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CN103510130B - Trivalent hard chromium electro-plating method - Google Patents

Trivalent hard chromium electro-plating method Download PDF

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CN103510130B
CN103510130B CN201210210952.7A CN201210210952A CN103510130B CN 103510130 B CN103510130 B CN 103510130B CN 201210210952 A CN201210210952 A CN 201210210952A CN 103510130 B CN103510130 B CN 103510130B
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electroplating
chromium
trivalent chromium
solution
coating
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CN103510130A (en
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毛祖国
李家柱
丁运虎
孙宁
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CHINA NORTH INDUSTRY NEW TECHNOLOGY PROMOTION INSTITUTE
Peking Blue Li Jiamei Chemical Science And Technology Center
WUHAN INST OF MATERIAL PROTECTION
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Peking Blue Li Jiamei Chemical Science And Technology Center
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Abstract

本发明公开了一种在钢铁上电镀三价铬硬铬镀层的电镀方法。采用DSA阳极和硫酸体系三价铬溶液,50℃左右的温度和35~65安培/平方分米的电流密度,通过电镀过程中控制电流和槽压变化的软启动工艺和维持酸度在指定的范围内(pH0.9~2.1),获得了80微米以上厚度的三价铬镀层,镀层硬度达到HV870以上,电流效率超过35%,镀覆速率最高可以达到2微米/分钟,镀层结合力通过热震试验(200℃加热,盐水急冷)。本发明提供了三价铬硬铬电镀取代严重污染环境的六价铬硬铬电镀的工艺方法,而且解决了现有三价铬电镀技术无法获得厚镀层以及镀层与基底结合力较差等问题。The invention discloses an electroplating method for electroplating a trivalent chromium hard chromium coating on steel. Using DSA anode and trivalent chromium solution in sulfuric acid system, temperature around 50°C and current density of 35-65 amperes/square decimeter, through the soft-start process of controlling the change of current and tank pressure during the electroplating process and maintaining the acidity within the specified range Inside (pH0.9~2.1), a trivalent chromium coating with a thickness of more than 80 microns is obtained, the hardness of the coating reaches above HV870, the current efficiency exceeds 35%, the highest plating rate can reach 2 microns/minute, and the bonding force of the coating can pass thermal shock Test (heating at 200°C, quenching with brine). The invention provides a process method for trivalent chromium hard chromium electroplating to replace hexavalent chromium hard chromium electroplating that seriously pollutes the environment, and solves the problems that the existing trivalent chromium electroplating technology cannot obtain a thick coating and the bonding force between the coating and the substrate is poor.

Description

三价铬硬铬电镀方法Trivalent chromium hard chrome plating method

技术领域本发明涉及三价铬硫酸盐作为主盐的电镀硬铬的工艺技术Technical field The present invention relates to the technology of electroplating hard chromium with trivalent chromium sulfate as main salt

