CN103325773A - Package structure of integrated circuit - Google Patents
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- CN103325773A CN103325773A CN2012100784895A CN201210078489A CN103325773A CN 103325773 A CN103325773 A CN 103325773A CN 2012100784895 A CN2012100784895 A CN 2012100784895A CN 201210078489 A CN201210078489 A CN 201210078489A CN 103325773 A CN103325773 A CN 103325773A
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- 238000004806 packaging method and process Methods 0.000 claims abstract description 33
- 239000004065 semiconductor Substances 0.000 claims abstract description 22
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- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical group [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 238000012360 testing method Methods 0.000 abstract description 8
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- 238000004519 manufacturing process Methods 0.000 description 2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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Abstract
本发明涉及一种集成电路的封装结构,包含:一第一芯片单元;一第二芯片单元,其与所述第一芯片单元紧密结合,所述第二芯片单元具有至少一半导体层与至少一金属层,且第二芯片单元具有多数个贯穿所述半导体层与金属层的孔径;其中,每一孔径分别贯穿第二芯片单元,且第一芯片单元与一输出输入接合元件电性连接。本发明所提供的集成电路的封装结构,经由该输出输入接合元件对该第一芯片单元进行测试,并且无须经过一般封装程序即可直接将该第一芯片单元切割成多数个晶粒,因此,可以有效降低封装测试成本及缩减芯片封装后的面积大小。
The present invention relates to an integrated circuit packaging structure, comprising: a first chip unit; a second chip unit, which is tightly combined with the first chip unit, the second chip unit having at least one semiconductor layer and at least one metal layer, and the second chip unit having a plurality of apertures penetrating the semiconductor layer and the metal layer; wherein each aperture penetrates the second chip unit respectively, and the first chip unit is electrically connected to an input-output junction element. The integrated circuit packaging structure provided by the present invention tests the first chip unit via the input-output junction element, and the first chip unit can be directly cut into a plurality of crystal grains without going through a general packaging procedure, thereby effectively reducing the packaging test cost and reducing the area size of the chip after packaging.
Description
技术领域 technical field
本发明涉及一种集成电路的封装结构,特别是指一种以一芯片单元作为基板的集成电路的封装结构。 The invention relates to a packaging structure of an integrated circuit, in particular to a packaging structure of an integrated circuit with a chip unit as a substrate.
背景技术 Background technique
现今一芯片封装的方式概略描述如下:依据一晶圆(Wafer)上多数个晶粒(Die)的排列位置进行切割后,将每一晶粒分别安装到对应的一导线架(Lead frame)或是一个基板(Substrate)上,使得晶粒中的多数个导电脚位(Pin)与导线架或是基板电连接,接收一组测试电压信号,以进行芯片测试。 The current method of chip packaging is roughly described as follows: after cutting according to the arrangement positions of multiple dies on a wafer (Wafer), each die is mounted on a corresponding lead frame (Lead frame) or It is on a substrate (Substrate), so that a plurality of conductive pins (Pin) in the die are electrically connected to the lead frame or the substrate, and receive a set of test voltage signals for chip testing.
此外,从现今封装技术中晶粒与基板接合方式来做进一步的观察,大致可分为打线接合型(Wire bond, WB)、自动压焊型(Tape automatic bonding, TAB)、覆晶型(Flip chip, FC)封装方式,若以基板接脚型态来观察,大致可分为引脚插入型(Pin-through-hole, PTH)、表面粘着型(Surface mount technology, SMT)、外围型(Peripheral package)及数组型(Array area)等,然而,随着电子产品持续朝轻、薄、短、小的趋势演进,芯片封装的技术也逐渐从早期的打线接合型变成以覆晶型为主,且基板接脚型态也由引脚插入型变成以数组型为主(如:锡球格数组封装(Ball Grid Array, BGA)。 In addition, based on the further observation of the bonding method between the die and the substrate in today's packaging technology, it can be roughly divided into wire bond (WB), automatic pressure bonding (Tape automatic bonding, TAB), flip-chip ( Flip chip, FC) packaging methods, if viewed from the substrate pin type, can be roughly divided into pin-through-hole (PTH), surface mount technology (SMT), peripheral type ( Peripheral package) and array type (Array area), etc. However, as electronic products continue to evolve toward lighter, thinner, shorter, and smaller trends, chip packaging technology has gradually changed from the early wire bonding type to the flip chip type. Mainly, and the pin type of the substrate is also changed from pin insertion type to array type (such as: ball grid array package (Ball Grid Array, BGA).
