CN103160775B - Vapor deposition shadow mask alignment system - Google Patents
Vapor deposition shadow mask alignment system Download PDFInfo
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- CN103160775B CN103160775B CN201110417068.6A CN201110417068A CN103160775B CN 103160775 B CN103160775 B CN 103160775B CN 201110417068 A CN201110417068 A CN 201110417068A CN 103160775 B CN103160775 B CN 103160775B
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- contraposition
- contraposition mark
- mark
- vapor deposition
- alignment system
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 230000000007 visual effect Effects 0.000 claims abstract description 16
- 238000005304 joining Methods 0.000 claims description 3
- 239000011368 organic material Substances 0.000 abstract description 5
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of Vapor deposition shadow mask alignment system, it comprises the first contraposition mark be arranged on four corners of mask plate, four of being arranged on substrate carry out the second contraposition mark of phase contraposition in order to respectively with the first contraposition mark, and be arranged on directly over mask plate in order to judge first contraposition mark and the second contraposition identify four cameras whether aliging identical, this camera has a visual range observed the first contraposition mark and identify with the second contraposition of the sensible contraposition of this first register guide respectively, described first contraposition mark is identical with the second contraposition mark, described first contraposition mark and the second contraposition mark have the contraposition mark extended line crossing with visual range, the contraposition mark extended line being positioned at two visual ranges on mask plate diagonal lines is marked with scale, so position aligning time can be saved, and substrate and organic materials can be saved.
Description
Technical field
The present invention relates to a kind of for the Vapor deposition shadow mask alignment system in organic vapor deposition technique.
Background technology
Past, as the mainly cathode ray tube (CRT) equipment of display equipment, in recent years, the such as flat panel display equipment of Plasmia indicating panel (PDP) equipment, liquid-crystal display (LCD) equipment and ORGANIC ELECTROLUMINESCENCE DISPLAYS (OrganicLightEmittingDisplay, hereinafter referred to as OLED) equipment obtains extensively research and uses.
In these flat panel display equipments, because OLED device is different from liquid-crystal display (LCD) equipment, for self luminous and do not need additional light source, so OLED device to have thickness thin, lightweight, fast response time, visual angle is wide, colorimetric purity advantages of higher cause people's extensive concern, and increasing OLED is applied to display and lighting field.
OLED device can be divided into passive matrix OLED (PMOLED) and active array type OLED (AMOLED), no matter is that mode, all needs to use evaporation mask plate (shadowmask).Screen along with ultrahigh resolution occurs, Vapor deposition shadow mask alignment system precision just requires higher, and the precision of alignment system directly has influence on screen quality, and that improves that the speed of alignment system can shorten product goes out ETCD estimated time of commencing discharging.
In existing Vapor deposition shadow mask alignment system, there are two figures: a figure on substrate, a figure on mask plate.The two complete center is coincide and just proves that contraposition completes, but there will be a problem like this, need to verify after new mask plate arrival, this alignment mode must cause needing evaporation good multi-piece substrate during inspection, carries out evaporation after contraposition, take out correction, more positive coordinate again, then evaporation, back and forth more than once, both lose time like this, waste substrate and organic materials again.
Summary of the invention
The object of the present invention is to provide a kind of contraposition Vapor deposition shadow mask alignment system easily.
For realizing aforementioned object, the present invention adopts following technical scheme: a kind of Vapor deposition shadow mask alignment system, it comprises the first contraposition mark be arranged on four corners of mask plate, four of being arranged on substrate carry out the second contraposition mark of phase contraposition in order to respectively with the first contraposition mark, and be arranged on directly over mask plate in order to judge first contraposition mark and identify with the second contraposition of the sensible contraposition of this first register guide four cameras whether aliging identical, this camera has the visual range that is observed the first contraposition mark and the second contraposition mark respectively, described first contraposition mark is identical with the second contraposition mark, described first contraposition mark and the second contraposition mark have the contraposition mark extended line crossing with visual range, the contraposition mark extended line being positioned at two visual ranges on mask plate diagonal lines is marked with scale.
As a further improvement on the present invention, extended line is crossing with visual range forms at least two joinings for described contraposition mark.
As a further improvement on the present invention, two adjacent contraposition mark extended lines are located on the same line mutually.
