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CN103325773A - Package structure of integrated circuit - Google Patents

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Publication number
CN103325773A
CN103325773A CN2012100784895A CN201210078489A CN103325773A CN 103325773 A CN103325773 A CN 103325773A CN 2012100784895 A CN2012100784895 A CN 2012100784895A CN 201210078489 A CN201210078489 A CN 201210078489A CN 103325773 A CN103325773 A CN 103325773A
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chip unit
integrated circuit
chip
unit
packaging structure
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陈声寰
王曙民
韩肇伟
李威侬
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Minrui Technology Co ltd
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Minrui Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

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  • Semiconductor Integrated Circuits (AREA)

Abstract

本发明涉及一种集成电路的封装结构,包含:一第一芯片单元;一第二芯片单元,其与所述第一芯片单元紧密结合,所述第二芯片单元具有至少一半导体层与至少一金属层,且第二芯片单元具有多数个贯穿所述半导体层与金属层的孔径;其中,每一孔径分别贯穿第二芯片单元,且第一芯片单元与一输出输入接合元件电性连接。本发明所提供的集成电路的封装结构,经由该输出输入接合元件对该第一芯片单元进行测试,并且无须经过一般封装程序即可直接将该第一芯片单元切割成多数个晶粒,因此,可以有效降低封装测试成本及缩减芯片封装后的面积大小。

Figure 201210078489

The present invention relates to an integrated circuit packaging structure, comprising: a first chip unit; a second chip unit, which is tightly combined with the first chip unit, the second chip unit having at least one semiconductor layer and at least one metal layer, and the second chip unit having a plurality of apertures penetrating the semiconductor layer and the metal layer; wherein each aperture penetrates the second chip unit respectively, and the first chip unit is electrically connected to an input-output junction element. The integrated circuit packaging structure provided by the present invention tests the first chip unit via the input-output junction element, and the first chip unit can be directly cut into a plurality of crystal grains without going through a general packaging procedure, thereby effectively reducing the packaging test cost and reducing the area size of the chip after packaging.

Figure 201210078489

Description

集成电路的封装结构Package structure of integrated circuit

技术领域 technical field

本发明涉及一种集成电路的封装结构,特别是指一种以一芯片单元作为基板的集成电路的封装结构。 The invention relates to a packaging structure of an integrated circuit, in particular to a packaging structure of an integrated circuit with a chip unit as a substrate.

背景技术 Background technique

现今一芯片封装的方式概略描述如下:依据一晶圆(Wafer)上多数个晶粒(Die)的排列位置进行切割后,将每一晶粒分别安装到对应的一导线架(Lead frame)或是一个基板(Substrate)上,使得晶粒中的多数个导电脚位(Pin)与导线架或是基板电连接,接收一组测试电压信号,以进行芯片测试。 The current method of chip packaging is roughly described as follows: after cutting according to the arrangement positions of multiple dies on a wafer (Wafer), each die is mounted on a corresponding lead frame (Lead frame) or It is on a substrate (Substrate), so that a plurality of conductive pins (Pin) in the die are electrically connected to the lead frame or the substrate, and receive a set of test voltage signals for chip testing.

此外,从现今封装技术中晶粒与基板接合方式来做进一步的观察,大致可分为打线接合型(Wire bond, WB)、自动压焊型(Tape automatic bonding, TAB)、覆晶型(Flip chip, FC)封装方式,若以基板接脚型态来观察,大致可分为引脚插入型(Pin-through-hole, PTH)、表面粘着型(Surface mount technology, SMT)、外围型(Peripheral package)及数组型(Array area)等,然而,随着电子产品持续朝轻、薄、短、小的趋势演进,芯片封装的技术也逐渐从早期的打线接合型变成以覆晶型为主,且基板接脚型态也由引脚插入型变成以数组型为主(如:锡球格数组封装(Ball Grid Array, BGA)。 In addition, based on the further observation of the bonding method between the die and the substrate in today's packaging technology, it can be roughly divided into wire bond (WB), automatic pressure bonding (Tape automatic bonding, TAB), flip-chip ( Flip chip, FC) packaging methods, if viewed from the substrate pin type, can be roughly divided into pin-through-hole (PTH), surface mount technology (SMT), peripheral type ( Peripheral package) and array type (Array area), etc. However, as electronic products continue to evolve toward lighter, thinner, shorter, and smaller trends, chip packaging technology has gradually changed from the early wire bonding type to the flip chip type. Mainly, and the pin type of the substrate is also changed from pin insertion type to array type (such as: ball grid array package (Ball Grid Array, BGA).

