CN103197508B - Analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation - Google Patents
Analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation Download PDFInfo
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- CN103197508B CN103197508B CN201310070330.3A CN201310070330A CN103197508B CN 103197508 B CN103197508 B CN 103197508B CN 201310070330 A CN201310070330 A CN 201310070330A CN 103197508 B CN103197508 B CN 103197508B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 25
- 238000011109 contamination Methods 0.000 title abstract description 9
- 239000007789 gas Substances 0.000 claims abstract description 69
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- 238000001816 cooling Methods 0.000 claims abstract description 18
- 238000004088 simulation Methods 0.000 claims description 19
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
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- 229910021642 ultra pure water Inorganic materials 0.000 claims description 11
- 239000012498 ultrapure water Substances 0.000 claims description 11
- 238000003860 storage Methods 0.000 claims description 10
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Abstract
The invention discloses an analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation. The means comprises a hydrogen atom generator interface, an electron gun, an electron gun chamber, an electron gun interface, an exposure chamber, a cooling capillary tube, a sample bench, a sample bench interface, a gas introducing device, a turbomolecular pump, a backing pump, an RGA, an RGA interface, a gate valve, a vent valve, a resistance gauge and an isolating valve, wherein the hydrogen atom generator interface, the electron gun interface, the sample bench interface and the RGA interface are all open, and fixedly connected with the exposure chamber, the electron gun interface and the sample bench interface are symmetrically arranged at both sides of the exposure chamber, so that the electron gun and the sample bench are located at one horizontal line, the hydrogen atom generator interface is arranged above the chamber and perpendicular to the axis of the electron gun interface, and the RGA interface is arranged at side of the experimental device. The means can solve problems that present devices cannot simultaneously realize experimental functions of optics surface contamination and cleaning, and has only one set of vacuum-pumping system; and the sample bench does not have the free degree.
Description
Technical field
The invention belongs to technical field of lithography, more specifically, the optical surface relating under a kind of extreme ultraviolet irradiation pollutes and cleans analogue means.
Background technology
In Next Generation Lithography, extreme ultraviolet lithography is regarded as having most the technology of application prospect.In EUVL, the wavelength of exposure light source is in extreme ultraviolet waveband, the energy of photon is high, easily causes the pollution of optical element surface, after optical element surface pollutes in the situation that there are pollution source, not only can reduce the reflectivity of optical element, also can cause the inconsistency of lithographic feature size.In EUVL, optical element is expensive, and assembling is complicated, and optical element causes whole Performance of Optical System decline even to be lost efficacy after polluting.Therefore be badly in need of the pollutant of litho machine inside to control, and the pollutant producing is cleaned online.
At present, the mechanism that EUV litho machine internal contamination forms is still not clear, and clean technologies are yet immature.Therefore, need to build analogue means, imitate the ultravacuum environment of EUV litho machine, carry out the experimental study of the pollution of EUV litho machine optical surface and online clean technologies, mechanism and groundwater pollution control that research EUV litho machine internal contamination forms, the effect of experimental pollution clean technologies.
Existing this type of analogue means is mainly divided into two kinds, and one is POLLUTION SIMULATION device, and one is online cleaning device.
The general structure of POLLUTION SIMULATION device is: have a vacuum cavity as main cavity, on it, be connected to electron gun, vacuum pump group and gas and introduce equipment, in cavity, there is a sample bench, on sample bench, lay clean optical element sample, in cavity, also have pressure transducer, temperature sensor and gas measuring apparatus simultaneously.Its principle of work is that vacuum cavity is vacuumized, introduce dusty gas by gas introducing equipment, optical element on sample bench is exposed with electron beam, with the optical surface pollution condition of simulation EUV litho machine inside, further by monitoring and control to parameter, study the impact that different factors are polluted optical surface, thereby the optical surface of realizing under ultravacuum condition pollutes experiential function.
General structure and the POLLUTION SIMULATION device of online cleaning device are similar: have a vacuum cavity as main cavity, on it, be connected to hydrogen atom generator, vacuum pump group and gas and introduce equipment, in cavity, there is a sample bench, on sample bench, lay contaminated optical element sample, in cavity, also have pressure transducer, temperature sensor and gas measuring apparatus simultaneously.Its principle of work is that vacuum cavity is vacuumized; with simulation EUV litho machine internal environment; introduce hydrogen atom by hydrogen atom generator; hydrogen atom reacts with the pollutant on optical element; clean online; further pass into different blanket gas by gas introducing equipment, studying different blanket gas affects cleaning speed, thereby realizes the optical surface clean experiential function online under ultravacuum condition.
