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CN103290373B - A kind of horizontal type multi-target vacuum sputtering or ion plating machine - Google Patents

A kind of horizontal type multi-target vacuum sputtering or ion plating machine Download PDF

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CN103290373B
CN103290373B CN201310177002.3A CN201310177002A CN103290373B CN 103290373 B CN103290373 B CN 103290373B CN 201310177002 A CN201310177002 A CN 201310177002A CN 103290373 B CN103290373 B CN 103290373B
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target
sputtering
coating machine
rotating cage
coater
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CN103290373A (en
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周小平
翁惠军
杨庆忠
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Ningbo Yunsheng Equipment Technology Co Ltd
Ningbo Yunsheng Magnet Components Technology Co Ltd
Ningbo Yunsheng Co Ltd
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NINGBO YUNSHENG ELECTROMECHANICAL EQUIPMENT Co Ltd
Ningbo Yunsheng Magnet Components Technology Co Ltd
Ningbo Yunsheng Co Ltd
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Abstract

一种卧式多靶真空溅射或离子镀膜机,包括镀膜机炉体、镀膜机中的传动输出部件、弧靶、溅射靶、真空抽吸口和工件架,镀膜机炉体内分为二个区域,区域一布置多个弧靶,多个弧靶设置在镀膜机炉体的下方靠近镀膜机炉体内壁,区域二布置多个溅射靶,多个溅射靶设置在镀膜机炉体中心上方的对应工件架中空位置的镀膜机炉体内腔中,工件架设置放置工件的转动件和动力输入机构,工件架进入镀膜机炉体内时转动件可以在弧靶和溅射靶之间通过,工件架的动力输入机构与镀膜机中的传动输出部件耦合而带动转动件转动,镀膜机炉体中心或靠近中心设有真空抽吸口。本发明有效防止弧靶与溅射靶的相互污染,提高了镀层效率和镀层质量。

A horizontal multi-target vacuum sputtering or ion coating machine, comprising a coating machine furnace body, a transmission output part in the coating machine, an arc target, a sputtering target, a vacuum suction port and a workpiece frame, and the coating machine furnace body is divided into two parts. Multiple arc targets are arranged in zone 1, and multiple arc targets are arranged under the furnace body of the coating machine close to the inner wall of the furnace body of the coating machine. Multiple sputtering targets are arranged in zone 2, and multiple sputtering targets are arranged on the furnace body of the coating machine In the furnace body cavity of the coating machine corresponding to the hollow position of the workpiece rack above the center, the workpiece rack is provided with a rotating part and a power input mechanism for placing the workpiece. When the workpiece rack enters the furnace body of the coating machine, the rotating part can pass between the arc target and the sputtering target , the power input mechanism of the workpiece rack is coupled with the transmission output part in the coating machine to drive the rotating parts to rotate, and a vacuum suction port is provided at or near the center of the furnace body of the coating machine. The invention effectively prevents the mutual pollution of the arc target and the sputtering target, and improves the coating efficiency and coating quality.

Description

一种卧式多靶真空溅射或离子镀膜机A horizontal multi-target vacuum sputtering or ion coating machine

技术领域 technical field

本发明涉及真空镀膜技术领域,特别涉及用于部分替代电镀工艺的卧式多靶真空溅射或离子镀膜机。 The invention relates to the technical field of vacuum coating, in particular to a horizontal multi-target vacuum sputtering or ion coating machine for partially replacing the electroplating process.

背景技术 Background technique

电镀在工业中应用已久,但由于在电镀过程中有三废排放对环境污染严重,需大量投资治理又难根治,近些年来国内外进行了广泛的研究,部分采用离子镀代替电镀技术,特别是立式多靶真空溅射或离子镀膜机得到了较快的发展,主要以挂镀为主,其缺点是比较适合特定工件的镀膜,与电镀比被镀件的适应性较差,很难实现工件滚镀的效果。 Electroplating has been used in industry for a long time, but due to the serious environmental pollution caused by the discharge of three wastes in the electroplating process, a large amount of investment is required to treat it and it is difficult to cure it. It is the vertical multi-target vacuum sputtering or ion coating machine that has been developed rapidly. It is mainly used for rack plating. Its disadvantage is that it is more suitable for the coating of specific workpieces. Realize the effect of barrel plating on the workpiece.

