CN103019047A - Developing solution spraying device and spraying method - Google Patents
Developing solution spraying device and spraying method Download PDFInfo
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- CN103019047A CN103019047A CN2012105247143A CN201210524714A CN103019047A CN 103019047 A CN103019047 A CN 103019047A CN 2012105247143 A CN2012105247143 A CN 2012105247143A CN 201210524714 A CN201210524714 A CN 201210524714A CN 103019047 A CN103019047 A CN 103019047A
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Abstract
本发明提供一种显影喷涂设备及喷涂方法，所述显影喷涂设备包括：至少一个第一喷头，用于沿第一方向朝所述基板喷涂显影液；至少一个第二喷头，用于沿第二方向朝所述基板喷涂显影液，其中所述第一方向与所述第二方向不同。通过沿不同方向朝基板喷涂显影液，相对于现有技术显影液相对基板静止，本发明所述显影喷涂设备使得显影液在基板上具有不同流动方向，从而达到基板不同区域的显影液浓度均一的效果。
The present invention provides a developing and spraying equipment and a spraying method. The developing and spraying equipment comprises: at least one first spraying head, used to spray developing solution toward the substrate along a first direction; at least one second spraying head, used to spray developer along a second direction. A developer is sprayed toward the substrate in a direction, wherein the first direction is different from the second direction. By spraying the developing solution toward the substrate in different directions, compared with the prior art, the developing solution is stationary relative to the substrate, the developing and spraying device of the present invention enables the developing solution to have different flow directions on the substrate, so as to achieve uniform concentration of the developing solution in different regions of the substrate Effect.
Description
Technical field
The present invention relates to display panel and make the field, especially design a kind of development spraying equipment and spraying method.
Background technology
In the preparation technology of Thin Film Transistor-LCD, usually adopt the mode of half exposure that photoresist is exposed, then through developing and etching, finally form the TFT(Thin Film Transistor (TFT) in electrostatic prevention district and pixel region) source electrode, drain electrode and raceway groove.At whole Panel(panel) layout in, the cabling of pixel region is comparatively sparse, and the cabling in fanout area (Fanout district) and Pad district is very dense, fanout area during development (Fanout district) and data terminal subarea (Pad district) to develop the photoresist that falls than pixel region lack many.As shown in Figure 1, when spraying developer solution, developer solution is that vertical spray is lower, in glass substrate advances process, the relative glass substrate of developer solution is static substantially, so just cause near the solution level fanout area (Fanout district) and data terminal subarea (the Pad district) higher than pixel region, the photoresist of near the electrostatic prevention district TFT these zones and the coating of pixel TFT top is easily crossed to develop, cause in the raceway groove photoresist thickness partially thin or disconnect, cause the switching characteristic forfeiture of TFT after the etching.Simultaneously, the live width homogeneity that is positioned at the signal wire in Fanout district and Pad district also can be subjected to the impact of developed concentration and be variant with pixel region.
Summary of the invention
In order to solve the problems of the technologies described above, the invention provides a kind of development spraying equipment and spraying method, make the solution level trend homogeneous of substrate zones of different.
One aspect of the present invention provides a kind of development spraying equipment, is used to the substrate spraying developer solution, comprising:
At least one first shower nozzle is used for along first direction towards described substrate spraying developer solution;
At least one second shower nozzle is used for along second direction towards described substrate spraying developer solution, and wherein said first direction is different from described second direction.
Preferably, development spraying equipment described above, the angle between described first direction and the described second direction is less than 90 degree.
Preferably, development spraying equipment described above, described substrate moves towards third direction with respect to described the first shower nozzle and described the second shower nozzle, and described first direction is vertical with respect to described third direction, and described the second shower nozzle is arranged at a side of described the first shower nozzle along described third direction.
Preferably, development spraying equipment described above, described first direction are perpendicular to described substrate, and described third direction is parallel to described substrate.
Preferably, development spraying equipment described above, described the first shower nozzle is two, two described the first shower nozzles are parallel to each other, and the direction of two described the first shower nozzle ejection developer solutions is described first direction.
Preferably, development spraying equipment described above, described the second shower nozzle is obliquely installed with respect to described the first shower nozzle and described substrate, and the nozzle direction of described the second shower nozzle is towards described second direction.
Preferably, development spraying equipment described above, described the second shower nozzle are parallel to described the first shower nozzle setting, and the nozzle direction of described the second shower nozzle is towards described second direction.
Preferably, development spraying equipment described above, the spraying scope of described the first shower nozzle and described the second shower nozzle equates with the width of described substrate at least.
The present invention also provides a kind of spraying method that uses above-mentioned development spraying equipment on the other hand, comprises step:
At least one first shower nozzle is along first direction towards the substrate spraying developer solution, and at least one second shower nozzle is along second direction towards described substrate spraying developer solution simultaneously.
