CN103904211B - A kind of magnetic field detectors based on vertical exchange coupling and preparation and application thereof - Google Patents
A kind of magnetic field detectors based on vertical exchange coupling and preparation and application thereof Download PDFInfo
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Abstract
本发明涉及一种基于垂直交换耦合的磁场探测器及其制备和使用方法,磁场探测器的制备方法包括以下步骤:采用磁控溅射或电子束蒸镀方法,在基片上依次沉积底电极、铁磁层、非磁性层和顶电极,得到多层膜结构;采用紫外曝光和氩离子刻蚀工艺,将得到的多层膜结构加工成一十字形结构。本发明制备得到的磁场探测器包括基片、底电极、铁磁层、非磁性层和顶电极,基片采用十字形结构,底电极、铁磁层、非磁性层和顶电极依次沉积在基片上,且形状均与基片的形状呈匹配设置;铁磁层由垂直磁化膜构成,非磁性层由反铁磁层或氧化层构成,底电极和顶电极均采用Pt电极。本发明可以广泛应用于磁场探测过程中。
The invention relates to a magnetic field detector based on vertical exchange coupling and its preparation and use method. The preparation method of the magnetic field detector includes the following steps: using magnetron sputtering or electron beam evaporation method, sequentially depositing a bottom electrode, a The ferromagnetic layer, the non-magnetic layer and the top electrode are used to obtain a multilayer film structure; the obtained multilayer film structure is processed into a cross-shaped structure by using ultraviolet exposure and argon ion etching processes. The magnetic field detector prepared by the present invention comprises a substrate, a bottom electrode, a ferromagnetic layer, a nonmagnetic layer and a top electrode, the substrate adopts a cross-shaped structure, and the bottom electrode, the ferromagnetic layer, the nonmagnetic layer and the top electrode are sequentially deposited on the substrate. On-chip, and the shape is matched with the shape of the substrate; the ferromagnetic layer is composed of a perpendicular magnetization film, the non-magnetic layer is composed of an antiferromagnetic layer or an oxide layer, and both the bottom electrode and the top electrode are Pt electrodes. The invention can be widely used in the magnetic field detection process.
Description
技术领域technical field
本发明涉及一种磁场探测器及其制备和使用方法,特别是关于一种基于垂直交换耦合的磁场探测器及其制备和使用方法。The invention relates to a magnetic field detector and its preparation and use method, in particular to a magnetic field detector based on vertical exchange coupling and its preparation and use method.
背景技术Background technique
磁传输测试包括利用AHE(Anomalous Hall effect,反常霍尔效应),PHE(PlanarHall effect,平面霍尔效应)以及各向异性磁电阻效应等原理探测磁性体系的磁化特征,相应原理的磁传感器可以精确探测磁场的大小和方向,应用于磁存储器、生物传感器、航空航天导航系统和自动控制系统等诸多方面。PHE传感器通常由面内磁化的材料制成,其易获得线性响应,然而PHE传感器尺寸的减小会使其敏感层的磁化状态受热效应和外界磁场影响,导致噪音增加和信号的不稳定性,以及输出信号的减弱。相反,对于热稳定性较好的垂直易磁化的磁学体系,AHE传感器是人们关注的热点,采用AHE传感器对信号进行探测时多集中在垂直于薄膜表面方向,而忽略了三维空间内的其他方向。The magnetic transmission test includes using the principles of AHE (Anomalous Hall effect, abnormal Hall effect), PHE (PlanarHall effect, planar Hall effect) and anisotropic magnetoresistance effect to detect the magnetization characteristics of the magnetic system. The magnetic sensor of the corresponding principle can accurately Detecting the size and direction of the magnetic field is used in many aspects such as magnetic memory, biosensor, aerospace navigation system and automatic control system. PHE sensors are usually made of in-plane magnetized materials, which are easy to obtain a linear response. However, the reduction in the size of PHE sensors will make the magnetization state of the sensitive layer affected by thermal effects and external magnetic fields, resulting in increased noise and signal instability. and attenuation of the output signal. On the contrary, for the magnetic system with good thermal stability and easy magnetization perpendicularly, the AHE sensor is the focus of people's attention. When the AHE sensor is used to detect the signal, it is mostly concentrated in the direction perpendicular to the film surface, while ignoring other factors in the three-dimensional space. direction.
发明内容Contents of the invention
针对上述问题,本发明的目的是提供一种基于垂直交换耦合的磁场探测器及其制备和使用方法,本发明的制备方法利用垂直交换耦合的磁性薄膜体系,结合AHE和PHE,制备了一种尺寸小、分辨率高、结构简单的磁场探测器,本发明的磁场探测器能够探测三维空间的磁场大小和方向。In view of the above problems, the object of the present invention is to provide a magnetic field detector based on vertical exchange coupling and its preparation and use method. The preparation method of the present invention utilizes the magnetic thin film system of vertical exchange coupling, combined with AHE and PHE, to prepare a A magnetic field detector with small size, high resolution and simple structure, the magnetic field detector of the present invention can detect the magnitude and direction of the magnetic field in three-dimensional space.
为实现上述目的,本发明采取以下技术方案:一种基于垂直交换耦合的磁场探测器,其特征在于:它包括基片、底电极、铁磁层、非磁性层和顶电极,所述基片采用十字形结构,所述底电极、铁磁层、非磁性层和顶电极依次沉积在所述基片上,且所述底电极、铁磁层、非磁性层和顶电极的形状均与所述基片的形状呈匹配设置;所述铁磁层由垂直磁化膜构成,所述非磁性层由反铁磁层或氧化层构成,所述底电极和顶电极均采用Pt电极。To achieve the above object, the present invention adopts the following technical solutions: a magnetic field detector based on vertical exchange coupling, characterized in that: it includes a substrate, a bottom electrode, a ferromagnetic layer, a nonmagnetic layer and a top electrode, and the substrate Using a cross-shaped structure, the bottom electrode, ferromagnetic layer, non-magnetic layer and top electrode are sequentially deposited on the substrate, and the shapes of the bottom electrode, ferromagnetic layer, non-magnetic layer and top electrode are the same as those of the The shapes of the substrates are arranged in a matching manner; the ferromagnetic layer is composed of a perpendicular magnetization film, the nonmagnetic layer is composed of an antiferromagnetic layer or an oxide layer, and both the bottom electrode and the top electrode are Pt electrodes.
构成氧化层的非磁性层的厚度为或0.5nm~1.5nm。The thickness of the non-magnetic layer constituting the oxide layer is 0.5 nm to 1.5 nm.
所述基片采用Si(100)/SiO2普通基片、MgO单晶基片、SrTiO3单晶基片以及铁电基片中的一种,所述铁电基片采用BaTiO3、PZT和PMN-PT中的一种。The substrate adopts one of Si(100)/SiO 2 common substrate, MgO single crystal substrate, SrTiO 3 single crystal substrate and ferroelectric substrate, and the ferroelectric substrate adopts BaTiO 3 , PZT and One of PMN-PT.