卧式多靶真空溅射或离子镀膜机目前在加速发展中,主要用于滚镀小形工件,如螺钉、螺母、多边形薄片、圆环、圆片、各种多边形块件和易碎工件如磁性材料各种形状的多边形块件等。 Horizontal multi-target vacuum sputtering or ion coating machines are currently under accelerated development, mainly used for barrel plating small workpieces, such as screws, nuts, polygonal sheets, rings, discs, various polygonal pieces and fragile workpieces such as magnetic Materials Polygonal blocks of various shapes, etc.

卧式多靶真空溅射或离子镀膜机的滚镀技术,目前大多处于小批试产阶段,相对于产业化应用还有很多技术难题需要攻克,要提高卧式多靶真空溅射或离子镀膜机的生产效率,在镀膜机内设置的弧靶和溅射靶要尽可能的多,使镀膜机单位时间内激发出来的镀层离子尽可能多,要防止弧镀与溅射镀的相互污染,要有利于工件架的布局和真空抽吸口的设置,使工件架的结构能有效地避开各种弧靶和溅射靶的制约,一次装料工件量要大,工件上下料要快捷,所以卧式多靶真空溅射或离子镀膜机的产业化应用有待深入研究和开发。 The barrel plating technology of horizontal multi-target vacuum sputtering or ion coating machine is mostly in the stage of small batch trial production. Compared with industrial application, there are still many technical problems to be overcome. To improve the horizontal multi-target vacuum sputtering or ion coating In order to improve the production efficiency of the machine, the number of arc targets and sputtering targets set in the coating machine should be as many as possible, so that the coating ions can be excited as much as possible in a unit time of the coating machine, and the mutual pollution of arc plating and sputtering plating should be prevented. It should be beneficial to the layout of the workpiece rack and the setting of the vacuum suction port, so that the structure of the workpiece rack can effectively avoid the constraints of various arc targets and sputtering targets, the amount of workpieces loaded at one time should be large, and the loading and unloading of workpieces should be fast Therefore, the industrial application of horizontal multi-target vacuum sputtering or ion coating machine needs further research and development.

发明内容 Contents of the invention

本发明所要解决的技术问题是提供用于部分替代电镀工艺的一种卧式多靶真空溅射或离子镀膜机,该镀膜机使工件架整体进出方便,工件上下料快捷,镀层适应性广,生产效率高,适合产业化应用要求。 The technical problem to be solved by the present invention is to provide a horizontal multi-target vacuum sputtering or ion coating machine for partially replacing the electroplating process. The coating machine makes it easy to enter and exit the workpiece frame as a whole, quick loading and unloading of the workpiece, and wide adaptability of the coating. High production efficiency, suitable for industrial application requirements.

