CN103699268A - Environmentally friendly dry etching method for touch screens - Google Patents
Environmentally friendly dry etching method for touch screens Download PDFInfo
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- CN103699268A CN103699268A CN201310737001.XA CN201310737001A CN103699268A CN 103699268 A CN103699268 A CN 103699268A CN 201310737001 A CN201310737001 A CN 201310737001A CN 103699268 A CN103699268 A CN 103699268A
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- Prior art keywords
- etching
- screen
- touch
- environment
- oxide layer
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- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000001312 dry etching Methods 0.000 title claims abstract description 7
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 11
- 238000001035 drying Methods 0.000 claims abstract description 8
- 238000004140 cleaning Methods 0.000 claims abstract description 7
- 238000005530 etching Methods 0.000 claims description 39
- 239000011521 glass Substances 0.000 claims description 14
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims description 4
- 235000013312 flour Nutrition 0.000 claims description 3
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 3
- 239000011118 polyvinyl acetate Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000002699 waste material Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 5
- 239000003292 glue Substances 0.000 description 5
- 238000001039 wet etching Methods 0.000 description 5
- 238000010422 painting Methods 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
The invention provides an environment-friendly dry etching method for a touch screen, which comprises the following steps: (1) cleaning; (2) coating; (3) drying; (4) and (5) demolding and cleaning. The invention reduces the discharge amount of the acid waste liquid, and achieves the purpose of reducing the pollution to the environment; the use of acid-resistant ink materials is reduced, and the production cost is saved; the operation procedures are reduced, and meanwhile, the product yield and the production efficiency are also improved; the process is simple, and is more suitable for production operation requirements and industry development trends.
Description
Technical field
The present invention relates to four-wire ohm and shield etched technical field, be specially a kind of environment-friendly type dry method engraving method for touch-screen.
Background technology
Traditional four-wire ohm screen way adopts harsh, is again wet etching, and its idiographic flow is as follows:
(1) select to be coated with glass or the PE film of tin indium oxide layer material, the material choosing is cleaned up and dried;
(2) on the material drying in step (1), be coated with acid-proof ink, form one deck acid-proof ink layer, and expose, development treatment;
(3) material of processing through step (2) is steeped to acid etching, at material surface, depict the figures such as various decorative patterns, pattern, scale, grid;
(4) the complete material of step (3) bubble acid etching is cleaned through the demoulding, obtain the four-wire ohm screen that wet etching is made.
Surface has glass or the PET film of indium-tin oxide coatings, and the concrete job operation of its wet etching is as follows: with acid, the local surfaces of glassware or PE material is corroded, on its surface, depict various decorative patterns, pattern, scale, grid etc.Wet etch process is to coat protection glue or paraffin at etched material surface.Then put into the etching solution that nitric acid, hydrochloric acid and a small amount of sulfuric acid form, material surface indium tin oxide layer and acid solution effect, the fluoride dissolution of generation is in etching solution or be deposited on glass surface.Fig. 1 is the technique of painting schematic diagram of traditional face etching half tone.
There is following shortcoming in above-mentioned wet etching: because wet etching need to be used acidic etching liquid, causes a large amount of acid waste liquids directly to discharge, greatly increased the weight of environmental pollution; Need on etching material, be coated with acid-proof ink, production cost is high; Operation is many, has not only affected the yield of production efficiency and product, nor is applicable to production operation demand and industry development trend.
Summary of the invention
Technical matters solved by the invention is to provide a kind of environment-friendly type dry method engraving method for touch-screen, to solve the problem proposing in above-mentioned background technology.
Technical matters solved by the invention realizes by the following technical solutions:
Environment-friendly type dry method engraving method for touch-screen, comprises the steps:
(1) clean: select to be coated with glass or the PE film of tin indium oxide layer material, the material choosing is cleaned up and dried;
(2) coating: the material etched surfaces coating etching paste drying in step (1), and on its surface, depict the etching contents such as various decorative patterns, pattern, scale, grid;
(3) dry: under low temperature, the material etched surfaces in step (2) is dried, the indium tin oxide layer of material surface and etching paste effect, coating position indium tin oxide layer erodes, thereby occurs etching mark;
(4) demoulding is cleaned: the complete material of etching in step (3) is carried out to demoulding cleaning, obtain the touch-screen that dry etching makes.
Preferably, the etching paste in step (2) is the potpourri of the one or more combination in water and polyvinyl acetate, polycarboxylic acid, silica flour, hydrochloric acid.
Preferably, the low temperature drying temperature in step (3) is 30～60 ℃.
The present invention has the glass of indium-tin oxide coatings or PET film to carry out surperficial dry method etching and processing by selection, with etching paste, the local surfaces of glass or PE material is corroded, and on its surface, depicts various decorative patterns, pattern, scale, grid etc.Then low-temperature bake, etching material surface oxidation indium tin layer and etching paste effect, a coating position indium tin oxide layer erodes, thus there is etching mark in refract light.
Beneficial effect of the present invention is as follows:
(1) reduce the discharge capacity of acid waste liquid, reached and reduced the pollution to environment;
(2) reduce the use of acid-proof ink material, save production cost;
(3) reduce operational sequence, also improve product yield and production efficiency simultaneously;
(4) operation is simple, is more suitable for production operation demand and industry development trend.
(5)
Accompanying drawing explanation
Fig. 1 is the technique of painting schematic diagram of traditional face etching half tone.
Fig. 2 is the technique of painting schematic diagram of the face etching half tone after the present invention optimizes.
Embodiment
In order to make of the present inventionly to realize technological means, creation characteristic, reach object and effect is easy to understand, below in conjunction with concrete diagram, further set forth the present invention.
