CN103305116B - A kind of photocuring anti-reflection film coating liquid and preparation method thereof and application - Google Patents
A kind of photocuring anti-reflection film coating liquid and preparation method thereof and application Download PDFInfo
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Abstract
The invention discloses a kind of photocuring anti-reflection film coating liquid and preparation method thereof and application, belong to organic chemistry and organic materials technical field.This coating liquid comprises as follows by the component of mass percentage: acrylate prepolymer body 1 ~ 5%, hollow nano silica 1 ~ 10% of surface modification, the nano silicon 0 ~ 10% of surface modification, thinner 1 ~ 10%, photosensitizers 0.01 ~ 0.5%, adhesion promoter 0.01 ~ 0.5%, all the other are solvent.Namely photocuring anti-reflection film coating liquid is obtained after each component being mixed.The preparation method that anti-reflection film coating liquid is solidified in the present invention is simple, do not need thermal treatment, reduce energy consumption, improve working efficiency, can be applicable to the surfaces such as opticglass, solar covering, mobile phone screen, PC, PET, PMMA and other transparent organic board, improve its transmitance to light, there is high sticking power and hardness, in addition ageing-resistant, antifouling property etc.
Description
Technical field
The present invention relates to organic chemistry and organic materials technical field, particularly a kind of photocuring anti-reflection film coating liquid and preparation method thereof and application.
Background technology
At present, anti-reflection film coating liquid is mixed film forming matter preparation mainly with silica dioxide granule or titanium dioxide granule and obtains.The anti-reflection film coating liquid of this formula, after film forming, all just will can reach required antireflective effect through high-temperature process.
As CN 101995589A discloses a kind of preparation method of antireflecting silicon dioxide film, take tetraethoxy as raw material, obtain silicon dioxide gel by sol-gel method, obtain anti-reflection film coating liquid by adding a little auxiliary, then obtain antireflecting silicon dioxide film by film, thermal treatment.Thermal treatment need about 400 DEG C several hours.
More method processes several minutes by after the coating liquid plated film containing inorganic oxide nanoparticles at about 700 DEG C, realizes anti-reflection film film process.Such process, consume energy high, working efficiency is low again; And this technique can only operate at inorganic material surface, PC(polycarbonate can not be applied to), PET(polyethylene terephthalate), PMMA(polymethylmethacrylate) etc. non-refractory organic transparent material surface, play antireflective effect.
Summary of the invention
Primary and foremost purpose of the present invention is that the shortcoming overcoming prior art is with not enough, provides a kind of photocuring anti-reflection film coating liquid.
Another object of the present invention is to the preparation method that a kind of above-mentioned photocuring anti-reflection film coating liquid is provided.
The present invention also aims to the application that above-mentioned photocuring anti-reflection film coating liquid is provided.
For realizing aforementioned invention object, the technical solution used in the present invention is as follows:
A kind of photocuring anti-reflection film coating liquid, comprises as follows by the component of mass percentage:
Acrylate prepolymer body 1 ~ 5%
Hollow nano silica 1 ~ 10% of surface modification
The nano silicon 0 ~ 10% of surface modification
Thinner 1 ~ 10%
Photosensitizers 0.01 ~ 0.5%
Adhesion promoter 0.01 ~ 0.5%
All the other are solvent.
Described acrylate prepolymer body is preferably one or more the mixture in the polyacrylate resin etc. of urethane acrylate, Epocryl, polyether acrylate resins, acrylate functional.
The external diameter of the hollow nano silica dioxide granule of described surface modification is preferably 20 ~ 200 nm, and internal diameter is preferably 5 ~ 150 nm.
The particle diameter of the nanometer silicon dioxide particle of described surface modification is preferably 20 ~ 150 nm.
Described thinner is preferably one or more the mixture in methacrylic acid-beta-hydroxy ethyl ester, 1,6-hexylene glycol double methacrylate, Viscoat 295 etc.
Described photosensitizers is preferably alpha-hydroxyalkyl benzophenone class, as one or both compositions in 2-hydroxy-2-methyl-1-phenyl-acetone, 1-hydroxycyclohexyl phenyl ketone etc.