本发明解决上述技术问题所采用的技术方案为:一种卧式多靶真空溅射或离子镀膜机,包括镀膜机炉体、镀膜机中的传动输出部件、弧靶、溅射靶、真空抽吸口和工件架,镀膜机炉体内分为二个区域,区域一布置多个弧靶,多个弧靶设置在镀膜机炉体靠近镀膜机炉体内壁,区域二布置多个溅射靶,多个溅射靶设置在镀膜机炉体对应工件架中空位置的镀膜机炉体内腔中,工件架设置放置工件的转动件和动力输入机构,工件架进入镀膜机炉体内时转动件可以在弧靶和溅射靶之间通过,工件架的动力输入机构与镀膜机中的传动输出部件耦合而带动转动件转动,镀膜机炉体中心或靠近中心设有真空抽吸口。 The technical solution adopted by the present invention to solve the above-mentioned technical problems is: a horizontal multi-target vacuum sputtering or ion coating machine, including a coating machine furnace body, a transmission output part in the coating machine, an arc target, a sputtering target, a vacuum pump Suction port and workpiece holder, the furnace body of the coating machine is divided into two areas, multiple arc targets are arranged in the first area, and the multiple arc targets are set on the furnace body of the coating machine close to the inner wall of the furnace body of the coating machine, and multiple sputtering targets are arranged in the second area, A plurality of sputtering targets are set in the furnace body cavity of the coating machine corresponding to the hollow position of the workpiece rack. The workpiece rack is provided with a rotating part and a power input mechanism for placing the workpiece. When the workpiece rack enters the furnace body of the coating machine, the rotating part can The target and the sputtering target pass through, the power input mechanism of the workpiece holder is coupled with the transmission output part in the coating machine to drive the rotating part to rotate, and a vacuum suction port is provided at or near the center of the furnace body of the coating machine.

上述多个弧靶设置在镀膜机炉体的下方靠近镀膜机炉体内壁,多个溅射靶设置在镀膜机炉体中心上方的对应工件架中空位置的镀膜机炉体内腔中。 The plurality of arc targets are arranged below the furnace body of the coating machine and close to the inner wall of the furnace body of the coating machine, and the plurality of sputtering targets are arranged in the inner cavity of the furnace body of the coating machine corresponding to the hollow position of the workpiece holder above the center of the furnace body of the coating machine.

上述真空抽吸口面积占镀膜机炉体内壁围成的面积的20%~60%,最好为30%~45%。 The area of the above-mentioned vacuum suction port accounts for 20%-60% of the area enclosed by the inner wall of the coating machine furnace, preferably 30%-45%.

上述溅射靶是圆柱体结构,并且可围绕圆柱体轴心旋转。 The above-mentioned sputtering target is a cylindrical structure and can rotate around the axis of the cylinder.

上述溅射靶分为相对排列的二组,一组溅射靶靠近镀膜机炉体内壁,另一组溅射靶设置在镀膜机炉体中心上方的对应工件架中空位置的镀膜机炉体内腔中,这样溅射效果更好。 The above-mentioned sputtering targets are divided into two groups arranged oppositely. One group of sputtering targets is close to the inner wall of the furnace body of the coating machine, and the other group of sputtering targets is set in the inner cavity of the furnace body of the coating machine corresponding to the hollow position of the workpiece holder above the center of the furnace body of the coating machine. In this way, the sputtering effect is better.

上述弧靶区域和溅射靶区域设有屏蔽挡板分隔。 The arc target area and the sputtering target area are separated by shielding baffles.

上述转动件包括转笼行星架和转笼,转笼行星架安装多个转笼驱动部件,每个转笼驱动部件装有转笼,动力输入机构驱动转笼行星架转动,转笼行星架带动动力传递件运动,动力传递件与安装在工件架外支架上的链轮啮合的同时带动多个转笼驱动部件转动,转笼驱动部件带动转笼转动,使转笼行星架公转与转笼自转。 The above-mentioned rotating parts include a rotating cage planetary frame and a rotating cage. The rotating cage planetary frame is equipped with a plurality of rotating cage driving parts. Each rotating cage driving part is equipped with a rotating cage. The power input mechanism drives the rotating cage planetary frame to rotate, and the rotating cage planetary frame drives The power transmission part moves, and the power transmission part meshes with the sprocket installed on the outer bracket of the workpiece frame to drive multiple rotating cage driving parts to rotate, and the rotating cage driving part drives the rotating cage to rotate, so that the rotating cage planetary frame revolves and the rotating cage rotates .

上述转笼行星架与转笼驱动部件的传动均为链轮,动力传递件为链条,这样传递动力结构紧凑。 The transmission of the above-mentioned rotating cage planet carrier and the rotating cage driving part is a sprocket, and the power transmission part is a chain, so that the power transmission structure is compact.

