CN103424057B - Micro electromechanical structure deflection angle measures vernier scale - Google Patents

Abstract

The invention discloses a vernier structure for measuring the deflection angle of a micro-electromechanical structure. The structure can measure both the clockwise deflection angle and the counterclockwise deflection angle. The micro-electromechanical structure deflection angle measuring vernier consists of a one-dimensional moving measuring vernier; a deflection pointer plate; a relative electrothermal actuator; a horizontal straight beam connecting the one-dimensional moving measuring vernier and the relative electrothermal actuator, and connecting the deflection pointer plate and The horizontal straight beam of the relative type electrothermal actuator is composed. The electrothermal actuator pushes the angle measurement pointer to deflect and simultaneously drives the vernier structure to move horizontally and linearly. According to the horizontal movement of the vernier and the design parameters, the angular deflection of the pointer can be obtained through simple mathematical calculation. The vernier scale can measure the deflection angle generated by the driving of the micro-electromechanical device, and can also measure the deflection angle generated by the residual stress when the structure is released.

Description

MEMS deflection angle measurement vernier

technical field

The invention provides a vernier structure for measuring the deflection angle of the micro-electromechanical structure. The invention belongs to the technical field of microelectromechanical system (MEMS) testing.

Background technique

The deflection angle of the deflection moving part in the MEMS device and the deflection angle in the parameter test of the MEMS material are important parameters reflecting the performance of the device and the material. On the other hand, these deflection angles are not only related to the design value, but also Affected by the processing process, these uncertain factors caused by the processing technology will make device design and performance prediction uncertain and unstable. One of the purposes of testing the actual deflection angle is to be able to measure the parameters of MEMS devices manufactured by a specific process in real time, and to monitor the stability of the process. The fundamental purpose is to feed back the parameters to the designer in order to obtain an accurate design.

There are usually two reasons for the above-mentioned deflection angles: displacement due to driving and deformation displacement due to release of the structure. The deflection angle generated by the drive is the angular deflection of the micro-electromechanical actuators under the action of the signal. A typical example is the structural deflection generated by the electrothermal execution of long and short beams. The deformation displacement caused by the release of the structure is due to the deflection caused by the release of the residual stress after the release of the structure. The typical case is the bending of the structure caused by the release of the residual tensile stress of the two-layer material. A common feature shared by the deflecting structures is that they have free ends, ie at least one end of the structure is suspended above the substrate material.

There are various methods of measuring deflection angle, most of which require special instruments. Since the actual deflection angle of the device and material parameter test structure is closely related to the process, the ideal method is to conduct online measurement, that is, to use general-purpose equipment for testing without leaving the processing environment.

The invention provides a vernier structure for measuring the deflection angle of a micro-electromechanical structure, and the structure can measure both clockwise deflection angle and counterclockwise deflection angle. The micro-electromechanical deflection angle measuring vernier consists of four parts: one-dimensional moving measuring vernier; deflection pointer plate; opposite type electrothermal actuator; horizontal straight beam connecting one-dimensional moving measuring vernier and opposite type Horizontal straight beam for deflection pointer plate and opposite type electrothermal actuator. The electrothermal actuator pushes the angle measurement pointer to deflect and simultaneously drives the vernier structure to move horizontally and linearly. According to the horizontal movement of the vernier and the design parameters, the angular deflection of the pointer can be obtained through simple mathematical calculation. The vernier scale can measure the deflection angle generated by the driving of the micro-electromechanical device, and can also measure the deflection angle generated by the residual stress when the structure is released.

Contents of the invention

The invention provides a vernier structure for measuring the deflection angle of a micro-electromechanical structure, and the structure can measure both clockwise deflection angle and counterclockwise deflection angle. The vernier scale can measure the deflection angle generated by the driving of the micro-electromechanical device, and can also measure the deflection angle generated by the residual stress when the structure is released.