Described adhesion promoter is preferably 3-aminopropyl triethoxysilane, N-(2-aminoethyl)-3-aminopropyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl triethoxysilane, 3-(2,3-epoxy third oxygen) propyl trimethoxy silicane, one or more mixture in 3-(2,3-epoxy third oxygen) propyl-triethoxysilicane, 3-(methacryloxypropyl) propyl trimethoxy silicane etc.
Described solvent is preferably methyl alcohol, ethanol, n-propyl alcohol, Virahol, propyl carbinol, isopropylcarbinol, the trimethyl carbinol, Pentyl alcohol, 2-methyl-1-butene alcohol, 3-methyl-1-butanol, 2, 2-dimethyl propyl alcohol, hexalin, tetrahydrofuran (THF), ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol bis methyl ether, ethylene glycol bis ether, ethylene glycol bis methyl ether acetate, propylene glycol, propylene glycol monomethyl ether, dihydroxypropane single-ether, Propylene Glycol Dimethyl Ether, propylene glycol diethyl ether, propylene glycol monomethyl ether acetate, butyleneglycol monomethyl ether, butyleneglycol list ether, butyleneglycol monomethyl ether acetate, dioxane, dimethyl formamide, acetonitrile, acetone, methyl ethyl ketone, pimelinketone, methylene dichloride, trichloromethane, tetrachloromethane, ethyl acetate, propyl acetate, ethylene dichloride ethyl acetate, one or more mixtures in butylacetate etc.
The preparation method of above-mentioned photocuring anti-reflection film coating liquid comprises following steps: join in solvent by the hollow nano silicon-dioxide of the acrylate prepolymer body of described mass percentage, surface modification, the nano silicon of surface modification, thinner, photosensitizers, adhesion promoter, mix, obtain photocuring anti-reflection film coating liquid.
Above-mentioned photocuring anti-reflection film coating liquid not only can be applied to the unorganic glass surfaces such as opticglass, solar covering, mobile phone screen, also can be applied to the transparent organic board surface of polymer that is representative such as PC, PET, PMMA, improve its transmitance to light, there is high sticking power and hardness, in addition ageing-resistant, antifouling property etc.
A kind of photocuring anti-reflection film adopts above-mentioned photocuring anti-reflection film coating liquid to prepare.
The present invention has the following advantages and effect relative to prior art tool:
(1) coating liquid film-forming resin disclosed by the invention is polyacrylate polymers, all higher with the sticking power of unorganic glass base material and organic polymer base material, thus not only can be applied to inorganic material surface, also can be applied to organic polymer material surface;
(2) owing to adopting the mode of ultraviolet radiation-curable, do not need high temperature, curing speed is fast, thus not only can reduce energy consumption, also greatly enhance productivity;
(3) hollow silica adopted in coating liquid disclosed in this invention and nanometer silicon dioxide particle more easily construct the rete of porous, reduce specific refractory power, improve the transmitance of light;
(4) solidification anti-reflection film coating liquid of the present invention belongs to inorganic/organic Hybrid Materials, take full advantage of both advantages, organic polymer part is conducive to film forming and improves toughness, and inorganic part is then conducive to giving the high sticking power of rete, hardness, ageing-resistant, antifouling property etc.
Embodiment
Below in conjunction with embodiment, further detailed description is done to the present invention, but embodiments of the present invention are not limited thereto.
Embodiment 1
In the ethanol of 73 mass parts, the number-average molecular weight adding 1 mass parts is about 10,000 urethane acrylates, (solid content is 5wt% to the hollow silica sol of 20 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd., 3-(2, 3-epoxy third oxygen) propyl trimethoxy silicane modification, external diameter is 70 nm, internal diameter 50 nm), 2 mass parts methacrylic acid-beta-hydroxy ethyl esters, 3 mass parts 1, 6-hexylene glycol double methacrylate, 0.1 mass parts 2-hydroxy-2-methyl-1-phenyl-acetone and 0.01 mass parts 3-aminopropyl triethoxysilane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt crystal pulling method plated film on PC plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 8.2%.The hardness adopting pencil hardometer to measure rete is 5 H, and the sticking power adopting cross-hatching to measure rete is 0 grade.Anti-reflection film sample is radiation 240 h in ultraviolet ageing case, and be determined at visible region average transmittances drop-out value, rete and sheet material do not have xanthochromia; Anti-reflection film sample relative humidity be 85%, temperature be in the constant temperature constant humidity baking oven of 85 DEG C place 40 days, be determined at visible region average transmittances drop-out value; Sample is warmed up to 80 DEG C in 1 h, keeps 0.5 h, then in 2 h, cool to-20 DEG C, then keep 0.5 h, this completes a circulation, and after completing circulation 200 times altogether, working sample is in visible region average transmittances drop-out value.Result is as shown in table 1, the result of table 1 illustrate the radiation hardness of this rete and weather resistance good.
