolecule is provided it is characterised in that:Main experimental apparatus are helium neon laser and luminous power detection meter;Laser instrument incides on the material with Porous Silicon Microcavity as substrate at an angle, receive meter with power and receive reflected light, find the superpower angle of the corresponding minimum light of micro-cavity structure, then add biological change porous silicon layer refractive index, detect the corresponding angle of minimum intensity of light power of reflected light again, by the change of front and rear angles, to detect interpolation biological concentration.

Description

一种基于反射光强的多孔硅微腔生物传感器检测生物分子的 方法A Porous Silicon Microcavity Biosensor Based on Reflected Light Intensity to Detect Biomolecules method

技术领域technical field

本发明涉及一种生物分子的检测方法,具体而言涉及一种基于反射光强的多孔硅微腔生物传感器检测生物分子的方法。The invention relates to a method for detecting biomolecules, in particular to a method for detecting biomolecules based on a porous silicon microcavity biosensor based on reflected light intensity.

背景技术Background technique

多孔硅生物传感器具有高灵敏度、响应速度快、实时性好、免标记、可遥控控制、结构紧凑、无电磁干扰和安全性高的特点,现在被广泛地应用于研究生物分子之间的相互作用,基因表达、新药开发、环境检测和食品安全和核辐射监测的重要研究手段。Porous silicon biosensors have the characteristics of high sensitivity, fast response, good real-time performance, label-free, remote control, compact structure, no electromagnetic interference and high safety, and are now widely used to study the interaction between biomolecules , an important research tool for gene expression, new drug development, environmental testing, food safety and nuclear radiation monitoring.

生物光学传感方法有两种:一种是利用生物分子折射率的变化原理,其主要特点是生物分子不用标记,而且样品制备简单;另一种利用于生物分子荧光标记的变化原理,主要特点检测简单而且灵敏度高。在各种生物传感器材料中,多孔硅是一种很好的生物传感器材料,具备以下优点:There are two kinds of bio-optical sensing methods: one is to use the change principle of the refractive index of biomolecules, and its main feature is that biomolecules do not need to be labeled, and the sample preparation is simple; the other is to use the change principle of biomolecular fluorescent labels, the main features The detection is simple and highly sensitive. Among various biosensor materials, porous silicon is a good biosensor material with the following advantages:

1.多孔硅生物传感器具有非常高的内表面积,方便了驻扎在多孔硅中识别感应分子(生物活性探针)与被测分子的结合,因而相比于平面器件的生物传感器,多孔硅的单位面积的信号容量显著增强;1. Porous silicon biosensors have a very high internal surface area, which facilitates the combination of sensing molecules (bioactive probes) stationed in porous silicon and the measured molecules. Therefore, compared with planar biosensors, the unit of porous silicon The signal capacity of the area is significantly enhanced;

2.多孔硅的蜂窝状孔隙结构对生物分子进行了自然包裹,很好地防止了生物成分的浸出,所以生物传感器的稳定性较强;2. The honeycomb pore structure of porous silicon wraps biological molecules naturally, which prevents the leaching of biological components well, so the stability of the biosensor is strong;

3.多孔硅的孔的大小,可用电流腐蚀时控制,所以对不同大小的生物分子,可以对应制备相应的多孔硅传感器,提高了该传感器的抗干扰能力;3. The size of the pores of porous silicon can be controlled by current corrosion, so for biomolecules of different sizes, corresponding porous silicon sensors can be prepared correspondingly, which improves the anti-interference ability of the sensor;

4.多孔硅生物传感器无毒无害,且具有非常好的生物兼容性和吸附性;4. The porous silicon biosensor is non-toxic and harmless, and has very good biocompatibility and adsorption;

5.多孔硅能保持生物活性,已有在多孔硅上生长神经元细胞、鼠肝上皮实质细胞和人类胚胎肾细胞等细胞。这些生长在多孔硅的生物细胞,可以进行正常的新陈代谢,明显好于生长在玻璃上的生物;5. Porous silicon can maintain biological activity. Cells such as neuron cells, rat liver epithelial parenchymal cells and human embryonic kidney cells have been grown on porous silicon. These biological cells grown on porous silicon can carry out normal metabolism, which is significantly better than those grown on glass;

6.多孔硅能与其它器件集成,而且多孔硅的制备方法也相当成熟稳定,可以快速,方便使用。多孔硅材料可大量用于制备光学生物传感器,同时可以对许多生物分子进行相应的改性。多孔硅生物光学传感器也可以MEMS器件的研发,并处于研究开发实用的阶段。6. Porous silicon can be integrated with other devices, and the preparation method of porous silicon is quite mature and stable, which can be used quickly and conveniently. Porous silicon materials can be widely used in the preparation of optical biosensors, and many biomolecules can be modified accordingly. Porous silicon bio-optical sensors can also be used in the research and development of MEMS devices, and are in the stage of research and development.

目前,在国际国内外的学术刊物发表的生物传感器的数量很多,越来越多的研究更加从理论走向实际的应用。比如:在玻璃为基底制备的二维光子晶体生物传感器和一维多层带隙结构的多孔硅生物传感器等的研究来看,将纳米多孔硅的生物特性与光波导或者光子晶体的带隙结构传感器结合起来的趋势,将大大提高目前的生物传感器的性能。At present, there are a large number of biosensors published in academic journals at home and abroad, and more and more researches are moving from theory to practical application. For example, in the research of two-dimensional photonic crystal biosensors prepared on glass substrates and porous silicon biosensors with one-dimensional multilayer bandgap structures, the biological characteristics of nanoporous silicon and the bandgap structure of optical waveguides or photonic crystals The trend of combining sensors will greatly improve the performance of current biosensors.