In order to achieve the above object, the technical scheme adopted in the present invention is:

A micro-electromechanical structure deflection angle measuring vernier, the vernier structure consists of a one-dimensional moving measuring vernier, a deflection pointer plate, a relative electrothermal actuator, and a first level connecting the one-dimensional moving measuring vernier and the relative electrothermal actuator a straight beam, and a second horizontal straight beam connecting the deflection pointer plate and the opposing type electrothermal actuator, characterized by:

The one-dimensional mobile measuring vernier consists of left and right parts, the left half of which includes a plurality of identical "T"-shaped structures rotated 90 degrees clockwise, and the rotated "T"-shaped structure consists of a horizontal rectangle and a vertical vertical rectangles;

The horizontal rectangles of each "T"-shaped structure are vertically connected to the vertical beams, and the two long sides of the vertical rectangles of the "T"-shaped structure are the baselines for alignment. Among them, the right long side is the A baseline, and the left long side For the B baseline, all "T"-shaped structures have exactly the same size, all A baselines are on one straight line, and B baselines are on another straight line;

The right half of the one-dimensional mobile measuring vernier consists of a comb-tooth structure and a "convex" structure on the teeth. The comb-tooth structure is composed of an anchor area and several teeth vertically connected to the anchor area. A "convex" structure is designed on the side adjacent to the "T" structure on the tooth. The number of "convex" structures is equal to the number of teeth minus 1 and multiplied by 2. The "convex" structure is perpendicular to the teeth. The 4 straight lines are another set of alignment baselines, among which the leftmost one is C1 alignment baseline, and the right ones are C2, C3, and C4 alignment baselines. The distance between C1 and C2 baselines and the distance between C3 and C4 baselines are all equal to (" The number of "convex" structures × 2-1) × △, where △ is the minimum resolution unit of the cursor;

The deflection pointer plate is composed of an anchor area fixed on the substrate; a rectangular pointer plate with two pointers; a thin beam connecting the anchor area and the rectangular pointer plate, wherein the upper end of the rectangular pointer plate has two Pointers Z1 and Z2, the rotation points of the two pointers are located at the joint point O of the anchor area and the thin beam, where Z1 is parallel to the long side of the rectangular pointer plate, Z2 is rotated clockwise by α degrees relative to Z1, and on the edge of the rectangular pointer plate A number of holes are opened in the direction of the pointer;

The relative type electrothermal actuator is composed of two common horizontal motion electrothermal actuators connected up and down. The lateral motion electrothermal actuator is composed of anchor area, thin beam, wide beam, thin beam and connecting beam. The electrothermal actuator is connected by horizontal thin beams, vertical wide beams and horizontal thin beams;

The connection relationship of the various components of the micro-electromechanical deflection angle measuring vernier is as follows: there is a connecting beam on the left and right of the vertical symmetrical center of the wide beam in the relative electrothermal actuator, and the other end of the second connecting beam is connected to the rectangular pointer plate. Vertically connected, the other end of the first connecting beam is vertically connected with the straight beam in the left half of the one-dimensional mobile measuring vernier, and the vertical distance from the vertical middle line of the second connecting beam to point O is L; the whole structure is fixed on the lining All but the anchor region on the bottom are suspended above the substrate.

According to one aspect of the present invention, the teeth of the one-dimensional mobile measuring vernier are arranged at intervals with the "T"-shaped structure, wherein the anchor area of the right half is parallel to the straight beam of the left half, and the teeth of the right half are aligned with the left half. The rectangular structures corresponding to the bottom of some "T"-shaped structures are parallel.

According to one aspect of the present invention, the B base line is aligned with the C2 alignment base line of the uppermost "convex" structure, and the distance between the A base line and the B base line is 1△ larger than the distance between C2, C4 or C1, C3.

According to one aspect of the present invention, for any two adjacent "convex" structures up and down, the lower "convex" structure is shifted to the left by 2Δ than the upper "convex" structure.

Compared with the prior art, the present invention has the following beneficial effects:

The micro-electromechanical structure deflection angle measuring vernier provided by the invention is characterized in that it has a simple structure and can measure the clockwise and anticlockwise deflection of the structure to be measured. In actual testing, the most commonly used on-line testing equipment is a microscope. The one-dimensional moving vernier provided by the present invention is a linear alignment method, which can visually check the alignment position under a general-tuning microscope, and can The position is directly read off the offset. The structure provided by the present invention can be made of polysilicon, and the polysilicon in the MEMS process usually has more than two layers, which is a common material. On the other hand, the one-dimensional moving vernier provided by the present invention is not affected by process deviation. The most common situation in process processing is that the width of the processing line changes, such as over-etching leads to line thinning and under-etching causes The line becomes wider, because the structure of the present invention is the same material and the same processing process, when there is a line width error, the degree of deviation of the alignment base line in the "T" structure and the "convex" structure is the same, and are in the same direction, and their relative positions have not changed.

