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CN103376657A - Photoresist composition and preparation method thereof, color film substrate and display device - Google Patents

Photoresist composition and preparation method thereof, color film substrate and display device Download PDF

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Publication number
CN103376657A
CN103376657A CN2013102957817A CN201310295781A CN103376657A CN 103376657 A CN103376657 A CN 103376657A CN 2013102957817 A CN2013102957817 A CN 2013102957817A CN 201310295781 A CN201310295781 A CN 201310295781A CN 103376657 A CN103376657 A CN 103376657A
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China
Prior art keywords
massfraction
microcapsules
photoresistance composition
photo
composition
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CN2013102957817A
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Chinese (zh)
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CN103376657B (en
Inventor
杨同华
吴洪江
黄常刚
袁剑峰
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Priority to CN201310295781.7A priority Critical patent/CN103376657B/en
Publication of CN103376657A publication Critical patent/CN103376657A/en
Priority to US14/381,514 priority patent/US9261779B2/en
Priority to PCT/CN2013/090023 priority patent/WO2015007062A1/en
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Publication of CN103376657B publication Critical patent/CN103376657B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The invention relates to the technical field of display, especially relates to a photoresist composition and a preparation method thereof, a color film substrate and a display device. The photoresist composition comprises 1-10wt% of microcapsules; the cystic walls of the microcapsules comprise alkali insoluble resin; and the capsule cores of the microcapsules include 10-60wt% of unsaturated resin oligomer capable of conducting light curing, 10-50wt% of photopolymerizable monomer, 10-70 wt% of a first black pigment, 0.1-10 wt% of a first light-induced polymerization initiator and 0.1-5 wt% of a coupling agent. The technical scheme provided by the invention can realize damage repair on a black matrix, and greatly improve the yield of products.

Description

Photoresistance composition and method of making the same, color membrane substrates and display device
Technical field
The present invention relates to the display technique field, particularly relate to a kind of photoresistance composition and method of making the same, a kind of color membrane substrates and a kind of display device.
Background technology
In panel display apparatus, Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, be called for short TFT-LCD) have that volume is little, low in energy consumption, manufacturing cost is relatively low and the characteristics such as radiationless, occupied leading position in current flat panel display market.
At present, the primary structure of TFT-LCD comprises box array base palte and color membrane substrates (CF) together.Wherein, color membrane substrates mainly comprises: glass substrate, black matrix (Black Matrix is called for short BM), chromatic photoresist and diaphragm.Generally speaking, black matrix is arranged between the multicolour pattern of chromatic photoresist formation with grid, striped or speckle form, the Main Function of black matrix is to improve picture contrast by the mixing that suppresses between color, also can block parasitic light, prevents that the TFT work that light leak causes between pixel is not normal.
Black matrix applies with photoresistance composition process, exposure and the black matrix of the formation of developing, existing black matrix comprises black color paste with the photoresistance composition, photo polymerization monomer, light trigger and organic solvent, wherein, black color paste is mainly used in forming black in case leak-stopping light, light trigger induces the photo polymerization monomer polymerization reaction take place to form polymer film under UV-irradiation, black matrix need to have high light shield performance, but owing to produce the impact of line making technology, such as BM preparation technology early, also need carry out the operations such as preparation of chromatic photoresist and protective seam thereafter, in addition, also has particulate (particle), the impacts such as foreign matter, the BM layer can be subject to the scratch breakage unavoidably, causes the damaged portion light leak, form white lacking, affect the TFT-LCD product quality; For avoiding this bad, existing arts demand is repaired (repair) operation after black matrix preparation is finished, shown in Fig. 1 a～Fig. 1 c, the black matrix of prior art is made schematic flow sheet, Fig. 1 a is that there was breakage in some position after the black matrix of coating was used the photoresistance composition, Fig. 1 b is for after adopting the black matrix of Ear Mucosa Treated by He Ne Laser Irradiation with the photoresistance composition, the white of black matrix damaged portion position formation rule shape lacked, Fig. 1 c is for adopting repair technology that white the lacking that forms repaired, and repair procedure can be repaired with the photoresistance composition and after solidifying by adding black matrix breakage.
