CN103151394A - Thin film solar cell and manufacturing method thereof - Google Patents

Abstract

The invention discloses a thin-film solar cell which comprises a substrate, wherein a compound transparent conductive thin film layer, a photoelectric conversion thin film layer and a back electrode layer are arranged on the substrate, and a silver thin film layer is arranged on one side of the compound transparent conductive thin film layer. By adding the silver film layer in the thin film solar cell, the conductivity of the whole thin film solar cell can be improved through the high transmittance and excellent conductivity of the silver film layer, and better light transmittance can be ensured, so that the light absorbed by the solar cell is increased, and the conversion efficiency is improved; the silver film layer is arranged on one side of the compound transparent conductive film layer, so that the compound transparent conductive film layer can support the silver film layer, the velvet making problem of the silver film layer and the process problem that the silver film layer is broken due to the fact that the silver film layer is cut by P2 and P3 scribed lines in the production process of the thin-film solar cell can be solved, and normal conduction of the thin-film solar cell is guaranteed.

Description

Thin film solar cell and manufacturing method thereof

technical field

The invention relates to the technical field of solar cells, in particular to a thin-film solar cell and a method for manufacturing the thin-film solar cell.

Background technique

In recent years, the solar cell industry has developed rapidly. With the continuous reduction of costs, solar cells are gradually entering people's lives and playing an increasingly important role. Thin-film solar cell is a kind of solar cell. It uses thin-film materials with a thickness of only a few hundred nanometers to realize photoelectric conversion. Excellent performance, excellent high-temperature power generation performance, strong comprehensive power generation capacity, etc.

At present, thin-film solar cells are divided into silicon-based thin-film solar cells, cadmium telluride thin-film solar cells, and copper indium gallium selenide thin-film solar cells. The main difference between them is that the materials used for the core photoelectric conversion layer are different. However, the basic structure of the battery adopts the same sandwich structure, that is, the front part uses a layer of transparent conductive film as the front electrode, the middle part is the core photoelectric conversion film layer, and the rear part is the back electrode film layer composed of conductive metal material or its composite material. .

The current thin-film solar cell technology uses a transparent conductive film with a compound structure as the front electrode. There are four main types: zinc aluminum oxide (ZnO: Al), fluorine-doped tin oxide (SnO2: F), indium tin oxide (ITO), and Zinc boron oxide (BZO).

For solar cells, the core issue is to improve conversion efficiency, so for transparent conductive thin film materials, there are two main performance indicators:

1. It has a very high sunlight transmittance, so that the photoelectric conversion layer at the rear can absorb the maximum amount of light energy;

2. It has excellent electrical conductivity (that is, the smaller the square resistance of the film layer, the better), so as to reduce the resistance loss when the electrical energy is derived from the transparent conductive electrode.

However, the current thin-film solar cell industry mainly uses compound films with relatively poor conductivity as the front transparent conductive electrode. Since the actual conductivity of the film is mainly determined by the material performance index of the film itself - the electrical conductivity and the thickness of the film, the main problems faced by this technology are:

1. The material characteristics of the compound film determine that its conductivity is not ideal, the conductivity index is low, and its conductivity is far worse than that of metal materials, but ordinary metal materials have low optical transmittance and are not suitable for transparent conductive films;

2. In order to improve the actual conductivity of the film, it is usually necessary to make the compound film thicker (for thin-film solar cells, the thickness of the film is usually required to be hundreds of nanometers before it has practical value), and the thicker film brings about the improvement of the conductivity At the same time, the loss of light when passing through the film is greatly increased, resulting in a decrease in light transmittance, reducing the light absorbed by the solar cell, and reducing conversion efficiency.

Therefore, for the existing compound transparent conductive thin film materials, the mutual restriction of conductive performance and light transmission performance makes it difficult to further improve the performance of the thin film, which is not conducive to improving the efficiency of solar cells.

Contents of the invention

An object of the present invention is to provide a thin-film solar cell. By adding a silver film layer with higher transmittance and better conductivity, the conductivity of the thin-film solar cell is improved, and the light transmittance is also increased. , increasing the light absorbed by the solar cell and improving the conversion efficiency.