But there is following deficiency in existing device:
Can not realize optical surface pollution simultaneously and clean experiential function.In actual application, optical surface pollutes and online the cleaning of optical surface is a continuous process, if can complete experiment in same table apparatus, experiment can be more convincing.
Existing POLLUTION SIMULATION device only has a set of pumped vacuum systems, and the vacuum tightness of gun chamber is identical with main cavity, cannot be operated under rated pressure, and the life-span is greatly impaired.
In existing POLLUTION SIMULATION device, sample bench does not possess degree of freedom, and clamped one time can only once be tested, and efficiency is very low.
Summary of the invention
For the defect of prior art, the object of the present invention is to provide a kind of extreme ultraviolet to irradiate lower optical surface and pollute and clean analogue means, be intended to solve can not realizing optical surface pollution simultaneously and cleaning experiential function, only have a set of pumped vacuum systems and sample bench not to possess the problem of degree of freedom of existing in existing apparatus.
For achieving the above object, the optical surface the invention provides under a kind of extreme ultraviolet irradiation pollutes and cleans analogue means, comprise: electron gun, gun chamber, exposure chamber, cooling kapillary, sample bench, gas is introduced equipment and two cover secondary molecular pump groups, exposure is provided with hydrogen atom G-interface on chamber, electron gun interface, sample bench interface and RGA interface, electron gun interface and sample bench interface are symmetricly set on the both sides in exposure chamber, make electron gun and sample bench on a horizontal line, hydrogen atom G-interface is arranged at cavity top, and vertical with the axis of electron gun interface, its axis and sample bench are in the same plane, electron gun is connected with gun chamber, gun chamber is connected to exposure chamber by electron gun interface, sample bench is connected to exposure chamber by sample bench interface, RGA is connected to exposure chamber by RGA interface, two cover secondary molecular pump groups are connected with exposure chamber with gun chamber respectively, be used for gun chamber and exposure chamber extracting vacuum, gas is introduced equipment and is connected with exposure chamber by pipeline, junction is arranged at the bottom in exposure chamber.
Device of the present invention also comprises cooling kapillary, and it is single backhaul U-shaped pipe, and it is arranged on sample bench, and is evenly arranged in sample bench bottom surface.
Gun chamber is connected by flange with exposure chamber, and flange is horizontally arranged with a kapillary, for connecting electronic rifle chamber and exposure chamber.
Device of the present invention also comprises temperature sensor, pressure transducer and vacuum meter, and it is all arranged at the top of exposure inside, chamber.
Sample bench is perpendicular to beam direction, and has an eccentrically weighted shaft, and it is parallel with beam direction, and is connected with external motor by the motive seal on flange.
On sample bench, have a shutter, shutter has a degree of freedom perpendicular to sample bench direction, compresses and release function to realize, and shutter is provided with an aperture.
Gas introducing equipment comprises connected in turn mass flowmeter, stop valve and gas tank, one end of mass flowmeter is connected with exposure chamber, the other end is connected with one end of stop valve, the other end of stop valve is connected with gas tank, the two coordinates mass flowmeter and stop valve, for controlling the intake of gas.
Gas introducing equipment comprises mass flowmeter, stop valve, transitional cavity, chamber wall firing equipment, stop valve and ultrapure water storage device, one end of mass flowmeter is connected with exposure chamber, the other end is connected with one end of stop valve, the other end of stop valve is connected with one end of transitional cavity, chamber wall firing equipment is arranged on transitional cavity, the other end of transitional cavity is connected with one end of stop valve, the other end of stop valve is connected with ultrapure water storage device, ultrapure water storage device for passing into aqueous water by stop valve in transitional cavity, be wound around chamber wall firing equipment for transitional cavity is heated, to produce water vapor, the two cooperation of mass flowmeter and stop valve, for controlling the intake of water vapor in transitional cavity.
