CN103657434B - 一种表面覆盖分子筛膜的钯基膜及其制备方法 - Google Patents
一种表面覆盖分子筛膜的钯基膜及其制备方法 Download PDFInfo
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- CN103657434B CN103657434B CN201210337649.3A CN201210337649A CN103657434B CN 103657434 B CN103657434 B CN 103657434B CN 201210337649 A CN201210337649 A CN 201210337649A CN 103657434 B CN103657434 B CN 103657434B
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- palladium
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims abstract description 267
- 239000012528 membrane Substances 0.000 title claims abstract description 146
- 229910052763 palladium Inorganic materials 0.000 title claims abstract description 135
- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- 210000002469 basement membrane Anatomy 0.000 title claims 16
- 210000004379 membrane Anatomy 0.000 title claims 10
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 86
- 239000002808 molecular sieve Substances 0.000 claims abstract description 81
- 239000001257 hydrogen Substances 0.000 claims abstract description 38
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 38
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 23
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 229910052782 aluminium Inorganic materials 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 238000009792 diffusion process Methods 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 10
- 238000007747 plating Methods 0.000 claims description 10
- 239000008367 deionised water Substances 0.000 claims description 9
- 229910021641 deionized water Inorganic materials 0.000 claims description 9
- 238000003786 synthesis reaction Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000002425 crystallisation Methods 0.000 claims description 8
- 230000008025 crystallization Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 239000011734 sodium Substances 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 239000002243 precursor Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- 239000012298 atmosphere Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 238000005275 alloying Methods 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 238000001027 hydrothermal synthesis Methods 0.000 claims description 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 claims description 3
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 2
- 238000007654 immersion Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000005342 ion exchange Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 239000004115 Sodium Silicate Substances 0.000 claims 2
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 claims 2
- 229910001388 sodium aluminate Inorganic materials 0.000 claims 2
- 235000019795 sodium metasilicate Nutrition 0.000 claims 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims 2
- 229910052911 sodium silicate Inorganic materials 0.000 claims 2
- 238000001771 vacuum deposition Methods 0.000 claims 2
- 238000009738 saturating Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 abstract description 7
- 239000000428 dust Substances 0.000 abstract description 6
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 abstract description 5
- 231100000572 poisoning Toxicity 0.000 abstract description 5
- 230000000607 poisoning effect Effects 0.000 abstract description 5
- 231100000331 toxic Toxicity 0.000 abstract description 4
- 230000002588 toxic effect Effects 0.000 abstract description 4
- 229920002521 macromolecule Polymers 0.000 abstract description 3
- 150000003384 small molecules Chemical class 0.000 abstract description 3
- 239000011148 porous material Substances 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 229910052717 sulfur Inorganic materials 0.000 description 14
- 239000011593 sulfur Substances 0.000 description 14
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 230000035699 permeability Effects 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 230000001147 anti-toxic effect Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- 231100000614 poison Toxicity 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 239000003440 toxic substance Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 238000007873 sieving Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910021536 Zeolite Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 239000010457 zeolite Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910002668 Pd-Cu Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005216 hydrothermal crystallization Methods 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009993 protective function Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021065 Pd—Fe Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- IEQUNHXCJVILJQ-UHFFFAOYSA-N aluminum palladium Chemical compound [Al].[Pd] IEQUNHXCJVILJQ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 230000002155 anti-virotic effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001495 arsenic compounds Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010960 commercial process Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229940093920 gynecological arsenic compound Drugs 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- -1 small molecule hydrogen Chemical class 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
压力(Mpa) | 透氢量(m3/h/m2) |
0.1 | 15.6 |
0.2 | 30.5 |
0.3 | 44.4 |
0.4 | 57.3 |
0.5 | 74.9 |
Claims (14)
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CN103657434A CN103657434A (zh) | 2014-03-26 |
CN103657434B true CN103657434B (zh) | 2015-08-12 |
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CN105013297B (zh) * | 2014-04-23 | 2017-12-26 | 中国科学院大连化学物理研究所 | 一种用分子筛修饰钯基复合膜的方法 |
CN105013339B (zh) * | 2014-04-23 | 2017-09-29 | 中国科学院大连化学物理研究所 | 一种金属钯膜表面制备分子筛膜的方法 |
US10668429B2 (en) | 2017-07-12 | 2020-06-02 | Industrial Technology Research Institute | Gas filtration structure and method for filtering gas |
JPWO2021230265A1 (zh) * | 2020-05-12 | 2021-11-18 | ||
CN114011372B (zh) * | 2021-11-30 | 2023-03-17 | 齐鲁工业大学 | 一种双功能微结构钯基膜反应器及其制备方法 |
Citations (1)
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CN1640527A (zh) * | 2004-01-13 | 2005-07-20 | 中南大学 | 氢分离用钯基合金/孔径梯度钛铝金属间化合物均质支撑体的过滤膜的制备方法 |
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EP1499452B1 (en) * | 2002-04-03 | 2013-12-18 | Colorado School Of Mines | Process for preparing palladium alloy composite membranes for use in hydrogen separation |
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CN1640527A (zh) * | 2004-01-13 | 2005-07-20 | 中南大学 | 氢分离用钯基合金/孔径梯度钛铝金属间化合物均质支撑体的过滤膜的制备方法 |
Non-Patent Citations (1)
Title |
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Preparation and characterization of Pd-zeolite composite membranes for hydrogen separation;F. Morna 等;《Desalination》;20020910;第147卷;第425-431页 * |
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Effective date of registration: 20191111 Address after: 215600 A 207 room A building center of Zhangjiagang Free Trade Zone, Suzhou Free Trade Zone, Jiangsu Co-patentee after: Dalian Institute of Chemical Physics, Chinese Academy of Sciences Patentee after: Zhangjiagang Institute of industrial technology, Dalian Institute of Chemical Physics, China Academy of Sciences Address before: 116023 No. 457, Zhongshan Road, Liaoning, Dalian Patentee before: Dalian Institute of Chemical Physics, Chinese Academy of Sciences |
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