CN103995308B - A kind of preparation method of multi-cavity etalon - Google Patents
A kind of preparation method of multi-cavity etalon Download PDFInfo
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- CN103995308B CN103995308B CN201310053300.1A CN201310053300A CN103995308B CN 103995308 B CN103995308 B CN 103995308B CN 201310053300 A CN201310053300 A CN 201310053300A CN 103995308 B CN103995308 B CN 103995308B
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- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 title claims abstract description 78
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- 238000001914 filtration Methods 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000013461 design Methods 0.000 claims abstract description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 230000002411 adverse Effects 0.000 claims description 2
- 230000001174 ascending effect Effects 0.000 claims description 2
- 241001270131 Agaricus moelleri Species 0.000 abstract description 10
- 238000012545 processing Methods 0.000 abstract description 5
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 description 18
- 239000004568 cement Substances 0.000 description 14
- 239000011148 porous material Substances 0.000 description 10
- 125000006850 spacer group Chemical group 0.000 description 9
- 239000007787 solid Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 4
- 238000005482 strain hardening Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
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Abstract
The invention discloses a kind of preparation method of multi-cavity etalon, it is first to design the structure of multi-cavity etalon, determines its filtering characteristic, then reduces by a chamber at every turn, determines its filtering characteristic, a to the last chamber, and confirm its filtering characteristic; Then carry out chamber one by one and process the method design multi-cavity etalon that regulates filtering. Adopt technique scheme, the beneficial effect of the preparation method of multi-cavity etalon of the present invention is: solve traditional cold processing the each chamber of multi-cavity etalon control is seen through to the more difficult problem in peak, reduced processing cost; It is large that the multi-cavity etalon of made has pass band width, and between passband and non-passband, steepness is large, and have the characteristic of flat-top through peak, can well meet the especial operation of etalon.
Description
Technical field
The present invention relates to optical field, relate in particular to a kind of preparation method of multi-cavity etalon.
Background technology
Etalon is a kind of comb filtering optical element, and its key technical indexes comprises: Free Spectral Range, see through peak, fineness etc. At optics, optical communication field, standard is commonly employed.
Lock ripple device is a kind of device for laser instrument wavelength locking, and its core parts are exactly etalon. The general principles of this utilization is as follows: under normal circumstances, the peak that sees through of laser output wavelength and etalon overlaps, and laser through etalon, then is held to using from laser instrument output. Now laser from the luminous power of laser instrument output with the ratio of luminous power after etalon in minimum state. And in the time that drift occurs laser output wavelength, due to the filter action of etalon, the luminous power of laser after etalon reduces, laser increases from the luminous power of laser instrument output and the ratio of luminous power after etalon. This power reduces phenomenon and is detected also feedback signal of processed rear formation. This feedback signal is provided for laser wavelength control system again, revises laser output wavelength a reference signal is provided for it. Sometimes in order to improve feedback signal sensitivity, wavelength corresponding to extreme point that meeting choice criteria tool transmitance changes overlaps with laser output wavelength. In a word, in etalon utilization in this respect, be mainly to see through these two of peak and finenesses to the index request of etalon.
In some specific use, require etalon to see through peak and there is certain flat-top, as laser cavity modeling, InterLeaver, WDM etc. For single chamber etalon, fineness index is two indexs that mutually oppose with seeing through peak flat-top index. Fineness index request height, sees through peak flat-top just poor; Otherwise it is good to see through peak flat-top, and fineness index is low. In order to meet high-fineness and to see through good these two indexs of peak flat-top simultaneously, need to adopt two-chamber or multi-cavity etalon. Compare with single chamber etalon, it is wider that multi-cavity etalon has pass band width, between passband and non-passband, has higher steepness, sees through peak and have outside the advantages such as flat-top.
Taking two-chamber etalon as example. Two single chamber etalons to be linked together and realize two-chamber etalon, in order realizing through peak flat-top, to need strictly to control the consistent through peak of these two single chamber etalons, namely will strictly control the thickness of these two single chamber etalons. If the material of two single chamber etalons is the same, the thickness of two single chamber etalons wants consistent. The 50GHz air-gap etalon that is 20 for fineness, two single chamber etalon thickness deviations need to be less than 19nm, see through peak and just have more satisfactory flat-top. This is very difficult for the production program of merely realizing THICKNESS CONTROL by cold working, has more challenge for the processing of multi-cavity etalon.
Summary of the invention
The object of the invention is to the deficiency existing for prior art, a kind of preparation method of making multi-cavity etalon is provided, to realize the meticulous control of the each chamber of multi-cavity etalon optical cavity length, be difficult to the long difficult problem of control chamber thereby solve simple optics cold working.