多孔硅作为基底材料用于生物检测已经被广泛的作为实验研究和应用。多孔硅通过电化学腐蚀的时候交替使用不同电流,可以制备出各种多孔硅多层结构,电化学腐蚀技术配合光刻等技术还可以制备出多孔硅波导、多孔硅光栅等各种结构。无论哪种类型的多孔硅生物传感器归根到底原理都是生物分子进入了多孔硅层的多孔结构后增大了多孔硅层的折射率,折射率增大的多少和进入生物分子的多少有关,因此利用多孔硅层的折射率的改变,就可以通过计算机模拟加入生物的实验。Porous silicon has been widely used in experimental research and application as a substrate material for biological detection. Various porous silicon multilayer structures can be prepared by alternately using different currents during electrochemical corrosion of porous silicon. Electrochemical etching technology combined with photolithography and other technologies can also prepare various structures such as porous silicon waveguides and porous silicon gratings. Regardless of the type of porous silicon biosensor, the fundamental principle is that the biomolecules enter the porous structure of the porous silicon layer and increase the refractive index of the porous silicon layer. The increase in the refractive index is related to the amount of biomolecules entering. Therefore Using the change of the refractive index of the porous silicon layer, it is possible to add biological experiments through computer simulation.

目前报道的基于多孔硅微腔的生物传感器很多,检测方法包括:反射光谱的检测和拉曼、荧光光谱的检测。There are many biosensors based on porous silicon microcavities reported so far, and the detection methods include: reflection spectrum detection and Raman and fluorescence spectrum detection.

CN101710118A公开了一种基于多孔硅三元结构微腔的光学免疫检测方法,该方法采用基于计算机精确控制的电化学腐蚀方法制备多 孔硅微腔,其中多孔硅微腔内上、下的Bragg结构由三种电流密度交替进行电化学腐蚀而形成,其特征在于对于不同条件制备的多孔硅微腔进行编码可以实现多元检测,如果是一元检测则不需要编码,使抗体或抗原在多孔硅三元结构微腔的孔洞里结合,多元检测中抗原或抗体的种类利用多孔硅微腔的编码进行标识,而通过生物反应前后的光谱峰位变化进行检测样品中相应的抗原或抗体浓度,所述检测方法包括以下步骤:CN101710118A discloses an optical immunodetection method based on a porous silicon ternary structure microcavity. The method adopts an electrochemical corrosion method based on computer precise control to prepare a porous silicon microcavity, wherein the upper and lower Bragg structures in the porous silicon microcavity are formed by Three current densities are alternately formed by electrochemical corrosion. It is characterized in that the coding of porous silicon microcavities prepared under different conditions can realize multiple detection. Combining in the holes of the microcavity, the type of antigen or antibody in multiple detection is marked by the coding of the porous silicon microcavity, and the concentration of the corresponding antigen or antibody in the sample is detected through the change of the spectral peak position before and after the biological reaction. The detection method Include the following steps:

1)抗原或抗体固定在多孔硅微腔的孔洞里,如果是需要编码的多元检测,那么一种编码的多孔硅微腔对应固定一种待测生物分子的特异性抗原或抗体,冲洗未结合的分子并封闭多孔硅微腔里的未结合生物分子的空白键位,记录测定固定有抗原或抗体的多孔硅微腔光谱;1) The antigen or antibody is immobilized in the hole of the porous silicon microcavity. If it is a multiplex detection that requires coding, then a coded porous silicon microcavity corresponds to immobilizing a specific antigen or antibody of a biomolecule to be tested, and washes out the unbound molecules and seal the blank bonds of unbound biomolecules in the porous silicon microcavity, record and measure the spectrum of the porous silicon microcavity immobilized with antigen or antibody;

2)不同多孔硅微腔与不同浓度待测溶液发生反应,使抗原-抗体在多孔硅微腔的孔洞里特异性结合,反应后进行冲洗,记录多孔硅微腔光谱及编码确定种类和浓度。2) Different porous silicon microcavities react with different concentrations of solutions to be tested, so that the antigen-antibody can be specifically combined in the pores of the porous silicon microcavity, rinse after the reaction, record the spectrum and code of the porous silicon microcavity to determine the type and concentration.

这种光学免疫检测方法不仅兼具多孔硅和光子带隙结构传感器的诸多优异性能,而且结构稳定性很好,通过编码检测技术更是可以实现多元检测。此外,由于采用的制备方法较为简单,价格相对低廉,有一定的商业应用前景。This optical immunoassay method not only has many excellent performances of porous silicon and photonic bandgap structure sensors, but also has good structural stability, and multiple detections can be realized through coded detection technology. In addition, because the preparation method adopted is relatively simple and the price is relatively low, it has certain commercial application prospects.

CN1922486A公开了一种用于分析生物样品中内含物的方法,包括:a)在合适的结合条件下,使所述生物样品与纳米多孔半导体传感器接触,所述纳米多孔半导体传感器包括纳米多孔半导体结构和连接到所述多孔半导体结构上的一个或多个第一探针,所述纳米多孔半导体结构包括置于上层和下层之间的中心层,所述上层和下层都包括5至20层交替多孔性层;所述一个或多个第一探针特异性结合所述样品中的至少一个分析物,形成一个或多个结合复合物;b)在适合促进 它们的特异性结合的条件下,使所述一个或多个结合复合物与拉曼活性探针接触;c)照射所述传感器,以便从所述传感器引发荧光发射,所述发射产生来自所述结合复合物的拉曼光谱;和d)检测由所述结合复合物产生的拉曼信号;其中,与所述结合分析物有关的拉曼信号表明所述样品中所述分析物的存在以及类型。CN1922486A discloses a method for analyzing contents in a biological sample, comprising: a) under suitable binding conditions, contacting the biological sample with a nanoporous semiconductor sensor, the nanoporous semiconductor sensor comprising a nanoporous semiconductor structure and one or more first probes connected to said porous semiconductor structure, said nanoporous semiconductor structure comprising a central layer disposed between an upper layer and a lower layer each comprising 5 to 20 alternating layers a porous layer; said one or more first probes specifically bind to at least one analyte in said sample, forming one or more binding complexes; b) under conditions suitable to promote their specific binding, contacting the one or more binding complexes with a Raman-active probe; c) illuminating the sensor to induce a fluorescent emission from the sensor, the emission producing a Raman spectrum from the binding complex; and d) detecting a Raman signal generated by said bound complex; wherein a Raman signal associated with said bound analyte indicates the presence and type of said analyte in said sample.

