CN102994283B - Wax removal cleaning method - Google Patents
Wax removal cleaning method Download PDFInfo
- Publication number
- CN102994283B CN102994283B CN201210395298.1A CN201210395298A CN102994283B CN 102994283 B CN102994283 B CN 102994283B CN 201210395298 A CN201210395298 A CN 201210395298A CN 102994283 B CN102994283 B CN 102994283B
- Authority
- CN
- China
- Prior art keywords
- clean
- out system
- weight percent
- deionized water
- cloth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000004140 cleaning Methods 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 claims abstract description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims abstract description 15
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000008367 deionised water Substances 0.000 claims abstract description 14
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 14
- 239000004744 fabric Substances 0.000 claims abstract description 14
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 26
- CCVYRRGZDBSHFU-UHFFFAOYSA-N (2-hydroxyphenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1O CCVYRRGZDBSHFU-UHFFFAOYSA-N 0.000 claims description 13
- CUBCNYWQJHBXIY-UHFFFAOYSA-N benzoic acid;2-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC=C1.OC(=O)C1=CC=CC=C1O CUBCNYWQJHBXIY-UHFFFAOYSA-N 0.000 claims description 13
- -1 polyoxyethylene octylphenol Polymers 0.000 claims description 13
- 235000019353 potassium silicate Nutrition 0.000 claims description 13
- 239000012188 paraffin wax Substances 0.000 claims description 12
- 238000010926 purge Methods 0.000 claims description 11
- 239000001993 wax Substances 0.000 claims description 9
- 239000012459 cleaning agent Substances 0.000 abstract 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 abstract 2
- LMHAGAHDHRQIMB-UHFFFAOYSA-N 1,2-dichloro-1,2,3,3,4,4-hexafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(Cl)C1(F)Cl LMHAGAHDHRQIMB-UHFFFAOYSA-N 0.000 abstract 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 abstract 1
- 229960004889 salicylic acid Drugs 0.000 abstract 1
- 238000002791 soaking Methods 0.000 abstract 1
- 239000000176 sodium gluconate Substances 0.000 abstract 1
- 229940005574 sodium gluconate Drugs 0.000 abstract 1
- 235000012207 sodium gluconate Nutrition 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- 229960002415 trichloroethylene Drugs 0.000 abstract 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 0 C*1(CCC2)C2CCCC1 Chemical compound C*1(CCC2)C2CCCC1 0.000 description 2
- JAPMJSVZDUYFKL-UHFFFAOYSA-N C1C2C1CCC2 Chemical compound C1C2C1CCC2 JAPMJSVZDUYFKL-UHFFFAOYSA-N 0.000 description 1
- BAOZQZPGQWXJOW-UHFFFAOYSA-N C1C2C=CCC12 Chemical compound C1C2C=CCC12 BAOZQZPGQWXJOW-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
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- Detergent Compositions (AREA)
Abstract
The invention relates to a wax removal cleaning method, comprising the following steps of: (1) using a cleaning agent which is composed of the following constituents in percentage by weight: 7.6-10.3% of octaphenyl polyoxyethyiene, 3.5-6.7% of salicylic acid, 1.5-5.2% of acetamide, 2.6-7.8% of 2-hydroxyphosphonoacetic acid, 4.1-8.3% of sodium silicate, 3.7-5.8% of sodium gluconate, 5.1-9.2% of alcohol, 1.3-4.0% of isopropanol, 5.5-9.8% of trichloro ethylene, and the balance of deionized water; and (2) soaking a cloth for cleaning in the cleaning agent at first, and then wiping the surface of an object with the cloth until waxiness on the surface of the object is removed. Via the wax removal cleaning method disclosed by the invention, waxy dirt on the surface of the object can be rapidly removed; and moreover, the surface of the object cannot be corroded, and the cleaned object can be clean as new.
Description
Technical field
The present invention relates to a kind of paraffin removal purging method, belong to industrial cleaning technique field.
Background technology
According to the applicant understood, in prior art, there is no paraffin removal clean-out system targetedly, be difficult to the wax dirt of body surface thoroughly to clean up.Need a kind of efficient cleaner with strong points badly.
Summary of the invention
Technical problem to be solved by this invention is: overcomes the problem that prior art exists, a kind of paraffin removal purging method is provided, can remove fast the wax dirt of body surface, and can erosion surface, can make the object after cleaning clean as new.
The technical scheme that the present invention solves its technical problem is as follows:
A kind of paraffin removal clean-out system, is characterized in that, is made up of the component of following weight percent:
The preparation method of above-mentioned clean-out system, comprises the following steps:
(1) in stirrer, add by weight percentage successively 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The purging method that adopts above-mentioned clean-out system, comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
The present patent application people is through repeatedly, in depth experimental study just draws and adopts the clean-out system of above-mentioned formula, this clean-out system can be removed the wax dirt of body surface fast, and can not corrode object, can make the object after cleaning clean as new, cleaning efficiency is greater than 99%, is the crystallization that the present patent application people pays a large amount of painstaking effort.
Embodiment
Below in conjunction with embodiment, the present invention is described in further detail.But the invention is not restricted to given example.
Embodiment 1
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 2
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 3
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 4
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Claims (3)
1. a paraffin removal purging method, is characterized in that, comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
2. paraffin removal purging method according to claim 1; it is characterized in that; in step (1), adopt the clean-out system being formed by following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water.
3. paraffin removal purging method according to claim 1; it is characterized in that; in step (1), adopt the clean-out system being formed by following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210395298.1A CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210395298.1A CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102994283A CN102994283A (en) | 2013-03-27 |
| CN102994283B true CN102994283B (en) | 2014-07-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210395298.1A Expired - Fee Related CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Country Status (1)
| Country | Link |
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| CN (1) | CN102994283B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104531380B (en) * | 2014-12-09 | 2017-10-20 | 侯琳 | A kind of preparation method of paraffin removal cleaning agent for oil pumping in oil fields pipeline |
| CN105499228B (en) * | 2015-11-25 | 2017-08-25 | 中锗科技有限公司 | A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette |
| CN105381984B (en) * | 2015-12-11 | 2018-02-02 | 华南协同创新研究院 | Method for removing 3D printing wax pattern supporting material |
| CN109979799A (en) * | 2017-12-27 | 2019-07-05 | 东莞新科技术研究开发有限公司 | The Degumming method of semiconductor wafer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1193897A (en) * | 1995-06-27 | 1998-09-23 | 普罗格特-甘布尔公司 | Methods, compositions and/or articles for cleaning/disinfecting products |
| CN101974377A (en) * | 2010-11-10 | 2011-02-16 | 南通海迅天恒纳米科技有限公司 | LED gallium arsenide substrate dewaxing cleaning agent |
| CN102373129A (en) * | 2010-08-12 | 2012-03-14 | 郑绪成 | Automobile waterless dry-cleaning cosmetic |
-
2012
- 2012-10-17 CN CN201210395298.1A patent/CN102994283B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1193897A (en) * | 1995-06-27 | 1998-09-23 | 普罗格特-甘布尔公司 | Methods, compositions and/or articles for cleaning/disinfecting products |
| CN102373129A (en) * | 2010-08-12 | 2012-03-14 | 郑绪成 | Automobile waterless dry-cleaning cosmetic |
| CN101974377A (en) * | 2010-11-10 | 2011-02-16 | 南通海迅天恒纳米科技有限公司 | LED gallium arsenide substrate dewaxing cleaning agent |
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| Publication number | Publication date |
|---|---|
| CN102994283A (en) | 2013-03-27 |
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Granted publication date: 20140709 Termination date: 20151017 |
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