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CN103762148B - A kind of microchannel plate for photomultiplier - Google Patents

A kind of microchannel plate for photomultiplier Download PDF

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Publication number
CN103762148B
CN103762148B CN201410017489.3A CN201410017489A CN103762148B CN 103762148 B CN103762148 B CN 103762148B CN 201410017489 A CN201410017489 A CN 201410017489A CN 103762148 B CN103762148 B CN 103762148B
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China
Prior art keywords
mcp
microchannel plate
panels
metal level
passage
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CN103762148A (en
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崔开源
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SHANXI CHANG CHENG MICROLIGHT EQUIPMENT CO Ltd
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SHANXI CHANG CHENG MICROLIGHT EQUIPMENT CO Ltd
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Abstract

The invention discloses a kind of microchannel plate for photomultiplier (MCP), comprise the two-dimensional array be made up of several parallel channels, two end face passages are coated with metal level as input electrode and output electrode, input electrode half has metal level, second half does not have metal level, when two panels or three microchannel plate superpositions, the passage of adjacent two panels microchannel plate take adjacent face as plane of symmetry specular, the corresponding microchannel of adjacent two panels microchannel plate (MCP) is made to become " " " type, passage aperture >=10 micron, passage length and diameter ratio are chosen as 35-40.The present invention can give full play to high-gain, the low-noise performance of MCP, and MCP is worked in the best condition, and the photomultiplier of two panels MCP superposition assembling, its gain is from 10 5be increased to 10 6, improve an order of magnitude.