技术背景 technical background

六价铬镀铬是电镀行业中应用最广泛的镀种之一,量大面广,钢铁、铝、塑料、铜合金和锌基合金压铸件上都要镀装饰铬,功能电镀(硬铬)的电镀工件包括液压汽缸和柱塞、曲轴、印刷板/滚筒、内燃机活塞、塑料模具、和玻璃纤维工件的制造、切削工具等,也用于修复磨损的工件,例如滚筒、模具、汽缸和曲轴的修复。六价铬镀层具有良好的硬度、耐磨性、耐腐蚀性能和装饰性,不仅用于装饰性镀层,而且大量用于功能性镀层以及工件的修复等,也可利用微裂纹铬层作为润滑镀层应用(硬铬)传统的镀铬技术一直采用六价铬(铬酸)作为主要的电镀原料,六价铬镀层,白亮、硬度高,耐磨损和防腐蚀性能好,而且工艺简单,维护方便。但是六价镀铬是最严重的,最难处理的电镀工业的污染源之一。铬是生物正常的代谢过程的必须的元素之一,缺铬将造成糖、脂肪等新陈代谢混乱,但铬含量过高,则对生物和人的身体造成严重危害。美国环境保护局(EPA)将六价铬确定为17种高度危险的毒性物质之一。铬在水中以三价和六价形式存在,其中六价铬的毒性很大,大约是三价铬的100倍,如果水中六价铬的含量超过0.1毫克/升的浓度,就会对人体产生毒性作用。六价铬对皮肤有严重的刺激性,能造成皮肤溃疡,长期摄入会引起扁平上皮癌、肉瘤和腺癌等疾病。六价铬的废水、废物不能象氰化物一样在自然界自然降解,它在生物和人体内积聚,能够造成长期性的危害,是一种毒性极强的强烈致癌物质,也是严重的腐蚀介质和重污染环境的物质。我国各地区拥有大量的六价铬电镀槽液,总量估计在千万吨以上,严重污染我国的水、土壤和大气环境,每年用于治理电镀废水的费用中60%以上是用于处理含六价铬的废水、废气和废物,六价铬电镀造成的环境污染损失,废水处理费用和人员职业病害少说也在数百亿人民币以上。Hexavalent chromium plating is one of the most widely used plating types in the electroplating industry. It has a large quantity and a wide range. Decorative chromium is plated on steel, aluminum, plastic, copper alloy and zinc-based alloy die castings. Functional electroplating (hard chrome) Plating workpieces include hydraulic cylinders and plungers, crankshafts, printing plates/rollers, internal combustion engine pistons, plastic molds, and fabrication of fiberglass workpieces, cutting tools, etc. Also used to repair worn workpieces such as rollers, molds, cylinders and crankshafts repair. Hexavalent chromium coating has good hardness, wear resistance, corrosion resistance and decorative properties. It is not only used for decorative coatings, but also widely used for functional coatings and repair of workpieces. Micro-cracked chromium coatings can also be used as lubricating coatings. Application (hard chromium) The traditional chromium plating technology has always used hexavalent chromium (chromic acid) as the main electroplating raw material. The hexavalent chromium coating is white and bright, has high hardness, good wear resistance and corrosion resistance, and the process is simple and easy to maintain. But hexavalent chromium plating is one of the most serious and difficult sources of pollution in the electroplating industry. Chromium is one of the necessary elements in the normal metabolic process of organisms. Chromium deficiency will cause metabolic disorders such as sugar and fat, but excessive chromium content will cause serious harm to organisms and human bodies. The U.S. Environmental Protection Agency (EPA) has identified hexavalent chromium as one of 17 highly hazardous toxic substances. Chromium exists in trivalent and hexavalent forms in water, and hexavalent chromium is very toxic, about 100 times that of trivalent chromium. Toxic effects. Hexavalent chromium is highly irritating to the skin and can cause skin ulcers. Long-term intake can cause diseases such as squamous cell carcinoma, sarcoma and adenocarcinoma. The wastewater and waste of hexavalent chromium cannot be degraded naturally in nature like cyanide. It accumulates in organisms and human body and can cause long-term harm. It is a highly toxic carcinogen and a serious corrosive medium and heavy Substances that pollute the environment. There are a large number of hexavalent chromium electroplating baths in various regions of our country, the total amount is estimated to be more than 10 million tons, which seriously pollutes our country's water, soil and atmospheric environment. More than 60% of the annual cost of treating electroplating wastewater is used to treat the electroplating wastewater containing Hexavalent chromium wastewater, waste gas and waste, environmental pollution losses caused by hexavalent chromium electroplating, wastewater treatment costs and occupational diseases of personnel are at least tens of billions of RMB.

为了取代严重污染的六价铬镀铬,人们进行了许多研究,包括低浓度镀铬、代铬镀层和三价铬电镀等研究,其中以三价铬电镀最为活跃和最有希望。In order to replace the heavily polluted hexavalent chromium plating, many studies have been carried out, including low-concentration chromium plating, chromium substitution coating and trivalent chromium plating, among which trivalent chromium plating is the most active and promising.

