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CN103245995A - 10.3 mu m-11.3 mu m transmissive long-wave infrared optical filter and preparation method - Google Patents

10.3 mu m-11.3 mu m transmissive long-wave infrared optical filter and preparation method Download PDF

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CN103245995A
CN103245995A CN2013101500842A CN201310150084A CN103245995A CN 103245995 A CN103245995 A CN 103245995A CN 2013101500842 A CN2013101500842 A CN 2013101500842A CN 201310150084 A CN201310150084 A CN 201310150084A CN 103245995 A CN103245995 A CN 103245995A
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CN103245995B (en
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王多书
董茂进
熊玉卿
张玲
王济洲
李晨
王超
高欢
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Lanzhou Institute of Physics of Chinese Academy of Space Technology
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Abstract

本发明涉及10.3~11.3μm透过长波红外滤光片及制备方法,属于光学薄膜技术领域。该滤光片包括锗基底和长、短波通膜系;长波通膜系结构为(0.5hl0.5h)^9(0.574l1.148h0.574l)^5(0.36h0.72l0.36h)^5,中心波长7300nm;短波通膜系结构为(lh)^8,中心波长14600nm;l和h分别为硫化锌和碲化铅膜层;通过真空中加热基底,离子源通氩气下电阻蒸发在基底两侧沉积长、短波通膜系,冷却后制得。该滤光片在10.3~11.3μm透过率高,0.9~10.15μm和11.45~20μm宽截止,膜系层数较少,满足遥感探测系统使用要求;该方法简便稳定,成品率高。

The invention relates to a 10.3-11.3 μm long-wave infrared filter and a preparation method thereof, and belongs to the technical field of optical thin films. The filter includes a germanium substrate and long-wave and short-wave pass films; the long-wave pass film structure is (0.5hl0.5h)^9 (0.574l1.148h0.574l)^5 (0.36h0.72l0.36h)^5, The central wavelength is 7300nm; the short-wave pass film structure is (lh)^8, and the central wavelength is 14600nm; l and h are zinc sulfide and lead telluride film layers respectively; the substrate is heated in vacuum, and the ion source is vaporized on the substrate under argon gas. Deposit long and short wave pass films on both sides, and make it after cooling. The optical filter has high transmittance at 10.3-11.3 μm, wide cut-offs at 0.9-10.15 μm and 11.45-20 μm, fewer film layers, and meets the requirements of remote sensing detection systems; the method is simple and stable, and the yield is high.

