CN103163671A - Display panel, forming method thereof and liquid crystal display device - Google Patents

Abstract

A display panel, a forming method thereof and a liquid crystal display device are provided, wherein the display panel comprises: a transparent substrate; the capacitive touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are sequentially formed on the transparent substrate; and a display structure of an IPS/FFS display mode on the second insulating layer. According to the display panel in the technical scheme, the touch structure and the display structure of the IPS/FFS display mode are located on the same transparent substrate and are of an embedded touch structure, and one transparent substrate is omitted compared with an externally hung touch panel, so that the thickness of a final LCD finished product is reduced, and the weight of a terminal product is reduced.

Description

Display panel, method for forming same, and liquid crystal display device

technical field

The invention relates to the field of displays, in particular to a display panel, a forming method thereof, and a liquid crystal display device.

Background technique

A liquid crystal display is a display that uses liquid crystal materials. Liquid crystals are organic compounds between solid and liquid. It becomes a clear liquid when heated, and a crystalline, cloudy solid when cooled. Under the action of an electric field, the arrangement of liquid crystal molecules will change, thereby affecting the change of light passing through it. This change of light can be expressed as a change of light and dark through the action of the polarizer. Through the control of the electric field, the light and shade changes of the light are controlled, so as to achieve the purpose of displaying images. According to the arrangement of liquid crystal molecules, common liquid crystal displays are divided into: narrow viewing angle TN-LCD, STN-LCD, DSTN-LCD; wide viewing angle IPS, VA, etc.

In-plane rotating display mode (In Plane Switching, IPS) liquid crystal display has attracted extensive attention due to its wide viewing angle characteristics in applications, and touch panel (Touch Panel, TP) touch technology, as the latest human-computer interaction technology, Whether it is resistive touch or capacitive touch or other touch methods, it has attracted much attention because it makes human-computer interaction more straightforward. The IPS-TP structure formed by combining IPS technology and TP technology will become an inevitable trend in its application in LCD. The current IPS-TP structure is mainly in the plug-in (TP-On-Cell) mode, which mainly includes two independent modules: one is the TP module, and the other is the LCD module of the IPS display mode. Attach the TP module to the front of the LCD module displayed in IPS mode, that is, the side of the color film transparent substrate, to form a plug-in (TP-On-Cell) touch mode display panel, and then attach the backlight to the back of the TFT transparent substrate side.

The current IPS display mode display panel (IPS-TP) of the plug-in touch mode is composed of a separate IPS display mode LCD module and a separate TP module, the process is complicated, the cost is high, and the final The finished LCD has a large thickness, which will increase the weight of the end product, which is not desired by users.

Contents of the invention

The problem to be solved by the present invention is that the conventional IPS display panel in the plug-in touch mode has complicated process and high cost, and the thickness of the final finished LCD is large, which will increase the weight of the terminal product.

In order to solve the above problems, the present invention provides a method for forming a display panel, comprising:

Provide a transparent base;

sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;

A display structure in IPS/FFS display mode is formed on the second insulating layer.

Optionally, the shielding electrode layer is made of a transparent conductive material, and the materials of the first insulating layer and the second insulating layer are both transparent insulating materials.

Optionally, forming a capacitive touch structure on the transparent substrate includes:

forming a plurality of sensing electrodes arranged in parallel on the transparent substrate;

forming a dielectric layer to cover the sensing electrodes and the transparent substrate;

A plurality of driving electrodes are formed on the dielectric layer, and the sensing electrodes and the driving electrodes are arranged to cross each other.

Optionally, forming a capacitive touch structure on the transparent substrate includes:

A plurality of parallel-arranged sensing electrodes and a plurality of parallel-arranged driving electrodes intersecting the sensing electrodes are formed on the transparent substrate, and each of the driving electrodes is separated into multiple segments by the plurality of sensing electrodes;

forming a dielectric layer to cover the sensing electrodes, the driving electrodes and the transparent substrate;

patterning the dielectric layer, forming a via hole in the dielectric layer, the bottom of the via hole exposing each segment of the driving electrode;

forming a conductive layer, covering the dielectric layer and filling the via hole;

Patterning the conductive layer to form an interconnection line electrically connects multiple segments of each of the driving electrodes separated by the plurality of sensing electrodes.

Optionally, forming a display structure in IPS/FFS display mode on the second insulating layer includes:

forming TFT switches, scan lines and data lines on the second insulating layer;

forming a passivation layer to cover the TFT switch, data lines and scan lines;

A pixel electrode and a common electrode arranged at intervals are formed on the passivation layer, and there is a gap between the pixel electrode and the common electrode.

Optionally, forming a display structure in IPS/FFS display mode on the second insulating layer includes:

forming TFT switches, scan lines and data lines on the second insulating layer;

forming a passivation layer to cover the TFT switch, data lines and scan lines;

forming a common electrode on the passivation layer;

forming a third insulating layer covering the common electrode and the passivation layer;

forming a pixel electrode on the third insulating layer, the pixel electrode being a strip electrode;

or,

forming TFT switches, scan lines and data lines on the second insulating layer;

forming a passivation layer to cover the TFT switch, data lines and scan lines;

forming a pixel electrode on the passivation layer;

forming a third insulating layer to cover the pixel electrode and the passivation layer;

A common electrode is formed on the third insulating layer, and the common electrode is a strip electrode.

Optionally, it also includes: providing a transparent substrate;

The front side of the transparent substrate on which the touch structure and the display structure are formed is relatively bonded to the transparent substrate;

forming a first linear polarizer on the back of the transparent substrate;

A second linear polarizer is formed on the back of the transparent substrate.

Optionally, before laminating the transparent substrate and the transparent substrate, it also includes:

forming a color resist and a black matrix on the transparent substrate, the black matrix being located between adjacent color resists;

Alternatively, a color resist is formed on the transparent substrate, and before the capacitive touch structure is formed, a black matrix is formed on the transparent substrate, and the black matrix is located at an adjacent color resist formed on the transparent substrate in a direction parallel to the transparent substrate. between;

Alternatively, a color resistance is formed on the transparent substrate, after the capacitive touch structure is formed, and before the first insulating layer is formed, a black matrix is formed on the capacitive touch structure, and the black matrix is formed in a direction parallel to the transparent substrate. The matrix is located between adjacent color resists formed on the transparent substrate;

Alternatively, a color resistance is formed on the transparent substrate, and after forming the shielding electrode layer and before forming the second insulating layer, a black matrix is formed on the shielding electrode layer, and the black matrix is formed in a direction parallel to the transparent substrate. The matrix is located between adjacent color resists formed on the transparent substrate;

Alternatively, a color resist is formed on the transparent substrate, and after forming the second insulating layer and before forming the display structure, a black matrix is formed on the second insulating layer, and the black matrix is located in the direction parallel to the transparent substrate. between adjacent color resists formed on the transparent substrate.

Optionally, it also includes: providing a transparent substrate;

The front side of the transparent substrate on which the touch structure and the display structure are formed is relatively bonded to the transparent substrate;

forming a first circular polarizer on the back of the transparent substrate;

A second circular polarizer is formed on the back of the transparent substrate.

Optionally, before laminating the transparent base and the transparent substrate, the method further includes: forming a color resist and a black matrix on the transparent substrate, and the black matrix is located between adjacent color resists.

The present invention also provides another method for forming a display panel, including:

Provide a transparent base;

sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;

forming a display structure in IPS/FFS display mode on the first insulating layer;

The display structure forming the IPS/FFS display mode includes:

forming a common electrode on the first insulating layer;

forming a second insulating layer on the common electrode;

forming TFT switches, scan lines and data lines on the second insulating layer;

forming a passivation layer to cover the TFT switch, data lines and scan lines;

A pixel electrode is formed on the passivation layer, and the pixel electrode is a strip electrode.

Optionally, the common electrode is made of a transparent conductive material, and materials of the first insulating layer and the second insulating layer are both transparent insulating materials.

Optionally, the common electrode is tiled with the passivation layer, or the common electrode has a gap, and the gap is opposite to the gap between the pixel electrodes.

Optionally, forming a capacitive touch structure on the transparent substrate includes:

forming a plurality of sensing electrodes arranged in parallel on the transparent substrate;

forming a dielectric layer to cover the sensing electrodes and the transparent substrate;

A plurality of driving electrodes are formed on the dielectric layer, and the sensing electrodes and the driving electrodes are arranged to cross each other.

Optionally, forming a capacitive touch structure on the transparent substrate includes:

A plurality of parallel-arranged sensing electrodes and a plurality of parallel-arranged driving electrodes intersecting the sensing electrodes are formed on the transparent substrate, and each of the driving electrodes is separated into multiple segments by the plurality of sensing electrodes;

forming a dielectric layer to cover the sensing electrodes, the driving electrodes and the transparent substrate;

patterning the dielectric layer, forming a via hole in the dielectric layer, the bottom of the via hole exposing each segment of the driving electrode;

forming a conductive layer, covering the dielectric layer and filling the via hole;

Patterning the conductive layer to form an interconnection line electrically connects multiple segments of each of the driving electrodes separated by the plurality of sensing electrodes.

Optionally, it also includes: providing a transparent substrate;

The front side of the transparent substrate on which the touch structure and the display structure are formed is relatively bonded to the transparent substrate;

forming a first linear polarizer on the back of the transparent substrate;

A second linear polarizer is formed on the back of the transparent substrate.

Optionally, before laminating the transparent substrate and the transparent substrate, it also includes:

forming a color resist and a black matrix on the transparent substrate, the black matrix being located between adjacent color resists;

Alternatively, a color resist is formed on the transparent substrate, and before the capacitive touch structure is formed, a black matrix is formed on the transparent substrate, and the black matrix is located at an adjacent color resist formed on the transparent substrate in a direction parallel to the transparent substrate. between;

Alternatively, a color resistance is formed on the transparent substrate, after the capacitive touch structure is formed, and before the first insulating layer is formed, a black matrix is formed on the capacitive touch structure, and the black matrix is formed in a direction parallel to the transparent substrate. The matrix is located between adjacent color resists formed on the transparent substrate;

Alternatively, a color resist is formed on the transparent substrate, and after forming the common electrode and before forming the second insulating layer, a black matrix is formed on the common electrode, and the black matrix is located in the direction parallel to the transparent substrate. between adjacent color resists formed on the transparent substrate;

Alternatively, a color resist is formed on the transparent substrate, and after forming the second insulating layer and before forming the TFT switch, the scanning line and the data line, a black matrix is formed on the second insulating layer, and the black matrix is formed in the direction parallel to the transparent substrate. The black matrix is located between adjacent color resists formed on the transparent substrate.

