CN103077901B - Packaging method of semiconductor package and semiconductor package formed by using same - Google Patents
Packaging method of semiconductor package and semiconductor package formed by using same Download PDFInfo
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- CN103077901B CN103077901B CN201310047921.9A CN201310047921A CN103077901B CN 103077901 B CN103077901 B CN 103077901B CN 201310047921 A CN201310047921 A CN 201310047921A CN 103077901 B CN103077901 B CN 103077901B
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 34
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 239000000463 material Substances 0.000 claims description 7
- 238000012856 packing Methods 0.000 claims 5
- 239000005022 packaging material Substances 0.000 description 11
- 238000005538 encapsulation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18161—Exposing the passive side of the semiconductor or solid-state body of a flip chip
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
技术领域technical field
本发明是有关于一种半导体封装件的封装方法及应用其形成的半导体封装件,且特别是有关于一种改善散热问题的半导体封装件的封装方法及应用其形成的半导体封装件。The present invention relates to a packaging method of a semiconductor package and a semiconductor package formed using the same, and in particular to a packaging method of a semiconductor package that improves heat dissipation and a semiconductor package formed using the same.
背景技术Background technique
传统的半导体封装件包含芯片及封装体。为了保护芯片,封装体通常包覆芯片的侧面及上表面。然而,这样完整的包覆反而不易散逸芯片的热量。A conventional semiconductor package includes a chip and a package. In order to protect the chip, the package usually covers the side and upper surface of the chip. However, such a complete encapsulation is not easy to dissipate the heat of the chip.
此外,若芯片的上表面及侧缘完全暴露于外界中虽具有较佳的散热效果但容易造成芯片遇外力碰撞而损坏的风险。In addition, if the upper surface and side edges of the chip are completely exposed to the outside world, although it has a better heat dissipation effect, it is easy to cause the risk of damage to the chip due to external force collision.
发明内容Contents of the invention
本发明有关于一种半导体封装件,一实施例中,可改善已知的芯片散热不佳的问题且可降低芯片遭受外界碰撞而损坏的风险。The invention relates to a semiconductor package. In one embodiment, the known problem of poor heat dissipation of the chip can be improved and the risk of the chip being damaged by external impact can be reduced.
根据本发明,提出一种半导体封装件的封装方法。半导体封装件的封装方法包括以下步骤。提供一上模及一下模,上模包括一可形变元件;设置一基板及一芯片于下模,其中芯片设于基板上且位于可形变元件正下方并具有一上表面;合模下模与上模而形成一模穴,使可形变元件挤压芯片而形成一环状突部,环状突部的一底面低于芯片的上表面,且下模与上模在合模后,模穴的一顶面对齐或高于芯片的上表面;以及,填充一封装材料于上模与下模之间的模穴内,其中封装材料包覆芯片且覆盖模穴的顶面。According to the present invention, a packaging method for a semiconductor package is provided. A packaging method for a semiconductor package includes the following steps. Provide an upper mold and a lower mold, the upper mold includes a deformable element; set a substrate and a chip on the lower mold, wherein the chip is arranged on the substrate and is located directly below the deformable element and has an upper surface; The upper mold forms a mold cavity, so that the deformable element squeezes the chip to form a ring-shaped protrusion. A bottom surface of the ring-shaped protrusion is lower than the upper surface of the chip, and after the lower mold and the upper mold are closed, the mold cavity A top surface of the upper mold is aligned with or higher than the upper surface of the chip; and, a packaging material is filled in the mold cavity between the upper mold and the lower mold, wherein the packaging material wraps the chip and covers the top surface of the mold cavity.
根据本发明,提出一种半导体封装件。半导体封装件包括一基板、一芯片及一封装体。芯片具有一面对基板的一第一表面及一远离基板的一第二表面。封装体包覆芯片且具有一凹槽及一上表面,封装体的上表面高于或对齐于芯片的第二表面,其中凹槽与封装体的上表面相连且露出芯片的第二表面,且凹槽的底面低于芯片的第二表面。According to the present invention, a semiconductor package is proposed. The semiconductor package includes a substrate, a chip and a package. The chip has a first surface facing the substrate and a second surface away from the substrate. The package covers the chip and has a groove and an upper surface, the upper surface of the package is higher than or aligned with the second surface of the chip, wherein the groove is connected to the upper surface of the package and exposes the second surface of the chip, and The bottom surface of the groove is lower than the second surface of the chip.
