CN103290362A - Bottom-coating-free process - Google Patents
Bottom-coating-free process Download PDFInfo
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- CN103290362A CN103290362A CN2013101676962A CN201310167696A CN103290362A CN 103290362 A CN103290362 A CN 103290362A CN 2013101676962 A CN2013101676962 A CN 2013101676962A CN 201310167696 A CN201310167696 A CN 201310167696A CN 103290362 A CN103290362 A CN 103290362A
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- 238000000034 method Methods 0.000 title abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 11
- 239000011248 coating agent Substances 0.000 claims abstract description 9
- 230000001681 protective effect Effects 0.000 claims abstract description 9
- 238000004140 cleaning Methods 0.000 claims abstract description 7
- 238000001704 evaporation Methods 0.000 claims abstract description 7
- 238000007747 plating Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 3
- 210000002469 basement membrane Anatomy 0.000 claims 3
- 210000004379 membrane Anatomy 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 2
- 230000002000 scavenging effect Effects 0.000 claims 1
- 239000002585 base Substances 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- 238000003912 environmental pollution Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 20
- 239000000758 substrate Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 241000283973 Oryctolagus cuniculus Species 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
本发明公开了一种免底涂工艺,包括以下步骤:(1)对镀件表面进行高压离子清洗;(2)对清洗后的镀件表面镀基膜,并镀上有机硅等离子重合SiOx;(3)在真空室内对涂有基膜的镀件进行蒸发镀膜,真空度为3×10-2Pa;(4)在炉内对镀膜后的镀件附上保护膜,附保护膜时间为200s。本发明提高了产品附着力及抗酸碱能力,提高了工作效率,保证了产品品质的稳定性和一致性,减少了人为因素影响,以及环境污染等问题。The present invention discloses a primer-free process, comprising the following steps: (1) high-pressure ion cleaning of the surface of the plated piece; (2) coating the surface of the plated piece after cleaning with a base film, and coating with organic silicon plasma superposition SiO x ; (3) evaporating the plated piece coated with the base film in a vacuum chamber, with a vacuum degree of 3×10 -2 Pa; (4) attaching a protective film to the plated piece after coating in a furnace, with the protective film attaching time being 200 seconds. The present invention improves the adhesion and acid and alkali resistance of the product, improves the work efficiency, ensures the stability and consistency of the product quality, and reduces the impact of human factors, as well as environmental pollution and other problems.
Description
技术领域 technical field
本发明涉及镀膜工艺技术领域,具体涉及一种免底涂工艺。 The invention relates to the technical field of coating technology, in particular to a primer-free technology. the
背景技术 Background technique
国内现有镀膜工艺均采用在产品表面喷一层薄而亮的底漆,烘烤后置入真空室内,再进行蒸发镀膜。待解除真空之后,取出再在膜层上喷涂保护漆,以防止空气对膜层的氧化,且各个环节分开进行,使层与层之间不可避免要受到灰尘等污染,从而影响膜层质量,而且按这种工艺生产的产品附着力低,抗酸,抗氧化能力低,会造成膜层脱落导致产品寿命短。 The existing domestic coating process adopts spraying a layer of thin and bright primer on the surface of the product, putting it into a vacuum chamber after baking, and then performing evaporation coating. After the vacuum is released, take it out and spray protective paint on the film layer to prevent the air from oxidizing the film layer, and each link is carried out separately, so that the layers will inevitably be polluted by dust and the like, thus affecting the quality of the film layer. Moreover, the product produced by this process has low adhesion, acid resistance, and low oxidation resistance, which will cause the film layer to fall off and cause the product to have a short life. the
发明内容 Contents of the invention
(一)要解决的技术问题 (1) Technical problems to be solved
本发明要解决的技术问题是提供一种环保且性能优异的免底涂工艺。 The technical problem to be solved by the present invention is to provide an environment-friendly and excellent-performance primer-free process. the
(二)技术方案 (2) Technical plan
为解决上述技术问题,本发明所采用的技术方案是:一种免底涂工艺,包括以下步骤:(1)对镀件表面进行高压离子清洗;(2)对清洗后的镀件表面镀基膜,并镀上有机硅等离子重合SiOx;(3)在真空室内对涂有基膜的镀件进行蒸发镀膜,真空度为3×10-2Pa;(4)在炉内对镀膜后的镀件附上保护膜,附保护膜时间为200s。 In order to solve the above technical problems, the technical solution adopted in the present invention is: a primer-free process, comprising the following steps: (1) carrying out high-pressure ion cleaning to the surface of the plated piece; (2) plating base on the surface of the plated piece after cleaning film, and coated with organic silicon plasma superimposition SiO x ; (3) Evaporate and coat the plated piece coated with the base film in a vacuum chamber with a vacuum degree of 3×10 -2 Pa; The protective film is attached to the plated parts, and the time for attaching the protective film is 200s.