构成所述铁磁层的垂直磁化膜采用垂直磁化的[Co/Pt]n多层膜、[Co/Pd]n多层膜、[Co/Ni]n多层膜和CoFeB中的一种,n=1~10;垂直磁化膜采用[Co/Pt]n多层膜时,Co层和Pt层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Pt层的厚度均为0.8nm~1.5nm;垂直磁化膜采用[Co/Pd]n多层膜时,Co层和Pd层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Pd层的厚度均为0.8nm~1.5nm;垂直磁化膜采用[Co/Ni]n多层膜时,Co层和Ni层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Ni层的厚度均为0.8nm~1.5nm;垂直磁化膜采用CoFeB时,CoFeB的厚度为0.7nm~1.5nm。The perpendicular magnetization film constituting the ferromagnetic layer is one of vertical magnetization [Co/Pt] n multilayer film, [Co/Pd] n multilayer film, [Co/Ni] n multilayer film and CoFeB, n=1~10; when the vertical magnetization film adopts [Co/Pt] n multilayer film, the Co layer and the Pt layer are periodically deposited repeatedly, the thickness of each Co layer is 0.3nm~0.8nm, and the thickness of each Pt layer is 0.8nm~1.5nm; when the vertical magnetization film adopts [Co/Pd] n multilayer film, the Co layer and Pd layer are periodically deposited repeatedly, the thickness of each Co layer is 0.3nm~0.8nm, and the thickness of each Pd layer is 0.8nm~1.5nm; when the [Co/Ni] n multilayer film is used for the vertical magnetization film, the Co layer and the Ni layer are periodically deposited repeatedly, the thickness of each Co layer is 0.3nm~0.8nm, and the thickness of each Ni layer is 0.8nm-1.5nm; when CoFeB is used for the perpendicular magnetization film, the thickness of CoFeB is 0.7nm-1.5nm.
构成所述非磁性层的反铁磁层采用Mn系合金和氧化物反铁磁材料中的一种;Mn系合金采用IrMn、FeMn和PtMn中的一种,氧化物反铁磁材料采用NiO、Cr2O3和Sr2IrO4中的一种。The antiferromagnetic layer constituting the nonmagnetic layer adopts one of Mn alloy and oxide antiferromagnetic material; the Mn alloy adopts one of IrMn, FeMn and PtMn, and the oxide antiferromagnetic material adopts NiO, One of Cr 2 O 3 and Sr 2 IrO 4 .
一种所述基于垂直交换耦合的磁场探测器的制备方法,其包括以下步骤:1)采用磁控溅射或电子束蒸镀方法,在基片上依次沉积底电极、铁磁层、非磁性层和顶电极,得到多层膜结构;2)采用紫外曝光和氩离子刻蚀工艺,将得到的多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。A method for preparing a magnetic field detector based on vertical exchange coupling, which includes the following steps: 1) using magnetron sputtering or electron beam evaporation to sequentially deposit a bottom electrode, a ferromagnetic layer, and a nonmagnetic layer on a substrate and the top electrode to obtain a multilayer film structure; 2) Using ultraviolet exposure and argon ion etching process, the obtained multilayer film structure is processed into a cross-shaped structure, and the area of the rectangle where the cross-shaped structure is located is 500×300μm 2 ~1000× 600 μm 2 , and the cross-overlapping portion at the center of the cross-shaped structure has an area of 5×3 μm 2 to 40×30 μm 2 .
一种所述基于垂直交换耦合的磁场探测器的使用方法,其包括以下步骤:1)将磁场探测器置于方向和大小均未知的磁场中;2)在第一端点与第二端点之间通电流I,在第三端点与第四端点之间测霍尔电阻;转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向;3)对步骤2)中方向确定的磁场,采用以下步骤确定大小:①将磁场探测器的表面作为xy平面,其中,平行于第一端点与第二端点之间所通电流I的方向为x轴,垂直于电流I的方向为y轴,将与xy平面垂直的方向作为z轴,建立空间坐标系;②将磁场探测器放置在步骤2)中方向确定的磁场中,使x轴平行于该磁场方向,将磁场探测器绕z轴旋转360°,测量并记录磁场探测器绕z轴旋转过程中的霍尔电阻值;根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制一条电阻-角度曲线;③将磁场探测器放置在若干方向和大小已知的磁场中,采用与步骤①和步骤②相同的方法,根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制若干条标准电阻-角度曲线;④将绘制的一条电阻-角度曲线与若干条标准电阻-角度曲线进行比对,找出与绘制的电阻-角度曲线相同的标准电阻-角度曲线,这条标准电阻-角度曲线对应的磁场大小即为该待确定磁场的大小。A method for using the magnetic field detector based on vertical exchange coupling, which includes the following steps: 1) placing the magnetic field detector in a magnetic field whose direction and magnitude are unknown; 2) placing the magnetic field detector between the first end point and the second end point The current I is passed through, and the Hall resistance is measured between the third terminal and the fourth terminal; the magnetic field detector is rotated, and the resistance values of any six different magnetic field sizes are respectively read at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values 3) For the magnetic field whose direction is determined in step 2), the following steps are used to determine the size: ① Take the surface of the magnetic field detector as the xy plane, where the plane parallel to the passage between the first end point and the second end point The direction of the current I is the x-axis, the direction perpendicular to the current I is the y-axis, and the direction perpendicular to the xy plane is used as the z-axis to establish a space coordinate system; ② Place the magnetic field detector in the magnetic field whose direction is determined in step 2) , make the x-axis parallel to the direction of the magnetic field, rotate the magnetic field detector 360° around the z-axis, measure and record the Hall resistance value during the rotation of the magnetic field detector around the z-axis; according to the angle and Measure the obtained Hall resistance value, and draw a resistance-angle curve; ③ Place the magnetic field detector in several magnetic fields with known directions and sizes, and use the same method as step ① and step ②, according to the magnetic field detector around the z-axis Draw a number of standard resistance-angle curves based on the angle of rotation and the measured Hall resistance value; ④Compare the drawn resistance-angle curve with several standard resistance-angle curves to find out the resistance-angle curve that is consistent with the drawn resistance-angle curve. The standard resistance-angle curve with the same curve, the magnetic field corresponding to this standard resistance-angle curve is the size of the magnetic field to be determined.
所述步骤3)中,方向和大小已知的磁场其大小范围为0.01kOe~90kOe。In the step 3), the magnetic field whose direction and size are known ranges from 0.01kOe to 90kOe.