Optionally, it also includes: providing a transparent substrate;

The front side of the transparent substrate on which the touch structure and the display structure are formed is relatively bonded to the transparent substrate;

forming a first circular polarizer on the back of the transparent substrate;

A second circular polarizer is formed on the back of the transparent substrate.

Optionally, before laminating the transparent base and the transparent substrate, the method further includes: forming a color resist and a black matrix on the transparent substrate, and the black matrix is located between adjacent color resists.

The present invention also provides a display panel, comprising:

transparent base;

sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;

A display structure in IPS/FFS display mode located on the second insulating layer.

Optionally, the shielding electrode layer is made of a transparent conductive material, and the materials of the first insulating layer and the second insulating layer are both transparent insulating materials.

Optionally, the capacitive touch structure includes:

a plurality of sensing electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the sensing electrodes and the transparent substrate;

A plurality of driving electrodes arranged in parallel on the dielectric layer, the sensing electrodes and the driving electrodes are arranged to cross each other;

Alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the driving electrodes and the transparent substrate;

A plurality of sensing electrodes arranged in parallel on the dielectric layer, the sensing electrodes and the driving electrodes are arranged to cross each other.

Optionally, the capacitive touch structure includes:

A plurality of parallel-arranged sensing electrodes located on the transparent substrate, a plurality of parallel-arranged driving electrodes intersecting the sensing electrodes, each of the driving electrodes is separated into multiple segments by the plurality of sensing electrodes;

a dielectric layer covering the sensing electrodes, the driving electrodes and the transparent substrate, the dielectric layer having via holes;

an interconnection line located on the dielectric layer, the interconnection line electrically connects each of the driving electrodes separated by the plurality of sensing electrodes;

Alternatively, the capacitive touch structure includes:

A plurality of driving electrodes arranged in parallel on the transparent substrate, a plurality of sensing electrodes arranged in parallel intersecting the driving electrodes, each of the sensing electrodes is divided into multiple segments by the plurality of driving electrodes;

a dielectric layer covering the sensing electrodes, the driving electrodes and the transparent substrate, the dielectric layer having via holes;

An interconnection line located on the dielectric layer, the interconnection line electrically connects together a plurality of segments in which each sensing electrode is separated by the plurality of driving electrodes.

Optionally, the display structure of the IPS/FFS display mode includes:

TFT switches, scan lines and data lines located on the second insulating layer;

a passivation layer covering the TFT switches, data lines and scan lines;

A pixel electrode and a common electrode are arranged at intervals on the passivation layer, and there is a gap between the pixel electrode and the common electrode.

Optionally, the display structure of the IPS/FFS display mode includes:

TFT switches, scan lines and data lines located on the second insulating layer;

a passivation layer covering the TFT switches, data lines and scan lines;

a common electrode on the passivation layer;

a third insulating layer covering the common electrode and the passivation layer;

a pixel electrode located on the third insulating layer, the pixel electrode being a strip electrode;

or,

The display structure of the IPS/FFS display mode includes:

TFT switches, scan lines and data lines located on the second insulating layer;

a passivation layer covering the TFT switches, data lines and scan lines;

a pixel electrode on the passivation layer;

a third insulating layer covering the pixel electrode and the passivation layer;

A common electrode located on the third insulating layer, the common electrode is a strip electrode.

Optionally, it also includes: a transparent substrate opposite to the transparent substrate;

a liquid crystal layer located between the transparent substrate and the transparent base;

a first linear polarizer positioned on the back of the transparent substrate;

a second linear polarizer located on the back of the transparent substrate.

Optionally, the transparent substrate is a color filter substrate with color resistance;

It also includes: a black matrix, the black matrix is located on the transparent substrate, and is located between adjacent color resists; or, the black matrix is located between the transparent substrate and the touch structure, and is parallel to the direction of the transparent substrate Located between adjacent color resists; or, the black matrix is located between the first insulating layer and the touch structure, and is located between adjacent color resists in a direction parallel to the transparent substrate; or, the black matrix is located between the between the shielding electrode layer and the second insulating layer, and between adjacent color resists in the direction parallel to the transparent substrate; or, the black matrix is located between the second insulating layer and the display structure, and between Located between adjacent color resists in a direction parallel to the transparent substrate.

Optionally, it also includes: a transparent substrate opposite to the transparent substrate;

a liquid crystal layer located between the transparent substrate and the transparent base;

a first circular polarizer positioned on the back of the transparent substrate;

a second circular polarizer located on the back of the transparent substrate.

Optionally, the transparent substrate is a color filter substrate with a color resist and a black matrix; the transparent substrate also has a black matrix located between adjacent color resists.

The present invention also provides another display panel, including:

transparent base;

sequentially forming a capacitive touch structure, a first insulating layer, and a display structure in IPS/FFS display mode on the transparent substrate;

Wherein, the display structure of the IPS/FFS display mode includes: a common electrode and a second insulating layer sequentially formed on the first insulating layer; a TFT switch, a scanning line and a data line located on the second insulating layer ; a passivation layer covering the TFT switch, data lines and scanning lines; a pixel electrode located on the passivation layer, and the pixel electrode is a strip electrode.

Optionally, the common electrode is made of a transparent conductive material, and materials of the first insulating layer and the second insulating layer are both transparent insulating materials.

Optionally, the common electrode is tiled with the passivation layer, or the common electrode has a gap, and the gap is opposite to the gap between the pixel electrodes.

Optionally, the capacitive touch structure includes:

a plurality of sensing electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the sensing electrodes and the transparent substrate;

A plurality of driving electrodes located on the dielectric layer, the sensing electrodes and the driving electrodes are arranged to cross each other;

Alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the driving electrodes and the transparent substrate;

A plurality of sensing electrodes arranged in parallel on the dielectric layer, the sensing electrodes and the driving electrodes are arranged to cross each other.

Optionally, the capacitive touch structure includes:

A plurality of parallel-arranged sensing electrodes located on the transparent substrate, and a plurality of parallel-arranged driving electrodes intersecting the sensing electrodes, each of the driving electrodes is separated into multiple segments by the plurality of sensing electrodes;

a dielectric layer covering the sensing electrodes, the driving electrodes and the transparent substrate, the dielectric layer having via holes;

an interconnection line located on the dielectric layer, the interconnection line electrically connects each of the driving electrodes separated by the plurality of sensing electrodes;

Alternatively, the capacitive touch structure includes:

A plurality of driving electrodes arranged in parallel on the transparent substrate, a plurality of sensing electrodes arranged in parallel intersecting the driving electrodes, each of the sensing electrodes is separated into multiple segments by the plurality of driving electrodes;

a dielectric layer covering the sensing electrodes, the driving electrodes and the transparent substrate, the dielectric layer having via holes;

An interconnection line located on the medium layer, the interconnection line electrically connects together a plurality of segments in which each sensing electrode is separated by the plurality of driving electrodes.

Optionally, it also includes: a transparent substrate opposite to the transparent substrate;

a liquid crystal layer located between the transparent substrate and the transparent base;

a first linear polarizer positioned on the back of the transparent substrate;

a second linear polarizer located on the back of the transparent substrate.

Optionally, the transparent substrate is a color filter substrate with color resistance;

It also includes: a black matrix, the black matrix is located on the transparent substrate of the color filter, and is located between adjacent color resists; or, the black matrix is located between the transparent substrate and the touch structure, and is located on the parallel transparent substrate The direction is located between adjacent color resists; or, the black matrix is located between the first insulating layer and the touch structure, and is located between adjacent color resists in the direction parallel to the transparent substrate; or, the black matrix Located between the common electrode and the second insulating layer, and between adjacent color resistors in the direction parallel to the transparent substrate; or, the black matrix is located between the second insulating layer and the TFT switch, data line, between scanning lines, and between adjacent color resists in the direction parallel to the transparent substrate.

Optionally, it also includes: a transparent substrate opposite to the transparent substrate;

a liquid crystal layer located between the transparent substrate and the transparent base;

a first circular polarizer positioned on the back of the transparent substrate;

a second circular polarizer located on the back of the transparent substrate.

Optionally, the transparent substrate is a color filter substrate with a color resist and a black matrix; the transparent substrate also has a black matrix located between adjacent color resists.

The present invention also provides a liquid crystal display device, comprising:

said display panel;

A backlight located on one side of the transparent substrate.

Compared with the prior art, the present invention has the following advantages:

In the display panel of this technical solution, the touch structure is formed on a transparent substrate, a display structure in IPS/FFS display mode is formed above the touch structure, and a shielding electrode layer or a shielding electrode layer is formed between the touch structure and the display structure in IPS/FFS display mode The common electrode serves as the shielding electrode layer, which can avoid the problem of mutual interference between the electric field of the display structure in the IPS/FFS display mode and the electric field of the touch structure. Moreover, since the touch structure and the display structure of the IPS/FFS display mode are located on the same transparent substrate, it is an in-cell touch structure (In Cell TP), which saves a transparent substrate compared with the external display panel, making the final LCD product The thickness becomes thinner, and the weight of the end product is reduced.

In addition, the method for forming the display panel of the technical solution has a simple preparation process and low cost.

Description of drawings

1 is a schematic flowchart of a method for forming a display panel according to a first embodiment of the present invention;

2 is a schematic plan view of a touch structure of a specific embodiment of the present invention;

3 is a schematic plan view of the pixel structure of the IPS/FFS display mode of the first embodiment of the present invention;

4 to 7 are schematic cross-sectional structural views of a method for forming a display panel according to a first embodiment of the present invention;

8 to 10 are schematic cross-sectional structure diagrams of a method for forming a display panel according to a second embodiment of the present invention;

11 is a schematic plan view of the pixel structure of the IPS/FFS display mode of the third embodiment of the present invention;

12 to 13 are schematic cross-sectional structural views of a method for forming a display panel according to a third embodiment of the present invention;

14 to 16 are schematic cross-sectional structural views of a method for forming a display panel according to a fourth embodiment of the present invention;

17 is a schematic cross-sectional structure diagram of a display panel according to a fifth embodiment of the present invention;

18 is a schematic cross-sectional structure diagram of a display panel according to a sixth embodiment of the present invention;

19 is a schematic cross-sectional structure diagram of a display panel according to a seventh embodiment of the present invention;

20 is a schematic cross-sectional structure diagram of a display panel according to an eighth specific embodiment of the present invention;

21 is a schematic cross-sectional structure diagram of a display panel according to a ninth embodiment of the present invention;

FIG. 22 is a schematic cross-sectional structure diagram of a display panel according to a tenth embodiment of the present invention.