使用时,工件放置在工件架的转笼上,工件架通过移动小车或其他移动件进出镀膜机炉体,完成工件下料与上料工作。工件架移入镀膜机炉体时,镀膜机炉体中的传动输出部件与工件架的动力输入机构偶合,带动转笼行星架进行公转与转笼自转,可以对工件进行弧镀和溅射镀。 When in use, the workpiece is placed on the rotating cage of the workpiece holder, and the workpiece holder enters and exits the furnace body of the coating machine through a moving trolley or other moving parts to complete the work of workpiece unloading and loading. When the workpiece rack is moved into the furnace body of the coating machine, the transmission output part in the furnace body of the coating machine is coupled with the power input mechanism of the workpiece rack, driving the planetary cage to revolve and the cage to rotate, and the workpiece can be arc-plated and sputter-plated.

本发明的有益效果:镀膜机工件架整体进出方便,工件上料与下料操作在镀膜机炉体外进行,工件上下料快捷,有利于工件架整体工件上料后,便于工件在镀膜机炉体外进行其它工艺炉镀前工艺预处理,有效提高镀膜机中工作效率和工件镀层质量。 Beneficial effects of the present invention: the workpiece frame of the coating machine is easy to enter and exit as a whole, the loading and unloading operations of the workpiece are carried out outside the furnace body of the coating machine, and the loading and unloading of the workpiece is fast, which is beneficial to the overall workpiece loading of the workpiece frame and facilitates the workpiece to be placed outside the furnace body of the coating machine Carry out pretreatment before plating in other process furnaces to effectively improve the working efficiency of the coating machine and the coating quality of the workpiece.

工件架带动转笼可以穿越弧镀区域和溅射镀区域,保证镀膜机单位时间内激发出来的镀层离子尽可能多地轰击被镀工件,使被镀工件均匀分布在弧靶与溅射靶之间,一次装料实现弧镀与溅射镀的复合工艺,弧镀提高镀层堆积速度,溅射镀改善镀层质量,有效地提高镀膜机生产效率和镀层质量。 The workpiece rack drives the rotating cage to pass through the arc plating area and the sputtering plating area, ensuring that the coating ions excited by the coating machine per unit time bombard the plated workpiece as much as possible, so that the plated workpiece is evenly distributed between the arc target and the sputtering target In one charge, the combined process of arc plating and sputtering plating is realized. Arc plating improves the deposition speed of the coating, and sputtering improves the quality of the coating, effectively improving the production efficiency and coating quality of the coating machine.

由于重力的作用被镀工件一般都堆积在转笼的下方,所以区域一布置多个弧靶,设置在镀膜机炉体的下方,弧镀效率更高。区域二布置多个溅射靶,设置在镀膜机炉体的上方,多个溅射靶分为相对排列的二组,一组溅射靶靠近镀膜机炉体内壁,另一组溅射靶设置在镀膜机炉体中心上方的对应工件架中空位置的镀膜机炉体内腔中,工件架中的转笼可以在二组溅射靶之间通过,另一组溅射靶对堆积在转笼下方的工件溅射镀效率更高。 Due to the effect of gravity, the workpieces to be plated are generally piled up under the rotating cage, so multiple arc targets are arranged in area 1, and they are placed under the furnace body of the coating machine, so that the arc plating efficiency is higher. Multiple sputtering targets are arranged in area 2, which are set above the furnace body of the coating machine. The multiple sputtering targets are divided into two groups arranged oppositely. One group of sputtering targets is close to the inner wall of the coating machine furnace, and the other group of sputtering targets is set In the inner cavity of the coating machine furnace corresponding to the hollow position of the workpiece rack above the center of the coating machine furnace body, the rotating cage in the workpiece rack can pass between the two groups of sputtering targets, and the other group of sputtering target pairs is piled up under the rotating cage The workpiece sputtering plating efficiency is higher.

