CN104002515B - Composite double-sided black copper foil and manufacturing method thereof - Google Patents
Composite double-sided black copper foil and manufacturing method thereof Download PDFInfo
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 121
- 239000011889 copper foil Substances 0.000 title claims abstract description 112
- 239000002131 composite material Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 238000009713 electroplating Methods 0.000 claims abstract description 71
- 238000000034 method Methods 0.000 claims abstract description 18
- 239000000956 alloy Substances 0.000 claims abstract description 9
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 9
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims abstract description 7
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 claims abstract description 7
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001429 cobalt ion Inorganic materials 0.000 claims abstract description 7
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001431 copper ion Inorganic materials 0.000 claims abstract description 7
- 229910001425 magnesium ion Inorganic materials 0.000 claims abstract description 7
- 229910001437 manganese ion Inorganic materials 0.000 claims abstract description 7
- 229910001453 nickel ion Inorganic materials 0.000 claims abstract description 7
- 229910001415 sodium ion Inorganic materials 0.000 claims abstract description 7
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 claims description 16
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 14
- 229960000999 sodium citrate dihydrate Drugs 0.000 claims description 14
- MEYVLGVRTYSQHI-UHFFFAOYSA-L cobalt(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Co+2].[O-]S([O-])(=O)=O MEYVLGVRTYSQHI-UHFFFAOYSA-L 0.000 claims description 13
- WRUGWIBCXHJTDG-UHFFFAOYSA-L magnesium sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Mg+2].[O-]S([O-])(=O)=O WRUGWIBCXHJTDG-UHFFFAOYSA-L 0.000 claims description 13
- 229940061634 magnesium sulfate heptahydrate Drugs 0.000 claims description 13
- ISPYRSDWRDQNSW-UHFFFAOYSA-L manganese(II) sulfate monohydrate Chemical compound O.[Mn+2].[O-]S([O-])(=O)=O ISPYRSDWRDQNSW-UHFFFAOYSA-L 0.000 claims description 13
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 claims description 13
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 claims description 13
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- 238000007788 roughening Methods 0.000 claims description 9
- 229910000077 silane Inorganic materials 0.000 claims description 9
- 239000003929 acidic solution Substances 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 abstract description 11
- 238000005553 drilling Methods 0.000 abstract description 9
- 230000031700 light absorption Effects 0.000 abstract description 2
- 238000010410 dusting Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000843 powder Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910000365 copper sulfate Inorganic materials 0.000 description 8
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- HJTAZXHBEBIQQX-UHFFFAOYSA-N 1,5-bis(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=CC2=C1CCl HJTAZXHBEBIQQX-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- GOLCXWYRSKYTSP-UHFFFAOYSA-N arsenic trioxide Inorganic materials O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 1
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- Electroplating Methods And Accessories (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种具有黑化处理面(层)的铜箔,尤涉及一种具有双面黑化处理面(层)的复合式双面黑色铜箔及其制造方法。The invention relates to a copper foil with a blackened surface (layer), in particular to a composite double-sided black copper foil with a double-sided blackened surface (layer) and a manufacturing method thereof.
背景技术Background technique
近年来,具有易于大画面化和驱动速度快等特征的等离子体显示器面板(PDP)正广泛被应用在各种显示设备上。In recent years, plasma display panels (PDPs), which are characterized by easy enlargement of the screen and high driving speed, are being widely used in various display devices.
一般来说,等离子体显示器面板是利用气体放电而产生等离子体,并通过依此所产生的紫外线区的线光谱来激发单元(cell)内所设置的荧光体,以产生可见光区的光。然而,在利用气体放电产生等离子体的过程中,不仅在紫外线区会产生线光谱,甚至会于近红外线区产生波长范围广泛的线光谱。需提及的是,上述近红外线区的波长,因为接近光通讯所采用的波长,若相互接近将会有误动作的问题,且将造成产生微波或超低频电磁波的问题。Generally speaking, the plasma display panel utilizes gas discharge to generate plasma, and excites phosphors disposed in cells to generate light in the visible region through the generated line spectrum in the ultraviolet region. However, in the process of generating plasma by gas discharge, not only a line spectrum is generated in the ultraviolet region, but even a line spectrum with a wide range of wavelengths is generated in the near-infrared region. It should be mentioned that the above-mentioned wavelengths in the near-infrared region are close to the wavelengths used in optical communication. If they are close to each other, there will be problems of malfunction, and problems of generating microwaves or ultra-low frequency electromagnetic waves.
为了阻断此种电磁波或近红外线区的线光谱泄漏的问题,一般是在面板前设置由铜箔所构成的屏蔽层,通常此铜箔是利用蚀刻处理而成细线状网状体以构成屏蔽层。但由于构成屏蔽层的铜箔本身具有光泽,会将来自面板外部的光予以反射,造成画面对比恶化的问题,而且会将画面内所产生的光予以反射,进而降低光穿透率,导致显示面板辨识性恶化的问题。In order to block the leakage of this kind of electromagnetic wave or line spectrum in the near-infrared region, a shielding layer made of copper foil is generally installed in front of the panel. Usually, the copper foil is formed by etching into a thin wire mesh Shield. However, since the copper foil that forms the shielding layer is glossy, it will reflect the light from the outside of the panel, resulting in the deterioration of the picture contrast, and will reflect the light generated in the picture, thereby reducing the light transmittance, resulting in A problem that the visibility of the panel deteriorates.
