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CN103864467A - Ceramic surface metalizing method - Google Patents

Ceramic surface metalizing method Download PDF

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Publication number
CN103864467A
CN103864467A CN201410121881.2A CN201410121881A CN103864467A CN 103864467 A CN103864467 A CN 103864467A CN 201410121881 A CN201410121881 A CN 201410121881A CN 103864467 A CN103864467 A CN 103864467A
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solder
ceramic
ceramic substrate
titanium
titanium alloy
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CN103864467B (en
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宋晓国
付伟
赵一璇
王美荣
冯吉才
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Ningbo Zhongyuan New Material Technology Co ltd
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Harbin Institute of Technology Weihai
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Abstract

本发明公开了一种陶瓷表面金属化方法,其特征在于步骤如下:步骤一、设计并制造钛合金坩埚,步骤二、将非活性钎料置于钛合金坩埚中,在真空或惰性气氛保护条件下,以5~20℃/min的升温速率加热到700℃~1000℃,得到熔融非活性钎料,此时钛合金中的钛向非活性钎料中扩散,得到熔融的含有活性元素钛的活性钎料,步骤三、将要表面金属化的陶瓷基板端面放入装有熔融钎料的钛合金坩埚中,时间5~30min,步骤四、取出陶瓷基板,平铺冷却即在陶瓷基板端面上得到均匀的金属化层,本发明不仅使金属化工艺得到简化,降低了生产成本,而且熔融的钎料可以重复利用,提高了金属化合金的利用率,液态金属化合金相比粉状具有更佳的流动性这利于其铺展,且膜层的厚度更加均匀,操作性好,可以实现批量制造。The invention discloses a ceramic surface metallization method, which is characterized in that the steps are as follows: step 1, designing and manufacturing a titanium alloy crucible, step 2, placing inactive brazing material in the titanium alloy crucible, and protecting it in vacuum or inert atmosphere , heated to 700°C~1000°C at a heating rate of 5~20°C/min to obtain molten inactive solder. At this time, titanium in the titanium alloy diffuses into the inactive solder to obtain molten titanium containing active element. Active solder, step 3, put the end face of the ceramic substrate to be surface metallized into a titanium alloy crucible with molten solder for 5-30 minutes, step 4, take out the ceramic substrate, flatten and cool it on the end face of the ceramic substrate Uniform metallization layer, the invention not only simplifies the metallization process, reduces the production cost, but also the molten solder can be reused, which improves the utilization rate of the metallization alloy, and the liquid metallization alloy has better properties than the powder The fluidity is good for its spreading, and the thickness of the film layer is more uniform, the operability is good, and batch production can be realized.

Description

一种陶瓷表面金属化方法A kind of ceramic surface metallization method

技术领域 technical field

本发明涉及一种新材料,具体地说是一种陶瓷表面金属化方法。 The invention relates to a new material, in particular to a ceramic surface metallization method.

背景技术 Background technique

 陶瓷具有耐高温、高强度、高硬度、高耐磨性、高抗腐蚀等许多优良的性能,但是,陶瓷在常温下韧性差,难以制备复杂形状的零件。只有将金属的强韧性与陶瓷的耐磨性、耐腐蚀性、耐高温性结合起来,才能成为理想的结构材料。一般需要在陶瓷表面金属化才能与金属连接在一起。 Ceramics have many excellent properties such as high temperature resistance, high strength, high hardness, high wear resistance, and high corrosion resistance. However, ceramics have poor toughness at room temperature and it is difficult to prepare parts with complex shapes. Only by combining the strength and toughness of metal with the wear resistance, corrosion resistance and high temperature resistance of ceramics can it become an ideal structural material. Generally, it is necessary to metallize the surface of the ceramic to connect with the metal.