The defective of prior art is, when Bai Queshi appears in black matrix, needs special repair procedure, needs in addition extras to add black matrix photoresistance composition, causes cost to increase.
Summary of the invention
The purpose of this invention is to provide a kind of photoresistance composition and method of making the same, a kind of color membrane substrates and a kind of display device, in order to realize the repairing of black matrix breakage, greatly improve the yield of product.
Photoresistance composition of the present invention comprises that massfraction is 1%～10% microcapsules, and the cyst wall of described microcapsules comprises the alkali insoluble resin, and the capsule-core of described microcapsules comprises:
Massfraction is the unsaturated polyester oligomer of 10%～60% carried out photocuring;
Massfraction is 10%～50% photo polymerization monomer;
Massfraction is the first black pigment mill base of 10%～70%;
Massfraction is the first photo-induced polymerization initiator of 0.1%～10%;
Massfraction is 0.1%～5% coupling agent.
Preferably, the described unsaturated polyester oligomer that carries out photocuring comprises one or more in epoxy acrylic resin and the polyurethane acrylic resin; Described photo polymerization monomer comprises one or more in dipentaerythritol acrylate (DPHA), trimethylolpropane triacrylate (TMPTA), pentaerythrite five acrylate (DPPA); Described the first photo-induced polymerization initiator comprises one or more in 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy-cyclohexyl phenyl ketone and 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone; Described coupling agent comprises one or more in γ-(2,3-epoxy the third oxygen) propyl trimethoxy silicane and the gamma-methyl allyl acyloxypropyl trimethoxysilane.
Preferably, described photoresistance composition also comprises:
Massfraction is the second black pigment mill base of 5%～70%;
Massfraction is 1%～50% the resin glue that contains carboxylic group;
Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link;
Massfraction is the second photo-induced polymerization initiator of 0.1%～10%;
Massfraction is the first solvent of 7.3%～59.39%;
Massfraction is 0.01%～5% auxiliary agent.
Better, the described resin glue that contains carboxylic group comprises methacrylic acid and benzyl methacrylate multipolymer; The described polymerisable monomer that contains the thiazolinyl unsaturated link comprises one or more in trimethylolpropane triacrylate, dipentaerythritol acrylate and the pentaerythritol triacrylate; Described the second photo-induced polymerization initiator comprises one or more in 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone and the 2-hydroxy-2-methyl-1-phenyl-1-acetone; Described the first solvent comprises one or more in propylene glycol monomethyl ether acetate, 3-ethoxyl ethyl propionate and the cyclohexanone; Described auxiliary agent comprises one or more in silane coupling agent and the levelling agent.
Preferably, described the first black pigment mill base and the second black pigment mill base comprise respectively:
Massfraction is 1%～20% black pigment;
Massfraction is 1%～50% hyper-dispersant;
Massfraction is 0.5%～10% dispersion aids;
Massfraction is 0.1%～5% adjuvant;
Massfraction is the second solvent of 39%～97.4%.
Preferably, described black pigment comprises in black one or more of carbon black and titanium; Described hyper-dispersant comprises acylamide polymer, contain in macromolecule block polymer, organic silicon surfactant, modified polyurethane and the modified polyacrylate of close pigment group one or more; Described dispersion aids comprises multiplying agent and improves in the solvent-borne type dispersion aids one or more; Described the second solvent is one or more in propylene glycol monomethyl ether acetate and the 3-ethoxyl ethyl propionate; Described adjuvant is one or more in tween and the sapn.
Preferably, described alkali insoluble resin comprises epoxy resin or urethane resin, is specifically as follows epoxy acrylic resin 6118, epoxy acrylic resin 6104 or urethane acrylate SM6201 that Jiangsu three wood are produced.
Above-mentioned photoresistance composition of the present invention is suitable for preparing black matrix.