为了解决上述问题,需对能有效遮蔽电磁波或近红外线区的线光谱泄漏的铜箔屏蔽层施行黑色化处理;然而,公知技术皆只在铜箔的单一面施行黑色化处理,故仅能解决铜箔单一面遮蔽电磁波的问题,造成于下游工艺需再对铜箔另一面进行黑色化处理,导致制造成本提高。另一方面,由于电子元件的高密度化、高性能化和微型化,故印刷电路板的配线也朝向高密度化;相较于传统的机械式钻孔,能进行更微细加工的激光钻孔已广泛被运用。但由于铜在二氧化碳激光的波长10μm附近的反射率接近100%,因此在通用性高的二氧化碳激光对铜箔进行激光钻孔的激光加工效率极差。In order to solve the above problems, it is necessary to implement blackening treatment on the copper foil shielding layer that can effectively shield electromagnetic waves or line spectrum leakage in the near infrared region; however, the known technologies only implement blackening treatment on a single side of the copper foil, so they can only solve The problem of shielding electromagnetic waves on one side of the copper foil causes the downstream process to blacken the other side of the copper foil, resulting in increased manufacturing costs. On the other hand, due to the high density, high performance and miniaturization of electronic components, the wiring of printed circuit boards is also moving toward high density; compared with traditional mechanical drilling, laser drilling that can perform finer processing Holes have been widely used. However, since the reflectance of copper near the wavelength of 10 μm of the carbon dioxide laser is close to 100%, the laser processing efficiency of laser drilling of copper foil with the highly versatile carbon dioxide laser is extremely poor.
再一方面,于HDI工艺有采用敷形掩模(conformalmask)方法(蚀刻法)者;有采用在铜箔表面施行黑棕化处理,使铜箔表面形成具有强烈吸光能力的细致黑氧化层结构,而可直接进行高效率的激光钻孔者;有采用铜箔薄化再进行激光钻孔者,但上述方法仍皆各存在有生产效率差、生产管理复杂、生产成本高等问题。On the other hand, in the HDI process, the conformal mask (etching method) is used; some use the black brown treatment on the surface of the copper foil to form a fine black oxide layer structure with strong light absorption ability on the surface of the copper foil. , and those who can directly perform high-efficiency laser drilling; some use copper foil thinning and then laser drilling, but the above methods still have problems such as poor production efficiency, complicated production management, and high production costs.
发明内容Contents of the invention
鉴于上述缺失,发明人等以多年的工作经验及针对上列拟解决的课题研究、实验、探讨,结果发现将铜箔两面先以硫酸铜酸性溶液洗去附着在表面上的污垢或秽物后,再以硫酸铜电镀浴于两面施以电镀后再于两面施于黑色化电镀处理,黑色化电镀前的铜箔形貌及黑色化电镀处理的形态会影响黑色镀层的色泽及均一性,基于此构思完成了本发明。In view of the above shortcomings, the inventors have used many years of work experience and researched, experimented and discussed the above-mentioned problems to be solved, and found that after washing both sides of the copper foil with an acidic solution of copper sulfate to remove the dirt or filth attached to the surface , and then apply electroplating on both sides with a copper sulfate electroplating bath, and then apply black electroplating treatment on both sides. The shape of the copper foil before black electroplating and the form of black electroplating treatment will affect the color and uniformity of the black coating. Based on This idea completes the present invention.
本发明的目的是提供一种复合式双面黑色铜箔,其特征在于同时对铜箔的两面施以黑色化处理,因此不论是亮面或暗面均呈现浓黑色外观、均一无纹斑、无掉粉发生、蚀刻性良好,适用于等离子体显示面板(PDP)、电磁波遮蔽(EMI)、高密度印刷电路板(HDI)工艺、直接激光钻孔工艺、内层板工艺、柔性铜箔基板(FCCL)、柔性印刷电路板(FPC)。The purpose of the present invention is to provide a composite double-sided black copper foil, which is characterized in that blackening treatment is applied to both sides of the copper foil at the same time, so that both the bright side and the dark side have a thick black appearance, uniform and no streaks, No powder falling, good etching performance, suitable for plasma display panel (PDP), electromagnetic wave shielding (EMI), high density printed circuit board (HDI) process, direct laser drilling process, inner layer board process, flexible copper foil substrate (FCCL), flexible printed circuit board (FPC).
根据本发明的一实施例,所述复合式双面黑色铜箔包括一铜箔及两黑化处理层;该铜箔具有一亮面及一暗面,所述两黑化处理层分别设置于该亮面及该暗面上,且所述两黑化处理层是于包含铜离子、钴离子、镍离子、锰离子、镁离子及钠离子的电镀浴进行电镀所形成的合金层。According to an embodiment of the present invention, the composite double-sided black copper foil includes a copper foil and two blackened layers; the copper foil has a bright side and a dark side, and the two blackened layers are respectively arranged on The bright side and the dark side, and the two blackening treatment layers are alloy layers formed by electroplating in an electroplating bath containing copper ions, cobalt ions, nickel ions, manganese ions, magnesium ions and sodium ions.
在本发明的一实施例中,还包括两粗化层,分别设置于所述两黑化处理层的其中之一与该亮面之间及所述两黑化处理层的其中另一与该暗面之间。In one embodiment of the present invention, it further includes two roughening layers, respectively arranged between one of the two blackening treatment layers and the bright surface and between the other one of the two blackening treatment layers and the Between the dark sides.
所述复合式双面黑色铜箔的制造方法包括以下步骤:首先,提供一铜箔,其具有一亮面及一暗面;接着,以酸性溶液处理该铜箔的亮面及暗面;随后,形成第一粗化层于该亮面,及形成第二粗化层于该暗面;之后,形成第一黑化处理层于该第一粗化层上,及形成第二黑化处理层于该第二粗化层上,其中该第一黑化处理层及该第二黑化处理层是于包含铜离子、钴离子、镍离子、锰离子、镁离子及钠离子的电镀浴进行电镀所形成的合金层。The method for manufacturing the composite double-sided black copper foil includes the following steps: firstly, providing a copper foil having a bright side and a dark side; then, treating the bright side and the dark side of the copper foil with an acidic solution; and then , forming a first roughening layer on the bright side, and forming a second roughening layer on the dark side; then, forming a first blackening treatment layer on the first roughening layer, and forming a second blackening treatment layer On the second roughened layer, wherein the first blackening treatment layer and the second blackening treatment layer are electroplated in an electroplating bath containing copper ions, cobalt ions, nickel ions, manganese ions, magnesium ions and sodium ions Alloy layer formed.