屏蔽挡板把弧镀区域和溅射镀区域分隔,可以有效防止弧镀与溅射镀的相互污染,提高设备运行可靠性。 The shielding baffle separates the arc plating area from the sputtering plating area, which can effectively prevent the mutual contamination of arc plating and sputtering plating, and improve the reliability of equipment operation.

在镀膜机炉体中心附近设置真空抽吸口,有效提高真空抽吸效率,提高镀膜机系统生产效率。 A vacuum suction port is installed near the center of the furnace body of the coating machine to effectively improve the vacuum suction efficiency and improve the production efficiency of the coating machine system.

附图说明 Description of drawings

图1为本发明实施例卧式多靶真空溅射或离子镀膜机中,多个弧靶、溅射靶和转笼的布局示意图。 Fig. 1 is a schematic layout diagram of multiple arc targets, sputtering targets and a rotating cage in a horizontal multi-target vacuum sputtering or ion coating machine according to an embodiment of the present invention.

图2本发明实施例卧式多靶真空溅射或离子镀膜机与工件架安装关系。 Fig. 2 is the installation relationship between the horizontal multi-target vacuum sputtering or ion coating machine and the workpiece holder according to the embodiment of the present invention.

图3本发明实施例工件架的结构。 Fig. 3 is the structure of the workpiece rack of the embodiment of the present invention.

图4 本发明实施例工件架进出镀膜机的方式。 Fig. 4 The manner in which the workpiece rack enters and exits the coating machine according to the embodiment of the present invention.

其中图中的标记如下:1镀膜机炉体;2镀膜机炉体内壁;3弧靶;4溅射靶;5转笼;6被镀工件;7弧靶与溅射靶屏蔽挡板;8镀膜机炉体中的传动输出部件;9炉体内壁导轨;10工件架支承轮;11动力传递链条;12链条张紧器;13链轮;14镀膜机炉体中的真空吸口;15移动小车;16小车导轨;17工件架外支架;18转笼行星架;19转笼驱动部件;20动力输入机构;21固定在工件架外支架上的链轮;22工件架。 The marks in the figure are as follows: 1 Coating machine furnace body; 2 Coating machine furnace inner wall; 3 Arc target; 4 Sputtering target; Transmission output parts in the furnace body of the coating machine; 9 Guide rails on the inner wall of the furnace; 10 Supporting wheels of the workpiece rack; 11 Power transmission chain; 12 Chain tensioner; 13 Sprocket; 14 Vacuum suction port in the furnace body of the coating machine; ; 16 trolley guide rail; 17 workpiece rack outer support; 18 rotating cage planetary frame; 19 rotating cage drive components; 20 power input mechanism;

具体实施方式 detailed description

下面结合附图和实施例对本发明进一步说明。 The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

如图1、图2所示,镀膜机炉体内壁2分为二个区域,区域一H布置多个弧靶3,设置在镀膜机炉体1的下方,区域二Z布置多个溅射靶4,设置在镀膜机炉体1的上方。 As shown in Figure 1 and Figure 2, the inner wall 2 of the coating machine furnace is divided into two areas, a plurality of arc targets 3 are arranged in area 1 H, which is arranged under the furnace body 1 of the coating machine, and multiple sputtering targets are arranged in area 2 Z 4. Set above the furnace body 1 of the coating machine.

溅射靶4是圆柱体结构,并且可围绕圆柱体轴心旋转。 The sputtering target 4 is a cylindrical structure and can rotate around the axis of the cylinder.

溅射靶4分为相对排列的二组,一组溅射靶4a靠近镀膜机炉体内壁2,另一组溅射靶4b设在镀膜机炉体中心上方对应工件架22中空位置的镀膜机炉体内腔中,工件架22中的转笼5可以在一组溅射靶4a和另一组溅射靶4b之间通过。 The sputtering targets 4 are divided into two groups arranged oppositely, one group of sputtering targets 4a is close to the inner wall 2 of the furnace body of the coating machine, and the other group of sputtering targets 4b is set on the coating machine corresponding to the hollow position of the workpiece holder 22 above the center of the coating machine furnace body In the inner cavity of the furnace, the rotating cage 5 in the workpiece holder 22 can pass between one group of sputtering targets 4a and another group of sputtering targets 4b.