Description

A kind of microchannel plate for photomultiplier
Technical field
The present invention relates to a kind of microchannel plate for photomultiplier (MCP).
Background technology
Microchannel plate (MCP) is a kind of electron tube of two-dimentional continuous electronic multiplication, by many (10 6-10 7) passage with continuous electronic multiplication capability forms by certain geometrical pattern relevant permutation.The two-dimensional array that the structure of MCP is made up of a large amount of parallel channels formula electron multiplier.It is actually one piece of vias inner walls and has good secondary performance and the fine hollow passageway fiberglass panel of certain electric conductivity.The aperture of microchannel is generally 6-12 μm (determining according to resolution requirement).Open area ratio on end face is 55%-85%, and passage length is 40--60 with the representative value of the ratio in aperture.Be coated with metal level at two end faces of MCP, form input electrode and output electrode.In the outer rim of MCP with solid edge reinforcing ring.The passage of usual MCP is not orthogonal to end face, and has the inclination angle (as Fig. 1) of 5-15 °.
Some object is electron emission under the charged particle bombardment with enough kinetic energy.Process is as follows: lotus energy electron impact, to solid skin, collides continuously with electronics in body and electronics is excited and overflows surface.This process is called secondary.The ratio of its outgoing electron number and incident electron number is defined as secondary electron yield, i.e. Secondary-emission multipbcation coefficient.
MCP utilizes the secondary electron emission characteristic of solid to realize electron multiplication.The method evaporation layer of metal of two end face vacuum coatings of MCP, as electrode, is input electrode 2 and output electrode 3 respectively.Like this, when two interpolars add voltage, in passage, set up a uniform electric field vertically.Microchannel plate secondary electron multiplicative process schematic diagram (as Fig. 2).The input electronics 5 injecting passage at a certain angle and the secondary electron that discharged by its collision channel wall 6, under the effect of this longitudinal electric field, will advance along tubular axis.Collision each time just produces once doubles.Repeat this process till multiplied electron penetrates from channel outlet.If the secondary emissionratio getting each collision is δ, when accumulative collision frequency is 10, then total electron gain of passage can reach δ 10.
MCP, in various non-image signal detection, plays more and more important effect.When MCP is applied in various non-image signal detection, different requirements is proposed to the technical indicator that MCP is applied in gleam image intensifier, its main distinction does not require image resolution ratio when being applied in non-image signal detection or requires very low, (image resolution ratio is very important index to the MCP in gleam image intensifier), and very tight to high-gain (electronics multiplication factor) the low noise index request of MCP.Therefore, how improving the signal to noise ratio of MCP in photomultiplier, reach high-gain low-noise, make the detectivity of photomultiplier higher, is problem in the urgent need to address in non-image signal detection.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of high-gain for photomultiplier, low noise microchannel plate (MCP) and using method thereof.
For solving above technical problem, the invention provides a kind of microchannel plate for photomultiplier, comprise the two-dimensional array be made up of several parallel channels, two end faces are coated with metal level as input electrode and output electrode, the half of each passage of input electrode end face has metal level, second half does not have metal level, and the degree of depth of metal level is less than 0.5 times of channel diameter, and the metal level degree of depth of output electrode end face is 0.5 times of channel diameter.Adopt electrode structure of the present invention decrease electronics be transfused to output electrode absorb probability, improve signal collection efficiency, thus improve gain and the signal to noise ratio (see figure 3) of multiplier tube.
In multiplier tube assembling, when two panels or three microchannel plate superpositions, the passage of adjacent two panels microchannel plate take adjacent face as plane of symmetry specular, the corresponding microchannel of adjacent two panels microchannel plate (MCP) is made to become " " " type (as Fig. 4), thus " coupling coefficient " that improve two panels MCP.Two panels MCP superpose gain can't meet the demands need superposition the 3rd MCP time, the channel direction of second MCP and the 3rd plate coupling still will be assembled into " " " type.
Passage length and the diameter ratio of the MCP of the present invention's design are chosen as 35-40, passage aperture >=10 micron.
Consider that photomultiplier is to the requirement of noise, due to operating voltage, more strong noise is larger, and the operating voltage of MCP can not be too high, is typically chosen in 700--800 volt more suitable, and when draw ratio is preferably 35 to 40, MCP gain is the highest.
Compared with conventional microchannel plate, (1) considers the operating characteristic of MCP, assembles mode and the coating changing MCP metal electrode, given full play to the high-gain of MCP, low-noise performance when the present invention have adjusted two panels MCP superposition by channel direction.(2) not high but require high feature to detectivity to image resolution requirement according to photomultiplier itself, in MCP structural design, adjustment pore size and draw ratio design parameter, make MCP work in the best condition.(3) without the need to increasing equipment and material, thus fund is saved.Only adjusting process parameter and parameter of structure design, creation economic benefit of just enhancing product performance.(4) according to result of the test, new process is taked.The photomultiplier of two panels MCP superposition assembling, its gain is from 10 5be increased to 10 6, improve an order of magnitude.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of MCP.
Fig. 2 is the multiplicative process of secondary electron in MCP.
Fig. 3 is input of the present invention, output electrode schematic diagram.
Fig. 4 is the present invention's adjacent two panels MCP mutual channel direction installation diagram.
In figure, 1-passage, 2-input electrode, 3-output electrode, 4-solid edge, 5-inputs electronics, 6-conduit wall.
Embodiment
In order to make those skilled in the art better understand the present invention, below in conjunction with accompanying drawing, explanation clear, complete is further done to the present invention.
Microchannel plate for photomultiplier of the present invention, comprises the two-dimensional array be made up of several parallel channels 1, and two end faces are coated with metal level as input electrode 2 and output electrode 3, and outer rim is with solid edge 4.
The method evaporation layer of metal of two end face vacuum coatings of MCP is as electrode.In traditional technique, the electrode input degree of depth of gleam image intensifier MCP is 0.5--0.7 times of channel diameter.Disperse electronic effect resolution in order to what reduce super aperture, the metal level of gleam image intensifier MCP output electrode evaporation is deep, reach more than 2 times of aperture.The a large amount of signal electron of this technique is transfused to and the electrode that exports absorbs, and MCPD gain is declined greatly.
Input electrode 2 of the present invention adopts directed hemichannel vapour deposition method, MCP only revolves round the sun not rotation in coating clamp, thus make the half of each passage of input electrode 2 end face have metal level, second half does not have metal level (as shown in Figure 3), the degree of depth of metal level is as far as possible more shallow, is preferably less than 0.5 times of channel diameter.And the metal level of output electrode 3 end face is also as far as possible shallow, be 0.5 times of passage 1 diameter.Electronics is transfused to, the probability of output electrode absorption to adopt electrode structure of the present invention and evaporation coating method to decrease, and improves signal collection efficiency, thus improves gain and the signal to noise ratio of multiplier tube.
In multiplier tube assembling, when two panels or three microchannel plate superpositions, the passage 1 of adjacent two panels microchannel plate is plane of symmetry specular with adjacent face, makes the corresponding microchannel of adjacent two panels microchannel plate (MCP) become " " " type.Fig. 4 is adjacent two panels MCP mutual channel direction assembling schematic diagram.Above the output electronic energy of a slice MCP fully receive by rear a slice MCP, more strike is on the conduit wall of second MCP, (namely the electronics hit on the electrode of second is absorbed by electrode to the electronics on the electrode of second to reduce strike, cannot Secondary-emission multipbcation be carried out), namely improve " coupling coefficient " of two panels MCP.Two panels MCP superpose gain can't meet the demands need superposition the 3rd MCP time, the channel direction of second MCP and the 3rd plate coupling still will be assembled into " " " type.
Passage 1 length of MCP and diameter ratio is selected to be chosen as 35-40.Consider that photomultiplier is to the requirement of noise, due to operating voltage, more strong noise is larger, so it is more suitable to be typically chosen in 700--800 volt, draw ratio is preferably 35 to 40.Consider that the requirement of photomultiplier to resolution is low in addition, the large aperture MCP of aperture >=10, selector channel 1 micron, like this can Simplified flowsheet, improve rate of finished products, lower MCP manufacturing cost.
The scope of protection of present invention is not limited to above embodiment; to those skilled in the art; the present invention can have various deformation and change, all in design of the present invention and any amendment, the improvement done within principle be equal to replacement and all should be included within protection scope of the present invention.

