[go: up one dir, main page]

CN103941406B - High-power semiconductor laser optical shaping method and device based on beam expanding - Google Patents

High-power semiconductor laser optical shaping method and device based on beam expanding Download PDF

Info

Publication number
CN103941406B
CN103941406B CN201410196971.8A CN201410196971A CN103941406B CN 103941406 B CN103941406 B CN 103941406B CN 201410196971 A CN201410196971 A CN 201410196971A CN 103941406 B CN103941406 B CN 103941406B
Authority
CN
China
Prior art keywords
light
laser
semiconductor laser
beam splitter
stack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201410196971.8A
Other languages
Chinese (zh)
Other versions
CN103941406A (en
Inventor
蔡磊
刘兴胜
杨凯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Focuslight Technologies Inc
Original Assignee
Xian Focuslight Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xian Focuslight Technology Co Ltd filed Critical Xian Focuslight Technology Co Ltd
Priority to CN201410196971.8A priority Critical patent/CN103941406B/en
Publication of CN103941406A publication Critical patent/CN103941406A/en
Application granted granted Critical
Publication of CN103941406B publication Critical patent/CN103941406B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

The invention provides a semiconductor laser optical shaping method and device. High-power uniform light spots can be obtained, and cost is low. The principle includes that firstly, beams emitted by semiconductor laser stacks are collimated and then exponentially expanded, laser beams with energy in Gaussian distribution are transformed into flat-top beams with uniform energy density distribution, and secondly, expanded laser is focused by a focusing system, so that uniformity of the light spots can be achieved and improved.

Description

一种基于扩束的高功率半导体激光器光学整形方法及其装置A method and device for optical shaping of high-power semiconductor lasers based on beam expansion

技术领域technical field

本发明属于激光应用领域,具体涉及一种激光扩束装置。The invention belongs to the field of laser applications, and in particular relates to a laser beam expander.

背景技术Background technique

激光具有单色性好,方向性好,相干性好,亮度高的优点,已经广泛应用于国民经济的各个领域。激光器发出的光束直径很小,通常为1-2mm,在一些特定的应用领域中,例如在激光加工,激光检测和激光照明等,需要使用较大直径的均匀性的激光光束,这就需要对激光进行光学整形来实现。Laser has the advantages of good monochromaticity, good directionality, good coherence and high brightness, and has been widely used in various fields of national economy. The diameter of the beam emitted by the laser is very small, usually 1-2mm. In some specific applications, such as laser processing, laser detection and laser lighting, it is necessary to use a uniform laser beam with a larger diameter. The laser is optically shaped to achieve this.

目前常用的光学整形方法可以使用如下方法:Currently commonly used optical shaping methods can use the following methods:

1、反射式光学整形方法:通常可使用光波导进行光学整形,但用此种方法存在较为严重的焦深问题,导致工作距离短,工作距离不可改变;1. Reflective optical shaping method: Usually, optical waveguide can be used for optical shaping, but there is a serious depth of focus problem with this method, resulting in short working distance and unchangeable working distance;

2、透射式光学整形方法:将激光光源进行准直后直接进行聚焦,此种方法最终输出的激光为亮暗相间隔的平顶光斑,能量不均匀;另外还可使用负透镜和正透镜相结合的方式进行光学整形,此种光学整形方法因使用较多透镜,成本高;此外还可以对光源先进行切割重排后再进行聚焦,但在切割重排的过程使用的光学器件较为复杂,成本高,同时发光面与最终需得到的光斑尺寸的压缩比较小,导致输出光斑不均匀。2. Transmissive optical shaping method: after collimating the laser light source, it is directly focused. The final output laser of this method is a flat-top spot with an interval of bright and dark phases, and the energy is not uniform; in addition, a combination of negative lens and positive lens can also be used This method of optical shaping is expensive because of the use of many lenses; in addition, the light source can be cut and rearranged before focusing, but the optical devices used in the process of cutting and rearranging are more complicated and costly. At the same time, the compression ratio between the light-emitting surface and the final required spot size is small, resulting in uneven output spots.

发明内容Contents of the invention

为了克服现有技术的不足,本发明提供了一种半导体激光器光学整形方法及其装置,能够获得高功率的均匀光斑,成本较低。In order to overcome the deficiencies of the prior art, the present invention provides a semiconductor laser optical shaping method and its device, which can obtain high-power uniform light spots with low cost.

本发明的原理是:首先对半导体激光器叠阵发出的光先进行准直后成倍扩束,将能量高斯分布的激光光束转换为能量密度分布均匀的平顶光束,然后通过聚焦系统对扩束后的激光进行聚焦,提高光斑均匀度,可以实现光斑的均匀性。The principle of the present invention is: firstly collimate the light emitted by the stack of semiconductor lasers and then expand the beam exponentially, convert the laser beam with energy Gaussian distribution into a flat top beam with uniform energy density distribution, and then expand the beam through the focusing system The final laser is focused to improve the uniformity of the spot, which can achieve the uniformity of the spot.

实现方案如下:The implementation plan is as follows:

该高功率半导体激光光学整形方法,包括:The high-power semiconductor laser optical shaping method includes:

对半导体激光器叠阵发出的光进行准直;Collimating the light emitted by the semiconductor laser stack;

对准直后的激光进行成倍扩束;Doubly expand the collimated laser beam;

将成倍扩束后的激光会聚得到所需尺寸的光斑;Converge the doubled beam expanded laser to get the spot of required size;

其中,扩束环节采用分光器和反射器的组合,分光器的透射光与反射器的反射光平行出射实现扩束。Among them, the beam expansion link adopts a combination of a beam splitter and a reflector, and the transmitted light of the beam splitter and the reflected light of the reflector exit in parallel to realize beam expansion.

上述扩束环节可以设置多级分光器和反射器的组合,进行多级扩束。The aforementioned beam expansion link can be provided with a combination of multi-stage beam splitters and reflectors to perform multi-stage beam expansion.