屏蔽挡板7把弧靶区域H和溅射靶区域Z分隔,屏蔽挡板7分隔弧靶区域H和溅射靶区域Z。 The shielding baffle 7 separates the arc target area H from the sputtering target area Z, and the shielding baffle 7 separates the arc target area H from the sputtering target area Z.

在镀膜机炉体1靠近中心设有真空抽吸口14,真空抽吸口14面积占镀膜机炉体内壁2围成的面积的20%~60%,最好是30%~45%。 A vacuum suction port 14 is provided near the center of the coating machine furnace body 1, and the area of the vacuum suction port 14 accounts for 20% to 60% of the area surrounded by the coating machine furnace body wall 2, preferably 30% to 45%.

如图3所示,工件架22包括带转笼驱动部件1的转笼5、工件架支承轮10、转笼行星架18、工件架的动力输入机构20。 As shown in FIG. 3 , the workpiece carrier 22 includes a rotating cage 5 with a rotating cage driving part 1 , a workpiece carrier support wheel 10 , a rotating cage planet carrier 18 , and a power input mechanism 20 of the workpiece carrier.

如图4所示,工件架22架在移动小车15上,在移动小车15上可朝A向或B向定向移动。 As shown in FIG. 4 , the workpiece frame 22 is mounted on the moving trolley 15 , and can move toward the A direction or the B direction on the moving trolley 15 .

当工件架22整体进出镀膜机炉体1时,移动小车15的二侧小车导轨16分别与炉体内壁导轨9对齐,工件架B向移动,工件架移出镀膜机炉体1,图1中被镀工件6在镀膜机炉体1外作下料操作,完成下料后,装上转笼5和被镀工件6,工件架A向移动,进入镀膜机炉体1中,完成工件下料与上料工作。 When the workpiece rack 22 enters and exits the furnace body 1 of the coating machine as a whole, the trolley guide rails 16 on both sides of the moving trolley 15 are respectively aligned with the guide rails 9 on the inner wall of the furnace. The plated workpiece 6 is unloaded outside the coating machine furnace body 1. After the blanking is completed, the rotating cage 5 and the coated workpiece 6 are loaded, and the workpiece rack A moves to enter the coating machine furnace body 1 to complete the workpiece blanking and processing. Loading work.

工件架22移入镀膜机炉体1时,镀膜机炉体中的传动输出部件8与工件架的动力输入机构20偶合,带动转笼行星架18进行公转,见图2,转笼行星架18安装有多个转笼驱动部件19,见图3,每个转笼驱动部件19装有链轮13,动力传递链条11与多个转笼驱动部件的链轮13啮合的同时与固定在工件架外支架17上的链轮21啮合,链条张紧器12张紧动力传递链条11,实现转笼行星架18公转与转笼5自转运动,见图2。 When the workpiece frame 22 is moved into the furnace body 1 of the coating machine, the transmission output part 8 in the furnace body of the coating machine is coupled with the power input mechanism 20 of the workpiece frame to drive the planetary carrier 18 to revolve, as shown in Figure 2, the planetary carrier 18 is installed There are a plurality of tumbler drive parts 19, as shown in Fig. 3, each tumbler drive part 19 is equipped with a sprocket 13, and the power transmission chain 11 is fixed outside the workpiece frame while engaging with the sprocket 13 of a plurality of tumbler drive parts The sprocket 21 on the bracket 17 is engaged, and the chain tensioner 12 tensions the power transmission chain 11 to realize the revolution of the planet carrier 18 and the rotation of the cage 5, as shown in FIG. 2 .