三价铬镀铬获得的镀铬层颜色白亮,硬度很高而且机械性能优良,它的分散性能和覆盖能力都远远高于六价铬,同样的电流密度情况下它的沉积速度是六价铬镀铬的两倍,电流效率也高于六价铬。不过,三价铬镀铬最主要的优点是它的毒性只有六价铬的100分之一,一般三价铬镀铬溶液中三价铬离子的含量只有六价铬镀铬槽液中六价铬离子的七分之一甚至更少,而且废水易于处理,是一种代替广泛使用但严重污染环境的六价铬镀铬的最具有前途的电镀工艺之一。但是,三价铬电镀也存在着一些问题,主要是由于它的杂质容忍性很低,例如锌、铜和镍等金属离子在三价铬镀槽中的累积浓度达到10~100ppm时,镀铬层质量就要下降,从而造成它的稳定性不好,难以投入实际生产应用。在阳极产生的六价铬离子也会严重影响镀层的质量,以至完全无法生产合格的产品。一般市场上销售的三价铬镀液,不能镀厚铬层,在槽液的稳定和维护等方面存在着比较大的问题。各方面性能能够替代六价铬电镀的三价铬电镀工艺技术还没有见到报道。为此,开发研究稳定的厚镀层(也就是硬铬镀层)的三价铬电镀技术具有重要的意义。The chromium plating layer obtained by trivalent chromium plating is white and bright, with high hardness and excellent mechanical properties. Its dispersion performance and covering ability are much higher than those of hexavalent chromium. Under the same current density, its deposition rate is faster than that of hexavalent chromium plating. Twice that of chromium, and the current efficiency is also higher than that of hexavalent chromium. However, the main advantage of trivalent chromium plating is that its toxicity is only 1/100 of that of hexavalent chromium. Generally, the content of trivalent chromium ions in trivalent chromium plating solution is only 1/100 of that of hexavalent chromium ions in hexavalent chromium plating bath. One-seventh or even less, and the waste water is easy to treat. It is one of the most promising electroplating processes to replace the hexavalent chromium plating that is widely used but seriously pollutes the environment. However, there are also some problems in trivalent chromium plating, mainly due to its low tolerance to impurities. For example, when the cumulative concentration of metal ions such as zinc, copper and nickel in the trivalent chromium plating bath reaches 10-100ppm, the chromium plating layer The quality will drop, resulting in poor stability and difficult to put into actual production and application. The hexavalent chromium ions produced at the anode will also seriously affect the quality of the coating, so that qualified products cannot be produced at all. Generally, the trivalent chromium plating solution sold on the market cannot plate a thick chromium layer, and there are relatively large problems in the stability and maintenance of the bath solution. There is no report on the trivalent chromium electroplating process technology that can replace hexavalent chromium electroplating in all aspects of performance. For this reason, it is of great significance to develop and study trivalent chromium electroplating technology with stable thick coating (that is, hard chromium coating).

发明内容 Contents of the invention

本发明提供了一种稳定的能够生产厚镀层(也就是硬铬)的三价铬电镀技术,包括溶液配制和厚铬镀层的电镀工艺控制技术。阴极电流密度超过30%,镀层硬度达到870HV,热处理后1058HV,镀层外观白亮无缺陷,中性盐雾240小时未腐蚀,300℃热震试验,无开裂。The invention provides a stable trivalent chromium electroplating technology capable of producing thick coatings (that is, hard chromium), including solution preparation and electroplating process control technology for thick chromium coatings. The cathode current density exceeds 30%, the hardness of the coating reaches 870HV, and after heat treatment is 1058HV, the appearance of the coating is white and bright without defects, and the neutral salt spray does not corrode for 240 hours. The thermal shock test at 300°C shows no cracking.