基于上述高功率半导体激光光学整形方法,本发明还提出具体的几种高功率半导体激光器光学整装置:Based on the above-mentioned high-power semiconductor laser optical shaping method, the present invention also proposes several specific high-power semiconductor laser optical adjustment devices:

第一种基于扩束的高功率半导体激光器光学整装置,包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述的半导体激光器叠阵由若干个半导体激光单元组成;所述分光系统包括沿激光出光方向依次设置的n组分光模块,每组分光模块包括分光器和反射器,分光器的分光面和反射器的反射面沿高度方向设置相互平行且与激光出光方向均成30-60°夹角;激光光束经过分光器后,一半能量的光直接透射,另一半能量的光反射至反射器后再次反射,与分光器直接透射的光平行出射;The first high-power semiconductor laser optical device based on beam expansion, including semiconductor laser stacks, collimating lens groups, beam splitting systems and focusing systems arranged in sequence along the optical path, the semiconductor laser stack consists of several semiconductor laser units Composition; the light splitting system includes n component optical modules arranged in sequence along the laser light emitting direction, each component optical module includes a beam splitter and a reflector, and the beam splitting surface of the beam splitter and the reflecting surface of the reflector are arranged parallel to each other along the height direction and parallel to the laser beam The light output direction is at an angle of 30-60°; after the laser beam passes through the beam splitter, half of the energy of the light is transmitted directly, and the other half of the energy of the light is reflected to the reflector and then reflected again, and exits parallel to the light directly transmitted by the beam splitter;

第一组分光模块的分光器与半导体激光器叠阵的堆叠高度相当;各组分光模块尺寸依次成倍增大,第m组分光模块出光光束入射至第m+1组分光模块的分光器上,1≤m<n,m为分光模块的排列序号,排列序号按照激光依次通过的顺序进行排号;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑。The beam splitter of the first component optical module is equivalent to the stacking height of the semiconductor laser stack; the size of each component optical module is multiplied sequentially, and the light beam emitted by the mth component optical module is incident on the beam splitter of the m+1th component optical module, 1 ≤m<n, m is the sequence number of the light splitting module, and the sequence number is arranged according to the order in which the laser passes through; the focusing system is used to focus and shape the beam expanding laser to obtain a spot of required size.

上述聚焦系统采用聚焦透镜组。The focusing system described above employs a focusing lens group.

分光模块可以有以下两类实现方式。The optical splitting module can be implemented in the following two types.

第一类:the first sort:

分光模块中,反射器可以采用全反射平面镜或者全反射棱镜。全反射平面镜的材料可以采用玻璃或金属,表面镀高反膜,高反膜的材料为金属银或者铝;或者高反膜采用多层介质反射膜。In the light splitting module, the reflector can be a total reflection plane mirror or a total reflection prism. The material of the total reflection plane mirror can be glass or metal, and the surface is coated with a high-reflection film, and the material of the high-reflection film is metallic silver or aluminum; or the high-reflection film adopts a multilayer dielectric reflection film.

分光模块中,反射器也可以采用偏振器件;半导体激光器叠阵的偏振特性为TE光,则偏振器件对TE光全反射;或者半导体激光器叠阵的偏振特性为TM光,则偏振器件对TM光全反射。偏振器件具体可以是偏振片、偏振镜或者偏振合束器。In the beam splitting module, the reflector can also use a polarizing device; if the polarization characteristic of the semiconductor laser stack is TE light, the polarizing device will fully reflect the TE light; or if the polarization characteristic of the semiconductor laser stack is TM light, then the polarizing device will reflect TM light total reflection. The polarizing device may specifically be a polarizer, a polarizer or a polarization beam combiner.

分光模块中,分光器可以采用分光镜,分光镜的基体材料为玻璃,分光镜表面镀半透半反膜,半透半反膜的材料为硫化锌-氟化镁膜系。In the beam splitting module, the beam splitter can be a beam splitter, the base material of the beam splitter is glass, the surface of the beam splitter is coated with a semi-transparent and semi-reflective film, and the material of the semi-transparent and semi-reflective film is a zinc sulfide-magnesium fluoride film system.

第二类:The second category:

分光模块也可以采用棱镜组合整体实现分光器和反射器的功能,棱镜组合中各个棱镜之间紧密贴合,使得整体上具有一个侧面面向半导体激光器叠阵且与所述激光出光方向垂直作为分光模块的入光面,具有另一个侧面与所述入光面平行作为分光模块的出光面(按照上述基本方案,第一组分光模块的入光面和出光面均与半导体激光器叠阵的堆叠高度相当,各组分光模块的入光面和出光面尺寸依次成倍增大);棱镜组合内部存在一个贴合面镀有半透半反膜作为分光器的分光面,与分光面平行且所述入光面相邻的一个侧面作为反射器的反射面。The light splitting module can also use a prism combination to realize the functions of a beam splitter and a reflector as a whole. The prisms in the prism combination are closely fitted to each other, so that there is a side facing the stack of semiconductor lasers and perpendicular to the laser light output direction as a light splitting module. The light incident surface has another side parallel to the light incident surface as the light exit surface of the light splitting module (according to the above basic scheme, the light incident surface and the light exit surface of the first component optical module are all equivalent to the stack height of the semiconductor laser stack , the size of the light incident surface and the light exit surface of each component optical module is doubled in turn); there is a bonding surface inside the prism combination coated with a semi-transparent and semi-reflective film as the light splitting surface of the beam splitter, which is parallel to the light splitting surface and the light incident surface A side adjacent to the surface is used as a reflective surface of the reflector.

这一类的分光模块优选平行六面棱镜和三棱镜的组合,平行六面棱镜具有唯一侧面面向半导体激光器叠阵且与所述激光出光方向垂直作为分光模块的入光面,与该侧面夹角为锐角的相邻侧面上紧密贴合所述三棱镜,贴合面上镀有半透半反膜作为分光器的分光面,与该侧面夹角为钝角的相邻侧面作为反射器的反光面;三棱镜还具有一个与所述激光出光方向垂直的外侧面,作为分光模块的出光面。This type of light-splitting module is preferably a combination of a parallelepiped prism and a triangular prism. The parallelepiped prism has a unique side facing the stack of semiconductor lasers and is perpendicular to the laser light-emitting direction as the light incident surface of the light-splitting module. The included angle with the side is The adjacent side of the acute angle closely fits the triangular prism, and the mating surface is coated with a semi-transparent and semi-reflective film as the splitting surface of the beam splitter, and the adjacent side with an obtuse angle with the side is used as the reflective surface of the reflector; the triangular prism It also has an outer surface perpendicular to the light emitting direction of the laser, serving as the light emitting surface of the light splitting module.

上述分光器的分光面和反射器的反射面最好均与激光出光方向成45°角设置。对于上述平行六面棱镜和三棱镜的组合,相当于是采用内夹角为45°和135°的平行六面棱镜来保证了分光面和反射面均与激光出光方向成45°角。Preferably, the beam-splitting surface of the beam splitter and the reflection surface of the reflector are both set at an angle of 45° to the laser light-emitting direction. For the combination of the above-mentioned parallelepiped prism and triangular prism, it is equivalent to using parallelepiped prisms with inner angles of 45° and 135° to ensure that both the splitting surface and the reflecting surface are at an angle of 45° to the laser light emitting direction.