Description of drawings

These and other features, aspects and advantages of the invention will now be described as preferred but non-limiting embodiments of the invention will become apparent when the following detailed description is read with reference to the accompanying drawings in which:

Fig. 1 is a top view of the present invention;

Fig. 2 is a partial structural diagram of the present invention;

Fig. 3 is a one-dimensional moving cursor alignment diagram of the present invention;

Reference signs: 100—relative type electric heating actuator, 101—transverse motion electric heating actuator, 101-7 (101-9)—first (second) horizontal thin beam, 101-8—vertical wide beam, 101- 1, 101-2—anchor area, 101-3—first thin beam, 101-4—wide beam, 101-5—connecting beam, 101-6—second thin beam;

102—one-dimensional mobile measuring vernier, 102-1—horizontal rectangle, 102-2—vertical rectangle, 102-3—vertical beam, 102-4—anchor area, 102-11—tooth, 102-5～102 -10—"convex" structure;

103—deflection pointer plate, 103-1—anchor area, 103-2—connecting beam, 103-4—rectangular plate, 103-3—hole, Z1, Z2—pointer;

104—connect the one-dimensional mobile measuring vernier scale 102 and the first horizontal straight beam of 101-8 in the relative electrothermal actuator, 105—connect the deflection pointer plate 103 and the second horizontal straight beam of 101-8 in the relative electrothermal actuator .

detailed description

The following description is merely exemplary in nature and not intended to limit the disclosure, application or use. It should be understood that throughout the drawings, corresponding reference numerals indicate like or corresponding parts and features. The present invention will be further described below in conjunction with accompanying drawings 1-3.

As can be seen from accompanying drawing 1, the structure of the present invention consists of a one-dimensional mobile measuring vernier 102, a deflection pointer plate 103, a relative electrothermal actuator 100, and a level connecting the one-dimensional mobile measuring vernier 102 and the relative electrothermal actuator 100. It consists of a straight beam 104 and a horizontal straight beam 105 connecting the relative electrothermal actuator 100 and the deflection pointer plate 103 .

The one-dimensional mobile measuring vernier 102 is composed of left and right parts, wherein:

The left half of the one-dimensional mobile measuring vernier 102 includes a plurality of "T"-shaped structures with the same size and rotated 90 degrees clockwise. The "|" part (bottom) of the "T"-shaped structure is a horizontal rectangular rail 102-1 , the "one" part (top) of the "T"-shaped structure is a vertical rectangular structure 102-2, and the horizontal rectangle 102-1 of each "T"-shaped structure is connected with a vertical beam 102-3 in a vertical relationship. The vertical rectangle 102-2 corresponding to the "one" part (top) of the "T" structure has two long sides as baselines for alignment, wherein the long side on the right side is the baseline A, and the long side on the left side is B Baseline (shown in Figure 2). Because the dimensions of all "T"-shaped structures are exactly the same, the A baselines of all "T"-shaped structures are on one straight line, and the B baselines are on another straight line.

The right half of the one-dimensional movement measuring vernier 102 includes two main elements: a comb structure and a "convex" structure on the teeth. The comb structure consists of an anchor area 102-4 and several teeth 102-11 connected vertically to the anchor area. A "convex" structure (102-5-102-10) is designed on the side adjacent to the "T" structure on the teeth. The number of "convex" structures is equal to the number of teeth minus 1 and multiplied by 2. In this embodiment, the number of teeth is 4, so the number of "convex" structures is 6. The four straight lines perpendicular to the teeth on the "convex" structure are another set of alignment baselines, among which the leftmost alignment baseline is C1, and the rightmost alignment alignment baselines are C2, C3, and C4. The distance between the baselines of C1 and C2 and the distance between the baselines of C3 and C4 is equal to (the number of “convex” shapes×2-1)×△, and △ is the minimum resolution unit of the cursor. The above-mentioned baseline distance in this embodiment is 11△.

The teeth of the one-dimensional mobile measuring vernier are arranged at intervals with the "T" structure, wherein the anchor area 102-4 of the right half is parallel to the vertical beam 102-3 of the left half, and the teeth 102-11 of the right half are It is parallel to the horizontal rectangle 102-1 corresponding to the "|" part (bottom) of the "T"-shaped structure in the left half.