该方法提供用级联拉曼传感用于分析生物样品例如血清中内含物的方法。使具有特异性结合已知分析物的探针的、产生荧光的纳米多孔生物传感器与生物样品接触,形成连接于多孔半导体结构的一个或多个结合复合物。将结合复合物与拉曼活性探针接触,该拉曼活性探针特异性结合该结合复合物,照射生物传感器,从生物传感器产生荧光发射。检测结合复合物产生的拉曼信号,与结合的含蛋白质分析物有关的拉曼信号表明样品中含蛋白质化合物的存在。The method provides a method for analyzing content in a biological sample such as serum using cascaded Raman sensing. A fluorescent nanoporous biosensor having probes that specifically bind a known analyte is contacted with a biological sample to form one or more binding complexes attached to the porous semiconductor structure. Contacting the bound complex with a Raman-active probe, which specifically binds the bound complex, illuminates the biosensor, producing a fluorescent emission from the biosensor. The Raman signal generated by the bound complex is detected, and the Raman signal associated with the bound protein-containing analyte indicates the presence of the protein-containing compound in the sample.

上述反射光谱和拉曼光谱、荧光光谱的检测,缺点都是需要昂贵精密的相应光谱分析仪。因此,需要研究开发一种可以用简单的实验仪器来检测生物的检测技术。The above-mentioned reflection spectrum, Raman spectrum, and fluorescence spectrum detection all have the disadvantage of requiring expensive and precise corresponding spectrum analyzers. Therefore, it is necessary to research and develop a detection technology that can detect organisms with simple experimental instruments.

发明内容Contents of the invention

本发明的目的是提供一种基于反射光强检测的多孔硅微腔生物传感器,及其用于生物检测的方法。The object of the present invention is to provide a porous silicon microcavity biosensor based on reflected light intensity detection, and a method for biological detection thereof.

本发明与以往的检测技术最大的区别在于用简单的实验仪器来检测生物。主要的实验仪器为氦氖激光器和光功率检测计(均为普通、便宜的常规光学配置)。激光器以一定的角度入射到以多孔硅微腔为基底的材料上,用功率接收计接收反射光,找到微腔结构对应的最小光强功率的角度,然后添加生物改变多孔硅层折射率,再检测反射光的最小光强功率对应的角度,通过前后角度的改变,来检测添加生物浓度。The biggest difference between the present invention and the previous detection technology is that simple experimental instruments are used to detect organisms. The main experimental instruments are helium-neon lasers and optical power detectors (both common and cheap conventional optical configurations). The laser is incident on the material based on the porous silicon microcavity at a certain angle, and the reflected light is received by a power receiver, and the angle corresponding to the minimum light intensity power of the microcavity structure is found, and then biological substances are added to change the refractive index of the porous silicon layer, and then Detect the angle corresponding to the minimum light intensity power of the reflected light, and detect the added biological concentration through the change of the front and rear angles.

如图1所示的,这种多孔硅微腔的反射光谱是一种有缺陷峰的光谱,在固定633nm波长的激光入射时,在30°出现反射光强的最小值,图1所示的这种多孔硅微腔的结构是一种多层多孔硅结构:(HL)6C(LH)6,H是高折射率层(折射率1.52、物理厚度104nm),L是低折射率层(折射率1.21、物理厚度131nm),C是缺陷层(折射率1.21、物理厚度131nm),因为通过调制电流,就可以制备出各种折射率(1.2-2.0之间)和厚度的多层多孔硅,这里选用的结构参数分布对应相应的电流腐蚀参数。As shown in Figure 1, the reflection spectrum of this porous silicon microcavity is a spectrum with a defective peak. When the laser light with a fixed wavelength of 633nm is incident, the minimum value of reflected light intensity appears at 30°, as shown in Figure 1 The structure of this porous silicon microcavity is a multilayer porous silicon structure: (HL)6C(LH)6, H is a high refractive index layer (refractive index 1.52, physical thickness 104nm), L is a low refractive index layer (refractive index Ratio 1.21, physical thickness 131nm), C is the defect layer (refractive index 1.21, physical thickness 131nm), because by modulating the current, you can prepare multi-layer porous silicon with various refractive indices (between 1.2-2.0) and thickness, The distribution of structural parameters selected here corresponds to the corresponding galvanic corrosion parameters.

图1所示的反射谱在加入生物分子,也就是增大多孔硅微腔每一层的折射率后,光谱会整体向右移动,也就是说,反射光强的最小值不再是30°而会增大,如图2所示,A线为折射率均匀增加0.02后、反射光强的最小值接近33°,B线为折射率均匀增加0.04、反射光强的最小值是36°。The reflectance spectrum shown in Figure 1 will shift to the right as a whole after adding biomolecules, that is, increasing the refractive index of each layer of the porous silicon microcavity, that is, the minimum value of reflected light intensity is no longer 30° As shown in Figure 2, the minimum value of reflected light intensity is close to 33° after the uniform increase of the refractive index of line A by 0.02, and the minimum value of reflected light intensity of line B is 0.04 evenly increased by the refractive index of 36°.