For achieving the above object, technical scheme proposed by the invention is as follows: a kind of preparation method of multi-cavity etalon, it is characterized in that, and described at least 2 chambeies of multi-cavity etalon, also comprise the steps:
Step 1: first design the structure of multi-cavity etalon, determine its filtering characteristic, then reduce by a chamber at every turn, determine its filtering characteristic, a to the last chamber, and confirm its filtering characteristic;
Step 2: in process, first process first air chamber, and according to single chamber etalon filtering characteristic of designing, adopt to the method that pours certain air pressure in air chamber, single chamber etalon filtering characteristic is adjusted to consistent with design load;
Step 3: and then on the basis of first air chamber, process second air chamber, and according to the two-chamber etalon filtering characteristic of designing, again adopt to the method that pours certain air pressure in second air chamber, two-chamber etalon filtering characteristic is adjusted to consistent with design load; Adopting uses the same method processes one by one, finally completes the multi-cavity etalon consistent with the multi-cavity etalon filtering characteristic of designing.
Further, described etalon filtering characteristic can see through peak center wavelength for etalon.
Further, described etalon air chamber is a closed chamber, and it has the aperture of a qi of chong channel ascending adversely body, and seals after made gas.
Further, described gas can be the inert gases such as nitrogen.
Further, first described chamber can be also Solid Cavity.
Adopt technique scheme, the beneficial effect of the preparation method of multi-cavity etalon of the present invention is: solve traditional cold processing the each chamber of multi-cavity etalon control is seen through to the more difficult problem in peak, reduced processing cost; It is large that the multi-cavity etalon of made has pass band width, and between passband and non-passband, steepness is large, and have the characteristic of flat-top through peak, can well meet the especial operation of etalon.
Brief description of the drawings
Fig. 1 is the structural representation of embodiment 1 two-chamber etalon;
Fig. 2 is the structural representation of embodiment 2 three chamber etalons;
Fig. 3 is single, double, the three chamber etalon filtering curves that adopt this method design.
Detailed description of the invention
Below in conjunction with brief description of the drawings and embodiment, the invention will be further described.
Embodiment 1
As shown in Figure 1, two-chamber etalon comprises a Solid Cavity 102 and an air chamber 107. 101,103,106 for having the reflectance coating of certain reflectivity. 105 for melting quartzy plain film, and 108 is spacer block, and 104 is air-filled pore. In process, adopt cold working, spacer block 108 is roughly worked into after design thickness together with Solid Cavity 102 optical cements or in-depth optical cement, and will melts quartzy plain film 105 together with spacer block 108 optical cements or in-depth optical cement, formation two-chamber etalon. Then test two-chamber etalon and see through peak, if survey has deviation through peak and design load, pour the nitrogen of certain air pressure to air chamber 107 by air-filled pore 104, make two-chamber etalon see through peak and conform to design load, finally, by air-filled pore sealing, complete the making of two-chamber etalon.
In the present embodiment, because Solid Cavity cannot be inflated adjusting, it sees through peak, therefore by inflation, air chamber is seen through to peak and regulate, and makes it see through peak consistent with Solid Cavity, finally realizes two-chamber etalon filtering characteristic. If the Solid Cavity of above-described embodiment changes air chamber into, i.e. the first air chamber, can, first by the mode of inflation, regulate the consistent with design load through peak of the first air chamber. Again the second air chamber is inflated, regulated two-chamber etalon filtering characteristic consistent with design load.
Embodiment 2
As shown in Figure 2, three chamber etalons comprise the first air chamber 216, the second air chamber 214 and the 3rd air chamber 212. Wherein 201,204,207,210 for melting quartzy plain film, and 213,215,217 is spacer block, and 202,205,208,211 for having the reflectance coating of certain reflectivity, 203,206,209 difference air-filled pores.
In process, first will melt quartzy plain film 201,205 and spacer block 217 and carry out optical cement or in-depth optical cement, form single chamber etalon, and it is carried out to filtering characteristic test, determine that it sees through peak, then the nitrogen that by air-filled pore 203, the first air chamber 216 is poured certain air pressure, regulates it to see through peak consistent with design load. Complete after adjusting, by air-filled pore 203 good seals, complete the making of the first air chamber 216.
By spacer block 215 with melt quartzy plain film 204 and carry out optical cement or in-depth optical cement. By spacer block 215 with melt quartzy plain film 207 and carry out optical cement or in-depth optical cement, form two-chamber etalon again. Two-chamber etalon is carried out to filtering characteristic test. Then the nitrogen that by air-filled pore 206, the second air chamber 214 is poured certain air pressure, regulates its filtering characteristic consistent with design load. Complete after adjusting, by air-filled pore 206 good seals, complete the making of the second air chamber.