本发明提供了一种三价铬硫酸盐硬铬电镀溶液及其配制方法,主要包括三价铬主盐、络合剂、缓冲剂、催化剂成分。The invention provides a trivalent chromium sulfate hard chromium electroplating solution and a preparation method thereof, mainly comprising a trivalent chromium main salt, a complexing agent, a buffer and a catalyst component.

三价铬电镀溶液主盐是硫酸铬或硫酸铬钾,三价铬离子的含量为5~40g/L,The main salt of the trivalent chromium electroplating solution is chromium sulfate or chromium potassium sulfate, and the content of trivalent chromium ions is 5-40g/L.

络合剂为氨三乙酸、草酸、苹果酸,甘氨酸、甲酸、乙酸或其钠盐钾盐,配制镀液,至少采用其中一种络合剂。含量为1~60g/L,The complexing agent is nitrilotriacetic acid, oxalic acid, malic acid, glycine, formic acid, acetic acid or its sodium salt and potassium salt, and at least one of the complexing agents is used to prepare the plating solution. The content is 1~60g/L,

缓冲剂为硼酸、硫酸铝、邻苯二甲酸,配制镀液,至少采用其中一种缓冲剂,含量为50~180g/L,催化剂为溴化钾、氯化钾、氟化铵、氟化钾和氟化钠,配制镀液至少采用其中一种催化剂10~30g/,导电盐为硫酸钾或硫酸钠为0~80g/L。其余为去离子水。The buffering agent is boric acid, aluminum sulfate, phthalic acid, at least one of the buffering agents is used to prepare the plating solution, the content is 50-180g/L, and the catalyst is potassium bromide, potassium chloride, ammonium fluoride, potassium fluoride and sodium fluoride, at least one catalyst 10-30g/L is used to prepare the plating solution, and the conductive salt is potassium sulfate or sodium sulfate at 0-80g/L. The rest is deionized water.

所述溶液的pH值为0.6~2.1,可以用碳酸钠或碳酸钾及硫酸调整酸度,优选0.8~1.8。The pH value of the solution is 0.6-2.1, and the acidity can be adjusted with sodium carbonate or potassium carbonate and sulfuric acid, preferably 0.8-1.8.

配制方法:首先将计量三分之二的去离子水放入容器并加热到60℃以上,将主盐边搅拌边放入去离子水中,然后依次放入络合剂、催化剂以及缓冲剂,待全部溶解后,保留待用。将少于计量三分之一的去离子水放入另外的容器并加热到60℃以上,将缓冲剂边搅拌边放入这个容器的去离子水中,待全部溶解后,将第二个容器中的溶液倒入第一个容器,加热到95℃左右,保温2个小时以上,当温度自然降温到工艺温度,三价铬镀液配制完成。Preparation method: first put two-thirds of the deionized water into the container and heat it to above 60°C, put the main salt into the deionized water while stirring, then put in the complexing agent, catalyst and buffer in turn, wait for After all dissolved, keep it for later use. Put less than one-third of the measured deionized water into another container and heat it above 60°C. Put the buffer into the deionized water in this container while stirring. After it is completely dissolved, put it in the second container. Pour the solution into the first container, heat it to about 95°C, and keep it warm for more than 2 hours. When the temperature naturally cools down to the process temperature, the preparation of the trivalent chromium plating solution is completed.

电镀参数控制方法:Electroplating parameter control method:

所述溶液硬铬的电流密度范围为25~75A/dm2’电流密度优选控制在35~60A/dm2。电流密度太小,达不到铬的析出电位;太大,镀层应力大,容易起皮。The current density range of the solution hard chromium is 25-75A/dm 2 , and the current density is preferably controlled at 35-60A/dm 2 . If the current density is too small, the precipitation potential of chromium cannot be reached; if it is too large, the stress of the coating will be large and it will easily peel.