Optical surface under a kind of extreme ultraviolet irradiates pollutes and cleans analogue means, comprise hydrogen atom generator, exposure chamber, cooling kapillary, sample bench, gas is introduced equipment and a set of secondary molecular pump group, exposure is provided with hydrogen atom G-interface on chamber, sample bench interface, electron gun interface and RGA interface, electron gun interface and sample bench interface are symmetricly set on the both sides in exposure chamber, hydrogen atom G-interface is arranged at cavity top, and vertical with the axis of electron gun interface, RGA interface is arranged at the side of experimental provision, its axis and sample bench are in the same plane, sample bench is connected to exposure chamber by sample bench interface, RGA is connected to exposure chamber by RGA interface, secondary molecular pump group is connected with exposure chamber, for exposing chamber extracting vacuum, gas is introduced equipment and is connected with exposure chamber by pipeline, junction is arranged at the bottom in exposure chamber, hydrogen atom generator is connected by hydrogen atom G-interface with exposure chamber.
Testing table place is provided with one deck ceramic fiber heat insulation felt, for preventing the infringement of high temperature to testing table and sample, is provided with condenser pipe, for experimental facilities is lowered the temperature on the inwall in exposure chamber.
Optical surface under a kind of extreme ultraviolet irradiates pollutes and cleans analogue means, comprise: exposure chamber, cooling kapillary, turbomolecular pump, push-pull valve, air release and carbon dioxide laser, exposure is provided with hydrogen atom G-interface on chamber, electron gun interface, sample bench interface and RGA interface, electron gun interface and sample bench interface are symmetricly set on the both sides in exposure chamber, hydrogen atom G-interface is arranged at cavity top, and vertical with the axis of electron gun interface, RGA interface is arranged at the side of experimental provision, carbon dioxide laser is connected by electron gun interface with exposure chamber.One end of push-pull valve is connected with exposure chamber by pipeline, and junction is arranged at the bottom in exposure chamber, and the other end of push-pull valve is connected with turbomolecular pump, and air release is connected with exposure chamber, and junction is arranged at the bottom in exposure chamber.
Device of the present invention also comprises extreme ultraviolet electric diode, metallic target generator and molten drop collection container, extreme ultraviolet electric diode is arranged at the top of exposure inside, chamber affixed with the inwall in exposure chamber, metallic target generator is connected by hydrogen atom G-interface with exposure chamber, and molten drop collection container is arranged at the bottom in exposure chamber.
The above technical scheme of conceiving by the present invention, compared with prior art, the present invention has following beneficial effect:
(1) can realize optical surface pollutes and cleans experiential function simultaneously: analogue means of the present invention has multiple interfaces, electron gun interface and sample bench interface are symmetrically distributed in exposure both sides, chamber, the two dead in line, be convenient to directly expose, these two interfaces provide condition for realizing pollution experiential function.Hydrogen atom G-interface is arranged at cavity top, has certain distance with other interfaces, is convenient to hydrogen atom generator and places, and also can not affect other interfaces and use, and this interface provides condition for realizing the clean experiential function of hydrogen atom.
(2) can carry out difference to main cavity and gun chamber vacuumizes, can ensure that main cavity vacuum tightness reaches requirement, can extend again the electron gun life-span: between two cavitys of this analogue means, take difference Vacuuming structure, two cavitys are connected by flange, kapillary is at flange horizontally set, connect two cavitys, by secondary molecular pump group extracting vacuum, in order to ensure that both sides can keep the pressure difference of two orders of magnitude, respectively between two cavitys and molecular pump, add a push-pull valve, by regulating valve port size to control vacuum tightness.So, just can carry out difference to two cavitys and vacuumize, both ensure that cavity communicates, electron beam is passed through, can carry out the extraction of different vacuum tightnesss to two cavitys again.
(3) can realize clamped one time, test of many times function: sample bench is placed vertically in exposure chamber, perpendicular to beam direction, there is a rotary freedom, rotating shaft is parallel with beam direction, is eccentrically weighted shaft, and rotating shaft is connected with external motor by the motive seal on flange, in ultra-high vacuum environment, utilize rotation to replace translation, keep condition of high vacuum degree.When experiment, by rotating shaft, change exposure position, makes to take out a vacuum and can do test of many times, improves test efficiency.