Color membrane substrates of the present invention, the black matrix in the described color membrane substrates adopts above-mentioned any photoresistance composition to obtain.
Display device of the present invention comprises above-mentioned color membrane substrates.
The preparation method of photoresistance composition of the present invention comprises:
It is the unsaturated polyester oligomer of 10%～60% carried out photocuring with massfraction, massfraction is 10%～50% photo polymerization monomer, massfraction is the first black pigment mill base of 10%～70%, massfraction is the first photo-induced polymerization initiator of 0.1%～10%, massfraction is to disperse after 0.1%～5% coupling agent mixes, and makes the capsule-core composition of microcapsules;
The capsule-core of described microcapsules is dripped in the solution of the cyst wall of microcapsules with composition, form microcapsules;
Get massfraction and be 1%～10% microcapsules and mixes formation photoresistance composition with each component of preparation photoresistance composition.
Preferably, each component of described photoresistance composition comprises that massfraction is the second black pigment mill base of 5%～70%; Massfraction is 1%～50% the resin glue that contains carboxylic group; Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link; Massfraction is the second photo-induced polymerization initiator of 0.1%～10%; Massfraction is the first solvent of 7.3%～59.39%; Massfraction is 0.01%～5% auxiliary agent.
In photoresistance composition of the present invention, owing to introduce microcapsules in the photoresistance composition, its structure comprises the cyst wall of microcapsules and the capsule-core of microcapsules, because the protective effect of cyst wall, the capsule-core material is difficult the outflow; On the contrary, in black matrix preparation process, because the existence of contamination particle or the scuffing of external force, it is damaged to cause black matrix to occur, and the shearing force that this breakage causes forces the cyst wall of microcapsules damaged, so that the composition in the inner capsule-core flows out, fill full breakage, through exposure-processed, can finish the repairing to breakage, and need not to wait for special renovation technique, and can greatly promote product yield and the product quality of TFT-LCD.
Description of drawings
Fig. 1 a～Fig. 1 c is that the black matrix of prior art is made schematic flow sheet;
Fig. 2 a～Fig. 2 b is that the black matrix of the present invention is made schematic flow sheet.
Embodiment
Fail to repair the technical matters that causes product defects for the breakage that solves the black matrix that exists in the prior art, the invention provides a kind of photoresistance composition and method of making the same, a kind of color membrane substrates and a kind of display device, described photoresistance composition is used for the preparation of black matrix.In this technical scheme, owing in the photoresistance composition, increased microcapsules, microcapsules comprise cyst wall and capsule-core, cyst wall can break under the effect of damaged shearing force, thereby the capsule-core material flows out, comprise unsaturated polyester oligomer and photo polymerization monomer and the black pigment mill base that can carry out photocuring in the capsule-core, resin oligomers polymerization and photo polymerization monomer polymerization under UV-irradiation, can realize the repairing to breakage, thereby the integrality that keeps black matrix, prevent light leak, and then improve the yield of product.For making the purpose, technical solutions and advantages of the present invention clearer, by the following examples the present invention is described in further detail.
The embodiment of the invention provides a kind of photoresistance composition, comprises that massfraction is 1%～10% microcapsules, and the cyst wall of described microcapsules comprises the alkali insoluble resin, and the capsule-core of described microcapsules comprises:
Massfraction is the unsaturated polyester oligomer of 10%～60% carried out photocuring;
Massfraction is 10%～50% photo polymerization monomer;
Massfraction is the first black pigment mill base of 10%～70%;
Massfraction is the first photo-induced polymerization initiator of 0.1%～10%;
Massfraction is 0.1%～5% coupling agent.