Embodiment 2
In the butanols of 15 mass parts, the number-average molecular weight adding 1 mass parts is about 5000 Epocryls, 40 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 10wt% for the hollow silica sol of solvent with propylene glycol monomethyl ether acetate, the modification of 3-(methacryloxypropyl) Trimethoxy silane, external diameter is 30 nm, internal diameter is 10 nm's), 33 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 30% for the silicon sol of solvent with propylene glycol monomethyl ether acetate, particle diameter is 100 nm), 10 mass parts methacrylic acid-beta-hydroxy ethyl esters, 0.5 mass parts 2-hydroxy-2-methyl-1-phenyl-acetone and 0.1 mass parts 3-(methacryloxypropyl) propyl trimethoxy silicane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PMMA plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 5.4%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
Embodiment 3
In the tetrahydrofuran (THF) of 41.5 mass parts, the number-average molecular weight adding 2 mass parts is about 3000 polyether acrylate resins, 30 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 10wt% for the hollow silica sol of solvent with propylene glycol monomethyl ether, the modification of 3-(methacryloxypropyl) hydroxypropyl methyl dimethoxysilane, external diameter is 20 nm, internal diameter is 5 nm), 25 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 20wt% for the silicon sol of solvent with propylene glycol monomethyl ether, particle diameter is 150 nm, 3-(methacryloxypropyl) hydroxypropyl methyl diethoxy silane modification), 1 mass parts Viscoat 295, 0.01 mass parts 1-hydroxycyclohexyl phenyl ketone and 0.5 mass parts 3-(2, 3-epoxy third oxygen) propyl trimethoxy silicane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PMMA plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 5.8%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
Embodiment 4
In the tetrahydrofuran (THF) of 59.5 mass parts, the number-average molecular weight adding 2 mass parts is about the polyacrylate resin of the acrylate functional of 3000, 30 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 10wt% for the hollow silica sol of solvent with butanone, divinyl tetramethyl disiloxane modification, external diameter is 120 nm, internal diameter is 90 nm), 5 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 20wt% for the silicon sol of solvent with butanone, particle diameter is 20 nm, 3-(methacryloxypropyl) propyl-dimethyl Ethoxysilane modification), 3 mass parts 1, 6-hexylene glycol double methacrylate, 0.1 mass parts 2-hydroxy-2-methyl-1-phenyl-acetone, 0.1 mass parts 1-hydroxycyclohexyl phenyl ketone, 0.1 mass parts 3-(2, 3-epoxy third oxygen) propyl trimethoxy silicane and 0.2 mass parts 3-(methacryloxypropyl) propyl trimethoxy silicane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PMMA plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 5.1%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
Embodiment 5
In the methyl alcohol of 13.4 mass parts, the number-average molecular weight adding 2 mass parts is about the Epocryl of 5000, 1 mass fraction average molecular weight is about 4000 polyether acrylate resins, 60 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 10wt% for the hollow silica sol of solvent with methyl alcohol, the external diameter of hexamethyldisilazane modification is 200 nm, internal diameter is 50 nm), 15 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 20wt% for the silicon sol of solvent with methyl alcohol, particle diameter is 20 nm, 3-(methacryloxypropyl) propyl-triethoxysilicane modification), 8 mass parts methacrylic acid-beta-hydroxy ethyl esters, 0.4 mass parts 1-hydroxycyclohexyl phenyl ketone and 0.2 mass parts 3-aminopropyl triethoxysilane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PMMA plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 4.3%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
Embodiment 6