在0.8-2.1范围内,随着pH值升高,电流范围扩大,同时电镀效率较高;pH值上升,溶液活化性能不够,镀层容易出现起皮,不适合长时间电镀;控制范围:pH值控制在1.2~1.6之间较好。In the range of 0.8-2.1, as the pH value increases, the current range expands, and the plating efficiency is higher; the pH value increases, the activation performance of the solution is not enough, and the coating is prone to peeling, which is not suitable for long-term electroplating; control range: pH value It is better to control it between 1.2 and 1.6.

电镀溶液的温度控制:温度低,覆盖能力好,沉积速度快,但是温度过低,传质速度较慢,长期连续电镀高端容易烧焦起皮;温度较高时,可以采用更高的电流密度,但是镀液的覆盖能力和沉积速度下降;所述溶液的温度范围为常温~60℃,硬铬电镀的优选温度范围为45~55℃,更优选温度范围为40~50℃。Temperature control of electroplating solution: low temperature, good coverage, fast deposition speed, but too low temperature, slow mass transfer speed, long-term continuous electroplating high-end is easy to burn and peel; when the temperature is high, a higher current density can be used , but the covering ability and deposition rate of the plating solution are reduced; the temperature range of the solution is normal temperature to 60°C, and the preferred temperature range of hard chromium electroplating is 45 to 55°C, and the more preferred temperature range is 40 to 50°C.

采用所述溶液进行电镀时,必须进行除油除锈和活化的前处理。When the solution is used for electroplating, the pre-treatment of degreasing, derusting and activation must be carried out.

电镀启动方法:为了保障镀层与基底有良好的结合力,必须采用软启动方法进行电镀。本发明所述的软启动的含义是在1分钟到5分钟内,施加的电流密度从开始的0安培逐步增加到指定的电流密度。或者从最初的0伏电镀电压,在1分钟到5分钟内逐步调压到指定的电压下,进行施镀。Electroplating start method: In order to ensure a good bonding force between the coating and the substrate, a soft start method must be used for electroplating. The meaning of soft start in the present invention is that the applied current density gradually increases from the initial 0 ampere to the specified current density within 1 minute to 5 minutes. Or from the initial plating voltage of 0 volts, gradually adjust the voltage to the specified voltage within 1 minute to 5 minutes for plating.

不可以采用阴极移动和溶液强制流动:Cathode movement and solution forced flow are not allowed:

为了保障镀层与基底金属有良好的结合力,电镀过程中,电镀阴极(也就是施镀工件)不能移动,溶液不能采用循环过滤、机械搅拌等造成溶液强制流动的其他方法。In order to ensure a good bonding force between the coating and the base metal, during the electroplating process, the electroplating cathode (that is, the workpiece to be plated) cannot move, and the solution cannot use other methods such as circulating filtration and mechanical stirring that cause the solution to flow.

阳极采用铱钽涂敷钛合金阳极。The anode is titanium alloy anode coated with iridium and tantalum.

性能测试数据,阴极电流密度超过30%,镀层硬度870HV,热处理后1058HV,镀层外观白亮无缺陷,中性盐雾240小时未腐蚀,300度热震试验,无开裂。Performance test data, the cathode current density exceeds 30%, the hardness of the coating is 870HV, and after heat treatment is 1058HV, the appearance of the coating is white and bright without defects, the neutral salt spray has not corroded for 240 hours, and the 300-degree thermal shock test has no cracks.

电源可以用直流电源也可以用脉冲电源,直流电源的沉积速度更快,脉冲电源的沉积层表面更细密。The power supply can be DC power supply or pulse power supply. The deposition speed of DC power supply is faster, and the deposition layer surface of pulse power supply is finer.

实施例1溶液配制Embodiment 1 solution preparation

采用硫酸铬钾230g/L,缓冲剂120g/L,络合剂30g/L,催化剂20g/L,导电盐50g/L,按照如下方法配制溶液。Using potassium chromium sulfate 230g/L, buffering agent 120g/L, complexing agent 30g/L, catalyst 20g/L, conductive salt 50g/L, prepare the solution according to the following method.