In embodiments of the present invention, in the photoresistance composition, microcapsules have been increased, the capsule-core of microcapsules comprises the unsaturated polyester oligomer, photo polymerization monomer, photo-induced polymerization initiator and adjuvant, cyst wall can break under the effect of damaged shearing force, thereby the capsule-core material flows out, comprise unsaturated polyester oligomer and photo polymerization monomer and the black pigment mill base that can carry out photocuring in the capsule-core, but resin oligomers polymerization reaction take place under UV-irradiation, photo polymerization monomer is polymerization reaction take place also, therefore, can realize the repairing to breakage, thereby keep the integrality of black matrix, prevent light leak, and then improve the yield of product.Owing to added microcapsules at black matrix in the photoresistance composition, can save follow-up repair technology to black matrix, the production time of having saved product, improve the production efficiency of product, and owing to need not the extra black matrix photoresistance composition that adds, therefore can save cost.
In embodiments of the present invention, the massfraction of microcapsules is 1%～10%, and when the content in the microcapsules photoresistance composition was less, if white lacking appears in black matrix, possible microcapsules rupture can not be filled up all white lacking; When the content of microcapsules in the photoresistance composition is more, increase cost, and existing technique causes white the lacking of black matrix also can be not a lot, the amount of the microcapsules that need is also few, the inventor finds that through lot of experiments the massfraction of the microcapsules in the photoresistance composition just can solve the white problem that lacks of black matrix appearance in the prior art 1%～10%.
Preferably, the described unsaturated polyester oligomer that carries out photocuring comprises one or more in epoxy acrylic resin and the polyurethane acrylic resin; Described photo polymerization monomer comprises one or more in dipentaerythritol acrylate (DPHA), trimethylolpropane triacrylate (TMPTA), pentaerythrite five acrylate (DPPA); Described the first photo-induced polymerization initiator comprises one or more in 2-hydroxy-2-methyl-1-phenyl-1-acetone (P.I.-1173), 1-hydroxy-cyclohexyl phenyl ketone (P.I.-184) and 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone (P.I.-369); Described coupling agent comprises one or more in γ-(2,3-epoxy the third oxygen) propyl trimethoxy silicane (KH-560) and the gamma-methyl allyl acyloxypropyl trimethoxysilane (KH-570).
Preferably, described photoresistance composition also comprises:
Massfraction is the second black pigment mill base of 5%～70%;
Massfraction is 1%～50% the resin glue that contains carboxylic group;
Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link;
Massfraction is the second photo-induced polymerization initiator of 0.1%～10%;
Massfraction is the first solvent of 7.3%～59.39%;
Massfraction is 0.01%～5% auxiliary agent.
Better, the described resin glue that contains carboxylic group comprises methacrylic acid and benzyl methacrylate multipolymer; The described polymerisable monomer that contains the thiazolinyl unsaturated link comprises one or more in trimethylolpropane triacrylate, dipentaerythritol acrylate and the pentaerythritol triacrylate; Described the second photo-induced polymerization initiator comprises one or more in 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone and the 2-hydroxy-2-methyl-1-phenyl-1-acetone; Described the first solvent comprises one or more in propylene glycol monomethyl ether acetate, 3-ethoxyl ethyl propionate and the cyclohexanone; Described auxiliary agent comprises one or more in silane coupling agent and the levelling agent.
Preferably, described the first black pigment mill base and the second black pigment mill base comprise respectively:
Massfraction is 1%～20% black pigment;
Massfraction is 1%～50% hyper-dispersant;
Massfraction is 0.5%～10% dispersion aids;
Massfraction is 0.1%～5% adjuvant;
Massfraction is the second solvent of 39%～97.4%.
Preferably, described black pigment comprises in black one or more of carbon black and titanium; Described hyper-dispersant comprises acylamide polymer, contain in macromolecule block polymer, organic silicon surfactant, modified polyurethane and the modified polyacrylate of close pigment group one or more; Described dispersion aids comprises multiplying agent and improves in the solvent-borne type dispersion aids one or more; Described the second solvent is one or more in propylene glycol monomethyl ether acetate (PGMEA) and the 3-ethoxyl ethyl propionate; Described adjuvant is one or more in tween and the sapn.