一种所述基于垂直交换耦合的磁场探测器的使用方法,其包括以下步骤:1)将磁场探测器置于方向和大小均未知的磁场中;2)在第一端点与第二端点之间通电流I,在第三端点与第四端点之间测霍尔电阻;转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值,其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向;3)对步骤2)中方向确定的磁场,确定其磁场大小的过程为:将带有铁电基片的磁场探测器置于未知大小的磁场中,让磁场方向垂直于磁场探测器的薄膜表面,在铁电基片上施加-10V~10V变化的电压,记录第三端点与第四端点之间霍尔电阻发生转变时的电压值,此时的电压值对应的该垂直交换耦合体系的矫顽力即为磁场的大小。A method for using the magnetic field detector based on vertical exchange coupling, which includes the following steps: 1) placing the magnetic field detector in a magnetic field whose direction and magnitude are unknown; 2) placing the magnetic field detector between the first end point and the second end point Pass a current I between the third terminal and the fourth terminal to measure the Hall resistance; rotate the magnetic field detector to read the Hall resistance values under any six different magnetic field sizes at a certain angle, among which three Hall resistance values R 1 , R 2 and R 3 under a positive magnetic field; Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and determine the direction of the magnetic field according to the relationship between each Hall resistance value ;3) For the magnetic field whose direction is determined in step 2), the process of determining the magnitude of its magnetic field is: place the magnetic field detector with the ferroelectric substrate in a magnetic field of unknown magnitude, and let the direction of the magnetic field be perpendicular to the film of the magnetic field detector On the surface, apply a voltage ranging from -10V to 10V on the ferroelectric substrate, and record the voltage value when the Hall resistance between the third terminal and the fourth terminal changes. The voltage value at this time corresponds to the correction of the vertical exchange coupling system. The coercive force is the magnitude of the magnetic field.
本发明由于采取以上技术方案,其具有以下优点:1、本发明由于采用磁控溅射或电子束蒸镀方法,在基片上依次沉积底电极、铁磁层、非磁性层和顶电极,得到多层膜结构,并采用紫外曝光和氩离子刻蚀工艺,将得到的多层膜结构加工成一十字形磁场探测器,因此本发明的磁场探测器的制备方法简单、成本低,所制备的多层膜结构的界面清晰、平整且附着力好,具有良好的垂直易磁化特性。2、本发明的磁场探测器由于其尺寸为微米量级,因此本发明可以用于探测狭小空间或精确位置的磁场方向和大小。3、本发明的磁场探测器由于铁磁层采用热稳定较好的垂直磁化膜,因此本发明能够减少热效应对信号的干扰,使测试结果更准确,同时本发明的分辨率高,探测的磁场方向能够精确到0.2°以内。4、由于使用本发明的磁场探测器探测磁场大小时可以通过铁电基片调控垂直磁化体系的矫顽力,因此本发明能够通过施加在铁电基片上不同电压下霍尔电阻的变化精确判断磁场的大小。5、由于采用本发明的磁场探测器探测磁场的过程中,磁场探测器的霍尔信号对磁场的方向非常敏感,因此本发明的磁场探测器能够结合反常霍尔电阻和平面霍尔电阻实现对三维空间内磁场方向和大小的探测。6、本发明的磁场探测器适用于温度范围为2K~400K的环境中磁场方向的判定,在不同温度环境中,本发明的磁场探测器应用于样品腔封闭的小型磁学测量设备时,能够精确判断样品腔中不同位置的磁场大小和方向且使用非常方便。基于以上优点,本发明可以广泛应用于磁场探测过程中。The present invention has the following advantages due to the adoption of the above technical scheme: 1. The present invention deposits a bottom electrode, a ferromagnetic layer, a nonmagnetic layer and a top electrode successively on the substrate due to the use of magnetron sputtering or electron beam evaporation methods to obtain multilayer film structure, and adopts ultraviolet exposure and argon ion etching process, the multilayer film structure obtained is processed into a cross-shaped magnetic field detector, so the preparation method of the magnetic field detector of the present invention is simple, and cost is low, and the many prepared The interface of the layer film structure is clear, flat and has good adhesion, and has good vertical easy magnetization characteristics. 2. Since the size of the magnetic field detector of the present invention is on the order of microns, the present invention can be used to detect the direction and magnitude of the magnetic field in a narrow space or at a precise location. 3. Since the magnetic field detector of the present invention adopts a vertical magnetization film with good thermal stability for the ferromagnetic layer, the present invention can reduce the interference of thermal effects on the signal, making the test results more accurate, and the resolution of the present invention is high, and the detected magnetic field The orientation can be accurate to within 0.2°. 4. Since the magnetic field detector of the present invention is used to detect the magnetic field, the coercive force of the perpendicular magnetization system can be regulated through the ferroelectric substrate, so the present invention can accurately judge the change of the Hall resistance under different voltages applied to the ferroelectric substrate The size of the magnetic field. 5. Since the Hall signal of the magnetic field detector is very sensitive to the direction of the magnetic field when the magnetic field detector of the present invention is used to detect the magnetic field, the magnetic field detector of the present invention can combine the abnormal Hall resistance and the planar Hall resistance to realize the detection of the magnetic field. Detection of the direction and magnitude of the magnetic field in three-dimensional space. 6. The magnetic field detector of the present invention is suitable for determining the direction of the magnetic field in an environment with a temperature range of 2K to 400K. In different temperature environments, when the magnetic field detector of the present invention is applied to a small magnetic measuring device with a closed sample cavity, it can It can accurately determine the magnitude and direction of the magnetic field at different positions in the sample cavity and is very convenient to use. Based on the above advantages, the present invention can be widely applied in the process of magnetic field detection.
附图说明Description of drawings
图1是本发明磁场探测器的局部结构示意图Fig. 1 is the partial structure schematic diagram of magnetic field detector of the present invention
图2是本发明磁场探测器的使用状态示意图Fig. 2 is a schematic diagram of the use state of the magnetic field detector of the present invention
具体实施方式detailed description
下面结合附图和实施例对本发明进行详细的描述。The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
如图1所示,本发明基于垂直交换耦合的磁场探测器包括基片1、底电极2、铁磁层3、非磁性层4和顶电极5,基片1采用十字形结构,底电极2、铁磁层3、非磁性层4和顶电极5依次沉积在基片1上,且底电极2、铁磁层3、非磁性层4和顶电极5的形状均与基片1的形状呈匹配设置。其中,铁磁层3由垂直磁化膜构成,非磁性层4由反铁磁层或0.5nm~1.5nm厚的氧化层构成,底电极2和顶电极5均采用Pt电极。As shown in Figure 1, the magnetic field detector based on vertical exchange coupling of the present invention comprises substrate 1, bottom electrode 2, ferromagnetic layer 3, nonmagnetic layer 4 and top electrode 5, and substrate 1 adopts cross-shaped structure, and bottom electrode 2 , ferromagnetic layer 3, nonmagnetic layer 4 and top electrode 5 are sequentially deposited on substrate 1, and the shapes of bottom electrode 2, ferromagnetic layer 3, nonmagnetic layer 4 and top electrode 5 are all in the same shape as substrate 1. Match settings. Among them, the ferromagnetic layer 3 is composed of a perpendicular magnetization film, the nonmagnetic layer 4 is composed of an antiferromagnetic layer or an oxide layer with a thickness of 0.5nm-1.5nm, and both the bottom electrode 2 and the top electrode 5 are Pt electrodes.