In the specific embodiment of the invention technique scheme at least one has following beneficial effect:
Described development spraying equipment is along different directions towards the glass substrate spraying developer solution, static with respect to the relative glass substrate of prior art developer solution, development spraying equipment of the present invention is so that developer solution has different flow directions at glass substrate, strengthened developer solution flowability in different directions, thereby reach the effect of the solution level homogeneous of glass substrate zones of different, avoided near higher and the electrostatic prevention district TFT causing of fanout area and Pad district developed concentration and the pixel TFT raceway groove disconnects and the inhomogenous problem of live width.
Description of drawings
Fig. 1 represents the schematic diagram of a kind of spraying method that develops of prior art;
Fig. 2 represents the first embodiment schematic diagram that the present invention develops and sprays;
Fig. 3 represents the second embodiment schematic diagram that the present invention develops and sprays;
Fig. 4 represent the present invention develop the spraying the second embodiment in the second nozzle structure schematic diagram.
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, describe the present invention below in conjunction with the accompanying drawings and the specific embodiments.
The invention provides a kind of development spraying equipment, be used to the substrate spraying developer solution, comprising:
At least one first shower nozzle is used for along first direction towards described substrate spraying developer solution;
At least one second shower nozzle is used for along second direction towards described substrate spraying developer solution, and wherein said first direction is different from described second direction.
By the described development spraying equipment of the specific embodiment of the invention, along different directions towards the substrate spraying developer solution, static with respect to the relative substrate of prior art developer solution, development spraying equipment of the present invention is so that developer solution has different flow directions at substrate, thereby reaches the effect of the solution level homogeneous of substrate zones of different.
Preferably, the angle between described first direction and the described second direction is less than 90 degree, and described substrate moves towards third direction with respect to described the first shower nozzle and described the second shower nozzle, and described first direction is vertical with respect to described third direction.
Preferably, described first direction is perpendicular to described substrate, described third direction is parallel to described substrate, common described third direction is level, also be that the substrate along continuous straight runs moves, described the first shower nozzle is perpendicular to described substrate spraying developer solution, and described the second shower nozzle is along the direction spraying developer solution that tilts with respect to vertical direction.
Adopt specific embodiments of the invention, on the basis of the first shower nozzle of prior art, increase again one or more the second shower nozzles, the developer solution that sprays from the second shower nozzle sprays to substrate with second direction, wherein second direction is different from first direction, it also is non-perpendicular state, so that developer solution is under the effect of the second shower nozzle, can on the substrate along important on the direction on the vertical third direction.Developer solution has increased the flowability on this direction like this, make the solution level trend homogeneous of substrate zones of different, avoided near higher and electrostatic prevention district TFT and the disconnection of pixel region TFT raceway groove and the live width heterogeneity causing of fanout area and Pad district developed concentration.
Particularly, described the first shower nozzle can be two, and described the second shower nozzle is arranged at a side of described the first shower nozzle along described third direction.So design, when substrate moves along third direction, the first shower nozzle at first arrives the first area of substrate along developer solution that first direction sprays, along with substrate continues to move along third direction, the second shower nozzle arrives again this first area of substrate along developer solution that second direction sprays, so that the solution level of this first area is more even.
Below will be described in detail the structure of the described development spraying equipment of the specific embodiment of the invention as glass substrate as example take the first shower nozzle as two and substrate.Wherein, described first direction is vertical glass substrate, and described third direction is the parallel glass substrate, also is that the glass substrate along continuous straight runs moves, described the first shower nozzle is perpendicular to described glass substrate spraying developer solution, and described the second shower nozzle is along the direction spraying developer solution that tilts with respect to vertical direction.Wherein two kinds of disposing ways of following the first shower nozzle and the second shower nozzle all can reach and make the first shower nozzle along first direction towards the glass substrate spraying developer solution, and the second shower nozzle is along the technique effect of second direction spraying developer solution:
1, comprise two the first shower nozzles that are parallel to each other, the second shower nozzle tilts with respect to described the first shower nozzle;
2, comprise two the first shower nozzles that are parallel to each other, the second shower nozzle is also parallel with respect to the first shower nozzle.
The first embodiment as shown in Figure 2, two the first shower nozzles 21,22 parallel to each other, and be placed on towards the desired location of glass substrate 11 tops of third direction 3 motion, the first shower nozzle 21,22 nozzle vertically spray towards glass substrate 11 surfaces with first direction.The second shower nozzle 23 is arranged at the first shower nozzle 21, a side of 22 along third direction 3.The second shower nozzle 23 and the first shower nozzle 21,22 not parallel putting, and the second shower nozzle 23 is with respect to glass substrate 11 slant settings, the nozzle of such the second shower nozzle 23 sprays along second direction, developer solution will have an angle with glass substrate 11 by nozzle flow lower time, this second direction is on glass substrate 11, on the direction perpendicular to third direction 3 one-component is arranged, can drive developer solution edge on glass substrate 11 moves perpendicular to the direction of third direction 3, can on this direction, be coated with again one deck developer solution, to increase the homogeneity of solution level, avoided fanout area 12 and Pad district developed concentration higher.In order to strengthen the homogeneity of solution level, can increase again the disposing way of one or more the second shower nozzle 23, the second shower nozzles 23 as mentioned above.