23 is a schematic flowchart of a method for forming a display panel according to an eleventh embodiment of the present invention;

24-25 are schematic cross-sectional structure diagrams of a method for forming a display panel according to an eleventh embodiment of the present invention;

26 is a schematic cross-sectional structure diagram of a display panel according to a twelfth embodiment of the present invention;

27 is a schematic cross-sectional structure diagram of a display panel according to a thirteenth embodiment of the present invention;

28 is a schematic cross-sectional structure diagram of a display panel according to a fourteenth specific embodiment of the present invention;

29 is a schematic cross-sectional structure diagram of a display panel according to a fifteenth embodiment of the present invention;

30 is a schematic cross-sectional structure diagram of a display panel according to a sixteenth embodiment of the present invention;

31 is a schematic cross-sectional structure diagram of a display panel according to a seventeenth specific embodiment of the present invention;

FIG. 32 is a schematic cross-sectional structure diagram of a display panel according to an eighteenth embodiment of the present invention.

Detailed ways

In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

In the following description, specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways than those described here, and those skilled in the art can make similar extensions without departing from the connotation of the present invention. Accordingly, the present invention is not limited to the specific embodiments disclosed below.

Embodiment of display panel forming method

first embodiment

FIG. 1 is a schematic flowchart of a method for forming a display panel according to a first embodiment of the present invention. With reference to FIG. 1 , the method for forming a display panel according to the first embodiment of the present invention includes:

Step S11, providing a transparent substrate;

Step S12, sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;

Step S13 , forming a display structure in IPS/FFS display mode on the second insulating layer.

FIG. 2 is a schematic plan view of a touch structure according to a specific embodiment of the present invention, showing a touch grid 100 of a touch screen, which is formed by cross-arranging driving electrodes and sensing electrodes.

Fig. 3 is a schematic plan view of the pixel structure of the IPS/FFS display mode of the first embodiment of the present invention, with reference to Fig. 3, the IPS/FFS (In Plane Switching, IPS for short; FringeField Switching, FFS for short) of the first embodiment The display structure includes: a TFT switch, the TFT switch includes a gate 411a, a source 441a, and a drain 442a; a scan line 412a electrically connected to the gate 411a; a data line 443a electrically connected to the source 441a; a common electrode 413a, And the pixel electrode 46a opposite to the common electrode 413a, wherein in each pixel area, there are a plurality of pixel electrodes 46a arranged at intervals, there is a gap between each pixel electrode 46a, the pixel electrode 46a is formed above the common electrode 413a, and The common electrodes 413a face each other.

In the display panel of the first embodiment of the present invention, the capacitive touch structure and the IPS/FFS display structure in the IPS display mode are formed on the same transparent substrate.

4 to 7 are schematic cross-sectional structure diagrams of the method for forming a display panel according to the first embodiment of the present invention along the a-a direction shown in FIG. 2 and the b-b direction shown in FIG. 3 . 4 to FIG. 7 describe in detail the method for forming the display panel according to the first embodiment of the present invention.

With reference to FIG. 1 , FIG. 3 and FIG. 4 , step S11 is performed to provide a transparent substrate 10 . In the first embodiment, the transparent substrate 10 is a glass transparent substrate, but the transparent substrate 10 in the present invention is not limited to a glass transparent substrate, and can also be other transparent substrates known to those skilled in the art, such as a transparent plastic transparent substrate.

Referring to FIG. 1 , FIG. 3 , FIG. 5 , and FIG. 6 , step S12 is performed to sequentially form a capacitive touch structure 20 a , a first insulating layer 31 , a shielding electrode layer 32 and a second insulating layer 33 on the transparent substrate 10 . Specifically, a capacitive touch structure 20a is formed on the transparent substrate 10, a first insulating layer 31 is formed on the capacitive touch structure 20a, a shielding electrode layer 32 is formed on the first insulating layer 31, and a shielding electrode layer 32 is formed on the shielding electrode layer 32. The second insulating layer 33 is formed. The shielding electrode layer 32 is a transparent conductive material, and the materials of the first insulating layer 31 and the second insulating layer 33 are both transparent insulating materials.

The transparent substrate 10 has two opposite sides, wherein the side used to form the touch structure and the subsequent display structure of the IPS/FFS display mode is defined as the front side in the present invention, and the side opposite to the front side is defined as the back side.

In the present invention, the capacitive touch structure is formed on the front side of the transparent substrate 10 . Referring to FIG. 5 , specifically, forming the capacitive touch structure 20a on the transparent substrate 10 includes: forming a plurality of parallel-arranged sensing electrodes 21a on the transparent substrate 10, and the specific formation method is to deposit and form a conductive layer on the transparent substrate 10, Then the conductive layer is patterned to form a plurality of sensing electrodes 21a arranged in parallel, the material of the sensing electrodes 21a is metal or transparent conductive material, such as MoNb metal, ITO transparent material; when the material of the sensing electrode 21a is a transparent conductive material such as ITO , the sensing electrode 21a will not affect the aperture ratio of the pixel; when the material of the sensing electrode 21a is metal, since the metal is opaque, in order to avoid the reduction of the pixel aperture ratio, each sensing electrode 21a is divided into multiple areas according to the pixel arrangement, each block The area is hollowed out in the pixel area to avoid affecting the aperture ratio of the pixel. Afterwards, a dielectric layer 23a is formed to cover the sensing electrodes 21a and the transparent substrate 10, and the material of the dielectric layer 23a is silicon oxide, silicon nitride and other transparent insulating materials known to those skilled in the art. Next, a plurality of driving electrodes 22a are formed on the dielectric layer 23a, and the sensing electrodes 21a and the driving electrodes 22a are arranged to cross each other; the specific method of forming the driving electrodes 22a is to deposit and form a conductive layer on the dielectric layer 23a, Then the conductive layer is patterned to form a plurality of driving electrodes 22a arranged in parallel, the material of the driving electrodes 22a is metal or transparent conductive material, such as MoNb metal, ITO transparent material; when the material of the driving electrode 22a is a transparent conductive material such as ITO , the drive electrode 22a will not affect the aperture ratio of the pixel; when the material of the drive electrode 22a is metal, since the metal is opaque, in order to avoid the reduction of the pixel aperture ratio, each drive electrode 22a is divided into multiple regions according to the pixel arrangement, each block The area is hollowed out in the pixel area to avoid affecting the aperture ratio of the pixel. In the first embodiment, a plurality of sensing electrodes 21a are arranged in parallel and spaced apart, and a plurality of driving electrodes 22a are arranged in parallel and spaced apart, and the sensing electrodes 21a and the driving electrodes 22a are perpendicular to each other. In addition, the plurality of driving electrodes 22a are electrically connected, and the electrical connection between the plurality of driving electrodes 22a is realized through peripheral circuits.

Referring to FIG. 6, in the first embodiment, the materials of the first insulating layer 31 and the second insulating layer 33 may be transparent organic materials, or transparent materials known to those skilled in the art such as silicon nitride or silicon oxide, forming The method of the first insulating layer 31 and the second insulating layer 33 needs to be adjusted according to the material. When silicon nitride or silicon oxide is used, the forming method of the first insulating layer 31 and the second insulating layer 33 is chemical vapor deposition. The material of the shielding electrode layer 32 is a transparent conductive material, such as ITO transparent material. Wherein, the shielding electrode layer 32 plays a role of preventing the electric fields of the touch structure and the display structure from interfering with each other.

With reference to FIG. 1 , FIG. 3 and FIG. 7 , step S13 is performed to form a display structure 40 a in IPS/FFS display mode on the second insulating layer 33 . In the first embodiment, specifically, forming the IPS-FFS display structure on the second insulating layer 33 includes: forming a TFT switch, a scan line 412a and a data line 443a on the second insulating layer 33; after that, forming A passivation layer 45a, covering the TFT switch, data line 443a and scanning line 412a; then, forming a common electrode 413a on the passivation layer 45a; forming a third insulating layer 47a, covering the common electrode 413a and passivation Layer 45a; Next, form the pixel electrode 46a on the third insulating layer 47a, the pixel electrode 46a is a strip-shaped electrode, and there are a plurality of strip-shaped pixel electrodes 46a arranged at intervals in one pixel, and in the same pixel area, each pixel electrode There are gaps (not labeled in the figure) between 46a. In the first embodiment, the common electrode 413a covers the entire passivation layer 45a, but in the present invention, the common electrode 413a may also have a gap, which is opposite to the gap between the pixel electrodes 46a. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which ensures that the liquid crystal rotates in a plane parallel to the transparent substrate.

In addition, in this embodiment, the positional relationship between the common electrode 413a and the pixel electrode 46a can be exchanged, specifically: forming TFT switches, scanning lines, and data lines on the second insulating layer; forming a passivation layer to cover all The TFT switch, the data line and the scanning line; forming a pixel electrode on the passivation layer; forming a third insulating layer to cover the pixel electrode and the passivation layer; forming a common electrode on the third insulating layer, so The common electrodes are strip-shaped electrodes, and there are multiple strip-shaped common electrodes arranged at intervals in one pixel, and there are gaps between each common electrode in the same pixel area. An electric field is formed between the pixel electrode and the common electrode, and the electric field at the gap of the common electrode is parallel to the surface of the transparent substrate, which ensures that the liquid crystal rotates in a plane parallel to the transparent substrate.

Specifically, forming a TFT switch, a scan line and a data line on the second insulating layer 33 includes: forming a gate 411a of a TFT switch on the second insulating layer 33, a scan line 412a electrically connected to the gate 411a, and The cut position in FIG. 7 does not show the grid 411a and the scanning line 412a; the specific formation method is: forming a conductive layer on the second insulating layer 33, and patterning the conductive layer to form the grid 411 and the scanning line 412a; 411a and the scanning line 412a are made of MoNd or AlNd. Afterwards, a gate dielectric layer 42a is formed to cover the gate 411a, the scanning line 412a and the second insulating layer 33. The material of the gate dielectric layer 42a is silicon oxide or silicon nitride and other materials known to those skilled in the art. for chemical vapor deposition. Next, an active region is formed on the gate dielectric layer 42a, not shown in the figure, and the material of the active region can be amorphous silicon; then, the source electrode 441a, the drain electrode 442a, and the source electrode 441a of the TFT switch are formed. The connected data line 443a; the specific formation method is: forming a conductive layer, covering the active region and the gate dielectric layer 42a, and patterning the conductive layer to form a source electrode 441a and a drain electrode 442a (not shown in the cut position of FIG. 7 ), the data line 443a electrically connected to the source 441a; the source 441a, the drain 442a, and the data line 443a electrically connected to the source 441a are made of MoNd or AlNd.