Preferably, described alkali insoluble resin comprises epoxy resin or urethane resin, is specifically as follows epoxy acrylic resin 6118, epoxy acrylic resin 6104 or urethane acrylate SM6201 that Jiangsu three wood are produced.
The embodiment of the invention also provides a kind of color membrane substrates, and the black matrix in the described color membrane substrates adopts above-mentioned any photoresistance composition to obtain.
The embodiment of the invention also provides a kind of display device, comprises above-mentioned color membrane substrates.Except black matrix, other structures of display device are consistent with existing technique.Described display device can for: liquid crystal panel, Electronic Paper, oled panel, LCD TV, liquid crystal display, digital album (digital photo frame), mobile phone, panel computer etc. have product or the parts of any Presentation Function.
The preparation method of photoresistance composition of the present invention comprises:
It is the unsaturated polyester oligomer of 10%～60% carried out photocuring with massfraction, massfraction is 10%～50% photo polymerization monomer, massfraction is the first black pigment mill base of 10%～70%, massfraction is the first photo-induced polymerization initiator of 0.1%～10%, massfraction is to disperse after 0.1%～5% coupling agent mixes, and makes the capsule-core composition of microcapsules; Concrete, dispersing technology can disperse 2～3 hours (h) under the condition of rotating speed 800 rev/mins (rpm);
The capsule-core of described microcapsules is dripped in the solution of the cyst wall of microcapsules with composition, form microcapsules;
Get massfraction and be 1%～10% microcapsules and mix with each component of photoresistance composition with black matrix, form the photoresistance composition.
In the present embodiment, except adding microcapsules, the component of other components and existing black matrix usefulness photoresistance composition can be identical, also can select the following black matrix of the present invention component of photoresistance composition in the photoresistance composition.
Preferably, black matrix comprises that with each component of photoresistance composition massfraction is the second black pigment mill base of 5%～70%; Massfraction is 1%～50% the resin glue that contains carboxylic group; Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link; Massfraction is the second photo-induced polymerization initiator of 0.1%～10%; Massfraction is the first solvent of 7.3%～59.39%; Massfraction is 0.01%～5% auxiliary agent.
Below enumerate specific embodiment photoresistance composition and method of making the same of the present invention is done further explanation, but the present invention is not limited to following examples.
One, the preparation method of the first black pigment mill base and the second black pigment mill base
Embodiment 1～5th, component and the massfraction thereof of preparation black pigment mill base.Because component and each constituent mass mark of the first black pigment mill base and the second black pigment mill base are identical, below the first black pigment mill base and the second black pigment mill base are referred to as the black pigment mill base, it is 1%～20% black pigment with massfraction among table 1 embodiment 1～5, massfraction is 1%～50% hyper-dispersant, massfraction is 0.5%～10% dispersion aids, massfraction is that 0.1%～5% adjuvant and massfraction are to grind after the second solvent of 39%～97.4%, be specially said components is added in the 500L abrading cylinder, be that the zirconium pearl of the 0.5mm of 350mL is ground under the rotating speed of 2500rpm to wherein adding volume again, obtain the black pigment mill base.In the present embodiment, black pigment is selected carbon black, hyper-dispersant is selected the macromolecule block polymer that contains close pigment group, EFKA4560, EFKA4030 or EFKA4040 such as the BYK-163 of German Bi Ke company, Dutch EFKA company, dispersion aids is selected multiplying agent and is improved the solvent-borne type dispersion aids, multiplying agent is specifically selected Solsperse5000, improves BYK2105 or BYK2100 that the solvent-borne type dispersion aids is specifically selected German Bi Ke company; Adjuvant is selected tween or sapn; The second solvent is selected propylene glycol monomethyl ether acetate (PGMEA) and 3-ethoxyl ethyl propionate.