Preferably, the spraying scope of two the first shower nozzles 21, the 22 and second shower nozzle 23, the width with glass substrate 11 minor faces equates at least.The phenomenon of glass substrate 11 a certain position drain sprays all can not occur in the first shower nozzle 21, the 22 and second shower nozzle 23 when spraying, guaranteed the homogeneity of solution level.
During work, glass substrate 11 moves along third direction 3, when glass substrate 11 is placed, minor face is parallel to the first shower nozzle, glass substrate 11 is first through the first shower nozzle 21, the 22 spraying effects along first direction, continuation is moved along third direction 3, and the second shower nozzle 23 sprays glass substrate 11 along second direction again.
This design not only is applicable to general Array and produces developing apparatus in the line, also be applicable to color film and produce developing apparatus in the line, and for the spraying of developing apparatus that need not be from generation to generation, the present invention is applicable equally.
The second embodiment of the present invention is shown in Fig. 3 and 4, the first shower nozzle 21,22 parallel to each other wherein, and be placed on towards the desired location of glass substrate 11 tops of third direction 3 motion, the first shower nozzle 21,22 nozzle vertically spray towards glass substrate 11 surfaces with first direction.The second shower nozzle 23 is arranged at the first shower nozzle 21, a side of 22 along third direction 3.The second shower nozzle 23 and the first shower nozzle 21,22 laid parallels, and perpendicular to glass substrate 11.Different from the first embodiment is, the second shower nozzle 23 has carried out the transformation such as Fig. 4, the nozzle of the second shower nozzle 23 no longer is vertically to spray developer solution 4, but nozzle is offered along second direction, spray developer solution 4 direction along second direction and and vertical direction between have relative angle, the developer solution 4 that sprays like this can the direction along vertical third direction 3 flow on glass substrate 11, makes the solution level homogeneous of glass substrate 11 zoness of different.
In order to strengthen the homogeneity of developer solution 4 concentration, can increase again one or more the second shower nozzles 2, the disposing way of the second shower nozzle 2 of increase is as mentioned above.
The disposing way that in embodiment two and the mode one only is the second shower nozzle is different with structure, and other the course of work, the scope of application and final effect do not repeat them here as described in the mode one.
The specific embodiment of the invention also provides a kind of spraying method that uses above-mentioned development spraying equipment on the other hand, comprise step: at least one first shower nozzle is along first direction towards the substrate spraying developer solution, at least one second shower nozzle of while is along second direction towards described substrate spraying developer solution.
Preferably, the angle between described first direction and the described second direction is less than 90 degree, and described substrate moves towards third direction with respect to described the first shower nozzle and described the second shower nozzle, and described first direction is vertical with respect to described third direction.
Preferably, described first direction is perpendicular to described substrate, described third direction is parallel to described substrate, common described third direction is level, also be that the substrate along continuous straight runs moves, described the first shower nozzle is perpendicular to described substrate spraying developer solution, and described the second shower nozzle is along the direction spraying developer solution that tilts with respect to vertical direction.
Adopt the concrete structure of the spraying equipment of the described spraying method of the specific embodiment of the invention can consult Fig. 2 to shown in Figure 4, do not repeat them here.
The described spraying equipment of the specific embodiment of the invention and spraying method, on the basis of the first shower nozzle of prior art, increase again one or more the second shower nozzles, the developer solution that sprays from the second shower nozzle sprays to substrate with second direction, wherein second direction is different from first direction, it also is non-perpendicular state, so that developer solution is under the effect of the second shower nozzle, can on the substrate along important on the direction on the vertical third direction.Developer solution has increased the flowability on this direction like this, make the solution level trend homogeneous of substrate zones of different, avoided near higher and electrostatic prevention district TFT and the disconnection of pixel region TFT raceway groove and the live width heterogeneity causing of fanout area and Pad district developed concentration.
The above only is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (9)
1. a development spraying equipment is used to the substrate spraying developer solution, it is characterized in that, comprising:
At least one first shower nozzle is used for along first direction towards described substrate spraying developer solution;
At least one second shower nozzle is used for along second direction towards described substrate spraying developer solution, and wherein said first direction is different from described second direction.
2. development spraying equipment as claimed in claim 1 is characterized in that, the angle between described first direction and the described second direction is less than 90 degree.
