CN103619083B - A kind of processing method with the heater of two temperature control function - Google Patents
A kind of processing method with the heater of two temperature control function Download PDFInfo
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- CN103619083B CN103619083B CN201310637094.9A CN201310637094A CN103619083B CN 103619083 B CN103619083 B CN 103619083B CN 201310637094 A CN201310637094 A CN 201310637094A CN 103619083 B CN103619083 B CN 103619083B
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- heater body
- water back
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- 238000003672 processing method Methods 0.000 title claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 47
- 238000007789 sealing Methods 0.000 claims abstract description 12
- 239000000498 cooling water Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 6
- 239000011148 porous material Substances 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005520 cutting process Methods 0.000 claims description 6
- 229910001094 6061 aluminium alloy Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- 238000003466 welding Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 abstract description 3
- 238000001816 cooling Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 3
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 210000002445 nipple Anatomy 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
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- Control Of Resistance Heating (AREA)
- Resistance Heating (AREA)
Abstract
Have a processing method for the heater of two temperature control function, its procedure of processing is as follows: the aluminium alloy heater main body that a. adopts; B. high performance Xite shell heating tube is adopted; C. heating tube is fit into heater body; By the cover plate welded seal of the thermal coefficient of expansion of consideration gas; D. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface; E. cool water back and be arranged on heating tube upper surface; Cold or hot gas is used to cool by cooling water back or heat respectively; F. sealing surface processed by heater, the vacuum degree of chamber when ensureing to produce.The present invention produces heat by the high-performance heater strip of the careful design of heating tube inside, and by the conduction of heat, heater body is generated heat jointly, accurately provides the various temperature needed for manufacture by temperature controller and cooling system.Semiconductor crystal wafer can be made very rapidly to improve temperature, thus enhance productivity.
Description
Technical field
The present invention relates to semiconductor technology treatment facility-heater, particularly relate to a kind of processing method with the heater of two temperature control function on wafer etching machine.
Background technology
Heater is the critical component in the production technology of semiconductor manufacturing facility, semiconductor crystal wafer manufacture in integrated circuit technique needs to reach different stable temperature by different treatment steps, only have and reach rapidly temperature required and just can enhance productivity, current manufacturing process does not have the rapid change of means or method treatment temperature, although the temperature homogeneity of the needs that semiconductor transistor elements manufactures can be reached, but reach certain high or low temperature to need to spend long time, so production efficiency is low, be badly in need of a kind of heater that can reach rapidly qualified temperature to change the status quo.
Summary of the invention
Object of the present invention is exactly to provide a kind of processing method with the heater of two temperature control function
It can overcome the above defect that prior art exists, and the object of the present invention is achieved like this,
A kind of processing method with the heater of two temperature control function
It is characterized in that: procedure of processing is as follows:
A. aluminium alloy heater main body is adopted;
B. high performance Xite shell heating tube is adopted;
C. heating tube is fit into heater body, by the cover plate welded seal of the thermal coefficient of expansion of consideration gas;
D. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface, accurate Survey control heter temperature;
E. cool water back and be arranged on heating tube upper surface; Cold or hot gas is used to cool by cooling water back or heat respectively;
F. sealing surface processed by heater, the vacuum degree of chamber when ensureing to produce;
Described step a. employing aluminium alloy heater main body is: (a) uses 6061 aluminium alloys of diameter 260mm, and cutting, is squeezed into diameter 125mm; B () cutting is swaged to design drawing size; (c) heat treatment; D () microstructure detects the uniformity.
Described step b. adopts high performance Xite shell heating tube: the outer ring of (a) heating tube adopts Xite, improves job stability and useful life that gas distributes heater; B () controls the resistance value of the inner heater strip of heating tube between 13.2 Ω-16.2 Ω, ensure the requirement to heating-up temperature in the course of work; C (), by loop test, circulate between 100 degree to 500 degree, each circulation timei is 1 hour, ensure the temperature homogeneity of heater.
Described step c heating tube is fit into heater body, the cover plate welded seal by the thermal coefficient of expansion of consideration gas: (a) heater body processes the groove placing heating tube, and trench cross section is U-shaped; B () is designed to arc transition shape in the exit of heating tube, play the guiding role to heating tube, and can realize heater body and heating tube whole process fits tightly, and improves thermal conduction effect; C () uses the double-layer cover plate welding of the coefficient of expansion considering gas, ensure the sealing of heater.
Described steps d. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface, accurate Survey control heter temperature: (a) custom-designed K type twin adapter thermocouple, with two kinds of joints; (b) one pipeline connector connect temperature indicator, convenient observation adjustment temperature, another road connects temperature control equipment, precise control of temperature.
Described step e. cools water back and is arranged on heating tube upper surface; Cold or hot gas is used to cool by cooling water back or add hot heater respectively: by the accurate quick adjustment heter temperature of control system, to realize the rapid translating of different operating temperature, enhance productivity.