上述实施例中,基片1采用Si(100)/SiO2普通基片、MgO单晶基片、SrTiO3(钛酸锶)单晶基片以及BaTiO3、PZT(锆钛酸铅)、PMN-PT(铌镁酸铅-钛酸铅)等铁电基片中的一种。In the above embodiment, the substrate 1 adopts Si(100)/SiO 2 common substrate, MgO single crystal substrate, SrTiO 3 (strontium titanate) single crystal substrate and BaTiO 3 , PZT (lead zirconate titanate), PMN -PT (lead magnesium niobate-lead titanate) and other ferroelectric substrates.
上述实施例中,垂直磁化膜采用垂直磁化的[Co/Pt]n多层膜、[Co/Pd]n多层膜、[Co/Ni]n多层膜和厚度为0.7nm~1.5nm的CoFeB中的一种。其中,n=1~10。In the above-mentioned embodiments, the perpendicular magnetization film adopts vertical magnetization [Co/Pt] n multilayer film, [Co/Pd] n multilayer film, [Co/Ni] n multilayer film and the thickness is 0.7nm~1.5nm One of CoFeB. Among them, n=1~10.
垂直磁化膜采用[Co/Pt]n多层膜时,Co层和Pt层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Pt层的厚度均为0.8nm~1.5nm。When the [Co/Pt] n multilayer film is used for the vertical magnetization film, the Co layer and the Pt layer are deposited periodically, and the thickness of each Co layer is 0.3nm-0.8nm, and the thickness of each Pt layer is 0.8nm-1.5nm.
垂直磁化膜采用[Co/Pd]n多层膜时,Co层和Pd层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Pd层的厚度均为0.8nm~1.5nm。When the vertical magnetization film adopts [Co/Pd] n multilayer film, the Co layer and the Pd layer are periodically deposited repeatedly, the thickness of each Co layer is 0.3nm-0.8nm, and the thickness of each Pd layer is 0.8nm-1.5nm.
垂直磁化膜采用[Co/Ni]n多层膜时,Co层和Ni层周期重复沉积,各Co层的厚度均为0.3nm~0.8nm,各Ni层的厚度均为0.8nm~1.5nm。When the [Co/Ni] n multilayer film is used for the vertical magnetization film, the Co layer and the Ni layer are deposited periodically, the thickness of each Co layer is 0.3nm-0.8nm, and the thickness of each Ni layer is 0.8nm-1.5nm.
上述实施例中,反铁磁层的厚度为6nm~20nm,反铁磁层采用IrMn、FeMn、PtMn等Mn系合金或NiO、Cr2O3、Sr2IrO4等氧化物反铁磁材料中的一种。In the above embodiments, the thickness of the antiferromagnetic layer is 6 nm to 20 nm, and the antiferromagnetic layer is made of Mn-based alloys such as IrMn, FeMn, and PtMn or oxide antiferromagnetic materials such as NiO, Cr 2 O 3 , Sr 2 IrO 4 . kind of.
本发明基于垂直交换耦合的磁场探测器的制备方法,具体包括以下步骤:The present invention is based on the preparation method of the magnetic field detector of vertical exchange coupling, specifically comprises the following steps:
1)采用磁控溅射或电子束蒸镀方法,在基片1上依次沉积底电极2、铁磁层3、非磁性层4和顶电极5,得到多层膜结构。1) The bottom electrode 2, the ferromagnetic layer 3, the non-magnetic layer 4 and the top electrode 5 are sequentially deposited on the substrate 1 by magnetron sputtering or electron beam evaporation to obtain a multilayer film structure.
2)如图2所示,采用紫外曝光和氩离子刻蚀等工艺,将由步骤1)得到的多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。2) As shown in Figure 2, the multilayer film structure obtained in step 1) is processed into a cross - shaped structure by using processes such as ultraviolet exposure and argon ion etching. 600 μm 2 , and the cross-overlapping portion at the center of the cross-shaped structure has an area of 5×3 μm 2 to 40×30 μm 2 .
如图2所示,将本发明基于垂直交换耦合的磁场探测器的第一~第四端点分别标记为a、b、c、d。在第一端点a与第二端点b之间通电流I,在第三端点c与第四端点d之间测霍尔电阻RHall。As shown in FIG. 2 , the first to fourth endpoints of the magnetic field detector based on vertical exchange coupling of the present invention are respectively marked as a, b, c, and d. A current I is passed between the first terminal a and the second terminal b, and the Hall resistance R Hall is measured between the third terminal c and the fourth terminal d.
本发明能够利用垂直交换耦合体系的霍尔信号对磁场大小和方向的敏感性,在温度范围为2K~400K的环境中精确判断磁场的大小和方向。采用本发明的磁场探测器探测磁场的过程中,磁场探测器的霍尔信号对磁场的方向非常敏感。The invention can use the sensitivity of the Hall signal of the vertical exchange coupling system to the magnitude and direction of the magnetic field to accurately judge the magnitude and direction of the magnetic field in an environment with a temperature range of 2K-400K. When the magnetic field detector of the present invention is used to detect the magnetic field, the Hall signal of the magnetic field detector is very sensitive to the direction of the magnetic field.
当磁场方向垂直于磁场探测器平面时,磁场探测器具有反常霍尔信号,即在正负磁场的作用下,第三端点c与第四端点d之间测得的霍尔电阻具有明显的高低阻态。When the direction of the magnetic field is perpendicular to the plane of the magnetic field detector, the magnetic field detector has an abnormal Hall signal, that is, under the action of positive and negative magnetic fields, the Hall resistance measured between the third terminal c and the fourth terminal d has obvious high and low resistance state.
当磁场方向平行于磁场探测器平面时,磁场探测器具有平面霍尔信号,即当所探测磁场大于饱和磁场时,在正负磁场的作用下,第三端点c与第四端点d之间测得的霍尔电阻大小完全相同。When the direction of the magnetic field is parallel to the plane of the magnetic field detector, the magnetic field detector has a planar Hall signal, that is, when the detected magnetic field is greater than the saturation magnetic field, under the action of positive and negative magnetic fields, the signal measured between the third terminal c and the fourth terminal d The Hall resistors are exactly the same size.
当磁场方向介于垂直于和平行于磁场探测器平面之间时,磁场探测器具有反常霍尔信号和平面霍尔信号叠加的信号。当磁场方向微小偏离磁场探测器的平面0.2°时,霍尔信号曲线的线型就发生明显变化。When the direction of the magnetic field is between perpendicular to and parallel to the plane of the magnetic field detector, the magnetic field detector has a superimposed signal of the abnormal Hall signal and the planar Hall signal. When the direction of the magnetic field deviates slightly from the plane of the magnetic field detector by 0.2°, the line shape of the Hall signal curve changes significantly.
