CN103014793B - Method for preparing titanium carbide coating through pulse electrodeposition - Google Patents
Method for preparing titanium carbide coating through pulse electrodeposition Download PDFInfo
- Publication number
- CN103014793B CN103014793B CN201210535928.0A CN201210535928A CN103014793B CN 103014793 B CN103014793 B CN 103014793B CN 201210535928 A CN201210535928 A CN 201210535928A CN 103014793 B CN103014793 B CN 103014793B
- Authority
- CN
- China
- Prior art keywords
- titanium carbide
- carbide coating
- prepares
- titanium
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 238000000576 coating method Methods 0.000 title claims abstract description 45
- 239000011248 coating agent Substances 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 24
- 239000010936 titanium Substances 0.000 claims abstract description 27
- 150000003839 salts Chemical class 0.000 claims abstract description 22
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 9
- 239000010439 graphite Substances 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 239000011261 inert gas Substances 0.000 claims abstract description 3
- 238000002156 mixing Methods 0.000 claims description 16
- 229910001220 stainless steel Inorganic materials 0.000 claims description 16
- 239000010935 stainless steel Substances 0.000 claims description 16
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 4
- 239000011780 sodium chloride Substances 0.000 claims description 4
- 230000008021 deposition Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 239000007789 gas Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 3
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 239000011833 salt mixture Substances 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000012876 topography Methods 0.000 description 4
- HEAUFJZALFKPBA-JPQUDPSNSA-N (3s)-3-[[(2s,3r)-2-[[(2s)-6-amino-2-[[(2s)-2-amino-3-(1h-imidazol-5-yl)propanoyl]amino]hexanoyl]amino]-3-hydroxybutanoyl]amino]-4-[[(2s)-1-[[(2s)-1-[[(2s)-1-[[2-[[(2s)-1-[[(2s)-1-amino-4-methylsulfanyl-1-oxobutan-2-yl]amino]-4-methyl-1-oxopentan-2-yl]amin Chemical compound C([C@@H](C(=O)N[C@H](C(=O)NCC(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCSC)C(N)=O)C(C)C)NC(=O)[C@H](CO)NC(=O)[C@H](CC(O)=O)NC(=O)[C@@H](NC(=O)[C@H](CCCCN)NC(=O)[C@@H](N)CC=1NC=NC=1)[C@@H](C)O)C1=CC=CC=C1 HEAUFJZALFKPBA-JPQUDPSNSA-N 0.000 description 3
- 239000010963 304 stainless steel Substances 0.000 description 3
- 229910017060 Fe Cr Inorganic materials 0.000 description 3
- 229910002544 Fe-Cr Inorganic materials 0.000 description 3
- 101800000399 Neurokinin A Proteins 0.000 description 3
- 102100024304 Protachykinin-1 Human genes 0.000 description 3
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 3
- 239000013543 active substance Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000005496 eutectics Effects 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000011946 reduction process Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a method for preparing a titanium carbide coating through pulse electrodeposition. The method comprises the following steps: through taking a substrate as a cathode, taking graphite as an anode and a carbon source and taking nickel as a reference electrode, melting a titanium source into a salt mixture; reacting for 0.5-2h under the protection of inert gas, at a temperature of 800-950 DEG C and under a pulse voltage of 2.5-3V, thus forming a titanium carbide coating on the substrate. According to the invention, deposition is performed by using a molten salt electro-deposition method without use of large equipment and precious materials, therefore, the method is low in cost and simple in operation; and in the reaction process, no harmful gas is required, and no harmful substance is produced, therefore, the method is environment-friendly; and a titanium carbide coating prepared by using the method disclosed by the invention is dense and good in performances.
Description
Technical field
The invention belongs to technical field of surface, particularly relate to a kind of method that pulse electrodeposition prepares titanium carbide coating.
Background technology
Therefore transition group carbide is called as refractory carbide owing to having very high fusing point.Titanium carbide, as wherein one of most important refractory carbide, has the advantages such as high-melting-point (3067 DEG C), high-modulus (410-450GPa), high rigidity (28-35GPa) and good chemical stability.Therefore cutting tool and industrial wear parts etc. is widely used in.Titanium carbide has low chemically reactive, therefore lower of room temperature is corroded by the concentrated acid and concentrated base containing oxygenant, at high temperature still has good solidity to corrosion.The industrial the most frequently used method preparing titanium carbide coating has chemical vapour deposition, physical vapor deposition and thermospray.Physical vapor deposition is lower than chemical vapour deposition depositing temperature used, but causes base material and coating layering just because of temperature is low, reduces adhesivity.Thermospray can prepare thicker titanium carbide coating, but porosity is high.In addition, also useful titanium valve as reagent crystal growth from flux titanium carbide.
