CN103567175A - Chromium plate cleaning machine - Google Patents
Chromium plate cleaning machine Download PDFInfo
- Publication number
- CN103567175A CN103567175A CN201310528291.7A CN201310528291A CN103567175A CN 103567175 A CN103567175 A CN 103567175A CN 201310528291 A CN201310528291 A CN 201310528291A CN 103567175 A CN103567175 A CN 103567175A
- Authority
- CN
- China
- Prior art keywords
- chromium plate
- cleaning machine
- rotating turret
- chromium
- rinse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 48
- 239000011651 chromium Substances 0.000 title claims abstract description 48
- 238000004140 cleaning Methods 0.000 title claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 230000007246 mechanism Effects 0.000 claims abstract description 8
- 238000005507 spraying Methods 0.000 claims abstract description 7
- 238000001035 drying Methods 0.000 claims description 13
- 230000003137 locomotive effect Effects 0.000 claims description 6
- 238000011010 flushing procedure Methods 0.000 abstract description 7
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a chromium plate cleaning machine which comprises a flushing system and a cleaning system, wherein the flushing system comprises a rinse tank and a pure water spraying mechanism; the rinse tank is used for accommodating a chromium plate; the pure water spraying mechanism is arranged above the rinse tank and used for flushing the chromium plate; the cleaning system comprises a centrifugal device which is arranged in a spin-dry tank and used for performing water print spin-dry of the chromium plate; the centrifugal device comprises a rotating frame; the rotating frame is arranged horizontally and is driven to rotate by a high-speed motor; a front clamping seat, a rear clamping seat, a left clamping seat and a right clamping seat are arranged on the rotating frame corresponding to four sides of the chromium plate; the clamping seats position a revolution center of the chromium plate in a rotation center of the rotating frame; and clamping mechanisms used for fixing the chromium plate are also arranged on the clamping seats. The chromium plate cleaning machine integrates flushing and cleaning and is simple and compact in structure, complete in function and efficient in operation.
Description
(1) technical field:
The present invention relates to cleaning equipment, be specially a kind of chromium plate cleaning machine.
(2) background technology:
Chromium plate (MASK) is fine line diameter line-spacing (10 microns) product, manually use the cleaning course of MASK cleaning agent wiping more difficult, and it is time-consuming to require great effort.Cause product first-time qualification rate lower, main manifestations is regular short circuit.
(3) summary of the invention:
For this reason, the present invention proposes a kind of chromium plate cleaning machine to replace manual operations, solve the clean problem existing of tradition.
The technical scheme of chromium plate cleaning machine of the present invention, comprises rinse-system and cleaning systems, and difference is that described rinse-system comprises and places the rinse bath of chromium plate and be located at the pure water spraying mechanism that rinse bath top is rinsed chromium plate; Described cleaning systems comprise is located at the centrifugal device that in drying groove, chromium plate is carried out to the drying of water mark, described centrifugal device comprises rotating turret, described rotating turret is horizontally disposed with and by high-speed electric expreess locomotive driven rotary, four limits corresponding to chromium plate arrange four of front, rear, left and right deck on rotating turret, described deck is positioned the chromium plate centre of gyration center of rotation of rotating turret, is also provided with the fixedly clamping device of chromium plate on deck.
Operation principle of the present invention:
By the chromium plate after cleaning with pure water spray (or chromium plate) after cleaning with MASK cleaning agent and ultra-pure water, be placed on the rotating turret of High Rotation Speed, utilize centrifugal force that the water stain removing of chromium plate remained on surface is clean, reach the clean object that is dried chromium plate surface.
A kind of structure of described rotating turret is non-equilateral cross, and described deck is located at each termination of cross.
For obtaining enough large centrifugal force, the rotary speed of described rotating turret should be chosen between 1500 revs/min 3000 revs/min.
For making to rinse and cleaning course linking compactness, described rinse bath and drying groove arrange in adjacent position.
For ease of draining, the bottom of described rinse bath and drying groove all offers discharge outlet.
Advantage of the present invention:
Chromium plate cleaning machine of the present invention integrates rinse-system and cleaning systems, simple and compact for structure, function is complete, operation is efficient.
(4) accompanying drawing explanation:
Fig. 1 is the structural representation of one embodiment of the present invention.
Fig. 2 is the top view of Fig. 1 embodiment.
Figure number sign: 1, chromium plate; 2, rinse bath; 3, pure water spraying mechanism; 4, dry groove; 5, rotating turret; 6, deck; 7, clamping device; 8, discharge outlet; 9, frame; 10, high-speed electric expreess locomotive; 11, shaft coupling.
(5) specific embodiment:
Below in conjunction with accompanying drawing illustrated embodiment, technical scheme of the present invention is described further.
Chromium plate cleaning machine of the present invention mainly consists of rinse-system and cleaning systems, and described rinse-system and cleaning systems are adjacent to be arranged in frame 9.
Described rinse-system comprises rinse bath 2 and the pure water spraying mechanism 3 of placing chromium plate 1, described rinse bath 2 is located at frame 9 one sides, described pure water spraying mechanism 3 is located at rinse bath 2 tops chromium plate 1 is rinsed, and discharge outlet 8 is offered in rinse bath 2 bottoms, as shown in Figure 1 and Figure 2.