目前,用于陶瓷表面预金属化的方法主要有法是将钼粉与氧化锰粉混合配制成浆料,涂覆在陶瓷表面,然后在1500℃烧结,在陶瓷表面形成金属钼层。该方法属于高温连接,其必然会带来如下问题:(1)设备要求严格;(2)大尺寸和结构复杂的接头易产生大的内应力;(3)连接温度超过复Mo-Mn法、化学镀和气相沉积等。其中Mo-Mn合陶瓷中强化相或韧化相的允许温度时会严重降低其强化或韧化效果;二是化学镀法,其工艺流程为:除油→流水洗→中和→流水洗→粗化→流水洗→敏化→蒸馏水洗→活化→蒸馏水洗→还原→化学镀。该方法步骤繁琐,而且化学镀液的排放会对环境造成污染,三是气相沉积法,其分为化学气相沉积和物理气相沉积,化学气相沉积(CVD)是借助空间气相化学反应在基体表面上沉积固态薄膜的工艺技术,物理气相沉积(PVD)是在真空室中采用加热或高能束轰击的方法将待镀材料或靶材蒸发成气态并使之沉淀在工件表面形成涂层的技术。该方法对设备要求高、制造成本高。 At present, the main method for pre-metallizing the surface of ceramics is to mix molybdenum powder and manganese oxide powder to prepare a slurry, coat it on the surface of the ceramic, and then sinter at 1500°C to form a metal molybdenum layer on the surface of the ceramic. This method belongs to high-temperature connection, which will inevitably bring the following problems: (1) strict equipment requirements; (2) large-scale and complex-structured joints are prone to large internal stress; (3) the connection temperature exceeds the complex Mo-Mn method, Electroless plating and vapor deposition, etc. Among them, the allowable temperature of the strengthening phase or toughening phase in Mo-Mn alloy ceramics will seriously reduce its strengthening or toughening effect; the second is the electroless plating method, and its process flow is: degreasing → running water washing → neutralization → running water washing → Coarsening → washing with running water → sensitization → washing with distilled water → activation → washing with distilled water → reduction → electroless plating. The steps of this method are cumbersome, and the discharge of the chemical plating solution will pollute the environment. The third is the vapor deposition method, which is divided into chemical vapor deposition and physical vapor deposition. Chemical vapor deposition (CVD) is based on the space gas phase chemical reaction. The process technology of depositing solid-state thin films, physical vapor deposition (PVD) is a technology that uses heating or high-energy beam bombardment in a vacuum chamber to evaporate the material to be plated or the target into a gaseous state and deposit it on the surface of the workpiece to form a coating. This method requires high equipment and high manufacturing cost.

发明内容 Contents of the invention

本发明的目的就是为了克服现有技术的不足,提供一种工艺简单、金属化膜层均匀的陶瓷表面金属化方法。 The object of the present invention is to overcome the deficiencies of the prior art and provide a method for metallizing ceramic surfaces with simple process and uniform metallized film layer.

本发明通过如下措施达到: The present invention reaches through following measures:

一种陶瓷表面金属化方法,其特征在于步骤如下: A ceramic surface metallization method is characterized in that the steps are as follows:

步骤一、设计并制造钛合金坩埚, Step 1. Design and manufacture a titanium alloy crucible,

步骤二、将非活性钎料置于钛合金坩埚中,在真空或惰性气氛保护条件下,以5~20℃/min的升温速率加热到700℃~1000℃,得到熔融非活性钎料,此时钛合金中的钛向非活性钎料中扩散,得到熔融的含有活性元素钛的活性钎料, Step 2: Put the inactive solder in a titanium alloy crucible, and heat it to 700°C~1000°C at a heating rate of 5~20°C/min under vacuum or inert atmosphere protection conditions to obtain molten inactive solder. When the titanium in the titanium alloy diffuses into the inactive solder, the molten active solder containing the active element titanium is obtained.

步骤三、将要表面金属化的陶瓷基板端面放入装有熔融钎料的钛合金坩埚中,时间5~30min, Step 3. Put the end face of the ceramic substrate to be surface metallized into a titanium alloy crucible filled with molten solder for 5 to 30 minutes.

步骤四、取出陶瓷基板,平铺冷却即在陶瓷基板端面上得到均匀的金属化层。 Step 4: Take out the ceramic substrate, flatten and cool to obtain a uniform metallization layer on the end surface of the ceramic substrate.

本发明步骤二所述的非活性钎料是指不含有活性元素(如Ti、Ge等)的钎料。 The inactive solder mentioned in the second step of the present invention refers to a solder that does not contain active elements (such as Ti, Ge, etc.).

本发明步骤二所述的非活性钎料为锡基钎料、铝基钎料或银基钎料。 The inactive solder described in step 2 of the present invention is tin-based solder, aluminum-based solder or silver-based solder.

本发明步骤二所述的钎料加热采用电阻或高频感应的方式加热。 The brazing filler metal described in the second step of the present invention is heated by means of resistance or high-frequency induction.

本发明步骤二所述的活性钎料随温度的变化,熔融钎料内钛的质量百分比相应变化。 The mass percentage of titanium in the molten solder changes correspondingly with the change of temperature of the active solder described in the second step of the present invention.