为让本发明的上述内容能更明显易懂,下文特举实施例,并配合附图,作详细说明如下∶In order to make the above content of the present invention more obvious and understandable, the following specific examples are given in conjunction with the accompanying drawings, and are described in detail as follows:
附图说明Description of drawings
图1A绘示依照本发明一实施例的半导体封装件的外观图。FIG. 1A is an external view of a semiconductor package according to an embodiment of the invention.
图1B绘示图1A中沿方向1B-1B’的剖视图。Fig. 1B is a cross-sectional view along the direction 1B-1B' in Fig. 1A.
图2绘示图1B的测试半导体封装件的示意图。FIG. 2 is a schematic diagram of the test semiconductor package of FIG. 1B .
图3A至3C绘示图1B的半导体封装件的制造过程图。3A to 3C are diagrams illustrating the manufacturing process of the semiconductor package shown in FIG. 1B .
主要元件符号说明:Description of main component symbols:
100:半导体封装件100: semiconductor package
110:基板110: Substrate
110u、130u:上表面110u, 130u: upper surface
120:芯片120: chip
120b:第一表面120b: first surface
120u:第二表面120u: second surface
120s:侧面120s: side
121、140:电性接点121, 140: electrical contacts
130:封装体130: Encapsulation
130’:封装材料130': Encapsulation material
130b、221b、2131b:底面130b, 221b, 2131b: bottom surface
130r:凹槽130r: groove
130r1:第一子凹槽130r1: first subgroove
130r2:第二子凹槽130r2: second subgroove
130s:内侧面130s: medial side
150:压板150: platen
160:测试针脚160: Test pin
210:上模210: upper mold
211:上模体211: Upper Phantom
212:中板212: Middle plate
212r、221r:凹部212r, 221r: concave part
213:可形变元件213: Deformable elements
213s1:外侧213s1: outside
213s2:内侧213s2: inside
2131:环形突部2131: Annular protrusion
220:下模220: lower mold
221:下模体221: Lower mold body
222:承载板222: Loading board
230r:模穴230r: mold cavity
230u、212u:顶面230u, 212u: top surface
2131:环状突部2131: Annulus
D1、D2:内径D1, D2: inner diameter
H1、H2、H3、H4、H5:距离H1, H2, H3, H4, H5: Distance
P:压缩厚度P: compressed thickness
S:模流空间S: mold flow space
T1、T2:厚度T1, T2: Thickness
具体实施方式Detailed ways
请参照图1A,其绘示依照本发明一实施例的半导体封装件的外观图。半导体封装件100包括基板110、芯片120、封装体130及至少一电性接点140。Please refer to FIG. 1A , which shows an appearance view of a semiconductor package according to an embodiment of the present invention. The semiconductor package 100 includes a substrate 110 , a chip 120 , a package 130 and at least one electrical contact 140 .
基板110可以是有机(organic)基板、陶瓷(ceramic)基板110、硅基板、金属载板或中介层基板。此外,基板110可以是单层或多层线路基板。The substrate 110 may be an organic substrate, a ceramic substrate 110 , a silicon substrate, a metal carrier or an interposer substrate. In addition, the substrate 110 may be a single-layer or multi-layer circuit substrate.
请参照图1B,其绘示图1A中沿方向1B-1B’的剖视图。芯片120以其主动面(例如是芯片120的面向基板110的第一表面120b)朝下方位设于基板110的上表面110u上,并通过至少一电性接点121电性连接于基板110,此种芯片120称为覆晶(flip chip)。电性接点121例如凸块、焊球或导电柱。Please refer to FIG. 1B, which shows a cross-sectional view along the direction 1B-1B' in FIG. 1A. The chip 120 is disposed on the upper surface 110u of the substrate 110 with its active surface (for example, the first surface 120b of the chip 120 facing the substrate 110 ) facing downwards, and is electrically connected to the substrate 110 through at least one electrical contact 121. Such a chip 120 is called a flip chip. The electrical contacts 121 are, for example, bumps, solder balls or conductive pillars.
封装体130包覆芯片120的侧面120s且具有凹槽130r。凹槽130r露出芯片120的远离基板110的第二表面120u。本例中,凹槽130r露出芯片120的整个第二表面120u,藉以提供最大露出面积,以快速把芯片120的热量逸散至半导体封装件100外。The package body 130 covers the side surface 120s of the chip 120 and has a groove 130r. The groove 130r exposes the second surface 120u of the chip 120 away from the substrate 110 . In this example, the groove 130r exposes the entire second surface 120u of the chip 120 so as to provide a maximum exposed area to quickly dissipate the heat of the chip 120 to the outside of the semiconductor package 100 .