举例来说,一覆晶锡球格数组封装(FC BGA)如图1所示,一个晶粒910利用多数个锡球991与一个基板920连结,同时所述锡球991与锡铅合金材质的基板接脚992有效电连接,而图2显示一打线接合锡球格数组封装(Wire bond BGA),其中晶粒810是以金属线892与基板820连结。 For example, a flip-chip ball grid array package (FC BGA) is shown in Figure 1, a die 910 is connected to a substrate 920 by a plurality of solder balls 991, and the solder balls 991 are connected to the tin-lead alloy material The substrate pin 992 is effectively electrically connected, and FIG. 2 shows a wire bond BGA package (Wire bond BGA), wherein the die 810 is connected to the substrate 820 by a metal wire 892 .

从上述芯片封装技术中,无论何者都须以一个基板(或是一导线架)做为承载晶粒的装置,且晶粒与基板之间都须以锡球或是金属线的方式连结,是目前芯片封装技术的主流方式之一。 From the above-mentioned chip packaging technologies, no matter which one must use a substrate (or a lead frame) as a device for carrying the die, and the die and the substrate must be connected by solder balls or metal wires. One of the mainstream methods of chip packaging technology at present.

发明内容 Contents of the invention

有鉴于此,本发明的目的在于提供一种集成电路的封装结构。 In view of this, the object of the present invention is to provide a packaging structure for integrated circuits.

为达到上述目的,本发明提供一种集成电路的封装结构,所述集成电路的封装结构包含: In order to achieve the above object, the present invention provides a package structure of an integrated circuit, the package structure of the integrated circuit includes:

一第一芯片单元;以及 a first chip unit; and

一第二芯片单元,其与所述第一芯片单元电性连接,所述第二芯片单元具有至少一半导体层与至少一金属层,且第二芯片单元具有多数个贯穿所述半导体层与金属层的孔径;其中,每一孔径分别贯穿第二芯片单元,且第一芯片单元与一输出输入接合元件电性连接。 A second chip unit, which is electrically connected to the first chip unit, the second chip unit has at least one semiconductor layer and at least one metal layer, and the second chip unit has a plurality of Apertures of the layer; wherein, each aperture respectively penetrates the second chip unit, and the first chip unit is electrically connected to an input-output joint element.

作为优选方案,其中所述第二芯片单元还具有一接合金属层,且根据半导体工艺将所述接合金属层制作出多数个输出输入接合元件。 As a preferred solution, the second chip unit further has a bonding metal layer, and the bonding metal layer is fabricated into a plurality of input and output bonding elements according to a semiconductor process.

作为优选方案,其中所述集成电路的封装结构还包含一接合层单元,且根据半导体工艺将所述接合层单元制作出多数个输出输入接合元件。 As a preferred solution, the packaging structure of the integrated circuit further includes a bonding layer unit, and the bonding layer unit is fabricated into a plurality of input and output bonding elements according to semiconductor technology.

作为优选方案,其中所述第一芯片单元、第二芯片单元及接合层单元封装成一集成电路模组。 As a preferred solution, wherein the first chip unit, the second chip unit and the bonding layer unit are packaged into an integrated circuit module.

作为优选方案,其中所述第二芯片单元的面积大于第一芯片单元的面积。 As a preferred solution, the area of the second chip unit is larger than the area of the first chip unit.

作为优选方案,其中所述第二芯片单元的面积等于第一芯片单元的面积。 As a preferred solution, the area of the second chip unit is equal to the area of the first chip unit.

作为优选方案,其中所述第一芯片单元与第二芯片单元封装成一集成电路模组。 As a preferred solution, the first chip unit and the second chip unit are packaged into an integrated circuit module.

作为优选方案,其中所述半导体层的材质为硅。 As a preferred solution, the material of the semiconductor layer is silicon.

作为优选方案,其中所述半导体层的材质为砷化镓。 As a preferred solution, the material of the semiconductor layer is gallium arsenide.