多孔硅的制备:Preparation of porous silicon:

多孔硅的形成原理解释很多,电化学腐蚀制备多孔硅为例,就是把单晶硅作为阳极在HF酸溶液中通以恒定直流电流进行阳极氧化。单晶硅在HF酸溶液中由于所加电压大小不同或者所给恒定电流大小不同,会出现两种情况:当电流大于某个临界值时,单晶硅将会被剥离掉。当电流低于这个此临界值时,单晶硅表面将出现蜂窝状的多孔硅。There are many explanations for the formation principle of porous silicon. For example, the preparation of porous silicon by electrochemical corrosion is to use single crystal silicon as an anode and pass a constant DC current in HF acid solution for anodic oxidation. Single crystal silicon in the HF acid solution due to different applied voltages or different constant currents, there will be two situations: when the current is greater than a certain critical value, the single crystal silicon will be peeled off. When the current is lower than this critical value, honeycomb porous silicon will appear on the surface of single crystal silicon.

P型单晶硅的电化学阳极腐蚀制备多孔硅。Preparation of porous silicon by electrochemical anodic etching of p-type single crystal silicon.

步骤1.采用P型<100>单面抛光单晶硅片,其电阻率为4-8Ω-m,厚度为100±10μm。实验前分别用丙酮、无水乙醇、去离子水对硅片进行超声洗15分钟。对经过清洗后的单晶硅片进行电化学腐蚀。腐蚀液是由49%的氢氟酸和95%的乙醇按照体积比 HF:CH3CH2OH=1:1-3比例混合而成。腐蚀过程分别由电流密度为200-300mA/cm2和600-800mA/cm2的恒流源引导。首先用电流密度为200-300mA/cm2,腐蚀时间为10-30s,暂停5-10s,再用电流密度为600-800mA/cm2,腐蚀时间为10-30s,再暂停5-10s,以此交替腐蚀2-4个周期。中间微腔用600-800mA/cm2腐蚀30-60s中间暂停10-20s,最后用电流密度为600-800mA/cm2,腐蚀时间为15-25s,暂停5-10s,再用电流密度为200-300mA/cm2,腐蚀时间为15-25s,以此交替腐蚀2-4个周期。实验过程中,需要低温,把腐蚀槽放入冰水混合溶液中的超声波槽中。Step 1. Use a P-type <100> single-sided polished single crystal silicon wafer with a resistivity of 4-8Ω-m and a thickness of 100±10μm. Silicon wafers were ultrasonically washed with acetone, absolute ethanol, and deionized water for 15 minutes before the experiment. Perform electrochemical etching on the cleaned single crystal silicon wafer. The corrosion solution is prepared by mixing 49% hydrofluoric acid and 95% ethanol according to the volume ratio HF:CH 3 CH 2 OH=1:1-3. The corrosion process was guided by constant current sources with current densities of 200-300mA/ cm2 and 600-800mA/ cm2 , respectively. First use a current density of 200-300mA/cm 2 , corrosion time of 10-30s, pause for 5-10s, then use a current density of 600-800mA/cm 2 , corrosion time of 10-30s, and pause for 5-10s to This alternate etching takes 2-4 cycles. Corrode the middle microcavity with 600-800mA/cm 2 for 30-60s, pause for 10-20s in the middle, and finally use a current density of 600-800mA/cm 2 , etch for 15-25s, pause for 5-10s, and then use a current density of 200 -300mA/cm 2 , the corrosion time is 15-25s, and alternately corrodes 2-4 cycles. During the experiment, low temperature is required, and the corrosion tank is placed in an ultrasonic tank in a mixed solution of ice and water.

步骤2.将得到的多孔硅进行烷氧基硅烷修饰。Step 2. Carrying out alkoxysilane modification to the obtained porous silicon.

步骤3.将得到的烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛反应,得到带有芳叔胺基团的多孔硅。Step 3. reacting the obtained alkoxysilane-modified porous silicon with 4-(diethylamino) salicylaldehyde to obtain porous silicon with aromatic tertiary amine groups.

步骤4.将得到的带有芳叔胺基团的多孔硅浸泡在离子交换水中,去除残存的有机物。Step 4. Soak the obtained porous silicon with tertiary aromatic amine groups in ion-exchanged water to remove residual organic matter.

优选地,所述步骤2中多孔硅以质量比为1:20-1:40分散于有机溶剂中,超声处理1-2h,滴加烷氧基硅烷,90-100℃反应2-4h;反应结束后过滤除去溶剂,用无水乙醇洗涤数次,真空干燥,即得烷氧基硅烷修饰的多孔硅。Preferably, in the step 2, porous silicon is dispersed in an organic solvent at a mass ratio of 1:20-1:40, ultrasonically treated for 1-2h, alkoxysilane is added dropwise, and reacted at 90-100°C for 2-4h; After the completion, the solvent was removed by filtration, washed several times with absolute ethanol, and dried in vacuum to obtain alkoxysilane-modified porous silicon.

进一步优选地,所述有机溶剂为甲苯或二甲苯或THF或DMF,溶剂的选择对于最终得到的多孔硅的灵敏度影响不大;烷氧基硅烷优选为γ-氨丙基三甲氧基硅烷或γ-氨丙基三乙氧基硅烷,其中,烷氧基硅烷与多孔硅的质量比为1:0.1-1:0.5。Further preferably, the organic solvent is toluene or xylene or THF or DMF, and the choice of solvent has little effect on the sensitivity of the porous silicon that is finally obtained; the alkoxysilane is preferably γ-aminopropyltrimethoxysilane or γ - Aminopropyltriethoxysilane, wherein the mass ratio of alkoxysilane to porous silicon is 1:0.1-1:0.5.