Another object of the present invention is to provide a method for making a thin film solar cell, by magnetron sputtering a layer of silver thin film layer on one side of the compound transparent conductive thin film layer, so that the conductivity and light conversion efficiency of the entire thin film solar cell can be improved. Both increased.

For reaching above-mentioned purpose, the present invention adopts following technical scheme:

A thin-film solar battery includes a substrate, on which a compound transparent conductive thin film layer, a photoelectric conversion thin film layer and a back electrode layer are arranged, and a silver thin film layer is arranged on one side of the compound transparent conductive thin film layer.

As a preferred solution of the thin film solar cell, the silver thin film layer has a thickness of 15nm, an optical transmittance greater than 90%, and a sheet resistance less than 5Ω/□.

As a preferred solution of a thin-film solar cell, the compound transparent conductive film layer is provided on one side of the substrate, and the silver film layer is provided on the side of the compound transparent conductive film layer away from the substrate. The side of the silver thin film layer far away from the compound transparent conductive thin film layer is provided with the photoelectric conversion thin film layer, and the side of the photoelectric conversion thin film layer far away from the silver thin film layer is provided with a back electrode layer.

Preferably, the substrate is made of glass or transparent polymer.

As a preferred solution of a thin-film solar cell, the back electrode layer is arranged on one side of the substrate, and the photoelectric conversion thin film layer is arranged on the side of the back electrode layer away from the substrate, and the photoelectric conversion thin film The side of the silver thin film layer away from the back electrode layer is provided with the silver thin film layer, and the side of the silver thin film layer far away from the photoelectric conversion thin film layer is provided with the compound transparent conductive thin film layer.

Preferably, the substrate is made of metal or non-metal.

More preferably, the substrate is made of stainless steel.

More preferably, the substrate is made of ceramics.

As a preferred solution of thin-film solar cells, the silver thin film layer is arranged on one side of the substrate, and the compound transparent conductive thin film layer is arranged on the side of the silver thin film layer away from the substrate, and the compound transparent The side of the conductive thin film layer away from the silver thin film layer is provided with the photoelectric conversion thin film layer, and the side of the photoelectric conversion thin film layer far away from the compound transparent conductive thin film layer is provided with the back electrode layer.

Preferably, the substrate is made of glass or transparent polymer.

As a preferred scheme of thin-film solar cells, a back electrode layer is arranged on one side of the substrate, and the photoelectric conversion thin film layer is arranged on the side of the back electrode layer away from the substrate, and the photoelectric conversion thin film layer is far away from the substrate. One side of the back electrode layer is provided with the compound transparent conductive thin film layer, and the side of the compound transparent conductive thin film layer away from the photoelectric conversion thin film layer is provided with a silver thin film layer.

Preferably, the substrate is made of metal or non-metal.

More preferably, the substrate is made of stainless steel.

More preferably, the substrate is made of ceramics.

As a preferred solution of the thin film solar cell, one side of the compound transparent conductive thin film layer and/or the photoelectric conversion thin film layer is provided with a textured structure.

As a preferred solution for thin-film solar cells, a connection layer is provided between the substrate and the silver film layer, and the connection layer is an oxide film with extremely high optical transmittance and good combination with the substrate and the silver film layer. Thin film layer.

Preferably, the connecting layer is a SiO2 thin film layer or an AZO thin film layer.

As a preferred solution of thin-film solar cells, the compound transparent conductive film layer is a zinc-aluminum oxide film layer, a fluorine-doped tin oxide film layer, an indium tin oxide film layer, a boron-doped zinc oxide film layer, and an aluminum-doped zinc oxide film layer any of the

The back electrode layer is a metal film layer;

The photoelectric conversion thin film layer is a silicon thin film layer.

Preferably, the back electrode layer is an aluminum thin film layer or a nickel thin film layer;

A method for manufacturing a thin-film solar cell, using the above-mentioned thin-film solar cell, magnetron sputtering a silver thin film layer on one side of the compound transparent conductive thin film layer.