Claims (8)

  1. null1. a horizontal type multi-target vacuum sputtering or ion plating machine,It is characterized in that: include coater body of heater、Transmission output member in coater、Arc target、Sputtering target、Vacuum draw mouth and a work rest,It is divided into Two Areas in coater body of heater,Multiple arc target is arranged in region one,Multiple arc targets are arranged on coater body of heater near coater inboard wall of furnace body,Multiple sputtering target is arranged in region two,Multiple sputtering targets are arranged in the coater body of heater inner chamber of the corresponding described work rest inner hollow position of coater body of heater,Work rest arranges tumbler and the power input mechanism placing workpiece,Time in work rest entrance coater body of heater, tumbler can pass through between arc target and sputtering target,And sputtering target enters into the inner hollow position of work rest,The power input mechanism of work rest couples with the transmission output member in coater and drives tumbler to rotate,Coater body of heater center or close center are provided with vacuum draw mouth;Described tumbler includes rotating cage planet carrier and rotating cage, rotating cage planet carrier installs multiple rotating cage driver parts, each rotating cage driver part is equipped with rotating cage, power input mechanism drives rotating cage planet carrier to rotate, rotating cage planet carrier drives power transmission part motion, driving multiple rotating cage driver part to rotate while power transmission part and the sprocket engagement being arranged on work rest support arm, rotating cage driver part drives rotating cage to rotate, and makes the revolution of rotating cage planet carrier and rotating cage rotation.
  2. 2. according to the horizontal type multi-target vacuum sputtering or ion plating machine described in claim l, it is characterized in that: the plurality of arc target is arranged on the lower section of coater body of heater near coater inboard wall of furnace body, in the coater body of heater inner chamber of the corresponding work rest hollow position that multiple sputtering targets are arranged on coater body of heater overcentre.
  3. 3. according to the horizontal type multi-target vacuum sputtering or ion plating machine described in claim l, it is characterised in that: described vacuum draw open area accounts for the 20% ~ 60% of the area that coater inboard wall of furnace body surrounds.
  4. Horizontal type multi-target vacuum sputtering or ion plating machine the most according to claim 3, it is characterised in that: described vacuum draw open area accounts for the 30% ~ 45% of the area that coater inboard wall of furnace body surrounds.
  5. 5. according to the horizontal type multi-target vacuum sputtering or ion plating machine described in claim l, it is characterised in that: described sputtering target is cylindrical structure, and can rotate around cylinder axle center.
  6. 6. according to the horizontal type multi-target vacuum sputtering or ion plating machine described in claim l, it is characterized in that: described sputtering target is divided into two groups of arranged opposite, one group of sputtering target is in coater inboard wall of furnace body, the coater body of heater inner chamber of the corresponding work rest hollow position that another group sputtering target is arranged on coater body of heater overcentre.
  7. 7. according to the horizontal type multi-target vacuum sputtering or ion plating machine described in claim l, it is characterised in that: arc target region and sputtering target region are provided with shielding barrier partitions.
  8. Horizontal type multi-target vacuum sputtering or ion plating machine the most according to claim 1, it is characterised in that: described rotating cage planet carrier is sprocket wheel with the transmission of rotating cage driver part, and power transmission part is chain.
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CN104174544B (en) * 2014-08-26 2016-06-08 法柯特科技(江苏)有限公司 Target airless spraying produces equipment
CN106086792A (en) * 2016-06-24 2016-11-09 李晓马 A kind of stainless-steel vacuum plated film horizontal chamber furnace (oven)
CN105970161A (en) * 2016-06-24 2016-09-28 李晓马 Stainless steel vacuum multi-arc ion plating horizontal furnace
US20180327897A1 (en) * 2017-05-12 2018-11-15 Applied Materials, Inc. Re-deposition free sputtering system
CN108359943A (en) * 2018-01-18 2018-08-03 维达力实业(深圳)有限公司 Variable gear ratio tunnel type sputter coating machine
CN108300974B (en) * 2018-04-28 2019-01-25 深圳市正和忠信股份有限公司 PVD Tumble-plating device and method
CN113699493B (en) * 2021-08-30 2023-10-10 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) Cluster beam deposition equipment for realizing wide nanoparticle beam

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