(三)有益效果 (3) Beneficial effects
本发明相比较于现有技术,具有如下有益效果:其提高了产品附着力及抗酸碱能力,提高了工作效率,保证了产品品质的稳定性和一致性,减少了人为因素影响,以及环境污染等问题。 Compared with the prior art, the present invention has the following beneficial effects: it improves product adhesion and acid and alkali resistance, improves work efficiency, ensures the stability and consistency of product quality, reduces the influence of human factors, and the environment pollution etc. the
具体实施方式 Detailed ways
下面结合实施例,对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明,但不用来限制本发明的范围。 Below in conjunction with the examples, the specific implementation of the present invention will be further described in detail. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention. the
一种兔底涂工艺,包括以下步骤:(1)对镀件表面进行高压离子清洗,并烘干,离子清洗是依靠离子体中活性粒子的“活化作用”达到去除物体表面污渍的目的;(2)对清洗后的镀件表面镀基膜;基膜主要是使产品有更好的附着力;基膜是在蒸发的低分子量有机材料之间,由于放电作用引起的反应,在镀件上淀积成薄膜。采用有机硅等离子重合SiOx,提高铝层的附着力和防腐蚀性能,作为膜层的衰减保护,以提高膜层的表面张力和硬度等,这样形成的薄膜均匀,没有针孔,附着力很强,具有很好的疏水性和耐化学腐蚀性能。(3)在真空室内对涂有基膜的镀件进行蒸发镀膜,真空度为3×10-2Pa;蒸发镀膜是指在真空条件下,用蒸发器加热蒸发物质使之汽化,蒸发粒子流直接射向基片并在基片上沉积形成固态薄膜;(4)在炉内对镀膜后的镀件附上保护膜,附保护膜时间为200s;保护膜则是为了防止空气对膜层的氧化。 A rabbit bottom coating process, comprising the following steps: (1) high-pressure ion cleaning is carried out on the surface of the plated parts, and drying, and the ion cleaning is to rely on the "activation" of active particles in the ion body to achieve the purpose of removing stains on the surface of objects; 2) Coating a base film on the surface of the cleaned plated parts; the base film is mainly to make the product have better adhesion; the base film is between the evaporated low molecular weight organic materials, due to the reaction caused by the discharge, on the plated deposited as a thin film. Silicone plasma is used to superimpose SiO x to improve the adhesion and anti-corrosion performance of the aluminum layer, as the attenuation protection of the film layer, to improve the surface tension and hardness of the film layer, so that the formed film is uniform, without pinholes, and the adhesion is very good Strong, good hydrophobicity and chemical resistance. (3) Evaporation coating is carried out on the plated parts coated with the base film in a vacuum chamber, the vacuum degree is 3×10 -2 Pa; evaporation coating refers to heating the evaporation material with an evaporator to vaporize it under vacuum conditions, and the evaporation particle flow Directly shoot to the substrate and deposit on the substrate to form a solid film; (4) attach a protective film to the plated parts in the furnace, and the time of attaching the protective film is 200s; the protective film is to prevent air from oxidizing the film layer .