本发明步骤三所述的陶瓷基板为氧化物陶瓷、氮化物陶瓷或碳化物陶瓷。 The ceramic substrate described in step 3 of the present invention is oxide ceramics, nitride ceramics or carbide ceramics.

本发明步骤三中要间歇性的来回晃动陶瓷基板,促进金属化层的铺展,即得到均匀的金属化层。 In the third step of the present invention, the ceramic substrate should be shaken back and forth intermittently to promote the spread of the metallized layer, that is, to obtain a uniform metallized layer.

本发明不仅使金属化工艺得到简化,降低了生产成本,而且熔融的锡基钎料可以重复利用,提高了金属化合金的利用率,液态金属化合金相比粉状具有更佳的流动性这利于其铺展,且膜层的厚度更加均匀。 The invention not only simplifies the metallization process and reduces the production cost, but also the molten tin-based solder can be reused, which improves the utilization rate of the metallization alloy, and the liquid metallization alloy has better fluidity than powder. It is conducive to its spreading, and the thickness of the film layer is more uniform.

具体实施方式 Detailed ways

下面结合实施例对本发明作进一步描述: The present invention will be further described below in conjunction with embodiment:

本发明是将非活性钎料放入钛合金坩埚中,在真空或惰性气体保护环境中,在一定温度下得到熔融的非活性钎料,在此时,钛合金中的钛向熔融的非活性钎料中过渡,便得到含有活性元素钛的活性钎料,在一定的温度条件下与陶瓷反应形成金属化层。 The present invention puts inactive solder into a titanium alloy crucible, and obtains molten inactive solder at a certain temperature in a vacuum or inert gas protection environment. Transition in the brazing filler metal, the active brazing filler metal containing the active element titanium is obtained, which reacts with the ceramic under certain temperature conditions to form a metallized layer.

实施例1:一种陶瓷表面金属化方法,步骤如下:(一)设计并制造钛合金坩埚,以陶瓷基板的尺寸为15mm×15mm×5mm制造钛合金坩埚,(二)称取一定质量的非活性钎料,配制质量份数为99%Sn,1%Ag的锡基钎料10g,锡基钎料采用粉末状,由金属单质组成,其质量纯度为99~99.95%,颗粒不大于100um,将锡基钎料置于钛合金坩埚中,并与氧化铝陶瓷一同放入真空炉中,在真空或惰性气体条件下,真空度为10-4Pa条件下,以20℃/min的加热速率加热到800℃,得到熔融的含有定量钛的活性钎料,(三)金属化:将氧化铝陶瓷放入熔融的活性钎料中并间歇性的来回晃动陶瓷基板,静置10min,然后取出,自然冷却,得到均匀、结合良好的金属化层。 Example 1: A ceramic surface metallization method, the steps are as follows: (1) Design and manufacture a titanium alloy crucible, and manufacture a titanium alloy crucible with a ceramic substrate size of 15 mm × 15 mm × 5 mm; Active solder, prepare 10g of tin-based solder with a mass fraction of 99% Sn and 1% Ag. The tin-based solder is in powder form and is composed of simple metals. Its mass purity is 99~99.95%, and the particles are not larger than 100um. Put tin-based solder in a titanium alloy crucible, and put it into a vacuum furnace together with alumina ceramics, under vacuum or inert gas conditions, with a vacuum degree of 10 -4 Pa, at a heating rate of 20°C/min Heating to 800°C to obtain molten active solder containing a certain amount of titanium. (3) Metallization: Put the alumina ceramics into the molten active solder and shake the ceramic substrate back and forth intermittently, let it stand for 10 minutes, and then take it out. Cool naturally to obtain a uniform and well-bonded metallization layer.

实施例2:一种陶瓷表面金属化方法,步骤如下:(一)设计并制造钛合金坩埚,以陶瓷基板的尺寸为15mm×15mm×5mm制造钛合金坩埚,(二)称取质量分数为99%Sn,1%Cu的10g锡基钎料,放在钛合金坩埚中,并与氧化铝陶瓷一同放入真空炉中,在真空度为10-4Pa条件下,以5℃/min的速率加热到700℃,保温1min,(三)金属化:将氧化铝陶瓷放入熔融的锡基钎料中并间歇性的来回晃动陶瓷基板,静置20min,然后取出,自然冷却,得到均匀、结合良好的金属化层。 Example 2: A ceramic surface metallization method, the steps are as follows: (1) Design and manufacture a titanium alloy crucible, and manufacture a titanium alloy crucible with a ceramic substrate size of 15 mm × 15 mm × 5 mm; (2) weigh a mass fraction of 99 10g of tin-based solder with %Sn and 1%Cu is placed in a titanium alloy crucible and placed in a vacuum furnace together with alumina ceramics. Heating to 700°C, keeping it warm for 1min, (3) Metallization: Put the alumina ceramics into the molten tin-based solder and shake the ceramic substrate back and forth intermittently, let it stand for 20min, then take it out, and cool it naturally to get uniform and bonded Good metallization layer.