In the first embodiment, the method for forming the touch structure is: firstly forming the sensing electrodes on the transparent substrate 10 , then forming the dielectric layer, and then forming the driving electrodes on the dielectric layer. However, in the first embodiment, the method for forming the touch structure may also be: firstly form the driving electrodes on the transparent substrate 10, then form the dielectric layer, and then form the sensing electrodes on the dielectric layer, that is, the driving electrodes and the sensing electrodes will be formed. The sequence is interchanged.

second embodiment

8 to 10 are schematic cross-sectional structure diagrams of the method for forming a display panel according to the second embodiment of the present invention along the a-a direction shown in FIG. 2 and the b-b direction shown in FIG. 3 . 8 to 10 describe in detail the method for forming the display panel according to the second embodiment of the present invention.

With reference to FIG. 1 , FIG. 8 , and FIG. 9 , step S11 and step S12 are executed, wherein step S11 is the same as that of the first embodiment, and details are not repeated here. Step S12, forming the capacitive touch structure 20b on the front surface of the transparent substrate 10 includes: forming a plurality of parallel-arranged sensing electrodes 21b on the transparent substrate 10, and forming a plurality of parallel-arranged driving electrodes 21b crossing the sensing electrodes 21b. Each of the driving electrodes 22b is divided into multiple segments by the plurality of sensing electrodes 21b. The specific formation method is: deposit and form a conductive layer on the transparent substrate 10, and pattern the conductive layer to form a plurality of electrodes 22b. Sensing electrodes 21b arranged in parallel, and a plurality of driving electrodes 22b arranged in parallel. Afterwards, a dielectric layer 23b is formed to cover the sensing electrodes 21b, the driving electrodes 22b and the transparent substrate 10. The material and formation method of the dielectric layer 23b are the same as those of the dielectric layer 23 in the first embodiment, which will not be repeated here. Next, the dielectric layer 23 is patterned to form a via hole 24b in the dielectric layer 23, and the bottom of the via hole 24b exposes each segment of the driving electrode 22b; then, a conductive layer is formed to cover the dielectric layer 23 and filling the via hole 24b; patterning the conductive layer to form an interconnection line 25b, electrically connecting multiple segments of each driving electrode 22b separated by the plurality of sensing electrodes. Wherein, the material of the conductive layer is metal or transparent conductive material, such as ITO.

The material of sensing electrode 21b and driving electrode 22b is metal or transparent conductive material, such as MoNb metal, ITO transparent material; When the material of sensing electrode 21b and driving electrode 22b is transparent conductive material such as ITO, sensing electrode 21b and driving electrode 22b are not It will affect the aperture ratio of the pixel; when the material of the sensing electrode 21b and the driving electrode 22b is metal, since the metal is opaque, in order to avoid the reduction of the pixel aperture ratio, the sensing electrode 21b and the driving electrode 22b are divided into multiple areas according to the pixel arrangement, each The block area is hollowed out in the pixel area to avoid affecting the aperture ratio of the pixel.

After the capacitive touch structure 20b is formed, the first insulating layer 31 , the shielding electrode layer 32 and the second insulating layer 33 are sequentially formed on the capacitive touch structure 20b , which is the same as the first embodiment and will not be repeated here.

With reference to FIG. 1 and FIG. 10 , step S13 is performed to form a display structure 40 b in IPS/FFS display mode on the second insulating layer 33 . In the second embodiment, the display structure 40b is the same as the display structure 40a, and the forming method is the same as that of the first embodiment, which will not be repeated here.

third embodiment

In the display panel of the third embodiment of the present invention, the capacitive touch structure and the display structure of the IPS display mode are formed on the same transparent substrate.

11 is a schematic plan view of the pixel structure of the IPS display mode of the third specific embodiment of the present invention. Referring to FIG. 11, the display structure of the IPS/FFS display mode of the third specific embodiment is an IPS display structure, including: a TFT switch, the The TFT switch includes a gate 411c, a source 441c and a drain 442c; a scan line 412c electrically connected to the gate 411c; a data line 443c electrically connected to the source 441c; a common electrode 47c, a pixel electrode on the same layer as the common electrode 46c, and in a pixel area, the pixel electrode 46c and the common electrode 47c are arranged at intervals with a gap between them, and both the common electrode 47c and the pixel electrode 46c are located on the passivation layer covering the TFT switch.

12 to 13 are schematic cross-sectional structure diagrams of a method for forming a display panel according to a third embodiment of the present invention. The method for forming a display panel according to the third embodiment of the present invention will be described in detail with reference to FIGS. 1 , 11 and 12 to 13. .

Referring to FIG. 1, FIG. 11 and FIG. 12, step S11 and step S12 are performed to provide a transparent substrate 10 on which a touch structure 20c, a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 32 are sequentially formed. Layer 33. In the third embodiment, the touch structure 20c is the same as the touch structure 20a in the first embodiment, and step S11 and step S12 are the same as the first embodiment, which will not be repeated here.

With reference to FIG. 1 , FIG. 11 and FIG. 13 , step S13 is performed to form a display structure 40 c in IPS/FFS display mode on the second insulating layer 33 . In the third embodiment of the present invention, forming the display structure 40c in the IPS/FFS display mode on the second insulating layer 33 includes: forming a TFT switch, a scan line 412c and a data line 443c on the second insulating layer 33, The scanning line is not shown in the section position in FIG. 13; a passivation layer 45c is formed to cover the TFT switch, data line 443c and scanning line 412c; pixel electrodes 46c and common electrodes arranged at intervals are formed on the passivation layer 45c 47c. In this third embodiment, the material of the pixel electrode 46c and the common electrode 47c is a transparent conductive material, such as ITO material; the method for forming the pixel electrode and the common electrode is: depositing and forming a transparent conductive material layer on the passivation layer 45c, and then The pixel electrode 46c and the common electrode 47c are formed by patterning the transparent conductive material layer by photolithography and etching process. In each pixel region, there are a plurality of pixel electrodes 46c arranged in parallel and common electrodes 47c arranged in parallel, and the pixel electrodes 46c and common electrodes 47c are arranged at intervals with gaps between them, and each pixel electrode is electrically connected to each other. The common electrodes 47c are electrically connected to each other, the pixel electrode 46c is electrically connected to the drain of the TFT switch, and the common electrode 47c is electrically connected to the common potential. The common electrode 47c also has a comb shape as a whole, and the pixel electrode is electrically connected to the drain of the TFT switch through a via hole. A parallel field parallel to the surface of the transparent substrate 10 is formed between the pixel electrode 46c and the common electrode 47c, and the parallel field can make the liquid crystal rotate in a plane parallel to the transparent substrate.

In the third embodiment, the material of the passivation layer 45c is silicon oxide, silicon nitride or other materials known to those skilled in the art, and the formation method is chemical vapor deposition.

In the third embodiment, forming a TFT switch, a scan line, and a data line on the second insulating layer 33 includes: forming a gate 411c of a TFT switch on the second insulating layer 33, and forming the gate 411c on the second insulating layer 33. Electrically connected scanning lines 412c, the cross-sectional position of FIG. 13 does not show the gates and the scanning lines electrically connected to the gates; a gate dielectric layer 42c is formed to cover the gates 411c, scanning lines 412c and the second insulating layer 33 ; forming an active region (not shown in the figure) on the gate dielectric layer 42c; forming a source electrode, a drain electrode of a TFT switch, and a data line 43c electrically connected to the drain electrode. In the third embodiment, the method for forming TFT switches, data lines and scanning lines is the same as that of the first embodiment, and details can be referred to the first embodiment.

Fourth embodiment

14 to 16 are schematic cross-sectional structural diagrams of a method for forming a display panel according to a fourth embodiment of the present invention. The method for forming a display panel according to the fourth embodiment of the present invention will be described in detail with reference to FIGS. 1 , 11 and 14 to 16. .

Referring to FIG. 1, FIG. 11 and FIG. 14 and FIG. 15, step S11 is performed to provide a transparent substrate 10; step S12 is to sequentially form a touch structure 20d, a first insulating layer 31, a shielding electrode layer 32 and a transparent substrate 10 on the transparent substrate 10. The second insulating layer 33 . The touch structure 20d is the same as the touch structure 20b in the second embodiment, and the steps S11 and S12 are the same as the second embodiment, and will not be repeated here.

With reference to FIG. 1 , FIG. 11 and FIG. 16 , step S13 is performed to form a display structure 40 d in the IPS/FFS display mode on the second insulating layer 33 . In the fourth embodiment, the display structure 40d in the IPS/FFS display mode is the same as the display structure 40c in the third embodiment, and the forming method is also the same, so details are not repeated here.

fifth embodiment

17 is a schematic cross-sectional structure diagram of a display panel according to a fifth embodiment of the present invention. Referring to FIG. 17, in the fifth embodiment, a method for forming a display panel includes: providing a transparent substrate 10, forming a touch structure 20 on the transparent substrate 10, the The touch structure 20 may be one of the touch structures 20a, 20b, 20c, and 20d of the first, second, third, and fourth embodiments described above; The first insulating layer 31, the shielding electrode layer 32, and the second insulating layer 33 of the third and fourth embodiments form a display structure 40 in the IPS/FFS display mode on the second insulating layer 33, and display in the IPS/FFS display mode The structure 40 is one of the display structures 40a, 40b, 40c and 40d of the first, second, third and fourth embodiments described above.

The method for forming a display panel of the fifth embodiment further includes:

A transparent substrate 50 is provided; the front side of the transparent substrate 10 with the touch structure and the display structure formed is opposite to the transparent substrate 50; a first linear polarizer 51 is formed on the back of the transparent substrate 10; A second linear polarizing plate 52 is formed. Before laminating the transparent substrate and the transparent substrate, it further includes: forming a color resist 54 and a black matrix 53 on the transparent substrate 50 , and the black matrix 53 is located between adjacent color resists 54 . The specific forming method may be to first form the color resist 54 on the transparent substrate 50 , and then form the black matrix 53 ; or it may also be to first form the black matrix 53 on the transparent substrate 50 , and then form the color resist 54 . The transparent substrate 50 is a glass transparent substrate, but is not limited to a glass transparent substrate, and may be other materials known to those skilled in the art, such as a transparent plastic transparent substrate. The color resistance can be a red, green, blue three-color color resistance or a red, green, blue, white four-color color resistance 54 and a black matrix 53 between adjacent color resistances; a first linear polarizer is formed on the back of the transparent substrate 10 51.

It should be noted that the surface of the transparent substrate 50 opposite to the transparent base 10 is the front surface, and the surface opposite the front surface is the rear surface.

When no color resistance is formed, it can be a black and white display or a field sequential color display.