综上所述,本发明的复合式双面黑色铜箔具有在包含铜离子、钴离子、镍离子、锰离子、镁离子及钠离子的电镀浴进行电镀所形成的黑化处理层,因此在铜箔的两表面均呈现浓黑色的外观,能有效抑制由面板外部射入的光的反射及由等离子体显示面板射出的光(画面内产生的光)的反射,以提升画面的对比性及显示面板的辨识性。In summary, the composite double-sided black copper foil of the present invention has a blackening treatment layer formed by electroplating in an electroplating bath containing copper ions, cobalt ions, nickel ions, manganese ions, magnesium ions and sodium ions. Both surfaces of the copper foil have a thick black appearance, which can effectively suppress the reflection of light incident from the outside of the panel and the reflection of light emitted from the plasma display panel (light generated in the screen), so as to improve the contrast of the screen and The visibility of the display panel.
再者,所述黑化处理层具有优异的屏蔽特性,可有效阻隔电磁波、近红外线、杂散光及外光等,适用于等离子体显示面板(PDP)、电磁波遮蔽(EMI)、高密度印刷电路板(HDI)工艺、直接激光钻孔工艺、内层板工艺、柔性铜箔基板(FCCL)、柔性印刷电路板(FPC)等。Furthermore, the blackened treatment layer has excellent shielding properties, can effectively block electromagnetic waves, near-infrared rays, stray light and external light, etc., and is suitable for plasma display panels (PDP), electromagnetic wave shielding (EMI), high-density printed circuit board (HDI) process, direct laser drilling process, inner layer board process, flexible copper clad substrate (FCCL), flexible printed circuit board (FPC), etc.
附图说明Description of drawings
图1为本发明的复合式双面黑色铜箔的制造方法的流程示意图;Fig. 1 is the schematic flow sheet of the manufacturing method of composite double-sided black copper foil of the present invention;
图2为本发明的复合式双面黑色铜箔的剖面示意图;Fig. 2 is a schematic cross-sectional view of the composite double-sided black copper foil of the present invention;
图3A为本发明实施例1的复合式双面黑色铜箔的亮面的扫描式电子显微镜图;3A is a scanning electron microscope image of the bright side of the composite double-sided black copper foil according to Example 1 of the present invention;
图3B为本发明实施例1的复合式双面黑色铜箔的暗面的扫描式电子显微镜图;以及Figure 3B is a scanning electron micrograph of the dark side of the composite double-sided black copper foil according to Example 1 of the present invention; and
图4为本发明实施例7的复合式双面黑色铜箔的剖面示意图。4 is a schematic cross-sectional view of a composite double-sided black copper foil according to Example 7 of the present invention.
其中,附图标记说明如下:Wherein, the reference signs are explained as follows:
1复合式双面黑色铜箔1 Composite double-sided black copper foil
10铜箔10 copper foil
11亮面11 bright surface
12暗面12 dark side
20粗化层20 coarse layers
21第一粗化层21 first coarsening layer
22第二粗化层22 second coarsening layer
30黑化处理层30 blackened treatment layers
31第一黑化处理层31 The first blackening treatment layer
32第二黑化处理层32 second blackening treatment layer
40防锈层40 anti-rust layers
41第一防锈层41 first anti-rust layer
42第二防锈层42 second anti-rust layer
50硅烷处理层50 silane treatment layers
具体实施方式detailed description
请参阅本发明的图1及2,其中图1显示本发明的复合式双面黑色铜箔的制造方法的流程示意图,图2显示所述制造方法所制成的复合式双面黑色铜箔的剖面示意图。以下将利用各实施例和比较例以具体说明本发明,惟本发明权利范围不受此等实施例所限定。Please refer to Fig. 1 and 2 of the present invention, wherein Fig. 1 shows the schematic flow chart of the manufacturing method of the composite double-sided black copper foil of the present invention, and Fig. 2 shows the composition of the composite double-sided black copper foil made by the manufacturing method Sectional schematic. The following examples and comparative examples will be used to illustrate the present invention in detail, but the scope of rights of the present invention is not limited by these examples.
实施例1Example 1
执行步骤S10,提供一铜箔10,其具有一亮面(shinyside)11及一暗面(matteside)12。在本具体实施例中,铜箔10的厚度介于6至35μm之间且粗糙度(Rz)为1.5以下;需说明的是,所述铜箔10因工艺特性的缘故,在靠近阴极电极侧的铜箔面的组织结构以细晶粒的方式呈现,其亮度和粗糙度皆较佳,故通称为亮面11;另外,在靠近电镀液的另一侧的铜箔面的组织结构以柱状晶的方式呈现,其粗糙度通常大于亮面且呈现粉红色的外观,故通称为暗面12。Step S10 is executed to provide a copper foil 10 having a shiny side 11 and a matte side 12 . In this specific embodiment, the thickness of the copper foil 10 is between 6 and 35 μm and the roughness (Rz) is below 1.5; The microstructure of the copper foil surface is in the form of fine grains, and its brightness and roughness are better, so it is commonly called the bright side 11; in addition, the microstructure of the copper foil surface on the other side close to the electroplating solution is columnar It is presented in the form of crystal, and its roughness is usually greater than that of the bright side and has a pink appearance, so it is commonly called the dark side 12 .