首先将计量三分之二的去离子水放入容器并加热到60℃以上,将主盐边搅拌边放入去离子水中,然后依次放入络合剂、催化剂以及缓冲剂,待全部溶解后,保留待用;。将少于计量三分之一的去离子水放入另外的容器并加热到60℃以上,将缓冲剂边搅拌边放入这个容器的去离子水中,待全部溶解后,将第二个容器中的溶液倒入第一个容器,加热到95℃左右,保温2个小时以上,当温度自然降温到工艺温度,采用去离子水定容,三价铬镀液配制完成。First, put two-thirds of the deionized water into the container and heat it to above 60°C, put the main salt into the deionized water while stirring, then put in the complexing agent, catalyst and buffer in turn, and wait until all are dissolved , reserved for later use; . Put less than one-third of the measured deionized water into another container and heat it above 60°C. Put the buffer into the deionized water in this container while stirring. After it is completely dissolved, put it in the second container. Pour the solution into the first container, heat it to about 95°C, and keep it warm for more than 2 hours. When the temperature naturally cools down to the process temperature, use deionized water to make up the volume, and the preparation of the trivalent chromium plating solution is completed.

实施例2基材45号钢轴状零件(直径30*长200mm)Embodiment 2 Base material No. 45 steel shaft-shaped part (diameter 30*long 200mm)

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(直接启动到指定的电流密度)——二次水洗——纯水洗——卸挂具Mechanical polishing——pre-chemical degreasing for 10 minutes—hanger, installation of shields—anode electrolytic degreasing for 5 minutes—secondary water washing—activation for 1 minute—secondary water washing—pure water washing—hard chrome plating (directly start to Specified current density) - secondary washing - pure water washing - unloading

三价铬镀层起皮脱落。The trivalent chromium plating is peeling off.

实施例3基材65Mn钢轴状零件(直径30*长200mm,其中局部电镀中间50mm长)Embodiment 3 Substrate 65Mn steel shaft-shaped part (diameter 30*length 200mm, wherein the middle part of electroplating is 50mm long)

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(机械搅拌)——二次水洗——纯水洗——卸挂具Mechanical polishing——pre-chemical degreasing for 10 minutes—hanger, installation of shields—anode electrolytic degreasing for 5 minutes—secondary water washing—activation for 1 minute—secondary water washing—pure water washing—hard chrome plating (mechanical stirring) ——Secondary water washing——Pure water washing——Unloading hanger

镀层开裂。Plating cracked.

实施例4:基材65Mn钢标准试片(100*50*2mm)Embodiment 4: Base material 65Mn steel standard test piece (100*50*2mm)

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(空气搅拌)——二次水洗——纯水洗——卸挂具Mechanical polishing——pre-chemical degreasing for 10 minutes—hanger and shield installation——anodic electrolytic degreasing for 5 minutes——secondary water washing——activation for 1 minute——secondary water washing—pure water washing—hard chrome plating (air stirring) ——Secondary water washing——Pure water washing——Unloading hanger

镀层开裂起皮。The coating is cracked and peeled.

实施例5基材45号钢轴状零件(直径30*长200mm)Embodiment 5 Base material No. 45 steel shaft-shaped parts (diameter 30*long 200mm)

工艺流程:Process flow:

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(软启动,阴极保持静止,溶液无搅拌)——二次水洗——纯水洗——卸挂具——除氢处理Mechanical polishing——pre-chemical degreasing for 10 minutes—hanger, installation of shields—anode electrolytic degreasing for 5 minutes—secondary water washing—activation for 1 minute—secondary water washing—pure water washing—hard chrome plating (soft start, Cathode kept still, solution without stirring)——secondary water washing—pure water washing—unloading tool—hydrogen removal treatment

电镀硬铬条件:50℃,90A,PH=1.4,电镀20min,镀层光亮均匀,厚度达到44um,硬度达到880HV(热处理后1050HV),结合力通过热震试验(200℃加热,盐水急冷)。Hard chromium electroplating conditions: 50°C, 90A, PH=1.4, electroplating for 20min, the coating is bright and uniform, the thickness reaches 44um, the hardness reaches 880HV (1050HV after heat treatment), and the bonding force passes the thermal shock test (heating at 200°C, quenching with salt water).