Description

10.3~11.3 μ m see through LONG WAVE INFRARED optical filter and preparation method
Technical field
The present invention relates to a kind of 10.3~11.3 μ m and see through LONG WAVE INFRARED optical filter and preparation method, specifically, relate to and a kind ofly have high permeability at 10.3~11.3 μ m spectral coverages, simultaneously at 0.9~10.15 μ m and the wide LONG WAVE INFRARED optical filter that ends of 11.45~20 μ m spectral coverages; Belong to optical film technology field.
Background technology
Be the optical filter of a key in the present remote sensing system at the optical filter that 10.3~11.3 μ m spectral coverages have a high permeability.In order to reduce the influence of signal noise, need in the remote sensing system light signal of 0.9~10.15 μ m and 11.45~20 μ m spectral coverages is suppressed.Therefore need that design is a kind of to have high permeability at 10.3~11.3 μ m spectral coverages badly, in 0.9~10.15 μ m and 11.45~20 wide ending of μ m spectral coverage, film quality LONG WAVE INFRARED optical filter preferably simultaneously.
Summary of the invention
A kind ofly do not have high permeability at 10.3~11.3 μ m spectral coverages at still having in the prior art, simultaneously at 0.9~10.15 μ m and the wide LONG WAVE INFRARED optical filter that ends of 11.45~20 μ m spectral coverages.The LONG WAVE INFRARED optical filter that provides a kind of 10.3~11.3 μ m to see through is provided one of purpose of the present invention, and described optical filter has high permeability at 10.3~11.3 μ m spectral coverages, simultaneously in 0.9~10.15 μ m and 11.45~20 wide ending of μ m spectral coverage.
Two of purpose of the present invention is to provide the preparation method of the LONG WAVE INFRARED optical filter that a kind of 10.3~11.3 μ m see through.
Purpose of the present invention is achieved through the following technical solutions.
A kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, and described optical filter comprises the long-pass film system of substrate, substrate one side and the short-pass film system of substrate opposite side.
Wherein, described base material is germanium, and preferred size is: long 29.5mm, and wide 1.36mm, thick 1.2mm, preferred surface smooth finish is 40/20;
Long-pass film system comprises zinc sulphide (ZnS) rete and lead telluride (PbTe) rete of alternately stack, and structure is: ^5 ^5(0.36h0.72l0.36h (0.5hl0.5h) ^9(0.574l1.148h0.574l)), and centre wavelength is 7300nm; Wherein, h is the lead telluride rete, 0.5,1.148 and 0.36 coefficient that is respectively the corresponding basic thickness of lead telluride thicknesses of layers, 0.5h expression lead telluride thicknesses of layers is 0.5 basic thickness, 1.148h expression lead telluride thicknesses of layers is 1.148 basic thickness, 0.36h expression lead telluride thicknesses of layers is 0.36 basic thickness, l is the zinc sulphide rete, 1,0.574 and 0.72 coefficient that is respectively the corresponding basic thickness of ZnS-film layer thickness, l represents that the ZnS-film layer thickness is 1 basic thickness, 0.574l expression ZnS-film layer thickness is 0.574 basic thickness, 0.72l expression ZnS-film layer thickness is 0.72 basic thickness, described basic thickness is 1/4th of optical thickness centre wavelength, the periodicity of basic membrane stack (0.5hl0.5h) is 9, and the periodicity of basic membrane stack (0.574l1.148h0.574l) and basic membrane stack (0.36h0.72l0.36h) is 5.
Employing TFCalc software is optimized the structure that described long-pass film is, obtains preferred long-pass film to be, and is as shown in table 1, wherein, the number of plies is that 1 rete is the outermost layer of long-pass film system, and the number of plies is that 39 rete is deposited in the germanium substrate, is the innermost layer of long-pass film system;
Table 1 long-pass film system
Figure BDA00003100525600021
Short-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and structure is: (lh) ^8, and centre wavelength is 14600nm; Wherein, l is the zinc sulphide rete, 1 is the coefficient of the corresponding basic thickness of ZnS-film layer thickness, l represents that the ZnS-film layer thickness is 1 basic thickness, h is the lead telluride rete, and 1 is the coefficient of the corresponding basic thickness of lead telluride thicknesses of layers, and h represents that the lead telluride thicknesses of layers is 1 basic thickness, described basic thickness is 1/4th of optical thickness centre wavelength, and the periodicity of basic membrane stack (lh) is 8.
Employing TFCalc software is optimized the structure that described short-pass film is, obtains preferred short-pass film to be, and is as shown in table 2, wherein, the number of plies is that 1 rete is the outermost layer of short-pass film system, and the number of plies is that 16 rete is deposited in the germanium substrate, is the innermost layer of short-pass film system;
Table 2 short-pass film system
Figure BDA00003100525600032
Figure BDA00003100525600041
A kind of 10.3~11.3 μ m of the present invention see through the preparation method of LONG WAVE INFRARED optical filter, and described method step is as follows:
(1) clean substrate is packed into the cleaning vacuum chamber in, be evacuated to 3.0 * 10 -3Pa;
(2) substrate is heated to 150 ℃, and keeps 30min;