本发明所提供的集成电路的封装结构,经由该输出输入接合元件对该第一芯片单元进行测试,并且无须经过一般封装程序即可直接将该第一芯片单元切割成多数个晶粒,因此,可以有效降低封装测试成本及缩减芯片封装后的面积大小。 In the packaging structure of the integrated circuit provided by the present invention, the first chip unit is tested through the I/O bonding element, and the first chip unit can be directly cut into a plurality of crystal grains without going through a general packaging procedure. Therefore, It can effectively reduce the packaging and testing cost and reduce the size of the packaged chip area.

附图说明 Description of drawings

图1是现有技术中一覆晶锡球格数组封装的侧视示意图; FIG. 1 is a schematic side view of a flip-chip solder ball array package in the prior art;

图2是现有技术中一打线接合锡球格数组封装的侧视示意图; FIG. 2 is a schematic side view of a wire-bonded ball grid array package in the prior art;

图3是本发明中第一较佳实施例的侧视示意图; Fig. 3 is a schematic side view of the first preferred embodiment of the present invention;

图4是本发明中第一较佳实施例经半导体工艺得到多数电路元件及输出输入接合元件后的侧视示意图; Fig. 4 is a schematic side view of the first preferred embodiment of the present invention after obtaining most circuit elements and input-input bonding elements through semiconductor technology;

图5是本发明中第一较佳实施例经半导体工艺得到多数电路元件及输出输入接合元件后的俯视示意图;  Fig. 5 is a schematic top view of the first preferred embodiment of the present invention after obtaining most circuit elements and output and input bonding elements through the semiconductor process;

图6是本发明中第二较佳实施例的侧视示意图;  Fig. 6 is the side view schematic diagram of the second preferred embodiment in the present invention;

图7是本发明中第三较佳实施例的俯视示意图。 FIG. 7 is a schematic top view of a third preferred embodiment of the present invention.

【主要元件符号说明】 [Description of main component symbols]

晶圆片-10;第一芯片单元-11;导电脚位-110;半导体层-111;金属层-112;第二芯片单元-12;孔径-121;接合层单元-13;输出输入接合元件-131; Wafer-10; First Chip Unit-11; Conductive Pins-110; Semiconductor Layer-111; Metal Layer-112; Second Chip Unit-12; Aperture-121; Bonding Layer Unit-13; -131;

晶粒-810;基板-820;金属线-892; Die-810; Substrate-820; Metal wire-892;

晶粒-910;基板-920;锡球-991;基板接脚-992; Die-910; Substrate-920; Solder Ball-991; Substrate Pin-992;

电路元件-CKT1~CKTn; Circuit elements - CKT1~CKTn;

晶粒-D1~Dm。  Grain-D1~Dm. the

具体实施方式 Detailed ways

有关本发明的特征与技术内容,以下配合参考附图的三个较佳实施例详细说明如下。 Regarding the features and technical contents of the present invention, three preferred embodiments are described in detail below with reference to the accompanying drawings.

由于本发明具有多数个较佳实施例,因此在详细说明之前,在以下较佳实施例中的相似的元件是以相同的编号来表示。 Since the present invention has several preferred embodiments, similar elements in the following preferred embodiments are denoted by the same numerals before detailed description.

1.集成电路的封装结构的第一较佳实施例 1. The first preferred embodiment of the packaging structure of the integrated circuit

参阅图3,本发明的一较佳实施例,包含:一个第一芯片单元11、一个第二芯片单元12及一个接合层单元13。第一芯片单元11、第二芯片单元12分别包括至少一半导体层111与至少一金属层112,且半导体层111的材质为一半导体材料(如:硅(Si)、砷化镓(GaAs)等),且接合层单元13是一金属层。 Referring to FIG. 3 , a preferred embodiment of the present invention includes: a first chip unit 11 , a second chip unit 12 and a bonding layer unit 13 . The first chip unit 11 and the second chip unit 12 respectively include at least one semiconductor layer 111 and at least one metal layer 112, and the material of the semiconductor layer 111 is a semiconductor material (such as: silicon (Si), gallium arsenide (GaAs), etc. ), and the bonding layer unit 13 is a metal layer.