Environment-friendly type dry method engraving method for touch-screen, comprises the steps:
(1) clean: select to be coated with glass or the PE film of tin indium oxide layer material, the material choosing is cleaned up and dried;
(2) coating: the material etched surfaces coating etching paste drying in step (1), and depict various decorative patterns, pattern, scale, grid etc. on its surface;
(3) dry: under low temperature, the material etched surfaces in step (2) is dried, the indium tin oxide layer of material surface and etching paste effect, coating position indium tin oxide layer erodes, thereby occurs etching mark; The demoulding is cleaned: the complete material of etching in step (3) is carried out to demoulding cleaning, obtain the touch-screen that dry etching makes.
Preferably, the etching paste in step (2) is the potpourri of the one or more combination in water and polyvinyl acetate, polycarboxylic acid, silica flour, hydrochloric acid.
Preferably, the low temperature drying temperature in step (3) is 30～60 ℃.
With reference to Fig. 2, Fig. 2 is the technique of painting schematic diagram of the face etching half tone after the present invention optimizes.The present invention has the glass of indium-tin oxide coatings or PET film to carry out surperficial dry method etching and processing by selection, with etching paste, the local surfaces of glass or PE material is corroded, and on its surface, depicts various decorative patterns, pattern, scale, grid etc.Then low-temperature bake, etching material surface oxidation indium tin layer and etching paste effect, a coating position indium tin oxide layer erodes, thus there is etching mark in refract light.
Embodiment 1:
The dry etching process of the film (FILM) is as follows:
After film ITO film-silk-screen etching paste, baking-cleaning, detect etch effect-silk-screen protection glue, baking-silk-screen silver road, baking-silk-screen glue, baking-after completing and glass combination.
Embodiment 2:
Glass (Glass) dry etching process is as follows:
Glass plug in basket and survey surface resistance-silk-screen etching paste, baking ,-after cleaning, detect etch effect-silk-screen spaced points, cross UV stove-silk-screen front protecting glue, baking-silk-screen silver line, baking-silk-screen insulator, baking-silk-screen black and white panel, baking-silk-screen glue, baking-completing after with embodiment 1 in film film combine.
More than show and described ultimate principle of the present invention and principal character and advantage of the present invention.The technician of the industry should understand; the present invention is not restricted to the described embodiments; that in above-described embodiment and instructions, describes just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Claimed scope of the present invention is defined by appending claims and equivalent thereof.
Claims (3)
1. for the environment-friendly type dry method engraving method of touch-screen, it is characterized in that: comprise the steps:
(1) clean: select to be coated with glass or the PE film of tin indium oxide layer material, the material choosing is cleaned up and dried;
(2) coating: the material etched surfaces coating etching paste drying in step (1), and depict etching content on its surface;
(3) dry: under low temperature, the material etched surfaces in step (2) is dried, the indium tin oxide layer of material surface and etching paste effect, coating position indium tin oxide layer erodes, thereby occurs etching mark;
(4) demoulding is cleaned: the complete material of etching in step (3) is carried out to demoulding cleaning, obtain the touch-screen that dry etching makes.
2. the environment-friendly type dry method engraving method for touch-screen according to claim 1, is characterized in that: the etching paste in step (2) is the potpourri of the one or more combination in water and polyvinyl acetate, polycarboxylic acid, silica flour, hydrochloric acid.
3. the environment-friendly type dry method engraving method for touch-screen according to claim 1, is characterized in that: the low temperature drying temperature in step (3) is 30～60 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310737001.XA CN103699268A (en) | 2013-12-30 | 2013-12-30 | Environmentally friendly dry etching method for touch screens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310737001.XA CN103699268A (en) | 2013-12-30 | 2013-12-30 | Environmentally friendly dry etching method for touch screens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103699268A true CN103699268A (en) | 2014-04-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310737001.XA Pending CN103699268A (en) | 2013-12-30 | 2013-12-30 | Environmentally friendly dry etching method for touch screens |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103699268A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104331207A (en) * | 2014-11-27 | 2015-02-04 | 中环高科（天津）股份有限公司 | Method for manufacturing integrated touch capacitive screen by using graphene materials |
| CN104331209A (en) * | 2014-11-27 | 2015-02-04 | 中环高科（天津）股份有限公司 | Method for manufacturing integrated touch capacitive screen by using conductive high molecular materials |
| CN105278718A (en) * | 2014-07-25 | 2016-01-27 | 深圳市智化电科技有限公司 | Etching process adopting peelable etching printing ink |
| CN113488385A (en) * | 2021-05-21 | 2021-10-08 | 高中彦 | Gas-ionization type etching process for conductive film |
-
2013
- 2013-12-30 CN CN201310737001.XA patent/CN103699268A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105278718A (en) * | 2014-07-25 | 2016-01-27 | 深圳市智化电科技有限公司 | Etching process adopting peelable etching printing ink |
| CN105278718B (en) * | 2014-07-25 | 2018-08-10 | 深圳市智化电科技有限公司 | A kind of etch process using peelable etching ink |
| CN104331207A (en) * | 2014-11-27 | 2015-02-04 | 中环高科（天津）股份有限公司 | Method for manufacturing integrated touch capacitive screen by using graphene materials |
| CN104331209A (en) * | 2014-11-27 | 2015-02-04 | 中环高科（天津）股份有限公司 | Method for manufacturing integrated touch capacitive screen by using conductive high molecular materials |
| CN113488385A (en) * | 2021-05-21 | 2021-10-08 | 高中彦 | Gas-ionization type etching process for conductive film |
| CN113488385B (en) * | 2021-05-21 | 2022-10-28 | 刘军 | Gas-ionization type etching process for conductive film |
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| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140402 |
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