(3) open the logical argon gas of the light-duty ion gun of Hall, airshed is 30sccm, and the unlatching cathode voltage is 100~200V, and anode voltage is 50~100V, makes that anode current is 0.5A; Adopt the thermal resistance evaporation method respectively at a side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit long-pass film system successively, at the opposite side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit short-pass film system successively, until the deposition of finishing described film system; Wherein, the rate of sedimentation of zinc sulphide rete is 2.0~3.0nm/s, and the rate of sedimentation of lead telluride rete is 0.8~1.0nm/s; Thicknesses of layers adopts the monitoring of light rule of three;
(4) substrate naturally cools to room temperature, obtains 10.3~11.3 μ m of the present invention and sees through the LONG WAVE INFRARED optical filter.
Beneficial effect
1. the invention provides a kind of 10.3~11.3 μ m and see through the LONG WAVE INFRARED optical filter, described optical filter reaches the excellent technique index: have high permeability τ at 10.3~11.3 μ m spectral coverages Av〉=80%, in 0.9~10.15 μ m and 11.45~20 wide ending of μ m spectral coverage, end degree of depth τ in the cut-off region λ<1%, half-power point wavelength franchise can be improved the characteristic of passband and the rejection zone of this spectral coverage optical filter greatly within 50nm, satisfy the request for utilization of remote sensing system, has high stability and high reliability;
2. the invention provides a kind of 10.3~11.3 μ m and see through the LONG WAVE INFRARED optical filter, the film system of described optical filter comprises zinc sulphide rete and the lead telluride rete of alternately stack, and film is that the number of plies is less;
3. the invention provides the preparation method that a kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, described method can make optical filter of the present invention, process stabilizing, and good reproducibility, easy and simple to handle, finished product rate height.
Description of drawings
Fig. 1 is the transmitted light spectrogram of optical filter among the embodiment 1.
Embodiment
In order to prove absolutely characteristic of the present invention and to implement mode of the present invention, provide embodiment below.
Embodiment 1
A kind of 10.3~11.3 μ m see through the LONG WAVE INFRARED optical filter, and described optical filter comprises the long-pass film system of germanium substrate, substrate one side and the short-pass film system of substrate opposite side.
Wherein, the long 29.5mm of described substrate, wide 1.36mm, thick 1.2mm, surface smoothness is 40/20.
Long-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and centre wavelength is 7300nm; Each rete parameter is as shown in table 3, and wherein, the number of plies is that 1 rete is the outermost layer of long-pass film system, and the number of plies is that 39 rete is deposited in the germanium substrate, is the innermost layer of long-pass film system;
Table 3 long-pass film system and thicknesses of layers monitoring
Figure BDA00003100525600051
Figure BDA00003100525600061
Short-pass film system comprises zinc sulphide rete and the lead telluride rete of alternately stack, and centre wavelength is 14600nm, and each rete parameter is as shown in table 4, wherein, the number of plies is that 1 rete is the outermost layer of short-pass film system, and the number of plies is that 16 rete is deposited in the germanium substrate, is the innermost layer of short-pass film system;
Table 4 short-pass film system and thicknesses of layers monitoring
Figure BDA00003100525600062
Preparation method's step of the described optical filter of present embodiment is as follows:
(1) removes impurity in the vacuum chamber with suction cleaner, dip in absolute ethyl alcohol wiped clean vacuum chamber inwall with absorbent gauze then; With analyzing pure acetone ultrasonic cleaning substrate 10min, again with the germanium substrate of analyzing straight alcohol ultrasonic cleaning substrate 10min, clean substrate is packed in the vacuum chamber of cleaning, be evacuated to 3.0 * 10 -3Pa;
(2) substrate is heated to 150 ℃, and keeps 30min;
(3) open the logical argon gas of the light-duty ion gun of Hall, airshed is 30sccm, and the unlatching cathode voltage is 100~200V, and anode voltage is 50~100V, makes that anode current is 0.5A; Adopt the thermal resistance evaporation method respectively at a side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit long-pass film system successively, at the opposite side of substrate zinc sulphide rete and the lead telluride rete in the alternating deposit short-pass film system successively, until the deposition of finishing described film system; Wherein, the rate of sedimentation of zinc sulphide rete is 2.0~3.0nm/s, and the rate of sedimentation of lead telluride rete is 0.8~1.0nm/s; Thicknesses of layers adopts the monitoring of light rule of three, and supervisory wavelength and number of times are shown in table 3 and table 4;
(4) substrate naturally cools to room temperature, obtains described 10.3~11.3 μ m of present embodiment and sees through the LONG WAVE INFRARED optical filter.
Described optical filter is carried out following performance test:
Adopt the test of the PE system of company 2000 infrared Fourier spectrometers, obtain transmitted spectrum as shown in Figure 1, with UVWINLAB software the spectral line among Fig. 1 is calculated, described optical filter is 84.61% at the mean transmissivity of 10.3~11.3 μ m spectral coverages as can be known, mean transmissivity at 0.9~10.15 μ m spectral coverage is 0.43% He, and the mean transmissivity of 1.45~20 μ m spectral coverages is 0.01%.
The present invention includes but be not limited to above embodiment, every any being equal to of carrying out under the spirit and principles in the present invention, replace or local improvement, all will be considered as within protection scope of the present invention.