Molten salt electrochemistry method is also used to prepare some carbide coatings as TaC, NbC, WC, SiC etc.In these researchs, the carbon source needed for electrosynthesis carbide is carbonate.Relative to other refractory carbide, the electrolytic synthesis of titanium carbide is much more difficult, and its reason is that titanium source is (as K
2tiF
6) easily and carbonate reaction form the product that is difficult to be reduced (as K
2tiO
3).
Summary of the invention
Based on this, the object of this invention is to provide a kind of method that pulse electrodeposition prepares titanium carbide coating.
Concrete technical scheme is as follows:
A kind of pulse electrodeposition prepares the method for titanium carbide coating; comprise the steps: to take substrate as negative electrode; graphite is anode and carbon source; nickel is reference electrode; in titanium source is melted in mixing salt, reaction conditions is: in protection of inert gas, 800-950 DEG C; react 0.5-2h under 2.5-3V pulse potential, namely on substrate, generate one deck titanium carbide coating.
Wherein in some embodiments, described titanium source is K
2tiF
6.
Wherein in some embodiments, described mixing salt composition and molar content be: 40-41%NaCl, 50-51%KCl and 9-10%NaF.
Wherein in some embodiments, described mixing salt composition and molar content be: 40.25%NaCl, 50.5%KCl and 9.25%NaF.
Wherein in some embodiments, the weight percentage of described titanium source in mixing salt is 5-10%.
Wherein in some embodiments, the weight percentage of described titanium source in mixing salt is 7%.
Wherein in some embodiments, described reaction conditions is: 900 DEG C, reacts 1h under 2.8V pulse potential.
Wherein in some embodiments, in described pulse potential, depositing time and stand-by time are than being 2-4:1.
Wherein in some embodiments, the thickness of described titanium carbide coating is 0.5-1 μm.
Wherein in some embodiments, described substrate is stainless steel plate.
Principle of the present invention: relate to three processes, namely as the K in titanium source in stainless steel surface electrochemical synthesis TiC coating
2tiF
6be reduced into Ti, produce C and Ti and C reaction formation TiC.Ti (K
2tiF
6) electro-reduction process in molten fluoride or fluorochemical-muriate comprises following two steps:
Ti
4++e=Ti
3+(1)
Ti
3++3e=Ti (2)
In reduction process, do not observe and relate to Ti
2+intermediate reaction.Carbanion is often used as the carbon source of fused salt galvanic deposit carbide.In the present invention, owing to not having carbonate in fused salt, therefore the carbon source formed needed for titanium carbide can only from graphite anode.Experimental result shows, graphite anode is subject to comparatively serious corrosion in pulse electrodeposition process, and obviously, graphite can form some carbonaceous products with molten salt react ion in the process.These carbonaceous products are reduced into carbon at stainless steel surface, and react with titanium and form titanium carbide.
Beneficial effect of the present invention:
The industrial the most frequently used method of carbide coating of preparing has chemical vapour deposition, physical vapor deposition and thermospray.Physical vapor deposition can carry out under the condition more much lower than chemical vapour deposition temperature, but lower substrate temperature also may cause the bonding force of coating and matrix to decline; Thermospray can prepare thicker carbide coating, but coating porosity is high.The present invention adopts the method for fused salt galvanic deposit to deposit, and does not need main equipment and precious materials, with low cost, simple to operate.Without the need for evil gas in reaction process, also do not produce objectionable impurities, so present method is environmentally friendly.The titanium carbide coating obtained by present method is fine and close, and performance is good.
Accompanying drawing explanation
Fig. 1 is the XRD figure (1 is titanium carbide, and 2 is stainless steel substrate) of the titanium carbide coating that pulse electrodeposition of the present invention prepares;
Fig. 2 is the surface topography of the titanium carbide coating that pulse electrodeposition of the present invention prepares.
Embodiment
By the following examples the present invention is further elaborated.