值得说明的是,第一芯片单元11、第二芯片单元12、接合层单元13以第二芯片单元12介于第一芯片单元11与接合层单元13之间依序接合,且第二芯片单元12的面积大于或等于第一芯片单元11的面积,此外,由于接合层单元13为一金属层,故也可利用第二芯片单元12中的最底层据以实施。 It is worth noting that the first chip unit 11, the second chip unit 12, and the bonding layer unit 13 are sequentially bonded with the second chip unit 12 interposed between the first chip unit 11 and the bonding layer unit 13, and the second chip unit The area of 12 is greater than or equal to the area of the first chip unit 11 . In addition, since the bonding layer unit 13 is a metal layer, it can also be implemented by utilizing the lowest layer in the second chip unit 12 .

第一芯片单元11、第二芯片单元12是以半导体工艺的方式(如:曝光、氧化层沉积、蚀刻、显影等),制作相关电路元件于其中,由于一应用半导体工艺的电路元件制作方式并非本发明的主要特征,请参酌Neil H. E. Weste及Kamran Eshraghian等人所著的“Principles of CMOS VLSI Design”一书中相关内容的说明,在此不再多加赘述。 The first chip unit 11 and the second chip unit 12 are made in the way of semiconductor technology (such as: exposure, oxide layer deposition, etching, development, etc.), and relevant circuit elements are made in them. Because a circuit element manufacturing method using semiconductor technology is not For the main features of the present invention, please refer to the description of the relevant content in the book "Principles of CMOS VLSI Design" written by Neil H. E. Weste and Kamran Eshraghian, etc., and will not repeat them here.

然后,在第二芯片单元12中设置多数个孔径121,其中,每一孔径121分别贯穿第二芯片单元12。 Then, a plurality of apertures 121 are provided in the second chip unit 12 , wherein each aperture 121 penetrates through the second chip unit 12 respectively.

最后,在接合层单元13中,利用半导体工艺的方式制作多数个输出输入接合元件131(I/O Pad)。 Finally, in the bonding layer unit 13, a plurality of input/output bonding elements 131 (I/O Pad) are manufactured by means of a semiconductor process.

联合参阅图4、5,假设第一芯片单元11中具有n个以半导体工艺制作出的电路元件CKT1~CKTn,且每一电路元件CKT1~CKTn分别具有其对应的导电脚位110,每一导电脚110分别经由一对应的孔径121电连接至一对应的输出输入接合元件131上,使得每一电路元件CKT1~CKTn得以经由其对应的输出输入接合元件131上接收一组参考电压(图未示)。 Referring to Figures 4 and 5 together, it is assumed that the first chip unit 11 has n circuit elements CKT1~CKTn manufactured by semiconductor technology, and each circuit element CKT1~CKTn has its corresponding conductive pin 110, each conductive The pins 110 are respectively electrically connected to a corresponding output-input junction element 131 via a corresponding aperture 121, so that each circuit element CKT1~CKTn can receive a set of reference voltages (not shown in the figure) via its corresponding output-input junction element 131 ).

当第一芯片单元11中的电路元件接收该组参考电压且完成测试后,即可经由晶圆切割方式,得到第一芯片单元11中的每一电路元件CKT1~CKTn,由于所述电路元件CKT1~CKTn以第二芯片单元12作为支撑,并可通过对应的输出输入接合元件131,以传送或接收信号,因此,并不需要经过如打线、填胶等传统封装流程处理,所以可以降低该电路元件的生产成本。 After the circuit elements in the first chip unit 11 receive the set of reference voltages and complete the test, each circuit element CKT1~CKTn in the first chip unit 11 can be obtained through wafer dicing, because the circuit element CKT1 ~CKTn is supported by the second chip unit 12, and can transmit or receive signals through the corresponding input and output bonding elements 131. Therefore, it does not need to go through traditional packaging processes such as wire bonding and glue filling, so it can reduce the Production costs of circuit components.

2.集成电路的封装结构的第二较佳实施例 2. The second preferred embodiment of the packaging structure of the integrated circuit

参阅图6,第二较佳实施例与第一较佳实施例最大的不同点在于:当第二芯片单元12的最下层为一金属层时,该金属层即可视为接合层单元13,并在该金属层上制作多数个输出输入接合元件,也就是说,接合层单元13与第二芯片12也可以一体成型的方式制作,并不局限于第一较佳实施例中分别制作的方式而实施。 Referring to FIG. 6, the biggest difference between the second preferred embodiment and the first preferred embodiment is: when the bottom layer of the second chip unit 12 is a metal layer, the metal layer can be regarded as the bonding layer unit 13, And make a plurality of input and output bonding elements on the metal layer, that is to say, the bonding layer unit 13 and the second chip 12 can also be made in an integrated manner, not limited to the way of making them separately in the first preferred embodiment And implement.