Claims (9)

1.一种10.3~11.3μm透过长波红外滤光片,其特征在于:所述滤光片包括锗基底、基底一侧的长波通膜系和基底另一侧的短波通膜系;1. A 10.3~11.3 μm through long-wave infrared filter, characterized in that: the filter comprises a germanium substrate, a long-wave pass film system on one side of the substrate and a short-wave pass film system on the other side of the substrate; 长波通膜系包括交替叠加的硫化锌和碲化铅膜层,结构为:(0.5hl0.5h)^9(0.574l1.148h0.574l)^5(0.36h0.72l0.36h)^5,中心波长为7300nm;h为碲化铅膜层,0.5h表示碲化铅膜层厚度为0.5个基本厚度,1.148h表示碲化铅膜层厚度为1.148个基本厚度,0.36h表示碲化铅膜层厚度为0.36个基本厚度,l为硫化锌膜层,表示硫化锌膜层厚度为1个基本厚度,0.574l表示硫化锌膜层厚度为0.574个基本厚度,0.72l表示硫化锌膜层厚度为0.72个基本厚度,所述基本厚度为光学厚度中心波长的四分之一,基本膜堆(0.5hl0.5h)的周期数为9,基本膜堆(0.574l1.148h0.574l)和(0.36h0.72l0.36h)的周期数均为5;The long-wave pass film system includes alternately stacked zinc sulfide and lead telluride film layers, the structure is: (0.5hl0.5h)^9 (0.574l1.148h0.574l)^5 (0.36h0.72l0.36h)^5 The wavelength is 7300nm; h is the lead telluride film layer, 0.5h means the lead telluride film thickness is 0.5 basic thickness, 1.148h means the lead telluride film thickness is 1.148 basic thickness, 0.36h means the lead telluride film layer The thickness is 0.36 basic thickness, l is the zinc sulfide film layer, which means that the thickness of the zinc sulfide film layer is 1 basic thickness, 0.574l means that the thickness of the zinc sulfide film layer is 0.574 basic thickness, and 0.72l means that the thickness of the zinc sulfide film layer is 0.72 A basic thickness, the basic thickness is a quarter of the central wavelength of the optical thickness, the period number of the basic film stack (0.5hl0.5h) is 9, the basic film stack (0.574l1.148h0.574l) and (0.36h0. 72l0.36h) the number of cycles is 5; 短波通膜系包括交替叠加的硫化锌和碲化铅膜层,结构为:(lh)^8,中心波长为14600nm;l为硫化锌膜层,表示硫化锌膜层厚度为1个基本厚度,h为碲化铅膜层,表示碲化铅膜层厚度为1个基本厚度,所述基本厚度为光学厚度中心波长的四分之一,基本膜堆(lh)的周期数为8。The short-wave pass film system includes alternately stacked zinc sulfide and lead telluride film layers, the structure is: (lh)^8, the center wavelength is 14600nm; l is the zinc sulfide film layer, indicating that the thickness of the zinc sulfide film layer is 1 basic thickness, h is the lead telluride film layer, indicating that the thickness of the lead telluride film layer is 1 basic thickness, the basic thickness is a quarter of the central wavelength of the optical thickness, and the period number of the basic film stack (lh) is 8. 2.根据权利要求1所述的一种10.3~11.3μm透过长波红外滤光片,其特征在于:基底长29.5mm,宽1.36mm,厚1.2mm;表面光洁度为40/20。2. A 10.3-11.3 μm long-wave infrared filter according to claim 1, characterized in that: the base is 29.5 mm long, 1.36 mm wide, and 1.2 mm thick; the surface finish is 40/20. 3.根据权利要求1或2所述的一种10.3~11.3μm透过长波红外滤光片,其特征在于:长波通膜系如表1所示,层数为1的膜层为长波通膜系的最外层,层数为39的膜层沉积在基底上,为长波通膜系的最内层;3. A 10.3-11.3 μm long-wave infrared filter according to claim 1 or 2, characterized in that: the long-wave pass film system is as shown in Table 1, and the film layer with 1 layer is a long-wave pass film The outermost layer of the system, the film layer with a layer number of 39 is deposited on the substrate, which is the innermost layer of the long-wave pass film system; 表1  长波通膜系Table 1 Long wave pass film system
Figure FDA00003100525500011
Figure FDA00003100525500011
Figure FDA00003100525500021
Figure FDA00003100525500021
.
4.根据权利要求1或2所述的一种10.3~11.3μm透过长波红外滤光片,其特征在于:短波通膜系如表2所示,层数为1的膜层为短波通膜系的最外层,层数为16的膜层沉积在基底上,为短波通膜系的最内层;4. A 10.3-11.3 μm long-wave infrared filter according to claim 1 or 2, characterized in that: the short-wave pass film system is as shown in Table 2, and the film layer with 1 layer is a short-wave pass film The outermost layer of the system, the film layer with 16 layers is deposited on the substrate, which is the innermost layer of the short-wave pass film system; 表2  短波通膜系Table 2 Short-wave pass film system
Figure FDA00003100525500022
Figure FDA00003100525500022
.
5.根据权利要求4所述的一种10.3~11.3μm透过长波红外滤光片,其特征在于:长波通膜系如表1所示,层数为1的膜层为长波通膜系的最外层,层数为39的膜层沉积在基底上,为长波通膜系的最内层;5. A 10.3-11.3 μm long-wave infrared filter according to claim 4, characterized in that: the long-wave pass film system is as shown in Table 1, and the film layer with 1 layer is the long-wave pass film system The outermost layer, the film layer with a layer number of 39 is deposited on the substrate, which is the innermost layer of the long-wave pass film system; 表1  长波通膜系Table 1 Long wave pass film system
Figure FDA00003100525500032
Figure FDA00003100525500032
Figure FDA00003100525500041
Figure FDA00003100525500041
.