Embodiment 1
The method that the present embodiment pulse electrodeposition prepares titanium carbide coating is as follows:
Adopt Linear cut by 304 stainless steel materials Linear cut slabbing samples, and through grinding, cleaning and drying treatment.Fe-Cr silk is spot welded to one end of sample as contact conductor, galvanic deposit adopt three-electrode system, namely with stainless steel plate sample for negative electrode, Graphite Electrodes is supporting electrode and carbon source (anode), and nickel electrode is reference electrode.With K
2tiF
6for titanium source, be active substance K with ternary eutectic (mixing salt) 40.25mol%NaCl-50.5mol%KCl--9.25mol%NaF salt
2tiF
6solvent, K
2tiF
6content is in a solvent 7wt%.The above-mentioned mixing salt for preparing and titanium source are put into alumina crucible, under the protection of argon gas, is warmed up to 900 DEG C.PAR2273 electrochemical workstation is adopted to carry out constant potential pulsed deposition.Applying pulse current potential is 2.8V, and stop 0.6 second after depositing 2.4 seconds, total pulsed deposition time is 1 hour, namely deposits the titanium carbide coating that a layer thickness is 0.8 μm on stainless steel.
The XRD figure of described titanium carbide coating and surface topography map are see Fig. 1 and Fig. 2.
Can find out that the titanium carbide coating that electrodeposition method of the present invention prepares at stainless steel base is continuously fine and close from Fig. 1, Fig. 2, with stainless steel base in conjunction with good.
Titanium carbide is a kind of high-hardness ceramic material, has excellent wear resisting property and chemical stability in room temperature environment.Titanium carbide has low chemically reactive, therefore can only be corroded by the concentrated acid and concentrated base containing oxygenant under room temperature, and at high temperature still have good solidity to corrosion, be widely used prospect, as cutting tool, industrial wear parts and electrode materials etc.
Stainless steel is used to the bipolar plates of Proton Exchange Membrane Fuel Cells owing to having the advantage of high strength, low cost, excellent machinability, good ductility and electroconductibility, but in the environment of Proton Exchange Membrane Fuel Cells, bipolar plate of stainless steel easily corrodes and passivation (causing electroconductibility to reduce), so need in its surface-coated last layer corrosion-resistant conductive coating.Adopt the method for pulse electrodeposition of the present invention on bipolar plate of stainless steel, deposit one deck titanium carbide coating, can ensure that bipolar plates has good electroconductibility, greatly can improve again the erosion resistance of bipolar plates.
Embodiment 2
The method that the present embodiment pulse electrodeposition prepares titanium carbide coating is as follows:
Adopt Linear cut by 304 stainless steel materials Linear cut slabbing samples, and through grinding, cleaning and drying treatment.Fe-Cr silk is spot welded to one end of sample as contact conductor, galvanic deposit adopt three-electrode system, namely with stainless steel plate sample for negative electrode, graphite is supporting electrode and carbon source (anode), and nickel electrode is reference electrode.With K
2tiF
6for titanium source, be active substance K with ternary eutectic (mixing salt) 40.25mol%NaCl-50.5mol%KCl--9.25mol%NaF salt
2tiF
6solvent, K
2tiF
6content in after solvent is 5wt%.The above-mentioned mixing salt for preparing and titanium source are put into alumina crucible, under the protection of argon gas, is warmed up to 850 DEG C.PAR2273 electrochemical workstation is adopted to carry out constant potential pulsed deposition.Applying pulse current potential is stop 0.6 second after 3V deposits 1.2 seconds, and total pulsed deposition time is 2 hours, namely deposits the titanium carbide coating that a layer thickness is 1 μm on stainless steel.
XRD figure and the surface topography map of described titanium carbide coating are similar to Example 1, therefore omit.
Embodiment 3
The method that the present embodiment pulse electrodeposition prepares titanium carbide coating is as follows:
Adopt Linear cut by 304 stainless steel materials Linear cut slabbing samples, and through grinding, cleaning and drying treatment.Fe-Cr silk is spot welded to one end of sample as contact conductor, galvanic deposit adopts three-electrode system, and namely stainless steel plate sample is negative electrode, and take graphite as supporting electrode and carbon source (anode), nickel electrode is reference electrode.With K
2tiF
6for titanium source, be active substance K with ternary eutectic (mixing salt) 40.25mol%NaCl-50.5mol%KCl--9.25mol%NaF salt
2tiF
6solvent, K
2tiF
6content 10wt% in a solvent.The above-mentioned mixing salt for preparing and titanium source are put into alumina crucible, under the protection of argon gas, is warmed up to 950 DEG C.PAR2273 electrochemical workstation is adopted to carry out constant potential pulsed deposition.Applying pulse current potential is stop 0.6 second after 2.5V deposits 1.8 seconds, and total pulsed deposition time is 0.5 hour, namely deposits the titanium carbide coating that a layer thickness is 1 μm on stainless steel.