此外,通过在铁电基片上施加不同的电压,可以改变铁磁层的矫顽力的大小和垂直磁化性能,即改变磁场探测器反常霍尔信号翻转场的大小,从而在方向确定的磁场中,在某一固定磁场下,在铁电基片上施加不同电压,记录霍尔电阻发生转变时的电压值,此时的电压值所对应的垂直交换耦合体系的矫顽力即为磁场的大小。In addition, by applying different voltages on the ferroelectric substrate, the size of the coercive force and the perpendicular magnetization performance of the ferromagnetic layer can be changed, that is, the size of the abnormal Hall signal switching field of the magnetic field detector can be changed, so that in the direction-determined magnetic field , under a fixed magnetic field, apply different voltages on the ferroelectric substrate, and record the voltage value when the Hall resistance changes. The coercive force of the vertical exchange coupling system corresponding to the voltage value at this time is the magnitude of the magnetic field.
使用本发明基于垂直交换耦合的磁场探测器探测磁场,其具体包括以下步骤:Using the magnetic field detector based on vertical exchange coupling of the present invention to detect the magnetic field, it specifically includes the following steps:
1)将磁场探测器置于方向和大小均未知的磁场中;1) Place the magnetic field detector in a magnetic field with unknown direction and magnitude;
2)在第一端点a与第二端点b之间通电流I,在第三端点c与第四端点d之间测霍尔电阻。转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向,其具体包括:2) Pass a current I between the first terminal a and the second terminal b, and measure the Hall resistance between the third terminal c and the fourth terminal d. Rotate the magnetic field detector to read the Hall resistance values under any six different magnetic field sizes at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values The relationship determines the direction of the magnetic field, which specifically includes:
若R1=R2=R3=R4=R5=R6,则确定平行于磁场探测器表面的方向为磁场方向。If R 1 =R 2 =R 3 =R 4 =R 5 =R 6 , the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
若各霍尔电阻值不相同,则记录各霍尔电阻差值的绝对值的平均值k,转动磁场探测器,k值不断改变,当k值变为0时,即R1=R2=R3=R4=R5=R6时,停止转动磁场探测器,此时平行于磁场探测器表面的方向确定为磁场方向。If the values of the Hall resistances are different, record the average value k of the absolute values of the differences of the Hall resistances, rotate the magnetic field detector, and the value of k changes continuously. When the value of k becomes 0, that is, R 1 =R 2 = When R 3 =R 4 =R 5 =R 6 , stop rotating the magnetic field detector, and at this time, the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
各霍尔电阻差值的绝对值的平均值k为:The average value k of the absolute value of each Hall resistance difference is:
3)对步骤2)中方向确定的磁场,采用以下两种方法确定磁场大小:3) For the magnetic field whose direction is determined in step 2), use the following two methods to determine the magnitude of the magnetic field:
方法一:method one:
①如图2所示,将磁场探测器的表面作为xy平面,其中,平行于第一端点a与第二端点b之间所通电流I的方向为x轴,垂直于电流I的方向为y轴,将与xy平面垂直的方向作为z轴,建立空间坐标系。①As shown in Figure 2, the surface of the magnetic field detector is taken as an xy plane, where the direction parallel to the current I flowing between the first end point a and the second end point b is the x-axis, and the direction perpendicular to the current I is The y axis uses the direction perpendicular to the xy plane as the z axis to establish a space coordinate system.
②将磁场探测器放置在步骤2)中方向确定的磁场中,使x轴平行于磁场方向,将磁场探测器绕z轴旋转360°,测量并记录磁场探测器绕z轴旋转过程中的霍尔电阻值;根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制一条电阻-角度曲线。② Place the magnetic field detector in the magnetic field whose direction is determined in step 2), make the x-axis parallel to the direction of the magnetic field, rotate the magnetic field detector 360° around the z-axis, measure and record the Huo during the rotation of the magnetic field detector around the z-axis Hall resistance value; draw a resistance-angle curve according to the rotation angle of the magnetic field detector around the z-axis and the measured Hall resistance value.
③将磁场探测器放置在若干方向和大小已知的磁场中,采用与步骤①和步骤②相同的方法,根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制若干条标准电阻-角度曲线。方向和大小已知的磁场其大小范围为0.01kOe~90kOe。③ Place the magnetic field detector in a number of magnetic fields with known directions and sizes, use the same method as step ① and step ②, draw several lines according to the angle of rotation of the magnetic field detector around the z-axis and the measured Hall resistance value Standard resistance-angle curve. The magnitude range of the magnetic field with known direction and magnitude is 0.01kOe~90kOe.
④将绘制的一条电阻-角度曲线与若干条标准电阻-角度曲线进行比对,找出与绘制的电阻-角度曲线相同的标准电阻-角度曲线,这条标准电阻-角度曲线对应的磁场大小即为该待确定磁场的大小。④ Compare a drawn resistance-angle curve with several standard resistance-angle curves, and find out the standard resistance-angle curve that is the same as the drawn resistance-angle curve. The magnetic field corresponding to this standard resistance-angle curve is is the size of the magnetic field to be determined.
方法二:Method Two:
将带有铁电基片的磁场探测器置于未知大小的磁场中,使磁场探测器的薄膜表面与磁场方向垂直,在铁电基片上施加-10V~10V变化的电压,记录第三端点c与第四端点d之间霍尔电阻发生转变时的电压值,此时的电压值对应的该垂直交换耦合体系的矫顽力即为磁场的大小。Place the magnetic field detector with the ferroelectric substrate in a magnetic field of unknown magnitude, make the film surface of the magnetic field detector perpendicular to the direction of the magnetic field, apply a voltage varying from -10V to 10V on the ferroelectric substrate, and record the third terminal c The voltage value when the Hall resistance changes between the fourth terminal d and the coercive force of the vertical exchange coupling system corresponding to the voltage value at this time is the magnitude of the magnetic field.
实施例1:制备自下至上依次为Si/SiO2/[Pt/Co]2/IrMn/Pt的磁场探测器,其具体包括:Example 1: Prepare a magnetic field detector with Si/SiO 2 /[Pt/Co] 2 /IrMn/Pt from bottom to top, which specifically includes:
1)采用磁控溅射方法,在Si/SiO2基片1上依次沉积Pt底电极2、[Pt/Co]2铁磁层3、IrMn非磁性层4和Pt顶电极5,得到多层膜结构。1) Using the magnetron sputtering method, a Pt bottom electrode 2, a [Pt/Co] 2 ferromagnetic layer 3, an IrMn nonmagnetic layer 4 and a Pt top electrode 5 are sequentially deposited on a Si/SiO 2 substrate 1 to obtain a multilayer Membrane structure.
其中,Si/SiO2基片1中SiO2层的厚度为200~400nm。[Pt/Co]2铁磁层2中,Pt层的厚度为1nm,Co层的厚度为0.5nm。IrMn非磁性层3的厚度为6nm~20nm,优选8nm。Wherein, the thickness of the SiO 2 layer in the Si/SiO 2 substrate 1 is 200-400 nm. [Pt/Co] 2 In the ferromagnetic layer 2, the Pt layer has a thickness of 1 nm, and the Co layer has a thickness of 0.5 nm. The thickness of the IrMn nonmagnetic layer 3 is 6 nm to 20 nm, preferably 8 nm.