6.一种如权利要求1或2所述的10.3~11.3μm透过长波红外滤光片的制备方法,其特征在于:所述方法步骤如下:6. A method for preparing a 10.3-11.3 μm long-wave infrared filter as claimed in claim 1 or 2, characterized in that: the steps of the method are as follows: (1)将干净的基底装入清洁的真空室中,抽真空至3.0×10-3Pa;(1) Put the clean substrate into a clean vacuum chamber and evacuate to 3.0×10 -3 Pa; (2)将基底加热到150℃,并保持30min;(2) Heat the substrate to 150°C and keep it for 30min; (3)打开霍尔轻型离子源通氩气,气流量为30sccm,开启阴极电压为100~200V,阳极电压为50~100V,使得阳极电流为0.5A;采用电阻蒸发法分别在基底两侧沉积长波通膜系和短波通膜系;硫化锌膜层的沉积速率为2.0~3.0nm/s,碲化铅膜层的沉积速率为0.8~1.0nm/s;膜层厚度采用光比例法监控;(3) Turn on the Hall light ion source to pass argon gas, the gas flow rate is 30sccm, the cathode voltage is 100-200V, the anode voltage is 50-100V, so that the anode current is 0.5A; use the resistance evaporation method to deposit on both sides of the substrate respectively Long-wave pass film system and short-wave pass film system; the deposition rate of the zinc sulfide film layer is 2.0-3.0nm/s, and the deposition rate of the lead telluride film layer is 0.8-1.0nm/s; the thickness of the film layer is monitored by the optical ratio method; (4)基底自然冷却至室温,得到10.3~11.3μm透过长波红外滤光片。(4) The substrate is naturally cooled to room temperature to obtain a 10.3-11.3 μm long-wave infrared filter. 7.根据权利要求6所述的一种10.3~11.3μm透过长波红外滤光片的制备方法,其特征在于:长波通膜系及膜层厚度监控如表3所示,层数为1的膜层为长波通膜系的最外层,层数为39的膜层沉积在基底上,为长波通膜系的最内层;7. The preparation method of a 10.3-11.3 μm long-wave infrared filter according to claim 6, characterized in that: the long-wave pass film system and film thickness monitoring are as shown in Table 3, and the number of layers is 1 The film layer is the outermost layer of the long-wave pass film system, and the film layer with 39 layers is deposited on the substrate, which is the innermost layer of the long-wave pass film system; 表3  长波通膜系及膜层厚度监控Table 3 Long-wave pass film system and film thickness monitoring
Figure FDA00003100525500042
Figure FDA00003100525500042
Figure FDA00003100525500051
Figure FDA00003100525500051
.
8.根据权利要求6所述的一种10.3~11.3μm透过长波红外滤光片的制备方法,其特征在于:短波通膜系及膜层厚度监控如表4所示,层数为1的膜层为短波通膜系的最外层,层数为16的膜层沉积在基底上,为短波通膜系的最内层;8. A method for preparing a 10.3-11.3 μm long-wave infrared filter according to claim 6, characterized in that: the short-wave pass film system and film thickness monitoring are as shown in Table 4, and the number of layers is 1 The film layer is the outermost layer of the short-wave pass film system, and the film layer with 16 layers is deposited on the substrate, which is the innermost layer of the short-wave pass film system; 表4  短波通膜系及膜层厚度监控Table 4 Short-wave pass film system and film thickness monitoring
Figure FDA00003100525500052
Figure FDA00003100525500052
.
9.根据权利要求8所述的一种10.3~11.3μm透过长波红外滤光片的制备方法,其特征在于:长波通膜系及膜层厚度监控如表3所示,层数为1的膜层为长波通膜系的最外层,层数为39的膜层沉积在基底上,为长波通膜系的最内层;9. A method for preparing a 10.3-11.3 μm long-wave infrared filter according to claim 8, characterized in that: the long-wave pass film system and film thickness monitoring are as shown in Table 3, and the number of layers is 1 The film layer is the outermost layer of the long-wave pass film system, and the film layer with 39 layers is deposited on the substrate, which is the innermost layer of the long-wave pass film system; 表3  长波通膜系及膜层厚度监控Table 3 Long-wave pass film system and film thickness monitoring
Figure FDA00003100525500062
Figure FDA00003100525500062
Figure FDA00003100525500071
Figure FDA00003100525500071
.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105137514A (en) * 2015-09-11 2015-12-09 兰州空间技术物理研究所 4.2-4.45[mu]m transmission medium wave infrared optical filter and preparation method
CN106324738A (en) * 2016-11-04 2017-01-11 天津津航技术物理研究所 Long-wave infrared filter and method for preparing same
CN114460677A (en) * 2022-04-13 2022-05-10 翼捷安全设备(昆山)有限公司 Infrared filter for MEMS black body packaging and preparation method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1588370A (en) * 1978-05-11 1981-04-23 Standard Telephones Cables Ltd Infra-red transmitting elements
US5007689A (en) * 1988-09-08 1991-04-16 Barr & Stroud Infra-red transmitting optical components and optical coatings therefor
CN2243085Y (en) * 1995-10-23 1996-12-18 中国科学院上海技术物理研究所 8-14 micron mini-size linear graduated variation light filter
CN1302916A (en) * 2000-12-27 2001-07-11 中国科学院上海技术物理研究所 Method of monitoring and controlling thickness of optical medium film for infrared-stopping filter
US6844976B1 (en) * 1999-11-26 2005-01-18 Commissariat A L'energie Atomique Heat-absorbing filter and method for making same
CN101458354A (en) * 2008-12-22 2009-06-17 中国航天科技集团公司第五研究院第五一○研究所 Wide cut-off long-wave infrared narrow-band filter with spectral range of 9.2-9.6 mu m
CN202305862U (en) * 2012-03-12 2012-07-04 杭州麦乐克电子科技有限公司 10560-nanometer band-pass infrared filter