凹槽130r的底面130b低于芯片120的第二表面120u,但高于芯片120的第一表面120b。由于凹槽130r的底面130b高于芯片120的第一表面120b,使凹槽130r的底面130b与芯片120的第一表面120b之间形成一模流空间S。在封装工艺中,呈流动态的封装材料130’(图3C)可经由此模流空间S顺畅地填满芯片120的第一表面120b与基板110的上表面110u之间的空间而包覆电性接点121。The bottom surface 130b of the groove 130r is lower than the second surface 120u of the chip 120 but higher than the first surface 120b of the chip 120 . Since the bottom surface 130b of the groove 130r is higher than the first surface 120b of the chip 120 , a mold flow space S is formed between the bottom surface 130b of the groove 130r and the first surface 120b of the chip 120 . During the packaging process, the flowing packaging material 130 ′ ( FIG. 3C ) can smoothly fill the space between the first surface 120 b of the chip 120 and the upper surface 110 u of the substrate 110 through the mold flow space S to cover the circuit board. sex contact 121 .
一例中,封装体130的上表面130u与芯片120的第二表面120u的距离H1介于0至110微米之间,而芯片120的第二表面120u与凹槽130r的底面130b的距离H2介于0至110微米之间,使封装体130的上表面130u与凹槽130r的底面130b的距离H3(距离H1与H2的合)介于0至220微米之间。此外,芯片120的厚度T1约800微米,然亦可更薄或更厚。上述距离H1、H2及H3的值亦可随芯片的厚度调整,其中根据本发明一实施例的距离H2与距离H1低于距离H3,可避免基板的上表面外露造成可靠度降低的问题。In one example, the distance H1 between the upper surface 130u of the package 130 and the second surface 120u of the chip 120 is between 0 and 110 microns, and the distance H2 between the second surface 120u of the chip 120 and the bottom surface 130b of the groove 130r is between Between 0 and 110 micrometers, the distance H3 between the upper surface 130 u of the package body 130 and the bottom surface 130 b of the groove 130 r (the sum of the distances H1 and H2 ) is between 0 and 220 micrometers. In addition, the thickness T1 of the chip 120 is about 800 microns, but it can also be thinner or thicker. The values of the distances H1, H2 and H3 can also be adjusted according to the thickness of the chip. According to an embodiment of the present invention, the distances H2 and H1 are lower than the distance H3, which can avoid the problem of lower reliability caused by the exposure of the upper surface of the substrate.
凹槽130r从封装体130的上表面130u往芯片120及基板110的方向延伸,使凹槽130r与封装体130的上表面130u相连且露出芯片120的第二表面120u。凹槽130r包括第一子凹槽130r1及第二子凹槽130r2。第一子凹槽130r1连通于第二子凹槽130r2,且露出芯片120的第二表面120u,例如是露出芯片120的整个第二表面120u,以提升对芯片120的散热效果。The groove 130r extends from the upper surface 130u of the package 130 toward the chip 120 and the substrate 110 , so that the groove 130r is connected to the upper surface 130u of the package 130 and exposes the second surface 120u of the chip 120 . The groove 130r includes a first sub-groove 130r1 and a second sub-groove 130r2. The first sub-recess 130r1 communicates with the second sub-recess 130r2 and exposes the second surface 120u of the chip 120 , for example, exposing the entire second surface 120u of the chip 120 , so as to improve the cooling effect on the chip 120 .