第二种基于扩束的高功率半导体激光器光学整装置,包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述分光系统包括沿半导体激光器叠阵堆叠高度方向依次设置的n个分光镜以及最后设置的一个全反射镜,其中第1个分光镜与半导体激光器叠阵堆叠高度相当,n个分光镜以及全反射镜平行等间隔排列,与半导体激光器叠阵出光方向成30-60°设置;第1个分光镜的透射光与其余n-1个分光镜以及全反射镜的反射光共同形成激光扩束;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑;The second high-power semiconductor laser optical device based on beam expansion includes a semiconductor laser stack, a collimating lens group, a beam splitting system, and a focusing system arranged in sequence along the optical path. N beamsplitters and a total reflection mirror are arranged in sequence, the first beamsplitter is at the same height as the stack of semiconductor lasers, and the n beamsplitters and total reflection mirrors are arranged in parallel and equally spaced to output light from the stack of semiconductor lasers The direction is set at 30-60°; the transmitted light of the first beam splitter and the reflected light of the remaining n-1 beam splitters and the total reflection mirror together form a laser beam expansion; the focusing system is used to perform beam expansion on the expanded laser beam Focus shaping to obtain the desired size of the spot;

n个分光镜的光透过率不同,第1个分光镜的透射光能量与其余n-1个分光镜以及全反射镜的反射光能量相等:The light transmittance of the n beamsplitters is different, and the transmitted light energy of the first beamsplitter is equal to the reflected light energy of the remaining n-1 beamsplitters and the total reflection mirror:

第1个分光镜的透过率为1/(n+1),反射率为n/(n+1);The transmittance of the first beam splitter is 1/(n+1), and the reflectance is n/(n+1);

第m个分光镜的透过率为(n-m+1)/(n-m+2),反射率为1/(n-m+2);The transmittance of the mth beam splitter is (n-m+1)/(n-m+2), and the reflectance is 1/(n-m+2);

其中,n为分光镜总个数,m为分光镜的排列序号,1<m≤n,排列序号按照激光依次通过的顺序进行排号。Among them, n is the total number of beam splitters, m is the sequence number of the beam splitter, 1<m≤n, and the sequence numbers are arranged according to the order in which the laser light passes through.

第三种基于扩束的高功率半导体激光器光学整装置,包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述半导体激光器叠阵由若干个半导体激光单元堆叠组成,所述分光系统包括沿半导体激光器叠阵出光方向依次设置的n个分光镜以及最后设置的一个全反射镜,其中第1个分光镜与半导体激光器叠阵堆叠高度相当,n个分光镜以及全反射镜平行等间隔排列,与半导体激光器叠阵出光方向成30-60°设置;n个分光镜以及全反射镜的反射光共同形成激光扩束;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑;The third high-power semiconductor laser optical device based on beam expansion includes semiconductor laser arrays, collimating lens groups, beam splitting systems, and focusing systems arranged sequentially along the optical path, and the semiconductor laser array is stacked by several semiconductor laser units Composition, the beam splitting system includes n beam splitters arranged in sequence along the light emitting direction of the semiconductor laser stack and a total reflection mirror arranged at the end, wherein the first beam splitter is equivalent to the stack height of the semiconductor laser stack, and the n beam splitters and The total reflection mirrors are arranged in parallel and at equal intervals, and are set at 30-60° to the light output direction of the stack of semiconductor lasers; the reflected light of n beam splitters and total reflection mirrors together form laser beam expansion; the focusing system is used to expand the beam The laser is focused and shaped to obtain the desired size of the spot;

n个分光镜的光透过率不同,使得n个分光镜以及全反射镜的反射光能量相等:The light transmittance of the n beamsplitters is different, so that the reflected light energy of the n beamsplitters and the total reflection mirror is equal:

第m个分光镜的反射率为1/(n-m+2),透过率为(n-m+1)/(n-m+2);The reflectance of the mth beam splitter is 1/(n-m+2), and the transmittance is (n-m+1)/(n-m+2);

其中,n为分光镜总个数,m为分光镜的排列序号,1≤m≤n,排列序号按照激光依次通过的顺序进行排号。Among them, n is the total number of beam splitters, m is the array number of beam splitters, 1≤m≤n, and the array numbers are arranged according to the order in which the laser light passes through.

上述准直透镜组可以采用快轴准直镜和慢轴准直镜的组合或两者之一,其中,快轴准直透镜为准直D型非球面透镜,慢轴准直镜为单阵列柱面透镜。The above-mentioned collimating lens group can use a combination of a fast-axis collimating lens and a slow-axis collimating lens or one of the two, wherein the fast-axis collimating lens is a collimating D-type aspheric lens, and the slow-axis collimating lens is a single array Cylindrical lens.

本发明具有以下优点:The present invention has the following advantages:

(1)增加发光面尺寸,提高发光面与最终光斑尺寸之间压缩比,最终可以提高均匀度,可应用于激光焊接和激光照明等对激光均匀度有较高要求的地方。(1) Increase the size of the light-emitting surface, increase the compression ratio between the light-emitting surface and the final spot size, and finally improve the uniformity. It can be used in laser welding and laser lighting where there is a high requirement for laser uniformity.

(2)实现成本低,元器件较小。(2) The implementation cost is low and the components are small.

(3)结构紧凑,适于实用。(3) The structure is compact and suitable for practical use.

(4)本发明的基于扩束的高功率半导体激光器光学整形方法及其装置,最终输出的激光分布为平顶分布,并且能量分布均匀。(4) According to the optical shaping method and device of the high-power semiconductor laser based on beam expansion of the present invention, the final output laser light distribution is a flat-top distribution, and the energy distribution is uniform.

附图说明Description of drawings

图1为本发明的原理图;Fig. 1 is a schematic diagram of the present invention;

图2为本发明实施例一示意图;Fig. 2 is a schematic diagram of Embodiment 1 of the present invention;

图3为本发明实施例二示意图;Fig. 3 is a schematic diagram of Embodiment 2 of the present invention;

图4为本发明实施例三示意图;Figure 4 is a schematic diagram of Embodiment 3 of the present invention;

图5为本发明实施例四示意图。Fig. 5 is a schematic diagram of Embodiment 4 of the present invention.