In the Virahol of 88 mass parts, the number-average molecular weight adding 1 mass parts is about the Epocryl of 5000,10 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. take Virahol as solvent, solid content is 10wt%, the external diameter of hexa methyl silazane modification is 50 nm, wall thickness is 10 nm hollow silica sol, 1 mass parts methacrylic acid-beta-hydroxy ethyl ester, 0.01 mass parts 1-hydroxycyclohexyl phenyl ketone and 0.01 mass parts 3-aminopropyl triethoxysilane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PMMA plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700nm scope light improves 6.1%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
Embodiment 7
In the acetone of 18 mass parts, the number-average molecular weight adding 5 mass parts is about the Epocryl of 5000, 33 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 30wt% for the hollow silica sol of solvent with butylacetate, the external diameter of hexamethyldisilazane modification is 30 nm, internal diameter is 10 nm), 20 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 30wt% for the silicon sol of solvent with butylacetate, hexamethyldisilazane modification, particle diameter is 50 nm), 13 mass parts Zhangjiagang Churen New Materials Technology Co., Ltd. be that (solid content is 30wt% for the silicon sol of solvent with butylacetate, hexamethyldisilazane modification, particle diameter is 20 nm), 10 mass parts methacrylic acid-beta-hydroxy ethyl esters, 0.5 mass parts 2-hydroxy-2-methyl-1-phenyl-acetone and 0.5 mass parts 3-(2, 3-epoxy third oxygen) propyl trimethoxy silicane, mix, obtain photocuring anti-reflection film coating liquid.
Adopt spread coating plated film on PC plate, illumination 2 minutes under ultraviolet lamp after solvent evaporates, adopt Shimadzu UV-3600 ultraviolet-visible spectrophotometer to measure, the transmitance of 400-700 nm scope light improves 3.7%.Other indication test method is identical with embodiment 1, and result is as shown in table 1.
The fundamental property of table 1 anti-reflection film
| Embodiment | Anti-reflection rate | Sticking power | Hardness | Wet-hot aging performance * | High-low temperature resistant cycle performance * | Ultraviolet light resistant performance * |
| 1 | 8.2 | 0 | 5 H | Pass through | Pass through | Pass through |
| 2 | 5.4 | 0 | 6 H | Pass through | Pass through | Pass through |
| 3 | 5.8 | 1 | 5 H | Pass through | Pass through | Pass through |
| 4 | 5.1 | 1 | 6 H | Pass through | Pass through | Pass through |
| 5 | 4.3 | 0 | 7 H | Pass through | Pass through | Pass through |
| 6 | 6.1 | 0 | 4 H | Pass through | Pass through | Pass through |
| 7 | 3.7 | 0 | 8 H | Pass through | Pass through | Pass through |
Note *: according to " photovoltaic antireflective coating glass " industry standard, test before and after light transmission rate change be less than 1% be through.
Finally it is to be noted; above preferred embodiment is only for illustration of content of the present invention; in addition; the present invention also has other embodiments; in every case those skilled in the art are because of technology involved in the present invention enlightenment, and the technical scheme adopting equivalent replacement or equivalent deformation mode to be formed all drops in protection scope of the present invention.
Claims (8)
1. a photocuring anti-reflection film coating liquid, is characterized in that comprising as follows by the component of mass percentage:
All the other are solvent;
Described acrylate prepolymer body is one or more the mixture in the polyacrylate resin of urethane acrylate, Epocryl, polyether acrylate resins, acrylate functional;
Described adhesion promoter is 3-aminopropyl triethoxysilane, N-(2-aminoethyl)-3-aminopropyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl triethoxysilane, 3-(2,3-epoxy third oxygen) propyl-triethoxysilicane, 3-(2,3-epoxy third oxygen) propyl trimethoxy silicane, one or more mixture in 3-(methacryloxypropyl) propyl trimethoxy silicane;
Described thinner is one or more the mixture in methacrylic acid-beta-hydroxy ethyl ester, 1,6-hexylene glycol double methacrylate, Viscoat 295.
2. photocuring anti-reflection film coating liquid according to claim 1, is characterized in that: the external diameter of the hollow nano silica dioxide granule of described surface modification is 20 ~ 200nm, and internal diameter is 5 ~ 150nm.
3. photocuring anti-reflection film coating liquid according to claim 1, is characterized in that: the particle diameter of the nanometer silicon dioxide particle of described surface modification is 20 ~ 150nm.