第二子凹槽130r2的内径D1从封装体130的上表面130u往凹槽130r的底面130b的方向渐缩,而构成一碗形凹槽、V型凹槽或其它合适凹槽轮廓,本例以碗形凹槽为例。就第二子凹槽130r2的轮廓来说,第二子凹槽130r2的内侧面130s从封装体130的上表面130u往基板110方向延伸一距离H3后,再往芯片120的第二表面120u的方向延伸至芯片120的侧面120s。当第二子凹槽130r2的内侧面130s与侧面120s的接触处愈靠近芯片120的第二表面120u,封装体130覆盖芯片120的侧面120s的范围愈大。本例中,第二子凹槽130r2的内侧面130s接触芯片120的第二表面120u与侧面120s的转角处,可使封装体130覆盖芯片120的整个侧面120s。The inner diameter D1 of the second sub-groove 130r2 is tapered from the upper surface 130u of the package body 130 to the bottom surface 130b of the groove 130r to form a bowl-shaped groove, a V-shaped groove or other suitable groove contours. In this example Take the bowl-shaped groove as an example. Regarding the profile of the second sub-groove 130r2, the inner surface 130s of the second sub-groove 130r2 extends from the upper surface 130u of the package body 130 toward the substrate 110 for a distance H3, and then extends toward the second surface 120u of the chip 120. The direction extends to the side 120s of the chip 120 . When the contact between the inner surface 130s of the second sub-recess 130r2 and the side surface 120s is closer to the second surface 120u of the chip 120 , the package body 130 covers a larger area of the side surface 120s of the chip 120 . In this example, the inner surface 130s of the second sub-recess 130r2 contacts the corner of the second surface 120u and the side surface 120s of the chip 120 , so that the package body 130 can cover the entire side surface 120s of the chip 120 .
请参照图2,其绘示图1B的测试半导体封装件的示意图。当半导体封装件100接受测试时,压板150会抵压在半导体封装件100上,使电性接点140电性接触到测试针脚160。由于本实施例的封装体130的上表面130u高于芯片120的第二表面120u,因此压板150接触封装体130的上表面130u,而不会直接压到芯片120,进而降低芯片120损坏的机率。Please refer to FIG. 2 , which is a schematic diagram of the test semiconductor package shown in FIG. 1B . When the semiconductor package 100 is tested, the pressure plate 150 is pressed against the semiconductor package 100 so that the electrical contacts 140 are electrically contacted with the test pins 160 . Since the upper surface 130u of the package body 130 in this embodiment is higher than the second surface 120u of the chip 120, the pressure plate 150 contacts the upper surface 130u of the package body 130 without directly pressing against the chip 120, thereby reducing the probability of damage to the chip 120 .
另一例中,封装体130的上表面130u与芯片120的第二表面120u可实质上对齐,例如是共面。在此设计下,压板150同时抵压到芯片120的第二表面120u及封装体130的上表面130u,使芯片120及封装体130一起分担受压应力,因此降低了芯片120本身的受压应力,进而降低芯片120损坏的机率。In another example, the upper surface 130u of the package body 130 and the second surface 120u of the chip 120 may be substantially aligned, eg coplanar. Under this design, the pressure plate 150 presses against the second surface 120u of the chip 120 and the upper surface 130u of the package body 130 at the same time, so that the chip 120 and the package body 130 share the compressive stress, thus reducing the compressive stress of the chip 120 itself , thereby reducing the probability of damage to the chip 120 .
请参照图3A至图3B,其绘示图1B的半导体封装件的制造过程图。Please refer to FIG. 3A to FIG. 3B , which illustrate the manufacturing process of the semiconductor package shown in FIG. 1B .
如图3A所示,提供上模210及下模220。上模210包括上模体211、中板212及可形变元件213,其中,中板212设于上模体211上,中板212具有一开口朝向下模220的凹部212r,可形变元件213设于中板212的凹部212r的顶面212u上。凹部212r的内径D2从凹部212r的顶面212u往凹部212r的开口方向渐缩,使设于其内的可形变元件213不会轻易掉落。可形变元件213例如是由橡胶或合适的弹性材料制成,藉此材料特性,使可形变元件213容易装设于中板212的凹部212r内,且装设于凹部212r内后产生回弹力抵压凹部212r的壁面,进而稳固于凹部212r内。As shown in FIG. 3A , an upper mold 210 and a lower mold 220 are provided. The upper mold 210 includes an upper mold body 211, a middle plate 212 and a deformable element 213, wherein the middle plate 212 is arranged on the upper mold body 211, the middle plate 212 has a recess 212r with an opening facing the lower mold 220, and the deformable element 213 is set on the top surface 212u of the concave portion 212r of the middle plate 212 . The inner diameter D2 of the concave portion 212r is tapered from the top surface 212u of the concave portion 212r toward the opening direction of the concave portion 212r, so that the deformable element 213 disposed therein will not be easily dropped. The deformable element 213 is, for example, made of rubber or a suitable elastic material. With this material property, the deformable element 213 is easily installed in the concave portion 212r of the middle plate 212, and after being installed in the concave portion 212r, a resilient force is produced. The wall surface of the concave portion 212r is pressed, and further stabilized in the concave portion 212r.