3. development spraying equipment as claimed in claim 1 or 2, it is characterized in that, described substrate moves towards third direction with respect to described the first shower nozzle and described the second shower nozzle, described first direction is vertical with respect to described third direction, and described the second shower nozzle is arranged at a side of described the first shower nozzle along described third direction.
4. development spraying equipment as claimed in claim 3 is characterized in that, described first direction is perpendicular to described substrate, and described third direction is parallel to described substrate.
5. development spraying equipment as claimed in claim 1 is characterized in that, described the first shower nozzle is two, and two described the first shower nozzles are parallel to each other, and the direction of two described the first shower nozzle ejection developer solutions is described first direction.
6. development spraying equipment as claimed in claim 5 is characterized in that, described the second shower nozzle is obliquely installed with respect to described the first shower nozzle and described substrate, and the nozzle direction of described the second shower nozzle is towards described second direction.
7. development spraying equipment as claimed in claim 5 is characterized in that, described the second shower nozzle is parallel to described the first shower nozzle setting, and the nozzle direction of described the second shower nozzle is towards described second direction.
8. development spraying equipment as claimed in claim 1 is characterized in that, the spraying scope of described the first shower nozzle and described the second shower nozzle equates with the width of described substrate at least.
9. the spraying method of right to use requirement 1 to 8 each described development spraying equipment is characterized in that, comprises step:
At least one first shower nozzle is along first direction towards the substrate spraying developer solution, and at least one second shower nozzle is along second direction towards described substrate spraying developer solution simultaneously.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012105247143A CN103019047A (en) | 2012-12-07 | 2012-12-07 | Developing solution spraying device and spraying method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012105247143A CN103019047A (en) | 2012-12-07 | 2012-12-07 | Developing solution spraying device and spraying method |
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| CN103019047A true CN103019047A (en) | 2013-04-03 |
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| CN2012105247143A Pending CN103019047A (en) | 2012-12-07 | 2012-12-07 | Developing solution spraying device and spraying method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104252098A (en) * | 2014-09-18 | 2014-12-31 | 京东方科技集团股份有限公司 | Phase shifting mask and manufacture method thereof, and array substrate and manufacture method thereof |
| CN110450542A (en) * | 2019-09-12 | 2019-11-15 | 昆山国显光电有限公司 | A kind of inkjet-printing device |
| CN110764374A (en) * | 2013-08-05 | 2020-02-07 | 东京毅力科创株式会社 | Developing method and developing device |
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| US6089762A (en) * | 1997-04-28 | 2000-07-18 | Dainippon Screen Mfg. Co., Ltd. | Developing apparatus, developing method and substrate processing apparatus |
| CN1737692A (en) * | 2004-08-20 | 2006-02-22 | 东京毅力科创株式会社 | Developing apparatus and method |
| CN101251720A (en) * | 2008-03-12 | 2008-08-27 | 友达光电股份有限公司 | Automatic developing device and automatic developing method |
| CN101644902A (en) * | 2009-08-26 | 2010-02-10 | 友达光电股份有限公司 | Substrate processing method and apparatus and liquid supply device thereof |
| JP2011203469A (en) * | 2010-03-25 | 2011-10-13 | Toppan Printing Co Ltd | Developing method and developing device |
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2012
- 2012-12-07 CN CN2012105247143A patent/CN103019047A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6089762A (en) * | 1997-04-28 | 2000-07-18 | Dainippon Screen Mfg. Co., Ltd. | Developing apparatus, developing method and substrate processing apparatus |
| CN1737692A (en) * | 2004-08-20 | 2006-02-22 | 东京毅力科创株式会社 | Developing apparatus and method |
| CN101251720A (en) * | 2008-03-12 | 2008-08-27 | 友达光电股份有限公司 | Automatic developing device and automatic developing method |
| CN101644902A (en) * | 2009-08-26 | 2010-02-10 | 友达光电股份有限公司 | Substrate processing method and apparatus and liquid supply device thereof |
| JP2011203469A (en) * | 2010-03-25 | 2011-10-13 | Toppan Printing Co Ltd | Developing method and developing device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110764374A (en) * | 2013-08-05 | 2020-02-07 | 东京毅力科创株式会社 | Developing method and developing device |
| CN110764374B (en) * | 2013-08-05 | 2024-01-19 | 东京毅力科创株式会社 | Developing method and developing device |
| CN104252098A (en) * | 2014-09-18 | 2014-12-31 | 京东方科技集团股份有限公司 | Phase shifting mask and manufacture method thereof, and array substrate and manufacture method thereof |
| CN104252098B (en) * | 2014-09-18 | 2019-03-01 | 京东方科技集团股份有限公司 | Phase-shift mask plate and preparation method thereof, array substrate and preparation method thereof |
| CN110450542A (en) * | 2019-09-12 | 2019-11-15 | 昆山国显光电有限公司 | A kind of inkjet-printing device |
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Application publication date: 20130403 |