As a further improvement on the present invention, described first contraposition mark and the second contraposition mark are " ten " font.
The present invention by arranging contraposition mark on four corners of mask plate, corresponding substrate is also provided with four contraposition marks, as long as to allow on four contraposition marks on mask plate and substrate the contraposition mark of four fit like a glove, just prove that contraposition completes, also can directly compensate if there is deviation, do not need to open chamber to carry out measurement and reorientate, a large amount of time can be saved like this, and substrate and organic materials can be saved.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of mask plate and contraposition mark thereof in existing Vapor deposition shadow mask alignment system.
Fig. 2 is the schematic diagram of mask plate and contraposition mark thereof in Vapor deposition shadow mask alignment system of the present invention.
Fig. 3 be mask plate in Vapor deposition shadow mask alignment system of the present invention and substrate generation angle deviation time schematic diagram.
Fig. 4 is mask plate in Vapor deposition shadow mask alignment system of the present invention and substrate schematic diagram when being subjected to displacement deviation.
Embodiment
Mask plate in a kind of existing Vapor deposition shadow mask alignment system shown in Figure 1, the alignment system of this mask plate is a pair " ten " font contraposition mark 11 be arranged on two diagonal angles of mask plate 1, when using new evaporation mask plate, all to carry out initial adjustment to this mask plate and substrate, determine each seat target value, this process need several is to the thin film transistor (ThinFilmTransistor of tens, hereinafter referred to as TFT) substrate carries out contraposition, and all necessary evaporation organic materials of each initial adjustment is to TFT substrate, then substrate is taken out under being put into microscope and test, both lost time also to waste material.
Vapor deposition shadow mask alignment system of the present invention uses when being applicable to the organic vapor depositions such as organic electroluminescence device (OrganicLightEmittingDiode, hereinafter referred to as OLED), active matrix/organic light emitting display (AMOLED) and OTFT (OTFT).Vapor deposition shadow mask alignment system comprises four " ten " font first contraposition marks 51 be arranged on four corners of mask plate 5, and all lay four CCD (charge-coupleddevice above corresponding four the first contraposition marks 51, charge coupled device) camera carries out contraposition, border circular areas in Fig. 2 is the visual range 52 of CCD camera, described first contraposition mark 51 extends to form the contraposition mark extended line 53 crossing with visual range along four edges being parallel to mask plate 5, extended line is crossing with visual range forms at least two joinings for contraposition mark.
Vapor deposition shadow mask alignment system comprises four the second contraposition marks 61 be arranged on substrate, as long as allow four the first contraposition marks 51 on mask plate 5 and four the second contrapositions on substrate identify 61 complete matchings coincide, just prove that its contraposition completes, also directly can compensate if there is deviation, not need to open chamber and carry out measurement and reorientate.The contraposition mark extended line being positioned at two visual ranges 52 on mask plate 5 and substrate diagonal lines is marked with scale, certainly, all contraposition mark extended lines 53 can indicate scale.Two adjacent contraposition mark extended lines are located on the same line mutually.Described first contraposition mark 51 and the second contraposition identify 61 identical, can be " ten " font.
Shown in Figure 3, described CCD camera lens display mask plate 5 and substrate deviation certain angle, now, the first contraposition mark 51 of mask plate 5 and the second contraposition of substrate identify 61 between shape at angle.
Shown in Figure 4, when CCD camera lens display mask plate 5 and substrate deviation certain displacement, now, the contraposition mark 51 of mask plate 5 and the contraposition of substrate form a determining deviation between identifying 61.
In sum, the present invention by arranging the first contraposition mark 51 on four corners of mask plate 5, corresponding substrate is also provided with four the second contraposition marks 61, as long as to allow on four the first contrapositions marks 51 on mask plate 5 and substrate the second contraposition mark 61 of four fit like a glove, just prove that contraposition completes, and also can directly compensate if there is deviation, do not need to open chamber and carry out measurement and reorientate, a large amount of time can be saved like this, and substrate and organic materials can be saved.
Although be example object, disclose the preferred embodiment of the present invention, but those of ordinary skill in the art will recognize, when not departing from scope and spirit of the present invention disclosed in appending claims, various improvement, increase and replacement are possible.