(4) can realize the function that gas componant real-time analysis and dividing potential drop are measured in real time: under variable concentrations, introducing gas is different on the impact of polluting, pollute to control experiment or online clean experiment no matter be, all need to be determined at the impact of polluting under different partial pressures, and measure in time the information of pollutant in residual gas.The vacuum cavity of this experimental provision has a special interface, for external RGA, realizes the function that gas componant real-time analysis and dividing potential drop are measured in real time.For guaranteeing the accuracy of experimental data, RGA interface is arranged at the side of experimental provision, and its axis and sample bench are in the same plane, and after RGA installs like this, RGA analyte sensors part can approach optical element as much as possible, and the data of measurement are more accurate;
(5) function of analogue means can be expanded, being not limited only to optical surface pollutes and online clean experiential function: the interface of device is flange, highly versatile, same interface can connect from different elements, outside the clean and online cleaning function of optical surface, realizes several functions.For example, at the external metallic target generator of hydrogen atom G-interface, at the external carbon dioxide laser of electron gun interface, just can realize the experiential function of EUV light source metallic target.
Brief description of the drawings
Fig. 1 is that the optical surface under the extreme ultraviolet of first embodiment of the invention irradiates pollutes and the front view that cleans analogue means.
Fig. 2 is that the optical surface under the extreme ultraviolet of first embodiment of the invention irradiates pollutes and the left view that cleans analogue means.
Fig. 3 is the structural representation of sample bench in the present invention.
Structural representation when Fig. 4 is gas introducing equipment introducing general gas flow.
Structural representation when Fig. 5 is gas introducing equipment introducing water vapor.
Fig. 6 is that the optical surface under the extreme ultraviolet of second embodiment of the invention irradiates pollutes and the front view that cleans analogue means.
Fig. 7 is that the optical surface under the extreme ultraviolet of second embodiment of the invention irradiates pollutes and the left view that cleans analogue means.
Fig. 8 is that the optical surface under the extreme ultraviolet of third embodiment of the invention irradiates pollutes and the front view that cleans analogue means.
Fig. 9 is that the optical surface under the extreme ultraviolet of third embodiment of the invention irradiates pollutes and the left view that cleans analogue means.
In figure:
1-hydrogen atom generator 2-hydrogen atom G-interface
3-electron gun 4-gun chamber
The 5-electron gun interface 6-chamber of exposing
The cooling kapillary 8-of 7-sample bench
9-sample bench interface 10-gas is introduced equipment
11-turbomolecular pump 12-forepump
13-temperature sensor 14-pressure transducer
15-vacuum meter 16-RGA
17-RGA interface 18-metallic target generator
19-carbon dioxide laser 20-molten drop collection container
21-test specimen 22-shutter
23-seal flange 24-motive seal
25-motor 26-sample holder
27-shutter aperture 28-mass flowmeter
29-stop valve 30-gas tank
31-transitional cavity 32-chamber wall firing equipment
33-ultrapure water storage device 34-push-pull valve
35-air release 36-Pirani gauge
37-shutdown valve 38-extreme ultraviolet electric diode
39-stop valve
Embodiment
In order to make object of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain the present invention, is not intended to limit the present invention.
Figure 1 shows that the structural representation of first embodiment of the invention.Under this embodiment, the optical surface that the present invention can realize under extreme ultraviolet irradiation pollutes experiment and the clean experiential function of oxygen atom.
As depicted in figs. 1 and 2, optical surface under extreme ultraviolet of the present invention irradiates pollutes and cleans analogue means and comprises: hydrogen atom G-interface 2, electron gun 3, gun chamber 4, electron gun interface 5, exposure chamber 6, cooling kapillary 7, sample bench 8, sample bench interface 9, gas are introduced equipment 10, temperature sensor 13, pressure transducer 14, vacuum meter 15, residual gas analyzer (Remaining gas analyzer is called for short RGA) 16, RGA interface 17 and two cover secondary molecular pump groups.
Exposure chamber 6 is main cavity, and hydrogen atom G-interface 2, electron gun interface 5, sample bench interface 9 and RGA interface 17 are flanged interface, and is arranged on exposure chamber 6.Electron gun interface 5 and sample bench interface 9 are symmetricly set on the both sides in exposure chamber 6, make electron gun 3 and sample bench 8 on a horizontal line, and the electron beam that electron gun 3 produces just can directly bombard the optical element surface on sample bench 8, and it is exposed.Hydrogen atom G-interface 2 is arranged at cavity top, and vertical with the axis of electron gun interface 5, provides condition for realizing embodiment two with embodiment three.RGA interface 17 is arranged at the side of experimental provision, and its axis and sample bench 8 are in the same plane, and after RGA16 installs, sensor is approached optical element to greatest extent, and the data of measurement are more accurate.
