Flip LED chips welding protection structure
Technical field
The invention relates to flip LED chips, is specifically related to its welding protection structure.
Background technology
When flip LED chips being carried out the solid brilliant welding of upside-down mounting, for example scolder such as tin cream, silver slurry may excessively be climbed up chip.Only in die bottom surface P ohmic contact layer and N ohmic contact layer are carried out the passivation insulation in the prior art; avoiding weld is to be short-circuited between the P ohmic contact layer of die bottom surface and the N ohmic contact layer; but do not consider the excessive more upper strata of climbing to of scolder meeting; so the insulation protection measure is not implemented on the more upper strata to the chip sidewall; and the existing P type of the sidewall that has on chip layer; the N-type layer is arranged again; for example the sidewall of P electrode one side is followed successively by the P ohmic contact layer from die bottom surface to chip end face; the P semiconductor layer; active illuminating layer; N semiconductor layer and substrate; so when carrying out the welding of P electrode; if the excessive sidewall of climbing up this side of scolder touches the N semiconductor layer, will cause P; direct short-circuit or electric leakage between the N.
Summary of the invention
The purpose of the invention is direct short-circuit or electric leakage between P, the N when preventing the solid brilliant welding of flip LED chips upside-down mounting.
Provide flip LED chips welding protection structure, the existing P type of the first side wall of chip layer has the N-type layer again, it is characterized in that for this reason, and the insulated passivation layer of the first side wall covers to the substrate bottom surface from die bottom surface.Before being passivated layer covering, the first side wall begins to be etched to the substrate bottom surface from die bottom surface.The passivation layer outside that covers the first side wall flushes in the substrate of homonymy.The passivation material that covers the first side wall is SiO
2, SiN
x, SiNO
xOr Al
2O
3
Second sidewall that P type layer and N-type layer are not arranged simultaneously of chip also insulated passivation layer covers to the substrate bottom surface from die bottom surface.Before being passivated layer covering, second sidewall begins to be etched to the substrate bottom surface from die bottom surface.The passivation layer outside that covers second sidewall flushes in the substrate of homonymy.The passivation material that covers second sidewall is SiO
2, SiN
x, SiNO
xOr Al
2O
3
Beneficial effect: during the solid brilliant welding of flip-chip, swash even scolder is excessive, owing to there is passivation layer to carry out insulation protection at the sidewall of chip, the P type layer of this side and N-type layer just can short circuits or have been leaked electricity yet.Be preferably in passivation layer and cover first etching sidewall before, the overlapping operation of passivation layer is easier to realize like this, and can allow the passivation layer outside flush in the substrate of homonymy, thereby makes chip sides neat.
Description of drawings
Fig. 1 is flip LED chips welding protection structural representation.
Embodiment
As Fig. 1, flip LED chips comprises substrate 1, N semiconductor layer 2, N ohmic contact layer 3, active illuminating layer 4, P semiconductor layer 5 and P ohmic contact layer 6.In die bottom surface P ohmic contact layer and N ohmic contact layer are carried out the passivation insulation and form passivation layer 80, avoiding weld is to be short-circuited between the P ohmic contact layer 6 of die bottom surface and the N ohmic contact layer 3, and this is prior art.
Among the figure, left side wall is the first side wall, and right side wall is second sidewall.As seen from the figure: the existing P type of the first side wall layer 5,6 has N-type layer 2 again; Second sidewall has N- type layer 2,3 but do not have P type layer, belongs to the sidewall that P type layer and N-type layer are not arranged simultaneously.
The first side wall begins to be etched to substrate 1 bottom surface from die bottom surface, and insulated passivation layer 81 covers to substrate 1 bottom surface from die bottom surface then, and passivation layer 81 outsides that cover the first side wall flush in the substrate 1 of homonymy; Second sidewall begins to be etched to substrate 1 bottom surface from die bottom surface, and insulated passivation layer 82 covers to substrate 1 bottom surface from die bottom surface then, and passivation layer 82 outsides that cover second sidewall flush in the substrate 1 of homonymy.So far form the welding protection structure.
Passivation layer 80,81,82 materials are SiO
2, SiN
x, SiNO
xOr Al
2O
3