Claims (4)
1. a Vapor deposition shadow mask alignment system, it is characterized in that: it comprises the first contraposition mark be arranged on four corners of mask plate, four of being arranged on substrate carry out the second contraposition mark of phase contraposition in order to respectively with the first contraposition mark, and be arranged on directly over mask plate in order to judge first contraposition mark and the second contraposition identify four cameras whether aliging identical, described camera has a visual range observed the first contraposition mark and identify with the second contraposition of the sensible contraposition of this first register guide respectively, described first contraposition mark is identical with the second contraposition mark, described first contraposition mark and the second contraposition mark have the contraposition mark extended line crossing with visual range, the contraposition mark extended line being positioned at two visual ranges on mask plate diagonal lines is marked with scale.
2. Vapor deposition shadow mask alignment system according to claim 1, is characterized in that: extended line is crossing with visual range forms at least two joinings for described contraposition mark.
3. Vapor deposition shadow mask alignment system according to claim 1, is characterized in that: two adjacent contraposition mark extended lines are located on the same line mutually.
4. Vapor deposition shadow mask alignment system according to claim 1, is characterized in that: described first contraposition mark and the second contraposition mark are " ten " font.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110417068.6A CN103160775B (en) | 2011-12-14 | 2011-12-14 | Vapor deposition shadow mask alignment system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110417068.6A CN103160775B (en) | 2011-12-14 | 2011-12-14 | Vapor deposition shadow mask alignment system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103160775A CN103160775A (en) | 2013-06-19 |
| CN103160775B true CN103160775B (en) | 2016-03-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110417068.6A Active CN103160775B (en) | 2011-12-14 | 2011-12-14 | Vapor deposition shadow mask alignment system |
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| Country | Link |
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| CN (1) | CN103160775B (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105702880B (en) * | 2014-11-28 | 2018-04-17 | 上海和辉光电有限公司 | Optical registration compensation device, compactness detection device, deposition system and its method |
| CN106129270B (en) * | 2016-07-01 | 2018-06-12 | 武汉华星光电技术有限公司 | Monitor method and substrate that mask plate forms pattern position |
| CN106676469B (en) * | 2017-01-09 | 2019-03-26 | 昆山国显光电有限公司 | Mask plate and its manufacturing method is deposited |
| JP2018127702A (en) * | 2017-02-10 | 2018-08-16 | 株式会社ジャパンディスプレイ | Vapor deposition mask, vapor deposition mask alignment method, and vapor deposition mask fixing device |
| CN107201498B (en) * | 2017-06-30 | 2019-03-15 | 京东方科技集团股份有限公司 | A kind of joint method of mask strip, engagement device, mask plate |
| CN110473822B (en) * | 2018-05-09 | 2021-11-23 | 京东方科技集团股份有限公司 | Alignment method, alignment device and evaporation equipment |
| CN113097422A (en) * | 2019-12-23 | 2021-07-09 | 合肥欣奕华智能机器有限公司 | Substrate alignment device and method, mask plate and wafer substrate |
| CN112725727B (en) * | 2020-12-08 | 2022-05-10 | 武汉天马微电子有限公司 | Mask plate, display panel and manufacturing method of mask plate |
| WO2022133737A1 (en) * | 2020-12-22 | 2022-06-30 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method therefor, display panel, and display device |
| CN114392896A (en) * | 2021-12-31 | 2022-04-26 | 联想(北京)有限公司 | Accessory and processing method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006111941A (en) * | 2004-10-15 | 2006-04-27 | Dainippon Printing Co Ltd | Metal mask position alignment method and apparatus |
| KR20060104288A (en) * | 2005-03-30 | 2006-10-09 | 엘지전자 주식회사 | Clamping apparatus and method of mask for organic light emitting display device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100636492B1 (en) * | 2005-01-05 | 2006-10-18 | 삼성에스디아이 주식회사 | Alignment device and alignment method of substrate and mask |
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2011
- 2011-12-14 CN CN201110417068.6A patent/CN103160775B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006111941A (en) * | 2004-10-15 | 2006-04-27 | Dainippon Printing Co Ltd | Metal mask position alignment method and apparatus |
| KR20060104288A (en) * | 2005-03-30 | 2006-10-09 | 엘지전자 주식회사 | Clamping apparatus and method of mask for organic light emitting display device |
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| Publication number | Publication date |
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| CN103160775A (en) | 2013-06-19 |
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