附图标号说明:1为半导体激光器;2为准直透镜组;3为分光系统;4聚焦系统;5为分光器;6为反射器;7为快轴准直透镜;8,9为聚焦透镜;10为输出光斑;11为慢轴准直镜;12为分光面;13为出光面;14为反射面;15为分光模块;16为入光面。Description of reference numerals: 1 is a semiconductor laser; 2 is a collimating lens group; 3 is a beam splitting system; 4 is a focusing system; 5 is a beam splitter; 6 is a reflector; 7 is a fast axis collimating lens; 8, 9 are focusing lenses ; 10 is the output spot; 11 is the slow axis collimator; 12 is the light splitting surface; 13 is the light output surface; 14 is the reflection surface; 15 is the light splitting module;

具体实施方式:detailed description:

如图1基于扩束的高功率半导体激光器光学整装置包括半导体激光器叠阵1,准直透镜组2、分光系统3及聚焦系统4组成。As shown in Figure 1, the high-power semiconductor laser optical device based on beam expansion includes a semiconductor laser stack 1, a collimating lens group 2, a beam splitting system 3 and a focusing system 4.

所述的半导体激光器叠阵1由若干个半导体激光单元组成;所述的准直透镜组2放置于半导体激光器激光出射处;所述分光系统3放置于准直后的激光光束出射方向用于对准直后的激光进行扩束;所述的聚焦系统4用于对扩束的激光进行聚焦整形。The semiconductor laser stack 1 is composed of several semiconductor laser units; the collimating lens group 2 is placed at the laser exit of the semiconductor laser; The collimated laser beam is expanded; the focusing system 4 is used to focus and shape the expanded laser beam.

分光系统3包括n组分光模块,如图1所示,本实施例中为一组分光模块,分光模块包括一个分光器5和一个反射器6,激光器所发出的激光入射至分光器5上;,分光器的分光面和反射器的反射面沿高度方向设置相互平行且与激光出光方向均成30-60°夹角,优选30°、45°、55°、60°夹角设置,分光器5将一半的光进行透射,一半的光进行反射90度后入至反射器6上,通过反射器6再次反射90度后与分光器5透射的光合束后入射至聚焦系统4后输出光斑10。The light splitting system 3 includes n components of optical modules, as shown in Figure 1, in this embodiment, it is a group of optical modules, the light splitting module includes a beam splitter 5 and a reflector 6, and the laser light emitted by the laser is incident on the beam splitter 5; , the beam splitting surface of the beam splitter and the reflection surface of the reflector are set parallel to each other along the height direction and form an angle of 30-60° with the laser light output direction, preferably 30°, 45°, 55°, 60° angle setting, the beam splitter 5. Transmit half of the light, and half of the light is reflected by 90 degrees and then enters the reflector 6. After being reflected by the reflector 6 again by 90 degrees, it is combined with the light transmitted by the beam splitter 5 and then enters the focusing system 4 to output a spot 10. .

所述的分光器5的透射率为50%,反射率为50%;所述的反射器6的反射率为100%,反射器6可以是全反射镜,全反射棱镜,也可以是偏振器件,可以是偏振片、偏振镜或者偏振合束器。The transmittance of the beam splitter 5 is 50%, and the reflectivity is 50%; the reflectivity of the reflector 6 is 100%, and the reflector 6 can be a total reflection mirror, a total reflection prism, or a polarizing device , can be a polarizer, a polarizer or a polarization beam combiner.

如图2基于扩束的高功率半导体激光器光学整装置包括半导体激光器叠阵1,准直透镜组2、分光系统3及聚焦系统4组成。所述的半导体激光器叠阵1由若干个半导体激光单元组成;所述的准直透镜组2放置于半导体激光器叠阵1激光出射处;所述分光系统3放置于准直后的激光光束出射方向,包括n组分光模块15,每组分光模块15包括一个分光器5和一个反射器6,第m((1≤m<n)组分光模块出光光束入射至第m+1组分光模块3的分光器上。As shown in Figure 2, the high-power semiconductor laser optical device based on beam expansion includes a semiconductor laser stack 1, a collimating lens group 2, a beam splitting system 3 and a focusing system 4. The semiconductor laser stack 1 is composed of several semiconductor laser units; the collimating lens group 2 is placed at the laser exit of the semiconductor laser stack 1; the beam splitting system 3 is placed in the laser beam exit direction after collimation , including n component optical modules 15, each component optical module 15 includes a beam splitter 5 and a reflector 6, the light beam emitted by the mth ((1≤m<n) component optical module is incident on the m+1th component optical module 3 on the beam splitter.

如图2所示,分光器6的透射率为50%,反射率为50%;所述的反射器7的反射率为100%,反射器7可以是全反射棱镜,也可以是偏振器件,具体可以是偏振片、偏振镜或者偏振合束器。As shown in Figure 2, the transmittance of the beam splitter 6 is 50%, and the reflectivity is 50%; the reflectivity of the reflector 7 is 100%, and the reflector 7 can be a total reflection prism or a polarizing device, Specifically, it may be a polarizer, a polarizer or a polarization beam combiner.

所述分光器6采用分光镜,基体材料为玻璃,分光镜表面镀半透半反膜,半透半反膜的材料为硫化锌-氟化镁膜系;所述反射器为全反射平面镜,基体材料为玻璃或金属,表面镀高反膜;高反膜的材料为金属银或者铝,或者高反膜采用多层介质反射膜。The beam splitter 6 adopts a beam splitter, the base material is glass, the surface of the beam splitter is coated with a semi-transparent and semi-reflective film, and the material of the semi-transparent and semi-reflective film is zinc sulfide-magnesium fluoride film system; the reflector is a total reflection plane mirror, The base material is glass or metal, and the surface is coated with a high-reflection film; the material of the high-reflection film is metallic silver or aluminum, or the high-reflection film adopts a multilayer dielectric reflective film.

如图3所示,分光模块采用平行六面棱镜和三棱镜的组合整体实现分光器6和反射器7的功能,平行六面棱镜具有唯一侧面面向半导体激光器叠阵且与所述激光出光方向垂直作为分光模块的入光面16,与该侧面夹角为锐角的相邻侧面上紧密贴合所述三棱镜,贴合面上镀有半透半反膜作为分光器的分光面12,与该侧面夹角为钝角的相邻侧面作为反射器的反射面14;三棱镜还具有一个与所述激光出光方向垂直的外侧面,作为分光模块的出光面13。As shown in Figure 3, the light splitting module uses a combination of parallelepiped prism and triangular prism to realize the functions of beam splitter 6 and reflector 7 as a whole. The incident surface 16 of the light-splitting module is closely attached to the triangular prism on the adjacent side of the acute angle with the side. The adjacent side with an obtuse angle is used as the reflective surface 14 of the reflector; the triangular prism also has an outer surface perpendicular to the light emitting direction of the laser, which is used as the light emitting surface 13 of the light splitting module.