Hydrogen atom G-interface 2 is closed, and electron gun interface 5 is opened, and sample bench interface 9 is opened, and RGA interface 17 is opened.Electron gun 3 is connected with gun chamber 4, and gun chamber 4 is connected to exposure chamber 6 by electron gun interface 5, and sample bench 8 is connected to exposure chamber 6 by sample bench interface 9, and RGA16 is connected to exposure chamber 6 by RGA interface 17.
In order to make optical element cooling fast as much as possible and evenly, ensure that liquid coolant do not pollute vacuum cavity simultaneously, on sample bench 8, be provided with cooling kapillary 7, cooling kapillary 7 is single backhaul U-shaped pipe, is evenly arranged in sample bench bottom surface.By the attemperating unit of cooling kapillary 7 and sample bench 8, can control the temperature of optical element.
Secondary molecular pump group comprises turbomolecular pump 11, forepump 12, push-pull valve 34, air release 35, Pirani gauge 36, shutdown valve 37, and in present embodiment, the quantity of secondary molecular pump group is two covers, and it is connected with exposure chamber 6 with gun chamber 4 respectively.Gun chamber 4 is connected by flange with exposure chamber 6, flange is horizontally arranged with a kapillary, for connecting electronic rifle chamber 4 and exposure chamber 6, gun chamber 4 and exposure chamber 6 are respectively by two cover secondary molecular pump group extracting vacuum, in order to ensure that both sides can keep the pressure difference of two orders of magnitude, control vacuum tightness by the valve port size that regulates push-pull valve 34, so can in the time that the interior vacuum tightness in exposure chamber 6 changes, guarantee that the vacuum tightness of gun chamber 4 is the rated pressure of electron gun 3, increase the life-span of electron gun 3.
Gas is introduced equipment 10 and is connected with exposure chamber 6 by pipeline, and junction is arranged at the bottom in exposure chamber 6.
Temperature sensor 13, pressure transducer 14 and vacuum meter 15 are arranged at the top of exposure 6 inside, chamber affixed with the inwall in exposure chamber 6, for different variablees is monitored or controlled.
As shown in Figure 3, it is the structural representation of sample bench 8, and sample bench 8 is connected with sample bench interface 9, places vertically in exposure chamber 6.Sample bench 8 is perpendicular to beam direction, and has an eccentrically weighted shaft, and it is parallel with beam direction, and is connected with external motor 25 by the motive seal 24 on flange 23, utilizes rotation to replace translation in ultra-high vacuum environment, maintenance condition of high vacuum degree.On sample bench 8, have a shutter 22, shutter 22 has a degree of freedom perpendicular to sample bench 8 directions, realizes and compressing and release function, and shutter 22 is provided with an aperture 27.When experiment, baffle plate presses test specimen 21, isolated gas and electron beam, and only aperture 27 position exposures, by rotating shaft, change exposure position, makes to take out a vacuum and can do test of many times, improves test efficiency.
Fig. 4 and two kinds of different structures that Figure 5 shows that gas introducing equipment 10.
As shown in Figure 4, it is when passing into general gas flow, and gas is introduced the structural representation of equipment 10.This gas is introduced equipment 10 and is comprised connected in turn mass flowmeter 28, stop valve 29 and gas tank 30.One end of mass flowmeter 28 is connected with exposure chamber 6, and the other end is connected with one end of stop valve 29, and the other end of stop valve 29 is connected with gas tank 30.Gas flow passes into exposure chamber 6 through stop valve 29 and mass flowmeter 28.The two coordinates mass flowmeter 28 and stop valve 29, accurately controls the intake of gas.So, pass into kind and the intake of gas by control, can observe gas with various composition to the impact of polluting.
As shown in Figure 5, it is when passing into water vapor, and gas is introduced the structural representation of equipment 10.This gas is introduced equipment 10 and is comprised mass flowmeter 28, stop valve 29, transitional cavity 31, chamber wall firing equipment 32, stop valve 39 and ultrapure water storage device 33.One end of mass flowmeter 28 is connected with exposure chamber 6, the other end is connected with one end of stop valve 29, the other end of stop valve 29 is connected with one end of transitional cavity 31, chamber wall firing equipment 32 is arranged on transitional cavity 31, the other end of transitional cavity 31 is connected with one end of stop valve 39, and the other end of stop valve 39 is connected with ultrapure water storage device 33.Because experiment is very high to the requirement of water vapor purity, only have ultrapure water to add thermogenetic water vapor and just can reach requirement, therefore while passing into water vapor, in transitional cavity 31, pass into aqueous water by stop valve 29 by ultrapure water storage device 33, on transitional cavity 31 outer walls, being wound around chamber wall firing equipment 32 heats transitional cavity 31, to produce water vapor, then control the intake of transitional cavity 31 interior water vapor by mass flowmeter 28 and stop valve 29.