实施实6:基材65Mn钢轴状零件(直径30*长200mm,其中局部电镀中间50mm长)工艺流程:Implementation 6: Substrate 65Mn steel shaft-shaped parts (diameter 30*length 200mm, of which 50mm in the middle of partial electroplating) process flow:

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物,非镀位置绝缘处理——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(软启动,阴极保持静止,溶液无搅拌)——二次水洗——纯水洗——卸挂具——除氢处理Mechanical polishing—pre-chemical degreasing for 10 minutes—hanger, installation of shields, insulation treatment for non-plating positions—anodic electrolytic degreasing for 5 minutes—secondary water washing—activation for 1 minute—secondary water washing—pure water washing—electroplating Hard chromium (soft start, the cathode remains still, the solution is not stirred) - secondary water washing - pure water washing - hanger removal - hydrogen removal treatment

电镀硬铬条件:50℃,22A,PH=1.4,电镀20min,镀层光亮均匀,厚度达到45um,硬度达到870V(热处理后1048HV),结合力通过热震试验(200℃加热,盐水急冷)。Hard chromium electroplating conditions: 50°C, 22A, PH=1.4, electroplating for 20min, the coating is bright and uniform, the thickness reaches 45um, the hardness reaches 870V (1048HV after heat treatment), and the bonding force passes the thermal shock test (heating at 200°C, quenching in salt water).

实施例7:基材65Mn钢标准试片(100*50*2mm)Embodiment 7: Base material 65Mn steel standard test piece (100*50*2mm)

工艺流程:Process flow:

机械磨光——预化学脱脂10min-上挂具,安装屏蔽物——阳极电解脱脂5min——二次水洗——活化1min——二次水洗——纯水洗——电镀硬铬(软启动,阴极保持静止,溶液无搅拌)——二次水洗——纯水洗——卸挂具——除氢处理Mechanical polishing——pre-chemical degreasing for 10 minutes—hanger, installation of shields—anode electrolytic degreasing for 5 minutes—secondary water washing—activation for 1 minute—secondary water washing—pure water washing—hard chrome plating (soft start, Cathode kept still, solution without stirring)——secondary water washing—pure water washing—unloading tool—hydrogen removal treatment

电镀硬铬条件:50℃,45A,PH=1.4,电镀20min,镀层光亮均匀,平均厚度达到40um,硬度达到890V(热处理后1030HV),结合力通过热震试验(200℃加热,盐水急冷)。Hard chromium electroplating conditions: 50°C, 45A, PH=1.4, electroplating for 20 minutes, the coating is bright and uniform, the average thickness reaches 40um, the hardness reaches 890V (1030HV after heat treatment), and the bonding force passes the thermal shock test (heating at 200°C, quenching with salt water).

Claims (5)