Table 1 embodiment 1～5 black pigment mill base component and massfraction table thereof
Figure BDA00003512321900091
Two, the capsule-core of the microcapsules preparation method of composition
Embodiment 6～10th, capsule-core component and the massfraction thereof of composition of preparation microcapsules.It is the unsaturated polyester oligomer of 10%～60% carried out photocuring with massfraction among table 2 embodiment 6～10, massfraction is 10%～50% photo polymerization monomer, massfraction is the first black pigment mill base of 10%～70%, massfraction is the first photo-induced polymerization initiator of 0.1%～10%, massfraction is 0.1%～5% coupling agent mixing, form potpourri, wherein, can carry out the unsaturated polyester oligomer of photocuring available from Jiangsu three wooden companies, photo polymerization monomer is selected from dipentaerythritol acrylate (DPHA), trimethylolpropane triacrylate (TMPTA) or pentaerythrite five acrylate (DPPA), the first photo-induced polymerization initiator is selected 2-hydroxy-2-methyl-1-phenyl-1-acetone (P.I.-1173), in 1-hydroxy-cyclohexyl phenyl ketone (P.I.-184) and 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone (P.I.-369) one or more, coupling agent is selected silane coupling agent, specifically select γ-(2,3-epoxy the third oxygen) propyl trimethoxy silicane (KH-560) or gamma-methyl allyl acyloxypropyl trimethoxysilane (KH-570);
Potpourri is under agitation disperseed 2～3h, and the rotating speed of described stirring is 800 rev/mins, makes the capsule-core composition of microcapsules, and described stirring can be adopted churned mechanically mode.
The core component of table 2 embodiment 6～10 microcapsules and massfraction table thereof
Figure BDA00003512321900101
Three, the preparation method of microcapsules
Embodiment 11～14th, preparation microcapsules component and massfraction thereof.Capsule-core composition with the above-mentioned microcapsules that make, drip in the resin solution of the cyst wall that is used to form microcapsules, as adopt the xylene solution of epoxy resin or urethane resin, each component and massfraction thereof are as shown in table 3, here, the capsule-core of the microcapsules that preferred embodiment 7 makes, the capsule-core of the microcapsules that embodiment 9～10 and embodiment 6 make are also applicable.Because the polarity difference of capsule-core and cyst wall, generation is separated, adopt different mechanical raking speed, as adopt the mechanical raking speed of 200～1000 rev/mins (rpm), make the capsule-core composition in resin solution, form the particle suspension liquid of different-grain diameter size, finally after filtration, the technique such as screening, drying, curing, thereby make the microcapsule granule with different-grain diameter size, Microcapsules Size is at 10～100 nanometers (nm).
Table 3 embodiment 11～14 microcapsules components and massfraction table thereof
Figure BDA00003512321900111
Four, the black matrix preparation method of photoresistance composition
Embodiment 15～19th, the black matrix of preparation component and the massfraction thereof of photoresistance composition.Be 1%～10% microcapsules with massfraction among table 4 embodiment 15～19, massfraction is 1%～50% the resin glue that contains carboxylic group, massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link, massfraction is the second photo-induced polymerization initiator, massfraction is that the first solvent of 7.3%～59.39% and massfraction are that 0.01%～5% auxiliary agent mixes, and obtains the black matrix photoresistance composition of the present invention; The resin glue that contains carboxylic group is selected methacrylic acid and benzyl methacrylate multipolymer (solid content is 20%); The polymerisable monomer that contains the thiazolinyl unsaturated link is selected one or more in trimethylolpropane triacrylate (TMPTA), dipentaerythritol acrylate (DPHA) and the pentaerythritol triacrylate (DPPA); The second photo-induced polymerization initiator is selected one or more in 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone (P.I.-369) and the 2-hydroxy-2-methyl-1-phenyl-1-acetone (P.I.-1173); The first solvent is selected one or more in propylene glycol monomethyl ether acetate (PGMEA), 3-ethoxyl ethyl propionate and the cyclohexanone; In selection of auxiliary silane coupling agent and the levelling agent one or more, silane coupling agent are specifically selected KH-560 or KH-570, EFKA-3883 or EFKA-3600 that levelling agent selects Dutch EFKA company to produce.
