Summary of the invention
A kind ofly do not have high permeability at 10.3~11.3 μ m spectral coverages at still having in the prior art, simultaneously at 0.9~10.15 μ m and the wide LONG WAVE INFRARED optical filter that ends of 11.45~20 μ m spectral coverages.The LONG WAVE INFRARED optical filter that provides a kind of 10.3~11.3 μ m to see through is provided one of purpose of the present invention, and described optical filter has high permeability at 10.3~11.3 μ m spectral coverages, simultaneously in 0.9~10.15 μ m and 11.45~20 wide ending of μ m spectral coverage.
Two of purpose of the present invention is to provide the preparation method of the LONG WAVE INFRARED optical filter that a kind of 10.3~11.3 μ m see through.
Purpose of the present invention is achieved through the following technical solutions.
A kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, and described optical filter comprises the long-pass film system of substrate, substrate one side and the short-pass film system of substrate opposite side.
Wherein, described base material is germanium, and preferred size is: long 29.5mm, and wide 1.36mm, thick 1.2mm, preferred surface smooth finish is 40/20;
Long-pass film system comprises zinc sulphide (ZnS) rete and lead telluride (PbTe) rete of alternately stack, and structure is: ^5 ^5(0.36h0.72l0.36h (0.5hl0.5h) ^9(0.574l1.148h0.574l)), and centre wavelength is 7300nm; Wherein, h is the lead telluride rete, 0.5,1.148 and 0.36 coefficient that is respectively the corresponding basic thickness of lead telluride thicknesses of layers, 0.5h expression lead telluride thicknesses of layers is 0.5 basic thickness, 1.148h expression lead telluride thicknesses of layers is 1.148 basic thickness, 0.36h expression lead telluride thicknesses of layers is 0.36 basic thickness, l is the zinc sulphide rete, 1,0.574 and 0.72 coefficient that is respectively the corresponding basic thickness of ZnS-film layer thickness, l represents that the ZnS-film layer thickness is 1 basic thickness, 0.574l expression ZnS-film layer thickness is 0.574 basic thickness, 0.72l expression ZnS-film layer thickness is 0.72 basic thickness, described basic thickness is 1/4th of optical thickness centre wavelength, the periodicity of basic membrane stack (0.5hl0.5h) is 9, and the periodicity of basic membrane stack (0.574l1.148h0.574l) and basic membrane stack (0.36h0.72l0.36h) is 5.
Employing TFCalc software is optimized the structure that described long-pass film is, obtains preferred long-pass film to be, and is as shown in table 1, wherein, the number of plies is that 1 rete is the outermost layer of long-pass film system, and the number of plies is that 39 rete is deposited in the germanium substrate, is the innermost layer of long-pass film system;
Table 1 long-pass film system
。
Short-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and structure is: (lh) ^8, and centre wavelength is 14600nm; Wherein, l is the zinc sulphide rete, 1 is the coefficient of the corresponding basic thickness of ZnS-film layer thickness, l represents that the ZnS-film layer thickness is 1 basic thickness, h is the lead telluride rete, and 1 is the coefficient of the corresponding basic thickness of lead telluride thicknesses of layers, and h represents that the lead telluride thicknesses of layers is 1 basic thickness, described basic thickness is 1/4th of optical thickness centre wavelength, and the periodicity of basic membrane stack (lh) is 8.
Employing TFCalc software is optimized the structure that described short-pass film is, obtains preferred short-pass film to be, and is as shown in table 2, wherein, the number of plies is that 1 rete is the outermost layer of short-pass film system, and the number of plies is that 16 rete is deposited in the germanium substrate, is the innermost layer of short-pass film system;
Table 2 short-pass film system
。
A kind of 10.3~11.3 μ m of the present invention see through the preparation method of LONG WAVE INFRARED optical filter, and described method step is as follows:
(1) clean substrate is packed into the cleaning vacuum chamber in, be evacuated to 3.0 * 10
-3Pa;
(2) substrate is heated to 150 ℃, and keeps 30min;
(3) open the logical argon gas of the light-duty ion gun of Hall, airshed is 30sccm, and the unlatching cathode voltage is 100~200V, and anode voltage is 50~100V, makes that anode current is 0.5A; Adopt the thermal resistance evaporation method respectively at a side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit long-pass film system successively, at the opposite side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit short-pass film system successively, until the deposition of finishing described film system; Wherein, the rate of sedimentation of zinc sulphide rete is 2.0~3.0nm/s, and the rate of sedimentation of lead telluride rete is 0.8~1.0nm/s; Thicknesses of layers adopts the monitoring of light rule of three;
(4) substrate naturally cools to room temperature, obtains 10.3~11.3 μ m of the present invention and sees through the LONG WAVE INFRARED optical filter.