下模220包括下模体221及承载板222。下模体221具有凹部221r,承载板222可设于凹部221r的底面221b上。承载板222可升降,以调整设于其上的基板110的高度位置。The lower mold 220 includes a lower mold body 221 and a supporting plate 222 . The lower mold body 221 has a concave portion 221r, and the bearing plate 222 can be disposed on the bottom surface 221b of the concave portion 221r. The supporting plate 222 can be lifted up and down to adjust the height position of the substrate 110 disposed thereon.
如图3A所示,设置基板110及芯片120于下模220的底部,其中基板110设于承载板22上,而芯片120通过电性接点121设于基板110上且位于可形变元件213正下方。As shown in FIG. 3A , the substrate 110 and the chip 120 are disposed at the bottom of the lower mold 220 , wherein the substrate 110 is disposed on the carrier plate 22 , and the chip 120 is disposed on the substrate 110 through electrical contacts 121 and is located directly below the deformable element 213 .
如图3B所示,合模下模220与上模210。例如,上模210往下模220的方向移动而合模,过程中,可形变元件213受到芯片120的挤压而于芯片120的侧面120s形成环状突部2131,其中环状突部2131一封闭环状突部,其环绕芯片120的侧面120s且环状突部2131的底面2131b低于芯片120的第二表面120u。As shown in FIG. 3B , the lower mold 220 and the upper mold 210 are clamped. For example, the upper mold 210 moves toward the direction of the lower mold 220 to close the mold. During the process, the deformable element 213 is pressed by the chip 120 to form an annular protrusion 2131 on the side surface 120s of the chip 120, wherein the annular protrusion 2131- The ring-shaped protrusion surrounds the side surface 120s of the chip 120 and the bottom surface 2131b of the ring-shaped protrusion 2131 is lower than the second surface 120u of the chip 120 .
上模210与下模220合模后,可形变元件213被压缩一压缩厚度P,此压缩厚度P可由下式(1)决定。After the upper mold 210 and the lower mold 220 are closed, the deformable element 213 is compressed to a compressed thickness P, and the compressed thickness P can be determined by the following formula (1).
P=(T2+H5)-H4.................................................(1)P=(T2+H5)-H4................................... ........(1)
式(1)中,厚度T2(图3A)可形变元件213的初始厚度、距离H4中板212的顶面212u与基板110的上表面110u的距离,而距离H5芯片120的第二表面120u至基板110的上表面110u的距离。经由适当的压缩厚度P设计(即可形变元件213压缩率设计),使可形变元件213紧密地抵压在芯片120的第二表面120u,避免或减少后续工艺中呈流动态的封装材料130’(图3C)流至可形变元件213与芯片120之间而覆盖到芯片120的第二表面120u。In formula (1), thickness T2 ( FIG. 3A ) is the initial thickness of the deformable element 213, the distance from the top surface 212u of the plate 212 to the upper surface 110u of the substrate 110 in distance H4, and the distance from the second surface 120u to the second surface 120u of the chip 120 in distance H5 The distance from the upper surface 110u of the substrate 110 . Through proper design of the compression thickness P (i.e. design of the compressibility of the deformable element 213), the deformable element 213 is tightly pressed against the second surface 120u of the chip 120, so as to avoid or reduce the fluid packaging material 130' in the subsequent process. ( FIG. 3C ) flows between the deformable element 213 and the chip 120 to cover the second surface 120u of the chip 120 .
本例中,压缩厚度P小于芯片120的厚度T1,如此可使环状突部2131的底面2131b高于芯片120的第一表面120b。一例中,芯片120的厚度T1例如是约800微米;然亦可采用更薄或更厚的芯片,若此,可形变元件213的厚度T2及压缩厚度P可配合调整,以获得预期或预设的环状突部2131的几何型态。由于环状突部2131的底面2131b高于芯片120的第一表面120b,使环状突部2131的底面2131b与芯片120的第一表面120b之间形成一模流空间S,此模流空间S可让呈流动态的封装材料130’(图3C)顺畅地流至芯片120的第一表面120b与基板110之间的空间。In this example, the compressed thickness P is smaller than the thickness T1 of the chip 120 , so that the bottom surface 2131 b of the annular protrusion 2131 is higher than the first surface 120 b of the chip 120 . In one example, the thickness T1 of the chip 120 is, for example, about 800 microns; however, a thinner or thicker chip can also be used. If so, the thickness T2 and the compressive thickness P of the deformable element 213 can be adjusted to obtain a desired or preset The geometry of the annular protrusion 2131. Since the bottom surface 2131b of the annular protrusion 2131 is higher than the first surface 120b of the chip 120, a mold flow space S is formed between the bottom surface 2131b of the annular protrusion 2131 and the first surface 120b of the chip 120. The mold flow space S The fluid packaging material 130 ′ ( FIG. 3C ) can smoothly flow to the space between the first surface 120 b of the chip 120 and the substrate 110 .