It can be seen from FIG. 2 that the B baseline is aligned with the C2 alignment baseline of the uppermost "convex" structure 102-5. The distance between A baseline and B baseline is 1△ larger than the distance between C2 and C4 (C1 and C3).

It can be seen from Figure 3 that for any two "convex" structures that are adjacent up and down, the lower "convex" structure is 2△ to the left than the upper "convex" structure, so the B baseline is larger than the second The C2 alignment baseline of the "convex" structure 102-6 is 2△ to the right, 4△ to the right of the C2 alignment baseline of the third "convex" structure 102-7, and 4△ to the right of the C2 alignment baseline of the fourth "convex" structure 102 -8's C2 alignment baseline is 6△ to the right, 8△ to the right of the C2 alignment baseline of the fifth "convex" structure 102-9, and 8△ to the right of the C2 alignment baseline of the sixth "convex" structure 102-10 The baseline is 10△ to the right; the baseline of A is 1△ to the right of the C4 alignment baseline of the uppermost "convex" structure 102-5, and 3△ to the right of the C4 alignment baseline of the second "convex" structure 102-6 , 5△ to the right of the C4 alignment baseline of the third "convex" structure 102-7, 7△ to the right of the C4 alignment baseline of the fourth "convex" structure 102-8, and 7△ to the right of the C4 alignment baseline of the fourth "convex" The C4 alignment baseline of the convex structure 102-9 is 9△ to the right, which is 11△ to the right of the C4 alignment baseline of the sixth "convex" structure 102-10.

As can be seen from accompanying drawing 1, the deflection pointer plate 103 is made up of three parts: the anchor region 103-1 fixed on the substrate; the rectangular pointer plate 103-4 with two pointers; the anchor region 103-1 and the Thin beam 103-2 of rectangular pointer plate 103-4. in:

There are two pointers Z1 and Z2 on the upper end of the rectangular pointer plate 103-4, and the rotating dots of the two pointers are located at the joint point O of the anchor area and the thin beam. Wherein, Z1 is parallel to the long side of the rectangular pointer plate 103-4, and Z2 is rotated by α degrees clockwise relative to Z1. A plurality of holes 103-3 are opened along the pointer direction on the rectangular pointer plate 103-4.

The relative electrothermal actuator 100 is composed of two upper and lower common transverse motion electrothermal actuators 101 which are relatively connected. It consists of a wide beam 101-4, a second thin beam 101-6, and a connecting beam 101-5 connecting 101-4 and 101-6. The two horizontally moving electrothermal actuators 101 up and down are connected by a first horizontal thin beam 101-7, a vertical wide beam 101-8 and a second horizontal thin beam 101-9.

The connection relationship of the various components of the micro-electromechanical deflection angle measuring vernier scale is as follows: there is a connecting beam 105 and 104 on the left and right of the vertical symmetrical center position of the vertical wide beam 101-8 in the relative electrothermal actuator 100 (first, Two horizontal straight beams), the other end of the left connecting beam 105 (the second horizontal straight beam) is vertically connected with the rectangular pointer plate 103, the other end of the right connecting beam 104 (the first horizontal straight beam) and the one-dimensional mobile measuring vernier scale 102 Vertical beams 102-3 are connected vertically in the left half. The vertical distance from the vertical midline of the left connecting beam 105 (the second horizontal straight beam) to point O is L.

The entire structure is suspended above the substrate except for the anchor area fixed on the substrate. There are 6 anchor areas in total, namely: the anchor area 102-4 located in the right half of the one-dimensional mobile measuring vernier 102; the anchor area located in the deflection pointer Anchor area 103-1 at the bottom left of the plate; anchor areas 101-1 and 101-2 in opposing type electrothermal actuators, two for each lateral movement electrothermal actuator.

The above is only a preferred embodiment of the present invention, it should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, some improvements and modifications can also be made, and these improvements and modifications are also possible. It should be regarded as the protection scope of the present invention.