XRD figure and the surface topography map of described titanium carbide coating are similar to Example 1, therefore omit.
The above embodiment only have expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (9)
1. a pulse electrodeposition prepares the method for titanium carbide coating; it is characterized in that, comprise the steps: to take substrate as negative electrode, graphite is anode and carbon source; nickel is reference electrode; in titanium source is melted in mixing salt, reaction conditions is: in protection of inert gas, 800-950 DEG C; 0.5-2h is reacted under 2.5-3V pulse potential; namely on substrate, generate one deck titanium carbide coating, wherein, described mixing salt composition and molar content be: 40-41%NaCl, 50-51%KCl and 9-10%NaF.
2. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, described titanium source is K
2tiF
6.
3. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, described mixing salt composition and molar content be: 40.25%NaCl, 50.5%KCl and 9.25%NaF.
4. pulse electrodeposition according to claim 1 and 2 prepares the method for titanium carbide coating, it is characterized in that, the weight percentage of described titanium source in mixing salt is 5-10%.
5. pulse electrodeposition according to claim 4 prepares the method for titanium carbide coating, it is characterized in that, the weight percentage of described titanium source in mixing salt is 7%.
6. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, described reaction conditions is: 900 DEG C, reacts 1h under 2.8V pulse potential.
7. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, in described pulse potential, depositing time and stand-by time are than being 2-4:1.
8. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, the thickness of described titanium carbide coating is 0.5-1 μm.
9. pulse electrodeposition according to claim 1 prepares the method for titanium carbide coating, it is characterized in that, described substrate is stainless steel plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210535928.0A CN103014793B (en) | 2012-12-11 | 2012-12-11 | Method for preparing titanium carbide coating through pulse electrodeposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210535928.0A CN103014793B (en) | 2012-12-11 | 2012-12-11 | Method for preparing titanium carbide coating through pulse electrodeposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103014793A CN103014793A (en) | 2013-04-03 |
| CN103014793B true CN103014793B (en) | 2015-02-11 |
Family
ID=47963892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210535928.0A Active CN103014793B (en) | 2012-12-11 | 2012-12-11 | Method for preparing titanium carbide coating through pulse electrodeposition |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103014793B (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103409774A (en) * | 2013-07-09 | 2013-11-27 | 中国船舶重工集团公司第七二五研究所 | Method for preparing titanium or titanium alloy in molten salt by use of pulse power supply |
| CN103972528B (en) * | 2014-05-30 | 2016-01-20 | 长沙理工大学 | Preparation method of protective coating of metal bipolar plate of proton exchange membrane fuel cell |
| CN104233424B (en) * | 2014-09-30 | 2017-01-25 | 长沙理工大学 | metal surface carbonitriding treatment method |
| US9520295B2 (en) * | 2015-02-03 | 2016-12-13 | Lam Research Corporation | Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems |
| CN109207960B (en) * | 2017-07-04 | 2021-02-02 | 宁波晨鑫维克工业科技有限公司 | Titanium carbide nanocrystal coating compounded on surface of M42 steel as well as preparation method and application thereof |
| CN110512233A (en) * | 2019-09-25 | 2019-11-29 | 武汉大学 | A porous carbide hydrogen evolution electrode with honeycomb microstructure and its one-step preparation method |
| CN110983393A (en) * | 2019-12-27 | 2020-04-10 | 广东电网有限责任公司电力科学研究院 | Silver-niobium carbide composite coating and preparation method thereof |
| CN111282586B (en) * | 2020-03-24 | 2022-07-08 | 福州大学 | A kind of preparation method and application of in-situ alumina-coated titanium carbide catalyst |
| CN114122422B (en) * | 2021-09-30 | 2022-07-19 | 哈尔滨工业大学（威海） | Preparation method of surface microstructure of bipolar plate of fuel cell |
| CN114808068B (en) * | 2022-03-01 | 2024-04-05 | 季华实验室 | A graphite cavity inner surface treatment method, graphite cavity thin plate and graphite cavity |