上模210与下模220合模后,中板212的顶面230u高于或实质上对齐芯片120的第二表面120u,本例以高于芯片120的第二表面120u为例说明。一例中,中板212的顶面230u与芯片120的第二表面120u的距离H1介于0至110微米之间,而芯片120的第二表面120u与环状突部2131的底面2131b的距离H2介于0至110微米之间,使中板212的顶面230u与环状突部2131的底面2131b的距离介于0至220微米之间。After the upper mold 210 and the lower mold 220 are molded together, the top surface 230u of the middle plate 212 is higher than or substantially aligned with the second surface 120u of the chip 120 . In one example, the distance H1 between the top surface 230u of the middle plate 212 and the second surface 120u of the chip 120 is between 0 and 110 microns, and the distance H2 between the second surface 120u of the chip 120 and the bottom surface 2131b of the annular protrusion 2131 The distance between the top surface 230u of the middle plate 212 and the bottom surface 2131b of the annular protrusion 2131 is between 0 and 110 microns, and the distance is between 0 and 220 microns.
当上模210与下模220合模时,上模210的中板212与下模220的承载板222之间形成一模穴230r。模穴230r的轮廓可决定后续形成的封装体130的外轮廓,然本发明实施例并不限定模穴230r的轮廓形状,因此封装体130的外轮廓可具有多种几何形态。When the upper mold 210 and the lower mold 220 are closed, a cavity 230 r is formed between the middle plate 212 of the upper mold 210 and the supporting plate 222 of the lower mold 220 . The contour of the mold cavity 230r can determine the outer contour of the subsequently formed package body 130, but the embodiment of the present invention does not limit the contour shape of the mold cavity 230r, so the outer contour of the package body 130 can have various geometric forms.
如图3C所示,填充高温流动态的封装材料130’于模穴230r内,其中封装材料130’在接触到环形突部2131的外侧213s1后,绕过环形突部2131的底面2131b至环形突部2131的内侧213s2,而覆盖芯片120的侧面120s的至少一部分。此外,封装材料130’也经由环形突部2131的底面2131b与基板110的上表面110u之间的模流空间S进入到芯片120的第一表面120b与基板110的上表面110u之间的空间,而包覆电性接点121,在此设计下,可省略额外的底胶(underfill)。此外,在封装材料130’充模后,封装材料130’覆盖模穴230r的顶面230u,而形成封装材料130’的上表面130u。封装材料130’冷却凝固后成为图1B的封装体130,至此,形成如图1A所示的半导体封装件100。As shown in FIG. 3C, the packaging material 130' of high temperature fluidity is filled in the mold cavity 230r, wherein the packaging material 130', after contacting the outer side 213s1 of the annular protrusion 2131, bypasses the bottom surface 2131b of the annular protrusion 2131 to the annular protrusion The inner side 213s2 of the portion 2131 covers at least a part of the side surface 120s of the chip 120 . In addition, the packaging material 130' also enters the space between the first surface 120b of the chip 120 and the upper surface 110u of the substrate 110 through the mold flow space S between the bottom surface 2131b of the annular protrusion 2131 and the upper surface 110u of the substrate 110, For covering the electrical contacts 121 , under this design, the extra underfill can be omitted. In addition, after the packaging material 130' is filled, the packaging material 130' covers the top surface 230u of the mold cavity 230r to form the upper surface 130u of the packaging material 130'. The encapsulation material 130' is cooled and solidified to become the encapsulation body 130 shown in FIG. 1B . So far, the semiconductor package 100 as shown in FIG. 1A is formed.
综上所述,虽然本发明已以实施例揭露如上,然其并非用以限定本发明。本发明所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作各种的更动与润饰。因此,本发明的保护范围当视权利要求书所界定者为准。To sum up, although the present invention has been disclosed by the above embodiments, it is not intended to limit the present invention. Those skilled in the art of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the claims.
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