The principle of work of present embodiment is:
Pumped vacuum systems is carried out difference to gun chamber 4 with 6 two, chamber of exposure chamber and is vacuumized, more than the vacuum tightness of gun chamber 4 is evacuated to 1E-4Pa, more than the vacuum tightness in exposure chamber 6 is evacuated to 1E-7Pa, ensure the exposure vacuum tightness in chamber 6 and the ultravacuum environmental facies of EUV litho machine seemingly, the vacuum tightness in gun chamber 4 still maintains the declared working condition of electron gun simultaneously.Ensure the mission life of electron gun filament with this.
After the vacuum tightness in exposure chamber 6 reaches requirement, unlocking electronic rifle 3, electron gun 3 produces beam bombardment to the optical element surface on sample bench 8, and it is exposed.Introduce equipment 10 by gas and be filled with pollution source gas in exposure chamber 6, after optical element is exposed, surface can produce pollutes.
By cooling kapillary 7, gas introduce equipment 10, temperature sensor 13, pressure transducer 14, vacuum meter 15 and and RGA16 different variablees is monitored or is controlled, this device can carry out multinomial extreme ultraviolet and irradiate lower optical surface and pollute and test.For example: the pollution source gas of introducing equipment 10 and be filled with in chamber 6 to exposure specific dividing potential drop by gas, adopt RGA16 to detect partial pressure, after dividing potential drop is stable, unlocking electronic rifle 3, use specific exposure dose to expose, by the information of RGA16 detection of contamination; Mobile sample, makes unexposed part enter into exposure area, regulates electron gun 3, increases exposure dose, and by the information of RGA16 detection of contamination; Repeat step above, until maximum exposure dose, research is under same gas dividing potential drop concentration, and different exposure doses is on the impact of polluting.
Meanwhile, due to oxygen under Ear Mucosa Treated by He Ne Laser Irradiation can with the pollutant generation chemical reaction of optical element surface, it is cleaned.Use gas to introduce equipment 10 and be filled with oxygen but not pollution source gas in exposure chamber 6, present embodiment can also realize the clean experiential function of oxygen atom of optical element.
Fig. 6 and the structural representation that Figure 7 shows that second embodiment of the invention.Under this embodiment, the present invention can realize the clean experiential function of hydrogen atom of optical element.
The device of second embodiment of the invention and the first embodiment are basic identical, and its difference is:
Electron gun 3, the gun chamber 4 occurring in embodiment one and a set of secondary molecular pump group being connected with gun chamber 4 are not set, and now electron gun interface 5 is closed.Meanwhile, increased hydrogen atom generator 1, it is connected by hydrogen atom G-interface 2 with exposure chamber 6.Because hydrogen atom generator afterbody temperature is 1500 DEG C of left and right, therefore testing table 8 places are provided with one deck ceramic fiber heat insulation felt, prevent the infringement of high temperature to testing table and sample; Meanwhile, on the inwall in exposure chamber 6, condenser pipe is set, experimental facilities is lowered the temperature.
The principle of work of present embodiment is:
Secondary molecular pump group is connected with exposure chamber 6, more than the vacuum tightness in exposure chamber 6 is evacuated to 1E-7Pa, ensures the exposure vacuum tightness in chamber 6 and the ultravacuum environmental facies of EUV litho machine seemingly.
The vacuum tightness in exposure chamber 6 is opened hydrogen atom generator 1 after reaching requirement, is filled with hydrogen atom to exposure chamber 6, and the pollutant on hydrogen atom and optical element reacts, and optical element is played to cleaning action.
Carry out hydrogen atom under inert free gas condition and clean while experiment, gas is introduced equipment 10 temporary closes.While carrying out follow-up inert gas impact experiment, gas is introduced equipment 10 and is opened, and is filled with inert gas (argon gas, nitrogen etc.) to exposure chamber 6, and research inert gas is introduced the impact on cleaning speed.