分光模块只要实现激光光束通过半透半反面即分光面12后一半的光透射至透射面即出光面13进行透射,另一半的光射至反射面14进行全反射,然后合束出射,实现扩束。As long as the light splitting module realizes that the second half of the light of the laser beam passes through the semi-transparent and semi-reflective surface, that is, the splitting surface 12, it is transmitted to the transmission surface, that is, the light-emitting surface 13 for transmission, and the other half of the light is transmitted to the reflective surface 14 for total reflection, and then the beams are combined and emitted to realize the expansion. bundle.

分光模块采用的分光器5和反射器6为平行六面棱镜(内夹角45°和135°)和三棱镜的组合使用实现激光扩束,即平行六面棱镜半透半反面即分光面12与三棱镜半透半反面即分光面12紧密贴合;平行六面棱镜半透半反面即分光面12镀有半透半反膜,三棱镜的半透半反面即分光面12镀有半透半反膜;平行六面棱镜的反射面14镀有反射膜,三棱镜的透射面即出光面13镀有透射膜。The beam splitter 5 and the reflector 6 adopted by the light splitting module are parallelepiped prisms (included angles of 45° and 135°) and triangular prisms used in combination to realize laser beam expansion, that is, the semi-transparent and semi-reflective surfaces of the parallelepiped prisms, that is, the splitting surface 12 and The semi-transparent and semi-reflective surface of the triangular prism, that is, the light-splitting surface 12 is closely attached; the semi-transparent and semi-reflective surface of the parallelepiped prism, that is, the light-splitting surface 12 is coated with a semi-transparent and semi-reflective film, and the semi-transparent and semi-reflective surface of the triangular prism, that is, the light-splitting surface 12 is coated with a semi-transparent and semi-reflective film. ; The reflective surface 14 of the parallelepiped prism is coated with a reflective film, and the transmissive surface of the triangular prism, that is, the light-emitting surface 13 is coated with a transmissive film.

平行六面棱镜和三棱镜不能为一体件,如为一体件则半透半反面将不能实现半透半反的作用。Parallelepiped prism and triangular prism can not be one piece, if one piece then semi-transparent and semi-reflective surface will not be able to realize the semi-transparent and semi-reflective effect.

如图3所示,除使用三棱镜外,还可以使用其他不规则器件,只要器半透半反面即分光面12可实现一半的光透射,一半的光反射且其透射面即出光面13可以直接垂直透射光即可。As shown in Figure 3, in addition to using a triangular prism, other irregular devices can also be used, as long as the semi-transparent and semi-reflective surface of the device, that is, the splitting surface 12, can realize half of the light transmission, half of the light reflection and its transmission surface, that is, the light-emitting surface 13, can directly The light is transmitted vertically.

图4为本发明实施例三示意图,基于扩束的高功率半导体激光器光学整装置,包括沿光路依次设置的半导体激光器叠阵1、准直透镜组2和分光系统3及聚焦系统4,半导体激光器叠阵1所发的激光经过准直后,通过分光系统3进行扩束后入射至聚焦系统4后输出光斑10。Fig. 4 is a schematic diagram of Embodiment 3 of the present invention, based on the high-power semiconductor laser optical device of beam expansion, including a semiconductor laser array 1, a collimating lens group 2, a beam splitting system 3 and a focusing system 4 arranged in sequence along the optical path, and the semiconductor laser The laser light emitted by stack 1 is collimated, expanded by beam splitting system 3 , enters focusing system 4 , and outputs light spot 10 .

所述分光系统3包括沿半导体激光器叠阵1堆叠高度方向依次设置的n个分光器5以及最后设置的一个反射器6,其中第1个分光器5与半导体激光器叠阵堆叠高度相当,n个分光器以及反射器6平行等间隔排列,与半导体激光器叠阵出光方向成一定角度,通常为30-60度之间,优选45度、60度等;第1个分光器5的透射光与其余n-1个分光器5以及反射器6的反射光共同形成激光扩束;The beam splitting system 3 includes n beam splitters 5 sequentially arranged along the stack height direction of the semiconductor laser stack 1 and a reflector 6 arranged at the end, wherein the first beam splitter 5 is equivalent to the stack height of the semiconductor laser stack, and n The beam splitter and the reflector 6 are arranged in parallel and at equal intervals, forming a certain angle with the semiconductor laser stack light output direction, usually between 30-60 degrees, preferably 45 degrees, 60 degrees, etc.; the transmitted light of the first beam splitter 5 and the rest The reflected light of n-1 beam splitters 5 and reflectors 6 together form laser beam expansion;

n个分光器5的光透过率不同,第1个分光器5的透射光能量与其余n-1个分光器5以及反射器6的反射光能量相等:The light transmittance of the n beam splitters 5 is different, and the transmitted light energy of the first beam splitter 5 is equal to the reflected light energy of the remaining n-1 beam splitters 5 and reflectors 6:

第1个分光镜的透过率为1/(n+1),反射率为n/(n+1);The transmittance of the first beam splitter is 1/(n+1), and the reflectance is n/(n+1);

第m个分光镜的透过率为(n-m+1)/(n-m+2),反射率为1/(n-m+2);The transmittance of the mth beam splitter is (n-m+1)/(n-m+2), and the reflectance is 1/(n-m+2);

其中,n为分光镜总个数,m为分光镜的排列序号,1<m≤n。Wherein, n is the total number of beam splitters, m is the sequence number of the beam splitters, 1<m≤n.

图4所示的半导体激光扩束装置为某试制激光加工系统,用于激光焊接电路板,要求激光器叠阵功率400W(4个巴条),并且在激光出射120mm处得到均匀光斑,相当于对激光器叠阵高度以及透镜焦距做出了限制。如果直接使用凸透镜进行聚焦,最终得到4条间隔分布的强光斑,无法达到要求。结合本发明,具体的实施方案为:如图4所示在半导体激光器叠阵1后增加本发明提及的扩束装置,再使用凸透镜进行聚焦,相当于增加了激光器叠阵输出的发光面尺寸,提高光束的压缩比,最终得到了均匀光斑。这种方法不必增加激光巴条,节省了成本,并且有效的改善了光斑质量。The semiconductor laser beam expander shown in Figure 4 is a trial-manufactured laser processing system for laser welding circuit boards. It requires a laser array with a power of 400W (4 bars) and a uniform spot at 120mm of laser output, which is equivalent to The height of the laser stack and the focal length of the lens are limited. If you directly use a convex lens for focusing, you will eventually get 4 strong spots distributed at intervals, which cannot meet the requirements. In combination with the present invention, the specific implementation is: as shown in Figure 4, after the semiconductor laser stack 1, the beam expander mentioned in the present invention is added, and then the convex lens is used for focusing, which is equivalent to increasing the size of the light-emitting surface output by the laser stack , improve the compression ratio of the beam, and finally get a uniform spot. This method does not need to increase the laser bar, saves the cost, and effectively improves the spot quality.