Claims (4)

1. a micro electromechanical structure deflection angle measures vernier scale, this vernier scale structure measures vernier scale (102) by one-dimensional movement, deflection dial plate (103), relative type electrical actuator (100), connect one-dimensional movement and measure vernier scale (102) and the first horizontal straight beam (104) of relative type electrical actuator (100), and connect deflection dial plate (103) and the second horizontal straight beam (105) of relative type electrical actuator (100), it is characterized in that: described one-dimensional movement is measured vernier scale (102) and is made up of left and right two parts, its left-half comprises the T-shape structure that multiple identical and dextrorotation turn 90 degrees, postrotational T-shape structure is made up of horizontal rectangular (102-1) and perpendicular vertical rectangle (102-2),

The horizontal rectangular (102-1) of each T-shape structure is connected with vertical beam (102-3) is vertical, two long limits of the vertical rectangle (102-2) of T-shape structure are to mutatis mutandis baseline, wherein, long limit, right side is A baseline, long limit, the left side is B baseline, the size of all T-shape structures is identical, and point-blank, B baseline is on another straight line for all A baselines;

Described one-dimensional movement measures the right half part of vernier scale (102) by comb structure and " convex " type Structure composing be positioned on tooth, comb structure is made up of with the vertical some teeth (102-11) being connected to anchor district (102-4) anchor district (102-4), upper adjacent with T-shape structure while be designed with " convex " type structure (102-5 ~ 102-10) at tooth (102-11), 2 are multiplied by after the number that the number of " convex " type structure equals tooth (102-11) subtracts 1, 4 straight lines vertical with tooth in " convex " type structure are that another is organized and aims at baseline, wherein leftmost is C1 aligning baseline, be followed successively by C2 to the right, C3, C4 aims at baseline, C1, C2 baseline spacing and C3, C4 baseline spacing is equal to (" convex " type structure number × 2-1) × △, wherein △ is the minimum resolution unit of vernier,

Described deflection dial plate (103) is by being fixed on substrate Shang Mao district (103-1); There is the rectangle dial plate (103-4) of two pointers; Connect thin beam (103-2) the three part composition of anchor district (103-1) and rectangle dial plate (103-4), wherein, there are two pointer Z1 and Z2 the upper end of described rectangle dial plate (103-4), article two, the rotation round dot of pointer is positioned at the binding site O of anchor district (103-1) and thin beam (103-2), wherein Z1 is parallel with the long limit of rectangle dial plate (103-4), Z2 to turn clockwise α degree relative to Z1, and rectangle dial plate (103-4) has opened some holes (103-3) along pointer direction;

Described relative type electrical actuator (100) is formed by connecting relatively by upper and lower two common transverse movement electrical actuators (101), transverse movement electrical actuator (101) is by anchor district (101-1,101-2), the first thin beam (101-3), wide beam (101-4), the second thin beam (101-6), tie-beam (101-5) composition, upper and lower two transverse movement electrical actuators (101) are connected with the second horizontal thin beam (101-9) by the first horizontal thin beam (101-7), vertically wide beam (101-8), the annexation that described micro electronmechanical deflection angle measures each ingredient of vernier scale is as follows: in type electrical actuator (100), vertically upper left the parting on the right side in vertical symmetry center of wide beam (101-8) does not have the second horizontal straight beam (105) relatively, first horizontal straight beam (104), wherein the other end of the second horizontal straight beam (105) is connected with rectangle dial plate (103-4) is vertical, the other end and the one-dimensional movement of the first horizontal straight beam (104) are measured vertical beam (102-3) in vernier scale (102) left-half and are vertically connected, the vertical centering control separated time of the second horizontal straight beam (105) is L to the vertical range of O point, total is all suspended in substrate except being fixed on substrate Shang Mao district.

2. micro electromechanical structure deflection angle according to claim 1 measures vernier scale, it is characterized in that described one-dimensional movement measures tooth and the arrangement of T-shape spacing structure of vernier scale, wherein the anchor district (102-4) of right half part and the vertical beam (102-3) of left-half parallel, the tooth (102-11) of right half part is parallel with the rectangular configuration (102-1) corresponding to the bottom of left-half T-shape structure.

3. micro electromechanical structure deflection angle according to claim 1 measures vernier scale, it is characterized in that: B baseline aims at Base alignment: See Alignment, gap ratio C2, C4 or C1 of A baseline and B baseline, large 1 △ of C3 spacing with the C2 of " convex " type structure (102-5) topmost.

4. micro electromechanical structure deflection angle according to claim 1 measures vernier scale, it is characterized in that any two neighbouring " convex " type structures, is arranged on " convex " type structure above " convex " type structural rate below to left 2 △.