实施例3:一种陶瓷表面金属化方法,步骤如下:(一)设计并制造钛合金坩埚,陶瓷基板的尺寸为15mm×15mm×5mm(二)称取为90%Sn, 10%Ag的锡基钎料10g,置于钛合金坩埚中,放入真空炉中,在氩气保护条件下,以15℃/min的加热速率加热到950℃,得到熔融的含有一定量钛的活性钎料,(三)金属化:将氧化铝陶瓷放入熔融的活性钎料中并间歇性的来回晃动陶瓷基板5min,然后取出,自然冷却,得到均匀、结合良好的金属化层。 Embodiment 3: A kind of ceramic surface metallization method, steps are as follows: (one) design and manufacture titanium alloy crucible, the size of ceramic substrate is 15mm * 15mm * 5mm (two) take the tin that is 90%Sn, 10%Ag 10g of base brazing material is placed in a titanium alloy crucible, placed in a vacuum furnace, and heated to 950°C at a heating rate of 15°C/min under argon protection to obtain a molten active brazing filler metal containing a certain amount of titanium. (3) Metallization: Put the alumina ceramics into the molten active solder and shake the ceramic substrate back and forth intermittently for 5 minutes, then take it out and cool it naturally to obtain a uniform and well-bonded metallization layer.

实施例4:一种陶瓷表面金属化方法,步骤如下:(一)设计并制造钛合金坩埚,陶瓷基板的尺寸为15mm×15mm×5mm(二)称取10g质量份数为90%Al,10%Cu的铝基钎料,铝基钎料采用粉末金属单质组成,质量纯度为99~99.95%,颗粒大小为70um,铝基钎料和氧化铝陶瓷一同放入真空炉中,在氩气保护条件下,以10℃/min的速率加热到950℃,得到熔融的含有一定量钛的活性钎料,(三)金属化:将氧化铝陶瓷放入熔融的活性钎料中并间歇性的来回晃动陶瓷基板5min,然后取出,自然冷却,得到均匀、结合良好的金属化层。 Example 4: A ceramic surface metallization method, the steps are as follows: (1) Design and manufacture a titanium alloy crucible, the size of the ceramic substrate is 15 mm × 15 mm × 5 mm (2) Weigh 10 g of 90% Al, 10 %Cu aluminum-based brazing filler metal, aluminum-based brazing filler metal is composed of powdered metal, with a mass purity of 99~99.95%, and a particle size of 70um. Under the same conditions, heat to 950°C at a rate of 10°C/min to obtain a molten active solder containing a certain amount of titanium. (3) Metallization: put alumina ceramics into the molten active solder and intermittently reciprocate Shake the ceramic substrate for 5 minutes, then take it out, and let it cool naturally to obtain a uniform and well-bonded metallization layer.

实施例5:一种陶瓷表面金属化方法,步骤如下:(一)设计并制造钛合金坩埚,陶瓷基板的尺寸为15mm×15mm×5mm(二)称取质量份数为95%Sn,5%Ag,5%Cu的锡基钎料10g,置于钛合金坩埚中,并与氧化铝陶瓷一同放入真空炉中,在氩气保护条件下,以10℃/min的速率加热到950℃,得到熔融的含有一定量钛的活性钎料,(三)金属化:将氧化铝陶瓷放入熔融的活性钎料中并间歇性的来回晃动陶瓷基板10min,然后取出,自然冷却,得到均匀、结合良好的金属化层。 Example 5: A ceramic surface metallization method, the steps are as follows: (1) Design and manufacture a titanium alloy crucible, the size of the ceramic substrate is 15mm × 15mm × 5mm (2) Weigh 95% Sn, 5% Ag, 5% Cu tin-based solder 10g, placed in a titanium alloy crucible, and placed in a vacuum furnace together with alumina ceramics, heated to 950°C at a rate of 10°C/min under the protection of argon, Obtain molten active solder containing a certain amount of titanium. (3) Metallization: Put the alumina ceramics into the molten active solder and shake the ceramic substrate back and forth intermittently for 10 minutes, then take it out and cool it naturally to obtain a uniform, bonded Good metallization layer.