2)采用紫外曝光和氩离子刻蚀等工艺,将多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。2) Process the multilayer film structure into a cross-shaped structure by using ultraviolet exposure and argon ion etching. The area of the rectangle where the cross-shaped structure is located is 500×300μm 2 to 1000×600μm 2 , and the overlapping part of the center of the cross-shaped structure The area is 5×3 μm 2 to 40×30 μm 2 .
如图1所示,在磁场探测器的第一端点a和第二端点b之间通电流,在磁场探测器的第三端点c和第四端点d之间测霍尔电阻RHall。采用以下方法确定磁场方向和大小:As shown in FIG. 1 , a current is passed between the first terminal a and the second terminal b of the magnetic field detector, and the Hall resistance R Hall is measured between the third terminal c and the fourth terminal d of the magnetic field detector. Determine the direction and magnitude of the magnetic field using the following methods:
1)将磁场探测器置于方向和大小均未知的磁场中;1) Place the magnetic field detector in a magnetic field with unknown direction and magnitude;
2)转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向,其具体包括:2) Rotate the magnetic field detector to read the Hall resistance values of any six different magnetic field sizes at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values The relationship determines the direction of the magnetic field, which specifically includes:
若R1=R2=R3=R4=R5=R6,则确定平行于磁场探测器表面的方向为磁场方向。If R 1 =R 2 =R 3 =R 4 =R 5 =R 6 , the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
若各霍尔电阻值不相同,则记录各霍尔电阻差值的绝对值的平均值k,转动磁场探测器,k值不断改变,当k值变为0时,即R1=R2=R3=R4=R5=R6时,停止转动磁场探测器,此时平行于磁场探测器表面的方向确定为磁场方向。If the values of the Hall resistances are different, record the average value k of the absolute values of the differences of the Hall resistances, rotate the magnetic field detector, and the value of k changes continuously. When the value of k becomes 0, that is, R 1 =R 2 = When R 3 =R 4 =R 5 =R 6 , stop rotating the magnetic field detector, and at this time, the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
3)对步骤2)中方向确定的磁场,采用以下方法确定磁场大小:3) For the magnetic field whose direction is determined in step 2), use the following method to determine the magnitude of the magnetic field:
①如图2所示,将磁场探测器的表面作为xy平面,其中,平行于第一端点a与第二端点b之间所通电流I的方向为x轴,垂直于电流I的方向为y轴,将与xy平面垂直的方向作为z轴,建立空间坐标系。①As shown in Figure 2, the surface of the magnetic field detector is taken as an xy plane, where the direction parallel to the current I flowing between the first end point a and the second end point b is the x-axis, and the direction perpendicular to the current I is The y axis uses the direction perpendicular to the xy plane as the z axis to establish a space coordinate system.
②将磁场探测器放置在步骤2)中方向确定的磁场中,使x轴平行于磁场方向,将磁场探测器绕z轴旋转360°,测量并记录磁场探测器绕z轴旋转过程中的霍尔电阻值;根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制一条电阻-角度曲线。② Place the magnetic field detector in the magnetic field whose direction is determined in step 2), make the x-axis parallel to the direction of the magnetic field, rotate the magnetic field detector 360° around the z-axis, measure and record the Huo during the rotation of the magnetic field detector around the z-axis Hall resistance value; draw a resistance-angle curve according to the rotation angle of the magnetic field detector around the z-axis and the measured Hall resistance value.
③将磁场探测器放置在若干方向和大小已知的磁场中,采用与步骤①和步骤②相同的方法,根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制若干条标准电阻-角度曲线。方向和大小已知的磁场其大小范围为0.01kOe~90kOe。③ Place the magnetic field detector in a number of magnetic fields with known directions and sizes, use the same method as step ① and step ②, draw several lines according to the angle of rotation of the magnetic field detector around the z-axis and the measured Hall resistance value Standard resistance-angle curve. The magnitude range of the magnetic field with known direction and magnitude is 0.01kOe~90kOe.
④将绘制的一条电阻-角度曲线与若干条标准电阻-角度曲线进行比对,找出与绘制的电阻-角度曲线相同的标准电阻-角度曲线,这条标准电阻-角度曲线对应的磁场大小即为该待确定磁场的大小。④ Compare a drawn resistance-angle curve with several standard resistance-angle curves, and find out the standard resistance-angle curve that is the same as the drawn resistance-angle curve. The magnetic field corresponding to this standard resistance-angle curve is is the size of the magnetic field to be determined.
实施例2:制备自下至上依次为MgO/CoFeB/FeMn/Pt的磁场探测器Example 2: Preparation of a magnetic field detector of MgO/CoFeB/FeMn/Pt from bottom to top
1)采用磁控溅射的方法,在MgO基片1上依次沉积Pt底电极2、CoFeB铁磁层3、FeMn非磁性层4和Pt顶电极5,得到多层膜结构。1) Using the method of magnetron sputtering, a Pt bottom electrode 2, a CoFeB ferromagnetic layer 3, a FeMn nonmagnetic layer 4 and a Pt top electrode 5 are sequentially deposited on the MgO substrate 1 to obtain a multilayer film structure.
其中,CoFeB铁磁层3为垂直磁化的铁磁层,其厚度为0.7~1.5nm,优选1.2nm。FeMn非磁性层4的厚度为6~20nm,优选10nm。Wherein, the CoFeB ferromagnetic layer 3 is a perpendicularly magnetized ferromagnetic layer with a thickness of 0.7-1.5 nm, preferably 1.2 nm. The thickness of the FeMn non-magnetic layer 4 is 6-20 nm, preferably 10 nm.
2)采用紫外曝光和氩离子刻蚀等工艺,将多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。2) Process the multilayer film structure into a cross-shaped structure by using ultraviolet exposure and argon ion etching. The area of the rectangle where the cross-shaped structure is located is 500×300μm 2 to 1000×600μm 2 , and the overlapping part of the center of the cross-shaped structure The area is 5×3 μm 2 to 40×30 μm 2 .