It also includes: forming a liquid crystal layer 70 between the bonded transparent substrate 50 and the transparent substrate 10. The specific forming method may be to first drop liquid crystal on the front of the transparent substrate, and then bond the transparent substrate and the transparent substrate. After the transparent substrate and the transparent substrate are pasted together, polarizers are respectively pasted on the back of the transparent substrate. Of course, you can also paste the polarizer first and then paste it. Both the major axis and the minor axis of the liquid crystals in the liquid crystal layer 70 are parallel to the front surface of the transparent substrate 10 . When the electric field between the pixel electrode and the common electrode rotates the liquid crystal, the liquid crystal always rotates on the surface parallel to the transparent substrate 10 .

A backlight 60 is formed on one side of the transparent substrate 50 . Since the backlight source is arranged on one side of the transparent substrate and the operation interface is on the back of the transparent substrate 10, a touch LCD device with an embedded touch structure combined with an in-plane rotation mode (InCell IPS (IPS-FFS)) can be realized.

Sixth embodiment

FIG. 18 is a schematic cross-sectional structure diagram of a display panel according to a sixth embodiment of the present invention. Referring to FIG. A second circular polarizing plate 52a is formed. A backlight 60 is formed on one side of the transparent substrate 50 . Others are the same as the fifth embodiment.

In this embodiment, the operation interface is on the back of the transparent substrate 10. Since the metal electrodes on the transparent substrate 10, such as gates, source electrodes, drain electrodes, data lines, scanning lines, etc., will reflect light, the external light will be blocked. Metal electrode reflection, reflected light enters the human eye, causing browsing display interface obstacles, in order to block and absorb the reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, change the type of polarizer, on the back of the transparent substrate 10 and the transparent substrate The first circular polarizer 51a and the second circular polarizer 52a are respectively attached to the back of the 50. This circular polarizer can absorb reflected light, so the reflection of the external ambient light reflected by the metal electrode after passing through the first circular polarizer 51a Light is absorbed by the first circular polarizing plate 51a.

Seventh embodiment

FIG. 19 is a schematic cross-sectional structure diagram of a display panel according to the seventh embodiment of the present invention. Referring to FIG. Before the structure 20, a black matrix 53 is formed on the transparent substrate 20, and the black matrix is located between adjacent color resists formed on the transparent substrate in a direction parallel to the transparent substrate. Others are the same as the fifth embodiment.

In this seventh embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the transparent substrate 10, and then the touch structure and the display structure are made , the ambient light reflected back is absorbed by the black matrix.

Eighth embodiment

20 is a schematic cross-sectional structure diagram of a display panel according to the eighth embodiment of the present invention. Referring to FIG. Before the insulating layer 31 , a black matrix 53 is formed on the capacitive touch structure 20 , and the black matrix is located between adjacent color resists formed on the transparent substrate 50 in a direction parallel to the transparent substrate. Others are the same as the fifth embodiment.

In this eighth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the touch structure 20, and then the first insulating layer 31 is made , the shielding electrode layer 32 , the second insulating layer 33 and the display structure 40 , the reflected ambient light is absorbed by the black matrix. The BM is made above the touch structure and below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the seventh embodiment, which can better absorb reflected ambient light and reduce the corresponding amount of reflected light .

Ninth embodiment

21 is a schematic cross-sectional structure diagram of a display panel according to the ninth embodiment of the present invention. Referring to FIG. 21, in the ninth embodiment, a color resist 54 is formed on the transparent substrate 50, and after the shielding electrode layer 32 is formed, a second insulating layer is formed. Before the layer 33, a black matrix 53 is formed on the shielding electrode layer 32, and the black matrix is located between adjacent color resists formed on the transparent substrate in a direction parallel to the transparent substrate. Others are the same as the fifth embodiment.

In this ninth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the shielding electrode layer 32, and then the second insulating layer is made and display structure, the ambient light reflected back is absorbed by the black matrix. The BM is fabricated on the shielding electrode layer and below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the eighth embodiment, which can better absorb reflected ambient light, and the corresponding amount of reflected light is reduce.

Tenth embodiment

22 is a schematic cross-sectional structure diagram of a method for forming a display panel according to the tenth embodiment of the present invention. Referring to FIG. A black matrix 53 is formed on the second insulating layer 33 , and the black matrix 53 is located between adjacent color resists 54 formed on the transparent substrate in a direction parallel to the transparent substrate 50 . Others are the same as the fifth embodiment.

In this tenth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the upper second insulating layer 33, under the display structure, by The black matrix absorbs the reflected ambient light. The BM is fabricated on the second insulating layer 33, below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the ninth embodiment, which can better absorb the reflected ambient light, and the corresponding reflection The amount of light is reduced.

Eleventh embodiment

FIG. 23 is a flowchart of a method for forming a display panel in the eleventh embodiment. Referring to FIG. 23 , the method for forming a display panel in the eleventh embodiment includes:

Step S21, providing a transparent substrate;

Step S22, sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;

Step S23, forming a display structure in IPS/FFS display mode on the first insulating layer; forming the display structure in IPS/FFS display mode includes: forming a common electrode on the first insulating layer; forming a second insulating layer on the electrodes; forming TFT switches, scan lines and data lines on the second insulating layer; forming a passivation layer covering the TFT switches, data lines and scan lines; A pixel electrode is formed, and the pixel electrode is a strip electrode.

24 to 25 are schematic cross-sectional structural diagrams of the method for forming the display panel of the eleventh embodiment. With reference to FIG. 23 and FIG. 24 , in the method for forming the display panel of the eleventh embodiment, step S21 and The step S11 is the same as that of the first embodiment. In step S22, a capacitive touch structure 20e is formed on the transparent substrate 10. The capacitive touch structure 20e is the same as the capacitive touch structure 20a of the first embodiment, and the formation method is also the same. Afterwards, the first insulating layer 31 is formed on the capacitive touch structure 20e.

Next, with reference to FIG. 23 , FIG. 25 and FIG. 3 , step S23 is performed to form a display structure 40e in the IPS/FFS display mode on the first insulating layer 31; the formation of the display structure in the IPS/FFS display mode includes: A common electrode 413a is formed on the first insulating layer 31, a second insulating layer 33 is formed on the common electrode 413a, a TFT switch, a scanning line 412a and a data line 443a are formed on the second insulating layer 33; a passivation layer 45a is formed to cover The TFT switch, the data line 443a and the scan line 412a; a pixel electrode 46a is formed on the passivation layer 45a, and the pixel electrode 46a is a strip electrode. In the same pixel area, there are a plurality of pixel electrodes 46a arranged at intervals, and there are gaps (not labeled in the figure) between each pixel electrode 46a. In the fifth embodiment, the common electrode 413a is used as a shielding electrode layer to shield the electric field between the display structure and the touch structure. Preferably, the common electrode 413a covers the entire first insulating layer 31, but in the present invention, the common electrode 413a also There may be a slit opposite to the slit between the pixel electrodes 46a. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, so as to ensure that the liquid crystal rotates in a plane parallel to the transparent substrate.

Others are the same as those in the first embodiment, and will not be repeated here.

Twelfth embodiment

26 is a schematic cross-sectional structure diagram of the display panel of the twelfth embodiment. Steps S21 to S23 are executed with reference to FIG. 26 and FIG. 24. Step S21 is the same as step S12 of the second embodiment. Forming the capacitive touch structure 20f on 10 is the same as forming the capacitive touch structure 20b in the second embodiment, forming the display structure 40f in the IPS/FFS display mode on the first insulating layer 31 is the same as forming the IPS/FFS in the eleventh embodiment The display structure 40e of the display mode is the same.

Thirteenth embodiment

FIG. 27 is a schematic cross-sectional structure diagram of a display panel according to the thirteenth embodiment of the present invention. Referring to FIG. 27 , in the thirteenth embodiment, the method for forming a display panel includes: providing a transparent substrate 10 and forming a touch structure 20 on the transparent substrate 10 , the touch structure 20 may be one of the touch structures 20e and 20f of the above-mentioned eleventh and twelfth embodiments; the above-mentioned first insulating layer 31 is formed on the touch structure 20, and the first insulating layer A display structure 40 in IPS/FFS display mode is formed on 31, and the display structure 40 in IPS/FFS display mode is one of the display structures 40e and 40f of the above eleventh and twelfth embodiments.

The method for forming a display panel of the thirteenth embodiment further includes:

A transparent substrate 50 is provided; the front side of the transparent substrate 10 with the touch structure and the display structure formed is opposite to the transparent substrate 50; a first linear polarizer 51 is formed on the back of the transparent substrate 10; A second linear polarizing plate 52 is formed. Before laminating the transparent substrate and the transparent substrate, it further includes: forming a color resist 54 and a black matrix 53 on the transparent substrate 50 , and the black matrix 53 is located between adjacent color resists 54 . The specific forming method may be to first form the color resist 54 on the transparent substrate 50 , and then form the black matrix 53 ; or it may also be to first form the black matrix 53 on the transparent substrate 50 , and then form the color resist 54 . The transparent substrate 50 is a glass transparent substrate, but is not limited to a glass transparent substrate, and may be other materials known to those skilled in the art, such as a transparent plastic transparent substrate. The color resistance can be a red, green, blue three-color color resistance or a red, green, blue, white four-color color resistance 54 and a black matrix 53 between adjacent color resistances; a first linear polarizer is formed on the back of the transparent substrate 10 51.

It should be noted that the surface of the transparent substrate 50 opposite to the transparent base 10 is the front surface, and the surface opposite the front surface is the rear surface.

When no color resistance is formed, it can be a black and white display or a field sequential color display.

It also includes: forming a liquid crystal layer 70 between the bonded transparent substrate 50 and the transparent substrate 10. The specific forming method may be to first drop liquid crystal on the front of the transparent substrate, and then bond the transparent substrate and the transparent substrate. After the transparent substrate and the transparent substrate are pasted together, polarizers are respectively pasted on the back of the transparent substrate. Of course, you can also stick the polarized skin first and then fit it. Both the major axis and the minor axis of the liquid crystals in the liquid crystal layer 70 are parallel to the front surface of the transparent substrate 10 . When the electric field between the pixel electrode and the common electrode rotates the liquid crystal, the liquid crystal always rotates on the surface parallel to the transparent substrate 10 .

A backlight 60 is formed on one side of the transparent substrate 50 . Since the backlight source is arranged on one side of the transparent substrate and the operation interface is on the back of the transparent substrate 10, a touch LCD device with an embedded touch structure combined with an in-plane rotation mode (InCell IPS (IPS-FFS)) can be realized.

Fourteenth embodiment

FIG. 28 is a schematic cross-sectional structure diagram of a display panel according to the fourteenth embodiment of the present invention. Referring to FIG. 28, in the fourteenth embodiment, a first circular polarizer 51a is formed on the back of the transparent substrate 10, 50 is formed with a second circular polarizer 52a on the back. Others are the same as the thirteenth embodiment.