A kind of preferred scheme as the manufacture method of thin-film solar cell, comprises the following steps:

Step a1. Deposit a compound transparent conductive film layer on the surface of the substrate by chemical vapor deposition. The square resistance of the film is between 12-25Ω/□, the transmittance is above 80%, and the suede structure is prepared, Haze The degree is between 5% and 25%;

Step b1, cleaning the substrate to a qualified cleanliness;

Step c1, using magnetron sputtering coating technology to deposit a silver film layer on the surface of the compound transparent conductive film layer, the square resistance of the silver film layer is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

Step d1, performing infrared laser scribing (P1 laser scribing), and marking the film layer into graphics used by mainstream thin-film batteries;

Step e1, putting the coated film substrate with P1 scribe line into PECVD to prepare photoelectric conversion thin film layer;

Step f1, after the photoelectric conversion thin film layer is fabricated, perform green laser marking (P2 laser marking);

Step g1, after completing the P2 scribing, the substrate is sent to the magnetron sputtering coating equipment to prepare the back electrode layer;

Step h1, after completing the production of the back electrode layer, perform green laser scribing (P3 laser scribing);

In step i1, the thin-film battery is manufactured and enters the battery assembly packaging process.

A kind of preferred scheme as the manufacture method of thin-film solar cell, comprises the following steps:

Step a2, cleaning the substrate to a qualified cleanliness;

Step b2, using magnetron sputtering coating technology to deposit a back electrode layer on the surface of the substrate,

Step c2. After the back electrode layer is fabricated, perform green laser scribing (P3 laser scribing);

Step d2, putting the coated film substrate with P3 scribe line into PECVD to prepare photoelectric conversion thin film layer, and make a suede structure, the Haze degree is between 5% and 25%;

Step e2, after completing the production of the photoelectric conversion thin film layer, perform green laser scribing (P2 laser scribing);

Step f2, using magnetron sputtering coating technology to deposit a layer of silver film layer on the surface of the photoelectric conversion film layer, the square resistance of the silver film layer is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

Step g2, using magnetron sputtering to deposit a compound transparent conductive film layer on the surface of the silver film layer, the square resistance of the film is between 12-25Ω/□, the transmittance is above 80%, and the suede structure is prepared , the Haze degree is between 5% and 25%;

Step h2, performing infrared laser scribing (P1 laser scribing), and marking the film layer into graphics used by mainstream thin-film batteries;

In step i2, the thin-film battery is manufactured and enters the battery assembly packaging process.

A kind of preferred scheme as the manufacture method of thin-film solar cell, comprises the following steps:

Step a3, cleaning the substrate to a qualified cleanliness;

Step b3, using magnetron sputtering coating technology to deposit a connection layer on the surface of the substrate;

Step c3, using magnetron sputtering coating technology to deposit a layer of silver thin film layer on the surface of the connection layer, the square resistance of the silver thin film layer is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

Step d3, using magnetron sputtering to deposit a compound transparent conductive film layer on the surface of the silver film layer, the square resistance of the film is between 12-25Ω/□, the transmittance is above 80%, and the suede structure is prepared , the Haze degree is between 5% and 25%;

Step e3, performing infrared laser scribing (P1 laser scribing), and marking the film layer into graphics used by mainstream thin-film batteries;

Step f3, putting the substrate of the compound transparent conductive thin film layer into PECVD to prepare a photoelectric conversion thin film layer;

Step g3, after completing the production of the photoelectric conversion thin film layer, perform green laser scribing (P2 laser scribing);

Step h3, after completing the P2 scribe line, sending the substrate into the magnetron sputtering coating equipment to prepare the back electrode layer;

Step i3. After the back electrode layer is fabricated, perform green laser scribing (P3 laser scribing);

In step j3, the thin-film battery is manufactured and enters the battery assembly packaging process.