4. photocuring anti-reflection film coating liquid according to claim 1, is characterized in that:
Described photosensitizers is alpha-hydroxyalkyl benzophenone class.
5. photocuring anti-reflection film coating liquid according to claim 1, it is characterized in that: described solvent is methyl alcohol, ethanol, n-propyl alcohol, Virahol, propyl carbinol, isopropylcarbinol, the trimethyl carbinol, Pentyl alcohol, 2-methyl-1-butene alcohol, 3-methyl-1-butanol, 2, 2-dimethyl propyl alcohol, hexalin, tetrahydrofuran (THF), ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol bis methyl ether, ethylene glycol bis ether, ethylene glycol bis methyl ether acetate, propylene glycol, propylene glycol monomethyl ether, dihydroxypropane single-ether, Propylene Glycol Dimethyl Ether, propylene glycol diethyl ether, propylene glycol monomethyl ether acetate, butyleneglycol monomethyl ether, butyleneglycol list ether, butyleneglycol monomethyl ether acetate, dioxane, dimethyl formamide, acetonitrile, acetone, methyl ethyl ketone, pimelinketone, methylene dichloride, trichloromethane, tetrachloromethane, ethyl acetate, propyl acetate, ethylene dichloride ethyl acetate, one or more mixtures in butylacetate.
6. the preparation method of the photocuring anti-reflection film coating liquid described in any one of claim 1-5, it is characterized in that comprising following steps: the hollow nano silicon-dioxide of the acrylate prepolymer body of described mass percentage, surface modification, the nano silicon of surface modification, thinner, photosensitizers, adhesion promoter are joined in solvent, mix, obtain photocuring anti-reflection film coating liquid.
7. the application of the photocuring anti-reflection film coating liquid described in any one of claim 1-5 in optical glass surface, solar covering surface, surperficial, the transparent organic board surface of mobile phone screen.
8. a photocuring anti-reflection film, is characterized in that: adopt the photocuring anti-reflection film coating liquid plated film on base material described in any one of claim 1-5 to obtain.
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| CN109370335A (en) * | 2018-10-18 | 2019-02-22 | Oppo广东移动通信有限公司 | Hardening paint, hardening fluid and mobile phone case |
| CN109456625A (en) * | 2018-11-15 | 2019-03-12 | 江苏赫尔斯镀膜技术有限公司 | Photocuring antireflection layer and its preparation method and application, heat absorption film and its preparation method and application |
| JP6840215B1 (en) * | 2019-11-29 | 2021-03-10 | 日本化工塗料株式会社 | Method for manufacturing active energy ray-curable composition for antiglare hard coat and antiglare hard coat film |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1847305A (en) * | 2005-04-12 | 2006-10-18 | 触媒化成工业株式会社 | Composition for forming low refractive index film and substrate with cured film |
| CN101501130A (en) * | 2006-08-04 | 2009-08-05 | 纳幕尔杜邦公司 | Low refractive index composition |
| CN102503165A (en) * | 2011-10-15 | 2012-06-20 | 浙江大学 | Preparation method of antireflection film on glass surface |
| CN102985499A (en) * | 2010-07-08 | 2013-03-20 | Lg化学株式会社 | Antireflection film and method for manufacturing same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003292831A (en) * | 2002-04-02 | 2003-10-15 | Toppan Printing Co Ltd | Coating agent having low refractive index and reflection preventive film |
| KR101226229B1 (en) * | 2011-08-26 | 2013-01-28 | 주식회사 엘지화학 | Anti-reflective coating film |
-
2013
- 2013-06-17 CN CN201310238786.6A patent/CN103305116B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1847305A (en) * | 2005-04-12 | 2006-10-18 | 触媒化成工业株式会社 | Composition for forming low refractive index film and substrate with cured film |
| CN101501130A (en) * | 2006-08-04 | 2009-08-05 | 纳幕尔杜邦公司 | Low refractive index composition |
| CN102985499A (en) * | 2010-07-08 | 2013-03-20 | Lg化学株式会社 | Antireflection film and method for manufacturing same |
| CN102503165A (en) * | 2011-10-15 | 2012-06-20 | 浙江大学 | Preparation method of antireflection film on glass surface |
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