In this embodiment, the operation interface is on the back of the transparent substrate 10. Since the metal electrodes on the transparent substrate 10, such as gates, source electrodes, drain electrodes, data lines, scanning lines, etc., will reflect light, the external light will be blocked. Metal electrode reflection, reflected light enters the human eye, causing browsing display interface obstacles, in order to block and absorb the reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, change the type of polarizer, on the back of the transparent substrate 10 and the transparent substrate The first circular polarizer 51a and the second circular polarizer 52a are respectively attached to the back of the 50. This circular polarizer can absorb reflected light, so the reflected light reflected by the metal electrode after the external ambient light passes through the first circular polarizer 51a Absorbed by the first circular polarizer 51a.

Fifteenth embodiment

FIG. 29 is a schematic cross-sectional structure diagram of a display panel according to the fifteenth embodiment of the present invention. Referring to FIG. Before the touch structure 20 , a black matrix 53 is formed on the transparent substrate 10 , and the black matrix is located between adjacent color resists 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50 . Others are the same as the thirteenth embodiment.

In this fifteenth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the transparent substrate 10, and then the touch structure and display are made. structure, the reflected ambient light is absorbed by the black matrix.

Sixteenth embodiment

FIG. 30 is a schematic cross-sectional structure diagram of a display panel according to the sixteenth embodiment of the present invention. Referring to FIG. Before the first insulating layer 31 , a black matrix 53 is formed on the capacitive touch structure 20 , and the black matrix 53 is located between adjacent color resists 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50 . Others are the same as the thirteenth embodiment.

In the sixteenth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the touch structure 20, and then the first insulating layer is made 31 and the display structure 40, the reflected ambient light is absorbed by the black matrix. The BM is made above the touch structure and below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the fifteenth embodiment, which can better absorb reflected ambient light, and the corresponding amount of reflected light is reduce.

Seventeenth embodiment

FIG. 31 is a schematic cross-sectional structure diagram of a display panel according to the seventeenth embodiment of the present invention. Referring to FIG. Before the insulating layer 33 , a black matrix 53 is formed on the common electrode 413 a, and the black matrix 53 is located between adjacent color resists 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50 . Others are the same as the thirteenth embodiment.

In the seventeenth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrode on the transparent substrate 10, a black matrix (Black Matrix) is made on the common electrode 413a, and then the second insulating layer is made 33 and other structures, the reflected ambient light is absorbed by the black matrix 53 . The BM is made on the common electrode 413a, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the sixteenth embodiment, which can better absorb reflected ambient light and reduce the corresponding amount of reflected light.

Eighteenth embodiment

FIG. 32 is a schematic cross-sectional structure diagram of a display panel according to the eighteenth embodiment of the present invention. Referring to FIG. 32 , in the eighteenth embodiment, a color resist 54 is formed on the transparent substrate 50, and after the second insulating layer 33 is formed , before forming TFT switches, scan lines and data lines, a black matrix 53 is formed on the second insulating layer 33 , and the black matrix is located between adjacent color resists formed on the transparent substrate in the direction parallel to the transparent substrate 50 . Others are the same as the thirteenth embodiment.

In this eighteenth embodiment, in order to block and absorb the reflected light reflected back to the operation interface from the metal electrodes on the transparent substrate 10, a black matrix (Black Matrix) is made on the upper second insulating layer 33, which is absorbed by the black matrix. Ambient light reflected back. The BM is made on the second insulating layer 33, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the seventeenth embodiment, which can better absorb the reflected ambient light, and the corresponding amount of reflected light is reduced .

Specific examples of display panels

Based on the method for forming a display panel described above, the present invention also provides a display panel, including: a transparent substrate, a touch structure located on the transparent substrate, a first insulating layer, a shielding electrode layer and a second insulating layer, the The shielding electrode layer is a transparent conductive material, and the materials of the first insulating layer and the second insulating layer are both transparent insulating materials; the display structure of the IPS/FFS display mode is located on the second insulating layer.

first embodiment

7 is a schematic cross-sectional structure diagram of a display panel according to the first embodiment of the present invention. Referring to FIG. 7, in the first embodiment, the capacitive touch structure 20a includes: a plurality of parallel-arranged sensing electrodes 21a located on the transparent substrate 10; The dielectric layer 23a covering the sensing electrodes 21a and the transparent substrate 10; a plurality of driving electrodes 22a located on the dielectric layer 23a, the sensing electrodes 21a and the driving electrodes 22a are arranged to cross each other.

Referring to FIG. 3 and FIG. 7, in the first embodiment, the display structure of the IPS/FFS display mode includes: a TFT switch located on the second insulating layer 33, a scan line 412a and a data line 443a; covering the The passivation layer 45a of the TFT switch, the data line 443a and the scan line 412a; the common electrode 413a located on the passivation layer 45a; the third insulating layer 47a covering the common electrode 413a and the passivation layer 45a; The pixel electrode 46a located on the third insulating layer 47a, the pixel electrode 46a is a strip electrode. And a pixel has a plurality of strip-shaped pixel electrodes 46a arranged at intervals, and in the same pixel area, there are gaps (not labeled in the figure) between each pixel electrode 46a. In the first embodiment, the common electrode 413a covers the entire passivation layer 45a, but in the present invention, the common electrode 413a may also have a gap, which is opposite to the gap between the pixel electrodes 46a. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which ensures that the liquid crystal rotates in a plane parallel to the transparent substrate.

In addition, in this embodiment, the positional relationship between the common electrode and the pixel electrode can be interchanged, specifically: the display structure of the IPS/FFS display mode includes: TFT switches on the second insulating layer, scanning lines and data line; a passivation layer covering the TFT switch, data line and scanning line; a pixel electrode on the passivation layer; a third insulating layer covering the pixel electrode and the passivation layer; The common electrode on the third insulating layer, the common electrode is a strip electrode.

In this embodiment, the positional relationship between the sensing electrodes and the driving electrodes can also be interchanged, specifically: the capacitive touch structure includes: a plurality of driving electrodes arranged in parallel on the transparent substrate; covering the driving electrodes and the The dielectric layer of the transparent base; a plurality of sensing electrodes located on the dielectric layer, the driving electrodes and the sensing electrodes are arranged to cross each other.

The TFT switch includes: a gate 411a located on the second insulating layer 33, a gate dielectric layer 42a covering the gate 411a, an active area located on the gate dielectric layer 42a, and an active area located on the active area , and are respectively located on the source 441a and drain 442a on both sides of the active region; the scanning line 412a is located on the same layer as the gate 411a; the data line 443a is located on the same layer as the source 441a and the drain 442a layer.

The content about the structure and materials of the display panel in the method for forming the display panel in the first embodiment can be referred to the display panel in the first embodiment, and will not be repeated here.

second embodiment

FIG. 10 is a schematic cross-sectional structure diagram of a display panel according to the second embodiment of the present invention. With reference to FIG. 3 and FIG. Electrode 21b, a plurality of driving electrodes 22b arranged in parallel across the sensing electrodes 21b, each of the driving electrodes is separated into multiple segments by the plurality of sensing electrodes; covering the sensing electrodes 21b, driving electrodes 22b and the transparent substrate 10 The dielectric layer 23b, the dielectric layer 23b has a via hole 24b; the interconnection line 25b located on the dielectric layer 23b, the interconnection line separates each of the driving electrodes from the plurality of sensing electrodes Multiple segments are electrically connected together. The material in the via hole and the material of the interconnection line are metal or transparent conductive material.

In addition, in this embodiment, the positional relationship between the sensing electrodes and the driving electrodes can be interchanged, specifically: the capacitive touch structure includes: a plurality of driving electrodes arranged in parallel on the transparent substrate, crossing the driving electrodes A plurality of sensing electrodes arranged in parallel, each sensing electrode is divided into multiple segments by the plurality of driving electrodes; a dielectric layer covering the driving electrodes, sensing electrodes and transparent substrate, the dielectric layer has via holes; An interconnection line on the dielectric layer, the interconnection line electrically connects the multiple segments of each sensing electrode separated by the plurality of driving electrodes together.

In the second embodiment, the structure of the display structure 40b is the same as that of the display structure 40a in the first embodiment, and will not be repeated here.

The content about the structure and material of the display panel in the method for forming the display panel of the second embodiment can be referred to the display panel of the second embodiment, and will not be repeated here.

third embodiment

FIG. 13 is a schematic cross-sectional structure diagram of a display panel according to a third embodiment of the present invention. Referring to FIG. 11 and FIG. 13 together, in the third embodiment, the display panel includes: a transparent substrate 10, and a touch structure 20c located on the front surface of the transparent substrate 10 A first insulating layer 31 , a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20c; a display structure 40c in IPS/FFS display mode located on the second insulating layer 33 .

In the third embodiment, the structure of the touch structure 20c is the same as that of the touch structure 20a in the first embodiment, which will not be repeated here.

In the third embodiment, the display structure 40c is an IPS display structure including: a TFT switch, a scan line 412c and a data line 443c located on the second insulating layer 33; The passivation layer 45c; the pixel electrode 46c and the common electrode 47c arranged at intervals on the passivation layer 45c (the two are located in the same layer), and there is a gap between the pixel electrode 46c and the common electrode 47c.

The TFT switch includes: a gate 411c located on the second insulating layer 33, a gate dielectric layer 42c located on the gate 411c, an active region (not shown in the figure) located on the gate dielectric layer 42c ), the source electrode 441c and the drain electrode 442c located on both sides of the active region; the scanning line 412c and the gate electrode 411c are located in the same layer; the data line 443c and The source 441c and the drain 442c are located in the same layer.

The content about the structure and materials of the display panel in the method for forming the display panel of the third embodiment can be referred to the display panel of the third embodiment, and will not be repeated here.

Fourth embodiment

FIG. 16 is a schematic cross-sectional structure diagram of a display panel according to a fourth embodiment of the present invention. Referring to FIG. 11 and FIG. 16 together, in the fourth embodiment, the display panel includes: a transparent substrate 10, and a touch structure 20d located on the front surface of the transparent substrate 10 ; A first insulating layer 31 , a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20 d ; a display structure 40 d in IPS/FFS display mode is located on the second insulating layer.

In the fourth embodiment, the structure of the touch structure 20d is the same as that of the touch structure 20b in the second embodiment, which will not be repeated here.