1.一种三价铬硬铬的电镀方法,包括如下步骤:1. a method for electroplating of trivalent chromium hard chromium, comprising the steps: a)工件前处理,必须对工件进行除油、除锈并清洗干净,稀硫酸活化;a) Pre-treatment of the workpiece, the workpiece must be degreased, derusted and cleaned, and activated with dilute sulfuric acid; b)工件装挂后放入三价铬硬铬电镀溶液;b) Put the trivalent chromium hard chromium electroplating solution after the workpiece is mounted; c)电镀启动必须采用软启动,即时间1~5min,电位由0V逐步变化为指定电位;电流密度由0A逐步变化为指定电流密度;c) The start of electroplating must adopt soft start, that is, the time is 1 to 5 minutes, the potential is gradually changed from 0V to the specified potential; the current density is gradually changed from 0A to the specified current density; d)电镀参数控制电流密度范围为25~75A/dm2d) The electroplating parameters control the current density range to 25-75A/dm 2 ; e)电镀溶液温度控制为常温~60℃;e) The temperature of the electroplating solution is controlled at normal temperature to 60°C; f)电镀过程中,电镀阴极不能移动,溶液不能采用循环过滤、机械搅拌强制溶液流动的方法;所述三价铬硬铬电镀溶液主要包括三价铬硫酸盐、络合剂、催化剂和缓冲剂,其中三价铬硫酸盐可以为硫酸铬或者硫酸铬钾,溶液中三价铬离子的浓度为23.9~40g/L;络合剂可以为氨三乙酸、草酸、苹果酸、甘氨酸、甲酸、乙酸或者其钠盐、钾盐,至少含有其中一种络合剂,含量为1~60g/L;催化剂可以为溴化钾、氟化钾、氟化铵或者氟化钠,至少含有其中一种催化剂,含量为5~50g/L;缓冲剂可以为硫酸铝、硼酸、邻苯二甲酸,至少含有其中一种缓冲剂,含量为120~150g/L;溶液pH值为1.2~2.1。f) During the electroplating process, the electroplating cathode cannot move, and the solution cannot adopt the method of circulating filtration and mechanical stirring to force the solution to flow; the trivalent chromium hard chromium electroplating solution mainly includes trivalent chromium sulfate, complexing agent, catalyst and buffering agent , wherein the trivalent chromium sulfate can be chromium sulfate or chromium potassium sulfate, and the concentration of trivalent chromium ions in the solution is 23.9-40g/L; the complexing agent can be nitrilotriacetic acid, oxalic acid, malic acid, glycine, formic acid, acetic acid Or its sodium salt, potassium salt, containing at least one of the complexing agents, the content is 1-60g/L; the catalyst can be potassium bromide, potassium fluoride, ammonium fluoride or sodium fluoride, containing at least one of the catalysts , the content is 5-50g/L; the buffering agent can be aluminum sulfate, boric acid, phthalic acid, at least one of them is contained, the content is 120-150g/L; the pH value of the solution is 1.2-2.1. 2.如权利要求1所述的三价铬硬铬的电镀方法,其特征在于,所述三价铬硬铬电镀溶液的配制方法为:首先将计量三分之二的去离子水放入容器并加热到60℃以上,将主盐边搅拌边加入去离子水中,然后依次放入络合剂、催化剂以及缓冲剂,待全部溶解后,保留待用;将少于计量三分之一的去离子水放入另外的容器并加热到60℃以上,将缓冲剂边搅拌边放入这个容器的去离子水中,待全部溶解后,将第二个容器中的溶液倒入第一个容器,加热到95℃左右保温2个小时以上,当温度自然降温到工艺温度,用去离子水定容,电镀溶液配制完成。2. the electroplating method of trivalent chromium hard chrome as claimed in claim 1, is characterized in that, the preparation method of described trivalent chromium hard chromium electroplating solution is: first put into container the deionized water of measuring 2/3rds and heated to above 60°C, add the main salt into the deionized water while stirring, then put in the complexing agent, catalyst and buffering agent in turn, and keep it for later use after all are dissolved; Put the deionized water into another container and heat it to above 60°C. Put the buffer into the deionized water in this container while stirring. After it is completely dissolved, pour the solution in the second container into the first container and heat it. Keep warm at about 95°C for more than 2 hours. When the temperature naturally cools down to the process temperature, use deionized water to make up the volume, and the electroplating solution is prepared. 3.如权利要求1所述的方法,其特征在于步骤(4)所述的电流密度是35~60A/dm23. The method according to claim 1, characterized in that the current density in step (4) is 35-60A/dm 2 . 4.如权利要求1所述的方法,其特征在于步骤(5)所述的温度控制范围为40~55℃。4. The method according to claim 1, characterized in that the temperature control range in step (5) is 40-55°C. 5.如权利要求4所述的方法,其特征在于温度控制范围为45~50℃。5. The method according to claim 4, characterized in that the temperature control range is 45-50°C.
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