举例来说,一覆晶锡球格数组封装(FC BGA)如图1所示,一个晶粒910利用多数个锡球991与一个基板920连结,同时所述锡球991与锡铅合金材质的基板接脚992有效电连接,而图2显示一打线接合锡球格数组封装(Wire bond BGA),其中晶粒810是以金属线892与基板820连结。
For example, a flip-chip ball grid array package (FC BGA) is shown in Figure 1, a die 910 is connected to a
从上述芯片封装技术中,无论何者都须以一个基板(或是一导线架)做为承载晶粒的装置,且晶粒与基板之间都须以锡球或是金属线的方式连结,是目前芯片封装技术的主流方式之一。 From the above-mentioned chip packaging technologies, no matter which one must use a substrate (or a lead frame) as a device for carrying the die, and the die and the substrate must be connected by solder balls or metal wires. One of the mainstream methods of chip packaging technology at present.
发明内容 Contents of the invention
有鉴于此,本发明的目的在于提供一种集成电路的封装结构。 In view of this, the object of the present invention is to provide a packaging structure for integrated circuits.
为达到上述目的,本发明提供一种集成电路的封装结构,所述集成电路的封装结构包含: In order to achieve the above object, the present invention provides a package structure of an integrated circuit, the package structure of the integrated circuit includes:
一第一芯片单元;以及 a first chip unit; and
一第二芯片单元,其与所述第一芯片单元电性连接,所述第二芯片单元具有至少一半导体层与至少一金属层,且第二芯片单元具有多数个贯穿所述半导体层与金属层的孔径;其中,每一孔径分别贯穿第二芯片单元,且第一芯片单元与一输出输入接合元件电性连接。 A second chip unit, which is electrically connected to the first chip unit, the second chip unit has at least one semiconductor layer and at least one metal layer, and the second chip unit has a plurality of Apertures of the layer; wherein, each aperture respectively penetrates the second chip unit, and the first chip unit is electrically connected to an input-output joint element.
作为优选方案,其中所述第二芯片单元还具有一接合金属层,且根据半导体工艺将所述接合金属层制作出多数个输出输入接合元件。 As a preferred solution, the second chip unit further has a bonding metal layer, and the bonding metal layer is fabricated into a plurality of input and output bonding elements according to a semiconductor process.
作为优选方案,其中所述集成电路的封装结构还包含一接合层单元,且根据半导体工艺将所述接合层单元制作出多数个输出输入接合元件。 As a preferred solution, the packaging structure of the integrated circuit further includes a bonding layer unit, and the bonding layer unit is fabricated into a plurality of input and output bonding elements according to semiconductor technology.
作为优选方案,其中所述第一芯片单元、第二芯片单元及接合层单元封装成一集成电路模组。 As a preferred solution, wherein the first chip unit, the second chip unit and the bonding layer unit are packaged into an integrated circuit module.
作为优选方案,其中所述第二芯片单元的面积大于第一芯片单元的面积。 As a preferred solution, the area of the second chip unit is larger than the area of the first chip unit.
作为优选方案,其中所述第二芯片单元的面积等于第一芯片单元的面积。 As a preferred solution, the area of the second chip unit is equal to the area of the first chip unit.
作为优选方案,其中所述第一芯片单元与第二芯片单元封装成一集成电路模组。 As a preferred solution, the first chip unit and the second chip unit are packaged into an integrated circuit module.
作为优选方案,其中所述半导体层的材质为硅。 As a preferred solution, the material of the semiconductor layer is silicon.
作为优选方案,其中所述半导体层的材质为砷化镓。 As a preferred solution, the material of the semiconductor layer is gallium arsenide.
本发明所提供的集成电路的封装结构,经由该输出输入接合元件对该第一芯片单元进行测试,并且无须经过一般封装程序即可直接将该第一芯片单元切割成多数个晶粒,因此,可以有效降低封装测试成本及缩减芯片封装后的面积大小。 In the packaging structure of the integrated circuit provided by the present invention, the first chip unit is tested through the I/O bonding element, and the first chip unit can be directly cut into a plurality of crystal grains without going through a general packaging procedure. Therefore, It can effectively reduce the packaging and testing cost and reduce the size of the packaged chip area.