In the fourth embodiment, the structure of the display structure 40d is the same as that of the display structure 40c in the third embodiment, which will not be repeated here.

fifth embodiment

FIG. 17 is a schematic cross-sectional structure diagram of a display panel according to a fifth embodiment of the present invention. Referring to FIG. 17, in the fifth embodiment, the display panel includes: a transparent substrate 10, a touch structure 20 located on the front surface of the transparent substrate 10; A first insulating layer 31 , a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20 ; and a display structure 40 in IPS/FFS display mode is located on the second insulating layer. Wherein, the touch structure 20 is one of the touch structures 20a, 20b, 20c, and 20d in the above-mentioned first embodiment, the second embodiment, the third embodiment, and the fourth embodiment, and the display structure 40 is the above-mentioned first embodiment. One of the display structures 40 a , 40 b , 40 c , and 40 d in the first embodiment, the second embodiment, the third embodiment, and the fourth embodiment.

In the fifth embodiment, the display panel further includes: a transparent substrate 50 opposite to the transparent substrate 10; a liquid crystal layer 70 located between the transparent substrate 50 and the transparent substrate 10; a linear polarizer 51 ; a second linear polarizer 52 located on the back of the transparent substrate 50 . In this embodiment, the transparent substrate 50 is a color filter substrate with a color resistance 25, and the color resistance can be a three-color color resistance of red, green, and blue or a four-color color resistance of red, green, blue, and white; it also includes: a black matrix 53 , the black matrix 53 is located on the color filter transparent substrate and between adjacent color resists 54 .

It also includes: a backlight source 60 located on one side of the transparent substrate 50 .

In the method for forming the display panel of the fifth embodiment, the structure, material, display method, advantages, etc. of the display panel may be cited here.

Sixth embodiment

Fig. 18 is a schematic cross-sectional structure diagram of a display panel according to the sixth embodiment of the present invention. Referring to Fig. 18, in the sixth embodiment, the polarizer located on the back of the transparent substrate 10 is a first circular polarizer 51a; The polarizer on the back of 50 is the second circular polarizer 52a; the others are the same as those of the display panel of the fifth embodiment, and will not be repeated here. In the method for forming the display panel of the sixth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Seventh embodiment

19 is a schematic cross-sectional structure diagram of a display panel according to the seventh embodiment of the present invention. Referring to FIG. 19 , in the seventh embodiment, the black matrix 53 is located between the transparent substrate 10 and the touch structure 20, and is parallel to the transparent substrate 50. Located between adjacent color resists 54 . Others are the same as those of the fifth embodiment. In the method for forming the display panel of the seventh embodiment, the content about the structure, material, display mode, and advantages of the display panel can be cited here.

Eighth embodiment

20 is a schematic cross-sectional structure diagram of a display panel according to the eighth embodiment of the present invention. Referring to FIG. The direction of the substrate 50 is located between adjacent color resists 54 . Others are the same as the display panel of the fifth embodiment. In the method for forming a display panel in the eighth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Ninth embodiment

FIG. 21 is a schematic cross-sectional structure diagram of a display panel according to the ninth embodiment of the present invention. Referring to FIG. 21, in the ninth embodiment, the black matrix 53 is located between the shielding electrode layer 32 and the second insulating layer 33, and The transparent substrate 50 is located between adjacent color resists 54 in the direction. Others are the same as the display panel of the fifth embodiment. In the method for forming a display panel in the ninth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Tenth embodiment

FIG. 22 is a schematic cross-sectional structure diagram of a display panel according to the tenth embodiment of the present invention. Referring to FIG. 22, in the tenth embodiment, the black matrix 53 is located between the second insulating layer 33 and the display structure 20, and The direction parallel to the transparent substrate 50 is located between adjacent color resists 54 . Others are the same as the display panel of the fifth embodiment. In the method for forming the display panel of the tenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Eleventh embodiment

25 is a schematic cross-sectional structure diagram of a display panel according to an eleventh embodiment of the present invention. With reference to FIG. 3 and FIG. The touch structure 20e, the first insulating layer 31, and the display structure 40e of the IPS/FFS display mode; wherein, the capacitive touch structure 20e is the same as the capacitive touch structure 20a of the first embodiment; the display structure 40e of the IPS/FFS display mode Including: a common electrode 413a and a second insulating layer 33 sequentially formed on the first insulating layer 31; a TFT switch located on the second insulating layer 33, a scanning line 412a and a data line 443a; covering the TFT switch , the passivation layer 45a of the data line and the scanning line; the pixel electrode 46a located on the passivation layer 45a, and the pixel electrode 46a is a strip electrode. The common electrode layer 413a is a transparent conductive material, and the materials of the first insulating layer 31 and the second insulating layer 33 are both transparent insulating materials.

In the same pixel area, there are a plurality of pixel electrodes 46a arranged at intervals, and there are gaps (not labeled in the figure) between each pixel electrode 46a. In the fifth embodiment, the common electrode 413a is used as a shielding electrode layer to shield the electric field between the display structure and the touch structure. Preferably, the common electrode 413a covers the entire first insulating layer 31, but in the present invention, the common electrode 413a also There may be a slit opposite to the slit between the pixel electrodes 46aa. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, so as to ensure that the liquid crystal rotates in a plane parallel to the transparent substrate.

Others are the same as those in the first embodiment, and will not be repeated here.

Twelfth embodiment

26 is a schematic cross-sectional structure diagram of a display panel according to the twelfth embodiment of the present invention. Referring to FIG. 26 , in the display panel of the twelfth embodiment, the capacitive touch structure 20f on the transparent substrate 10 and the capacitive touch structure 20b of the second embodiment Similarly, the display structure 40f formed on the first insulating layer 31 is the same as the display structure 40e of the eleventh embodiment.

Thirteenth embodiment

FIG. 27 is a schematic cross-sectional structure diagram of a display panel according to the thirteenth embodiment of the present invention. Referring to FIG. 27, in the thirteenth embodiment, the display panel includes: a transparent substrate 10, a touch structure 20 located on the transparent substrate 10, a first An insulating layer 31; a display structure 40 in IPS/FFS display mode located on the first insulating layer. Wherein, the touch structure 20 is one of the touch structures 20e and 20f in the above-mentioned eleventh embodiment and the twelfth implementation, and the display structure 40 is the display in the above-mentioned eleventh embodiment and the twelfth implementation. One of structures 40e, 40f.

In the thirteenth embodiment, the display panel further includes: a transparent substrate 50 opposite to the transparent substrate 10; a liquid crystal layer 70 located between the transparent substrate 50 and the transparent substrate 10; a linear polarizer 51 ; a second linear polarizer 52 located on the back of the transparent substrate 50 . In this embodiment, the transparent substrate 50 is a color film transparent substrate with a color resist 25, and the color resist can be a three-color resist of red, green, and blue or a four-color resist of red, green, blue, and white; it also includes: black A matrix 53 , the black matrix 53 is located on the color filter transparent substrate and between adjacent color resists 54 .

The backlight 60 located on one side of the transparent substrate 50 .

In the method for forming a display panel in the thirteenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Fourteenth embodiment

FIG. 28 is a schematic cross-sectional structure diagram of a display panel according to the fourteenth embodiment of the present invention. Referring to FIG. 28, in the fourteenth embodiment, the polarizer located on the back of the transparent substrate 10 is a first circular polarizer 51a; The polarizing plate on the back of the transparent substrate 50 is the second circular polarizing plate 52a; the others are the same as those of the display panel of the thirteenth embodiment, and will not be repeated here. In the method for forming a display panel in the fourteenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Fifteenth embodiment

FIG. 29 is a schematic cross-sectional structure diagram of a display panel according to the fifteenth embodiment of the present invention. Referring to FIG. The direction is located between adjacent color resists 54 . Others are the same as those of the thirteenth embodiment. In the method for forming the display panel of the fifteenth embodiment, the content about the structure, material, display mode, and advantages of the display panel can be cited here.

Sixteenth embodiment

FIG. 30 is a schematic cross-sectional structure diagram of a display panel according to the sixteenth embodiment of the present invention. Referring to FIG. 30, in the sixteenth embodiment, the black matrix 53 is located between the first insulating layer 31 and the touch structure 20, and The direction parallel to the transparent substrate 50 is located between adjacent color resists 54 . Others are the same as the display panel of the thirteenth embodiment. In the method for forming a display panel in the sixteenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Seventeenth embodiment

FIG. 31 is a schematic cross-sectional structure diagram of a display panel according to the seventeenth embodiment of the present invention. Referring to FIG. 31, in the seventeenth embodiment, the black matrix 53 is located between the common electrode 413a and the second insulating layer 33, and The direction parallel to the transparent substrate 50 is located between adjacent color resists 54 . Others are the same as the display panel of the thirteenth embodiment. In the method for forming a display panel in the seventeenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Eighteenth embodiment

FIG. 32 is a schematic cross-sectional structure diagram of a display panel according to an eighteenth embodiment of the present invention. Referring to FIG. 32 , in the eighteenth embodiment, the black matrix 53 is located between the second insulating layer 33 and the TFT switches, data lines, between the scanning lines and between adjacent color resists 54 in the direction parallel to the transparent substrate 50 . Others are the same as the display panel of the thirteenth embodiment. In the method for forming a display panel in the eighteenth embodiment, the structure, material, display method, advantages, etc. of the display panel can be cited here.

Based on the above-mentioned display panel, the present invention also provides a liquid crystal display device, comprising: the display panel of the first to eighteenth embodiments; and a backlight 60 located on one side of the transparent substrate 50 .

In the display panel of this technical solution, the touch structure is formed on a transparent substrate, a display structure in IPS/FFS display mode is formed above the touch structure, and a shielding electrode layer or a shielding electrode layer is formed between the touch structure and the display structure in IPS/FFS display mode The common electrode serves as the shielding electrode layer, which can avoid the problem of mutual interference between the electric field of the display structure in the IPS/FFS display mode and the electric field of the touch structure. Moreover, since the touch structure and the display structure of the IPS/FFS display mode are located on the same transparent substrate, it is an in-cell touch structure (In Cell TP), which saves a transparent substrate compared with the external display panel, making the final LCD product The thickness becomes thinner, and the weight of the end product is reduced.

In addition, the method for forming the display panel of the technical solution has a simple preparation process and low cost.

Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention, and any person skilled in the art can use the methods disclosed above and technical content to analyze the present invention without departing from the spirit and scope of the present invention. Possible changes and modifications are made in the technical solution. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention, which do not depart from the content of the technical solution of the present invention, all belong to the technical solution of the present invention. protected range.

Claims (39)

1. A method of forming a display panel, comprising:

providing a transparent substrate;

sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;

and forming a display structure of an IPS/FFS display mode on the second insulating layer.

2. The method of forming a display panel according to claim 1, wherein the shielding electrode layer is a transparent conductive material, and the first insulating layer and the second insulating layer are both made of a transparent insulating material.