对于步骤3,将步骤2得到的烷氧基硅烷修饰的多孔硅分散到无水乙醇中,超声处理10-20min,加入4-(二乙氨基)水杨醛(CAS:17754-90-4),搅拌回流6-8h后倾出上层悬浮液,过滤除去溶 剂后用无水乙醇洗涤数次,真空干燥,得到带有芳叔胺基团的多孔硅。烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的质量比为1:5-1:10。For step 3, disperse the alkoxysilane-modified porous silicon obtained in step 2 into absolute ethanol, sonicate for 10-20min, and add 4-(diethylamino)salicylaldehyde (CAS: 17754-90-4) , Stirred and refluxed for 6-8h, poured out the upper suspension, filtered to remove the solvent, washed several times with absolute ethanol, and dried in vacuum to obtain porous silicon with aromatic tertiary amine groups. The mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde is 1:5-1:10.

本发明中通过对交替电流制备的多孔硅进行修饰,得到了制备工艺简单,价格低廉的修饰多孔硅,有的产品的检测灵敏度可以高达8800±50nm/折射率单位以上。In the present invention, the porous silicon prepared by alternating current is modified to obtain modified porous silicon with simple preparation process and low price, and the detection sensitivity of some products can be as high as 8800±50nm/refractive index unit or more.

附图说明Description of drawings

图1.固定入射波长633nm的多孔硅微腔的模拟反射光谱Figure 1. Simulated reflectance spectrum of a porous silicon microcavity with a fixed incident wavelength of 633nm

图2.固定入射波长633nm的多孔硅微腔的模拟反射光谱(A线为折射率均匀增加0.02,B线为折射率均匀增加0.04)Figure 2. The simulated reflection spectrum of a porous silicon microcavity with a fixed incident wavelength of 633nm (line A is a uniform increase in refractive index of 0.02, and line B is a uniform increase in refractive index of 0.04)

具体实施方式detailed description

实施例1:Example 1:

⑴通过电化学刻蚀方法制备多孔硅:采用P型<100>单面抛光单晶硅片,其电阻率为4Ω-m,厚度为100μm。实验前分别用丙酮、无水乙醇、去离子水对硅片进行超声洗15分钟。对经过清洗后的单晶硅片进行电化学腐蚀。腐蚀液是由49%的氢氟酸和95%的乙醇按照体积比HF:CH3CH2OH=1:1比例混合而成。腐蚀过程分别由电流密度为200mA/cm2和800mA/cm2的恒流源引导。首先用电流密度为200mA/cm2,腐蚀时间为10s,暂停5s,再用电流密度为800mA/cm2,腐蚀时间为10s,再暂停5s,以此交替腐蚀2个周期。中间微腔用800mA/cm2腐蚀30s中间暂停10s,最后用电流密度为800mA/cm2,腐蚀时间为15s,暂停5s,再用电流密度为200mA/cm2,腐蚀时间为15s,以此交替腐蚀2个周期。实验过程中,需要低温,把腐蚀槽放入冰水混合溶液中的超声波槽中;(1) Prepare porous silicon by electrochemical etching method: use P-type <100> single-sided polished single-crystal silicon wafer, its resistivity is 4Ω-m, and the thickness is 100μm. Silicon wafers were ultrasonically washed with acetone, absolute ethanol, and deionized water for 15 minutes before the experiment. Perform electrochemical etching on the cleaned single crystal silicon wafer. The corrosion solution is prepared by mixing 49% hydrofluoric acid and 95% ethanol according to the volume ratio HF:CH 3 CH 2 OH=1:1. The corrosion process was guided by constant current sources with current densities of 200mA/ cm2 and 800mA/ cm2 , respectively. Firstly, the current density is 200mA/cm 2 , the etching time is 10s, pause for 5s, and then the current density is 800mA/cm 2 , the etching time is 10s, and then pause for 5s, so as to alternately corrode for 2 cycles. The middle microcavity is corroded with 800mA/cm 2 for 30s and paused for 10s. Finally, the current density is 800mA/cm 2 , the etching time is 15s, and the pause is 5s. Then the current density is 200mA/cm 2 and the etching time is 15s. Corrosion for 2 cycles. During the experiment, low temperature is required, and the corrosion tank is placed in an ultrasonic tank in a mixed solution of ice and water;

⑵将步骤⑴得到的多孔硅进行烷氧基硅烷修饰:多孔硅以质量比 为1:20分散于甲苯中,超声处理1h,滴加γ-氨丙基三甲氧基硅烷,100℃反应2h;反应结束后过滤除去溶剂,用无水乙醇洗涤数次,真空干燥,即得烷氧基硅烷修饰的多孔硅;γ-氨丙基三甲氧基硅烷与多孔硅的质量比为1:0.1;(2) The porous silicon obtained in step (1) is modified with alkoxysilane: the porous silicon is dispersed in toluene at a mass ratio of 1:20, ultrasonically treated for 1 hour, γ-aminopropyltrimethoxysilane is added dropwise, and reacted at 100°C for 2 hours; After the reaction is completed, the solvent is removed by filtration, washed several times with absolute ethanol, and dried in vacuum to obtain alkoxysilane-modified porous silicon; the mass ratio of γ-aminopropyltrimethoxysilane to porous silicon is 1:0.1;

⑶将步骤⑵得到的烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛反应,得到带有芳叔胺基团的多孔硅:将步骤⑵得到的烷氧基硅烷修饰的多孔硅分散到无水乙醇中,超声处理10min,加入4-(二乙氨基)水杨醛(CAS:17754-90-4),搅拌回流6h后倾出上层悬浮液,过滤除去溶剂后用无水乙醇洗涤数次,真空干燥,得到带有芳叔胺基团的多孔硅;烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的质量比为1:5;(3) react the alkoxysilane-modified porous silicon obtained in step (2) with 4-(diethylamino) salicylaldehyde to obtain porous silicon with aromatic tertiary amine groups: the alkoxysilane-modified silicon obtained in step (2) Disperse the porous silicon in absolute ethanol, ultrasonically treat for 10min, add 4-(diethylamino)salicylaldehyde (CAS: 17754-90-4), stir and reflux for 6h, pour out the upper layer suspension, filter to remove the solvent and use Washing with water and ethanol for several times, and vacuum drying to obtain porous silicon with aromatic tertiary amine groups; the mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde is 1:5;

⑷将步骤⑶得到的带有芳叔胺基团的多孔硅浸泡在离子交换水中,去除残存的有机物。(4) Soak the porous silicon with aromatic tertiary amine groups obtained in step (3) in ion-exchanged water to remove residual organic matter.