A kind of preferred scheme as the manufacture method of thin-film solar cell, comprises the following steps:

Step a4, cleaning the substrate to a qualified cleanliness;

Step b4, using magnetron sputtering coating technology to deposit a back electrode layer on the surface of the substrate;

Step c4, after completing the fabrication of the back electrode layer, perform green laser scribing (P3 laser scribing);

Step d4, after completing P3 scribing, putting the substrate into PECVD to prepare a photoelectric conversion thin film layer;

Step e4. After the photoelectric conversion film layer is fabricated, perform green laser scribing (P2 laser scribing), and fabricate a suede structure with a Haze degree of 5% to 25%;

Step f4, after completing the P2 scribe line, deposit a layer of compound transparent conductive film layer on the surface of the photoelectric conversion film layer by magnetron sputtering method, the square resistance of the film is between 12-25Ω/□, and the transmittance is above 80% ;

Step g4, using magnetron sputtering coating technology to deposit a silver film layer on the surface of the compound transparent conductive film layer, the square resistance of the silver film layer is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

Step h4, performing infrared laser scribing (P1 laser scribing), and marking the film layer into graphics used by mainstream thin-film batteries;

In step i4, the thin-film battery is manufactured and enters the battery assembly packaging process.

Compared with prior art, the beneficial effects of the present invention are:

1. By adding a silver thin film layer in the thin film solar cell, the conductivity of the entire thin film solar cell can be improved through the high transmittance and excellent conductivity of the silver thin film layer, and better light transmittance can also be ensured , so that the light absorbed by the solar cell increases, thereby improving the conversion efficiency;

2. By setting the silver film layer on one side of the compound transparent conductive film layer, the compound transparent conductive film layer can provide support for the silver film layer, and it can also solve the problem of making silver film layers and P2 and P2 in the production process of thin film solar cells. The P3 scribe line will cut off the silver film layer and cause the process problem of battery disconnection. Since the P2 and P3 lasers cannot cut off the compound film, the extremely narrow area where the P2 and P3 cut off the silver film layer can be conducted by the compound film to ensure thin-film solar energy. The battery conducts electricity normally;

3. By setting a textured structure that meets the requirements of thin-film solar cells on the compound transparent conductive film or photoelectric conversion film layer, the silver film is deposited on the textured structure. Since the silver film is very thin, the deposited form is the same as that of the compound transparent The surface of the conductive film is consistent, and the surface can also present a suede structure, which is conducive to the diffuse reflection of light inside the battery and improves the ability of the battery to absorb light energy;

4. By setting a connection layer between the silver film layer and the substrate, this connection layer is an oxide film layer with extremely high optical transmittance, which can ensure reliable connection between the silver film layer and the substrate without affecting the entire Light transmittance of thin film solar cells.

Description of drawings

Fig. 1 is the structural representation of the thin-film solar cell described in embodiment one;

Figure 2 is a schematic diagram of the manufacturing process of Figure 1;

Fig. 3 is the structural representation of the thin-film solar cell described in embodiment two;

Fig. 4 is a schematic diagram of the manufacturing process of Fig. 3;

5 is a schematic structural view of the thin-film solar cell described in Embodiment 3;

Fig. 6 is a schematic diagram of the manufacturing process of Fig. 5;

7 is a schematic structural view of the thin-film solar cell described in Embodiment 4;

FIG. 8 is a schematic diagram of the manufacturing process of FIG. 7 .

In the picture:

1. Substrate; 2. Compound transparent conductive film layer; 3. Silver film layer; 4. Photoelectric conversion film layer; 5. Back electrode layer; 6. Connection layer.

Detailed ways

Embodiment one:

As shown in Figures 1-2, the thin film solar cell described in this embodiment includes a substrate 1, a compound transparent conductive thin film layer 2 is arranged on one side of the substrate 1, and the compound transparent conductive thin film layer 2 is far away from the side of the substrate 1. The silver thin film layer 3 is arranged on the side, the photoelectric conversion thin film layer 4 is arranged on the side of the silver thin film layer 3 away from the compound transparent conductive thin film layer 2, and the back electrode layer 5 is arranged on the side of the photoelectric conversion thin film layer 4 away from the silver thin film layer 3.

The thickness of the silver thin film layer 3 is 15nm, its optical transmittance is greater than 90%, and its sheet resistance is less than 3Ω/□.

A suede structure is provided on the side of the compound transparent conductive thin film layer 2 close to the silver thin film layer 3 .