执行步骤S11,以酸性溶液清洗铜箔10的亮面11和暗面12。具体而言,所述酸性溶液包含浓度为255g/L的硫酸铜五水合物及浓度为95g/L的硫酸,而清洗的时间为8秒,用以去除附着于铜箔10的亮面11和暗面12上的污垢或秽物;并于酸洗完成后以水清洗,以避免在铜箔10的两面残留有酸性溶液而影响后续工艺。Step S11 is executed to clean the bright side 11 and the dark side 12 of the copper foil 10 with an acidic solution. Specifically, the acidic solution contains copper sulfate pentahydrate with a concentration of 255g/L and sulfuric acid with a concentration of 95g/L, and the cleaning time is 8 seconds to remove the shiny surface 11 and Dirt or filth on the dark side 12; and wash with water after the pickling is completed, so as to avoid residual acid solution on both sides of the copper foil 10 and affect subsequent processes.
执行步骤S12,形成粗化层20,包括形成第一粗化层21于亮面11,及形成第二粗化层22于暗面12。具体而言,先将铜箔10置入包含浓度为86g/L的硫酸铜五水合物、浓度为95g/L的硫酸及浓度为15ppm的磷钨酸钠十八水合物的电镀浴进行电镀;其中电镀的浴温为25℃、电流密度介于10.8A/dm2至20.6A/dm2(安培/平方公寸)之间且时间为6.5秒,以对铜箔10的亮面11和暗面12进行预处理。Step S12 is executed to form the roughened layer 20 , including forming the first roughened layer 21 on the bright side 11 and forming the second roughened layer 22 on the dark side 12 . Specifically, the copper foil 10 is first placed in an electroplating bath containing copper sulfate pentahydrate with a concentration of 86g/L, sulfuric acid with a concentration of 95g/L, and sodium phosphotungstate octadecahydrate with a concentration of 15ppm for electroplating; The electroplating bath temperature is 25°C, the current density is between 10.8A/dm 2 and 20.6A/dm 2 (ampere/square inch), and the time is 6.5 seconds, so as to treat the bright side 11 and the dark side of the copper foil 10 Surface 12 is pretreated.
接着,在以水清洗后使用相同的电镀浴进行电镀;其中电镀的电流密度介于1.34A/dm2至2.59A/dm2之间且时间为9.7秒,以分别形成由铜组成的粗化结构(图未示)于铜箔10的亮面11和暗面12;同样地,在以水清洗后使用相同的电镀浴及条件进行电镀,藉以形成完整的粗化层20于铜箔10的亮面11和暗面12,从而提升复合式双面黑色铜箔1与一外部基材(图未示)的结合强度。Next, electroplating was performed using the same electroplating bath after rinsing with water; where the electroplating was performed at a current density between 1.34A/dm 2 and 2.59A/dm 2 for 9.7 seconds to form a roughening consisting of copper, respectively. structure (not shown) on the bright side 11 and dark side 12 of the copper foil 10; similarly, after washing with water, use the same electroplating bath and conditions for electroplating, so as to form a complete roughened layer 20 on the copper foil 10 The bright side 11 and the dark side 12 improve the bonding strength between the composite double-sided black copper foil 1 and an external substrate (not shown).
执行步骤S13,形成黑化处理层30,包括形成第一黑化处理层31于第一粗化层21上,及形成第二黑化处理层32于第二粗化层22上。具体而言,先以水清洗后,再将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为35g/L的硫酸镁七水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀。Step S13 is executed to form the blackened layer 30 , including forming a first blackened layer 31 on the first roughened layer 21 , and forming a second blackened layer 32 on the second roughened layer 22 . Specifically, after washing with water, the copper foil 10 formed with a complete roughened layer 20 is placed into a layer containing copper sulfate pentahydrate with a concentration of 65 g/L and nickel sulfate hexahydrate with a concentration of 9 g/L. , cobalt sulfate heptahydrate with a concentration of 45g/L, manganese sulfate monohydrate with a concentration of 20g/L, magnesium sulfate heptahydrate with a concentration of 35g/L and sodium citrate dihydrate with a concentration of 95g/L Electroplating bath for electroplating.
在本实施例中,电镀的浴温为35℃、pH值为5.5、电流密度介于6A/dm2至8A/dm2之间且时间为15秒,藉以形成完整的黑化处理层30于第一粗化层21及第二粗化层22上,从而在铜箔10的两面形成有浓黑色的外观。再者,请参阅图3A及3B,其显示所述第一黑化处理层31和第二黑化处理层32的外观均一无纹斑、无掉粉发生。In this embodiment, the electroplating bath temperature is 35°C, the pH value is 5.5, the current density is between 6A/dm2 and 8A/ dm2 , and the time is 15 seconds, so as to form a complete blackening treatment layer 30 On the first roughened layer 21 and the second roughened layer 22 , a deep black appearance is formed on both surfaces of the copper foil 10 . Furthermore, please refer to FIGS. 3A and 3B , which show that the appearance of the first blackened layer 31 and the second blackened layer 32 is uniform without streaks and powder falling.
执行步骤S14,形成防锈层40,包括形成第一防锈层41于第一黑化处理层31上,及形成第二防锈层42于第二黑化处理层32上。具体而言,先以水清洗后,再将形成有完整的粗化层20及黑化处理层30的铜箔10置入包含浓度为3g/L的硫酸锌七水合物、浓度为2g/L的铬酸及浓度为25g/L的液碱的电镀浴进行电镀;其中电镀的浴温为60℃、电流密度为1A/dm2且时间为7秒,藉以形成完整的防锈层40于第一黑化处理层31及第二黑化处理层32上,以附加防锈的功效于铜箔10上。Step S14 is executed to form the antirust layer 40 , including forming a first antirust layer 41 on the first blackened layer 31 , and forming a second antirust layer 42 on the second blackened layer 32 . Specifically, after washing with water first, the copper foil 10 formed with a complete roughening layer 20 and blackening treatment layer 30 is placed in zinc sulfate heptahydrate with a concentration of 3 g/L and a concentration of 2 g/L. chromic acid and a concentration of 25g/L of liquid caustic soda for electroplating; wherein the electroplating bath temperature is 60°C, the current density is 1A/dm 2 and the time is 7 seconds, so as to form a complete anti-rust layer 40. On the first blackened treatment layer 31 and the second blackened treatment layer 32 , an anti-rust function is added to the copper foil 10 .