如图1所示,在磁场探测器的第一端点a和第二端点b之间通电流,在磁场探测器的第三端点c和第四端点d之间测霍尔电阻RHall。采用以下方法确定磁场方向和大小:As shown in FIG. 1 , a current is passed between the first terminal a and the second terminal b of the magnetic field detector, and the Hall resistance R Hall is measured between the third terminal c and the fourth terminal d of the magnetic field detector. Determine the direction and magnitude of the magnetic field using the following methods:
1)将磁场探测器置于方向和大小均未知的磁场中;1) Place the magnetic field detector in a magnetic field with unknown direction and magnitude;
2)转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向,其具体包括:2) Rotate the magnetic field detector to read the Hall resistance values of any six different magnetic field sizes at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values The relationship determines the direction of the magnetic field, which specifically includes:
若R1=R2=R3=R4=R5=R6,则确定平行于磁场探测器表面的方向为磁场方向。If R 1 =R 2 =R 3 =R 4 =R 5 =R 6 , the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
若各霍尔电阻值不相同,则记录各霍尔电阻差值的绝对值的平均值k,转动磁场探测器,k值不断改变,当k值变为0时,即R1=R2=R3=R4=R5=R6时,停止转动磁场探测器,此时平行于磁场探测器表面的方向确定为磁场方向。If the values of the Hall resistances are different, record the average value k of the absolute values of the differences of the Hall resistances, rotate the magnetic field detector, and the value of k changes continuously. When the value of k becomes 0, that is, R 1 =R 2 = When R 3 =R 4 =R 5 =R 6 , stop rotating the magnetic field detector, and at this time, the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
3)对步骤2)中方向确定的磁场,采用以下方法确定磁场大小:3) For the magnetic field whose direction is determined in step 2), use the following method to determine the magnitude of the magnetic field:
①如图2所示,将磁场探测器的表面作为xy平面,其中,平行于第一端点a与第二端点b之间所通电流I的方向为x轴,垂直于电流I的方向为y轴,将与xy平面垂直的方向作为z轴,建立空间坐标系。①As shown in Figure 2, the surface of the magnetic field detector is taken as an xy plane, where the direction parallel to the current I flowing between the first end point a and the second end point b is the x-axis, and the direction perpendicular to the current I is The y axis uses the direction perpendicular to the xy plane as the z axis to establish a space coordinate system.
②将磁场探测器放置在步骤2)中方向确定的磁场中,使x轴平行于磁场方向,将磁场探测器绕z轴旋转360°,测量并记录磁场探测器绕z轴旋转过程中的霍尔电阻值;根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制一条电阻-角度曲线。② Place the magnetic field detector in the magnetic field whose direction is determined in step 2), make the x-axis parallel to the direction of the magnetic field, rotate the magnetic field detector 360° around the z-axis, measure and record the Huo during the rotation of the magnetic field detector around the z-axis Hall resistance value; draw a resistance-angle curve according to the rotation angle of the magnetic field detector around the z-axis and the measured Hall resistance value.
③将磁场探测器放置在若干方向和大小已知的磁场中,采用与步骤①和步骤②相同的方法,根据磁场探测器绕z轴旋转的角度和测量得到的霍尔电阻值,绘制若干条标准电阻-角度曲线。方向和大小已知的磁场其大小范围为0.01kOe~90kOe。③ Place the magnetic field detector in a number of magnetic fields with known directions and sizes, use the same method as step ① and step ②, draw several lines according to the angle of rotation of the magnetic field detector around the z-axis and the measured Hall resistance value Standard resistance-angle curve. The magnitude range of the magnetic field with known direction and magnitude is 0.01kOe~90kOe.
④将绘制的一条电阻-角度曲线与若干条标准电阻-角度曲线进行比对,找出与绘制的电阻-角度曲线相同的标准电阻-角度曲线,这条标准电阻-角度曲线对应的磁场大小即为该待确定磁场的大小。④ Compare a drawn resistance-angle curve with several standard resistance-angle curves, and find out the standard resistance-angle curve that is the same as the drawn resistance-angle curve. The magnetic field corresponding to this standard resistance-angle curve is is the size of the magnetic field to be determined.
实施例3:制备自下至上依次PZT/CoFeB/MgO/Pt的磁场探测器Example 3: Preparation of a magnetic field detector of PZT/CoFeB/MgO/Pt from bottom to top
1)采用磁控溅射的方法,在PZT铁电基片1上依次沉积Pt底电极2、CoFeB铁磁层3、MgO非磁性层4和Pt顶电极5,得到多层膜结构。1) Using magnetron sputtering method, deposit Pt bottom electrode 2, CoFeB ferromagnetic layer 3, MgO non-magnetic layer 4 and Pt top electrode 5 sequentially on PZT ferroelectric substrate 1 to obtain a multilayer film structure.
其中,CoFeB铁磁层3为垂直磁化的铁磁层,其厚度为0.7~1.5nm,优选1nm。MgO非磁性层4的厚度为0.6~1.2nm,优选0.8nm。Wherein, the CoFeB ferromagnetic layer 3 is a perpendicularly magnetized ferromagnetic layer with a thickness of 0.7-1.5 nm, preferably 1 nm. The thickness of the MgO non-magnetic layer 4 is 0.6-1.2 nm, preferably 0.8 nm.
2)采用紫外曝光和氩离子刻蚀等工艺,将多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。2) Process the multilayer film structure into a cross-shaped structure by using ultraviolet exposure and argon ion etching. The area of the rectangle where the cross-shaped structure is located is 500×300μm 2 to 1000×600μm 2 , and the overlapping part of the center of the cross-shaped structure The area is 5×3 μm 2 to 40×30 μm 2 .
如图1所示,在磁场探测器的第一端点a和第二端点b之间通电流,在磁场探测器的第三端点c和第四端点d之间测霍尔电阻RHall。采用以下方法确定磁场方向和大小:As shown in FIG. 1 , a current is passed between the first terminal a and the second terminal b of the magnetic field detector, and the Hall resistance R Hall is measured between the third terminal c and the fourth terminal d of the magnetic field detector. Determine the direction and magnitude of the magnetic field using the following methods:
1)将磁场探测器置于方向和大小均未知的磁场中;1) Place the magnetic field detector in a magnetic field with unknown direction and magnitude;
2)转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向,其具体包括:2) Rotate the magnetic field detector to read the Hall resistance values of any six different magnetic field sizes at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values The relationship determines the direction of the magnetic field, which specifically includes:
若R1=R2=R3=R4=R5=R6,则确定平行于磁场探测器表面的方向为磁场方向。If R 1 =R 2 =R 3 =R 4 =R 5 =R 6 , the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
若各霍尔电阻值不相同,则记录各霍尔电阻差值的绝对值的平均值k,转动磁场探测器,k值不断改变,当k值变为0时,即R1=R2=R3=R4=R5=R6时,停止转动磁场探测器,此时平行于磁场探测器表面的方向确定为磁场方向。If the values of the Hall resistances are different, record the average value k of the absolute values of the differences of the Hall resistances, rotate the magnetic field detector, and the value of k changes continuously. When the value of k becomes 0, that is, R 1 =R 2 = When R 3 =R 4 =R 5 =R 6 , stop rotating the magnetic field detector, and at this time, the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
3)对步骤2)中方向确定的磁场,采用以下方法确定磁场大小:3) For the magnetic field whose direction is determined in step 2), use the following method to determine the magnitude of the magnetic field:
将带有PZT铁电基片的磁场探测器置于未知大小的磁场中,使磁场探测器的薄膜表面与磁场方向垂直,在铁电基片上施加-10V~10V变化的电压,记录第三端点c与第四端点d之间霍尔电阻发生转变时的电压值,此时的电压值对应的该垂直交换耦合体系的矫顽力即为磁场的大小。由于铁电调控CoFeB矫顽力变化范围较广,制备的PZT/CoFeB/MgO/Pt磁场探测器可以广泛应用于较大范围磁场大小的探测中。Place a magnetic field detector with a PZT ferroelectric substrate in a magnetic field of unknown magnitude, make the film surface of the magnetic field detector perpendicular to the direction of the magnetic field, apply a voltage varying from -10V to 10V on the ferroelectric substrate, and record the third endpoint The voltage value when the Hall resistance between c and the fourth terminal d changes, and the coercive force of the vertical exchange coupling system corresponding to the voltage value at this time is the magnitude of the magnetic field. Since the coercive force of CoFeB is controlled by ferroelectricity in a wide range, the prepared PZT/CoFeB/MgO/Pt magnetic field detector can be widely used in the detection of a large range of magnetic field.