Table 4 embodiment 15～19 black matrixes component and the massfraction table thereof of photoresistance composition
Figure BDA00003512321900121
Figure BDA00003512321900131
Five, the preparation of black matrix
Usually there are various forms of defectives among the color membrane substrates preparation technology, for these defectives of discovery promptly and accurately, on production line, all are equipped with automatic optical detecting system (Automatic Optic Inspection); This equipment can accurately be grasped defective locations by the optical difference at contrast damaged repair place and normal intact place, but and the monitor and repairing effect;
Use the black matrix of the present invention to deceive the method for matrix with the preparation of photoresistance composition:
With the black matrix of the present invention preparation with composition be coated on clean up glass substrate on, the black photoresistance of the present invention's preparation is coated on the glass substrate that cleans up, after the vacuum drying 30～240 seconds (s), after 50～120 ℃ hot plates toast 1～5min, in exposure machine, (include the light shield that is carved with the definite shape pattern) with 40～100mJ/cm 2Energy exposure, with potassium hydroxide or sodium carbonate developing liquid developing 60～120s, finally in 200～250 ℃ oven, toast 20～50min again, the colored filter that namely makes the black photoresistance of using the present invention's preparation is deceived matrix pattern.
Six, detection method
The pattern of black matrix can detect by detection meanss such as optical microscope, scanning electron microscope (SEM), transmission electron microscopes (TEM).Shown in Fig. 2 a and Fig. 2 b, the present invention is black, and matrix is made schematic flow sheet, adopt the black matrix of observation by light microscope, some position existed damaged after the black matrix that Fig. 2 a prepares for the coating embodiment of the invention 15～19 was used the photoresistance composition, Fig. 2 b is for after adopting UV-irradiation photoresistance composition, because the breakage of microcapsules, therefore can fill breakage, avoid forming white lacking, below adopt black matrix that prior art do not contain microcapsules with composition as a comparison case, as embodiment, the result table is as shown in table 5 with the embodiment of the invention 15～19 preparation photoresistance compositions.
Table 5 the result contrast table
Figure BDA00003512321900132
Can find by detecting, because contamination particle exists or the scuffing of external force, it is damaged to cause black matrix to occur, the black matrix of prior art preparation, its dazzlingly white falls into rate about 0.1%, and adopt the black matrix of the present invention to use the black matrix of photoresistance composition preparation substantially without damaged, its ratio of defects falls into about 1% of rate for existing black matrix dazzlingly white, this is because the damaged shear force that causes forces the cyst wall of microcapsules damaged, so that the capsule-core composition of microcapsules flows out, fill full breakage, contain black pigment mill base and photo polymerization monomer in the microcapsules, therefore, through an exposure-processed, can finish the repairing to black matrix breakage, greatly promote product yield and the product quality of TFT-LCD.
Obviously, those skilled in the art can carry out various changes and modification to the present invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.

Claims (11)

1. a photoresistance composition is characterized in that, comprises that massfraction is 1%～10% microcapsules, and the cyst wall of described microcapsules comprises the alkali insoluble resin, and the capsule-core of described microcapsules comprises:
Massfraction is the unsaturated polyester oligomer of 10%～60% carried out photocuring;
Massfraction is 10%～50% photo polymerization monomer;
Massfraction is the first black pigment mill base of 10%～70%;
Massfraction is the first photo-induced polymerization initiator of 0.1%～10%;
Massfraction is 0.1%～5% coupling agent.
2. photoresistance composition as claimed in claim 1 is characterized in that,
The described unsaturated polyester oligomer that carries out photocuring comprises one or more in epoxy acrylic resin and the polyurethane acrylic resin;
Described photo polymerization monomer comprises one or more in dipentaerythritol acrylate, trimethylolpropane triacrylate, pentaerythrite five acrylate;
Described the first photo-induced polymerization initiator comprises one or more in 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy-cyclohexyl phenyl ketone and 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone;
Described coupling agent comprises one or more in γ-(2,3-epoxy the third oxygen) propyl trimethoxy silicane and the gamma-methyl allyl acyloxypropyl trimethoxysilane.