Introduced equipment 10, temperature sensor 13, pressure transducer 14, vacuum meter 15 and RGA16 different variablees is monitored or controlled by hydrogen atom generator 1, cooling kapillary 7, gas, this device can be studied the impact of different parameters on hydrogen atom cleaning speed.For example: be filled with the hydrogen atom of specific dividing potential drop in chamber 6 to exposure by hydrogen atom generator 1, by the information of RGA16 detection of contamination; Regulate hydrogen atom generator 1, increase hydrogen atom partial pressure, and by the information of RGA16 detection of contamination; Repeat step above, until hydrogen atom partial pressure reaches certain value, the impact of research different hydro atomic gas dividing potential drop on cleaning speed.
Fig. 8 and the structural representation that Figure 9 shows that third embodiment of the invention.Under this embodiment, the present invention can realize the experiential function of EUV light source metallic target.
The device of third embodiment of the invention and the first embodiment are basic identical, and its difference is:
The sample bench 8, the gas that in embodiment one, occur are not set and introduce equipment 10, forepump 12, RGA16, Pirani gauge 36 and shutdown valve 37, sample bench interface 9, RGA interface 17 are closed.Meanwhile, electron gun 3, the gun chamber 4 occurring in embodiment one and a set of secondary molecular pump group being connected with gun chamber 4 are not set, its replacement is replaced with to carbon dioxide laser 19, it is connected by electron gun interface 5 with exposure chamber 6; The vacuum meter 15 occurring in embodiment one is not set, is replaced with extreme ultraviolet electric diode 38.Meanwhile, increased metallic target generator 18, it is connected by hydrogen atom G-interface 2 with exposure chamber 6; Increased molten drop collection container 20, it is arranged at the bottom in exposure chamber 6.One end of push-pull valve 34 is connected with exposure chamber 6 by pipeline, and junction is arranged at the bottom in exposure chamber 6, and the other end of push-pull valve 34 is connected with turbomolecular pump 11 by pipeline.Air release 35 is connected with exposure chamber 6 by pipeline, and junction is arranged at the bottom in exposure chamber 6.
The principle of work of present embodiment is:
First,, according to EUV light source metallic target requirement of experiment, use turbomolecular pump 11 that the vacuum tightness in exposure chamber 6 is evacuated to 1E-1Pa.The vacuum tightness in exposure chamber 6 starts metallic target generator 18 after reaching requirement, produces molten drop target, and droplet size is little and even, whereabouts gap periods stable; Start carbon dioxide laser 19, produce pulse laser, regulate the frequency of laser ejaculation and the frequency of droplets fall, pulse laser is mapped on molten drop target, bombardment molten drop target produces plasma, plasma generation extreme ultraviolet.Use extreme ultraviolet electric diode 38 to measure the energy of the extreme ultraviolet producing; Change the frequency of metallic target generator 38 and carbon dioxide laser 19, measure the energy of the extreme ultraviolet producing; Repeat step above, the relation of research extreme ultraviolet frequency and target practice frequency.The molten drop that molten drop collection container 20 produces for collecting metallic target generator 18, avoids polluting exposure chamber 6.
Those skilled in the art will readily understand; the foregoing is only preferred embodiment of the present invention; not in order to limit the present invention, all any amendments of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.
Claims (12)
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| CN104375237B (en) * | 2014-10-31 | 2017-06-16 | 中国建筑材料科学研究总院 | The method and its device of a kind of secondary multifilament surface cleaning of optical fiber |
| CN104597115B (en) * | 2015-02-12 | 2019-03-19 | 中国科学院光电研究院 | The vacuum acquirement device and corresponding detection method of test system for extreme ultraviolet radiation material |
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| CN105234131A (en) * | 2015-11-02 | 2016-01-13 | 中国工程物理研究院激光聚变研究中心 | Baking device used for removing trace of organic pollutants on surface of light machine element |
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| CN107068598A (en) * | 2017-05-04 | 2017-08-18 | 哈尔滨工业大学 | A kind of utilization vacuum-ultraviolet light cleaning and the device on activated material surface |
| CN108562343B (en) * | 2018-03-15 | 2024-01-26 | 核工业理化工程研究院 | Device and method for testing ventilation capacity of dynamic operation equipment |
| CN110879198B (en) * | 2019-11-25 | 2022-10-21 | 中国科学院微电子研究所 | A test system for outgassing pollution of extreme ultraviolet photoresist |
| CN111258340B (en) * | 2020-03-13 | 2021-06-29 | 中国科学院长春光学精密机械与物理研究所 | A gas supply device for EUV carbon pollution experiment with stable flow rate |
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