附图说明 Description of drawings
图1是现有技术中一覆晶锡球格数组封装的侧视示意图; FIG. 1 is a schematic side view of a flip-chip solder ball array package in the prior art;
图2是现有技术中一打线接合锡球格数组封装的侧视示意图; FIG. 2 is a schematic side view of a wire-bonded ball grid array package in the prior art;
图3是本发明中第一较佳实施例的侧视示意图; Fig. 3 is a schematic side view of the first preferred embodiment of the present invention;
图4是本发明中第一较佳实施例经半导体工艺得到多数电路元件及输出输入接合元件后的侧视示意图; Fig. 4 is a schematic side view of the first preferred embodiment of the present invention after obtaining most circuit elements and input-input bonding elements through semiconductor technology;
图5是本发明中第一较佳实施例经半导体工艺得到多数电路元件及输出输入接合元件后的俯视示意图; Fig. 5 is a schematic top view of the first preferred embodiment of the present invention after obtaining most circuit elements and output and input bonding elements through the semiconductor process;
图6是本发明中第二较佳实施例的侧视示意图; Fig. 6 is the side view schematic diagram of the second preferred embodiment in the present invention;
图7是本发明中第三较佳实施例的俯视示意图。 FIG. 7 is a schematic top view of a third preferred embodiment of the present invention.
【主要元件符号说明】 [Description of main component symbols]
晶圆片-10;第一芯片单元-11;导电脚位-110;半导体层-111;金属层-112;第二芯片单元-12;孔径-121;接合层单元-13;输出输入接合元件-131; Wafer-10; First Chip Unit-11; Conductive Pins-110; Semiconductor Layer-111; Metal Layer-112; Second Chip Unit-12; Aperture-121; Bonding Layer Unit-13; -131;
晶粒-810;基板-820;金属线-892; Die-810; Substrate-820; Metal wire-892;
晶粒-910;基板-920;锡球-991;基板接脚-992; Die-910; Substrate-920; Solder Ball-991; Substrate Pin-992;
电路元件-CKT1~CKTn; Circuit elements - CKT1~CKTn;
晶粒-D1~Dm。 Grain-D1~Dm. the
具体实施方式 Detailed ways
有关本发明的特征与技术内容,以下配合参考附图的三个较佳实施例详细说明如下。 Regarding the features and technical contents of the present invention, three preferred embodiments are described in detail below with reference to the accompanying drawings.
由于本发明具有多数个较佳实施例,因此在详细说明之前,在以下较佳实施例中的相似的元件是以相同的编号来表示。 Since the present invention has several preferred embodiments, similar elements in the following preferred embodiments are denoted by the same numerals before detailed description.
1.集成电路的封装结构的第一较佳实施例 1. The first preferred embodiment of the packaging structure of the integrated circuit
参阅图3,本发明的一较佳实施例,包含:一个第一芯片单元11、一个第二芯片单元12及一个接合层单元13。第一芯片单元11、第二芯片单元12分别包括至少一半导体层111与至少一金属层112,且半导体层111的材质为一半导体材料(如:硅(Si)、砷化镓(GaAs)等),且接合层单元13是一金属层。
Referring to FIG. 3 , a preferred embodiment of the present invention includes: a
值得说明的是,第一芯片单元11、第二芯片单元12、接合层单元13以第二芯片单元12介于第一芯片单元11与接合层单元13之间依序接合,且第二芯片单元12的面积大于或等于第一芯片单元11的面积,此外,由于接合层单元13为一金属层,故也可利用第二芯片单元12中的最底层据以实施。
It is worth noting that the
第一芯片单元11、第二芯片单元12是以半导体工艺的方式(如:曝光、氧化层沉积、蚀刻、显影等),制作相关电路元件于其中,由于一应用半导体工艺的电路元件制作方式并非本发明的主要特征,请参酌Neil H. E. Weste及Kamran Eshraghian等人所著的“Principles of CMOS VLSI Design”一书中相关内容的说明,在此不再多加赘述。
The
然后,在第二芯片单元12中设置多数个孔径121,其中,每一孔径121分别贯穿第二芯片单元12。
Then, a plurality of
最后,在接合层单元13中,利用半导体工艺的方式制作多数个输出输入接合元件131(I/O Pad)。 Finally, in the bonding layer unit 13, a plurality of input/output bonding elements 131 (I/O Pad) are manufactured by means of a semiconductor process.