By spacer block 213 with melt quartzy plain film 207 and carry out optical cement or in-depth optical cement; By spacer block 213 with melt quartzy plain film 210 and carry out optical cement or in-depth optical cement, form three chamber etalons again. Three chamber etalons are carried out to filtering characteristic test. Then the nitrogen that by air-filled pore 209, the 3rd air chamber 212 is poured certain air pressure, regulates its filtering characteristic consistent with design load. Complete after adjusting, by air-filled pore 209 good seals, complete the making of the 3rd air chamber.
Complete the making of three chamber etalons by above-mentioned steps, for four chambeies, five chambeies etc., more preparation method and the said method of multi-cavity etalon is similar, can the rest may be inferred. Fig. 3 is single, double, the three chamber etalon filtering curve comparison diagrams that adopt this method design.
Although specifically show and introduced the present invention in conjunction with preferred embodiment; but those skilled in the art should be understood that; not departing from the spirit and scope of the present invention that appended claims limits; the various variations of in the form and details the present invention being made, are protection scope of the present invention.
Claims (5)
1. a preparation method for multi-cavity etalon, is characterized in that, described at least 2 chambeies of multi-cavity etalon, also comprise the steps:
Step 1: first design the structure of multi-cavity etalon, determine its filtering characteristic, then reduce by a chamber at every turn, determine its filtering characteristic, a to the last chamber, and confirm its filtering characteristic;
Step 2: in process, first process first air chamber, and according to single chamber etalon filtering characteristic of designing, adopt to the method that pours certain air pressure in air chamber, single chamber etalon filtering characteristic is adjusted to consistent with design load;
Step 3: and then on the basis of first air chamber, process second air chamber, and according to the two-chamber etalon filtering characteristic of designing, again adopt to the method that pours certain air pressure in second air chamber, two-chamber etalon filtering characteristic is adjusted to consistent with design load; Adopting uses the same method processes one by one, finally completes the multi-cavity etalon consistent with the multi-cavity etalon filtering characteristic of designing.
2. the preparation method of a kind of multi-cavity etalon according to claim 1, is characterized in that, described etalon filtering characteristic is that etalon sees through peak center wavelength.
3. the preparation method of a kind of multi-cavity etalon according to claim 1, is characterized in that, described etalon air chamber is a closed chamber, and it has the aperture of a qi of chong channel ascending adversely body, and seals after made gas.
4. the preparation method of a kind of multi-cavity etalon according to claim 1, is characterized in that, described gas is inert gas.
5. the preparation method of a kind of multi-cavity etalon according to claim 4, is characterized in that, described inert gas is nitrogen.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310053300.1A CN103995308B (en) | 2013-02-19 | 2013-02-19 | A kind of preparation method of multi-cavity etalon |
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| CN201310053300.1A CN103995308B (en) | 2013-02-19 | 2013-02-19 | A kind of preparation method of multi-cavity etalon |
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| CN103995308A CN103995308A (en) | 2014-08-20 |
| CN103995308B true CN103995308B (en) | 2016-05-11 |
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| CN112241034A (en) * | 2019-07-18 | 2021-01-19 | 福州高意光学有限公司 | Etalon coupled with air layer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0915352A2 (en) * | 1997-11-12 | 1999-05-12 | Alliance Fiber Optics Products Inc. | Optical filter device and method of manufacturing the same |
| CN102087376A (en) * | 2010-12-28 | 2011-06-08 | 福州高意光学有限公司 | Double-cavity etalon and fabrication method thereof |
| CN102096137A (en) * | 2010-12-28 | 2011-06-15 | 福州高意光学有限公司 | Method for making etalon |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6606182B2 (en) * | 2001-11-16 | 2003-08-12 | Oplink Communications, Inc. | Tuning and temperature compensation of the air-gap etalon for dense wavelength-division multiplexing application |
| JP2012078475A (en) * | 2010-09-30 | 2012-04-19 | Kyocera Kinseki Corp | Etalon filter |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0915352A2 (en) * | 1997-11-12 | 1999-05-12 | Alliance Fiber Optics Products Inc. | Optical filter device and method of manufacturing the same |
| CN102087376A (en) * | 2010-12-28 | 2011-06-08 | 福州高意光学有限公司 | Double-cavity etalon and fabrication method thereof |
| CN102096137A (en) * | 2010-12-28 | 2011-06-15 | 福州高意光学有限公司 | Method for making etalon |
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