Claims (3)

1. the microchannel plate for photomultiplier, comprise the two-dimensional array be made up of several parallel channels (1), two end faces are coated with metal level as input electrode (2) and output electrode (3), it is characterized in that: the half of each vias inner walls of input electrode (2) end face has metal level, second half does not have metal level, the degree of depth of metal level is less than 0.5 times of channel diameter, and the metal level degree of depth of output electrode (3) end face is 0.5 times of passage (1) diameter.
2. the microchannel plate for photomultiplier according to claim 1, it is characterized in that: in multiplier tube assembling, when two panels or three microchannel plate superpositions, the passage (1) of adjacent two panels microchannel plate is plane of symmetry specular with adjacent face, makes the corresponding microchannel of adjacent two panels microchannel plate (MCP) become " " " type.
3. the microchannel plate for photomultiplier according to claim 1 and 2, is characterized in that: passage (1) length and diameter ratio are chosen as 35-40, passage (1) aperture >=10 micron.
CN201410017489.3A 2014-01-15 2014-01-15 A kind of microchannel plate for photomultiplier Expired - Fee Related CN103762148B (en)

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CN104465295B (en) * 2014-10-27 2018-02-27 中国电子科技集团公司第五十五研究所 A kind of AT-MCP electrode with ion barrier functionality and preparation method thereof
CN106158554B (en) * 2015-03-23 2018-01-16 北方夜视技术股份有限公司 A kind of preparation method of V-type passage microchannel plate
JP6433398B2 (en) * 2015-09-25 2018-12-05 ウシオ電機株式会社 Optical measuring instrument

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CN1967770A (en) * 2005-11-17 2007-05-23 中国科学院西安光学精密机械研究所 photoelectron multiplier

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JP2003004640A (en) * 2001-03-30 2003-01-08 Fuji Photo Film Co Ltd Method and system for generating data for biochemical analysis

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CN1967770A (en) * 2005-11-17 2007-05-23 中国科学院西安光学精密机械研究所 photoelectron multiplier

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