实施例4:制备自下至上依次为BaTiO3/[Co/Ni]10/NiO/Pt的磁场探测器Example 4: Preparation of a magnetic field detector of BaTiO 3 /[Co/Ni] 10 /NiO/Pt from bottom to top
1)采用电子束蒸镀方法,在BaTiO3铁电基片1上依次沉积Pt底电极2、[Co/Ni]10铁磁层3、NiO非磁性层4和Pt顶电极5,得到多层膜结构。1) Using the electron beam evaporation method, the Pt bottom electrode 2, [Co/Ni] 10 ferromagnetic layer 3, NiO nonmagnetic layer 4 and Pt top electrode 5 are sequentially deposited on the BaTiO 3 ferroelectric substrate 1 to obtain a multilayer Membrane structure.
其中,[Co/Ni]10铁磁层3为垂直磁化的铁磁层,Co层的厚度为0.3nm,Ni层的厚度为0.8nm。NiO非磁性层4的厚度为0.8~1.5nm。Wherein, the [Co/Ni] 10 ferromagnetic layer 3 is a ferromagnetic layer with perpendicular magnetization, the thickness of the Co layer is 0.3 nm, and the thickness of the Ni layer is 0.8 nm. The thickness of the NiO nonmagnetic layer 4 is 0.8 to 1.5 nm.
2)采用紫外曝光和氩离子刻蚀等工艺,将多层膜结构加工成一十字形结构,十字形结构所在矩形的面积为500×300μm2~1000×600μm2,十字形结构中心的交叉重合部分的面积为5×3μm2~40×30μm2。2) Process the multilayer film structure into a cross-shaped structure by using ultraviolet exposure and argon ion etching. The area of the rectangle where the cross-shaped structure is located is 500×300μm 2 to 1000×600μm 2 , and the overlapping part of the center of the cross-shaped structure The area is 5×3 μm 2 to 40×30 μm 2 .
如图1所示,在磁场探测器的第一端点a和第二端点b之间通电流,在磁场探测器的第三端点c和第四端点d之间测霍尔电阻RHall。采用以下方法确定磁场方向和大小:As shown in FIG. 1 , a current is passed between the first terminal a and the second terminal b of the magnetic field detector, and the Hall resistance R Hall is measured between the third terminal c and the fourth terminal d of the magnetic field detector. Determine the direction and magnitude of the magnetic field using the following methods:
1)将磁场探测器置于方向和大小均未知的磁场中;1) Place the magnetic field detector in a magnetic field with unknown direction and magnitude;
2)转动磁场探测器,在某一角度下分别读取任意六个不同磁场大小下的霍尔电阻值。其中,三个正磁场下的霍尔电阻值R1、R2和R3;三个负磁场下的霍尔电阻值R4、R5和R6,并根据各霍尔电阻值之间的关系确定磁场方向,其具体包括:2) Rotate the magnetic field detector to read the Hall resistance values of any six different magnetic field sizes at a certain angle. Among them, the Hall resistance values R 1 , R 2 and R 3 under three positive magnetic fields; the Hall resistance values R 4 , R 5 and R 6 under three negative magnetic fields, and according to the relationship between the Hall resistance values The relationship determines the direction of the magnetic field, which specifically includes:
若R1=R2=R3=R4=R5=R6,则确定平行于磁场探测器表面的方向为磁场方向。If R 1 =R 2 =R 3 =R 4 =R 5 =R 6 , the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
若各霍尔电阻值不相同,则记录各霍尔电阻差值的绝对值的平均值k,转动磁场探测器,k值不断改变,当k值变为0时,即R1=R2=R3=R4=R5=R6时,停止转动磁场探测器,此时平行于磁场探测器表面的方向确定为磁场方向。If the values of the Hall resistances are different, record the average value k of the absolute values of the differences of the Hall resistances, rotate the magnetic field detector, and the value of k changes continuously. When the value of k becomes 0, that is, R 1 =R 2 = When R 3 =R 4 =R 5 =R 6 , stop rotating the magnetic field detector, and at this time, the direction parallel to the surface of the magnetic field detector is determined as the magnetic field direction.
3)对步骤2)中方向确定的磁场,采用以下方法确定其磁场大小:3) For the magnetic field whose direction is determined in step 2), use the following method to determine its magnetic field size:
将带有BaTiO3铁电基片的探测器置于未知大小的磁场中,使磁场探测器的薄膜表面与磁场方向垂直,在铁电基片上施加-10V~10V变化的电压,记录第三端点c与第四端点d之间霍尔电阻发生转变时的电压值,此时的电压值对应的该垂直交换耦合体系的矫顽力即为磁场的大小。由于铁电调控[Co/Ni]10矫顽力变化范围较广,制备的BaTiO3/[Co/Ni]10/NiO/Pt磁场探测器可以广泛应用于较大范围磁场大小的探测中。Place the detector with the BaTiO 3 ferroelectric substrate in a magnetic field of unknown magnitude, make the film surface of the magnetic field detector perpendicular to the direction of the magnetic field, apply a voltage varying from -10V to 10V on the ferroelectric substrate, and record the third endpoint The voltage value when the Hall resistance between c and the fourth terminal d changes, and the coercive force of the vertical exchange coupling system corresponding to the voltage value at this time is the magnitude of the magnetic field. Since the coercive force of [Co/Ni] 10 varies widely by ferroelectric control, the prepared BaTiO 3 /[Co/Ni] 10 /NiO/Pt magnetic field detector can be widely used in the detection of a large range of magnetic field.
上述各实施例仅用于说明本发明,其中各部件的结构、连接方式和方法步骤等都是可以有所变化的,凡是在本发明技术方案的基础上进行的等同变换和改进,均不应排除在本发明的保护范围之外。The above-mentioned embodiments are only used to illustrate the present invention, wherein the structure, connection mode and method steps of each component can be changed to some extent, and any equivalent transformation and improvement carried out on the basis of the technical solution of the present invention should not be used. excluded from the protection scope of the present invention.
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