The method for making the above-mentioned thin film solar cell comprises the following steps:

The first step is to deposit a compound transparent conductive film layer 2 on the surface of the substrate 1 by chemical vapor deposition. structure, the Haze degree is between 5% and 25%;

The second step is to clean the substrate 1 to a qualified cleanliness;

The third step is to use magnetron sputtering coating technology to deposit a layer of silver film layer 3 on the surface of the compound transparent conductive film layer 2. The square resistance of the silver film layer 3 is controlled below 4Ω/□, and the transmittance of the film layer is above 90%. ;

The fourth step is to carry out infrared laser scribing (P1 laser scribing), and scribing the silver thin film layer 3 into patterns used by mainstream thin film batteries;

The fifth step is to put the coated substrate 1 with the P1 scribe line into PECVD to prepare the photoelectric conversion thin film layer 4;

Step 6: After completing the production of the photoelectric conversion thin film layer 4, perform green laser scribing (P2 laser scribing);

In the seventh step, after the P2 scribe line is completed, the substrate 1 is sent to the magnetron sputtering coating equipment to prepare the back electrode layer 5;

The eighth step, after completing the production of the back electrode layer 5, perform green laser scribing (P3 laser scribing);

The ninth step, the thin-film battery is finished, and enters the battery component packaging process.

In this embodiment, the substrate 1 is made of toughened glass, the compound transparent conductive film layer 2 is an aluminum-doped zinc oxide film layer, the photoelectric conversion film layer 4 is a silicon film layer, and the back electrode layer 5 is an aluminum film layer.

Embodiment two:

As shown in Figures 3 to 4, the thin film solar cell described in this embodiment includes a substrate 1, a back electrode layer 5 is arranged on one side of the substrate 1, and a photoelectric conversion layer is arranged on the side of the back electrode layer 5 away from the substrate 1. Thin film layer 4, the side of the photoelectric conversion thin film layer 4 away from the back electrode layer 5 is provided with a silver thin film layer 3, and the side of the silver thin film layer 3 away from the photoelectric conversion thin film layer 4 is provided with a compound transparent conductive thin film layer 2.

The thickness of the silver film layer is 15nm, its optical transmittance is greater than 90%, and its sheet resistance is less than 3Ω/□.

A textured structure is provided on the side of the photoelectric conversion thin film layer 4 close to the silver thin film layer 3 .

The method for making the above-mentioned thin film solar cell comprises the following steps:

The first step is to clean the substrate 1 to a qualified cleanliness;

In the second step, a back electrode layer 5 is deposited on the surface of the substrate 1 by magnetron sputtering coating technology,

In the third step, after the production of the back electrode layer 5 is completed, green laser scribing (P3 laser scribing) is performed;

The fourth step is to put the coated substrate 1 with the P3 scribe line into PECVD to prepare the photoelectric conversion film layer 4, and make a suede structure with a Haze degree of 5% to 25%;

Step 5: After the photoelectric conversion thin film layer 4 is fabricated, green laser scribing (P2 laser scribing) is performed;

The sixth step is to deposit a layer of silver thin film layer 3 on the surface of photoelectric conversion thin film layer 4 by using magnetron sputtering coating technology, the square resistance of silver thin film layer 3 is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

The seventh step is to deposit a compound transparent conductive film layer 2 on the surface of the silver film layer 3 by magnetron sputtering. The square resistance of the film is between 12～25Ω/□, and the transmittance is above 80%;

The eighth step is to carry out infrared laser marking (P1 laser marking), marking the film layer into the graphics used by mainstream thin film batteries;

The ninth step, the thin-film battery is finished, and enters the battery component packaging process.

In this embodiment, the substrate 1 is made of float glass, the compound transparent conductive film layer 2 is a fluorine-doped tin oxide film layer, the photoelectric conversion film layer 4 is a silicon film layer, and the back electrode layer 5 is an aluminum film layer.