Described cleaning systems comprise drying groove 4 and centrifugal device, and described drying groove 4, in frame 9 opposite side settings, carries out the centrifugal device of water mark drying in drying the interior setting of groove 4 to chromium plate 1, dry groove 4 bottoms and offer discharge outlet 8, as shown in Figure 1 and Figure 2.
Described centrifugal device comprises that the rotating turret 5(of non-equilateral cross shape is called for short cross), described cross is horizontally disposed with, cross bottom arranges three phase variable frequency high-speed electric expreess locomotive 10, and the rotating shaft of cross bottom connects by the shaft coupling 11 of installing in frame 9 output shaft that high-speed electric expreess locomotive 10 makes progress; Each termination of cross is equipped with deck 6, and described deck 6 is positioned chromium plate 1 centre of gyration center of rotation of cross, is also provided with the clamping device 7 of fixing chromium plate 1 as shown in Figure 1 and Figure 2 on deck 6.
In the present invention, first carry out the flushing of chromium plate 1, four checkposts by rectangle chromium plate 1 after flushing are loaded between the deck 6 on cross, and be clamped on cross with clamping device 7, start high-speed electric expreess locomotive 10, drive cross rotates with the rotating speed of 1500 revs/min～3000 revs/min, under enough large centrifugal actions, the water mark on chromium plate 1 is got rid of with air-dry, realizes the clean and dry of chromium plate 1 surface.
Outside flushing process and the cleaning course water discharge outlet 8 eliminating machines by rinse bath 2 and drying groove 4 bottoms.
Chromium plate cleaning machine of the present invention can be made of angle lap machine transformation.
Claims (5)
1. chromium plate cleaning machine, comprises rinse-system and cleaning systems, it is characterized in that: described rinse-system comprises to be placed the rinse bath (2) of chromium plate (1) and be located at the pure water spraying mechanism (3) that rinse bath (2) top is rinsed chromium plate; Described cleaning systems comprise is located at the centrifugal device that in drying groove (4), chromium plate (1) is carried out to the drying of water mark, described centrifugal device comprises rotating turret (5), described rotating turret (5) is horizontally disposed with and drives rotation by high-speed electric expreess locomotive (10), four limits corresponding to chromium plate (1) arrange four decks in front, rear, left and right (6) on rotating turret (5), described deck (6) is positioned chromium plate (1) centre of gyration center of rotation of rotating turret (5), is also provided with the fixedly clamping device (7) of chromium plate (1) on deck (6).
2. chromium plate cleaning machine according to claim 1, is characterized in that: described rotating turret (5) is non-equilateral cross, and described deck (6) is located at each termination of cross.
3. chromium plate cleaning machine according to claim 1, is characterized in that: the rotary speed of described rotating turret (5) is 1500 revs/min～3000 revs/min.
4. according to the chromium plate cleaning machine described in any one in claim 1～3, it is characterized in that: described rinse bath (2) and drying groove (4) arrange in adjacent position.
5. according to the chromium plate cleaning machine described in any one in claim 1～3, it is characterized in that: the bottom of described rinse bath (2) and drying groove (4) all offers discharge outlet (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310528291.7A CN103567175A (en) | 2013-10-30 | 2013-10-30 | Chromium plate cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310528291.7A CN103567175A (en) | 2013-10-30 | 2013-10-30 | Chromium plate cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103567175A true CN103567175A (en) | 2014-02-12 |
Family
ID=50040380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310528291.7A Pending CN103567175A (en) | 2013-10-30 | 2013-10-30 | Chromium plate cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103567175A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111822437A (en) * | 2020-08-27 | 2020-10-27 | 梅州市尚善光电有限公司 | Washing and dewatering method for optical lens |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87103641A (en) * | 1986-05-16 | 1987-11-25 | 伊斯曼柯达公司 | Clean the method and apparatus of semiconductor wafer |
| JPH06326067A (en) * | 1993-03-18 | 1994-11-25 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JPH0921587A (en) * | 1995-07-04 | 1997-01-21 | Shibaura Eng Works Co Ltd | Spin dry treating apparatus |
| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| CN102683243A (en) * | 2011-03-04 | 2012-09-19 | 三菱瓦斯化学株式会社 | Substrate processing apparatus and substrate processing method |
| CN203678736U (en) * | 2013-10-30 | 2014-07-02 | 广西钦州天山微电子有限公司 | Cleaning machine for chromium plate |
-
2013
- 2013-10-30 CN CN201310528291.7A patent/CN103567175A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87103641A (en) * | 1986-05-16 | 1987-11-25 | 伊斯曼柯达公司 | Clean the method and apparatus of semiconductor wafer |
| JPH06326067A (en) * | 1993-03-18 | 1994-11-25 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JPH0921587A (en) * | 1995-07-04 | 1997-01-21 | Shibaura Eng Works Co Ltd | Spin dry treating apparatus |
| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| CN102683243A (en) * | 2011-03-04 | 2012-09-19 | 三菱瓦斯化学株式会社 | Substrate processing apparatus and substrate processing method |
| CN203678736U (en) * | 2013-10-30 | 2014-07-02 | 广西钦州天山微电子有限公司 | Cleaning machine for chromium plate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111822437A (en) * | 2020-08-27 | 2020-10-27 | 梅州市尚善光电有限公司 | Washing and dewatering method for optical lens |
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140212 |