制备的经修饰的多孔硅的稳定性检测:修饰的多孔硅片试样放入聚甲基丙烯酸甲酯制成的流式槽中,不同的pH值的磷酸盐缓冲液依次通过微流泵送入流式槽中,每次送入缓冲液前用pH7.4,0.01M磷酸盐缓冲液洗涤流式槽5分钟。光学反射干涉光谱通过γ型光纤拾取光学信号,实时监控薄膜光学厚度变化。结果发现经修饰的多孔硅的光学厚度在pH2-12范围变化的磷酸盐缓冲液中,变化很稳定。Stability testing of the prepared modified porous silicon: the modified porous silicon sample is placed in a flow cell made of polymethyl methacrylate, and phosphate buffer solutions with different pH values are sequentially pumped through the microflow Into the flow cell, wash the flow cell with pH 7.4, 0.01M phosphate buffer for 5 minutes before each buffer solution. Optical reflectance interference spectroscopy picks up optical signals through γ-type optical fibers, and monitors the change of optical thickness of the film in real time. It was found that the optical thickness of the modified porous silicon changes very stably in the phosphate buffer solution with a pH range of 2-12.

灵敏度检测:将10uL不同折射率的有机化合物滴在硅片的表面,检测光学厚度的变化,以折射率为横轴,光学厚度为纵轴绘制线性关系图,以折射率改变1个单位的光学厚度变化量为试样的灵敏度。本发明实施例1中多孔硅的灵敏度为8850±50nm/折射率单位。Sensitivity detection: drop 10uL of organic compounds with different refractive indices on the surface of the silicon wafer, detect the change of optical thickness, draw a linear relationship graph with the horizontal axis of refractive index and the vertical axis of optical thickness, and change the optical thickness of 1 unit with the refractive index The thickness variation is the sensitivity of the sample. The sensitivity of porous silicon in Example 1 of the present invention is 8850±50 nm/refractive index unit.

测试生物分子;test biomolecules;

主要的实验仪器为氦氖激光器和光功率检测计(均为普通、便宜的常规光学配置)。激光器以一定的角度入射到以多孔硅微腔为基底的材料上,用功率接收计接收反射光,找到微腔结构对应的最小光强功率的角度,然后添加生物改变多孔硅层折射率,再检测反射光的最小光强功率对应的角度,通过前后角度的改变,来检测添加生物浓度。The main experimental instruments are helium-neon lasers and optical power detectors (both common and cheap conventional optical configurations). The laser is incident on the material based on the porous silicon microcavity at a certain angle, and the reflected light is received by a power receiver, and the angle corresponding to the minimum light intensity power of the microcavity structure is found, and then biological substances are added to change the refractive index of the porous silicon layer, and then Detect the angle corresponding to the minimum light intensity power of the reflected light, and detect the added biological concentration through the change of the front and rear angles.

事先,对确定浓度的生物分子制定浓度-角度位移的标准曲线。以便通过测试结果的角度位移值获得目标分子的浓度。In advance, a concentration-angle shift standard curve is prepared for defined concentrations of biomolecules. In order to obtain the concentration of the target molecule through the angular displacement value of the test result.

首先,测试没有加入生物小分子时的多孔硅微腔的反射光谱,记录光强最小值时的角度;First, test the reflectance spectrum of the porous silicon microcavity when no biological small molecules are added, and record the angle at the minimum value of light intensity;

其次,测试加入生物小分子后的反射光谱,记录光强最小值时的角度;Second, test the reflectance spectrum after adding small biomolecules, and record the angle at the minimum value of light intensity;

然后,分别对比其中光强最小值对应角度的红移,计算得出移动的角度差值。将该角度位移值与标准曲线相对应,读取生物小分子的浓度值。Then, compare the redshift of the angle corresponding to the minimum value of the light intensity, and calculate the angular difference of the movement. Correspond the angular displacement value with the standard curve, and read the concentration value of the biological small molecule.

实施例2:Example 2:

腐蚀过程分别由电流密度为300mA/cm2和600mA/cm2的恒流源引导。其他同实施例1,多孔硅的灵敏度为8800±50nm/折射率单位。The corrosion process was guided by constant current sources with current densities of 300mA/ cm2 and 600mA/ cm2 , respectively. Others are the same as in Embodiment 1, and the sensitivity of porous silicon is 8800±50 nm/refractive index unit.

实施例3:Example 3:

步骤⑵中的有机溶剂选用THF,其它同实施例1.所得的多孔硅的灵敏度达到8850±50nm/折射率单位。The organic solvent in step (2) is THF, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8850±50nm/refractive index unit.

实施例4:Example 4:

步骤⑵中的有机溶剂选用DMF,其它同实施例1.所得的多孔硅的灵敏度达到8850±50nm/折射率单位。The organic solvent in step (2) is DMF, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8850±50nm/refractive index unit.

实施例5:Example 5:

步骤⑵中的有机溶剂选用二甲苯,其它同实施例1.所得的多孔硅的灵敏度达到8850±50nm/折射率单位。The organic solvent in step (2) is xylene, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8850±50nm/refractive index unit.

实施例6:Embodiment 6:

步骤⑵中的γ-氨丙基三甲氧基硅烷与多孔硅的质量比为1:0.5,其它同实施例1.所得的多孔硅的灵敏度达到8900±50nm/折射率单位。The mass ratio of γ-aminopropyltrimethoxysilane to porous silicon in step (2) is 1:0.5, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8900±50 nm/refractive index unit.