执行步骤S15,形成一硅烷处理层50于第一防锈层41及第二防锈层42的其中之一上。具体而言,先以水清洗后,再以0.5wt%(重量百分浓度)的3-氨基三甲基硅烷水溶液喷洒涂布于第一防锈层41或第二防锈层42上,之后利用烘箱在150℃的温度下烘烤8秒,藉以形成硅烷处理层50于第一防锈层41或第二防锈层42上。Step S15 is executed to form a silane treatment layer 50 on one of the first anti-rust layer 41 and the second anti-rust layer 42 . Specifically, after cleaning with water first, spray and coat the first antirust layer 41 or the second antirust layer 42 with 0.5wt% (weight percentage concentration) of 3-aminotrimethylsilane aqueous solution, and then Baking in an oven at a temperature of 150° C. for 8 seconds is used to form the silane treatment layer 50 on the first anti-rust layer 41 or the second anti-rust layer 42 .
补充提及的是,依实际应用的需求,本发明的硅烷处理层50可作为绝缘涂层、光学涂层、离型涂层、防雾涂层等,或于改质的表面附加亲水性、疏水性、方向性、吸收及电荷传送等功能。经上述步骤所得到的复合式双面黑化铜箔的各特性表示于表2。It is added that, according to the needs of practical applications, the silane treatment layer 50 of the present invention can be used as an insulating coating, an optical coating, a release coating, an anti-fog coating, etc., or add hydrophilicity to the modified surface , hydrophobicity, directionality, absorption and charge transport functions. The characteristics of the composite double-sided blackened copper foil obtained through the above steps are shown in Table 2.
实施例2Example 2
实施例2与实施例1的不同之处在于步骤S12,其余步骤皆与实施例1相同。具体而言,先将铜箔10置入包含有浓度为86g/L的硫酸铜五水合物、浓度为95g/L的硫酸及浓度为400ppm的三氧化二砷的电镀浴进行电镀;其中电镀的浴温为25℃、电流密度介于13.8A/dm2至22.6A/dm2之间且时间为6.5秒,以对铜箔10的亮面11和暗面12进行预处理。The difference between embodiment 2 and embodiment 1 lies in step S12, and other steps are the same as embodiment 1. Specifically, the copper foil 10 is first placed into an electroplating bath containing copper sulfate pentahydrate with a concentration of 86g/L, sulfuric acid with a concentration of 95g/L, and arsenic trioxide with a concentration of 400ppm for electroplating; wherein the bath temperature of electroplating is 25°C, the current density is between 13.8A/dm 2 and 22.6A/dm 2 and the time is 6.5 seconds, so as to pretreat the bright side 11 and the dark side 12 of the copper foil 10 .
接着,在以水洗后使用相同的电镀浴进行电镀;其中电镀的电流密度介于1.74A/dm2至2.89A/dm2之间且时间为9.7秒,以分别形成由铜组成的粗化结构于铜箔10的亮面11和暗面12。同样地,在以水清洗后使用相同的电镀浴及条件进行电镀,藉以形成完整的粗化层20于铜箔10的亮面11和暗面12,从而提升复合式双面黑色铜箔1与一外部基材的结合强度。Then, electroplating was performed using the same electroplating bath after rinsing with water; where the electroplating was performed at a current density between 1.74A /dm2 and 2.89A /dm2 for 9.7 seconds to form a roughened structure composed of copper, respectively on the bright side 11 and the dark side 12 of the copper foil 10. Similarly, after washing with water, use the same electroplating bath and conditions for electroplating, so as to form a complete roughened layer 20 on the bright side 11 and dark side 12 of the copper foil 10, thereby improving the composite double-sided black copper foil 1 and - The bond strength of the outer substrate.
更详细地说,实施例2改变了电镀浴的组成及电镀条件。经上述步骤所得到的复合式双面黑化铜箔的各特性表示于表2。More specifically, in Example 2, the composition of the electroplating bath and the electroplating conditions were changed. The characteristics of the composite double-sided blackened copper foil obtained through the above steps are shown in Table 2.
实施例3Example 3
实施例3与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为55g/L的硫酸铜五水合物、浓度为12g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为35g/L的硫酸镁七水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between embodiment 3 and embodiment 1 lies in step S13, and the rest of the steps are the same as embodiment 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 55g/L, nickel sulfate hexahydrate with a concentration of 12g/L, and copper sulfate with a concentration of 45g/L. Cobalt sulfate heptahydrate, manganese sulfate monohydrate with a concentration of 20g/L, magnesium sulfate heptahydrate with a concentration of 35g/L and sodium citrate dihydrate with a concentration of 95g/L were used for electroplating.
更详细地说,实施例3降低了电镀浴中硫酸铜五水合物的浓度,并增加电镀浴中硫酸镍六水合物的浓度。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, Example 3 reduces the concentration of copper sulfate pentahydrate in the electroplating bath and increases the concentration of nickel sulfate hexahydrate in the electroplating bath. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
实施例4Example 4
实施例4与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为27g/L的硫酸锰一水合物、浓度为48g/L的硫酸镁七水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between embodiment 4 and embodiment 1 lies in step S13, and other steps are the same as embodiment 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and copper sulfate with a concentration of 45g/L. Cobalt sulfate heptahydrate, a concentration of 27g/L manganese sulfate monohydrate, a concentration of 48g/L magnesium sulfate heptahydrate and a concentration of 95g/L sodium citrate dihydrate electroplating bath for electroplating.