Claims (6)

1.一种陶瓷表面金属化方法,其特征在于步骤如下: 1. A ceramic surface metallization method, characterized in that the steps are as follows: 步骤一、设计并制造钛合金坩埚, Step 1. Design and manufacture a titanium alloy crucible, 步骤二、将非活性钎料置于钛合金坩埚中,在真空或惰性气氛保护条件下,以5~20℃/min的升温速率加热到700℃~1000℃,得到熔融非活性钎料,此时钛合金中的钛向非活性钎料中扩散,得到熔融的含有活性元素钛的活性钎料, Step 2: Put the inactive solder in a titanium alloy crucible, and heat it to 700°C~1000°C at a heating rate of 5~20°C/min under vacuum or inert atmosphere protection conditions to obtain molten inactive solder. When the titanium in the titanium alloy diffuses into the inactive solder, the molten active solder containing the active element titanium is obtained. 步骤三、将要表面金属化的陶瓷基板端面放入装有熔融钎料的钛合金坩埚中,时间5~30min, Step 3. Put the end face of the ceramic substrate to be surface metallized into a titanium alloy crucible filled with molten solder for 5 to 30 minutes. 步骤四、取出陶瓷基板,平铺冷却即在陶瓷基板端面上得到均匀的金属化层。 Step 4: Take out the ceramic substrate, flatten and cool to obtain a uniform metallization layer on the end surface of the ceramic substrate. 2.根据权利要求1所述的一种陶瓷表面金属化方法,其特征在于步骤一中非活性钎料为锡基钎料、铝基钎料或银基钎料。 2. A method for metallizing ceramic surfaces according to claim 1, wherein the inactive solder in step 1 is tin-based solder, aluminum-based solder or silver-based solder. 3.根据权利要求1所述的一种陶瓷表面金属化方法,其特征在于步骤二中钎料加热采用电阻或高频感应的方式加热。 3. A ceramic surface metallization method according to claim 1, characterized in that the brazing filler metal is heated in the second step by means of resistance or high-frequency induction. 4.根据权利要求1所述的一种陶瓷表面金属化方法,其特征在于步骤二中活性钎料随温度的变化,熔融钎料内钛的质量百分比相应变化。 4. A kind of ceramic surface metallization method according to claim 1, is characterized in that in the step 2, active brazing filler metal changes with temperature, and the mass percent of titanium in the molten brazing filler metal changes correspondingly. 5.根据权利要求1所述的一种陶瓷表面金属化方法,其特征在于步骤三中的陶瓷基板为氧化物陶瓷、氮化物陶瓷或碳化物陶瓷。 5. A ceramic surface metallization method according to claim 1, characterized in that the ceramic substrate in step 3 is oxide ceramics, nitride ceramics or carbide ceramics. 6.根据权利要求1所述的一种陶瓷表面金属化方法,其特征在于步骤三中要间歇性的来回晃动陶瓷基板,促进金属化层的铺展。 6. A method for metallizing ceramic surfaces according to claim 1, characterized in that in step 3, the ceramic substrate is intermittently shaken back and forth to promote the spreading of the metallized layer.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105149717A (en) * 2015-10-19 2015-12-16 哈尔滨工业大学 Silicon-based ceramic surface metallization method
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Publication number Priority date Publication date Assignee Title
CN105149717A (en) * 2015-10-19 2015-12-16 哈尔滨工业大学 Silicon-based ceramic surface metallization method
CN115302033A (en) * 2022-08-22 2022-11-08 哈尔滨工业大学(威海) Low-temperature indirect brazing method for zirconia ceramic and titanium alloy
CN115302033B (en) * 2022-08-22 2023-11-21 哈尔滨工业大学(威海) Low-temperature indirect brazing method for zirconia ceramic and titanium alloy
CN116332629A (en) * 2023-03-30 2023-06-27 中国科学院上海硅酸盐研究所 An alumina ceramic-titanium alloy integrated composite structure and its preparation method
CN116332629B (en) * 2023-03-30 2024-02-06 中国科学院上海硅酸盐研究所 Alumina ceramic-titanium alloy integrated composite structure and preparation method thereof

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