3. photoresistance composition as claimed in claim 1 is characterized in that, described photoresistance composition also comprises:
Massfraction is the second black pigment mill base of 5%～70%;
Massfraction is 1%～50% the resin glue that contains carboxylic group;
Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link;
Massfraction is the second photo-induced polymerization initiator of 0.1%～10%;
Massfraction is the first solvent of 7.3%～59.39%;
Massfraction is 0.01%～5% auxiliary agent.
4. photoresistance composition as claimed in claim 3 is characterized in that,
The described resin glue that contains carboxylic group comprises methacrylic acid and benzyl methacrylate multipolymer;
The described polymerisable monomer that contains the thiazolinyl unsaturated link comprises one or more in trimethylolpropane triacrylate, dipentaerythritol acrylate and the pentaerythritol triacrylate;
Described the second photo-induced polymerization initiator comprises one or more in 2-phenyl benzyl-2-dimethyl amine-4'-morpholino butyrophenone and the 2-hydroxy-2-methyl-1-phenyl-1-acetone;
Described the first solvent comprises one or more in propylene glycol monomethyl ether acetate, 3-ethoxyl ethyl propionate and the cyclohexanone;
Described auxiliary agent comprises one or more in silane coupling agent and the levelling agent.
5. photoresistance composition as claimed in claim 3 is characterized in that, described the first black pigment mill base and the second black pigment mill base comprise respectively:
Massfraction is 1%～20% black pigment;
Massfraction is 1%～50% hyper-dispersant;
Massfraction is 0.5%～10% dispersion aids;
Massfraction is 0.1%～5% adjuvant;
Massfraction is the second solvent of 39%～97.4%.
6. photoresistance composition as claimed in claim 5 is characterized in that,
Described black pigment comprises in black one or more of carbon black and titanium;
Described hyper-dispersant comprises acylamide polymer, contain in macromolecule block polymer, organic silicon surfactant, modified polyurethane and the modified polyacrylate of close pigment group one or more;
Described dispersion aids comprises multiplying agent and improves in the solvent-borne type dispersion aids one or more;
Described the second solvent is one or more in propylene glycol monomethyl ether acetate and the 3-ethoxyl ethyl propionate;
Described adjuvant is one or more in tween and the sapn.
7. photoresistance composition as claimed in claim 1 is characterized in that, described alkali insoluble resin comprises epoxy resin or urethane resin.
8. a color membrane substrates is characterized in that, the black matrix in the described color membrane substrates adopts and obtains such as each described photoresistance composition in the claim 1～7.
9. a display device is characterized in that, comprises color membrane substrates as claimed in claim 8.
10. the preparation method of a photoresistance composition is characterized in that, comprising:
It is the unsaturated polyester oligomer of 10%～60% carried out photocuring with massfraction, massfraction is 10%～50% photo polymerization monomer, massfraction is the first black pigment mill base of 10%～70%, massfraction is the first photo-induced polymerization initiator of 0.1%～10%, massfraction is to disperse after 0.1%～5% coupling agent mixes, and makes the capsule-core composition of microcapsules;
The capsule-core of described microcapsules is dripped in the solution of the cyst wall of microcapsules with composition, form microcapsules;
Get massfraction and be 1%～10% microcapsules and mixes formation photoresistance composition with each component of preparation photoresistance composition.
11. the preparation method of photoresistance composition as claimed in claim 10 is characterized in that, each component of described photoresistance composition comprises that massfraction is the second black pigment mill base of 5%～70%; Massfraction is 1%～50% the resin glue that contains carboxylic group; Massfraction is 5%～50% the polymerisable monomer that contains the thiazolinyl unsaturated link; Massfraction is the second photo-induced polymerization initiator of 0.1%～10%; Massfraction is the first solvent of 7.3%～59.39%; Massfraction is 0.01%～5% auxiliary agent.
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