更详细地说,实施例4同时增加了电镀浴中硫酸锰一水合物和硫酸镁七水合物的浓度。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, Example 4 increases both manganese sulfate monohydrate and magnesium sulfate heptahydrate concentrations in the electroplating bath. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
实施例5Example 5
实施例5与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为35g/L的硫酸镁七水合物及浓度为115g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between embodiment 5 and embodiment 1 lies in step S13, and other steps are the same as embodiment 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and copper sulfate with a concentration of 45g/L. Cobalt sulfate heptahydrate, a concentration of manganese sulfate monohydrate of 20g/L, a concentration of magnesium sulfate heptahydrate of 35g/L and a concentration of sodium citrate dihydrate of 115g/L were used for electroplating.
更详细地说,实施例5增加了电镀浴中柠檬酸钠二水合物的浓度。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, Example 5 increases the concentration of sodium citrate dihydrate in the plating bath. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
实施例6Example 6
实施例6与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为38g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为48g/L的硫酸镁七水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between embodiment 6 and embodiment 1 lies in step S13, and other steps are the same as embodiment 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and copper sulfate with a concentration of 38g/L. Cobalt sulfate heptahydrate, manganese sulfate monohydrate with a concentration of 20g/L, magnesium sulfate heptahydrate with a concentration of 48g/L and sodium citrate dihydrate with a concentration of 95g/L were used for electroplating.
更详细地说,实施例6降低了电镀浴中硫酸钴七水合物的浓度。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, Example 6 reduces the concentration of cobalt sulfate heptahydrate in the electroplating bath. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
实施例7Example 7
请参阅图4,实施例7与实施例1的不同之处在于未执行步骤S12。具体而言,将铜箔10置入包含浓度为70g/L的硫酸铜五水合物、浓度为12g/L的硫酸镍六水合物、浓度为50g/L的硫酸钴七水合物、浓度为25g/L的硫酸锰一水合物、浓度为40g/L的硫酸镁七水合物及浓度为135g/L的柠檬酸钠二水合物的电镀浴进行电镀。Please refer to FIG. 4 , the difference between embodiment 7 and embodiment 1 is that step S12 is not executed. Specifically, the copper foil 10 is placed in copper sulfate pentahydrate with a concentration of 70 g/L, nickel sulfate hexahydrate with a concentration of 12 g/L, cobalt sulfate heptahydrate with a concentration of 50 g/L, and a concentration of 25 g/L. /L manganese sulfate monohydrate, magnesium sulfate heptahydrate with a concentration of 40g/L and sodium citrate dihydrate with a concentration of 135g/L for electroplating.
因此,实施例7的复合式双面黑化铜箔1未形成有第一粗化层21及第二粗化层22,而第一黑化处理层31形成于铜箔10的亮面11,第二黑化处理层32则形成于铜箔10的暗面12,并且所述第一黑化处理层31及第二黑化处理层32分别具有更为浓郁的黑色度。Therefore, the composite double-sided blackened copper foil 1 of Example 7 is not formed with the first roughened layer 21 and the second roughened layer 22, but the first blackened treatment layer 31 is formed on the bright side 11 of the copper foil 10, The second blackened layer 32 is formed on the dark side 12 of the copper foil 10 , and the first blackened layer 31 and the second blackened layer 32 have richer blackness respectively.
比较例1Comparative example 1
比较例1与实施例1的不同之处在于步骤S12不予实施,即未形成有粗化层20,其余步骤皆与实施例1相同。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。The difference between Comparative Example 1 and Example 1 is that step S12 is not implemented, that is, no roughening layer 20 is formed, and the rest of the steps are the same as Example 1. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
比较例2Comparative example 2
比较例2与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为35g/L的硫酸镁七水合物及浓度为70g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between Comparative Example 2 and Example 1 lies in step S13, and the rest of the steps are the same as Example 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and copper sulfate with a concentration of 45g/L. Cobalt sulfate heptahydrate, manganese sulfate monohydrate with a concentration of 20g/L, magnesium sulfate heptahydrate with a concentration of 35g/L and sodium citrate dihydrate with a concentration of 70g/L were used for electroplating.
更详细地说,比较例2降低了电镀浴中柠檬酸钠二水合物的浓度。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, Comparative Example 2 reduces the concentration of sodium citrate dihydrate in the plating bath. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
比较例3Comparative example 3
比较例3与实施例1的不同之处在于步骤S13,其余步骤皆与实施例1相同。具体而言,将形成有完整的粗化层20的铜箔10置入包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀。The difference between Comparative Example 3 and Example 1 lies in step S13, and the rest of the steps are the same as Example 1. Specifically, the copper foil 10 formed with a complete roughened layer 20 was placed into copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and copper sulfate with a concentration of 45g/L. Cobalt sulfate heptahydrate, a concentration of 20g/L manganese sulfate monohydrate and a concentration of 95g/L sodium citrate dihydrate electroplating bath for electroplating.
更详细地说,比较例3的电镀浴未包含硫酸镁七水合物。经上述步骤所得到的复合式双面黑化铜箔1的各特性表示于表2。In more detail, the electroplating bath of Comparative Example 3 did not contain magnesium sulfate heptahydrate. The properties of the composite double-sided blackened copper foil 1 obtained through the above steps are shown in Table 2.