3.集成电路的封装结构的第三较佳实施例 3. The third preferred embodiment of the packaging structure of the integrated circuit

参阅图7,由于包含所述电路元件CKT1~CKTn的第一芯片单元11并不需要如现有技术般的分别设置于一导线架或是一基板上,因此,在本较佳实施例中,是将多数个第一芯片单元1同时设置于一晶圆片10(Wafer)中,并配合一对应的第二芯片单元12,经由第二芯片单元12的孔径将每一第一芯片单元1的导电脚位(Pin)与一具有多数个输出输入接合元件131的接合层单元13电连接,所以,若是需要进行封装时,每一第一芯片单元11与对应的第二芯片单元12,及接合层单元13可直接共同进行封装,然后经由晶圆切割的程序后,即可得到多数个分别具有所述电路元件CKT1~CKTn的晶粒D1~Dm,换句话说,本较佳实施例可以有效缩减每一具有所述电路元件CKT1~CKTn的晶粒的面积。 Referring to FIG. 7, since the first chip units 11 including the circuit elements CKT1~CKTn do not need to be respectively arranged on a lead frame or a substrate as in the prior art, in this preferred embodiment, A plurality of first chip units 1 are arranged in a wafer 10 (Wafer) at the same time, and a corresponding second chip unit 12 is arranged, and each first chip unit 1 is separated through the aperture of the second chip unit 12 The conductive pin (Pin) is electrically connected to a bonding layer unit 13 having a plurality of output and input bonding elements 131, so if packaging is required, each first chip unit 11 is connected to the corresponding second chip unit 12, and bonded The layer units 13 can be directly packaged together, and then through the wafer dicing process, a plurality of dies D1~Dm respectively having the circuit elements CKT1~CKTn can be obtained. In other words, this preferred embodiment can effectively The area of each die having the circuit elements CKT1 - CKTn is reduced.

本发明与现有技术最大的不同点在于,本发明将该第一芯片单元与该第二芯片单元贴合之后,该第一芯片单元得以经由该等第二芯片单元中的孔径接收一组参考电压以进行测试,因此,并非如现有技术一般,将晶圆切割成多数个晶粒后,再将晶粒置于导线架或是基板上以进行封装测试,因此,相较于现有技术而言,本发明整合该第一芯片单元、第二芯片单元、接合层单元于该集成电路中,即可经由该输出输入接合元件对该第一与第二芯片单元进行测试与使用,并且无须经过一般封装程序(如:设置表面粘着型(SMT)接脚、或是以打线接合型(WB)进行芯片封装),即可直接将该第一芯片单元切割成多数个晶粒,因此,相较于现有技术而言,可以有效降低封装测试成本及缩减芯片封装后的面积大小,故确实能达成本发明的目的。 The biggest difference between the present invention and the prior art is that, after bonding the first chip unit and the second chip unit in the present invention, the first chip unit can receive a set of references through the apertures in the second chip units. Therefore, it is not as in the prior art that the wafer is cut into a plurality of dies, and then the dies are placed on a lead frame or a substrate for packaging and testing. Therefore, compared with the prior art In other words, the present invention integrates the first chip unit, the second chip unit, and the bonding layer unit in the integrated circuit, so that the first and second chip units can be tested and used through the input-input bonding element without After general packaging procedures (such as: setting surface mount type (SMT) pins, or wire bonding (WB) chip packaging), the first chip unit can be directly cut into multiple dies. Therefore, Compared with the prior art, the packaging and testing cost can be effectively reduced and the size of the packaged chip area can be reduced, so the purpose of the present invention can indeed be achieved.

以上所述,仅为本发明的较佳实施例,并非用以此限定本发明的专利范围,举凡依本发明专利精神所作的等效变化与修饰等,均同理属于本发明的专利保护范围内。 The above is only a preferred embodiment of the present invention, and is not used to limit the scope of the patent of the present invention. All equivalent changes and modifications made according to the spirit of the patent of the present invention belong to the scope of protection of the patent of the present invention. Inside.