3. The method of forming a display panel of claim 1, wherein forming a capacitive touch structure on the transparent substrate comprises:

forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;

forming a dielectric layer to cover the induction electrode and the transparent substrate;

and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.

4. The method of forming a display panel of claim 1, wherein forming a capacitive touch structure on the transparent substrate comprises:

forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;

forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;

patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;

forming a conducting layer, covering the dielectric layer and filling the via hole;

patterning the conductive layer to form interconnect lines electrically connecting together segments of each of the drive electrodes separated by the plurality of sense electrodes.

5. The method of forming a display panel of claim 1, wherein forming a display structure of an IPS/FFS display mode on the second insulating layer comprises:

forming a TFT switch, a scan line and a data line on the second insulating layer;

forming a passivation layer covering the TFT switch, the data line and the scanning line;

and forming pixel electrodes and a common electrode which are arranged at intervals on the passivation layer, wherein a gap is formed between the pixel electrodes and the common electrode.

6. The method of forming a display panel of claim 1, wherein forming a display structure of an IPS/FFS display mode on the second insulating layer comprises:

forming a TFT switch, a scan line and a data line on the second insulating layer;

forming a passivation layer covering the TFT switch, the data line and the scanning line;

forming a common electrode on the passivation layer;

forming a third insulating layer covering the common electrode and the passivation layer;

forming a pixel electrode on the third insulating layer, the pixel electrode being a stripe electrode;

or,

forming a TFT switch, a scan line and a data line on the second insulating layer;

forming a passivation layer covering the TFT switch, the data line and the scanning line;

forming a pixel electrode on the passivation layer;

forming a third insulating layer covering the pixel electrode and the passivation layer;

and forming a common electrode on the third insulating layer, wherein the common electrode is a strip electrode.

7. The method of forming a display panel of claim 1, further comprising: providing a transparent substrate;

the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;

forming a first linear polarizer on the back of the transparent substrate;

and forming a second linear polarizer on the back of the transparent substrate.

8. The method of forming a display panel according to claim 7, further comprising, before attaching the transparent base and the transparent substrate:

forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;

or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the shielding electrode layer after forming the shielding electrode layer and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the display structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.

9. The method of forming a display panel of claim 1, further comprising: providing a transparent substrate;

the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;

forming a first circular polarizer on the back surface of the transparent substrate;

and forming a second circular polarizer on the back of the transparent substrate.

10. The method of forming a display panel according to claim 9, further comprising, before attaching the transparent base and the transparent substrate: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.

11. A method of forming a display panel, comprising:

providing a transparent substrate;

sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;

forming a display structure of an IPS/FFS display mode on the first insulating layer;

the display structure forming the IPS/FFS display mode comprises:

forming a common electrode on the first insulating layer;

forming a second insulating layer on the common electrode;

forming a TFT switch, a scan line and a data line on the second insulating layer;

forming a passivation layer covering the TFT switch, the data line and the scanning line;

and forming a pixel electrode on the passivation layer, wherein the pixel electrode is a strip electrode.

12. The method of forming a display panel according to claim 11, wherein the common electrode is a transparent conductive material, and the first insulating layer and the second insulating layer are both made of a transparent insulating material.

13. The method of forming a display panel according to claim 11, wherein the common electrode tiles the passivation layer, or the common electrode has a slit opposite to a slit between the pixel electrodes.

14. The method of forming a display panel of claim 11, wherein forming a capacitive touch structure on the transparent substrate comprises:

forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;

forming a dielectric layer to cover the induction electrode and the transparent substrate;

and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.

15. The method of forming a display panel of claim 11, wherein forming a capacitive touch structure on the transparent substrate comprises:

forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;

forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;

patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;

forming a conducting layer, covering the dielectric layer and filling the via hole;

patterning the conductive layer to form interconnect lines electrically connecting together segments of each of the drive electrodes separated by the plurality of sense electrodes.

16. The method of forming a display panel of claim 11, further comprising: providing a transparent substrate;

the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;

forming a first linear polarizer on the back of the transparent substrate;

and forming a second linear polarizer on the back of the transparent substrate.

17. The method of forming a display panel according to claim 16, further comprising, before attaching the transparent base and the transparent substrate:

forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;

or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the common electrode after forming the common electrode and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;

or forming color resistors on the transparent substrate, forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the TFT switches, the scanning lines and the data lines, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.

18. The method of forming a display panel of claim 11, further comprising: providing a transparent substrate;

the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;

forming a first circular polarizer on the back surface of the transparent substrate;

and forming a second circular polarizer on the back of the transparent substrate.

19. The method of forming a display panel according to claim 18, further comprising, before attaching the transparent base and the transparent substrate: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.

20. A display panel, comprising:

a transparent substrate;

the capacitive touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are sequentially formed on the transparent substrate;

and a display structure of an IPS/FFS display mode on the second insulating layer.

21. The display panel according to claim 20, wherein the shielding electrode layer is a transparent conductive material, and the first insulating layer and the second insulating layer are both made of a transparent insulating material.

22. The display panel of claim 20,

the capacitive touch structure includes:

a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;

a dielectric layer covering the sensing electrode and the transparent substrate;

the induction electrodes and the driving electrodes are arranged in a cross mode;

alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the driving electrode and the transparent substrate;

and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.

23. The display panel of claim 20,

the capacitive touch structure includes:

a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;

the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;

an interconnect on the dielectric layer, the interconnect electrically connecting together a plurality of segments of each of the drive electrodes spaced apart by the plurality of sense electrodes;

alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of sensing electrodes arranged in parallel and crossed with the driving electrodes, wherein each sensing electrode is divided into a plurality of sections by the plurality of driving electrodes;

the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;

and the interconnecting wire is positioned on the dielectric layer and electrically connects the sections of the sensing electrodes which are separated by the driving electrodes together.

24. The display panel of claim 20, wherein the display structure of the IPS/FFS display mode comprises:

a TFT switch, a scan line and a data line on the second insulating layer;

a passivation layer covering the TFT switch, the data line and the scan line;

the pixel electrodes and the common electrodes are arranged on the passivation layer at intervals, and gaps are formed between the pixel electrodes and the common electrodes.

25. The display panel of claim 20, wherein the display structure of the IPS/FFS display mode comprises:

a TFT switch, a scan line and a data line on the second insulating layer;

a passivation layer covering the TFT switch, the data line and the scan line;

a common electrode on the passivation layer;

a third insulating layer covering the common electrode and the passivation layer;

the pixel electrode is positioned on the third insulating layer and is a strip electrode;

or,

the display structure of the IPS/FFS display mode comprises:

a TFT switch, a scan line and a data line on the second insulating layer;

a passivation layer covering the TFT switch, the data line and the scan line;

a pixel electrode on the passivation layer;

a third insulating layer covering the pixel electrode and the passivation layer;

and the common electrode is positioned on the third insulating layer and is a strip-shaped electrode.

26. The display panel according to claim 20, further comprising: a transparent substrate opposite to the transparent base;

a liquid crystal layer between the transparent substrate and the transparent substrate;

a first linear polarizer located on the back of the transparent substrate;

a second linear polarizer on the back of the transparent substrate.

27. The display panel according to claim 26, wherein the transparent substrate is a color film substrate having color resistance;

further comprising: the black matrix is positioned on the transparent substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the shielding electrode layer and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the display structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate.

28. The display panel according to claim 20, further comprising: a transparent substrate opposite the transparent base;

a liquid crystal layer between the transparent substrate and the transparent substrate;

a first circular polarizer on the back of the transparent substrate;

a second circular polarizer on the back of the transparent substrate.

29. The display panel according to claim 28, wherein the transparent substrate is a color film substrate having a color resistance and a black matrix; the transparent substrate is also provided with a black matrix which is positioned between the adjacent color resistors.

30. A display panel, comprising:

a transparent substrate;

the display structure comprises a capacitive touch structure, a first insulating layer and an IPS/FFS display mode, wherein the capacitive touch structure, the first insulating layer and the display structure are sequentially formed on the transparent substrate;

wherein the display structure of the IPS/FFS display mode comprises: a common electrode and a second insulating layer sequentially formed on the first insulating layer; a TFT switch, a scan line and a data line on the second insulating layer; a passivation layer covering the TFT switch, the data line and the scan line; and the pixel electrode is positioned on the passivation layer and is a strip electrode.

31. The display panel according to claim 30, wherein the common electrode is a transparent conductive material, and wherein the first insulating layer and the second insulating layer are both made of a transparent insulating material.

32. The display panel of claim 30, wherein the common electrode tiles the passivation layer or has a slit opposite to a slit between the pixel electrodes.

33. The display panel of claim 30,

the capacitive touch structure includes:

a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;

a dielectric layer covering the sensing electrode and the transparent substrate;

the induction electrodes and the driving electrodes are arranged in a cross mode;

alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel on the transparent substrate;

a dielectric layer covering the driving electrode and the transparent substrate;

and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.

34. The display panel of claim 30,

the capacitive touch structure includes:

a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;

the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;

an interconnect on the dielectric layer, the interconnect electrically connecting together a plurality of segments of each of the drive electrodes spaced apart by the plurality of sense electrodes;

alternatively, the capacitive touch structure includes:

a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of sensing electrodes arranged in parallel and crossed with the driving electrodes, wherein each sensing electrode is divided into a plurality of sections by the plurality of driving electrodes;

the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;

and the interconnecting wire is positioned on the dielectric layer and electrically connects the sections of the sensing electrodes which are separated by the driving electrodes together.

35. The display panel according to claim 30, further comprising: a transparent substrate opposite to the transparent base;

a liquid crystal layer between the transparent substrate and the transparent substrate;

a first linear polarizer located on the back of the transparent substrate;

a second linear polarizer on the back of the transparent substrate.

36. The display panel according to claim 35, wherein the transparent substrate is a color film substrate having color resistance;

further comprising: the black matrix is positioned on the color film transparent substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the common electrode and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the TFT switch, the data line and the scanning line and positioned between adjacent color resistors in the direction parallel to the transparent substrate.

37. The display panel according to claim 30, further comprising: a transparent substrate opposite the transparent base;

a liquid crystal layer between the transparent substrate and the transparent substrate;

a first circular polarizer on the back of the transparent substrate;

a second circular polarizer on the back of the transparent substrate.

38. The display panel according to claim 37, wherein the transparent substrate is a color film substrate having a color resistance and a black matrix; the transparent substrate is also provided with a black matrix which is positioned between the adjacent color resistors.

39. A liquid crystal display device, comprising:

a display panel according to any one of claims 20 to 38;

and the backlight source is positioned on one side of the transparent substrate.

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