Sealing surface processed by described step f. heater, the vacuum degree of chamber when ensureing to produce: polishing grinding seal surface, and the sealing ring on cavity closely cooperates, and ensures that the vacuum degree of chamber realizes fast.
the present invention produces heat by the high-performance heater strip of the careful design of heating tube inside, and by the conduction of heat, heater body is generated heat jointly, accurately provides the various temperature needed for manufacture by temperature controller and cooling system.Semiconductor crystal wafer can be made very rapidly to improve temperature, thus enhance productivity, can, in very wide temperature range, provide accurate temperature to control simultaneously, raising process control be flexible.
Accompanying drawing illustrates:
Fig. 1 is structural representation of the present invention;
Fig. 2 is the structural representation of heater body in the present invention;
Fig. 3 is Fig. 2 A-A direction cutaway view;
Fig. 4 is the structural representation of twin adapter thermocouple in the present invention;
Fig. 5 is the structural representation of heating tube in the present invention;
Fig. 6 is the structural representation cooling water back in the present invention;
Embodiment:
A kind of processing method with the heater of two temperature control function
It is characterized in that: procedure of processing is as follows:
A. aluminium alloy heater main body is adopted;
B. high performance Xite shell heating tube is adopted;
C. heating tube is fit into heater body, by the cover plate welded seal of the thermal coefficient of expansion of consideration gas;
D. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface, accurate Survey control heter temperature;
E. cool water back and be arranged on heating tube upper surface; Cold or hot gas is used to cool by cooling water back or heat respectively;
F. sealing surface processed by heater, the vacuum degree of chamber when ensureing to produce;
Described step a. employing aluminium alloy heater main body is: (a) uses 6061 aluminium alloys of diameter 260mm, and cutting, is squeezed into diameter 125mm; B () cutting is swaged to design drawing size; (c) heat treatment; D () microstructure detects the uniformity.
Described step b. adopts high performance Xite shell heating tube: the outer ring of (a) heating tube adopts Xite, improves job stability and useful life that gas distributes heater; B () controls the resistance value of the inner heater strip of heating tube between 13.2 Ω-16.2 Ω, ensure the requirement to heating-up temperature in the course of work; C (), by loop test, circulate between 100 degree to 500 degree, each circulation timei is 1 hour, ensure the temperature homogeneity of heater.
Described step c heating tube is fit into heater body, the cover plate welded seal by the thermal coefficient of expansion of consideration gas: (a) heater body processes the groove placing heating tube, and trench cross section is U-shaped; B () is designed to arc transition shape in the exit of heating tube, play the guiding role to heating tube, and can realize heater body and heating tube whole process fits tightly, and improves thermal conduction effect; C () uses the double-layer cover plate welding of the coefficient of expansion considering gas, ensure the sealing of heater.
Described steps d. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface, accurate Survey control heter temperature: (a) custom-designed K type twin adapter thermocouple, with two kinds of joints; (b) one pipeline connector connect temperature indicator, convenient observation adjustment temperature, another road connects temperature control equipment, precise control of temperature.
Described step e. cools water back and is arranged on heating tube upper surface; Cold or hot gas is used to cool by cooling water back or add hot heater respectively: by the accurate quick adjustment heter temperature of control system, to realize the rapid translating of different operating temperature, enhance productivity.
Sealing surface processed by described step f. heater, the vacuum degree of chamber when ensureing to produce: polishing grinding seal surface, and the sealing ring on cavity closely cooperates, and ensures that the vacuum degree of chamber realizes fast.
During concrete enforcement, as shown in Figure 1, the heater of the two temperature control function of the present invention comprises: heater body 1, twin adapter thermocouple 2, heating tube 3, cooling water back 4.
As shown in Figure 2 and Figure 3, the structure of heater body comprises: for place heating tube U-shaped groove 1-1, load wafer boss 1-2 and for assembling time location and the hole 1-3 that fixes.
As shown in Figure 4, the structure of twin adapter thermocouple comprises: thermocouple 2-1, protection tube 2-2 and two kind of data connector 2-3; By thermocouple 2-1, insert heater body and be provided with in the hole of the plane central of U-shaped groove 1-1.
As shown in Figure 5, the structure of heating tube comprises: the outer 3-1 and the NI-G heater strip 3-2 of resistance value between 13.2 Ω-16.2 Ω of heating tube of Xite;
As shown in Figure 6, the structure cooling water back comprises: cooling water back 4-1 and seal nipple 4-2.
At grade, placed by heating tube 3 in the U-shaped groove 1-1 in heater body 1, cooling water back 4 is placed on heating tube 3 upper surface, thermocouple 2-1, inserts in the hole of heater body 1 plane central; Covered by cover plate, seal with heater body, above cover plate, be provided with locking device.