实施例7:Embodiment 7:

步骤⑵中的γ-氨丙基三甲氧基硅烷与多孔硅的质量比为1:1,其它同实施例1.所得的多孔硅的灵敏度达到8830±50nm/折射率单位。The mass ratio of γ-aminopropyltrimethoxysilane to porous silicon in step (2) is 1:1, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8830±50 nm/refractive index unit.

实施例8:Embodiment 8:

步骤⑵中的γ-氨丙基三甲氧基硅烷与多孔硅的质量比为1:2,其它同实施例1.所得的多孔硅的灵敏度达到8810±50nm/折射率单位。The mass ratio of γ-aminopropyltrimethoxysilane to porous silicon in step (2) is 1:2, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8810±50 nm/refractive index unit.

实施例9:Embodiment 9:

步骤⑶中烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的质量比为1:10,其它同实施例1.所得的多孔硅的灵敏度达到8870±50nm/折射率单位。The mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde in step (3) is 1:10, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8870 ± 50nm/refractive index unit .

实施例10:Example 10:

步骤⑶中烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的质量比为1:2,其它同实施例1.所得的多孔硅的灵敏度达到8330±50nm/折射率单位。The mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde in step (3) is 1:2, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8330±50nm/refractive index unit .

实施例11:Example 11:

步骤⑶中烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的 质量比为1:15,其它同实施例1.所得的多孔硅的灵敏度达到8410±50nm/折射率单位。The mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde in step (3) is 1:15, and the others are the same as in Example 1. The sensitivity of the obtained porous silicon reaches 8410 ± 50nm/refractive index unit .

实施例12:Example 12:

腐蚀过程分别由电流密度为20mA/cm2和80mA/cm2的恒流源引导。其他同实施例1,多孔硅的灵敏度为8300±50nm/折射率单位。The corrosion process was guided by constant current sources with current densities of 20mA/ cm2 and 80mA/ cm2 , respectively. Others are the same as in Embodiment 1, and the sensitivity of porous silicon is 8300±50 nm/refractive index unit.

实施例13:Example 13:

腐蚀过程分别由电流密度为30mA/cm2和60mA/cm2的恒流源引导。其他同实施例1,多孔硅的灵敏度为8200±50nm/折射率单位。The corrosion process was guided by constant current sources with current densities of 30mA/ cm2 and 60mA/ cm2 , respectively. Others are the same as in Embodiment 1, and the sensitivity of porous silicon is 8200±50 nm/refractive index unit.

对比例1:Comparative example 1:

步骤⑴为通过电化学刻蚀方法制备多孔硅,刻蚀液为氢氟酸:无水乙醇体积比为3:1;电流密度为600mA/cm2,蚀刻时间为20秒;其他同实施例1。本发明对比例1中多孔硅的灵敏度为8600±100nm/折射率单位。Step (1) is to prepare porous silicon by electrochemical etching, the etching solution is hydrofluoric acid: absolute ethanol volume ratio is 3:1; the current density is 600mA/cm 2 , the etching time is 20 seconds; others are the same as in Example 1 . The sensitivity of porous silicon in Comparative Example 1 of the present invention is 8600±100 nm/refractive index unit.

对比例2:Comparative example 2:

电流密度为200mA/cm2,蚀刻时间为20秒;其他同对比例1。本发明对比例2中多孔硅的灵敏度为8100±100nm/折射率单位。The current density is 200mA/cm 2 , and the etching time is 20 seconds; others are the same as in Comparative Example 1. The sensitivity of porous silicon in Comparative Example 2 of the present invention is 8100±100 nm/refractive index unit.

对比例3:Comparative example 3:

未进行步骤⑶处理,其它同实施例1.结果发现多孔硅的稳定性较差,光学厚度在pH2-12范围变化的磷酸盐缓冲液中,变化较大。灵敏度不足8000±100nm/折射率单位。The treatment in step (3) was not carried out, and the others were the same as in Example 1. It was found that the stability of porous silicon was poor, and the optical thickness varied greatly in the phosphate buffer solution with a pH range of 2-12. The sensitivity is less than 8000±100nm/refractive index unit.

对比例4:Comparative example 4:

未进行步骤⑵处理,其它同实施例1.结果发现多孔硅的稳定性较差,光学厚度在pH2-12范围变化的磷酸盐缓冲液中,变化很大。Step (2) was not performed, and the others were the same as in Example 1. It was found that the stability of porous silicon was poor, and the optical thickness varied greatly in a phosphate buffer solution with a pH range of 2-12.

对比例5:Comparative example 5:

采用N型<100>单晶硅,其它同实施例1.多孔硅的灵敏度为8500±100nm/折射率单位。N-type <100> single crystal silicon is used, and the others are the same as in Example 1. The sensitivity of porous silicon is 8500±100 nm/refractive index unit.

通过实施例1,对比例3-4的比较可见,本发明的步骤⑵和⑶处理均对最终多孔硅的稳定性和灵敏度有重要影响。Through the comparison of Example 1 and Comparative Examples 3-4, it can be seen that the treatment of steps (2) and (3) of the present invention have an important impact on the stability and sensitivity of the final porous silicon.

通过实施例1,对比例1-2的比较可见,步骤⑴中采用交替电流腐蚀比单一电流强度腐蚀所得到的多孔硅的灵敏度要好。Through the comparison of Example 1 and Comparative Examples 1-2, it can be seen that the sensitivity of porous silicon obtained by alternating current etching in step (1) is better than that obtained by single current intensity etching.