需注意的是,若电镀浴中硫酸铜五水合物的浓度小于40g/L,黑色色度会不足;若大于80g/L,会产生掉铜粉(粉落)的现象。若硫酸镍六水合物的浓度小于5g/L,黑色色度会不足;若大于15g/L,蚀刻性会变差。若硫酸钴七水合物的浓度小于30g/L,黑色色度会不足;若大于60g/L,会产生斑纹。若硫酸锰一水合物的浓度小于15g/L,黑色色度会不足;若大于30g/L,会产生掉铜粉(粉落)的现象。若硫酸镁七水合物的浓度小于20g/L,黑色色度会不足;若大于50g/L,会产生斑纹。若柠檬酸钠二水合物的浓度小于80g/L,黑色色度会不足;若大于150g/L,电镀浴会产生沉淀。It should be noted that if the concentration of copper sulfate pentahydrate in the electroplating bath is less than 40g/L, the black chroma will be insufficient; if it is greater than 80g/L, copper powder (powder falling) will occur. If the concentration of nickel sulfate hexahydrate is less than 5g/L, the black chroma will be insufficient; if it is greater than 15g/L, the etchability will be deteriorated. If the concentration of cobalt sulfate heptahydrate is less than 30g/L, the black chroma will be insufficient; if it is greater than 60g/L, streaks will occur. If the concentration of manganese sulfate monohydrate is less than 15g/L, the black chroma will be insufficient; if it is greater than 30g/L, copper powder (powder falling) will occur. If the concentration of magnesium sulfate heptahydrate is less than 20g/L, the black chroma will be insufficient; if it is greater than 50g/L, streaks will occur. If the concentration of sodium citrate dihydrate is less than 80g/L, the black chroma will be insufficient; if it is greater than 150g/L, precipitation will occur in the electroplating bath.
再者,若电镀的温度大于20℃,会产生斑纹;若大于60℃,黑色色度会不足。若pH值小于4,电镀浴会产生沉淀;若大于7,黑色色度会不足。若电流密度小于3A/dm2,黑色色度会不足;若大于20A/dm2,会产生掉铜粉(粉落)的现象。若电镀时间小于10秒,黑色色度会不足;若大于30秒,会产生掉铜粉(粉落)的现象。Furthermore, if the electroplating temperature is higher than 20°C, streaks will occur; if it is higher than 60°C, the black chroma will be insufficient. If the pH value is less than 4, the electroplating bath will produce precipitation; if it is greater than 7, the black chroma will be insufficient. If the current density is less than 3A/dm 2 , the black chroma will be insufficient; if it is greater than 20A/dm 2 , copper powder will fall off (powder drop). If the electroplating time is less than 10 seconds, the black chroma will be insufficient; if it is longer than 30 seconds, copper powder (powder fall) will occur.
请参阅下列表1及2,表1显示本发明各实施例与各比较例所使用的电镀液组成,图2显示本发明各实施例与各比较例的物理特性。其中,本发明各实施例与各比较例的物理特性测试项目包括:Please refer to Tables 1 and 2 below. Table 1 shows the composition of the electroplating solution used in each embodiment of the present invention and each comparative example. FIG. 2 shows the physical properties of each embodiment of the present invention and each comparative example. Wherein, the physical property test items of each embodiment of the present invention and each comparative example include:
A.外观斑纹:关于外观表面的黑色色斑条纹以目视判定。A. Appearance streaks: visually judge the black spots and stripes on the appearance surface.
B.色度Y值:以色差计测定。B. Chromaticity Y value: Measured with a color difference meter.
C.光泽度:以光泽度计测定。C. Gloss: Measured with a gloss meter.
D.粉落:将滤纸的一面以指尖按在铜箔10的亮面11和暗面12的全宽左侧位置,由左至右滑行约30公分,测试完的滤纸再与样品卡比较,判定等级。D. Powder fall: Press one side of the filter paper with your fingertips on the left side of the full width of the bright side 11 and dark side 12 of the copper foil 10, slide it from left to right for about 30 cm, and compare the tested filter paper with the sample card , to determine the grade.
<粉落等级的评价基准><Evaluation Criteria for Powder Falling Level>
O:≦1级O:≦Level 1
△:≦1-2级△:≦Level 1-2
X:≦2级X:≦Level 2
E.蚀刻性:将试验片制作成为线宽/线距:75/75(μm),置于含氯化铜265.9g/l,双氧水150ml/l,HCl224ml/l的酸性蚀刻液中,于温度55℃条件下浸渍5分钟后,以3%NaOH溶液于温度48℃条件下去膜。水洗后,电镀镍层,然后切片,以OM(光学显微镜)及SEM(扫瞄式电子显微镜)观察毛边情形。E. Etching: The test piece is made into a line width/line spacing: 75/75 (μm), placed in an acid etching solution containing 265.9g/l of copper chloride, 150ml/l of hydrogen peroxide, and 224ml/l of HCl, at temperature After dipping at 55°C for 5 minutes, remove the film with 3% NaOH solution at 48°C. After washing with water, the nickel layer was electroplated, then sliced, and the burrs were observed by OM (optical microscope) and SEM (scanning electron microscope).
<蚀刻性等级的评价基准><Evaluation Criteria for Etching Level>
O:蚀刻后,基材上无残留的毛边现象。O: After etching, there is no residual burr phenomenon on the substrate.
△:蚀刻后,基材上有若干残留的毛边现象。△: After etching, there are some remaining burrs on the substrate.
X:蚀刻后,基材上有甚多残留的毛边现象。X: After etching, there are many remaining burrs on the substrate.
表1:Table 1:
表2:Table 2:
由此可知,本发明实施例1~6的复合式双面黑化铜箔1的外观黑色色度、光泽度、粉落及蚀刻性等品质特性皆相当优良,比较例的各项特性外观、黑色色度及光泽度等特性皆较本发明的实施例差。It can be seen from this that the composite double-sided blackened copper foil 1 of Examples 1 to 6 of the present invention has excellent quality characteristics such as appearance black chroma, glossiness, powder falling and etchability, and the various characteristics of Comparative Examples, appearance, Properties such as black chroma and glossiness are inferior to those of the embodiment of the present invention.