Beneficial effect
1. the invention provides a kind of 10.3~11.3 μ m and see through the LONG WAVE INFRARED optical filter, described optical filter reaches the excellent technique index: have high permeability τ at 10.3~11.3 μ m spectral coverages
Av〉=80%, in 0.9~10.15 μ m and 11.45~20 wide ending of μ m spectral coverage, end degree of depth τ in the cut-off region
λ<1%, half-power point wavelength franchise can be improved the characteristic of passband and the rejection zone of this spectral coverage optical filter greatly within 50nm, satisfy the request for utilization of remote sensing system, has high stability and high reliability;
2. the invention provides a kind of 10.3~11.3 μ m and see through the LONG WAVE INFRARED optical filter, the film system of described optical filter comprises zinc sulphide rete and the lead telluride rete of alternately stack, and film is that the number of plies is less;
3. the invention provides the preparation method that a kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, described method can make optical filter of the present invention, process stabilizing, and good reproducibility, easy and simple to handle, finished product rate height.
Embodiment 1
A kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, and described optical filter comprises the long-pass film system of germanium substrate, substrate one side and the short-pass film system of substrate opposite side.
Wherein, the long 29.5mm of described substrate, wide 1.36mm, thick 1.2mm, surface smoothness is 40/20.
Long-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and centre wavelength is 7300nm; Each rete parameter is as shown in table 3, and wherein, the number of plies is that 1 rete is the outermost layer of long-pass film system, and the number of plies is that 39 rete is deposited in the germanium substrate, is the innermost layer of long-pass film system;
Table 3 long-pass film system and thicknesses of layers monitoring
。
Short-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and centre wavelength is 14600nm, and each rete parameter is as shown in table 4, wherein, the number of plies is that 1 rete is the outermost layer of short-pass film system, and the number of plies is that 16 rete is deposited in the germanium substrate, is the innermost layer of short-pass film system;
Table 4 short-pass film system and thicknesses of layers monitoring
。
Preparation method's step of the described optical filter of present embodiment is as follows:
(1) removes impurity in the vacuum chamber with suction cleaner, dip in absolute ethyl alcohol wiped clean vacuum chamber inwall with absorbent gauze then; With analyzing pure acetone ultrasonic cleaning substrate 10min, again with the germanium substrate of analyzing straight alcohol ultrasonic cleaning substrate 10min, clean substrate is packed in the vacuum chamber of cleaning, be evacuated to 3.0 * 10
-3Pa;
(2) substrate is heated to 150 ℃, and keeps 30min;
(3) open the logical argon gas of the light-duty ion gun of Hall, airshed is 30sccm, and the unlatching cathode voltage is 100~200V, and anode voltage is 50~100V, makes that anode current is 0.5A; Adopt the thermal resistance evaporation method respectively at a side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit long-pass film system successively, at the opposite side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit short-pass film system successively, until the deposition of finishing described film system; Wherein, the rate of sedimentation of zinc sulphide rete is 2.0~3.0nm/s, and the rate of sedimentation of lead telluride rete is 0.8~1.0nm/s; Thicknesses of layers adopts the monitoring of light rule of three, and supervisory wavelength and number of times are shown in table 3 and table 4;
(4) substrate naturally cools to room temperature, obtains described 10.3~11.3 μ m of present embodiment and sees through the LONG WAVE INFRARED optical filter.
Described optical filter is carried out following performance test:
Adopt the test of the PE system of company 2000 infrared Fourier spectrometers, obtain transmitted spectrum as shown in Figure 1, with UVWINLAB software the spectral line among Fig. 1 is calculated, described optical filter is 84.61% at the mean transmissivity of 10.3~11.3 μ m spectral coverages as can be known, mean transmissivity at 0.9~10.15 μ m spectral coverage is 0.43% He, and the mean transmissivity of 1.45~20 μ m spectral coverages is 0.01%.
The present invention includes but be not limited to above embodiment, every any being equal to of carrying out under the spirit and principles in the present invention, replace or local improvement, all will be considered as within protection scope of the present invention.