图5为本发明实施例四示意图,本发明另外一种高功率半导体激光器的扩束装置,包括沿光路依次设置的半导体激光器叠阵1、准直透镜组2和分光系统3及聚焦系统4,半导体激光器叠阵1所发的激光经过准直后,通过分光系统3进行扩束后入射至聚焦系统4后输出光斑10。5 is a schematic diagram of Embodiment 4 of the present invention. Another beam expander device for high-power semiconductor lasers of the present invention includes a semiconductor laser array 1, a collimating lens group 2, a beam splitting system 3 and a focusing system 4 arranged in sequence along the optical path. The laser light emitted by the semiconductor laser stack 1 is collimated, expanded by the beam splitting system 3 , enters the focusing system 4 , and outputs a light spot 10 .

分光系统3包括沿半导体激光器叠阵1出光方向依次设置的n个分光器5以及最后设置的一个反射器6,其中第1个分光器5与半导体激光器叠阵1堆叠高度相当,n个分光器5以及反射器6平行等间隔排列,与半导体激光器叠阵出光方向成一定角度,通常为30-60度之间,优选45度、60度等;n个分光器5以及反射器的反射光共同形成激光扩束;The beam splitting system 3 includes n beam splitters 5 sequentially arranged along the light emitting direction of the semiconductor laser stack 1 and a reflector 6 arranged at the end, wherein the first beam splitter 5 is equivalent to the stack height of the semiconductor laser stack 1, and the n beam splitters 5 and the reflectors 6 are arranged in parallel and at equal intervals, forming a certain angle with the semiconductor laser stacked light output direction, usually between 30-60 degrees, preferably 45 degrees, 60 degrees, etc.; the reflected light of n beam splitters 5 and reflectors is common form laser beam expansion;

n个分光器的光透过率不同,使得n个分光镜以及全反射镜的反射光能量相等:The light transmittance of the n beam splitters is different, so that the reflected light energy of the n beam splitters and the total reflection mirror is equal:

第m个分光镜的反射率为1/(n-m+2),透过率为(n-m+1)/(n-m+2);The reflectance of the mth beam splitter is 1/(n-m+2), and the transmittance is (n-m+1)/(n-m+2);

其中,n为分光镜总个数,m为分光镜的排列序号,1≤m≤n。Wherein, n is the total number of beam splitters, m is the sequence number of the beam splitters, 1≤m≤n.

本发明中半导体激光器叠阵所发出的激光通过分光系统扩束后,在快轴方向上将能量分布为高斯分布的激光光束转换为能量密度分布均匀的平顶光束,通过聚焦系统对扩束后的激光进行聚焦,提高光斑均匀度,可以实现光斑的均匀性,实现均匀面状光斑输出。而采用传统的方法,由于半导体激光器叠阵中巴条之间存在间距,总是会形成条状光斑。In the present invention, after the laser beam emitted by the stack of semiconductor lasers is expanded by the beam splitting system, the laser beam whose energy distribution is Gaussian distribution is converted into a flat-top beam with uniform energy density distribution in the direction of the fast axis. The laser is focused to improve the uniformity of the spot, which can achieve the uniformity of the spot and achieve a uniform planar spot output. However, with the traditional method, due to the spacing between the bars in the stack of semiconductor lasers, stripe-shaped spots will always be formed.

Claims (4)