按此工艺所镀产品通过了附着力试验、反射镜劣化试验及耐温试验。 The products plated according to this process have passed the adhesion test, mirror deterioration test and temperature resistance test. the
耐温试验:本试验由低温试验和高温试验组成,试验设备均符合GB2423.1和GB2423.2试验设备的有关要求。主要的试验结果如下: Temperature resistance test: This test consists of a low temperature test and a high temperature test, and the test equipment meets the relevant requirements of GB2423.1 and GB2423.2 test equipment. The main test results are as follows:
附着力试验:用锋利刀片(刀锋角度为15°~30°)在测试样本表面划10×10个1mm×1mm小网格,每一条划线深及油漆的底层;用毛刷将测试区域的碎片刷干净;用粘附力350g/cm2~400g/cm2的胶带(3M600号胶纸或等同)牢牢粘住被测试小网格,并用橡皮擦用力擦拭胶带,以加大胶带与被测区域的接触面积及力度;用手抓住胶带一端,在垂直方向(90°)迅速扯下胶纸,同一位置进行2次相同试验。我们曾随机抽取用此工艺所镀产品进行此项试验,结果均合格,划线边缘光滑,在划线的边缘及交叉点均无脱落现象。 Adhesion test: draw 10×10 small grids of 1mm×1mm on the surface of the test sample with a sharp blade (the blade angle is 15°~30°), and each line is as deep as the bottom layer of the paint; use a brush to wipe the surface of the test area Brush the debris clean; use adhesive tape (3M600 adhesive paper or equivalent) with an adhesion of 350g/cm 2 to 400g/cm 2 to firmly stick the small grid under test, and wipe the tape vigorously with an eraser to increase the contact between the tape and the substrate. Measure the contact area and strength of the area; grab one end of the tape with your hand, quickly tear off the tape in the vertical direction (90°), and perform the same test twice at the same position. We have randomly selected products plated with this process for this test, and the results are all qualified, the edge of the scribed line is smooth, and there is no shedding phenomenon at the edge and intersection of the scribed line.
反射镜劣化试验:把试样置于高温试验箱内1h,取出放置常温,然后逐项进行耐酸、碱、盐试验。我们对用此工艺所镀产品进行了此项试验,试验后检查试样无变形、腐蚀等缺陷。 Mirror deterioration test: Put the sample in the high-temperature test chamber for 1 hour, take it out and place it at room temperature, and then carry out acid, alkali and salt resistance tests one by one. We have carried out this test on the products plated by this process. After the test, we check that the samples have no defects such as deformation and corrosion. the
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明技术原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。 The above is only a preferred embodiment of the present invention, it should be pointed out that for those of ordinary skill in the art, without departing from the technical principle of the present invention, some improvements and modifications can also be made. These improvements and modifications It should also be regarded as the protection scope of the present invention. the
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CN2013101676962A CN103290362A (en) | 2013-04-23 | 2013-04-23 | Bottom-coating-free process |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003253428A (en) * | 2002-03-07 | 2003-09-10 | Sanyo Shinku Kogyo Kk | Method and system for film deposition onto resin substrate |
CN101153380A (en) * | 2006-09-27 | 2008-04-02 | 宝山钢铁股份有限公司 | Vacuum production method for SiOx coating on organic precoating metal sheet |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003253428A (en) * | 2002-03-07 | 2003-09-10 | Sanyo Shinku Kogyo Kk | Method and system for film deposition onto resin substrate |
CN101153380A (en) * | 2006-09-27 | 2008-04-02 | 宝山钢铁股份有限公司 | Vacuum production method for SiOx coating on organic precoating metal sheet |
Non-Patent Citations (1)
Title |
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朱俊: "轿车车灯的镀铝和免底涂技术", 《制造技术与材料》 * |
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Application publication date: 20130911 |