实施例1与对比例5的比较可见,单晶硅的选择对最终的多孔硅灵敏度有影响。P型单晶硅更适合本发明。The comparison between Example 1 and Comparative Example 5 shows that the selection of single crystal silicon has an influence on the sensitivity of the final porous silicon. P-type single crystal silicon is more suitable for the present invention.

实施例1与2的比较可见,交替电流分别选择200-300mA/cm2和600-800mA/cm2,对最终多孔硅的灵敏度有一定影响。但是比选择交替电流分别为20-30mA/cm2和60-80mA/cm2的所得产品灵敏度高。A comparison between Examples 1 and 2 shows that the selection of alternating currents of 200-300mA/cm 2 and 600-800mA/cm 2 has certain influence on the sensitivity of the final porous silicon. However, it is more sensitive than the products obtained by selecting alternate currents of 20-30mA/cm 2 and 60-80mA/cm 2 respectively.

实施例1与3-5的比较可见,步骤⑵中溶剂的选择对最终多孔硅的灵敏度没有影响。The comparison between Example 1 and 3-5 shows that the choice of solvent in step (2) has no effect on the sensitivity of the final porous silicon.

通过实施例1,6-8的比较可见,步骤⑵中γ-氨丙基三甲氧基硅烷与多孔硅的质量比对最终多孔硅的灵敏度有重要影响。It can be seen from the comparison of Examples 1, 6-8 that the mass ratio of γ-aminopropyltrimethoxysilane to porous silicon in step (2) has an important influence on the sensitivity of the final porous silicon.

通过实施例1,9-11的比较可见,步骤⑶中烷氧基硅烷修饰的多孔硅与4-(二乙氨基)水杨醛的质量比对最终多孔硅的灵敏度有重要影响。It can be seen from the comparison of Examples 1, 9-11 that the mass ratio of alkoxysilane-modified porous silicon to 4-(diethylamino) salicylaldehyde in step (3) has an important influence on the sensitivity of the final porous silicon.

Claims (7)

1. a kind of porous silicon micro-cavity biosensor based on reflective light intensity detect biomolecule method it is characterised in that:Make Capital equipment is helium neon laser and luminous power detection meter;Laser instrument incides at an angle On the material of substrate, receive meter with the power in light power detection meter and receive reflected light, find the corresponding minimum light of micro-cavity structure Superpower angle, then adds biomolecule and changes porous silicon layer refractive index, then the minimum intensity of light power pair detecting reflected light The angle answered, by the change of front and rear angles, to detect interpolation biological concentration;The preparation method of porous silicon is (1) to pass through electrochemistry Lithographic method prepares porous silicon, wherein adopts p type single crystal silicon as the raw material preparing described porous silicon;(2) (1) step is obtained Porous silicon carries out alkoxy silane modification;(3) the porous silicon of the alkoxy silane modification (2) step being obtained and 4-(Lignocaine) Bigcatkin willow aldehyde reaction, obtains the porous silicon with aryl tertiary amine group;(4) the porous silicon with aryl tertiary amine group (3) step being obtained It is immersed in ion exchange water, remove the Organic substance of remaining;
Described step (2) middle porous silicon with mass ratio for 1:20-1:40 are scattered in organic solvent, supersound process 1-2h, Deca alkane TMOS, 90-100oC reacts 2-4h;Reaction is filtered to remove solvent after terminating, with absolute ethanol washing for several times, vacuum drying, Obtain final product the porous silicon of alkoxy silane modification;
For step (3), the porous silicon alkoxy silane that (2) step obtains modified is distributed in dehydrated alcohol, supersound process 10-20min, adds 4-(Lignocaine)Salicylide(CAS:17754-90-4), pour out upper strata suspension after being stirred at reflux 6-8h, It is filtered to remove after solvent with absolute ethanol washing for several times, vacuum drying, obtain the porous silicon with aryl tertiary amine group.
2. method according to claim 1 it is characterised in that:
(1) step adopts P type<100>Single-sided polishing monocrystalline silicon piece, its resistivity is 4-8-m, and thickness is 100 ± 10 μ m;With acetone, dehydrated alcohol, deionized water, silicon chip is carried out respectively before preparation ultrasonic washing 15 minutes;To the list after over cleaning Crystal silicon chip carries out electrochemical corrosion;Corrosive liquid be by 49% Fluohydric acid. and 95% ethanol according to volume ratio HF:CH3CH2OH= 1:1-3 ratio mixes;Corrosion process is 200-300mA/cm by electric current density respectively2And 600-800mA/cm2Constant current Source guides;It is 200-300mA/cm first with electric current density2, etching time is 10-30s, suspends 5-10s, closeer with electric current Spend for 600-800 mA/cm2, etching time is 10-30 s, then suspends 5-10 s, with the 2-4 cycle of this alternating corrosion; Middle microcavity 600-800mA/cm2Corrosion 30-60s intermediate suspension 10-20s, is finally 600- with electric current density 800mA/cm2, etching time is 15-25s, suspends 5-10s, then is 200-300mA/cm with electric current density2, etching time is 15-25s, with the 2-4 cycle of this alternating corrosion;In preparation process, need low temperature, etching tank is put in frozen water mixed solution In ultrasonic bath.
3. method according to claim 1 it is characterised in that:Described organic solvent is THF or DMF.
4. method according to claim 1 it is characterised in that:Alkoxy silane is 1 with the mass ratio of porous silicon:0.1-1: 0.5.
5. method according to claim 1 it is characterised in that:Alkoxy silane be γ-aminopropyltrimethoxysilane or Gamma-aminopropyl-triethoxy-silane.
6. method according to claim 1 it is characterised in that:Porous silicon and 4- that alkoxy silane is modified(Lignocaine) The mass ratio of salicylide is 1:5-1:10.
7. method according to claim 1 it is characterised in that:It is non-that described porous silicon is used for optics as biosensor Labelling biological detection, wherein testing sample are serum or tissue fluid.
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