Claims (9)

1.一种集成电路的封装结构,其特征在于,所述集成电路的封装结构包含: 1. A packaging structure for an integrated circuit, characterized in that the packaging structure for an integrated circuit comprises: 一第一芯片单元;以及 a first chip unit; and 一第二芯片单元,其与所述第一芯片单元电性连接,所述第二芯片单元具有至少一半导体层与至少一金属层,且第二芯片单元具有多数个贯穿所述半导体层与金属层的孔径;其中,每一孔径分别贯穿第二芯片单元,且第一芯片单元与一输出输入接合元件电性连接。 A second chip unit, which is electrically connected to the first chip unit, the second chip unit has at least one semiconductor layer and at least one metal layer, and the second chip unit has a plurality of Apertures of the layer; wherein, each aperture respectively penetrates the second chip unit, and the first chip unit is electrically connected to an input-output joint element. 2.如权利要求1所述集成电路的封装结构,其特征在于,所述第二芯片单元还具有一接合金属层,且根据半导体工艺将所述接合金属层制作出多数个输出输入接合元件。 2 . The packaging structure of the integrated circuit according to claim 1 , wherein the second chip unit further has a bonding metal layer, and the bonding metal layer is fabricated into a plurality of input and output bonding elements according to a semiconductor process. 3.如权利要求1所述集成电路的封装结构,其特征在于,所述集成电路的封装结构还包含一接合层单元,且根据半导体工艺将所述接合层单元制作出多数个输出输入接合元件。 3. The packaging structure of the integrated circuit according to claim 1, characterized in that, the packaging structure of the integrated circuit further comprises a bonding layer unit, and the bonding layer unit is made into a plurality of output and input bonding elements according to the semiconductor process . 4.如权利要求3所述集成电路的封装结构,其特征在于,所述第一芯片单元、第二芯片单元及接合层单元封装成一集成电路模组。 4. The packaging structure of an integrated circuit according to claim 3, wherein the first chip unit, the second chip unit and the bonding layer unit are packaged into an integrated circuit module. 5.如权利要求1所述集成电路的封装结构,其特征在于,所述第二芯片单元的面积大于第一芯片单元的面积。 5. The packaging structure of an integrated circuit according to claim 1, wherein the area of the second chip unit is larger than the area of the first chip unit. 6.如权利要求1所述集成电路的封装结构,其特征在于,所述第二芯片单元的面积等于第一芯片单元的面积。 6. The packaging structure of the integrated circuit according to claim 1, wherein the area of the second chip unit is equal to the area of the first chip unit. 7.如权利要求1所述集成电路的封装结构,其特征在于,所述第一芯片单元与第二芯片单元封装成一集成电路模组。 7. The packaging structure of an integrated circuit according to claim 1, wherein the first chip unit and the second chip unit are packaged into an integrated circuit module. 8.如权利要求1所述集成电路的封装结构,其特征在于,所述半导体层的材质为硅。 8. The packaging structure of an integrated circuit according to claim 1, wherein the semiconductor layer is made of silicon. 9.如权利要求1所述集成电路的封装结构,其特征在于,所述半导体层的材质为砷化镓。 9 . The packaging structure of the integrated circuit according to claim 1 , wherein the material of the semiconductor layer is gallium arsenide.
CN2012100784895A 2012-03-22 2012-03-22 Package structure of integrated circuit Pending CN103325773A (en)

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WO2000001208A1 (en) * 1998-06-30 2000-01-06 Formfactor, Inc. Assembly of an electronic component with spring packaging
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* Cited by examiner, † Cited by third party
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US5490040A (en) * 1993-12-22 1996-02-06 International Business Machines Corporation Surface mount chip package having an array of solder ball contacts arranged in a circle and conductive pin contacts arranged outside the circular array
WO2000001208A1 (en) * 1998-06-30 2000-01-06 Formfactor, Inc. Assembly of an electronic component with spring packaging
US6379982B1 (en) * 2000-08-17 2002-04-30 Micron Technology, Inc. Wafer on wafer packaging and method of fabrication for full-wafer burn-in and testing
US20060065976A1 (en) * 2004-09-24 2006-03-30 Min-Chih Hsuan Method for manufacturing wafer level chip scale package structure
US20060228825A1 (en) * 2005-04-08 2006-10-12 Micron Technology, Inc. Method and system for fabricating semiconductor components with through wire interconnects

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Application publication date: 20130925