Embodiment three:

As shown in Figures 5-6, the thin-film solar cell described in this embodiment includes a substrate 1, a connection layer 6 is provided on one side of the substrate 1, and a silver thin film layer 3 is provided on the side of the connection layer 6 away from the substrate 1. The side of the silver film layer 3 away from the connection layer 6 is provided with a compound transparent conductive film layer 2, and the side of the compound transparent conductive film layer 2 away from the silver film layer 3 is provided with a photoelectric conversion film layer 4, and the photoelectric conversion film layer 4 is far away from the compound transparent conductive film layer. One side of the film layer 2 is provided with a back electrode layer 5 .

The thickness of the silver film layer is 15nm, its optical transmittance is greater than 90%, and its sheet resistance is less than 3Ω/□.

A textured structure is provided on the side of the compound transparent conductive thin film layer 2 close to the photoelectric conversion thin film layer 4 .

The method for making the above-mentioned thin film solar cell comprises the following steps:

The first step is to clean the substrate 1 to a qualified cleanliness;

The second step is to deposit a layer of connection layer 6 on the surface of substrate 1 by magnetron sputtering coating technology;

The third step is to deposit a layer of silver film layer 3 on the surface of the connection layer 6 by magnetron sputtering coating technology, the square resistance of the silver film layer 3 is controlled below 4Ω/□, and the transmittance of the film layer is above 90%;

The fourth step is to deposit a layer of compound transparent conductive film layer 2 on the surface of silver film layer 3 by magnetron sputtering. Suede structure, Haze degree is 5% to 25%;

The fifth step is to carry out infrared laser scribing (P1 laser scribing) to scribe the film layer into the graphics used by mainstream thin film batteries;

The sixth step is to put the substrate 1 with the compound transparent conductive thin film layer 2 into PECVD to prepare the photoelectric conversion thin film layer 4;

Step 7: After completing the photoelectric conversion thin film layer 4, perform green laser scribing (P2 laser scribing);

In the eighth step, after the P2 scribe line is completed, the substrate 1 is sent to the magnetron sputtering coating equipment to prepare the back electrode layer 5;

Step 9: After completing the production of the back electrode layer 5, perform green laser scribing (P3 laser scribing);

The tenth step, the thin-film battery is finished, and enters the battery component packaging process.

In this embodiment, the substrate 1 is made of toughened glass, the compound transparent conductive film layer 2 is an indium tin oxide film layer, the photoelectric conversion film layer 4 is a silicon film layer, the back electrode layer 5 is an aluminum film layer, and the connection layer 6 is SiO2 thin film layer.

Embodiment four:

As shown in Figures 7 to 8, the thin film solar cell described in this embodiment includes a substrate 1, a back electrode layer 5 is arranged on one side of the substrate 1, and a photoelectric conversion layer is arranged on the side of the back electrode layer 5 away from the substrate 1. Thin film layer 4, the side of the photoelectric conversion thin film layer 4 away from the back electrode layer 5 is provided with a compound transparent conductive thin film layer 2, and the side of the compound transparent conductive thin film layer 2 far away from the photoelectric conversion thin film layer 4 is provided with a silver thin film layer 3.

The thickness of the silver thin film layer 3 is 15nm, its optical transmittance is greater than 90%, and its sheet resistance is less than 3Ω/□.

A textured structure is provided on the side of the photoelectric conversion thin film layer 4 close to the compound transparent conductive thin film layer 2 .

The method for making the above-mentioned thin film solar cell comprises the following steps:

The first step is to clean the substrate 1 to a qualified cleanliness;

The second step is to deposit a layer of back electrode layer 5 on the surface of substrate 1 by magnetron sputtering coating technology;

In the third step, after the production of the back electrode layer 5 is completed, green laser scribing (P3 laser scribing) is performed;

The fourth step, after completing the P3 scribe line, put the substrate 1 into PECVD to prepare the photoelectric conversion thin film layer 4;

Step 5: After the photoelectric conversion film layer 4 is produced, perform green laser scribing (P2 laser scribing), and make a suede structure with a Haze degree of 5% to 25%;

Step 6: After the P2 scribe line is completed, a layer of compound transparent conductive film layer 2 is deposited on the surface of the photoelectric conversion film layer 4 by magnetron sputtering. More than 80%;

The seventh step is to deposit a silver film layer 3 on the surface of the compound transparent conductive film layer 2 by using magnetron sputtering coating technology. The square resistance of the silver film layer 3 is controlled below 4Ω/□, and the transmittance of the film layer is above 90%. ;

The eighth step is to carry out infrared laser marking (P1 laser marking), marking the film layer into the graphics used by mainstream thin film batteries;

The ninth step, the thin-film battery is finished, and enters the battery component packaging process.