Claims (2)
1. there is a processing method for the heater of two temperature control function,
It is characterized in that: procedure of processing is as follows:
A. adopt aluminium alloy heater main body, use 6061 aluminium alloys of diameter 260mm, cutting, is squeezed into diameter 125mm, and cutting is swaged to design drawing size, heat treatment, and microstructure detects the uniformity;
B. adopt Xite shell heating tube, control the resistance value of the inner heater strip of heating tube between 13.2 Ω-16.2 Ω, by loop test, circulate between 100 degree to 500 degree, each circulation timei is 1 hour, ensures the homogeneous temperature of heater;
C. heating tube is fit into heater body; By the cover plate welded seal of the thermal coefficient of expansion of consideration gas;
D. adopt double nip thermocouple, insert in the medium pore of heater body band U-shaped grooved surface, control heater temperature;
E. cool water back and be arranged on heating tube upper surface, use cold or hot gas cool by cooling water back or add hot heater respectively, by the accurate quick adjustment heter temperature of control system, realize the rapid translating of different operating temperature;
F. sealing surface processed by heater, the vacuum degree of chamber when ensureing to produce, polishing grinding seal surface, and the sealing ring on cavity closely cooperates, and ensures that the vacuum degree of chamber realizes fast.
2. a kind of processing method with the heater of two temperature control function according to claim 1, it is characterized in that: described step c heating tube is fit into heater body, cover plate welded seal by the thermal coefficient of expansion of consideration gas: (a) is designed to arc transition shape in the exit of heating tube, heating tube is play the guiding role, guarantees that heater body and heating tube whole process fit tightly; B () uses the double-layer cover plate welding of the coefficient of expansion considering gas, ensure the sealing of heater.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310637094.9A CN103619083B (en) | 2013-12-03 | 2013-12-03 | A kind of processing method with the heater of two temperature control function |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310637094.9A CN103619083B (en) | 2013-12-03 | 2013-12-03 | A kind of processing method with the heater of two temperature control function |
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| Publication Number | Publication Date |
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| CN103619083A CN103619083A (en) | 2014-03-05 |
| CN103619083B true CN103619083B (en) | 2016-01-20 |
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| CN201310637094.9A Active CN103619083B (en) | 2013-12-03 | 2013-12-03 | A kind of processing method with the heater of two temperature control function |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112118643A (en) * | 2019-06-19 | 2020-12-22 | 魏旭东 | Quick-cooling heater for special environment |
| CN111161995A (en) * | 2020-03-07 | 2020-05-15 | 靖江先锋半导体科技有限公司 | Totally enclosed mica heating base for plasma etching machine |
| CN117286474B (en) * | 2022-12-28 | 2024-06-21 | 无锡至辰科技有限公司 | High-temperature metal shell wafer heater and processing method thereof |
| CN116504675A (en) * | 2023-04-25 | 2023-07-28 | 亚赛(无锡)半导体科技有限公司 | A heater for semiconductor production equipment |
| CN118218566A (en) * | 2024-05-27 | 2024-06-21 | 成都新航工业科技股份有限公司 | Casting process for aluminum alloy sensor housing casting with embedded heating wire |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101970328A (en) * | 2007-01-11 | 2011-02-09 | 奥蒂斯电梯公司 | Thermoelectric thermal management system for the energy storage system in a regenerative elevator |
| CN102122169A (en) * | 2011-03-09 | 2011-07-13 | 宁波市产品质量监督检验研究院 | Durability tester for temperature controller |
| CN203118919U (en) * | 2013-04-02 | 2013-08-07 | 金杰 | Wafer heating unit |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102495095B (en) * | 2011-11-07 | 2013-08-14 | 兰州理工大学 | Automatic control device of material cold and hot circulation performance and operating method thereof |
| CN102833895B (en) * | 2012-09-03 | 2015-09-16 | 上海泰昌健康科技股份有限公司 | A kind of high-temperature insulation ceramic coating PTC aluminium alloy heating tube and preparation method thereof |
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- 2013-12-03 CN CN201310637094.9A patent/CN103619083B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101970328A (en) * | 2007-01-11 | 2011-02-09 | 奥蒂斯电梯公司 | Thermoelectric thermal management system for the energy storage system in a regenerative elevator |
| CN102122169A (en) * | 2011-03-09 | 2011-07-13 | 宁波市产品质量监督检验研究院 | Durability tester for temperature controller |
| CN203118919U (en) * | 2013-04-02 | 2013-08-07 | 金杰 | Wafer heating unit |
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Address after: 214500 No. 195, Xingang Avenue, Jingjiang Economic Development Zone, Taizhou City, Jiangsu Province Patentee after: Jiangsu Xianfeng Precision Technology Co.,Ltd. Address before: No. 8, Deyu Road, Chengnan Development Zone, Jingjiang City, Taizhou City, Jiangsu Province, 214500 Patentee before: JINGJIANG XIANFENG SEMICONDUCTOR TECHNOLOGY CO.,LTD. |