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1588370A (en) * 1978-05-11 1981-04-23 Standard Telephones Cables Ltd Infra-red transmitting elements
US5007689A (en) * 1988-09-08 1991-04-16 Barr & Stroud Infra-red transmitting optical components and optical coatings therefor
CN2243085Y (en) * 1995-10-23 1996-12-18 中国科学院上海技术物理研究所 8-14 micron mini-size linear graduated variation light filter
US6844976B1 (en) * 1999-11-26 2005-01-18 Commissariat A L'energie Atomique Heat-absorbing filter and method for making same
CN1302916A (en) * 2000-12-27 2001-07-11 中国科学院上海技术物理研究所 Method of monitoring and controlling thickness of optical medium film for infrared-stopping filter
CN101458354A (en) * 2008-12-22 2009-06-17 中国航天科技集团公司第五研究院第五一○研究所 Wide cut-off long-wave infrared narrow-band filter with spectral range of 9.2-9.6 mu m
CN202305862U (en) * 2012-03-12 2012-07-04 杭州麦乐克电子科技有限公司 10560-nanometer band-pass infrared filter

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
KAREL LAMBERT ECT.: "PbTe|CdTe Core|Shell Particles by Cation Exchange,a HR-TEM study", 《CHEMISTRY OF MATERIALS》 *
熊玉卿等: "碲化铅/硫化锌红外多层滤光片的光谱漂移研究", 《光学技术》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105137514A (en) * 2015-09-11 2015-12-09 兰州空间技术物理研究所 4.2-4.45[mu]m transmission medium wave infrared optical filter and preparation method
CN105137514B (en) * 2015-09-11 2017-07-28 兰州空间技术物理研究所 4.2~4.45 μm pass through medium-wave infrared optical filter and preparation method
CN106324738A (en) * 2016-11-04 2017-01-11 天津津航技术物理研究所 Long-wave infrared filter and method for preparing same
CN114460677A (en) * 2022-04-13 2022-05-10 翼捷安全设备(昆山)有限公司 Infrared filter for MEMS black body packaging and preparation method thereof
CN114460677B (en) * 2022-04-13 2022-09-16 翼捷安全设备(昆山)有限公司 Infrared filter for MEMS black body packaging and preparation method thereof

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