In this embodiment, the substrate 1 is made of stainless steel, the compound transparent conductive film layer 2 is a boron-doped zinc oxide film layer, the photoelectric conversion film layer 4 is a silicon film layer, and the back electrode layer 5 is a nickel film layer.

The above describes the technical principles of the present invention in conjunction with specific embodiments. These descriptions are only for explaining the principles of the present invention, and cannot be construed as limiting the protection scope of the present invention in any way. Based on the explanations herein, those skilled in the art can think of other specific implementation modes of the present invention without creative efforts, and these modes will all fall within the protection scope of the present invention.

Claims (10)

1. A thin-film solar cell, comprising a substrate, a compound transparent conductive film layer, a photoelectric conversion film layer and a back electrode layer are set on the substrate, it is characterized in that, one side of the compound transparent conductive film layer is provided with silver film layer. 2. The thin film solar cell according to claim 1, wherein the thickness of the silver thin film layer is 15nm, its optical transmittance is greater than 90%, and its sheet resistance is less than 5Ω/□. 3. The thin film solar cell according to claim 2, characterized in that, the compound transparent conductive thin film layer is arranged on one side of the substrate, and the compound transparent conductive thin film layer is arranged on the side far away from the substrate. The silver thin film layer, the side of the silver thin film layer far away from the compound transparent conductive thin film layer is provided with the photoelectric conversion thin film layer, and the side of the photoelectric conversion thin film layer far away from the silver thin film layer is provided with a back electrode layer. 4. The thin film solar cell according to claim 2, wherein the back electrode layer is arranged on one side of the substrate, and the photoelectric conversion film is arranged on the side of the back electrode layer away from the substrate layer, the side of the photoelectric conversion thin film layer away from the back electrode layer is provided with the silver thin film layer, and the side of the silver thin film layer far away from the photoelectric conversion thin film layer is provided with the compound transparent conductive thin film layer. 5. The thin film solar cell according to claim 2, characterized in that, the silver thin film layer is arranged on one side of the substrate, and the transparent and conductive compound is arranged on the side of the silver thin film layer away from the substrate. Thin film layer, the side of the compound transparent conductive thin film layer away from the silver thin film layer is provided with the photoelectric conversion thin film layer, and the side of the photoelectric conversion thin film layer far away from the compound transparent conductive thin film layer is provided with the back electrode layer . 6. The thin-film solar cell according to claim 2, wherein a back electrode layer is arranged on one side of the substrate, and the photoelectric conversion thin film layer is arranged on a side far away from the substrate of the back electrode layer, The side of the photoelectric conversion thin film layer away from the back electrode layer is provided with the compound transparent conductive thin film layer, and the side of the compound transparent conductive thin film layer far away from the photoelectric conversion thin film layer is provided with a silver thin film layer. 7. The thin-film solar cell according to any one of claims 1-6, characterized in that, one side of the compound transparent conductive thin film layer and/or the photoelectric conversion thin film layer is provided with a textured structure. 8. The thin film solar cell according to claim 5, characterized in that, a connection layer is set between the substrate and the silver thin film layer, and the connection layer has a very high optical transmittance, and is compatible with the substrate and the silver film layer. The silver thin film layer combines well with the oxide thin film layer. 9. The thin film solar cell according to any one of claims 1 to 6, characterized in that, The compound transparent conductive film layer is any one of zinc-aluminum oxide film layer, fluorine-doped tin oxide film layer, indium tin oxide film layer, boron-doped zinc oxide film layer, aluminum-doped zinc oxide film layer; The back electrode layer is a metal film layer; The photoelectric conversion thin film layer is a silicon thin film layer. 10. A method for making a thin-film solar cell, using the thin-film solar cell according to claim 1, characterized in that, one layer of silver thin film is magnetron sputtered on one side of the compound transparent conductive thin film.

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