1.一种基于扩束的高功率半导体激光器光学整形装置,其特征在于:包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述的半导体激光器叠阵由若干个半导体激光单元组成;所述分光系统包括沿激光出光方向依次设置的n组分光模块,每组分光模块包括分光器和反射器,分光器的分光面和反射器的反射面沿高度方向设置相互平行且与激光出光方向均成30-60°夹角;激光光束经过分光器后,一半能量的光直接透射,另一半能量的光反射至反射器后再次反射,与分光器直接透射的光平行出射;1. A high-power semiconductor laser optical shaping device based on beam expansion, characterized in that: comprise a stack of semiconductor lasers, a collimating lens group, a beam splitting system and a focusing system arranged successively along the optical path, and the stack of semiconductor lasers is composed of Composed of several semiconductor laser units; the light splitting system includes n components of optical modules arranged in sequence along the laser light emitting direction, each group of optical modules includes a beam splitter and a reflector, and the beam splitting surface of the beam splitter and the reflecting surface of the reflector are arranged along the height direction Parallel to each other and form an angle of 30-60° with the laser light output direction; after the laser beam passes through the beam splitter, half of the energy of the light is directly transmitted, and the other half of the energy of the light is reflected to the reflector and then reflected again, and the light directly transmitted by the beam splitter Parallel exit; 第一组分光模块的分光器与半导体激光器叠阵的堆叠高度相当;各组分光模块尺寸依次成倍增大,第m组分光模块出光光束入射至第m+1组分光模块的分光器上,1≤m<n,m为分光模块的排列序号,排列序号按照激光依次通过的顺序进行排号;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑;The beam splitter of the first component optical module is equivalent to the stacking height of the semiconductor laser stack; the size of each component optical module is multiplied sequentially, and the light beam emitted by the mth component optical module is incident on the beam splitter of the m+1th component optical module, 1 ≤m<n, m is the sequence number of the light splitting module, and the sequence number is arranged according to the order in which the laser passes through; the focusing system is used to focus and reshape the beam expanding laser to obtain a spot of required size; 所述分光模块采用平行六面棱镜和三棱镜的组合整体实现分光器和反射器的功能,平行六面棱镜具有唯一侧面面向半导体激光器叠阵且与所述激光出光方向垂直作为分光模块的入光面,与该侧面夹角为锐角的相邻侧面上紧密贴合所述三棱镜,贴合面上镀有半透半反膜作为分光器的分光面,与该侧面夹角为钝角的相邻侧面作为反射器的反光面;三棱镜还具有一个与所述激光出光方向垂直的外侧面,作为分光模块的出光面。The light-splitting module adopts a combination of a parallelepiped prism and a triangular prism to realize the functions of a beam splitter and a reflector as a whole. The parallelepiped prism has the only side facing the stack of semiconductor lasers and is perpendicular to the light-emitting direction of the laser as the light-incidence surface of the light-splitting module. The triangular prism is closely attached to the adjacent side that the included angle with the side is an acute angle. The reflective surface of the reflector; the triangular prism also has an outer surface perpendicular to the light emitting direction of the laser, which serves as the light emitting surface of the light splitting module. 2.根据权利要求1所述的基于扩束的高功率半导体激光器光学整形装置,其特征在于:分光器的分光面和反射器的反射面均与激光出光方向成45°角设置。2. The high-power semiconductor laser optical shaping device based on beam expansion according to claim 1, characterized in that: the beam splitting surface of the beam splitter and the reflecting surface of the reflector are all set at an angle of 45° to the laser light emitting direction. 3.一种基于扩束的高功率半导体激光器光学整形装置,其特征在于:包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述分光系统包括沿半导体激光器叠阵堆叠高度方向依次设置的n个分光镜以及最后设置的一个全反射镜,其中第1个分光镜与半导体激光器叠阵堆叠高度相当,n个分光镜以及全反射镜平行等间隔排列,与半导体激光器叠阵出光方向成30-60°设置;第1个分光镜的透射光与其余n-1个分光镜以及全反射镜的反射光共同形成激光扩束;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑;3. A high-power semiconductor laser optical shaping device based on beam expansion, characterized in that: it comprises a semiconductor laser array, a collimating lens group, a beam splitting system and a focusing system arranged in sequence along the optical path, and the beam splitting system includes a semiconductor laser array along the optical path. N beamsplitters and a total reflection mirror are arranged in sequence in the direction of the stack height of the array, wherein the first beam splitter is equivalent to the stack height of the semiconductor laser array, and the n beamsplitters and total reflection mirrors are arranged in parallel and equally spaced. The direction of light output from the semiconductor laser stack is set at 30-60°; the transmitted light of the first beam splitter and the reflected light of the remaining n-1 beam splitters and the total reflection mirror together form a laser beam expansion; the focusing system is used for The expanded laser beam is focused and shaped to obtain the desired size of the spot; n个分光镜的光透过率不同,第1个分光镜的透射光能量与其余n-1个分光镜以及全反射镜的反射光能量相等:The light transmittance of the n beamsplitters is different, and the transmitted light energy of the first beamsplitter is equal to the reflected light energy of the remaining n-1 beamsplitters and the total reflection mirror: 第1个分光镜的透过率为1/(n+1),反射率为n/(n+1);The transmittance of the first beam splitter is 1/(n+1), and the reflectance is n/(n+1); 第m个分光镜的透过率为(n-m+1)/(n-m+2),反射率为1/(n-m+2);The transmittance of the mth beam splitter is (n-m+1)/(n-m+2), and the reflectance is 1/(n-m+2); 其中,n为分光镜总个数,m为分光镜的排列序号,1<m≤n,排列序号按照激光依次通过的顺序进行排号。Among them, n is the total number of beam splitters, m is the sequence number of the beam splitter, 1<m≤n, and the sequence numbers are arranged according to the order in which the laser light passes through. 4.一种基于扩束的高功率半导体激光器光学整形装置,其特征在于:包括沿光路依次设置的半导体激光器叠阵、准直透镜组、分光系统以及聚焦系统,所述半导体激光器叠阵由若干个半导体激光单元堆叠组成,所述分光系统包括沿半导体激光器叠阵出光方向依次设置的n个分光镜以及最后设置的一个全反射镜,其中第1个分光镜与半导体激光器叠阵堆叠高度相当,n个分光镜以及全反射镜平行等间隔排列,与半导体激光器叠阵出光方向成30-60°设置;n个分光镜以及全反射镜的反射光共同形成激光扩束;所述的聚焦系统用于对扩束的激光进行聚焦整形得到所需尺寸的光斑;4. A high-power semiconductor laser optical shaping device based on beam expansion, characterized in that: it comprises a semiconductor laser array, a collimating lens group, a beam splitting system and a focusing system arranged successively along the optical path, and the semiconductor laser array consists of several Composed of stacked semiconductor laser units, the beam splitting system includes n beam splitters arranged in sequence along the light output direction of the semiconductor laser stack and a total reflection mirror at the end, wherein the first beam splitter is equivalent to the stack height of the semiconductor laser stack, n beamsplitters and total reflection mirrors are arranged in parallel and at equal intervals, and are arranged at 30-60° with the light emitting direction of the semiconductor laser array; the reflected light of n beamsplitters and total reflection mirrors together form laser beam expansion; the focusing system is used Focusing and shaping the expanded laser beam to obtain the desired size of the spot; n个分光镜的光透过率不同,使得n个分光镜以及全反射镜的反射光能量相等:The light transmittance of the n beamsplitters is different, so that the reflected light energy of the n beamsplitters and the total reflection mirror is equal: 第m个分光镜的反射率为1/(n-m+2),透过率为(n-m+1)/(n-m+2);The reflectance of the mth beam splitter is 1/(n-m+2), and the transmittance is (n-m+1)/(n-m+2); 其中,n为分光镜总个数,m为分光镜的排列序号,1≤m≤n,排列序号按照激光依次通过的顺序进行排号。Among them, n is the total number of beam splitters, m is the array number of beam splitters, 1≤m≤n, and the array numbers are arranged according to the order in which the laser light passes through.
CN201410196971.8A 2014-05-09 2014-05-09 High-power semiconductor laser optical shaping method and device based on beam expanding Expired - Fee Related CN103941406B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410196971.8A CN103941406B (en) 2014-05-09 2014-05-09 High-power semiconductor laser optical shaping method and device based on beam expanding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410196971.8A CN103941406B (en) 2014-05-09 2014-05-09 High-power semiconductor laser optical shaping method and device based on beam expanding

Publications (2)

Publication Number Publication Date
CN103941406A CN103941406A (en) 2014-07-23
CN103941406B true CN103941406B (en) 2017-01-25

Family

ID=51189141

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410196971.8A Expired - Fee Related CN103941406B (en) 2014-05-09 2014-05-09 High-power semiconductor laser optical shaping method and device based on beam expanding

Country Status (1)