| CN115491675B (en) * | 2022-09-22 | 2023-06-23 | 广西大学 | A preparation method for titanium carbide coating on the surface of metal bipolar plate of proton exchange membrane fuel cell |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US791151A (en) * | 1904-06-24 | 1905-05-30 | Marion Steam Shovel Co | Steam-shovel. |
| JPS5012107A (en) * | 1973-02-28 | 1975-02-07 | ||
| US7410562B2 (en) * | 2003-08-20 | 2008-08-12 | Materials & Electrochemical Research Corp. | Thermal and electrochemical process for metal production |
| KR20100071571A (en) * | 2008-12-19 | 2010-06-29 | 재단법인 포항산업과학연구원 | Method for manufacturing titanium carbide |
| CN102168280A (en) * | 2011-03-10 | 2011-08-31 | 东北大学 | A method for electrochemically synthesizing TiC in low-temperature molten salt |
| USD791151S1 (en) * | 2014-06-24 | 2017-07-04 | Robert Bosch Gmbh | Display screen with graphical user interface |
-
2012
- 2012-12-11 CN CN201210535928.0A patent/CN103014793B/en active Active
Non-Patent Citations (1)
| Title |
|---|
| 碳化钛的合成及其应用研究进展;刘阳等;《中国陶瓷》;20021031;第38 卷(第5 期);第7-10页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103014793A (en) | 2013-04-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103014793B (en) | Method for preparing titanium carbide coating through pulse electrodeposition | |
| Han et al. | A study on pulse plating amorphous Ni–Mo alloy coating used as HER cathode in alkaline medium | |
| CN104220630B (en) | Corrosion-resistant and conductive metal surface | |
| CN103797160B (en) | Analyse chlorine anode | |
| AU2012234150B2 (en) | Anode for electrowinning and electrowinning method using same | |
| US8241530B2 (en) | Metal separator for fuel cell and method for producing the same | |
| CN101994128A (en) | Method for preparing Al-Ti alloy or plated Al-Ti alloy by low-temperature electrolytic deposition of ionic liquid | |
| CN103972528B (en) | Preparation method of protective coating of metal bipolar plate of proton exchange membrane fuel cell | |
| CN106381507B (en) | A kind of inert anode for melting triplex carbonate electrolysis system | |
| CN106967998A (en) | The method that Al Li foundry alloys are prepared as the nearly room temperature electro-deposition of raw material using lithia | |
| CN101103141A (en) | A method for electrolytic production of aluminum | |
| CN106011955A (en) | A corrosion-resistant and wear-resistant Ni-W/Al2O3 CMMA protective layer for marine engineering machinery and its preparation method | |
| Liu et al. | Comparative review of corrosion-resistant coatings on metal bipolar plates of proton exchange membrane fuel cells | |
| Zhao et al. | Anodic carbidation of tantalum in molten CaCl2-CaC2 | |
| Jović et al. | On the kinetics of the hydrogen evolution reaction on Ni-MoOx composite catalysts in alkaline solutions | |
| JP3554630B2 (en) | Electrolytic electrode with durability | |
| CN114808041B (en) | Preparation and activation and regeneration method of Pb-based pseudo-stable anode for manganese electrowinning | |
| CN113881977B (en) | Method for preparing zinc-titanium alloy at low temperature by taking titanium oxycarbide as anode | |
| CN115261914A (en) | Surface treatment method for double electrode plates of alkaline water electrolysis device | |
| CN101892498A (en) | A kind of ionic liquid electrodeposition solution and the method for preparing iridium layer by electrodeposition in the solution | |
| Guan et al. | 3‐D Tin‐Carbon Fiber Paper Electrodes for Electrochemically Converting CO2 to Formate/Formic Acid | |
| JP2008001932A (en) | Electrode for electrolysis | |
| JP2020057551A (en) | Electrode plate | |
| Wang et al. | The Electrochemical Behavior of Zr (IV) and Y (III) in NaCl-KCl-K2ZrF6-YCl3 Molten Salt | |
| Chang et al. | Effects of Zr content on electrochemical performance of Ti/Sn− Ru− Co− ZrO x electrodes |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 510080 Dongfeng East Road, Dongfeng, Guangdong, Guangzhou, Zhejiang Province, No. 8 Patentee after: ELECTRIC POWER RESEARCH INSTITUTE, GUANGDONG POWER GRID CO., LTD. Address before: 510080 Dongfeng East Road, Dongfeng, Guangdong, Guangzhou, Zhejiang Province, No. 8 Patentee before: Electrical Power Research Institute of Guangdong Power Grid Corporation |