再次参阅图2,其显示经由上述复合式双面黑色铜箔的制造方法所制成的复合式双面黑色铜箔1,其包括一铜箔10、两粗化层20、两黑化处理层30、两防锈层40及一硅烷处理层50。铜箔10具有一亮面11及一暗面12;两粗化层20分别设置于亮面11及暗面12;两黑化处理层30分别设置于两粗化层20上,其中,两黑化处理层30是于包含铜离子、钴离子、镍离子、锰离子、镁离子及钠离子的电镀浴进行电镀所形成的合金层;两防锈层40分别设置于两黑化处理层30上;及硅烷处理层50设置于两防锈层40的其中之一上。Referring to FIG. 2 again, it shows a composite double-sided black copper foil 1 made by the above-mentioned composite double-sided black copper foil manufacturing method, which includes a copper foil 10, two roughened layers 20, and two blackened layers 30. Two antirust layers 40 and one silane treatment layer 50. Copper foil 10 has a bright side 11 and a dark side 12; two roughened layers 20 are respectively arranged on the bright side 11 and dark side 12; two blackened treatment layers 30 are respectively arranged on the two roughened layers 20, wherein, two black The chemical treatment layer 30 is an alloy layer formed by electroplating in an electroplating bath containing copper ions, cobalt ions, nickel ions, manganese ions, magnesium ions and sodium ions; two antirust layers 40 are respectively arranged on the two blackening treatment layers 30 ; and the silane treatment layer 50 is disposed on one of the two antirust layers 40 .
具体而言,两黑化处理层30是于包含浓度为65g/L的硫酸铜五水合物、浓度为9g/L的硫酸镍六水合物、浓度为45g/L的硫酸钴七水合物、浓度为20g/L的硫酸锰一水合物、浓度为35g/L的硫酸镁七水合物及浓度为95g/L的柠檬酸钠二水合物的电镀浴进行电镀所形成的合金层;其中电镀的浴温为20℃至60℃、pH值为4至7、时间为10秒至30秒且电流密度为3安培/平方公寸至20安培/平方公寸。Specifically, the two blackening treatment layers 30 are composed of copper sulfate pentahydrate with a concentration of 65g/L, nickel sulfate hexahydrate with a concentration of 9g/L, and cobalt sulfate heptahydrate with a concentration of 45g/L. An alloy layer formed by electroplating an electroplating bath of 20g/L manganese sulfate monohydrate, a concentration of 35g/L magnesium sulfate heptahydrate and a concentration of 95g/L sodium citrate dihydrate; wherein the electroplating bath The temperature is 20° C. to 60° C., the pH value is 4 to 7, the time is 10 seconds to 30 seconds, and the current density is 3 amps/square inch to 20 amps/square inch.
优选地,铜箔10的厚度为6至35μm,而铜箔10的亮面11的粗糙度(Rz)为1.0至2.0,铜箔10的暗面12的粗糙度为1.0至2.0。及色差计所测定的两黑化处理层30的色度Y值为2至10,其中优选不大于4;光泽度计所测定的两黑化处理层30的光泽度值为0.1至10,其中优选不大于1。Preferably, the thickness of the copper foil 10 is 6 to 35 μm, the roughness (Rz) of the bright side 11 of the copper foil 10 is 1.0 to 2.0, and the roughness of the dark side 12 of the copper foil 10 is 1.0 to 2.0. The chromaticity Y value of the two blackening treatment layers 30 measured by the color difference meter is 2 to 10, wherein it is preferably not more than 4; the gloss value of the two blackening treatment layers 30 measured by the gloss meter is 0.1 to 10, wherein Preferably no more than 1.
经由以上所述,相较于传统具有单面黑色处理面(层)的电解铜箔,本发明具有下列优点:本发明的复合式双面黑色铜箔的制造方法可通过特殊电解液及步骤的电解处理,让铜箔的两面具有浓黑色的外观、均一无纹斑、无掉粉发生及蚀刻性良好等优点;再者,所述制造方法是先以酸性溶液洗去附着于铜箔的两面污垢或秽物后,再于铜箔的两面施以黑化处理,以形成色泽及均一性较佳的黑化处理层。Through the above, compared with the traditional electrolytic copper foil with a single-sided black treatment surface (layer), the present invention has the following advantages: The manufacturing method of the composite double-sided black copper foil of the present invention can be achieved through special electrolytes and steps. Electrolytic treatment makes the two sides of the copper foil have the advantages of thick black appearance, uniform and no streaks, no powder falling, and good etching performance; moreover, the manufacturing method is to first wash off the two sides of the copper foil attached to the copper foil with an acidic solution After removing dirt or dirt, apply blackening treatment on both sides of the copper foil to form a blackening treatment layer with better color and uniformity.
如上所陈,本发明的黑化处理层还具有优异的屏蔽特性,能有效阻隔电磁波、近红外线、杂散光及外光等,因此适用于等离子体显示面板(PDP)、电磁波遮蔽(EMI)、高密度印刷电路板(HDI)工艺、直接激光钻孔工艺、内层板工艺、柔性铜箔基板(FCCL)、柔性印刷电路板(FPC)等。As mentioned above, the blackening treatment layer of the present invention also has excellent shielding properties, which can effectively block electromagnetic waves, near infrared rays, stray light and external light, etc., so it is suitable for plasma display panels (PDP), electromagnetic wave shielding (EMI), High-density printed circuit board (HDI) process, direct laser drilling process, inner layer board process, flexible copper clad substrate (FCCL), flexible printed circuit board (FPC), etc.
以上所述仅为本发明的较佳可行实施例,非因此局限本发明的专利范围,故举凡运用本发明说明书及图示内容所为的等效技术变化,均包含于本发明的范围内。The above descriptions are only preferred feasible embodiments of the present invention, and do not limit the patent scope of the present invention. Therefore, all equivalent technical changes made by using the description and illustrations of the present invention are included in the scope of the present invention.
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