联合参阅图4、5,假设第一芯片单元11中具有n个以半导体工艺制作出的电路元件CKT1~CKTn,且每一电路元件CKT1~CKTn分别具有其对应的导电脚位110,每一导电脚110分别经由一对应的孔径121电连接至一对应的输出输入接合元件131上,使得每一电路元件CKT1~CKTn得以经由其对应的输出输入接合元件131上接收一组参考电压(图未示)。
Referring to Figures 4 and 5 together, it is assumed that the
当第一芯片单元11中的电路元件接收该组参考电压且完成测试后,即可经由晶圆切割方式,得到第一芯片单元11中的每一电路元件CKT1~CKTn,由于所述电路元件CKT1~CKTn以第二芯片单元12作为支撑,并可通过对应的输出输入接合元件131,以传送或接收信号,因此,并不需要经过如打线、填胶等传统封装流程处理,所以可以降低该电路元件的生产成本。
After the circuit elements in the
2.集成电路的封装结构的第二较佳实施例 2. The second preferred embodiment of the packaging structure of the integrated circuit
参阅图6,第二较佳实施例与第一较佳实施例最大的不同点在于:当第二芯片单元12的最下层为一金属层时,该金属层即可视为接合层单元13,并在该金属层上制作多数个输出输入接合元件,也就是说,接合层单元13与第二芯片12也可以一体成型的方式制作,并不局限于第一较佳实施例中分别制作的方式而实施。 Referring to FIG. 6, the biggest difference between the second preferred embodiment and the first preferred embodiment is: when the bottom layer of the second chip unit 12 is a metal layer, the metal layer can be regarded as the bonding layer unit 13, And make a plurality of input and output bonding elements on the metal layer, that is to say, the bonding layer unit 13 and the second chip 12 can also be made in an integrated manner, not limited to the way of making them separately in the first preferred embodiment And implement.
3.集成电路的封装结构的第三较佳实施例 3. The third preferred embodiment of the packaging structure of the integrated circuit
参阅图7,由于包含所述电路元件CKT1~CKTn的第一芯片单元11并不需要如现有技术般的分别设置于一导线架或是一基板上,因此,在本较佳实施例中,是将多数个第一芯片单元1同时设置于一晶圆片10(Wafer)中,并配合一对应的第二芯片单元12,经由第二芯片单元12的孔径将每一第一芯片单元1的导电脚位(Pin)与一具有多数个输出输入接合元件131的接合层单元13电连接,所以,若是需要进行封装时,每一第一芯片单元11与对应的第二芯片单元12,及接合层单元13可直接共同进行封装,然后经由晶圆切割的程序后,即可得到多数个分别具有所述电路元件CKT1~CKTn的晶粒D1~Dm,换句话说,本较佳实施例可以有效缩减每一具有所述电路元件CKT1~CKTn的晶粒的面积。
Referring to FIG. 7, since the
本发明与现有技术最大的不同点在于,本发明将该第一芯片单元与该第二芯片单元贴合之后,该第一芯片单元得以经由该等第二芯片单元中的孔径接收一组参考电压以进行测试,因此,并非如现有技术一般,将晶圆切割成多数个晶粒后,再将晶粒置于导线架或是基板上以进行封装测试,因此,相较于现有技术而言,本发明整合该第一芯片单元、第二芯片单元、接合层单元于该集成电路中,即可经由该输出输入接合元件对该第一与第二芯片单元进行测试与使用,并且无须经过一般封装程序(如:设置表面粘着型(SMT)接脚、或是以打线接合型(WB)进行芯片封装),即可直接将该第一芯片单元切割成多数个晶粒,因此,相较于现有技术而言,可以有效降低封装测试成本及缩减芯片封装后的面积大小,故确实能达成本发明的目的。 The biggest difference between the present invention and the prior art is that, after bonding the first chip unit and the second chip unit in the present invention, the first chip unit can receive a set of references through the apertures in the second chip units. Therefore, it is not as in the prior art that the wafer is cut into a plurality of dies, and then the dies are placed on a lead frame or a substrate for packaging and testing. Therefore, compared with the prior art In other words, the present invention integrates the first chip unit, the second chip unit, and the bonding layer unit in the integrated circuit, so that the first and second chip units can be tested and used through the input-input bonding element without After general packaging procedures (such as: setting surface mount type (SMT) pins, or wire bonding (WB) chip packaging), the first chip unit can be directly cut into multiple dies. Therefore, Compared with the prior art, the packaging and testing cost can be effectively reduced and the size of the packaged chip area can be reduced, so the purpose of the present invention can indeed be achieved.
以上所述,仅为本发明的较佳实施例,并非用以此限定本发明的专利范围,举凡依本发明专利精神所作的等效变化与修饰等,均同理属于本发明的专利保护范围内。 The above is only a preferred embodiment of the present invention, and is not used to limit the scope of the patent of the present invention. All equivalent changes and modifications made according to the spirit of the patent of the present invention belong to the scope of protection of the patent of the present invention. Inside.
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