Country Link
CN (1) CN103941406B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105739101B (en) * 2014-12-12 2020-02-28 深圳光峰科技股份有限公司 Lighting Structure and Lighting System
CN104635343A (en) * 2015-02-14 2015-05-20 哈尔滨工业大学 Refracting-reflecting type variable zoom laser expanding and collimating system
KR102293502B1 (en) * 2016-10-17 2021-08-26 포커스라이트 테크놀로지스 인크 Semiconductor laser modules and non-invasive medical methods
CN107199401B (en) * 2017-04-24 2019-11-19 和品(香港)公司 A kind of polishing method of laser polishing machine
CN106980180B (en) * 2017-05-08 2019-06-11 中国科学院长春光学精密机械与物理研究所 A beam combining device and method of making the same
CN109799601A (en) * 2017-11-17 2019-05-24 财团法人金属工业研究发展中心 Light secondary process construction
CN107941850B (en) * 2017-11-21 2020-08-04 宁波英飞迈材料科技有限公司 A device and method for rapidly measuring heat capacity of thin film materials
CN108224361A (en) * 2018-01-18 2018-06-29 云南裕光科技有限公司 A kind of laser illuminator system and laser lighting method
CN108508621A (en) * 2018-03-12 2018-09-07 广东欧珀移动通信有限公司 Structured light projection module, image acquisition device and electronic equipment
CN108594457A (en) * 2018-04-03 2018-09-28 Oppo广东移动通信有限公司 Laser projector, image acquisition device, and electronic device
CN111041474B (en) * 2019-12-09 2024-08-09 中国科学院西安光学精密机械研究所 High-power laser cladding head
CN111127847A (en) * 2019-12-12 2020-05-08 皖南医学院 A system and method for preventing queue insertion based on face recognition
CN111799647B (en) * 2020-07-06 2021-10-12 中国人民解放军战略支援部队航天工程大学 A miniaturized, automatic reciprocating scanning high-power laser
CN111897134B (en) * 2020-07-31 2022-02-25 西安炬光科技股份有限公司 An optical module and medical laser device
CN112731674B (en) * 2021-02-05 2023-06-06 西安炬光科技股份有限公司 Laser cutting beam splitting device, laser stitching beam combining system and method, laser radar
CN113732487A (en) * 2021-08-02 2021-12-03 北京工业大学 Single-head multi-path laser processing head and laser processing system
CN113930607B (en) * 2021-09-07 2023-01-31 中国科学院宁波材料技术与工程研究所 An adaptive distributed laser shock peening processing system and method
TW202315695A (en) * 2021-09-30 2023-04-16 美商晶典有限公司 Laser beam shaping apparatus
CN115113409B (en) * 2022-08-26 2022-12-30 成都莱普科技股份有限公司 Linear flat-top light spot generation system, method and equipment based on Dammann grating
CN115420951A (en) * 2022-09-07 2022-12-02 无锡唯因特数据技术有限公司 Square resistance measuring device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19915000A1 (en) * 1999-04-01 2000-10-26 Microlas Lasersystem Gmbh Controlling distribution intensity of laser beam to process a substrate, causing laser radiation to pass through a homogenizing device to let partial rays in laser beam overlay each other
EP2219064A1 (en) * 2009-02-13 2010-08-18 Laserline Gesellschaft für Entwicklung und Vertrieb von Diodenlasern mbH Laser lens and diode laser
CN102313995A (en) * 2011-09-06 2012-01-11 山西飞虹激光科技有限公司 Light beam shaping system of semiconductor laser arrays
CN102621694A (en) * 2012-03-21 2012-08-01 中国科学院光电技术研究所 Strip-shaped astigmatic beam shaping and collimating device
CN203870330U (en) * 2014-05-09 2014-10-08 西安炬光科技有限公司 High-power semiconductor laser optical shaping device based on beam expansion

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009012913A1 (en) * 2007-07-21 2009-01-29 Keming Du Optical arrangement for generating multi-beams
WO2012129789A1 (en) * 2011-03-30 2012-10-04 青岛海信信芯科技有限公司 Beam shaping method and device and laser display light source module and equipment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19915000A1 (en) * 1999-04-01 2000-10-26 Microlas Lasersystem Gmbh Controlling distribution intensity of laser beam to process a substrate, causing laser radiation to pass through a homogenizing device to let partial rays in laser beam overlay each other
EP2219064A1 (en) * 2009-02-13 2010-08-18 Laserline Gesellschaft für Entwicklung und Vertrieb von Diodenlasern mbH Laser lens and diode laser
CN102313995A (en) * 2011-09-06 2012-01-11 山西飞虹激光科技有限公司 Light beam shaping system of semiconductor laser arrays
CN102621694A (en) * 2012-03-21 2012-08-01 中国科学院光电技术研究所 Strip-shaped astigmatic beam shaping and collimating device
CN203870330U (en) * 2014-05-09 2014-10-08 西安炬光科技有限公司 High-power semiconductor laser optical shaping device based on beam expansion

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
激光加工用半导体激光器的光束变换;刘友强等;《光学精密工程》;20120331;第20卷(第3期);第455-460页 *

Also Published As

Publication number Publication date
CN103941406A (en) 2014-07-23

Similar Documents

Publication Publication Date Title
CN103941406B (en) High-power semiconductor laser optical shaping method and device based on beam expanding
CN108233182B (en) Optical fiber coupling system based on hollow total reflection prism compression light beam
CN205790934U (en) A kind of semiconductor laser
CN103944066B (en) A kind of high-power semiconductor laser closes Shu Fangfa
CN105846311A (en) Semiconductor laser
CN103996973B (en) A Beam Expander of High Power Semiconductor Laser
CN201199288Y (en) Right Angle Prism Group Realizes Beam Coupling Device of High Power Semiconductor Laser Array
CN203871649U (en) High-power semiconductor laser beam expanding system
CN109212767B (en) Laser beam combining system
CN103944059B (en) High-power semiconductor laser beam expanding system
CN111896937A (en) An optical module and laser system for beam superposition
CN103944067B (en) A kind of high-power semiconductor laser closes beam system
CN115954761A (en) A multi-single-tube semiconductor laser beam combining device
CN203870330U (en) High-power semiconductor laser optical shaping device based on beam expansion
CN103326226A (en) Laser pumping device
US8767304B2 (en) Beam shaping device for focusing light beams from semiconductor laser
CN104600566A (en) High beam quality of semiconductor laser array beam combination device
CN203871648U (en) High-power semiconductor laser beam expanding device
CN1651972A (en) Method for realizing semiconductor laser beam shaping by off-axis total internal reflection prism array
CN213845834U (en) A high brightness and high efficiency semiconductor laser
CN101369717A (en) Multi-beam coupling high-power semiconductor laser device
CN116706689A (en) Distributed multi-single-tube semiconductor laser beam combining device
CN1553240A (en) A Method of Changing the Optical Parameter Product of Collimated Beam Using Mirror Stacks
CN203631973U (en) High-power semiconductor laser light source system used for laser processing
CN112563879A (en) Dense wavelength beam combining device of multi-single-tube semiconductor laser

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: 710077 Xi'an hi tech Zone 56, Xi'an, Shaanxi Province, No. 56

Patentee after: Focuslight Technologies Inc.

Address before: 710119 Third Floor, Building 10, 17 Information Avenue, New Industrial Park, Xi'an High-tech Zone, Shaanxi Province

Patentee before: XI'AN FOCUSLIGHT TECHNOLOGIES Co.,Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170125